KR20040073037A - Apparatus of thermal vacuum evaporator - Google Patents

Abstract

PURPOSE: An apparatus is provided to achieve improved work efficiency by permitting the processes of evaporation material preparation, component replacement, and system maintenance to be performed in the outside of a glove box. CONSTITUTION: An apparatus comprises a glove box(110) filled with a gas; one or more vacuum chambers(120a,120b) including first vacuum chambers(121a,121b) disposed in the glove box, and second vacuum chambers(122a,122b) communicated to the first vacuum chambers and disposed in the outside of the glove box; a vacuum evacuation unit for vacuum evacuation of the vacuum chambers; and evaporation sources(123a,123b) arranged in the vacuum chambers, and which sublimes and/or evaporates the material to be deposited on a substrate by heating the material.

Description

Apparatus of thermal vacuum evaporator

The present invention relates to a vacuum thermal vapor deposition apparatus, and more particularly, vacuum thermal vapor deposition for depositing an organic thin film and / or a metal thin film on a substrate surface by heating, subliming and / or evaporating a deposition material in a chamber maintaining a vacuum atmosphere. Relates to a device.

As a method of forming a thin film on the substrate surface of the flat panel display device, there is a printing method or a rotary coating method, but recently, a deposition method capable of forming a uniform thickness regardless of whether the lower layer is bent is mainly used. Such vapor deposition methods are roughly classified into vacuum vapor deposition and atmospheric vapor deposition. In general, vacuum vapor deposition is referred to as vapor deposition, and atmospheric vapor deposition is mainly referred to as ion sputtering or plasma sputtering.

Recently, EL (Electroluminescence) devices among the devices used in displays are attracting attention as next-generation display devices because they have a wide viewing angle, excellent contrast, and fast response speed. . The EL element is classified into an inorganic EL element and an organic EL element according to a material forming an emissive layer. Herein, the organic EL device has an advantage of excellent luminance, driving voltage, and response speed, and multicoloring, compared to the inorganic EL device. In such an organic EL device, an anode layer having a predetermined pattern is generally formed on the substrate, and an organic layer formed by laminating a hole transporting layer, a light emitting layer, an electron transporting layer, and the like is formed on the upper portion of the anode layer. The cathode layer of a predetermined pattern is formed in the direction orthogonal to the said anode layer. Here, the hole transport layer, the light emitting layer and the electron transport layer are organic thin films made of an organic compound, and the cathode layer is a metal thin film made of a metal.

In the process of manufacturing the organic EL device configured as described above, the organic thin film such as the hole transport layer, the light emitting layer, the electron transport layer and the metal thin film of the negative electrode layer, the vacuum chamber is adjusted to the internal pressure of 10 ^ -6 to 10 ^ -7 torr and And a vacuum heat evaporation apparatus provided opposite the substrate disposed inside the vacuum chamber and having a deposition source for heating and subliming and / or evaporating a small amount of organic material or metal.

1 is a cross-sectional view showing an example of such a conventional vacuum thermal evaporation apparatus.

Referring to the drawings, a conventional vacuum thermal vapor deposition apparatus, for example, a glove box (10) filled with an inert gas such as nitrogen (N ₂ ) or helium (He), argon (Ar), and the like, Vacuum chambers 20a and 20b disposed inside the glove box 10 and a vacuum pump 30 for evacuating the vacuum chambers 20a and 20b are provided. Inside the vacuum chambers 20a and 20b, substrate holders 25a and 25b for supporting a substrate are disposed to face the substrate holders 25a and 25b, and the deposition material is heated by the heating units 24a and 24b. Vapor deposition sources 23a and 23b for sublimation and / or evaporation.

However, such a conventional vacuum thermal evaporation apparatus has the following problems.

First, since detailed work, such as preparing a small amount of deposition material, needs to be performed by wearing thick gloves in the glove box 10, the work is cumbersome and the work efficiency is low.

Second, when replacing parts such as the heating units (24a, 24b) or when you need to maintain the device, such as cleaning or repair, there is a problem that the entire glove box 10 must be dismantled first.

SUMMARY OF THE INVENTION The present invention has been made to solve the problems described above, and an object thereof is to provide a vacuum thermal evaporation apparatus which has improved its working efficiency in preparation of deposition material, replacement of parts, maintenance of apparatus, and the like.

1 is a cross-sectional view showing an example of a conventional vacuum thermal vapor deposition apparatus,

2 is a front view showing a partial cut-in vacuum vacuum deposition apparatus according to an embodiment of the present invention,

3 is a cross-sectional view of the vacuum thermal vapor deposition apparatus shown in FIG.

4 and 5 are views for explaining the operation of the vacuum thermal evaporation apparatus shown in Figs.

Figure 6 is a front view showing a partial cut-in vacuum vacuum deposition apparatus according to another embodiment of the present invention,

7 is a cross-sectional view of the vacuum thermal vapor deposition apparatus shown in FIG.

8 and 9 are views for explaining the operation of the vacuum thermal evaporation apparatus shown in Figs.

<Description of Symbols for Major Parts of Drawings>

100 ... substrate 110 ... glove box

120a, 120b ... vacuum chamber 121a, 121b ... first chamber

122a, 122b ... Second chamber 123a, 123b ... Deposition source

124a, 124b ... heating unit 125a, 125b ... substrate holder

126a, 126b ... Shutter 127a, 127b ... Support

128a, 128b ... Deposition boat 140 ... Vacuum pump

141 ... switching valve 150a, 150b ... linear motor

160a ~ 160d ... opening and closing door 161a ~ 161d ... view window

170a ~ 170d ... Sealing seal 180a ~ 180d ... Fastening member

190.Support member

In order to achieve the above object, the vacuum thermal vapor deposition apparatus of the present invention, the gas filled glove box; At least one vacuum chamber having a first chamber disposed inside the glove box, and a second chamber communicating with the first chamber and disposed outside the glove box; Vacuum exhaust means for evacuating the inside of the vacuum chamber; And a deposition source installed in the vacuum chamber and heating and subliming and / or evaporating the deposition material to be deposited on the substrate.

Here, the substrate is disposed on the first chamber side, the deposition source is preferably disposed on the second chamber side.

The first chamber may be installed to be vertically movable with respect to the bottom of the glove box, and the second chamber may be fixed to the bottom of the glove box. The vacuum thermal evaporation apparatus may further include a linear motor for vertically moving the first chamber with respect to the bottom of the glove box. In addition, the second chamber is preferably provided with at least one opening and closing door for opening and closing the interior thereof.

In addition, the first and second chambers may be fixed to the bottom of the glove box. Here, the first and second chambers are preferably provided with at least one opening and closing door to open and close the interior thereof.

The vacuum thermal evaporation apparatus may further include a sealing seal interposed between the first and second chambers and a bottom of the glove box to seal the inside of the vacuum chamber.

In addition, the first and second chambers may be provided with at least one viewing window for viewing the inside from the outside.

In addition, the vacuum thermal evaporation apparatus may further include a support member for supporting the second chamber below the second chamber.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 2 is a front view showing a partial cutaway view of a vacuum thermal vapor deposition apparatus according to an embodiment of the present invention, and FIG. 3 is a cross-sectional view of the vacuum thermal vapor deposition apparatus shown in FIG.

As shown, the vacuum thermal vapor deposition apparatus according to an embodiment of the present invention, for example, a glove box 110 filled with an inert gas such as nitrogen, helium, argon, and at least one substrate is disposed therein The vacuum chambers 120a and 120b of the vacuum chamber, the vacuum pump 140 for evacuating the vacuum chambers 120a and 120b, and the deposition material to be deposited on the substrate, which is installed in the vacuum chambers 120a and 120b. And / or deposition sources 123a and 123b to evaporate. The substrate is mounted to the substrate holders 125a and 125b disposed above the vacuum chambers 120a and 120b. The deposition material contained in the boats 128a and 128b is heated by the heating units 124a and 124b to sublimate and / or evaporate. 2 and 3 illustrate that two vacuum chambers 120a and 120b are disposed in the glove box 110, the number of such vacuum chambers may be appropriately added or subtracted as necessary, and the number of vacuum chambers is provided. The scope of the present invention is not limited by.

In the embodiment configured as described above, according to one feature of the present invention, each of the vacuum chamber (120a, 120b) and the first chamber (121a, 121a) disposed inside the glove box 110, the first Second chambers 122a and 122b are disposed in communication with the chambers 121a and 121b and disposed outside the glove box 110.

Here, the substrate is preferably disposed on the first chamber (121a, 121b) side, the deposition source 123 is disposed on the side of the second chamber (122a, 122b).

In addition, the first chambers 121a and 121b are installed to be vertically movable with respect to the bottom 111 of the glove box 110, and the second chambers 122a and 122b are bottoms of the glove box 110. It is installed to be fixed to the (111). To this end, linear motors 150a and 150b are installed at one side of the first chambers 121a and 121b to vertically move the first chambers 121a and 121b with respect to the bottom 111 of the glove box 110. Can be. In addition, the second chambers 122a and 122b may be fixed to the bottom 111 of the glove box 110 by the fastening members 180a and 180b.

On the other hand, in order to seal the interior of the vacuum chamber (120a, 120b), between the first and second chamber (121a, 121b, 122a, 122b) and the bottom 111 of the glove box 110, respectively ( 170a, 170b, 170c, and 170d may be interposed.

In addition, in order to open and close the inside of the second chambers 122a and 122b from the outside of the glove box 110, opening and closing doors 160a and 160b may be installed in the second chambers 122a and 122b. have. The opening / closing doors 160a and 160b may be installed not only on the front surfaces of the second chambers 122a and 122b but also on the side surfaces or the rear surfaces thereof.

In addition, the first and second chambers 121a, 121b, 122a, and 122b may include at least one viewing window 161a, 161b, 161c, and 161d, respectively, in order to allow the inside to be viewed from the outside. .

In addition, a support member 190 may be installed at the lower portion of the second chambers 122a and 122b to support the load of the second chambers 122a and 122b.

Meanwhile, reference numerals 126a and 126b, which are not described, indicate shutters for uniformly maintaining the thickness of the deposited film, and reference numerals 127a and 127b denote supports for supporting the substrate holders 125a and 125b.

Referring to the operation of the vacuum thermal evaporation apparatus according to an embodiment of the present invention configured as described above in detail. However, for the convenience of description, only the organic vacuum chamber 120a for depositing an organic material to form an organic thin film on the substrate surface and the metal vacuum chamber 120b for depositing a metal to form a metal thin film on the substrate surface, The case where the metal thin films are sequentially formed by the metal vacuum chamber 120b after the organic thin film is formed on the substrate surface by the organic vacuum chamber 120a will be described. However, it should be understood that the limiting or deposition order of the number of vacuum chambers is exemplary and is not intended to limit the scope of the present invention.

4 and 5 are views for explaining the operation of the vacuum thermal evaporation apparatus shown in Figs. Here, the same reference numerals as the reference numerals shown in FIGS. 2 and 3 denote the same members having the same configuration and operation.

First, as shown in FIG. 4, in the vacuum chamber 120a for forming an organic thin film, the opening / closing door 160a of the second chamber 122a disposed outside the glove box 110 is opened to open the inside thereof. . In the state in which the inside of the second chamber 122a is opened, an operation such as preparing a deposition material is performed. Therefore, detailed operations, such as preparing a deposition material, can be performed quickly and accurately outside the glove box 110.

When the operation of preparing the deposition material is completed, the opening / closing door 160a is closed and the vacuum chamber 140a is evacuated by using the vacuum pump 140. At this time, only the vacuum chamber 120a for forming the organic thin film is evacuated using the switching valve 141 of the vacuum pump 140. When the internal vacuum degree of the vacuum chamber 120a for forming the organic thin film is approximately 10 ^ -6 to 10 ^ -7 torr, a gas such as nitrogen filled in the glove box 110 is injected into the first chamber 121a and vacuumed. The pressure inside the chamber 120a and the glove box 110 are maintained to be the same.

Next, as shown in FIG. 5, the first chamber 121a is lifted up using the linear motor 150a. In this way, the substrate 100 is mounted on the substrate holder 125a in a state where the first chamber 121a is lifted up. After the substrate 100 is mounted, the first chamber 121a is lowered again by using the linear motor 150a to close the first chamber 121a.

Next, the inside of the organic thin film forming vacuum chamber 120a is evacuated using the vacuum pump 140. In such a vacuum atmosphere, the deposition source 123a heats the deposition material by the heating unit 124a to sublimate and / or evaporate to form an organic thin film on the surface of the substrate 100.

When the organic thin film is formed on the surface of the substrate 100, the vacuum pump 140 is locked and a gas such as nitrogen is injected into the first chamber 121a of the vacuum chamber 120a. After gas injection, the first chamber 121a is lifted up and detached from the substrate holder 125a.

Finally, the substrate 100 on which the organic thin film is formed is mounted on the substrate holder 125b of the vacuum chamber 120b for forming the metal thin film, which is already prepared in the same manner as described above. In the vacuum chamber 120b for forming the metal thin film, the metal thin film is deposited on the surface of the substrate 100 through a process similar to the deposition of organic materials in the vacuum chamber 120a for forming the organic thin film.

Hereinafter, another embodiment of the present invention will be described with reference to the accompanying drawings.

FIG. 6 is a front view showing a partial cutaway of the vacuum thermal vapor deposition apparatus according to another embodiment of the present invention, and FIG. 7 is a cross-sectional view of the vacuum thermal vapor deposition apparatus shown in FIG. However, here, the same reference numerals as the reference numerals shown in FIGS. 2 and 3 represent the same members having the same configuration and operation, and thus, repeated descriptions thereof will be omitted.

As shown, according to another embodiment of the present invention, not only the second chambers 122a and 122b but also the first chambers 121a and 121b are installed to be fixed to the bottom 111 of the glove box 110. To this end, the first and second chambers 121a, 121b, 122a, and 122b may be fastened to the bottom 111 of the glove box 110 by the fastening members 180a, 180b, 180c, and 180d.

In addition, in order to open and close not only the second chambers 122a and 122b but also the insides of the first chambers 121a and 121b, the opening and closing doors 160c and 160d are also provided in the first chambers 121a and 121b. Can be installed. The opening / closing doors 160c and 160d may be installed not only on the front surfaces of the first chambers 121a and 121b but also on the side surfaces or the rear surfaces thereof.

Referring to the operation of the vacuum thermal evaporation apparatus according to another embodiment of the present invention configured as described above are as follows.

8 and 9 are views for explaining the operation of the vacuum thermal evaporation apparatus shown in Figs. Here, the same reference numerals as the reference numerals shown in Figs. 6 and 7 denote the same members having the same configuration and action.

First, as shown in FIG. 8, in the vacuum chamber 120a for forming an organic thin film, an operation such as preparing a deposition material is performed by opening and closing the door 160a of the second chamber 122a and opening the inside thereof. do.

Next, after closing the opening and closing door (160a) and evacuating the interior of the vacuum chamber (120a) by using a vacuum pump 140, the first chamber (121a) such as nitrogen filled in the glove box 110 The pressure is injected into the vacuum chamber 120a to maintain the same pressure in the glove box 110.

Next, as shown in FIG. 9, the opening / closing door 160c of the first chamber 121a is opened to open the inside thereof. In this way, the substrate 100 is mounted on the substrate holder 125a in a state where the first chamber 121a is opened. After the substrate 100 is mounted, the opening / closing door 160c of the first chamber 121a is closed.

Finally, an organic thin film and / or a metal thin film are sequentially formed on the surface of the substrate 100 through a process similar to the embodiment of the present invention described above.

As described above, according to the vacuum thermal evaporation apparatus of the present invention, the following effects can be obtained.

First, the work efficiency is improved because precise and detailed work such as preparing a small amount of deposition material can be performed quickly and accurately outside the glove box.

Second, there is no need to disassemble the glove box when replacing a component such as a heating unit or when maintaining a device such as cleaning or repairing, it can be easily performed by opening only the opening / closing door of the second chamber.

Although the present invention has been described with reference to one embodiment shown in the drawings, this is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (10)

A glove box filled with gas; At least one vacuum chamber having a first chamber disposed inside the glove box, and a second chamber communicating with the first chamber and disposed outside the glove box; Vacuum exhaust means for evacuating the inside of the vacuum chamber; And And a deposition source installed in the vacuum chamber, the deposition source heating and subliming and / or evaporating the deposition material to be deposited on the substrate. The method of claim 1, And the substrate is disposed at the first chamber side, and the deposition source is disposed at the second chamber side. The method according to claim 1 or 2, And the first chamber is installed to be movable vertically with respect to the bottom of the glove box, and the second chamber is fixed to the bottom of the glove box. The method of claim 3, And a linear motor for vertically moving the first chamber with respect to the bottom of the glove box. The method of claim 3, And the second chamber has at least one opening and closing door for opening and closing the inside thereof. The method according to claim 1 or 2, And the first and second chambers are fixed to the bottom of the glove box. The method of claim 6, And the first and second chambers each include at least one opening and closing door for opening and closing the inside of the first and second chambers. The method according to claim 1 or 2, And a sealing seal interposed between the first and second chambers and the bottom of the glove box, respectively, to seal the inside of the vacuum chamber. The method according to claim 1 or 2, And the first and second chambers each have at least one viewing window for viewing the inside from the outside. The method according to claim 1 or 2, And a support member for supporting the second chamber below the second chamber.