KR20040055987A - Apparatus for elecrto-chemical etching with adjustable rod - Google Patents

Apparatus for elecrto-chemical etching with adjustable rod Download PDF

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Publication number
KR20040055987A
KR20040055987A KR1020020082488A KR20020082488A KR20040055987A KR 20040055987 A KR20040055987 A KR 20040055987A KR 1020020082488 A KR1020020082488 A KR 1020020082488A KR 20020082488 A KR20020082488 A KR 20020082488A KR 20040055987 A KR20040055987 A KR 20040055987A
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South Korea
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specimen
rod
etching
screw shaft
fixed plate
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KR1020020082488A
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Korean (ko)
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강영환
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재단법인 포항산업과학연구원
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Priority to KR1020020082488A priority Critical patent/KR20040055987A/en
Publication of KR20040055987A publication Critical patent/KR20040055987A/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE: An apparatus for electro-chemical etching with adjustable rods is provided which is capable of uniformly etching samples as a whole, securing prompt etching speed and easily fabricating various shaped samples through adjustment of gap and height of sample grounding rods. CONSTITUTION: The apparatus comprises a fixed plate(16) which is installed in an upper side of an etching reagent container(5) with being spaced apart from the etching reagent container, and one end of which is cutout; a screw shaft(12) which is penetratingly installed on both surfaces of the cutout one end of the fixed plate, and on which screw thread is formed in such directions that are oppositely directed to each other around the center of length of the screw shaft; sample grounding rod holders(8) which are engaged with the screw threads with being inserted onto the respective screw threads of the screw shaft and movably installed within the cutout width of the fixed plate, and to respective lower parts of which sample grounding rods(1) are fixed; and a precipitation rod(2) fixed onto the fixed plate with being spaced apart from the sample grounding rods in a certain distance.

Description

봉 간격 조절이 가능한 전해에칭장치{APPARATUS FOR ELECRTO-CHEMICAL ETCHING WITH ADJUSTABLE ROD}Electrolytic Etching Equipment with Adjustable Bar Spacing {APPARATUS FOR ELECRTO-CHEMICAL ETCHING WITH ADJUSTABLE ROD}

본 발명은 금속재료의 조직 관찰시 화학 에칭이 불가능한 시편에 전기를 통하여 에칭하는 봉 간격 조절이 가능한 전해에칭장치에 관한 것이다.The present invention relates to an electrolytic etching apparatus capable of adjusting rod spacing for electrically etching a specimen that cannot be chemically etched when observing the structure of a metal material.

일반적으로, 철 및 비철합금 등의 금속재료의 미세조직을 관찰할 때는 에칭 처리를 하고 있는데, 대개의 경우에는 에칭 시약에 시편을 침전시키거나 시약을 적신 솜으로 문지르는 방법으로 화학 에칭을 실시하고 있다.Generally, etching is carried out when observing microstructures of metal materials such as iron and nonferrous alloys, and in general, chemical etching is performed by depositing a specimen in an etching reagent or rubbing with a cotton cloth wet with the reagent. .

그러나, 스테인레스강과 같이 부식이 용이하지 않은 금속은 이러한 화학 에칭법을 사용할 수 없으므로 전기를 이용한 전해 에칭을 하여야 한다.However, a metal that is not easily corroded, such as stainless steel, cannot be used in such a chemical etching method, and thus, electrolytic etching using electricity should be performed.

종래 전해에칭장치는 도 1의 도시와 같이, 전해액(7)이 일정량 들어있는 에칭시약용기(5)에 시편(6)을 담그고, 고정판(15)에 고정되어 있는 침전봉(2)을 시편(6)에 닿지 않게 전해액(7)중에 침지시키며, 상기 고정판(15)에 고정되어 있는 시편접지봉(1)을 시편(6)에 접촉되도록 배치한 후 이 시편접지봉(1)을 시편(6)에 전선(3,4)을 통해 미도시한 전해에칭기(Electric Etching Machine)에 설정된 전류 및 전압을 인가해 주면 시편(6)의 표면이 화학적으로 활성화 되어 미세조직간의 전기 화학적 전위차에 의해 서로 다른 속도로 부식이 진행되면서 에칭되도록 구성되어 있었다.In the conventional electrolytic etching apparatus, as shown in FIG. 1, the specimen 6 is immersed in an etching reagent container 5 containing a predetermined amount of the electrolyte solution 7, and the precipitation rod 2 fixed to the fixing plate 15 is attached to the specimen ( 6) is immersed in the electrolyte (7) so as not to contact, and the specimen ground rod (1) fixed to the fixing plate (15) is placed in contact with the specimen (6) and then the specimen ground rod (1) to the specimen (6) Applying a current and voltage set to an electric etching machine (not shown) through the wires 3 and 4, the surface of the specimen 6 is chemically activated, and the speed is different due to the electrochemical potential difference between the microstructures. The furnace was configured to be etched as corrosion progressed.

그런데, 이와 같이 에칭된 시편(6)은 시편접지봉(1)이 접지된 곳으로부터 가장 거리가 먼 부위(a)부터 에칭이 시작되어 중간부위(b)를 거쳐 가까운 부위(c)로 에칭이 진행되기 때문에 에칭의 정도가 위치별로 균일하지 않아 먼 부위(a)의 에칭 정도가 알맞을 싯점에서 가까운 부위(c)는 아직 에칭이 덜 된 상태이고, 가까운 부위(c)가 알맞은 정도가 되면 먼 부위(a)는 이미 과다 에칭이 되어 버린다는 문제점이 있었다.However, the specimen 6 etched in this way starts etching from the part (a) farthest from the place where the specimen grounding rod 1 is grounded, and the etching proceeds through the middle part (b) to the close part (c). Since the degree of etching is not uniform for each position, the near part (c) is still less etched at the point where the distant part (a) is suitable for etching, and when the close part (c) is a suitable degree, the far part ( a) has already suffered from excessive etching.

뿐만 아니라, 시편(6)이 전체적으로 균일한 조직을 갖는 경우에는 이러한 현상이 발생한 경우에도 적당히 한 부위를 선택해서 촬영하거나 관찰하면 되지만 시편(6)의 전체적인 조직변화를 관찰하는 실험이나 시편(6)의 여러 부위에서 특정한 조직 예를 들어 크랙 주위의 조직 같은 것을 관찰하는 실험에서는 시편(6) 전체가 균일하게 에칭되어야 하는데도 불구하고 종래 장치로는 이를 충족시키지 못한다는 문제점이 있었다.In addition, in the case where the specimen 6 has a uniform structure as a whole, even when such a phenomenon occurs, an appropriate part may be selected or photographed or observed, but an experiment or specimen (6) for observing the overall tissue change of the specimen (6) In experiments in which specific tissues, for example, tissues around cracks, were observed at various sites, there was a problem that although the entire specimen 6 had to be uniformly etched, the conventional apparatus could not satisfy this problem.

본 발명은 상기와 같은 문제점을 해결하기 위한 것으로, 시편을 전체적으로 균일하게 에칭할 수 있고 에칭속도가 신속하며, 시편접지봉의 간격조정과 높이조정에 의하여 다양한 모양의 시편을 용이하게 제작할 수 있는 봉 간격 조절이 가능한 전해에칭장치를 제공하는데 그 목적이 있다.The present invention is to solve the above problems, the entire specimen can be uniformly etched, the etching speed is fast, the rod spacing that can easily produce a specimen of various shapes by adjusting the spacing and height of the specimen ground rod It is an object of the present invention to provide an adjustable electroetching apparatus.

도 1은 종래 단봉식 전해에칭장치의 사시도,1 is a perspective view of a conventional unsealed electrolytic etching apparatus,

도 2는 본 발명에 따른 봉 간격 조절이 가능한 전해에칭장치의 사시도,2 is a perspective view of an electrolytic etching apparatus capable of adjusting rod spacing according to the present invention;

도 3은 도 2의 평면도.3 is a plan view of FIG.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

1....시편접지봉 2....침전봉1 .... specimen ground rod 2 .... sedimentation rod

5....에칭시약용기 6....시편5 .... Etching reagent container 6 .... Specimen

7....전해액 8....시편접지봉홀더7 .... Electrolyte 8 .... Specimen ground rod holder

9....높이조절나사 10....폭조절레버9 .... Height adjusting screw 10 .... Width adjusting lever

11....슬라이딩가이드 12....나사축Sliding guide 12.Screw shaft

16....고정판 17....접지봉홈16..Mounting plate 17..Ground bar groove

18....홀더활동공간18 .... holder activity space

본 발명의 상기한 목적은, 에칭시약용기의 상측에 이격설치되고 일단이 절개형성된 고정판과; 상기 고정판의 절개된 일단 양측면을 관통하여 배설되고 길이 중앙을 기준으로 양단을 향해 서로 대향되는 방향으로 나사산이 형성된 나사축과; 상기 나사축의 각 나사산에 끼워져 치합되며 상기 고정판의 절개된 폭 내에서 이동가능하게 설치되고 각 하단에는 시편접지봉이 고정된 시편접지봉홀더와; 상기 시편접지봉과 거리를 두고 상기 고정판상에 고정된 침전봉을 포함하여 구성되는 것을 특징으로 하는 봉 간격 조절이 가능한 전해에칭장치을 제공함에 의해 달성된다.The above object of the present invention, the fixing plate is spaced apart and installed on the upper side of the etching reagent container; A screw shaft disposed through both sides of the cut end of the fixing plate and having threads formed in opposite directions toward both ends with respect to the center of the length; A specimen ground rod holder fitted to each thread of the screw shaft and installed to be movable within the cut width of the fixing plate, and a specimen ground rod fixed at each lower end thereof; It is achieved by providing an electrolytic etching apparatus capable of adjusting the rod spacing, characterized in that comprising a settling rod fixed on the fixed plate at a distance from the specimen ground rod.

이하에서는, 첨부도면을 참조하여 본 발명을 보다 상세하게 설명한다.Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings.

도 2는 본 발명에 따른 장치의 사시도이고, 도 3은 본 발명 장치의 평면도이다.2 is a perspective view of the device according to the invention, and FIG. 3 is a plan view of the device of the invention.

도 2 및 도 3에 따르면, 좌우 양측의 시편접지봉홀더(8)는 슬라이딩가이드(11) 및 나사축(12)에 의해 관통되어 홀더활동공간(18)에 설치된다.According to FIGS. 2 and 3, the specimen ground rod holders 8 on both the left and right sides are penetrated by the sliding guide 11 and the screw shaft 12 and are installed in the holder active space 18.

상기 슬라이딩가이드(11)는 양측 시편접지봉홀더(8)의 이동을 원활하게 하는 역할을 하고, 상기 나사축(12)은 그 외주에 오른나사(13) 및 왼나사(14)가 양측에 형성되어 있어 상기 시편접지봉홀더(8)의 관통 부분(미도시)에 형성된 나사부분과 맞물려 연결되며, 그 일단에는 폭조절레버(10)가 고정되어 있어 상기 폭조절레버(10)의 회전에 의해 좌우 반대로 상기 시편접지봉홀더(8)를 이동시킬 수 있도록 구성된다.The sliding guide 11 serves to facilitate the movement of both specimen ground rod holder (8), the screw shaft 12 is formed on both sides of the right screw 13 and the left screw 14 on the outer circumference It is connected to the screw portion formed in the through portion (not shown) of the specimen ground rod holder 8, the width adjustment lever 10 is fixed to one end thereof by the rotation of the width adjustment lever 10 to the left and right It is configured to move the specimen ground rod holder (8).

한편, 고정판(16)의 일부에는 높이조절나사(9)에 의해 고정된 양측의 시편접지봉(1)이 좌우 활주가능하도록 접지봉홈(17)이 구비된다.On the other hand, a part of the fixing plate 16 is provided with a grounding rod groove 17 so that the specimen ground rods 1 on both sides fixed by the height adjustment screw 9 can slide left and right.

상기 시편접지봉홀더(8), 높이조절나사(9), 폭조절레버(10), 슬라이딩가이드(11), 나사축(12), 접지봉홈(17), 및 홀더활동공간(18)은 한조를 이루게 되는데 이를 고정판(16)에 1조 이상 임의의 각도 및 크기로 설치할 수 있으므로 시편접지봉(1)의 갯수를 2개로 늘려서 길이가 긴 시편(6)의 경우 시편(6)의 양쪽에서 이와 접촉가능하도록 시편접지봉(1)을 설치할 수 있다.The specimen ground rod holder (8), the height adjustment screw (9), the width adjustment lever (10), the sliding guide (11), the screw shaft (12), the ground rod groove (17), and the holder active space (18) Since it can be installed at any angle and size more than one set on the fixing plate 16, the number of specimen ground rods (1) by increasing the number to two, in the case of long specimen (6) can be contacted with both sides of the specimen (6) Specimen ground rod (1) can be installed.

이러한 구성으로 이루어진 본 발명의 작동관계를 설명한다.The operation relationship of the present invention having such a configuration will be described.

먼저, 고정판(16)에 침전봉(2)을 고정시키고, 시편접지봉홀더(8)의 높이조절나사(9)를 이용하여 높이를 조절한 후 시편접지봉(1)을 양측에 고정시킨다.First, the settling rod (2) is fixed to the fixing plate (16), the height is adjusted using the height adjusting screw (9) of the specimen ground rod holder (8), and then the specimen ground rod (1) is fixed to both sides.

시편(6) 및 전해액(7)이 담긴 에칭시약용기(5)에 상기 시편접지봉(1) 및 침전봉(2)을 담그되 시편접지봉(1)은 시편(6)에 접촉하도록 침지시키고 상기 침전봉(2)은 시편(6)에 닿지 않도록 침지시킨다.Immerse the specimen ground rod (1) and the precipitation rod (2) in the etching reagent container (5) containing the specimen (6) and the electrolyte (7), the specimen ground rod (1) is immersed in contact with the specimen (6) and the precipitation Rod (2) is immersed so as not to contact the specimen (6).

여기서, 시편(6)은 종래와는 달리 그 길이방향을 양측 시편접지봉(1)에 맞추어 배설토록 한다.Here, the specimen 6 is to be excreted in accordance with the specimen ground rods (1) on both sides of the longitudinal direction unlike the conventional.

시편접지봉(1)의 크기나 모양에 따라 폭조절레버(10)를 회전시켜 조정하게 되는데 상기 폭조절레버(10)가 회전하면 나사축(12)의 외주에 형성되어 있는 오른나사(13) 및 왼나사(14)에 의하여 시편접지봉홀더(8)가 양측으로 벌려지거나 오므려지게 된다.The width adjusting lever 10 is rotated and adjusted according to the size or shape of the specimen grounding rod 1. When the width adjusting lever 10 rotates, the right screw 13 formed on the outer circumference of the screw shaft 12 and The specimen ground rod holder 8 is opened or retracted to both sides by the left screw 14.

이때, 시편접지봉홀더(8)의 원활한 이동을 위하여 시편접지봉홀더(8)의 관통 구멍에 슬라이딩가이드(11)가 설치되어 있다.At this time, the sliding guide 11 is provided in the through hole of the specimen ground rod holder 8 for smooth movement of the specimen ground rod holder 8.

반복되는 에칭에 의하여 시편접지봉(1)의 길이가 단축되는 경우에는 상기 높이조절나사(9)를 조절하여 시편접지봉(1)을 하강시켜 그 길이를 변경할 수 있다.When the length of the specimen grounding rod 1 is shortened by repeated etching, the length of the specimen grounding rod 1 may be changed by adjusting the height adjusting screw 9 to change its length.

다음, 시편접지봉(1) 및 침전봉(2)에 접속되어 있는 전선(3,4)을 통해 미도시된 전해에칭기에 설정된 전류 및 전압을 인가해 주면 침전봉(2)으로부터 시편접지봉(1)의 시편(6) 접점부분과의 사이가 가깝기 때문에 전하의 이동경로가 짧아 시편(6)이 골고루 에칭되게 된다.Next, when the current and voltage set in the electrolytic etching machine (not shown) are applied through the wires (3, 4) connected to the specimen ground rod (1) and the precipitation rod (2), the specimen ground rod (1) from the precipitation rod (2) Because of the close proximity between the contact portions of the specimen 6, the path of charge transfer is short, and the specimen 6 is evenly etched.

이상에서 상세히 설명한 바와 같이, 본 발명에 따르면 시편을 전체적으로 완전히 균일하게 에칭할 수 있고, 에칭 속도가 종래의 1봉식에 비해 3배이상 향상되며, 시편접지봉을 2개 설치하여 간격조정과 높이조정을 하면 크기가 다른 다양한 시편도 간단한 조작으로 폭조절을 하면서 용이하게 에칭할 수 있어서 작업 능률이 향상되고, 생산성 향상에도 큰 효과가 있다.As described in detail above, according to the present invention, the test piece can be etched completely and uniformly as a whole, and the etching speed is improved by three times or more compared with the conventional single rod type, and two test piece ground rods are installed to adjust the gap and height. If the various specimens of different sizes can be easily etched while controlling the width by simple operation, the work efficiency is improved and the productivity is greatly improved.

Claims (3)

에칭시약용기(5)의 상측에 이격설치되고 일단이 절개형성된 고정판(16)과;A fixed plate 16 spaced apart from the etching reagent container 5 and having one end cut out; 상기 고정판(16)의 절개된 일단 양측면을 관통하여 배설되고 길이 중앙을 기준으로 양단을 향해 서로 대향되는 방향으로 나사산이 형성된 나사축(12)과;A screw shaft 12 disposed through both sides of the cut end of the fixing plate 16 and having threads formed in opposite directions toward both ends with respect to the center of the length; 상기 나사축(12)의 각 나사산에 끼워져 치합되며 상기 고정판(16)의 절개된 폭 내에서 이동가능하게 설치되고 각 하단에는 시편접지봉(1)이 고정된 시편접지봉홀더(8)와;A specimen ground rod holder (8) fitted to each thread of the screw shaft (12) to be engaged and installed to be movable within the cut width of the fixing plate (16) and to a specimen ground rod (1) fixed at each lower end thereof; 상기 시편접지봉(1)과 거리를 두고 상기 고정판(16)상에 고정된 침전봉(2)을 포함하여 구성되는 것을 특징으로 하는 봉 간격 조절이 가능한 전해에칭장치.Electrolytic etching apparatus capable of adjusting the rod spacing, characterized in that comprises a settling rod (2) fixed on the fixed plate (16) at a distance from the specimen ground rod (1). 제1항에 있어서,The method of claim 1, 상기 시편접지봉(1)은 높이조절나사(9)의 쇄정 및 해정에 의해 상기 시편접지봉홀더(8)상에 상하방향으로 길이조정가능하게 설치되는 것을 특징으로 하는 봉 간격 조절이 가능한 전해엣칭장치.The specimen ground rod (1) is an electrolytic etching apparatus capable of adjusting the rod spacing, characterized in that the length is adjustable in the vertical direction on the specimen ground rod holder (8) by locking and unlocking the height adjustment screw (9). 제1항에 있어서,The method of claim 1, 상기 나사축(12)의 일단에는 이를 회전시킬 수 있는 폭조절레버(10)가 부설된 것을 특징으로 하는 봉 간격 조절이 가능한 전해엣칭장치.One end of the screw shaft 12 is an electrolytic etching apparatus capable of adjusting the rod spacing, characterized in that the width adjustment lever 10 is installed to rotate it.
KR1020020082488A 2002-12-23 2002-12-23 Apparatus for elecrto-chemical etching with adjustable rod KR20040055987A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101455527B1 (en) * 2013-04-30 2014-10-27 현대제철 주식회사 Electropolishing apparatus
KR20210002892U (en) 2020-06-17 2021-12-24 두산중공업 주식회사 Multi-terminal jig for electrolytic etching test
KR20240073577A (en) 2022-11-18 2024-05-27 현대제철 주식회사 Device of fabricating specimen for transmission electron microscope

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101455527B1 (en) * 2013-04-30 2014-10-27 현대제철 주식회사 Electropolishing apparatus
KR20210002892U (en) 2020-06-17 2021-12-24 두산중공업 주식회사 Multi-terminal jig for electrolytic etching test
KR20240073577A (en) 2022-11-18 2024-05-27 현대제철 주식회사 Device of fabricating specimen for transmission electron microscope

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