KR20040031227A - Photosensitive resin composition using photopolymer - Google Patents

Abstract

PURPOSE: A photosensitive resin composition using a photopolymer is provided to enhance a developing characteristic under a small quantity of exposure by using a resin having a crosslinkable photopolymer. CONSTITUTION: A photosensitive resin composition using a photopolymer includes a macro-polymer of 1 to 30 weight percent, a crosslinkable monomer of 5 to 10 weight percent, paints of 10 to 60 percent, a photopolymerization initiator of 0.5 to 5 weight percent, and a solvent of 20 to 80 weight percent. The macro-polymer is expressed by a predetermined chemical formula. The macro-polymer has an average molecular weight of 10,000 to 40,000. The crosslinkable monomer has two or more ethylene-based dual bonds.

Description

Photosensitive resin composition using a photopolymer {PHOTOSENSITIVE RESIN COMPOSITION USING PHOTOPOLYMER}

The present invention relates to a photosensitive resin composition for color filters of a transmissive, reflective and semi-transmissive liquid crystal display with excellent sensitivity and excellent development margin.

The method of forming the color filter of the liquid crystal display has conventionally been a dyeing method, printing method, electrodeposition method, ink-jet method, pigment dispersion method, etc., but recently the resolution and manufacturing method of the pattern is easy Pigment dispersion method is adopted, and this method has been applied to manufacture LCD of mobile phones, laptops, monitors, TVs.

However, as the color reproducibility (color density compared to NTSC) such as monitors and TVs is higher than that of notebook LCDs, the content of pigments is considerably increased, which requires a high exposure amount in the actual production process. It adversely affected the straightness.

Conventionally used photosensitive resin compositions generally include a) a binder dissolved in an aqueous alkali solution; B) a crosslinkable monomer having at least two ethylenic double bonds; c) pigments; D) a photopolymerization initiator; And e) a solvent, and if necessary, contains additives such as an adhesion improving agent with a substrate, a stabilizer for storage stability, and a dispersant for improving dispersibility with pigments. The photosensitive resin composition generally crosslinks with the crosslinkable monomer by radicals of the photopolymerization initiator generated by light, thereby preventing the solvent from being dissolved in the developing solution. However, as the pigment content increases and the thickness of the color filter becomes thinner, the content of the binder and the monomer, which act as a matrix, decreases, which presents a significant problem in terms of reactivity with the developer and process margin in forming the pattern. .

Therefore, in order to solve this problem, Japanese Patent Application Laid-Open Nos. 8-278630, 6-1938, and 5-339356 and Korean Patent Publication No. 1995-702313 have proposed a manufacturing method using various photopolymers. However, the method using such a resin is poor in storage stability and residues after development are often required to be improved, and solubility in solvents is not as good as in conventional acrylic binders.

An object of the present invention is to provide a photopolymer having excellent curing ability by light (UV) and excellent compatibility with an acrylic binder and a copolymer using the same, in order to solve the conventional problems as described above.

Another object of the present invention is to provide a photosensitive resin composition which is excellent in developability and excellent in storage stability even with a small exposure amount using the photopolymer.

In order to achieve the above object, the present invention provides a macropolymer represented by the following general formula (1a) or (1b).

[Formula 1a]

[Formula 1b]

In the above formula, each R ₁ is independently hydrogen or an alkyl group having 1 to 2 carbon atoms; R ₂ is an alkyl group having 2 to 5 carbon atoms which is unsubstituted or substituted with a hydroxy group; a + b + c = 1 and 0.1 <a <0.4, 0 <b <0.5, 0.1 <c <0.5.

Moreover, this invention is the photosensitive resin composition for color filters,

In the photosensitive resin composition for color filters,

A) 5 to 30 parts by weight of a macropolymer represented by Formula 1a or 1b;

B) 5 to 30 parts by weight of a crosslinkable monomer having at least two ethylenic double bonds;

C) 10 to 60 parts by weight of pigment;

D) 0.5 to 5 parts by weight of the photopolymerization initiator; And

E) providing a photosensitive resin composition for color filters comprising 20 to 80 parts by weight of a solvent:

[Formula 1a]

[Formula 1b]

Wherein R ₁ is each independently hydrogen or an alkyl group having 1 to 2 carbon atoms; R ₂ is an alkyl group having 2 to 5 carbon atoms which is optionally substituted with a hydroxy group; a + b + c = 1 and 0.1 <a <0.4, 0 <b <0.5, 0.1 <c <0.5.

Hereinafter, the present invention will be described in detail.

The present invention is characterized by providing a transmissive, reflective and semi-transmissive photosensitive resin composition having excellent sensitivity and excellent development margin by using the macropolymer of Formula 1a or Formula 1b including a photopolymer which is self-cured by light.

In the photosensitive resin composition of the present invention, a) the macropolymer of Formula 1a or Formula 1b is a resin that is dissolved in an aqueous alkali solution, and an ethylene monomer having a photopolymer and an acid group represented by the following Formula 2a or Formula 2b in a solvent or It can obtain by copolymerizing the ethylene-type monomer which does not have an acidic group.

[Formula 2a]

[Formula 2b]

In the above formula, each R ₁ is independently hydrogen or an alkyl group having 1 to 2 carbon atoms; R ₂ is an alkyl group having 2 to 5 carbon atoms which is optionally substituted with a hydroxy group.

Specific examples of the photopolymer group of Formula 2a or Formula 2b include a resin of Chalcone or Cinnamate. The content of Formula 2a or Formula 2b is preferably 10 to 50% by weight.

The monomer having an ethylenic acid group may be in the form of acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, vinyl acetic acid or an acid anhydride thereof, or 2-acryloxyethyl hydrogen phthalate, 2-acryloxyoxypropyl hydrogen Phthalate, 2-acrylooxypropyl hexahydro phthalate, and the like. The content of the monomer having an ethylenic acid group is preferably 10 to 40% by weight, more preferably 20 to 30% by weight. When the content of the monomer having an acid group is less than 10% by weight, the solubility of the photosensitive resin composition in the alkaline developer tends to be lowered. When the content of the monomer having an acidic content exceeds 40% by weight, the dropping and tearing of the pattern occurs when developing the alkaline developer. .

Examples of the monomer having no acidic group include isobutyl acrylate, tert-butyl acrylate, lauryl acrylate, alkyl acrylate, steacrylate, cyclohexyl acrylate, isobornyl acrylate, benzyl acrylate and 2-hydride. Hydroxyacrylate, trimethoxybutyl acrylate, ethylcarbidol acrylate, phenoxyethyl acrylate, 4-hydroxybutyl acrylate, phenoxy polyethylene glycol acrylate, 2-hydroxyethyl acrylate, 2- hydrate Hydroxypropyl acrylate, 2-acryloxyethyl 2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl acrylate and methacrylates thereof; Acrylates containing halogen compounds such as 3-floethyl acrylate and 4-flopropyl acrylate and methacrylates thereof; Acrylates containing siloxane groups such as triethylsiloxane ethyl acrylate and methacrylates thereof; Olefins having aromatics such as styrene and 4-methoxy styrene, and the like, and these may be used alone or in combination of two or more thereof. The content of the monomer having no acid group is preferably 10 to 80% by weight, more preferably 20 to 70% by weight in the polymer composition. When the content of such monomer is less than 10% by weight, the adhesion to the glass surface is poor during the developing process, the pattern tearing phenomenon is severe, and the straightness of the formed pattern is deteriorated. When the content is more than 80% by weight, the developing time is long.

The weight average molecular weight of the macropolymer dissolved in the aqueous alkali solution of the present invention is preferably 10,000 to 80,000, more preferably 15,000 to 50,000. When the weight average molecular weight of the macropolymer exceeds 80,000, the developing time is slowed down and a residual film is formed in the developing process, and when the weight average molecular weight is less than 10,000, there is no developing margin in the developing process.

The content of the macropolymer of Formula 1a or Formula 1b is preferably used in an amount of 5 to 30 parts by weight based on the total photosensitive resin composition, and shows an increase in sensitivity and degree of curing depending on the content. If the content of the macropolymer is less than 1 part by weight, there is a problem in heat resistance and chemical resistance of the formed pattern, and if it exceeds 30 parts by weight, there is a problem of viscosity increase due to an increase in solid content.

In the photosensitive resin composition of the present invention, b) 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacryl, as a crosslinkable monomer having at least two or more ethylenic double bonds; Latex, pentaerythritol tetraacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol diacrylate, sorbitol triacrylate, bisphenol A diacrylate derivative, trimethyl propane triacrylate, dipentaerythritol Polyacrylates, and methacrylates thereof. The content of the crosslinkable monomer having at least two or more ethylenic double bonds is preferably 5 to 30 parts by weight, more preferably 5 to 20 parts by weight based on the total photosensitive resin composition. When the content of the crosslinkable monomer is less than 5 parts by weight, it is difficult to realize the pattern due to the low degree of curing with the photosensitive resin. When the content of the crosslinkable monomer exceeds 30 parts by weight, the tearing of the pattern becomes worse and the straightness of the pattern worsens due to the high degree of curing. .

In the photosensitive resin composition of the present invention, c) pigments may be used both organic pigments and inorganic pigments, specific examples of such organic pigments are C.I. Pigment Yellow 83, C.I. Pigment Yellow 150, C.I. Pigment Yellow 138, C.I. Pigment Yellow 128, C.I. Pigment Orange 43, C.I. Pigment Red 177, C.I. Pigment Red 202, C.I. Pigment Red 209, C.I. Pigment Red 254, C.I. Pigment Red 255, C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Blue 15, C.I. Pigment Blue 15: 3, C.I. Pigment Blue 15: 4, C.I. Pigment Blue 15: 6, C.I. Pigment Violet 23, C.I. Pigment Black 1, C.I. Pigment black 7 and the like. Examples of the inorganic pigments include titanium oxide, titanium black and carbon black. These pigments can be used 1 type or in mixture of 2 or more types in order to make color tone mix. The content of the pigment is preferably used in 10 to 60 parts by weight based on the total photosensitive resin composition.

In the photosensitive resin composition of the present invention, d) a photopolymerization initiator may be selected from one or more selected from the group consisting of triazine compounds, acetophenone compounds, xanthone compounds, benzoin compounds, and imidazole compounds. Specific examples of the photoinitiator include 2,4-bistrichloromethyl-6-p-methoxystyryl-s-triazine, 2-p-methoxystyryl-4,6-bistrichloromethyl-s- Triazine, 2,4-trichloromethyl-6-triazine, 2,4-trichloromethyl-4-methylnaphthyl-6-triazine, benzophenone, p- (diethylamino) benzophenone, 2, 2-dichloro-4-phenoxyacetophenone, 2,2-diethoxyacetophenone, 2,2-dibutoxyacetophenone, 2-hydroxy-2-methylproriophenone, pt-butyltrichloroacetophenone, 2 -Methyl thioxanthone, 2-isobutyl thioxanthone, 2-dodecyl thioxanthone, 2,4-dimethyl thioxanthone, 2,4-diethyl thioxanthone, 2,2-bis-2-chlorophenyl And -4,5,4,5-tetraphenyl-2 -1,2-biimidazole compounds.

The content of the photopolymerization initiator is preferably 0.5 to 5 parts by weight, more preferably 1 to 2 parts by weight based on the photosensitive resin composition. If the content of the photopolymerization initiator is less than 0.5 parts by weight, it is difficult to implement a normal pattern due to low sensitivity, and it is not good for the straightness of the pattern. If the content is more than 5 parts by weight, there may be a problem in storage stability. This can be severe and residues are likely to occur in portions other than the formed pattern.

In the photosensitive resin composition of the present invention, the e) solvent is selected by solubility, pigment dispersibility and coating property, and specifically, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, propylene Glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and the like are preferred. Or it can mix and use 2 or more types. The content of the solvent is preferably used in 20 to 80 parts by weight based on the total photosensitive resin composition.

In addition, the photosensitive resin composition of the present invention may further include a) a dispersant for improving dispersibility with the pigment or an additive for improving the coating property, for example, a polyester-based dispersant, a polyurethane-based dispersant or a silicone-based surfactant, Surfactants, such as a fluorine type, are mentioned and can be used in 0.01-1 weight part with respect to the photosensitive resin composition.

Hereinafter, the present invention will be described in detail based on the following examples, but the present invention is not limited to the following examples. In the following examples, unless stated otherwise, percentages and mixing ratios are by weight.

Example 1

A) Copolymer of benzyl methacrylate / methacrylic acid / hydroxyethyl cinnamic acrylate as a macropolymer dissolved in an aqueous alkali solution (copolymerization ratio is 60/20/20 under a solution of propylene glycol methyl ether acetate, and the content of solid content And 35 weight percent of a copolymer having a weight average molecular weight of 30,000) 15 parts by weight, b) 5 parts by weight of dipentaerythritol hexaacrylate as a crosslinkable monomer having at least two or more ethylenic double bonds, and c) as a pigment. Pigment Red 254 40 parts by weight, d) 1 part by weight of Irgacure369 (manufactured by Ciba Specialty Chemical) and 1 part by weight of 4,4'-bisdiethylaminobenzophenone as a photopolymerization initiator, e) 28 parts by weight of propylene glycol methyl ether acetate Part and 10 parts by weight of cyclohexanone were mixed to prepare a liquid photosensitive resin composition.

Example 2

A) Copolymer of styrene / methacrylic acid / hydroxybutyl cinnamic methacrylate as a macropolymer dissolved in an aqueous alkali solution (copolymerization ratio is 60/20/20 under a solution of propylene glycol methyl ether acetate, and the solid content is 35 Copolymer by weight% and weight average molecular weight of 30,000) 15 parts by weight, b) 5 parts by weight of dipentaerythritol hexaacrylate as a crosslinkable monomer having at least two or more ethylenic double bonds, and c) as a pigment. Pigment green 36 30 parts by weight and C.I. Pigment Yellow 138 20 parts by weight, d) 1 part by weight of Irgacure369 (manufactured by CIVA Specialty Chemical) and 1 part by weight of 4,4'-bisdiethylaminobenzophenone as a photopolymerization initiator, e) 18 parts by weight of propylene glycol methyl ether acetate Part and 10 parts by weight of cyclohexanone were mixed to prepare a liquid photosensitive resin composition.

Example 3

A) Copolymer of styrene / methacrylic acid / hydroxybutyl cinnamic methacrylate as a macropolymer dissolved in an aqueous alkali solution (copolymerization ratio is 50/25/25 under a solution of propylene glycol methyl ether acetate, and the solid content is 35 Copolymer by weight% and weight average molecular weight of 30,000) 15 parts by weight, b) 5 parts by weight of dipentaerythritol hexaacrylate as a crosslinkable monomer having at least two or more ethylenic double bonds, and c) as a pigment. Pigment Blue 15: 6 35 parts by weight and C.I. Pigment Violet 23 5 parts by weight, d) 1 part by weight of Irgacure369 (manufactured by CIVA Specialty Chemical) and 1 part by weight of 4,4'-bisdiethylaminobenzophenone as a photopolymerization initiator, e) 28 parts by weight of propylene glycol methyl ether acetate Part and 10 parts by weight of cyclohexanone were mixed to prepare a liquid photosensitive resin composition.

Example 4

A) A copolymer of benzyl methacrylate / methacrylic acid / hydroxyphenylchalconacrylate as a macropolymer dissolved in an aqueous alkali solution (copolymerization ratio is 50/25/25 under a solution of propylene glycol methyl ether acetate, and the content of solid content is 35 weight% of copolymer having a weight average molecular weight of 30,000) 15 parts by weight, b) 5 parts by weight of dipentaerythritol hexaacrylate as a crosslinkable monomer having at least two or more ethylenic double bonds, and c) carbon black as a pigment. (20% solution) 40 parts by weight, d) 2 parts by weight of Irgacure369 (manufactured by CIVA Specialty Chemical) and 1 part by weight of 4,4'-bisdiethylaminobenzophenone as a photopolymerization initiator, e) propylene glycol methyl ether acetate 28 Part by weight and 10 parts by weight of cyclohexanone were mixed to prepare a liquid photosensitive resin composition.

Comparative Example 1

Prepared in the same composition and content as in Example 2, but a) A copolymer of styrene / methacrylic acid (a copolymer ratio of 70/30 under a solution of propylene glycol methyl ether acetate and a solid content of 35% as a binder dissolved in an aqueous alkali solution) 15 parts by weight of a polymer having a weight average molecular weight of 30,000) to prepare a photosensitive resin composition.

Comparative Example 2

Prepared with the same composition and content as in Example 4, but a) a copolymer of t-butyl acrylate / methacrylic acid / 2-hydroxyethyl methacrylate as a binder dissolved in an aqueous alkali solution (of propylene glycol methyl ether acetate A photosensitive resin composition was prepared using 15 parts by weight of a polymer having a copolymerization ratio of 60/20/20, a solid content of 35%, and a weight average molecular weight of 30,000) under solution.

Property comparison

As in Examples 1 to 4, the development characteristics and the straightness of the pattern were evaluated for the composition containing the photosensitive photopolymer group and the compositions of Comparative Examples 1 to 2 containing no photopolymer group at all.

A) Evaluation of development characteristics

The photosensitive composition obtained through the above Examples and Comparative Examples was spin-coated to a thickness of 2 μm on a glass surface, and then dried on an 80 ° C. hot plate for 2 minutes to obtain a coating film.

After the photomask is placed on the obtained film, an ultra-high pressure mercury lamp having a wavelength of 200nm to 400nm is exposed for a predetermined time to be about 200mj / ㎠ based on 365nm, and a KOH developer (Dongjin Semichem, DCD-260CF) is used. The development was carried out through a spray nozzle for a certain time. The developability was evaluated through the degree of the developed fine pattern and the straightness of the end portion of the pattern, and the experimental results are shown in Table 1 below. In Table 1 below, ○ is excellent in the straightness of the end portion of the pattern, △ is poor in straightness, × indicates that the pattern was removed by the developer.

Example 1 Example 2 Example 3 Example 4 Comparative Example 1 Comparative Example 2 Pattern width (㎛) 100 ○ ○ ○ ○ △ △ 50 ○ ○ ○ ○ × × 20 ○ ○ ○ △ × ×

In the above Table 1, in Examples 1 to 4 of the present invention, an excellent phenomenon was shown with respect to a low exposure amount, whereas in Comparative Examples 1 to 3, developability was very poor.

B) storage stability evaluation

The photosensitive composition obtained through the above example was left in a closed oven at 40 ° C. and then taken out at intervals of 2 days for 10 days, and then coated and developed to evaluate the straightness of the 100 μm patterned pattern. Shown in In Table 2 below, when ○ is not changed from the initial state, △ is the thickness after coating is changed, but the straightness of the pattern after development is good, × indicates the case where the thickness after coating is changed and the straightness of the pattern is bad.

Example 1 Example 2 Example 3 Example 4 Pattern width 2 days ○ ○ ○ ○ 4 days ○ ○ ○ ○ 6 days ○ ○ ○ ○ 8th ○ ○ ○ ○ 10 days ○ △ ○ △

As shown in Table 2, Examples 1 to 4 showed excellent storage stability specifications.

As described above, the photosensitive resin composition according to the present invention uses a resin containing a photopolymer group capable of self-crosslinking by light to include a high concentration of pigment or a low exposure amount even when the developability is not good such as a black pigment. It can bring excellent developability and excellent storage stability can be usefully used in LCD manufacturing process including color filter.

Claims (8)

Macro polymer represented by the following general formula (1a) or (1b): [Formula 1a] [Formula 1b] Where Each R ₁ is independently hydrogen or an alkyl group having 1 to 2 carbon atoms; R ₂ is an alkyl group having 2 to 5 carbon atoms which is unsubstituted or substituted with a hydroxy group; a + b + c = 1 and 0.1 <a <0.4, 0 <b <0.5, 0.1 <c <0.5. The macropolymer of claim 1, wherein the macropolymer has a weight average molecular weight of 10,000 to 40,000. In the photosensitive resin composition for color filters, 1) 1 to 30 parts by weight of a macropolymer represented by Formula 1a or Formula 1b; B) 5 to 30 parts by weight of a crosslinkable monomer having at least two ethylenic double bonds; C) 10 to 60 parts by weight of pigment; D) 0.5 to 5 parts by weight of the photopolymerization initiator; And E) photosensitive resin composition for color filters comprising 20 to 80 parts by weight of a solvent: [Formula 1a] [Formula 1b] Where Each R ₁ is independently hydrogen or an alkyl group having 1 to 2 carbon atoms; R ₂ is an alkyl group having 2 to 5 carbon atoms which is unsubstituted or substituted with a hydroxy group; a + b + c = 1 and 0.1 <a <0.4, 0 <b <0.5, 0.1 <c <0.5. The photosensitive resin composition for color filters according to claim 3, wherein the macropolymer has a weight average molecular weight of 10,000 to 40,000. The crosslinkable monomer having at least two or more ethylenic double bonds is 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, ethylene glycol diacrylate, pentaerythritol tetra Acrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, dipentaerythritol diacrylate, sorbitol triacrylate, bisphenol A diacrylate derivative, trimethyl propane triacrylate, dipentaerythritol polyacrylate, and At least 1 type is selected from the group which consists of these methacrylates, The photosensitive resin composition for color filters characterized by the above-mentioned. The photosensitive composition for color filters according to claim 3, wherein the pigment is an organic pigment or an inorganic pigment. 4. The solvent according to claim 3, wherein the solvent is ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexa A photosensitive composition for color filters, characterized in that at least one member is selected from the group consisting of rice paddy, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, and ethyl 3-ethoxypropionate. According to claim 3, wherein the photosensitive resin composition is at least one selected from the group consisting of polyester-based dispersant, polyurethane-based dispersant, silicone-based surfactant and fluorine-based surfactant) dispersing agent or coating for improving the dispersibility with the pigment A photosensitive composition for color filters, further comprising 0.01 to 1 part by weight of an additive for improving the properties.