KR20040026155A - Fabrication of Patterned Media Using Ultra-Precision Injection Molding - Google Patents

Abstract

PURPOSE: A method for manufacturing a patterned media is provided to mass-produce the patterned media, which is a high-density information recording medium, by using an ultra-fine injection molding. CONSTITUTION: A master is made through the nano dot patterning using an electronic beam lithography or a holographic lithography(S10). After mounting a stamper on a mold, a polymer nano dot pattern is formed by using the ultra-fine die-casting(S12). A magnetic nano dot pattern is made through a post-process using the polymer or a glass dot pattern(S13). The information is stored by vertically/horizontally magnetizing each dot pattern(S14).

Description

Fabrication of Patterned Media Using Ultra-Precision Injection Molding}

The present invention relates to a method for producing a patterned media using ultra-fine injection molding.

Current magnetic information storage media consists of a magnetic layer having a continuous grain structure on a substrate, and magnetizes each crystal to have a certain direction of magnetism to store information by giving bit signals of 0 and 1. The information storage medium of this type uses a method of reducing the crystal size in order to store a large amount of data in a limited space. However, if the crystal size is reduced above a certain limit, instability due to the superparamagnetic limit does not guarantee stability as an information storage medium, and reduces the signal-to-noise ratio (SNR), thereby sensing the desired data. Can not.

The patterned media is an information storage medium that has a bit signal of 0 and 1 by producing a nano-size magnetic dot and then magnetizing it in a predetermined direction, deviating from the conventional method using a continuous magnetic layer. The advantages of the storage medium of the method are overcoming the problems of existing superparamagnetic limits and low signal-to-noise ratios and increased storage capacity.

Existing processes for producing patterned media include a method of producing by patterning using ion beams; A method of patterning the resist using electron beam or holographic lithography followed by subsequent processing (FIGS. 1A and 1B); There is a method of fabricating using nanoimprint lithography technology (FIG. 2).

Patterned media manufacturing using an ion beam is a method of manufacturing a magnetic dot pattern through ion beam irradiation after laminating a magnetic material on a silicon substrate. Since this method requires irradiation of ion beams every time an individual patterned media is produced, it is not only costly but also time consuming to produce, which is not suitable for mass production.

As shown in FIG. 1A, patterned media fabrication using dry etching after nano dot patterning using electron beam or holographic lithography is performed by sequentially stacking a magnetic material 2a and a resist 3a on a silicon substrate 1. Nanoscale dots 3b are patterned in the resist using electron beam or holographic lithography. Using the resist dot pattern as a mask, a dot pattern 2b is formed on the magnetic layer through dry etching or ion beam milling, and then the resist is removed to form a patterned media.

As shown in FIG. 1B, patterned media fabrication using lift-off after nano dot patterning using electron beam or holographic lithography is performed by directly depositing a resist 4a on a silicon substrate 1 followed by electron beam or holographic lithography. Patterning (4b) through. After laminating the magnetic material 5a, a magnetic dot pattern 5b is manufactured by using a lift-off method to produce a patterned media. This method also has the disadvantage of being time-consuming and expensive since electron beam or holographic lithography techniques must be used every time individual patterned media is manufactured.

As shown in FIG. 2, patterned media fabrication using nanoimprint lithography techniques first fabricates a silicon mold 6 using electron beam lithography, lift-off, and dry etching. After applying the polymer (8a) on the substrate (7), pressurized by pressing with a mold, and then cured by applying heat or light, and then remove the remaining polymer of the imprint portion through dry etching to remove the polymer nano dot pattern (8b) ). The magnetic dot pattern is manufactured by stacking the magnetic material 9a on the polymer pattern and using a lift-off method 9b. This method reduces the production cost and production time to some extent by using a mold, but has a disadvantage in that the mold breakage and manufacturing time is longer than that of injection molding.

Therefore, in the series of process methods proposed by the present invention, the non-alloy and alloy-based electroplating technology is introduced into the electron beam and holographic lithography technology, thereby lowering the production cost by manufacturing a semi permanent stamper and mold using a single pattern process. . In addition, ultra-fine injection molding system is introduced to increase productivity by performing polymer nano pattern molding in a few seconds. In addition, nano-patterns can be formed by compression molding using thermoplastic or thermosetting polymers and photocurable polymers instead of ultra-fine injection molding. In addition, in the forming step, using a glass material instead of a polymer material to produce a pattern excellent in the strength and deformation of the molded article. In addition, various types of patterned media can be produced through dry etching, lamination, and lift-off of magnetic materials.

SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a patterned media that enables mass production of patterned media, which is a high density magnetic information storage medium, using an ultra-fine injection molding process.

The technical problem required to achieve the above object is the mass production of patterned media through a series of process steps of the present invention, including ultra-fine injection molding. The process of the present invention comprises the following steps: (1) fabrication of a master with nanoscale dot pattern using electron beam lithography or holographic lithography; (2) fabrication of metal stamper with nano size dot pattern using electroplating technology; (3) nano-size polymer dot pattern molding through mold making and ultra-fine injection molding technology; (4) fabrication of nano size magnetic dot patterns using etching and lamination techniques; (5) It refers to the horizontal and vertical magnetization in the media dot pattern.

In addition, in the injection molding step, a technique of molding a polymer dot pattern through compression molding using a metal stamper made of a thermoplastic or thermosetting polymer or a photocurable polymer instead of injection molding is required.

Pattern molding technology using glass is also required instead of the polymer material used in the pattern molding step of the present invention.

Electron beam lithography according to the present invention is a technique for manufacturing a master, and after applying a resist for electron beams on a substrate to produce a nano-sized dot pattern through the process control such as the exposure amount and exposure time of the electron beam. After the electron beam is irradiated to the resist, nano-sized dots are produced through the development process. The dot pattern includes not only an embossed shape having protruding shapes, but also an engraved shape having a shape. If necessary, the desired master is manufactured through various post-treatment operations such as dry etching, lamination, and lift-off processes.

Holographic lithography of the present invention is a technique for fabricating a master, and fabricates nano-sized dots on a substrate using the interference effect of a laser. The laser irradiation is performed twice in order to produce a dot shape. The first irradiation produces a line pattern, and the second irradiation rotates the substrate by 90 ° to produce a dot pattern. After the pattern is fabricated, a desired master is produced through various post-treatment operations such as dry etching, lamination, and lift-off processes as necessary.

Electroplating of the present invention is a technique for manufacturing a stamper for ultra-fine injection molding, using a nickel and various alloy materials to produce a semi-permanent metal stamper excellent in wear resistance and transferability. In order to control the hydrophilicity, hydrophobicity, fluidity, and releasability of the polymer during ultra-fine injection molding, a seed-layer of alloy material is laminated before pre-plating, and a self-assembled layer (SAM) after pre-plating. Monolayer)) layered.

Ultra-fine injection molding of the present invention is a technology for forming a nano-sized polymer dot pattern through the ultra-fine injection molding after manufacturing a mold for ultra-fine injection molding equipped with a metal stamper made of electroplating. Nano-dot pattern can be mass produced through ultra-fine injection molding technology of optimization process considering temperature and pressure, pattern molding material, and processing time. The polymer pattern is produced in various ways in embossed or engraved form according to the subsequent process.

Instead of injection molding, the molding method of the present invention may be a compression molding method in which a thermoplastic and thermosetting polymer or a photocurable polymer is pressed by pressing with a metal stamper, and then the heat or light of the polymer is applied to form a pattern.

Regarding the material used in the molding step of the present invention, by using a glass material instead of a polymer material, it is possible to produce a glass dot pattern having a different characteristic from that of the polymer dot pattern.

Magnetic dot pattern fabrication using the engraved polymer or glass dot pattern is a method of laminating a magnetic material on a polymer or glass pattern and then removing the entire polymer, and polishing the laminated magnetic material and using the polymer or glass pattern together. There is this.

Magnetic dot pattern fabrication using an embossed polymer or glass dot pattern includes a method of directly stacking a magnetic material according to a polymer or glass dot pattern shape, and a method of etching a magnetic material using a polymer or glass dot pattern as a mask.

Each of the magnetic nano dot patterns is horizontally and vertically magnetized in a predetermined direction to give a bit signal of 0 and 1, thereby producing a patterned media which is a high density data storage medium.

Figure 1a is a conventional method for producing a patterned media using etching after dot patterning using electron beam or holographic lithography

Figure 1b is a conventional method for producing a patterned media using a lift-off after dot patterning using electron beam or holographic lithography

Figure 2 is a conventional method for producing a patterned media using nano imprint lithography

Figure 3 is a flow chart of the patterned media manufacturing process using the ultra-fine injection molding technology

4A is a method for nanosized dot patterning for masters using electron beam or holographic lithography

4b is a post-processing method of the patterned master

5 is a stamper manufacturing method using electroplating

6 is a method of manufacturing a nano dot pattern of a polymer or a glass material using a stamper manufacturing a mold and ultra-fine injection molding

7 is a method of manufacturing a nano dot pattern using compression molding of a thermoplastic or thermosetting polymer, a photocurable polymer, or glass.

8A illustrates a method of manufacturing a magnetic dot pattern using a polymer or glass pattern molded into an intaglio dot pattern

Figure 8b is a magnetic dot pattern manufacturing method using a polymer or glass pattern molded into an embossed dot pattern

* Description of the symbols for the main parts of the drawings *

1: substrate for patterned media

2a: magnetic layer laminated on the substrate 2b: magnetic dot pattern

3a: Resist laminated on substrate 3b: Dot patterned resist

4a: Resist Laminated on Substrate 4b: Dot Patterned Resist

5a: magnetic layer laminated on resist

5b: magnetic dot pattern

6: mold for imprint 7: substrate for patterned media

8a: polymer coated on substrate

8b: Polymer dot pattern produced by etching after imprint

9a: magnetic layer laminated on polymer

9b: magnetic dot pattern

10: substrate for master

11a: Resist for electron beam or holographic lithography stacked on a substrate

11b dot patterned resist

12a: electron beam irradiation 12b: holographic laser irradiation

13: etched master substrate

14a: master pattern layer deposited on resist

14b: master dot pattern

15a: Pattern layer for mask laminated on resist

15b: dot pattern for mask

16: master dot pattern 17: Seed-layer

18: metal stamper

19: Self-Assembled Monolayer (SAM)

20: mold for ultra-fine injection molding 21: injection of molten polymer or glass material

22: Ultra-fine injection molded polymer or glass dot pattern

23: substrate for compression molding

24a: Polymer or glass molding material applied onto the substrate

24b: molded polymer or glass dot pattern

25a: Engraved polymer or glass dot pattern

25b: embossed polymer or glass dot pattern

26: magnetic dot pattern 27: patterned media substrate

28: polished magnetic dot pattern 29: laminated magnetic dot pattern

30a: Magnetic layer attached under molded polymer or glass pattern

30b: magnetic dot pattern

31: etched polymer or glass pattern

Hereinafter, a method of manufacturing a patterned media of the present invention will be described with reference to the drawings.

3 is a process flow diagram of manufacturing a patterned media by introducing an ultra-fine injection molding process. First, a master is fabricated through nano dot patterning using electron beam lithography or holographic lithography (S10). Metal stamper is manufactured by using electroplating (S11). After mounting the manufactured stamper in the mold, the polymer nano dot pattern is molded by using ultra-fine injection molding (S12). Instead of injection molding, compression molding of thermoplastic and thermosetting or photocurable polymers may be used to form polymer nano dot patterns. As for the pattern forming material, a glass material may be used instead of the polymer material. A magnetic nano dot pattern is manufactured through a subsequent process using a polymer or glass dot pattern (S13). Information is stored by horizontally and vertically magnetizing each of the manufactured dot patterns (S14).

4A is a method of fabricating a master with nano dot patterns using electron beam lithography and holographic lithography. After laminating the resist 11a reacting to the electron beam or the holographic laser on the substrate 10, irradiating the electron beam 12a or the holographic laser 12b using the interference effect and then developing the nano dot pattern 11b. To produce. In FIG. 3A, the fabrication of the intaglio pattern containing the shape using a positive resist is illustrated. However, the intaglio pattern may be fabricated using different resists or the intaglio pattern as well as the intaglio pattern using the negative resist. .

4B is a post-treatment method of a patterned master by lithography technique, wherein the patterned master may be used without post-treatment, but may be variously manufactured as necessary. Manufacturing a master by etching the substrate by dry etching using the patterned resist 11b as a mask; Laminating a suitable master dot pattern material 14a and then producing a master dot 14b using a lift-off method; After stacking the material 15a to be used as a mask, only the mask 15b is left by lift-off, and then the substrate is used as the master 16 by dry etching. Figure 4b shows a representative embodiment, many other applications are possible.

5 is a method of manufacturing a metal stamper using electroplating. First, the base layer 17 considering the conductivity and releasability is laminated using physical lamination such as sputtering and evaporation. The base layer is composed of a non-alloyed or alloy-based material in consideration of hydrophilicity and hydrophobic properties and surface energy. The non-alloy or alloy metal stamper 18 is fabricated using electroplating and then separated from the master. The stamper also increases the release property during the ultra-fine injection molding using the self-assembled monolayer 19.

6 is a method of molding a polymer nano dot pattern by ultra-fine injection molding. The metal stamper 18 made of electroplating is mounted on the ultra-thin injection molding mold 20, the molten polymer is injected 21 to form a dot pattern, and the polymer pattern 22 is separated from the mold to form a polymer. Complete the pattern. Precise process control of temperature and pressure is required in order to transfer nano size dot patterns excellently. Embossing and engraving of the polymer pattern is determined by the following magnetic dot fabrication process.

7 is a method of forming a nano dot pattern by compression molding instead of ultra-fine injection molding. The polymer nano dot pattern 24b is formed by applying thermoplastic or thermosetting or photocurable polymer 24a on the substrate 23 and applying heat or light to which the polymer reacts while pressing by pressing with a metal stamper 18. Separate from stamper and substrate.

Ultrafine injection molding or pattern molding through thermal and light compression molding may use a polymer material, but it is possible to change its properties using a glass material.

8A illustrates a method of fabricating a magnetic dot pattern using an intaglio-type polymer or glass pattern 25a. After the pattern is formed using a material that is easy to remove, the magnetic material 26 is laminated on the substrate using sputtering or evaporation. The magnetic dot pattern is manufactured by removing the polymer pattern after attaching the substrate 27. Alternatively, the magnetic dot pattern 28 is manufactured by polishing the laminated magnetic material 26. It can be used as a patterned media as it is, but it can be used as a patterned media by attaching a desired substrate separately here.

8B illustrates a method of manufacturing a magnetic dot pattern using an embossed polymer pattern substrate 25b. By forming a magnetic dot pattern 29 by stacking a magnetic material using a sputter or an evaporation on the molded embossed pattern, a patterned media using the magnetic dot pattern as a polymer is produced. Alternatively, after the magnetic material is laminated 3a under the polymer pattern substrate, the polymer layer 31 and the magnetic layer 30b are sequentially etched by dry etching or ion beam milling. Likewise, the manufactured products can also be used by attaching a separate substrate to the bottom.

The nano-size dot pattern of the patterned media produced by the above method is magnetized horizontally or vertically in a predetermined direction to store bit signals of 0 and 1, thereby completing the patterned media which is a high density magnetic information storage medium.

According to the present invention as described above, it is possible to achieve a mass production system by reducing the production cost and production time in the production of patterned media, which is a high density magnetic information storage medium. By creating a semi-permanent metal stamper without having to go through the electron beam and holographic lithography process every time in one media, the cost of implementing nano dot pattern can be greatly reduced, and the existing process takes minimum moisture in one process. Productivity can be increased by breaking away from the process and producing polymer patterns continuously in seconds through ultra-fine injection molding processes. In addition, instead of injection molding, patterns may be formed through various processes as necessary through compression molding using thermoplastic and thermosetting polymers or photocurable polymers. In addition to the polymer-based material, the material used for the pattern molding may be manufactured using a glass-based material. Accordingly, a pattern having desired physical properties may be produced.

Claims (11)

In the method of manufacturing a patterned media Fabricating a master with nanoscale dot pattern using electron beam lithography and holographic lithography techniques; Manufacturing a metal stamper through electroplating using a master obtained from the process; Mounting a stamper obtained from the process to a mold and fabricating a polymer dot pattern using ultra-fine injection molding; Fabricating a magnetic dot pattern using the polymer dot pattern obtained from the process; And horizontally and vertically magnetizing the magnetic dot pattern obtained from the process. The method of claim 1, A method of manufacturing a patterned media, comprising combining an electron beam lithography technique, a dry etching technique, a lamination technique, and a lift-off technique in an electron beam lithography process step according to an injection molding patterned media master manufacturing process. The method of claim 1, A method of manufacturing a patterned media, comprising holographic lithography, dry etching, lamination, and lift-off techniques in a holographic lithography process step of a patterned media master manufacturing process for injection molding. The method of claim 1, A method of manufacturing a patterned media, characterized by using a pre-plating technique applied with a non-alloy-based and alloy-based matrix and self-assembled monolayer technology in the metal stamper manufacturing step according to the injection molding patterned media stamper manufacturing process. The method of claim 1, Method of producing a patterned media, characterized in that the dot pattern is formed by using the ultra-fine injection molding in the ultra-fine injection molding process step according to the polymer dot pattern manufacturing process. The method of claim 5, A method of manufacturing a patterned media, characterized in that the dot pattern is formed by compression molding using a thermoplastic and thermosetting polymer or a photocurable polymer in place of the ultra-fine injection molding in the ultra-fine injection molding process step according to the polymer dot pattern manufacturing process. The method of claim 1, A method of manufacturing a patterned media, comprising manufacturing a magnetic dot pattern by removing a polymer pattern after laminating a magnetic material on an ultrafine injection molded intaglio polymer pattern in a magnetic dot pattern processing step. The method of claim 1, A method of manufacturing a patterned media, comprising manufacturing a magnetic dot pattern by laminating a magnetic material on an ultra-fine injection molded intaglio polymer pattern in a magnetic dot pattern processing step and then polishing an extra magnetic layer. The method of claim 1, A method of manufacturing a patterned media, comprising producing a magnetic dot pattern by laminating a magnetic material in a dot pattern shape on an ultra-fine injection molded embossed polymer pattern in a magnetic dot pattern processing step. The method of claim 1, Magnetic dot pattern is produced by attaching a magnetic material under the ultra fine injection-embossed polymer pattern in the magnetic dot pattern process step, and etching the polymer pattern and the magnetic layer using dry etching and ion beam, and removing the remaining polymer. Patterned media manufacturing method. The method according to claim 5 or 6, A method of producing a patterned media, characterized in that a dot pattern is formed by using a glass material instead of a polymer material for a material in a molding process in an ultra-fine injection molding or compression molding process.