KR20030088644A - Reflection-penetration type liquid crystal display device and method for fabricating thereof - Google Patents

Abstract

PURPOSE: A transflective liquid crystal display and a method for manufacturing the same are provided to realize high brightness display despite a wider range of a viewing angle. CONSTITUTION: A second transparent substrate(310) is opposite to a first transparent substrate(210) and embosses protrusions for improving a viewing angle. A light reflective and transmissive element(340) transmitting a first light proceeding toward the first substrate from the second transparent substrate, and reflecting a second light proceeding toward the second substrate from the first transparent substrate. A color filter(350) is formed on a part of the light reflective and transmissive element at a certain thickness to realize high brightness display and wanted colors. A second electrode(360) is formed on a front surface of the second transparent substrate.

Description

Reflective-transmissive liquid crystal display and its manufacturing method {REFLECTION-PENETRATION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THEREOF}

The present invention relates to a reflection-transmissive liquid crystal display device and a manufacturing method thereof, and more particularly, to an advanced reflection-transmission liquid crystal display device and a method for manufacturing the same, which maximize the color reproduction characteristics of a display image and enable high brightness display. will be.

In general, a display device is a device that can be recognized by a user by displaying information processed in the information processing device in an electrical form by text, picture or video.

Liquid crystal display device (LCD) is a kind of such display device to control the liquid crystal (LC) to perform the display. In this case, since the thickness of the liquid crystal can sufficiently perform its function with only a few μm, the volume and weight of the liquid crystal are much higher than those of other display devices, for example, a CRT display device having the same screen size. Has a small advantage.

On the other hand, light plays an important role in displaying information from the liquid crystal display together with the liquid crystal. This is because the liquid crystal does not emit light by itself and is a light receiving element that only adjusts light transmittance.

In this case, the reflective liquid crystal display device, which is a type of liquid crystal display device that displays information using liquid crystal, performs display by light obtained by external light, for example, sunlight, indoor lighting, or the like. Therefore, the reflective liquid crystal display device does not need a light generating structure necessary for generating light by itself. Accordingly, the reflective liquid crystal display device has a simple structure and has an advantage of realizing a display with very low power consumption.

In addition, a transmissive liquid crystal display device, which is another type of liquid crystal display device for displaying information using liquid crystal, performs display with light obtained by consuming self-charged electric energy. Accordingly, the transmissive liquid crystal display device has an advantage of displaying information anywhere regardless of the surrounding environment.

In addition, the reflection-transmissive liquid crystal display device, which is another type of liquid crystal display device for displaying information using liquid crystal, performs display with light obtained by consuming self-charged electric energy according to an external display environment, or The display is performed using light. Such a reflection-transmissive liquid crystal display device has both the advantages of a transmissive liquid crystal display device that can be displayed anywhere regardless of the external environment and a reflection type liquid crystal display device having low power consumption.

1 is a cross-sectional view showing the internal structure of a liquid crystal display panel which is a part of a conventional reflection-transmissive liquid crystal display device.

Referring to FIG. 1, a conventional reflection-transmissive liquid crystal display device 100 is generally shown as a color filter substrate 110, a liquid crystal 120, and a TFT substrate 130.

The TFT substrate 130 is composed of a transparent substrate 131, a thin film transistor 132, an organic insulating film 133, a transparent electrode 134, a reflective electrode 135, and an alignment film 136. Unexplained reference numeral 136a is an alignment groove.

More specifically, the thin film transistor 132 is arranged in a matrix form on the transparent substrate 131. The thin film transistor 132 serves to output an externally applied data signal by a timing signal. The organic insulating layer 133 is thinly formed over the entire surface of the transparent substrate 131 so as to cover the thin film transistor 132. As shown in FIG. 1, a contact hole 133b is formed on the top surface of the organic insulating layer 133 to expose the embossed concave-convex 133a and the output terminal of the thin film transistor 132.

On the other hand, the transparent electrode 134 is formed on the entire upper surface of the organic insulating film 133 on which the embossed convex-concave 133a is formed to have a predetermined thickness, and the indium tin oxide thin film is formed on each thin film transistor 132. It is patterned and formed so as to be connected to the output terminal one by one.

In addition, the reflective electrode 135 is formed on the upper surface of the transparent electrode 134. At this time, the opening window 135a is formed in a portion of the reflective electrode 135 so that a portion of the transparent electrode 134 that is hidden under the reflective electrode 135 is exposed.

The alignment layer 136 illustrated in FIG. 1 is formed flat over the entire surface of the transparent substrate 131 to cover the reflective electrode 135, and rubbing is performed on the upper surface of the alignment layer 136 through a rubbing roller to form an alignment groove ( 136a) is formed.

Reference numeral 110 denotes a color filter substrate which is a part of the conventional reflection-transmissive liquid crystal display device 100. The color filter substrate 110 is composed of a transparent substrate 111, a black matrix 112, a color filter 113, a common electrode 114, and an alignment layer 115.

In this case, the black matrix 112 formed on the transparent substrate 111 has a lattice shape and is formed to face the insulating space 135c formed between the reflective electrodes 135 of the TFT substrate 130 described above.

On the other hand, the color filter 113 is formed in a matrix form on the transparent substrate 111 as shown in FIG. 1 corresponding to each reflective electrode 135. The color filter 113 is a red color filter for filtering light to generate a monochromatic light having a red wavelength, a green color filter for filtering light to generate a monochromatic light having a green wavelength, and filtering light to generate a monochromatic light having a blue wavelength. It consists of a blue color filter.

The common electrode 114 is formed over the entire surface of the transparent substrate 111 to cover the top surface of the color filter 113.

The alignment layer 115 is formed on the upper surface of the transparent substrate 111 to cover the common electrode 114, and the alignment groove 115a is formed on the upper surface of the alignment layer 115 by a rubbing roller.

The color filter substrate 110 and the TFT substrate 130 having such a configuration are stacked on each other and combined. At this time, the combination of the color filter substrate 110 and the TFT substrate 130 is performed by a sealant (not shown) after the spacer (not shown) is scattered to form a cell gap.

Meanwhile, the liquid crystal 120 is injected into a space formed between the color filter substrate 110 and the TFT substrate 130 assembled as shown in FIG. 1.

The conventional reflection-transmissive liquid crystal display device 100 having such a configuration lacks the amount of light and consumes self-charged energy toward the color filter substrate 110 from the rear surface of the TFT substrate 130 when the display is performed in the transmissive mode. II direction light is emitted from a lamp (not shown).

At this time, the light having the II direction is incident on the user's eye 140 via the opening window 135a-the liquid crystal 120-the color filter 113-the transparent substrate 111 as shown in FIG. On the other hand, when the display proceeds in the reflective mode due to the abundance of light, the lamp (not shown) is turned off and has an I direction toward the glass substrate 111-the color filter 113-the liquid crystal 120-the reflective electrode 135. Accept the light At this time, the external light reflected by the reflective electrode 135 is incident on the user's eye 140 via the liquid crystal 120-the color filter 113-the transparent substrate 111.

However, such a conventional reflection-transmissive liquid crystal display device has a problem in that it is difficult to realize a high quality display due to a decrease in luminance which determines the quality of the display.

The cause of this problem is that all the light passing through the transmission region or the reflection region must pass through the color filter 113, and a large portion of the amount of light is lost in the process of passing through the color filter 113.

In particular, the light I incident to the reflective region passes through the color filter 113 by the length of A, passes through the color filter 113 by the length of B, after being reflected by the reflective electrode 135. On the other hand, the light (II) incident to the transmissive region passes through the color filter 113 by C length and then enters the user's eye 140.

Therefore, the luminance of the image displayed in the reflection area is different from the luminance of the image displayed in the transmission area, and color characteristics are generated differently.

In addition to the above problems, the conventional reflection-transmissive liquid crystal display device 100 has various thin film layers formed under the organic insulating film 133 when the embossing unevenness 133a is formed on the organic insulating film 133 formed on the TFT substrate 130. As a result, poor formation of the embossed irregularities 133a occurs frequently. The defect of the embossed convex and convex 133a is also related to the contact hole 133b, and the formation of the embossed concave and convex 133a is frequently generated around the contact hole 133b.

As described above, when the formation of the embossed irregularities 133a formed in the organic insulating layer 133 is poor due to various factors, the luminance uniformity is greatly deteriorated, so that display characteristics and viewing angle characteristics are greatly degraded.

Accordingly, the present invention has been made in view of such a conventional problem, and a first object of the present invention is to overcome a poor viewing angle caused by a poor formation of embossed irregularities and to reduce display characteristics caused by inherent characteristics in the reflective and transmissive regions. It is an object of the present invention to provide a reflection-transmissive liquid crystal display device which prevents a decrease in luminance.

In addition, a second object of the present invention is a reflection-transmissive liquid crystal display device which overcomes the viewing angle defect caused by the poor formation of the embossed irregularities and prevents the display characteristic degradation and the luminance decrease caused by the unique characteristics in the reflection region and the transmission region. To provide a method for producing.

1 is a cross-sectional view of a conventional reflection-transmissive liquid crystal display device.

FIG. 2 is a conceptual diagram illustrating an entire reflection-transmissive liquid crystal display device according to an exemplary embodiment of the present invention.

3 is a cross-sectional view of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

4 is a plan view of a TFT substrate of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

FIG. 5 is a conceptual diagram illustrating a power supply device and a first electrode formed in FIG. 4.

6 is a cross-sectional view taken along the line A-A of FIG.

7 is a cross-sectional view taken along line B-B in FIG. 4.

8 is an enlarged view of A of FIG. 3.

9 is a plan view of a color filter substrate of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

10 is a cross-sectional view taken along the line A-A of FIG.

11A is a graph showing the luminance in the light reflecting thin film.

11B is a graph showing the luminance in the color filter.

FIG. 11C is a graph illustrating luminance felt by an actual user according to FIGS. 11A and 11B.

12A to 12I are process diagrams illustrating a process of manufacturing a TFT substrate of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

13A to 13J are process diagrams illustrating a process of manufacturing a color filter substrate of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

The reflection-transmissive liquid crystal display device for realizing the first object of the present invention comprises a first transparent substrate, a first electrode arranged in a matrix form on the first transparent substrate, and supplying power to each first electrode. A first transparent substrate facing the first substrate including the power supply means, the second transparent substrate on which the viewing angle enhancement means is formed, and the first light from the second transparent substrate to the first transparent substrate; The second light from the second transparent substrate toward the second transparent substrate is a light reflection / transmission means for reflecting in the first light direction, a color filter having a constant thickness on a part of the light reflection / transmission means, And a liquid crystal injected between the second substrate including the formed second electrode and the first substrate and the second substrate.

In addition, a method of manufacturing a reflection-transmissive liquid crystal display device for implementing the second object of the present invention is to form a power supply for supplying power to the first transparent substrate in a small area unit and a transparent first connected to the power supply device. Forming an electrode to form a first substrate, in which the first light is transmitted to the first transparent substrate in the first region of the second transparent substrate on which the viewing angle enhancement means is formed, and the first transparent in the second region surrounding the first region. Forming a light reflection / transmission means for reflecting the second light from the substrate toward the second transparent substrate in the first light direction, forming a color filter having a constant thickness in the first region of the light reflection / transmission means, and forming a color filter. Forming a second substrate by forming a second electrode on the front surface of the second transparent substrate; bonding the first substrate and the second substrate; and bonding the bonded first substrate and the second substrate. In a step of injecting liquid crystal.

Hereinafter, a reflection-transmissive liquid crystal display device and a method of manufacturing the same according to an embodiment of the present invention will be described with reference to the accompanying drawings.

First, a reflection-transmissive liquid crystal display device according to an embodiment of the present invention will be described with reference to the accompanying drawings.

Referring to FIG. 3, the liquid crystal display panel 700, which is a part of the reflective-transmissive liquid crystal display device 800 according to an exemplary embodiment of the present invention, is again a first substrate 200, a second substrate 300, and a liquid crystal. It consists of 400.

As shown in FIG. 3 or FIG. 4, the first substrate 200 is composed of the first transparent substrate 210, the power supply device 220, the organic insulating layer 230, and the first electrode 240. In this case, reference numeral 280 denotes an alignment layer, and 285 denotes an alignment groove.

In this case, as the first transparent substrate 210, a glass substrate having excellent light transmittance may be used. The power supply device 220 formed on the first transparent substrate 210 may further include the thin film transistors 221, 222, 223, 224; 226 and signal lines arranged in a matrix form as shown in FIG. 5. It consists of 229.

In this case, referring to FIG. 5, each thin film transistor 226 is composed of a gate electrode 221, a channel layer 222, a source electrode 223, and a drain electrode 224.

In detail, as illustrated in FIG. 6, the gate electrode 221 has a first area on an upper surface of the first transparent substrate 210 and has a first light reflectance and a first metal 221a and a first metal ( It has a multilayer structure of the second metal 221b having a second light reflectance higher than 221a.

In an embodiment, the first metal 221a is a chromium oxide film (CrO ₂ film), and the second metal 221b is a chromium thin film (Cr film). The reason why the gate electrode 221 is formed in the multilayered manner is to minimize the reflection of light from the outside toward the first metal 221a of the gate electrode 221 from the first metal 221a to be incident back into the user's eyes. To do this.

On the other hand, the second metal 221b of the gate electrode 221 having such a configuration is electrically connected to the gate line 228 illustrated in FIG. 4 or 7 which is one of the signal lines 229. At this time, in one embodiment, the gate line 228 is formed by patterning a thin film made of a transparent conductive material. In this case, the transparent conductive material is made of indium tin oxide or indium zinc oxide.

Meanwhile, as shown in FIG. 6, the channel layer 222 is formed to overlap the top surface of the gate electrode 221 through the insulating film 221c. In this case, the area of the channel layer 222 has a second area smaller than the first area of the gate electrode 221.

The reason why the area of the channel layer 222 is smaller than the area of the gate electrode 221 is because when the material constituting the channel layer 222 is exposed to light, current flows to cause malfunction of the power supply device. to be. At this time, the channel layer 222 may have an amorphous silicon thin film or an amorphous silicon thin film on the n ⁺ ion doped n ⁺ amorphous silicon thin film made of amorphous silicon material may be used.

Meanwhile, as illustrated in FIG. 5 or 6, the conductive source electrode 223 and the drain electrode 224 are formed on the upper surface of the channel layer 222 so as not to be shorted again. In this case, the data line 227, which is one of the signal lines 229, is connected to the source electrode 223. The data line 227 may be used by patterning a transparent thin film made of the same material as the source electrode 223 or made of an ITO material or an IZO material.

Meanwhile, as illustrated in FIG. 6 or 7, the flat and transparent organic insulating layer 230 is formed on the upper surface of the power supply 220 having such a configuration. A contact hole 235 is formed in the organic insulating layer 230 to expose the drain electrode 224 of the thin film transistor 226.

The first electrode 240 is formed in the drain electrode 224 of the thin film transistor 226 through the contact hole 235. The first electrode 240 is used by patterning a thin film made of a transparent and conductive ITO or IZO material.

Meanwhile, as shown in FIG. 3, the second substrate 300, which is one of the other components of the reflective-transmissive liquid crystal display panel 700 according to the exemplary embodiment of the present invention, is again a second transparent substrate 310, The light reflection / transmitting member 340, the color filter 350, and the second electrode 360 are formed.

In this case, as shown in FIG. 8, an embossing protrusion 315 for viewing angle improvement is formed on the second transparent substrate 310. The viewing angle enhancement embossing protrusion 315 may be formed together when the second transparent substrate 310 is manufactured.

On the other hand, the embossing projection 315 for viewing angle improvement may be formed through a precise exposure process and a developing process on the photosensitive organic insulating film in a state where the photosensitive organic insulating film is formed on the second transparent substrate 310.

In the present invention, as shown in FIG. 3 or FIG. 8, the embossed projection 315 for improving the viewing angle is directly processed on the second transparent substrate 310 as one embodiment.

Meanwhile, the light reflection / transmission member 340 is formed to cover the viewing angle enhancement embossing protrusion 315 formed on the second transparent substrate 310. Accordingly, the light reflection / transmission member 340 also has irregularities in the shape of the embossing projection 315 for viewing angle enhancement.

In this case, the light reflecting / transmitting member 340 is composed of two multilayer films in one embodiment. At this time, the light reflecting / transmitting member 340 composed of the multilayer film has a light reflecting / transmitting thin film 320 capable of both reflecting and transmitting light as shown in FIG. 8 and a light reflecting thin film 330 capable of reflecting only light. It consists of.

Specifically, the light reflection / transmission thin film 320 forms an aluminum alloy with pure aluminum or aluminum in one embodiment on the upper surface of the embossing projection 315 for improving the viewing angle of the second transparent substrate 310. It may be used.

At this time, the material alloyed with aluminum is Nd, Si, Cu, Zn, Ti, V, Co, Ni, Sn, Ag, Pd, Mo, Zr, Hs, Ta, W, Au and the like. In this case, the thickness of the light reflection / transmission thin film 320 is preferably such that the light reflectance is 30% to 50% of the total amount of light and the transmittance is sufficient to satisfy the conditions of 50% to 90%.

In a preferred embodiment of the present invention, the aluminum-neodymium alloy (Al-Nd) is formed by depositing a thickness of 20 kPa to 800 kPa. In this state in which the light reflection / transmission thin film 320 is formed, the light reflection thin film 330 is formed on the upper surface of the light reflection / transmission thin film 320 again.

At this time, the light reflecting thin film 330 is a thin film made of silver (Ag) or a silver alloy having a thickness of about 5000Å in one embodiment. In this case, the light reflection thin film 330 is formed thinner than the light reflection / transmission thin film 320.

In this case, a portion of the light reflection thin film 330 among the light reflection thin film 330 and the light reflection / transmission thin film 320 is formed with an opening window 335 as shown in FIG. 9 or 10. As a result, a part of the light reflection / transmission thin film 320 is exposed to the outside through the opening window 335 formed in the light reflection thin film 330. In this case, when the area of the opening window 335 is maximized, the ratio of the light generated by consuming electric energy to be blocked by the light reflection thin film 330 may be minimized. In other words, the utilization efficiency of the light generated by the lamp (not shown) can be maximized.

When the "outer region" shown in FIG. 10 is brighter than the "inner region" based on the light reflecting / transmitting member 340 having the structure as described above, the first light 391 supplied from the outer region is a light reflecting thin film ( 330 is of course reached to the exposed portion of the light reflecting / transmitting member 320.

That is, when the outer region is brighter than the inner region, the first light 391 reflects the light in the exposed portion of the light reflecting thin film 330 and the light reflecting thin film 330 without being covered by the light reflecting thin film 330. Causes Such a configuration enables to reflect external light not only in the light reflecting thin film 330 but also in a part of the light reflecting / transmitting member 320, thereby maximizing light utilization efficiency.

On the other hand, if the outer region is darker than the inner region, the light passing through the liquid crystal is insufficient and thus the display is practically impossible. To overcome this, a lamp (not shown) is turned on to generate a second light 392 from the inner region to the outer region. In this case, the second light 392 is supplied to the liquid crystal through a portion of the light reflection / transmission member 320 that is not covered by the light reflection thin film 330.

On the other hand, the light absorbing portion 370 is formed in a portion of the light reflection / transmissive member 340 facing the space between the first electrode 240 of the first substrate 200 described above. This is because the light supplied from the external region cannot be blocked even though the portions between the first electrodes 240 are not controlled by the liquid crystal 400. In this case, the light absorbing part 370 is formed by oxidizing the light reflecting thin film 330 to ozone (O ₃ ) or chemical. That is, the light absorbing part 370 is a silver oxide film in which the light reflecting thin film 330 is oxidized.

As described above, when the light reflection / transmitting member 340 and the light absorbing portion 370 are formed on the second transparent substrate 310, the upper surface of the second transparent substrate 310 is colored in a matrix form as shown in FIG. 3. The filter 350 is formed.

In this case, each color filter 350 is formed to be 1: 1 matched with the first electrodes 240 described above.

At this time, in one embodiment of the present invention, one color filter 350 facing the first electrode 240 is formed only on the upper surface of the opening window 335 which is a part of the light reflecting thin film 330, and the thickness is uniform. Do.

More specifically, the color filter 350 is composed of a red color filter 353, a green color filter 356, and a blue color filter 359 as shown in FIG. 9. The red color filter 353 filters the light to emit monochromatic light having a red wavelength, and the green color filter 356 filters the light to emit monochromatic light having a green wavelength, and the blue color filter 359 uses the light. Filter by to output a monochromatic light having a blue wavelength.

Meanwhile, as shown in FIG. 10, when the color filter 350 is formed to have a uniform thickness in the opening window 335 of the light reflecting thin film 330, the color filter 350 among the light reflecting thin films 330. The light (III) that reaches the place where is not formed is reflected in a state where there is no light loss by the color filter 350.

As such, the light (III) reflected without loss in the light reflection thin film 330 and the light (IV) passing through the color filter 350 are mixed with each other to generate light of a desired color.

At this time, the light (III) reflected from the light reflecting thin film 330 without passing through the color filter 350 has a uniform and high brightness as shown in graph a of FIG. 11A, and the light passing through the color filter 350. (IV) has a low luminance as shown in graph b of FIG. 11B.

As a result, the light recognized by the user is light having high luminance in a mixed state similar to the synthesis of the graph a of FIG. 11A and the graph b of FIG. 11B, as shown in the graph c of FIG. 11C.

12 and 13 are shown in more detail in the method of manufacturing a reflection-transmissive liquid crystal display device according to an embodiment of the present invention.

12 is a view illustrating a method of manufacturing a TFT substrate of a reflection-transmissive liquid crystal display device according to an embodiment of the present invention in more detail.

12A shows a first transparent substrate 210 having a high light transmittance.

The gate electrode 221 is formed on the upper surface of the first transparent substrate 210 by the process of FIGS. 12B and 12C.

In order to form the gate electrode 221, as shown in FIG. 12B, a first metal thin film 221e having a first light reflectance is formed on the top surface of the first transparent substrate 210, and the first metal thin film 221e is formed. The second metal thin film 221d having a second light reflectance higher than the first light reflectance is formed on the upper surface of the N-M. At this time, the first metal thin film 221e is composed of chromium oxide film CrO ₂ , and the second metal thin film 221d is composed of chromium (Cr) thin film. As shown in FIG. 3 or 4, the chromium oxide film and the chromium thin film are patterned to have a predetermined interval on the first transparent substrate 310 to form the multilayer gate electrodes 221a, 221b, and 221 as shown in FIG. 12C. do. At this time, the chromium oxide film serves to suppress reflection of light incident from the outside.

Subsequently, as shown in FIG. 4, among the gate electrodes 221 formed in a matrix form, all gate electrodes 221 belonging to a column are connected by transparent gate lines (see FIG. 4 and 228). . More specifically, the upper surface of the first transparent substrate 310, a transparent conductive material, for example, indium tin oxide (ITO) or indium zinc oxide (Indium Zinc Oxide, IZO) as shown in Figure 12d The material is deposited to form a transparent conductive thin film 128a.

In this state, as shown in FIG. 4, the transparent conductive thin film 128a is patterned to connect all the gate electrodes belonging to the same row, thereby forming the transparent gate line 228.

As shown in FIG. 12E, the insulating layer 221c is formed over the entire surface of the first transparent substrate 210 while the gate electrodes 221 are connected by the transparent gate lines 228.

As shown in FIG. 12F, an amorphous silicon thin film (not shown) and an n ⁺ amorphous silicon thin film (not shown) are sequentially formed on the upper surface of the insulating film 221c, and patterning thereof is performed to form the channel layer 222. Is formed.

Subsequently, a source / drain metal thin film (not shown) is formed over the entire surface of the first transparent substrate 210 to include the channel layer 222. The source / drain metal thin film is patterned again as shown in FIG. 12F to form a source electrode 223 and a drain electrode 224, and even the data line 227 shown in FIG. Alternatively, the data line 227 may be formed of ITO material or IZO material.

In this case, the data line 227 is commonly connected to the source electrodes 223 of all the thin film transistors belonging to the same row among the thin film transistors arranged in a matrix form.

Next, as illustrated in FIG. 12G, a thin organic insulating layer 230 is formed on the first transparent substrate 210 so as to cover the source electrode 223 and the drain electrode 224. This organic insulating film 230 is a flat film.

In this state, a contact hole 235 is formed in the organic insulating layer 230 so that the drain electrode 224 is exposed again as shown in FIG. 12H. In this state, a transparent conductive thin film (not shown) is formed over the entire surface of the organic insulating film 230. Thereafter, the transparent conductive thin film is patterned as shown in FIG. 12H to form the first electrode 240. In this case, the shape of the patterned first electrode 240 is shown in more detail in FIG. 4.

Subsequently, as illustrated in FIG. 12I, the alignment layer 280 is formed flat on the first transparent substrate 240 so that the first electrode 240 is covered, and the alignment groove 285 is formed on the upper surface of the alignment layer 280. Is formed.

Meanwhile, a method of manufacturing the second substrate 300 will be described with reference to the accompanying drawings below with reference to FIG. 13.

First, as illustrated in FIG. 13A, an embossing protrusion 315 for viewing angle improvement is manufactured on the upper surface of the second transparent substrate 310 in the process of manufacturing the second transparent substrate 310.

In another embodiment, the viewing angle enhancement embossing protrusion 317a shown in FIG. 13B forms a transparent organic insulating film 317 on the surface of the second transparent substrate 310 having a flat surface, and the surface of the organic insulating film. It is implemented through processing. More specifically, the exposure-development-etching process is successively performed on the photoresist thin film while the photoresist thin film is formed on the top surface of the organic insulating film 317, so that the viewing angle enhancement embossing protrusion 317a is formed on the top surface of the organic insulating film 317. Is formed.

The embossing projection 315 for viewing angle enhancement is directly formed on the top surface of the second transparent substrate 310 on which no thin film is formed, or on the top surface of the second transparent substrate 310 on which no thin film is formed. ), And when the embossing projections 317a for viewing angle enhancement are formed, the embossing projections 315 and 317a for viewing angle enhancement can be formed very precisely.

Meanwhile, in the state where the viewing angle enhancement embossing projection 315 shown in FIG. 13A is formed on the second transparent substrate 310, the light reflection / transmitting thin film 320 is formed on the viewing angle enhancement embossing projection 315 as shown in FIG. 13C. ) And the light reflecting thin film 330 are formed.

This will be described in more detail as follows. First, the light reflection / transmission thin film 320 is made of an aluminum or aluminum alloy having a very thin thickness of about 20 kPa to 800 kPa in one embodiment. In the present invention, an aluminum-neodymium alloy thin film is used. On the upper surface of the light reflection / transmission thin film 320, a light reflection thin film layer 332 which is very thin as compared to the light reflection / transmission thin film 320 is formed over about the entire area. At this time, the light reflecting thin film layer 332 is a silver thin film made of silver (Ag) or a silver alloy in one embodiment.

As described above, in the state where the light reflection / transmission thin film 320 and the light reflection thin film layer 332 are sequentially formed, the photoresist thin film 331 is formed on the top surface of the light reflection thin film layer 332 over the entire area as shown in FIG. 13D. Is formed. As the photoresist thin film, a negative photoresist thin film is used.

The photoresist thin film 331 is for forming a light absorbing layer and a light transmitting window to be described later in detail on the upper surface of the light reflecting thin film layer 332.

More specifically, as shown in FIG. 13D, the pattern mask 344 is aligned on the photoresist thin film 331 already formed to form the light transmitting window.

The pattern mask 344 serves to reach different exposure amounts according to the position of the photoresist thin film 331. At this time, the position where the exposure amount is high in the photoresist thin film 331 is a place where the opening 335 is formed in the light reflection thin film layer 332 as shown in FIG. 9, and the position where the exposure amount is low is the gate line shown in FIG. 4. 228 and data line 227.

Accordingly, as the exposure process proceeds through the pattern mask 344, a portion of the photoresist thin film 331 on which the light transmitting window is to be formed is completely exposed to the outside, and a light absorbing layer is formed. In part, exposure is performed only partially.

In this state, the photoresist thin film 331 is entirely etched by an etch back process as shown in FIG. 13E. During the etch-back process, the light reflecting thin film layer 332 of the portion not covered by the photoresist thin film 331 is etched to form the opening window 335.

Hereinafter, a new reference numeral 330 will be given to the light reflecting thin film on which the opening window 335 is formed, and will be referred to as "light reflecting thin film". Accordingly, the light reflection / transmission thin film 320 positioned below the light reflection thin film layer 332 is exposed to the outside by the light reflection thin film 330 having the opening window 335. Meanwhile, a portion of the portion of the photoresist thin film 331 covered by the photoresist thin film 331 to be formed with the light absorbing layer is exposed to the outside as shown in FIG. 13E.

Subsequently, as illustrated in FIG. 13F, a silver oxide film 370 that is a light absorbing portion is formed on the light reflection thin film 330 exposed from the photoresist thin film 331 by an etch-back process. Oxidation of the light reflecting thin film 330 is performed by a chemical that selectively oxidizes only ozone or silver (Ag).

As such, the color filter 350 is formed on the second transparent substrate 310 in a state in which the remaining photoresist thin film is removed while the silver oxide film 370 is formed on the light reflective thin film 330. In this case, the color filter 350 includes a red color filter, a green color filter, and a blue color filter. In the present invention, a process of forming a red color filter will be described.

At this time, in one embodiment, a process of patterning the red color filter 353 is illustrated in FIGS. 13G to 13I. First, as illustrated in FIG. 13G, the red color filter thin film 353a is formed of a red color filter material having a first height h1 over the entire area of the second transparent substrate 310. At this time, the red color filter thin film 353a filters light to generate monochromatic light having a red wavelength. In this case, the red color filter material is a photosensitive material. In addition, the red color filter material is a negative photosensitive material which is less reactive as more light is exposed.

As described above, in the state where the red color filter material is formed over the entire area of the second transparent substrate 310, the pattern mask 353b as shown in FIG. 13H is mounted on the top surface of the red color filter material.

In this case, referring to FIGS. 13H and 9, the pattern mask 353b has the smallest amount of light passing through the A region where the light transmission window is to be formed, and a relatively large amount of light is supplied in the remaining regions except for the A region.

As the development proceeds in such an environment, the thickness of the red color filter thin film in region A is the thickest as the first thickness h1, and the thickness has a constant thickness.

This process is similar to a blue color filter (not shown) adjacent to the red color filter 353 to form the green color filter 356 in the C region adjacent to the A region and again to the adjacent green color filter. Apply.

Subsequently, as shown in FIG. 13J, a flat overcoat thin film 355 is formed on the top surface of the color filter 350, and an indium tin oxide or indium zinc oxide material, which is a transparent conductive material, is formed on the top surface of the overcoat thin film 355. A second electrode 360 consisting of the second electrode 360 is formed.

The liquid crystal is injected between the first substrate 200 and the second substrate 300 in a state where both the first substrate 200 and the second substrate 300 manufactured through the above process are bonded together. Are manufactured.

As described above in detail, the reflective or reflective transmissive liquid crystal display device can overcome the problems caused in the process of forming the viewing angle enhancement protrusion necessary to improve the viewing angle and luminance uniformity, as well as the reflective transmissive liquid crystal display device. It is possible to solve the problem of deterioration of luminance, which is one of the big problems.

In the detailed description of the present invention described above with reference to a preferred embodiment of the present invention, those skilled in the art or those skilled in the art having ordinary knowledge in the scope of the invention described in the claims to be described later It will be understood that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

Claims (9)

A first substrate comprising a first transparent substrate, a first electrode arranged in a matrix form on the first transparent substrate, and power supply means for supplying power to each of the first electrodes; A second transparent substrate facing the first transparent substrate and having a viewing angle enhancement means; a first light directed from the second transparent substrate to the first transparent substrate, and transmitting from the first transparent substrate to the second transparent substrate The second light directed toward the light reflecting / transmitting means for reflecting in the first light direction, a color filter having a constant thickness on a part of the light reflecting / transmitting means, formed on the front surface of the second transparent substrate on which the color filter is formed. A second substrate comprising a second electrode; And And a liquid crystal injected between the first substrate and the second substrate. The reflective / transmissive liquid crystal display device according to claim 1, wherein the viewing angle improving means is an unevenness for improving the viewing angle formed on the surface of the second transparent substrate facing the first transparent substrate. The reflective / transmissive liquid crystal display device according to claim 1, wherein the viewing angle improving means is an organic insulating film formed with unevenness for improving viewing angle on a surface of the second transparent substrate. The method of claim 1, wherein the light reflecting / transmitting means reflects the second light when the first transparent substrate side is brighter than the second transparent substrate side, and the second transparent substrate side is the first transparent substrate side. When it is brighter, the reflection / transmission liquid crystal display device, characterized in that the light reflection / transmission thin film for transmitting the first light. 5. The reflection / transmission liquid crystal display device according to claim 4, wherein the light reflection / transmission thin film has a thickness of 20 kPa to 800 kPa. The method of claim 1, wherein the light reflecting / transmitting means reflects the second light when the first transparent substrate side is brighter than the second transparent substrate side, and the second transparent substrate side is the first transparent substrate side. When it is brighter, a light reflection / transmission thin film for transmitting the first light, a light transmission region opened to expose a portion of the light reflection / transmission thin film, and a light reflection thin film surrounding the light transmission region and reflecting the second light And the color filter is formed in the light transmitting area. The method of claim 1, wherein the power supply means is composed of a thin film transistor disposed on the first transparent substrate in the form of a matrix and a signal line consisting of a gate line and a data line for driving the thin film transistor, The thin film transistor is formed on a first transparent substrate with a first area, and includes a gate electrode comprising a first metal having a first light reflectance and a second metal having a second light reflectivity higher than the first light reflectance, the gate electrode; A channel layer formed to be insulated and formed with a second area smaller than the first area, a source electrode and a drain electrode formed so as not to short-circuit with the channel layer, and a gate line connected to the gate electrode is made of a transparent conductive material Reflective / transmissive liquid crystal display device characterized in that. The liquid crystal display of claim 7, wherein the first metal is a chromium oxide film having a first light reflectance, and the second metal is a chromium thin film having a second light reflectivity greater than the first light reflectance. Device. Manufacturing a first substrate by forming a power supply device for supplying power to the first transparent substrate in small area units, and forming a transparent first electrode connected to the power supply device; In the first region of the second transparent substrate on which the viewing angle enhancement means is formed, the first light directed to the first transparent substrate is transmitted, and in the second region surrounding the first region, the first transparent substrate is directed from the first transparent substrate to the second transparent substrate. Forming a light reflecting / transmitting means for reflecting a second light in the first light direction, forming a color filter having a constant thickness in the first region of the light reflecting / transmitting means, the second transparent substrate having the color filter formed thereon A second step of forming a second substrate by forming a second electrode on a front surface of the second substrate; Bonding the first substrate and the second substrate to each other; And And injecting a liquid crystal between the bonded first substrate and the second substrate.