KR200265836Y1 - Photo Mask Set - Google Patents

Abstract

The present invention is directed to a set of photomasks that allow simultaneous fabrication and assembly of subsequent developments with the same process and conditions as any development.

The photomask set according to the present invention is a main photomask patterns for any development product, main photomask patterns for testing for subsequent development products having the same process and conditions except for the development product and the pattern shape, and It is characterized by including a monitoring photomask pattern for control.

According to the present invention, when designing and developing a photomask of an arbitrary product, photomask design and fabrication, device fabrication, and assembly can be performed simultaneously by inserting mask patterns related to subsequent products having the same process and conditions. It is possible to reduce the photomask manufacturing cost for the generated products.

Description

Photo Mask Set {Photo Mask Set}

The present invention relates to a photomask, and more particularly to a set of photomasks that allow simultaneous fabrication and assembly of subsequent developments with the same process and conditions as any development.

In general, the process of designing and manufacturing a photomask is an important field in manufacturing a semiconductor chip or a circuit board. After the photomask is analyzed and designed for the device to be manufactured, patterns are produced for each layer in response to the photomask. In this case, even if the same device is used, the photomask pattern is designed differently. For example, when a regulator device is manufactured, the electrode wiring shape is designed differently according to which set the regulator is applied to. Correspondingly, the pattern of the photomask for forming the electrode wiring is also designed and manufactured differently. In this case, the photomasks for forming electrode wirings according to the field used have the same process and conditions for forming the electrode wirings, but have different shapes, and thus are individually designed and manufactured. In other words, photomasks are produced for each variety as shown in FIGS. 1A and 1B.

Referring to Fig. 1A, the configuration of a conventional photomask set is simply shown. The photomask set in which the mask patterns are arranged in a matrix form for mass production is generally composed of main patterns C for the traveling elements and a monitor pattern M for process control. In fact, when manufacturing the photomask set for forming the electrode wiring of the regulator element, as shown in Fig. 1B, the photomask set is composed of only the main varieties of the same variety with the number '33'. Then, the photomask set having different varieties, that is, the photomask set for subsequent processing elements, will be separately designed and manufactured later.

As described above, the conventional photomask set has a problem in that it costs a lot of manufacturing costs because it designs and manufactures several sets of photomasks according to the design and manufacture of the photomask for each variety. In addition, the device fabrication, assembly and evaluation only one item (Item) at a time, so there is a problem that can not guarantee the reliability when improving the characteristics and add features. Furthermore, as the design pattern of the photomask is dualized / trinized, it is possible to prolong the development period and increase the failure rate.

Accordingly, an object of the present invention is to insert photomask patterns for subsequent developments having the same process and conditions when performing photomask fabrication for an arbitrary development product so that photomask design and fabrication, device fabrication, and assembly can be simultaneously performed. It is to provide a set of photomasks.

1A shows a configuration for a conventional photomask set, and FIG. 1B shows a portion of an actual photomask set.

Figure 2a shows the configuration of a photomask set according to an embodiment of the present invention, Figure 2b is a view showing a portion of the actual photomask set according to the present invention.

<Brief description of symbols for the main parts of the drawings>

A, B, C, D: first to fourth main patterns M: monitoring pattern

In order to achieve the above objects, the photomask set according to the present invention is a main photomask pattern for any development product and a main test for subsequent development products having the same process and conditions except for the development product and the pattern shape. And photomask patterns and a monitoring photomask pattern for process control.

Other objects and advantages of the present invention in addition to the above object will be apparent from the description of the preferred embodiment of the present invention with reference to the accompanying drawings.

Hereinafter, preferred embodiments of the present invention will be described with reference to FIGS. 2A and 2B.

Figure 2a shows a simple configuration of a photomask set according to an embodiment of the present invention, Figure 2b shows an actual photomask set configuration to which the present invention is applied.

First of all, the analysis and design of the development of the same device and different fields, that is, different varieties and subsequent developments, will be performed. Then, when proceeding with the design and manufacture of the photomask for the development product, the photomask patterns for subsequent development products of the same process and conditions are inserted. In other words, as shown in FIG. 2A, the photomask set for the developed product includes the first main pattern A related to the developed product, the monitoring pattern M, and the second to fourth main patterns B related to the subsequent developed products. , C, D). Here, the monitoring pattern M is used for process control. For example, when designing and manufacturing a photomask set for forming electrode wirings of a regulator, as shown in FIG. 2B, the main patterns 33 related to the development product, the monitoring patterns M, and the main patterns related to the subsequent development products are illustrated. It can be seen that (45, 19, 42, 21, 39) are configured together. As such, the manufacturing and assembly process of the development product and the subsequent development products using a photomask set in which the main patterns 45, 19, 42, 21, and 39 of the subsequent development product are inserted in the arrangement of the main patterns 33 for the development product. Will proceed. In addition, evaluation of the completed development product and subsequent development products is performed separately. Subsequent developments determined to have good characteristics in this evaluation will further produce and proceed with the photomask set using its photomask pattern.

As such, the photomask set according to the present invention is composed of the main patterns of arbitrary development products and subsequent development products, so that device fabrication and assembly can proceed simultaneously. As a result, it is possible to reduce the cost of manufacturing photomasks for frequently occurring development products.

As described above, the photomask set according to the present invention inserts mask patterns related to subsequent developments having the same process and conditions when designing and developing a photomask and designing and fabricating photomasks, device fabrication, and the like. Allows assembly to proceed simultaneously. Accordingly, it is possible to reduce the production cost of photomasks for frequently occurring development products, to develop development possibilities for the development products, and to reduce the development failure rate.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be defined by the utility model registration claims.

Claims (1)

Main photomask patterns for any development, The main photomask patterns for the test of subsequent developments having the same process and conditions except for the development and the pattern shape; A photomask set comprising a monitoring photomask pattern for process control.