KR200203865Y1 - 3-way valve for gas separation - Google Patents
3-way valve for gas separation Download PDFInfo
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- KR200203865Y1 KR200203865Y1 KR2019970034251U KR19970034251U KR200203865Y1 KR 200203865 Y1 KR200203865 Y1 KR 200203865Y1 KR 2019970034251 U KR2019970034251 U KR 2019970034251U KR 19970034251 U KR19970034251 U KR 19970034251U KR 200203865 Y1 KR200203865 Y1 KR 200203865Y1
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- housing
- bellows
- gas
- way valve
- nitrogen gas
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
- F16K31/0603—Multiple-way valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
- F16K27/0209—Check valves or pivoted valves
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Self-Closing Valves And Venting Or Aerating Valves (AREA)
- Check Valves (AREA)
Abstract
본 고안은 3웨이 밸브에 관한 것으로서 종래에는 하우징 내에 설치된 밸로우즈에 반응가스가 분말화되어 응결되는 결점이 있었다.The present invention relates to a three-way valve, conventionally had a drawback that the reaction gas is powdered and condensed in the bellows installed in the housing.
본 고안은 제4도와 같이 하우징(1)에 흡입구(2)와 배출구(3)(4)가 형성되고 내부에 밸로우즈(9)가 설치된 것에 있어서, 하우징(1)의 내경을 크게하여 하우징(1)과 밸로우즈(9)간의 공간부(10)를 크게하고, 하우징(1)의 상부에는 외부에서 내부로 관통하는 질소가스 유입관(11)을 연결하여 적정온도의 질소가스가 첵크밸브(12)를 통하여 하우징(1)내로 유입되도록 한 것이다.According to the present invention, the inlet 2 and the outlet 3 and 4 are formed in the housing 1 and the bellows 9 is installed therein, so that the inner diameter of the housing 1 is increased so that the housing ( 1) the space 10 between the bellows 9 is enlarged, and a nitrogen gas inlet pipe 11 penetrating from the outside to the upper part of the housing 1 is connected to the check valve ( 12 is to be introduced into the housing (1).
Description
본 고안은 3웨이 밸브에 관한 것으로서 더욱 상세히 설명하면, 밸로우즈 주위의 공간을 넓게하고 밸로우즈에 질소가스를 분사하여 반응가스의 분말화를 방지할 수 있도록 한 가스분리용 3웨이 밸브의 개량에 관한 것이다.The present invention relates to a three-way valve, and in more detail, to improve the separation of the three-way valve for gas separation to widen the space around the bellows and inject nitrogen gas into the bellows to prevent powdering of the reaction gas. It is about.
반도체 제조공정에서는 다종의 프로세싱 가스(processing gas)를 사용하게 되는데 상기 반응 가스들은 대개가 매우 독성이 강해서 인체에 치명적이고 또한 다른 가스나 공기와 혼합되면 폭발할 수도 있어서 공정후 상기 가스의 처리가 환경의 안전성면에서 상당히 중요한 비중을 차지하고 있기 때문에 상기 가스는 공정라인 상에서 정화처리되어 무해한 가스로 배출되도록 의무화되어있다.In the semiconductor manufacturing process, a variety of processing gases are used. The reaction gases are usually very toxic and may be fatal to humans and may explode when mixed with other gases or air. Because of its considerable importance in terms of safety, the gas is mandated to be purified on the process line and discharged as a harmless gas.
예시도면 제1도는 반도체 공정라인의 다이어그램을 보인 것으로, 보통 웨이퍼를 다량으로 처리하기 위해 다수의 챔버(chamber)가 구비되고, 각 챔버에는 프로세싱 가스 흡입라인과 클린가스 흡입라인이 연결되며, 챔버의 배출라인에는 진공펌프가 설치된다. 또한 진공펌프의 배출라인에는 반응가스 소각 정화용 스크러버(scrubber)를 통한 가연배기부와 산배기부가 연결된다.1 is a diagram of a semiconductor processing line. In general, a plurality of chambers are provided to process a large amount of wafers, and each chamber is connected with a processing gas suction line and a clean gas suction line. A vacuum pump is installed in the discharge line. In addition, the exhaust line of the vacuum pump is connected to the combustion exhaust and acid exhaust through the scrubber (scrubber) for the purification of incineration of the reaction gas.
반도체인 웨이퍼 생산시에는 가연성가스 및 부식성이 강한 산성가스를 이용하여 웨이퍼에 막을 형성하도록 되어 있는데, 위와 같이 가연성 가스를 이용하여 1차 가공이 끝나면 챔버를 청소하고 다시 2차 가공을 위하여 산성가스를 챔버에 주입하게 된다.In the production of wafers, which are semiconductors, films are formed on the wafers using flammable gases and highly corrosive acid gases.Cleaning the chamber after the first processing is completed using the combustible gas as described above, and again removing the acid gas for the second processing. It is injected into the chamber.
챔버 청소시에는 질소(N2)가스를 사용하는데 잔류 가연성가스의 청소시에는 가연배기부로 질소가스를 배출시키고, 잔류산성가스의 청소시에는 산배기부로 질소가스를 배출시키도록 되어있다.Nitrogen (N2) gas is used to clean the chamber. Nitrogen gas is discharged to the flammable exhaust when cleaning residual flammable gas, and nitrogen gas is discharged to the acid exhaust when cleaning residual acid gas.
위와 같이 가연성가스와 산성가스를 순차로 사용하면서 그 중간에 질소가스를 사용하여 청소를 하는 반복되는 과정에 있어서 3웨이 밸브는 이들을 엄격히 분리하는 역할을 하게 되며, 이 과정에서 가연성가스와 산성가스가 혼합되면 폭발의 위험성이 있어서 3웨이 밸브는 고도의 정밀성을 요한다.In the repeated process of using flammable gas and acid gas sequentially and cleaning with nitrogen gas in between, the 3-way valve plays a role of strictly separating them. In this process, combustible gas and acid gas are separated. When mixed, there is a risk of explosion and the three-way valve requires a high degree of precision.
제2도는 본 출원인이 기출원한 실용신안등록출원 제97-22271호에 관한 것으로서 하우징(1) 중앙에 흡입구(2)가 형성되고 흡입구(2)의 반대 방향에는 배출구(3)(4)가 형성되어 스크러버 및 산 배기부로 연결되며, 하우징(1)의 양측에는 대칭형으로 조립체(5)와 스프링케이스(6) 및 리턴 스프링(7)이 설치되고, 리턴스프링(7)에 연하여 패킹(8)과 밸로우즈(9)가 설치되어 있다.2 is related to the Utility Model Registration No. 97-22271 filed by the present applicant, the inlet (2) is formed in the center of the housing (1) and the outlet (3) (4) in the opposite direction of the inlet (2) It is formed and connected to the scrubber and the acid exhaust, the assembly (5), the spring case 6 and the return spring (7) is installed on both sides of the housing (1) symmetrically, and connected to the return spring (7) packing (8) ) And bellows 9 are installed.
또한 패킹(8)의 중심부로부터 작동축(도시안됨)이 밸로우즈(9)내를 관통하여 설치되어 있다.An operating shaft (not shown) penetrates the inside of the bellows 9 from the center of the packing 8.
여기서 밸로우즈(9)는 작동축의 주위로 반응가스가 누출되는 것을 방지하기 위한 것으로서 마치 주름관의 형태를 이루고 있다.Here, the bellows 9 is to prevent the reaction gas from leaking around the operating shaft, and forms a corrugated pipe.
그런데 상술한 바와 같은 구조의 종래의 3웨이 밸브는 주름관 형태의 밸로우즈 밸브를 사용하기 때문에 밸로우즈 밸브와 하우징사이가 빈번히 막히고 그에 따라 수시로 분해하여 청소를 해야하는 불편이 있었다.However, since the conventional three-way valve having the structure as described above uses a bellows valve in the form of a corrugated pipe, the bellows valve and the housing are frequently blocked, and accordingly, there is a inconvenience in that it is often disassembled and cleaned.
다시 말해서 반응가스는 밸로우즈 주위를 통하여 스크러버 또는 산배기부로 배출되는데, 이때 온도변화에 따라 분말화되고 이러한 분말이 주름형태의 밸로우즈 외표면에 달라붙게 됨으로서 밸로우즈 자체의 기능이 저하됨은 물론 밸로우즈와 하우징 내부와의 공간을 막아서 가스통로가 막히는 결점이 있으며, 수시로 분리하여 청소를 해야 하므로 시간낭비 및 공정지연을 초래하는 결점이 있었다.In other words, the reaction gas is discharged through the surroundings of the bellows to the scrubber or the acid exhaust, whereby the powder is powdered according to the temperature change and the powder adheres to the bellows outer surface of the bellows. There is a defect that the gas passage is blocked by blocking the space between the wood and the inside of the housing, and because it must be separated and cleaned from time to time, there was a defect that causes waste of time and process delay.
본 고안은 상술한 바와 같은 종래의 결점을 해결하기 위하여 하우징의 내경을 넓혀서 밸로우즈와 하우징간의 간격을 크게 함으로서 밸로우즈 주위에 파우더가 달라붙더라도 가스가 원활히 통과할 수 있도록 하고, 하우징의 상부에는 질소가스 유입관을 설치하여 필요한 온도로 가열된 질소가스를 밸로우즈의 외표면에 분사시켜 줄 수 있도록 함으로서 반응가스의 분말화를 예방할 수 있도록 함에 목적이 있다.The present invention widens the inner diameter of the housing to solve the above-mentioned drawbacks as described above to increase the distance between the bellows and the housing so that the gas can pass smoothly even if the powder adheres around the bellows, The purpose is to prevent the powdering of the reaction gas by installing a nitrogen gas inlet pipe so that the nitrogen gas heated to the required temperature can be sprayed on the outer surface of the bellows.
상기와 같은 목적을 실현하기 위한 본 고안은 하우징내에 밸로우즈 밸브가 설치된 것에 있어서, 하우징의 내경을 크게 하고, 하우징 상부에는 외부에서 내부로 관통하는 질소가스 유입관을 연결하며, 질소가스 유입관에는 첵크밸브를 설치한 것이다.The present invention for realizing the above object is that the bellows valve is installed in the housing, to increase the inner diameter of the housing, to connect the nitrogen gas inlet pipe penetrating from the outside to the inside of the housing, the nitrogen gas inlet pipe Check valve is installed.
제1도는 종래의 3웨이 밸브를 사용하는 반도체 제작공정의 다이어그램.1 is a diagram of a semiconductor fabrication process using a conventional three-way valve.
제2도는 종래의 3웨이 밸브의 분리사시도.2 is an exploded perspective view of a conventional three-way valve.
제3도는 본 고안에 따른 3웨이 밸브의 분리사시도.3 is an exploded perspective view of a three-way valve according to the present invention.
제4도는 본 고안에 따른 3웨이 밸브의 단면도.4 is a cross-sectional view of a three-way valve according to the present invention.
제5도는 본 고안에 따른 3웨이 밸브의 사시도이다.5 is a perspective view of a three-way valve according to the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 하우징 2 : 흡입구1 housing 2 suction port
3,4 : 배출구 5 : 조립체3,4 outlet 5: assembly
6 : 스프링케이스 7 : 리턴스프링6: Spring Case 7: Return Spring
8 : 패킹 9 : 밸로우즈8: packing 9: bellows
10 : 공간부 11 : 질소가스 유입관10: space portion 11: nitrogen gas inlet pipe
12 : 첵크밸브12: Check valve
본 고안을 첨부된 예시도면과 함께 상세히 설명하면 다음과 같다.The present invention will be described in detail with reference to the accompanying drawings.
본 고안은 하우징(1)에 흡입구(2)와 배출구(3)(4)가 형성되고 내부에 밸로우즈(9)가 설치된 것에 있어서, 하우징(1)의 내경을 크게하여 하우징(1)과 밸로우즈(9)간의 공간부(10)를 크게하고, 하우징(1)의 상부에는 외부에서 내부로 관통하는 질소가스 유입관(11)을 연결하여 적정온도의 질소가스가 첵크밸브(12)를 통하여 하우징(1)내로 유입되도록 한 것이다.In the present invention, the inlet port 2 and the outlet port 3, 4 are formed in the housing 1, and the bellows 9 is provided therein, so that the inner diameter of the housing 1 is increased so that the housing 1 and the bellows are large. The space 10 between the woods 9 is enlarged, and a nitrogen gas inlet pipe 11 penetrating from the outside to the inside of the housing 1 is connected to the nitrogen gas at a proper temperature through the check valve 12. It is to be introduced into the housing (1).
질소가스는 필요에 따라 고온 또는 저온으로 온도를 조절하여 반응가스의 온도손실을 보상하도록 하는 것이며, 질소가스 이외의 불활성가스의 사용도 가능하다.Nitrogen gas is to compensate for the temperature loss of the reaction gas by adjusting the temperature to a high temperature or low temperature as needed, it is also possible to use an inert gas other than nitrogen gas.
질소가스의 온도 조절은 반응가스가 분말상태에서 딱딱한 상태로 굳어서 달라붙는 것을 방지하기 위한 것이며, 질소가스는 자동 제어장치의 지시에 의해 별도의 고압펜 등을 이용하여 공급하도록 되어있다.The temperature control of the nitrogen gas is to prevent the reaction gas from solidifying in a hard state in the powder state, the nitrogen gas is to be supplied using a separate high-pressure pen or the like by the instruction of the automatic control device.
첵크밸브(12)는 질소가스의 일방향 이동만을 허용하기 위한 것이며, 질소가스가 반응가스 이동시에 밸로우즈(9)의 외표면에 강하게 분사되면, 온도보상에 의해 분말상태를 유지하면서 밸로우즈의 외표면에 달라붙어 굳는 것을 방지하게 된다.The check valve 12 is intended to allow only one-way movement of nitrogen gas. When nitrogen gas is strongly injected to the outer surface of the bellows 9 during the reaction gas movement, the check valve 12 maintains the powder state by temperature compensation. It will stick to the surface and prevent it from hardening.
본 고안은 하우징(1)의 내경을 확대하며 밸로우즈(9)와 하우징(1)간의 공간부(10)를 넓게 함으로서 밸로우즈(9)의 외표면에 어느정도의 분말이 끼이더라도 반응가스의 유통이 원활하고, 하우징(1)의 질소가스유입관(11)을 통하여 별도의 질소가스를 공급함으로서 반응가스의 손실 온도 보상 및 분말상태를 유지하며 분말의 응고를 방지함으로서 밸로우즈(9)의 작용을 원활히 하고 장기간 청소를 요하지 않는 효과가 있다.The present invention enlarges the inner diameter of the housing 1 and widens the space 10 between the bellows 9 and the housing 1, so that even if some powder is stuck on the outer surface of the bellows 9, the reaction gas flows. This smooth, by supplying a separate nitrogen gas through the nitrogen gas inlet pipe 11 of the housing (1) to compensate for the loss temperature of the reaction gas and maintain the powder state and prevent the solidification of the powder action of the bellows (9) The effect is smooth and does not require long-term cleaning.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019970034251U KR200203865Y1 (en) | 1997-11-28 | 1997-11-28 | 3-way valve for gas separation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019970034251U KR200203865Y1 (en) | 1997-11-28 | 1997-11-28 | 3-way valve for gas separation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR19990020763U KR19990020763U (en) | 1999-06-25 |
| KR200203865Y1 true KR200203865Y1 (en) | 2001-01-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019970034251U KR200203865Y1 (en) | 1997-11-28 | 1997-11-28 | 3-way valve for gas separation |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR100818341B1 (en) * | 2006-10-25 | 2008-04-01 | (주)인화이엔지 | Gearing valve |
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- 1997-11-28 KR KR2019970034251U patent/KR200203865Y1/en not_active IP Right Cessation
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