KR20020038232A - Adhesive tape - Google Patents

Adhesive tape Download PDF

Info

Publication number
KR20020038232A
KR20020038232A KR1020000068333A KR20000068333A KR20020038232A KR 20020038232 A KR20020038232 A KR 20020038232A KR 1020000068333 A KR1020000068333 A KR 1020000068333A KR 20000068333 A KR20000068333 A KR 20000068333A KR 20020038232 A KR20020038232 A KR 20020038232A
Authority
KR
South Korea
Prior art keywords
polyimide
adhesive tape
added
film
weight
Prior art date
Application number
KR1020000068333A
Other languages
Korean (ko)
Other versions
KR100625055B1 (en
Inventor
황용하
정승환
장원석
Original Assignee
구광시
주식회사 코오롱
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 구광시, 주식회사 코오롱 filed Critical 구광시
Priority to KR1020000068333A priority Critical patent/KR100625055B1/en
Publication of KR20020038232A publication Critical patent/KR20020038232A/en
Application granted granted Critical
Publication of KR100625055B1 publication Critical patent/KR100625055B1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09J179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J109/00Adhesives based on homopolymers or copolymers of conjugated diene hydrocarbons
    • C09J109/02Copolymers with acrylonitrile
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/18Homopolymers or copolymers of nitriles
    • C09J133/20Homopolymers or copolymers of acrylonitrile
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2479/00Presence of polyamine or polyimide
    • C09J2479/08Presence of polyamine or polyimide polyimide
    • C09J2479/086Presence of polyamine or polyimide polyimide in the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PURPOSE: Provided is a heat-resistant adhesive tape for a lead-on chip, which can keep the adhesive force under the temperature condition of taping and epoxy molding and improve the size stability of a lead frame. CONSTITUTION: The heat-resistant adhesive tape is produced by spreading an adhesive layer(100) on the both sides of a heat-resistant polyimide film(200), wherein the adhesive layer(100) contains 100pts.wt. of a polyimide copolymer having a glass transition temperature of more than 200deg.C and 20-100pts.wt. of an acrylonitrile/butadiene copolymer as a binder.

Description

내열성 접착테이프{Adhesive tape}Heat-resistant Adhesive Tape {Adhesive tape}

본 발명은 내열성 접착테이프에 관한 것으로서, 더욱 상세하게는 유리전이온도가 200℃ 이상인 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체의 혼합물을 바인더로 사용한 접착층을 폴리이미드 필름의 양면에 도포하여 테이핑시의 온도에서 탁월한 접착력 및 내열성을 보이고 에폭시 몰딩시의 온도 조건 하에서도 접착력을 유지하여 납 프레임의 치수안정성을 향상시킨 접착테이프의 제조방법에 관한 것이다.The present invention relates to a heat-resistant adhesive tape, and more particularly, by applying an adhesive layer using a mixture of a polyimide copolymer having a glass transition temperature of 200 ° C. or more and an acrylonitrile / butadiene copolymer as a binder to both sides of a polyimide film and taping the tape. The present invention relates to a method for producing an adhesive tape having excellent adhesive strength and heat resistance at a temperature of time and maintaining adhesive strength even under temperature conditions during epoxy molding to improve dimensional stability of a lead frame.

수지 봉지형 반도체 기구에 사용되는 접착 테이프는 납 프레임을 고정시키기위한 테이프, 다이패드 고정 테이프, TAB(Tape Automated Bonding) 테이프, 리드온칩 테이프 등이 있다. 이들 테이프들은 모두 접착층이 가지는 고접착, 절연 및 내열특성을 가지고 있을 뿐만 아니라 패키지 내에 탑재되므로 반도체 수준의 신뢰성, 테이핑시의 작업성, 그리고 반도체 전체 조립 절차에서 견딜 수 있는 충분한 내열성 및 접착력을 가져야 하기 때문에 지금까지 많은 재료들이 이 접착층을 구성하는 성분으로 연구되어 왔다.Adhesive tapes used in resin encapsulated semiconductor devices include tapes for fixing lead frames, die pad fixing tapes, tape automated bonding tapes, and lead-on chip tapes. These tapes all have the high adhesion, insulation and heat resistance properties of the adhesive layer as well as are mounted in the package, so they must have semiconductor level reliability, workability at taping, and sufficient heat and adhesion to withstand the entire semiconductor assembly process. Therefore, many materials have been studied so far as a component constituting the adhesive layer.

이중에서 리드온칩 패키지는 실장되는 반도체 칩의 본딩패드가 반도체 칩 상부 표면의 중앙부분에 배열되어 있고, 리드프레임의 리드가 이 상부면 위로 올라와서 면 부착하기 때문에 리드가 차지하는 면적이 그렇지 않은 경우에 비해서 작아 패키지의 면적을 줄일 수 있는 장점이 있다. 또한, 전원단자로 사용되는 본딩 패드가 칩의 중앙에 배치되기 때문에 이러한 전원을 필요로 하는 반도체 칩 내의 회로들이 전원과 연결되는 연결선들이 짧고 또 그 길이가 다른 회로에서 전원과 연결되는 선의 길이와 동일하기 때문에 전원 노이즈가 감소되고 출력 데이터 간의 편차를 줄일 수 있는 장점이 있어서 많이 사용된다.In this case, the lead-on chip package includes a case in which the pads of the semiconductor chip to be mounted are arranged at the center of the upper surface of the semiconductor chip, and the lead occupies the lead frame because the lead of the lead frame rises above the upper surface and attaches the surface. It is small compared with the advantages of reducing the area of the package. In addition, since the bonding pad used as the power supply terminal is disposed at the center of the chip, circuits in the semiconductor chip requiring such a power supply have shorter connection lines for connecting the power supply and the length is the same as the length of the connection line for the power supply in other circuits. This is because the power supply noise is reduced and the deviation between the output data can be reduced, so it is frequently used.

한편, 여기에 사용되는 접착 테이프에 대한 개발도 급속히 진행되고 있는데, 리드온칩용 접착테이프와 같은 경우는 폴리이미드 필름의 양면에 접착층이 코팅된 형태의 것으로, 다이패드가 없어 패키지 크기를 줄일 수 있는 장점이 있다.Meanwhile, the development of the adhesive tape used here is also rapidly progressing. In the case of the adhesive tape for the lead-on chip, the adhesive layer is coated on both sides of the polyimide film. There is an advantage.

리드온칩 패키지의 공정온도가 납 프레임 고정용 테이프에 비해 100∼200℃ 가량 높아 상대적으로 내열성이 더 요구되며, 접착력은 일정 수준 이상이면 만족하는 정도이다. 접착 테이프는 내열성 필름에 일정한 두께의 접착층을 도포한 후 필요하다면 그 위에 보호 필름을 라미네이션함으로써 얻어진다.The process temperature of the lead-on chip package is about 100-200 ° C. higher than that of the lead frame fixing tape, so that the heat resistance is further required. An adhesive tape is obtained by applying an adhesive layer of constant thickness to a heat resistant film and then laminating a protective film thereon if necessary.

이에, 본 발명자들은 테이핑시의 온도조건은 물론 에폭시 몰딩시의 온도 조건에서도 접착력을 유지할 수 있는 리드온칩용 접착테이프를 개발하기 위해 연구노력하던 중, 접착층의 바인더를 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체의 혼합물로 사용한 결과, 상기 요구를 만족시킬 수 있음을 알게되어 본 발명을 완성하였다.Accordingly, the present inventors are trying to develop an adhesive tape for lead-on-chip which can maintain the adhesive strength not only in the temperature condition during taping but also in the temperature condition during epoxy molding, and the binder of the adhesive layer is formed of polyimide copolymer and acrylonitrile. As a result of the use of a mixture of / butadiene copolymers, it was found that the above requirements could be satisfied to complete the present invention.

따라서, 본 발명의 목적은 테이핑시의 온도조건은 물론 에폭시 몰딩시의 온도조건에서도 접착력을 유지할 수 있는 리드온칩용 접착테이프를 제공하는 데 있다.Accordingly, an object of the present invention is to provide an adhesive tape for a lead-on chip that can maintain the adhesive force not only at the temperature condition during taping but also at the temperature condition during epoxy molding.

이와같은 목적을 달성하기 위한 본 발명의 리드온칩용 접착테이프는 폴리이미드 필름의 양면에 바인더로서 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체의 혼합물을 포함하는 접착층을 도포하여 제조된 것임을 그 특징으로 한다.The adhesive tape for lead-on chip of the present invention for achieving the above object is produced by applying an adhesive layer comprising a mixture of a polyimide copolymer and an acrylonitrile / butadiene copolymer as a binder on both sides of the polyimide film. It is done.

도 1은 본 발명에 따른 내열성 접착테이프의 단면을 나타낸 것이다.1 shows a cross section of a heat resistant adhesive tape according to the present invention.

*도면의 주요 부분에 대한 부호의 설명** Description of the symbols for the main parts of the drawings *

100 - 접착층200 - 내열성 필름100-Adhesive Layer 200-Heat Resistant Film

이와같은 본 발명을 더욱 상세하게 설명하면 다음과 같다.The present invention will be described in more detail as follows.

본 발명에 따라 얻어진 접착테이프의 구조는 개략적으로 도 1과 같이 내열성 베이스 필름(200)의 양면에 내열 접착층(100)이 형성된 구조를 갖는다.The structure of the adhesive tape obtained according to the present invention has a structure in which the heat resistant adhesive layer 100 is formed on both surfaces of the heat resistant base film 200 as shown in FIG. 1.

(1)내열성 필름(200)(1) heat resistant film (200)

본 발명에서 사용된 내열성 베이스 필름은 폴리에테르이미드, 폴리파라페닐렌설파이드, 폴리이미드, 폴리에테르케톤 필름 및 에폭시 수지-유리직물, 에폭시수지-폴리이미드-유리직물과 같은 복합 내열성 베이스 필름 등을 사용할 수 있으며, 내열성 측면이나 구리 합금과의 열팽창계수의 차이가 가장 작은 폴리이미드 필름이 바람직하다. 다른 베이스 필름은 리드온칩 공정 중 내부 납이 300℃ 이상의 가공 온도 조건 하에서 옆으로 이동하여 서로 붙거나 단락할 가능성이 있다. 베이스 필름의 두께는 10∼150㎛, 바람직하게는 25∼100㎛가 적당하다.As the heat resistant base film used in the present invention, polyetherimide, polyparaphenylene sulfide, polyimide, polyether ketone film and composite heat resistant base film such as epoxy resin-glass fabric, epoxy resin-polyimide-glass fabric, etc. can be used. A polyimide film can be used, and the smallest difference in the coefficient of thermal expansion with respect to the heat-resistant side or the copper alloy is preferable. Other base films have the possibility that internal lead moves sideways under processing temperature conditions of 300 ° C. or higher during lead-on-chip processing to stick or short together. The thickness of a base film is 10-150 micrometers, Preferably 25-100 micrometers is suitable.

(2)접착층(2) adhesive layer

본 발명의 접착층을 구성하는 바인더는 유리전이온도가 200℃ 이상인 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체의 혼합물로 구성되는데, 여기서 폴리이미드 수지는 내열성이 우수하면서도 어느 정도의 접착력을 갖는 형태로 하여 디아민과 디안하이드라이드로 공중합을 통해 제조되며, 분자량은 10,000∼1,000,000, 더욱 바람직하게는 50,000∼500,000이다. 만일, 50,000 미만의 분자량을 가지면 열분해 온도가 낮아 내열성이 부족하며, 500,000 보다 크면 접착력을 전혀 갖지 못하여 사용이 불가능하다.The binder constituting the adhesive layer of the present invention is composed of a mixture of a polyimide copolymer having an glass transition temperature of 200 ° C. or more and an acrylonitrile / butadiene copolymer, wherein the polyimide resin has a good heat resistance and a certain adhesive strength. It is prepared by copolymerization with diamine and dianhydride, the molecular weight is 10,000 to 1,000,000, more preferably 50,000 to 500,000. If the molecular weight is less than 50,000, the pyrolysis temperature is low, and thus the heat resistance is insufficient. If the molecular weight is greater than 500,000, the adhesive may not have any adhesive force and thus cannot be used.

본 발명에서 사용된 폴리이미드 수지는 특히 유리전이온도가 200℃ 이상이어야 한다. 그 이유는 리드온칩 테이프의 공정온도가 300∼400℃ 정도이기 때문에 접착층을 형성하는 물질이 공정온도보다 조금 낮은 온도에서 유동성을 가져야 하며, 접착력이 탁월한 고무 성분과 혼합할 경우 고무 성분에 부족한 내열성을 보완하기위해 유리전이온도가 높은 폴리이미드를 사용하여야만 적절한 접착력을 나타내기 때문이다. 폴리이미드의 유리전이온도가 200℃ 보다 낮으면 내열성이 부족하여 패키지의 재료로 사용할 수 없다.The polyimide resin used in the present invention should have a glass transition temperature of 200 ° C. or higher in particular. The reason is that since the process temperature of lead-on chip tape is about 300 ~ 400 ℃, the material forming the adhesive layer should have fluidity at a temperature slightly lower than the process temperature. This is because polyimide with a high glass transition temperature is used to compensate for proper adhesion. If the glass transition temperature of the polyimide is lower than 200 ° C., heat resistance may be insufficient and thus it may not be used as a material of the package.

접착층을 구성하는 바인더 중 아크릴로니트릴/부타디엔 고무 성분으로서는 니트릴기의 함량이 5∼50중량%인 것이 바람직한 바, 만일 니트릴기 함량이 5중량% 미만이면 끈적끈적한 보호필름을 사용해야 하며, 50중량% 초과면 접착층의 유동성이 감소되어 고온에서 접착력이 감소한다. 분자량은 10,000∼500,000, 바람직하게는 50,000∼300,000인 니트릴 고무를 사용할 수 있다.As the acrylonitrile / butadiene rubber component of the binder constituting the adhesive layer, the content of nitrile group is preferably 5 to 50% by weight. If the content of the nitrile group is less than 5% by weight, a sticky protective film should be used. If the excess surface adhesive layer of the fluidity is reduced, the adhesive force is reduced at high temperatures. A nitrile rubber having a molecular weight of 10,000 to 500,000, preferably 50,000 to 300,000 can be used.

아크릴로니트릴/부타디엔 고무는 폴리이미드 공중합체 100중량부에 대하여 10∼200중량부, 더욱 바람직하게는 20∼100중량부로 첨가하는 것이 바람직하다. 만일, 아크릴로니트릴/부타디엔 고무의 함량이 폴리이미드 공중합체 100중량부에 대하여 20중량부 미만이면 내열성은 높으나 접착력이 저하되어 에폭시 몰딩 조건하에서 열에 의해 단락이 일어나 패키지의 불량의 원인이 되며, 100중량부 초과면 내열성이 현저히 떨어지는 단점이 있다.The acrylonitrile / butadiene rubber is preferably added in an amount of 10 to 200 parts by weight, more preferably 20 to 100 parts by weight, based on 100 parts by weight of the polyimide copolymer. If the content of acrylonitrile / butadiene rubber is less than 20 parts by weight with respect to 100 parts by weight of the polyimide copolymer, the heat resistance is high, but the adhesive strength is lowered, causing short circuit due to heat under epoxy molding conditions, resulting in a package defect. If the weight part exceeds, there is a disadvantage that the heat resistance is significantly lower.

한편, 본 발명의 접착층은 상기 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 이외에 필요하다면 다음과 같은 첨가제를 포함할 수 있다.On the other hand, the adhesive layer of the present invention may include the following additives if necessary in addition to the polyimide copolymer and acrylonitrile / butadiene.

(a)가황제(a) vulcanizing agent

고무 성분의 열에 의한 자기 가교성능을 향상시키기 위해 가황제를 사용할 수 있는 바, 그 예로는 황, 디메틸퍼옥사이드 등을 들 수 있다. 그 함량은 바인더 100중량부에 대하여 0.01∼1중량부, 바람직하게는 0.05∼0.50중량부이다. 만일0.05중량부 미만이면 저온경화 효과가 거의 일어나지 않으며, 0.50중량부 초과면 경화효과가 더 이상 커지지 않는다.In order to improve the self-crosslinking performance by heat of the rubber component, a vulcanizing agent may be used. Examples thereof include sulfur and dimethyl peroxide. The content is 0.01-1 weight part with respect to 100 weight part of binders, Preferably it is 0.05-0.50 weight part. If it is less than 0.05 parts by weight, the low-temperature curing effect hardly occurs, and if it is more than 0.50 parts by weight, the curing effect is no longer increased.

(b)경화제(b) hardener

경화제로는 4-아미노페닐설폰, 1,1-메틸이미다졸 등과 같은 알려진 에폭시 경화제를 사용할 수 있으며, 그 함량은 바인더 100중량부에 대하여 0.01∼1중량부, 바람직하게는 0.03∼0.30중량부이다. 만일, 그 함량이 0.03중량부 미만이면 경화개선이 미미하고, 0.30중량부 초과면 더 이상의 경화효과가 없다.As the curing agent, known epoxy curing agents such as 4-aminophenylsulfone, 1,1-methylimidazole and the like can be used, and the content thereof is 0.01 to 1 parts by weight, preferably 0.03 to 0.30 parts by weight based on 100 parts by weight of the binder. to be. If the content is less than 0.03 parts by weight, the curing improvement is insignificant, and if it exceeds 0.30 parts by weight, there is no further curing effect.

(c)경화촉진제(c) hardening accelerator

경화촉진제(crosslinking activator)로는 아연 화합물들을 사용하며, 이들은 가황제와 복합체를 이루어 경화의 상승효과를 나타내기도 한다. 경화촉진제의 예로는 아연, 산화아연, 황화아연 등을 사용할 수 있으며, 첨가량은 바인더 100중량부에 대하여 0.02∼1중량부, 바람직하게는 0.10∼0.50중량부이다. 만일, 그 첨가량이 0.10중량부 미만이면 경화정도의 개선효과가 없고, 0.50중량부 초과면 더 이상의 상승효과가 없어 경제적 측면에서 의미가 없다.Zinc compounds are used as crosslinking activators, and they form a complex with a vulcanizing agent to show a synergistic effect of curing. Examples of the curing accelerator may be zinc, zinc oxide, zinc sulfide, and the like, and the amount is 0.02 to 1 part by weight, preferably 0.10 to 0.50 part by weight based on 100 parts by weight of the binder. If the added amount is less than 0.10 parts by weight, there is no improvement effect of the degree of curing, and if the amount is more than 0.50 parts by weight, there is no synergistic effect and there is no meaning in terms of economy.

(d)난연제(d) flame retardants

본 발명에서는 접착층의 난연성을 향상시키기 위해 인계 난연제를 첨가할 수 있다. 난연제의 예로는 9,10-디하이드로-9-옥소-10-포스파페난트렌-10-옥사이드, 3-하이드록시페닐 포스피닐 프로파노익 에시드, 디페닐-1,2-디-하이드록시에틸포스핀 옥사이드 등과 같은 인을 함유하는 화합물들을 들 수 있다. 이들의 첨가량은 바인더 100중량부에 대하여 0.02∼2중량부, 바람직하게는 0.10∼1중량부이다. 만일,그 첨가량이 0.10중량부 미만이면 난연성의 개선효과가 없고 1중량부 초과면 접착력을 떨어뜨리며 가격적인 면에서도 장점이 없다.In the present invention, a phosphorus-based flame retardant may be added to improve the flame retardancy of the adhesive layer. Examples of flame retardants include 9,10-dihydro-9-oxo-10-phosphaphenanthrene-10-oxide, 3-hydroxyphenyl phosphinyl propanoic acid, diphenyl-1,2-di-hydroxyethyl Phosphorus containing compounds such as phosphine oxide and the like. These addition amounts are 0.02-2 weight part with respect to 100 weight part of binders, Preferably they are 0.10-1 weight part. If the added amount is less than 0.10 parts by weight, there is no effect of improving flame retardancy, and if the amount is more than 1 part by weight, the adhesive strength is lowered and there is no advantage in terms of price.

본 발명에서는 필러는 첨가하지 않는다.In the present invention, no filler is added.

한편, 본 발명에서 바인더로서 사용되는 폴리이미드의 중합은 2 단계를 거쳐 진행된다. 첫 번째는 디아민과 산무수물과의 축합을 위한 폴리아미드산 제조이며, 두 번째는 제조된 폴리아미드산의 이미드화로, 산촉매를 사용하여 폐환하는 화학적 이미드화 방법과 고온에 의한 열이미드화 두가지 방법이 있다.On the other hand, the polymerization of the polyimide used as the binder in the present invention proceeds through two steps. The first is the production of polyamic acid for condensation of diamines and acid anhydrides, and the second is the imidation of polyamic acid produced, which is a chemical imidization method using an acid catalyst for ring closure and thermal imidization at high temperatures. There is a way.

폴리아미드산 제조에 사용되는 디아민과 산무수물은 방향족 화합물과 지방족 화합물을 적절히 혼합하는 것이 좋은데, 그 이유는 방향족 화합물로부터의 내열성, 지방족 화합물로부터의 접착성을 동시에 충족시킬 수 있기 때문이다.The diamine and acid anhydride used in the production of the polyamic acid are preferably mixed with an aromatic compound and an aliphatic compound, because the heat resistance from the aromatic compound and the adhesion from the aliphatic compound can be simultaneously satisfied.

위의 바인더 및 첨가제들을 다이메틸포름아마이드, 메틸피롤리돈 등의 아민류 용매에 녹이는데, 필요하다면 가열할 수도 있다. 혼합용액의 점도는 100∼10,000cps, 바람직하게는 500∼5,000cps로, 이 범위 내에서만 콤마 코팅이 가능하며 코팅 조건은 200℃에서 10분이며, 온도를 더 높힐 경우에는 코팅시간을 줄일 수는 있지만, 이 경우 필름의 심한 컬링이 일어나므로 용매를 제거할 만큼의 저온이 적당하다. 코팅에 의해 건조 후 수득한 접착층의 피복 두께는 2∼100㎛, 바람직하게는 15∼50㎛이다.The above binder and additives are dissolved in amine solvents such as dimethylformamide and methylpyrrolidone, and may be heated if necessary. The viscosity of the mixed solution is 100 to 10,000 cps, preferably 500 to 5,000 cps. The comma can be coated only within this range, and the coating condition is 10 minutes at 200 ° C. However, in this case severe curling of the film occurs, so a low temperature enough to remove the solvent is appropriate. The coating thickness of the adhesive layer obtained after drying by coating is 2-100 탆, preferably 15-50 탆.

이하, 본 발명을 실시예에 의거 상세히 설명하면 다음과 같은 바, 본 발명이 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by the Examples.

실시예 1Example 1

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.05몰과 아미노페녹시벤젠 0.05몰을 차례대로 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.05몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.05몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.05 mol of methylene dianiline and 0.05 mol of aminophenoxybenzene were sequentially added thereto, followed by dissolving at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.05 mole of benzophenone tetracarboxylic dianhydride and 0.05 mole of ethylene glycol tetracarboxylic dianhydride are slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 1이라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 1)).

PA 1에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 30중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 23±1㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.30 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) was added to PA 1, and a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 23 ± 1 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

실시예 2Example 2

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.05몰과 아미노페녹시벤젠 0.05몰을 차례대로 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.1몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.05 mol of methylene dianiline and 0.05 mol of aminophenoxybenzene were sequentially added thereto, followed by dissolving at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.1 mole of benzophenone tetracarboxylic dianhydride was slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution became high to synthesize polyamic acid. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 2라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 2).

PA 2에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 30중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 22±2㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.30 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) was added to PA 2, and a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 22 ± 2 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

실시예 3Example 3

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.05몰과 아미노페녹시벤젠 0.05몰을 차례대로 투입하고 상온에서 20분간 용해시켰다.이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.05몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.05몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.05 mol of methylene dianiline and 0.05 mol of aminophenoxybenzene were sequentially added thereto, followed by dissolving at room temperature for 20 minutes. At this time, the temperature of the solution rose to about 40 ° C., so that the temperature of the solution dropped to about 5 ° C. after 20 minutes. Again, 0.05 mole of benzophenone tetracarboxylic dianhydride and 0.05 mole of ethylene glycol tetracarboxylic dianhydride are slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 3이라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 3).

PA 3에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 30중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 22±1㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.30 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) was added to PA 3, and a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 22 ± 1 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

비교예 1Comparative Example 1

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.03몰과 아미노페녹시벤젠 0.07몰을 차례대로 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.02몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.08몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. To this, 0.03 mol of methylene dianiline and 0.07 mol of aminophenoxybenzene were sequentially added and dissolved at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.02 mol of benzophenone tetracarboxylic dianhydride and 0.08 mol of ethylene glycol tetracarboxylic dianhydride are slowly added thereto to react for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 4라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 4).

PA 4에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 30중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 23±1㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.30 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) was added to PA 4, and a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 23 ± 1 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

비교예 2Comparative Example 2

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 헥사메틸렌디아민 0.1몰을 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.05몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.05몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.1 mol of hexamethylenediamine was added thereto and dissolved at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.05 mole of benzophenone tetracarboxylic dianhydride and 0.05 mole of ethylene glycol tetracarboxylic dianhydride are slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 5라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 5).

PA 5에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 30중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 24㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.30 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) was added to PA 5, and a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 24 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape.

비교예 3Comparative Example 3

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.05몰과 아미노페녹시벤젠 0.05몰을 차례대로 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.05몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.05몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.05 mol of methylene dianiline and 0.05 mol of aminophenoxybenzene were sequentially added thereto, followed by dissolving at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.05 mole of benzophenone tetracarboxylic dianhydride and 0.05 mole of ethylene glycol tetracarboxylic dianhydride are slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 1이라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 1)).

PA 1에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 120중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 23±1㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.Add acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) to PA 1 by 120 parts by weight, and then mix polyimide / acrylonitrile / butadiene solution with Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 23 ± 1 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

비교예 4Comparative Example 4

1,000㎖의 삼구 교반기에 질소를 환류시키면서 316㎖의 N-메틸-2-피롤리돈 용매를 넣고 질소 분위기 하에서 10분간 방치하였다. 여기에 메틸렌디아닐린 0.05몰과 아미노페녹시벤젠 0.05몰을 차례대로 투입하고 상온에서 20분간 용해시켰다. 이때, 용액의 온도가 40℃ 정도로 상승하므로 20분 후에 용액의 온도를 5℃ 정도로 떨어뜨렸다. 다시, 여기에 벤조페논 테트라카르복실산 2무수물 0.05몰, 에틸렌글리콜 테트라카르복실산 2무수물 0.05몰을 서서히 첨가하여 5시간 동안 반응시켜 용액의 점도가 높아졌을 때 반응을 중지시켜 폴리아미드산을 합성하였다. 이렇게 얻어진 폴리아미드산의 점도는 2,000cps 정도였다.316 ml of N-methyl-2-pyrrolidone solvent was added to a 1,000 ml three-neck stirrer while refluxing nitrogen, and the mixture was allowed to stand for 10 minutes under a nitrogen atmosphere. 0.05 mol of methylene dianiline and 0.05 mol of aminophenoxybenzene were sequentially added thereto, followed by dissolving at room temperature for 20 minutes. At this time, since the temperature of the solution rises to about 40 ° C, the temperature of the solution was dropped to about 5 ° C after 20 minutes. Again, 0.05 mole of benzophenone tetracarboxylic dianhydride and 0.05 mole of ethylene glycol tetracarboxylic dianhydride are slowly added thereto and reacted for 5 hours to stop the reaction when the viscosity of the solution becomes high to synthesize polyamic acid. It was. The viscosity of the polyamic acid thus obtained was about 2,000 cps.

합성된 폴리아미드산에 파라톨루엔 술폰산을 소량 첨가하고 톨루엔을 공비로 넣어 200℃에서 3시간 동안 교반시켜 화학적 이미드화시킨 후 감압하여 용매를 날린 후 메탄올과 물로 침전을 잡은 후 건조시켜 폴리이미드(이하, PA 1라 함)를 얻었다.A small amount of paratoluene sulfonic acid was added to the synthesized polyamic acid, and toluene was added at azeotropy, stirred at 200 ° C. for 3 hours, chemical imidization was carried out, and the solvent was removed under reduced pressure, and then precipitated with methanol and water, followed by drying. , PA 1)).

PA 1에 아크릴로니트릴/부타디엔(Nipol-33, Nippon Zeon사 제품)을 10중량부만큼 첨가한 후 폴리이미드/아크릴로니트릴/부타디엔 혼합용액을 Apical NPI(폴리이미드 필름, Kaneka사 제품) 50㎛의 한쪽 표면상에 콤마 나이프를 사용하여 코팅하여 200℃에서 10분간 경화시켜 피복두께 22±2㎛의 접착테이프를 제조한 후 필름의 후면에도 똑같은 방법으로 접착층을 코팅하여 폴리이미드 접착테이프를 제조하였다.After adding 10 parts by weight of acrylonitrile / butadiene (Nipol-33, manufactured by Nippon Zeon) to PA 1, a polyimide / acrylonitrile / butadiene mixed solution was added to Apical NPI (polyimide film, manufactured by Kaneka) 50 μm. The surface of the film was coated with a comma knife and cured at 200 ° C. for 10 minutes to prepare an adhesive tape having a coating thickness of 22 ± 2 μm. Then, the adhesive layer was coated on the back of the film in the same manner to prepare a polyimide adhesive tape. .

상기 실시예 및 비교예에 따라 얻어진 접착테이프에 대하여 다음과 같은 평가방법으로 평가하여 그 결과를 다음 표 1에 나타내었다.The adhesive tapes obtained according to the above Examples and Comparative Examples were evaluated by the following evaluation method, and the results are shown in Table 1 below.

(1)접착특성(1) Adhesive characteristics

코팅 제조된 접착테이프를 10mm×10mm의 크기로 자른 후, 표준형의 동박의 한쪽면에 HSM(Hot Stamping Machine)을 사용하여 400℃, 0.6atm, 2초간 압착하여 샘플을 만들었다. 만능시험기(Instron 4303, Instron사)에 걸고 100mm/min의 속도로 당겨 동박과 필름 접착층 사이의 박리력을 측정하였다.The coated adhesive tape was cut to a size of 10 mm × 10 mm, and then pressed onto 400 ° C., 0.6 atm, and 2 seconds using a hot stamping machine (HSM) on one side of a standard copper foil to prepare a sample. The peel force between the copper foil and the film adhesive layer was measured by pulling on a universal testing machine (Instron 4303, Instron Co., Ltd.) at a speed of 100 mm / min.

(2)내열특성(2) heat resistance

다음의 두가지 방법을 사용하였다.The following two methods were used.

①TAG(Thermogravimetric Analysis)에 의해 400℃ 잔존량을 측정하였다.① 400 degreeC residual amount was measured by TAG (Thermogravimetric Analysis).

②SYBRON Themolyne 42900 Furnace에 동박 접착된 샘플을 넣고 450℃, 3분간 두어 접착 표면의 깨짐 정도를 관찰하여 전혀 변화가 없으며 양호, 조금이라도 이상이 있으며 보통, 접착층의 탄 정도가 심하면 불량으로 평가하였다.② SYBRON The molyne 42900 Furnace put copper-bonded samples and placed at 450 ℃, 3 minutes to observe the degree of cracking of the adhesive surface was not changed at all, there is no change, good, even a little abnormal.

(3)절연성(3) insulation

코팅 제조된 접착테이프를 항온항습 조건 하에서 24℃, 45% RH하에서 24시간 방치하였다. 그 후, High Current Measurement Unit Keithley 238로 100V의 전압을 걸어 전류량을 측정하였다.The prepared adhesive tape was allowed to stand at 24 ° C. and 45% RH for 24 hours under constant temperature and humidity conditions. Subsequently, the amount of current was measured by applying a voltage of 100 V with the High Current Measurement Unit Keithley 238.

한편, 수득한 폴리이미드의 유리전이온도는 Perkin Elmer DSC7으로 측정하였다.In addition, the glass transition temperature of the obtained polyimide was measured by Perkin Elmer DSC7.

실 시 예Example 비 교 예Comparative Example 1One 22 33 1One 22 33 44 폴리이미드 공중합체Polyimide copolymer 폴리이미드 No.Polyimide No. 1One 22 33 44 55 1One 1One 유리전이온도(℃)Glass transition temperature (℃) 245245 255255 250250 185185 198198 245245 245245 접착력(g/cm)Adhesive force (g / cm) 400℃400 ℃ 130130 140140 130130 150150 180180 310310 3030 내열성Heat resistance 400℃ residue(%)400 ℃ residue (%) 9898 9797 9797 9595 8989 8787 8787 Furnace TestFurnace test 양호Good 양호Good 양호Good 보통usually 보통usually 보통usually 양호Good 절연성Insulation 전류값(A)Current value (A) 2×10-12 2 × 10 -12 4×10-12 4 × 10 -12 3×10-12 3 × 10 -12 5×10-11 5 × 10 -11 2×10-11 2 × 10 -11 8×10-12 8 × 10 -12 4×10-10 4 × 10 -10

이상에서 상세히 설명한 바와 같이, 본 발명에 따라 유리전이온도가 200℃ 이상인 폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체를 바인더로 하는접착층을 폴리이미드 필름의 양면에 도포한 경우 테이핑시의 온도에서 탁월한 접착력 및 내열성을 보이고 에폭시 몰딩시의 온도 조건 하에서도 접착력을 유지하여 납 프레임의 치수안정성을 향상시킬 수 있어 리드온칩용 접착테이프로 바람직하다.As described in detail above, when the adhesive layer comprising a polyimide copolymer having an glass transition temperature of 200 ° C. or more and an acrylonitrile / butadiene copolymer as binders on both sides of the polyimide film according to the present invention, at the temperature at the time of taping It is preferable as an adhesive tape for lead-on chip because it shows excellent adhesion and heat resistance and can maintain the adhesion even under the temperature condition during epoxy molding to improve the dimensional stability of the lead frame.

Claims (4)

폴리이미드 공중합체와 아크릴로니트릴/부타디엔 공중합체를 바인더로 포함하는 접착층을 내열성 필름의 양면에 도포하여 제조된 내열성 접착테이프.A heat resistant adhesive tape prepared by applying an adhesive layer comprising a polyimide copolymer and an acrylonitrile / butadiene copolymer as a binder on both sides of a heat resistant film. 제 1 항에 있어서, 폴리이미드 공중합체는 유리전이온도가 200℃ 이상인 것임을 특징으로 하는 내열성 접착테이프.The heat resistant adhesive tape according to claim 1, wherein the polyimide copolymer has a glass transition temperature of 200 ° C or higher. 제 1 항에 있어서, 접착층은 폴리이미드 공중합체 100중량부에 대하여 아크릴로니트릴/부타디엔 공중합체를 20∼100중량부로 함유하는 것임을 특징으로 하는 내열성 접착테이프.The heat-resistant adhesive tape according to claim 1, wherein the adhesive layer contains 20 to 100 parts by weight of acrylonitrile / butadiene copolymer with respect to 100 parts by weight of polyimide copolymer. 제 1 항에 있어서, 내열성 필름은 폴리이미드 필름인 것임을 특징으로 하는 내열성 접착테이프.The heat resistant adhesive tape according to claim 1, wherein the heat resistant film is a polyimide film.
KR1020000068333A 2000-11-17 2000-11-17 Adhesive tape KR100625055B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020000068333A KR100625055B1 (en) 2000-11-17 2000-11-17 Adhesive tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020000068333A KR100625055B1 (en) 2000-11-17 2000-11-17 Adhesive tape

Publications (2)

Publication Number Publication Date
KR20020038232A true KR20020038232A (en) 2002-05-23
KR100625055B1 KR100625055B1 (en) 2006-09-18

Family

ID=19699598

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000068333A KR100625055B1 (en) 2000-11-17 2000-11-17 Adhesive tape

Country Status (1)

Country Link
KR (1) KR100625055B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005100500A1 (en) * 2004-04-16 2005-10-27 Kolon Industries Inc. Adhesive tape
KR101290731B1 (en) * 2013-01-15 2013-07-29 (주)디포인덕션 Induction range having thermal isolation from top plate using blanket and nano prosidad powder

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4543295A (en) * 1980-09-22 1985-09-24 The United States Of America As Represented By The Director Of The National Aeronautics And Space Administration High temperature polyimide film laminates and process for preparation thereof
JPH06216521A (en) * 1993-01-12 1994-08-05 Toshiba Chem Corp Adhesive composition for flexible printed circuit board
JPH06287523A (en) * 1993-04-05 1994-10-11 Nippon Steel Chem Co Ltd Heat-resistant adhesive film
JPH06340856A (en) * 1993-05-31 1994-12-13 Nitto Denko Corp Frame-retardant adhesive

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005100500A1 (en) * 2004-04-16 2005-10-27 Kolon Industries Inc. Adhesive tape
KR101290731B1 (en) * 2013-01-15 2013-07-29 (주)디포인덕션 Induction range having thermal isolation from top plate using blanket and nano prosidad powder
WO2014112664A1 (en) * 2013-01-15 2014-07-24 (주)디포인덕션 Induction range having adiabatic top structure using blanket and inorganic particles
CN104054392A (en) * 2013-01-15 2014-09-17 迪珀电磁设备有限公司 Induction range having adiabatic top structure using blanket and inorganic particles

Also Published As

Publication number Publication date
KR100625055B1 (en) 2006-09-18

Similar Documents

Publication Publication Date Title
US6538093B2 (en) Polyimide silicone resin, process for its production, and polyimide silicone resin composition
KR101419293B1 (en) Resin composition, prepreg using same, metal foil with resin, adhesive film, and metal-clad laminate
US6887580B2 (en) Adhesive polyimide resin and adhesive laminate
US6329050B1 (en) Adhesive for electronic parts and adhesive tape for electronic parts
KR100287238B1 (en) Adhesive Tapes and Liquid Adhesives for Electronic Components
CN101245231A (en) Adhesive composition, adhesive film, and method for producing semiconductor device
JP2961642B2 (en) Adhesive tape and liquid adhesive for electronic parts
US7843045B2 (en) Thermoplastic resin composition for semiconductor, adhesion film, lead frame, and semiconductor device using the same, and method of producing semiconductor device
KR20100059812A (en) Primer resin for semiconductor device, and semiconductor device
US20050165196A1 (en) Adhesive resin and film adhesive made by using the same
KR100625055B1 (en) Adhesive tape
JP3650493B2 (en) Adhesive tape for electronic parts
KR100635053B1 (en) Adhesive tape for electronic components
KR100625054B1 (en) Thermally stable adhesive tape
US6045886A (en) Adhesive tape for electronic parts
US5725948A (en) Adhesive tape for electronic parts and liquid adhesive
JP3839887B2 (en) Adhesive tape for electronic parts
KR100307061B1 (en) Adhesive tape for electronic parts
JPH01304165A (en) Adhesive composition
KR100707732B1 (en) Adhesive and adhesive tape for electronic accessories
JP3011302B2 (en) Coated electrical conductor
JP3304479B2 (en) TAB adhesive tape
KR100613754B1 (en) Adhesive tape
TW202140673A (en) Resin composition and resin sheet
JP2006282973A (en) Adhesive film, lead frame with adhesive film, and semiconductor device using them

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120619

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20130830

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20140829

Year of fee payment: 9

FPAY Annual fee payment

Payment date: 20150826

Year of fee payment: 10

FPAY Annual fee payment

Payment date: 20180903

Year of fee payment: 13