KR100613754B1 - Adhesive tape - Google Patents

Adhesive tape Download PDF

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KR100613754B1
KR100613754B1 KR1020000002120A KR20000002120A KR100613754B1 KR 100613754 B1 KR100613754 B1 KR 100613754B1 KR 1020000002120 A KR1020000002120 A KR 1020000002120A KR 20000002120 A KR20000002120 A KR 20000002120A KR 100613754 B1 KR100613754 B1 KR 100613754B1
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South Korea
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adhesive tape
weight
heat
adhesive layer
acrylonitrile
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KR1020000002120A
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Korean (ko)
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KR20010073528A (en
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황용하
노향우
박종민
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주식회사 코오롱
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J109/00Adhesives based on homopolymers or copolymers of conjugated diene hydrocarbons
    • C09J109/02Copolymers with acrylonitrile
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L9/00Compositions of homopolymers or copolymers of conjugated diene hydrocarbons
    • C08L9/02Copolymers with acrylonitrile
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • C09J183/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesive Tapes (AREA)

Abstract

본 발명에서는 저온 경화가 가능하고 상온에서 끈적거리지 않으며 테이핑 온도에서 탁월한 접착력 및 내열성을 보이고 에폭시 몰딩 온도조건인 300℃에서도 접착력을 유지하여 납 프레임의 치수 안정성을 향상시킬 수 있는 내열성 접착테이프에 대해 공개한다. 이 내열성 접착테이프는 내열성 베이스 필름 위에 접착층과 보호층이 적층 구성되는 내열성 접착테이프에 있어서, 상기 접착층이 니트릴기 함량이 10~35%인 아크릴로니트릴/부타디엔 공중합체, 실리콘에폭시, 가황제, 경화 촉진제, 난연제로 조성된 것으로, 바람직하게는 아크릴로니트릴/부타디엔 공중합체와 실리콘에폭시 수지의 혼합비가 중량비로 1:0.5~2인 것이다.The present invention discloses a heat-resistant adhesive tape that can be cured at low temperatures, is not sticky at room temperature, exhibits excellent adhesion and heat resistance at a taping temperature, and maintains adhesion even at an epoxy molding temperature condition of 300 ° C. to improve dimensional stability of lead frames. do. The heat resistant adhesive tape is a heat resistant adhesive tape in which an adhesive layer and a protective layer are laminated on a heat resistant base film, wherein the adhesive layer has an acrylonitrile / butadiene copolymer having a nitrile content of 10 to 35%, a silicone epoxy, a vulcanizing agent, and a curing agent. It is composed of an accelerator and a flame retardant. Preferably, the mixing ratio of the acrylonitrile / butadiene copolymer and the silicone epoxy resin is 1: 0.5 to 2 by weight.

접착테이프, 납 프레임, 반도체Adhesive Tape, Lead Frame, Semiconductor

Description

내열성 접착테이프{Adhesive tape}Heat-resistant Adhesive Tape {Adhesive tape}

본 발명은 내열성 접착테이프에 관한 것으로, 보다 상세하게는 저온 경화가 가능하고 상온에서 끈적거리지 않으며 테이핑 온도에서 탁월한 접착력 및 내열성을 보이고 에폭시 몰딩 온도조건인 300℃에서도 접착력을 유지하여 납 프레임의 치수 안정성을 향상시킬 수 있는 내열성 접착테이프에 관한 것이다.The present invention relates to a heat-resistant adhesive tape, and more particularly, it is possible to cure at low temperatures, not sticky at room temperature, showing excellent adhesion and heat resistance at a taping temperature, and maintaining adhesion even at an epoxy molding temperature condition of 300 ° C., thereby ensuring dimensional stability of the lead frame. It relates to a heat resistant adhesive tape that can improve the.

최근 반도체 시장 및 관련 기술들이 급속히 발전하고 반도체 소자 및 전자 부품들의 소형화, 고집적화 및 박형화 추세에 따라, 이들 소자 및 그 부품들의 경박단소화를 이루기 위해 공정의 단순화를 위한 재료를 사용하거나 재료 자체를 박막화하여 사용하고 있다.With the recent rapid development of the semiconductor market and related technologies and the miniaturization, integration and thinning of semiconductor devices and electronic components, the use of materials for the simplification of the process or thinning of the materials themselves is made to achieve the light and small size of these devices and their components. I use it.

또한, 반도체 패키징 분야도 내부 납 핀의 피치(Pitch)화, 박막화 및 다핀화 경향이 나타나고 있으며, 따라서 각 핀의 위치 설정의 정확도에 관한 보다 엄격한 요건을 요구되고 있다.In addition, the field of semiconductor packaging has also shown a tendency to pitch, thin and multi-pin the internal lead pins, and thus demands more stringent requirements regarding the accuracy of the positioning of each pin.

수지 봉지형 반도체 기구에 사용되는 접착테이프는 납 프레임을 고정시키기 위한 테이프, 다이패드 고정 테이프, TAB(Tape Automated Bonding) 테이프 등이 있 다.Adhesive tapes used in resin encapsulated semiconductor devices include tapes for fixing lead frames, die pad fixing tapes, and tape automated bonding (TAB) tapes.

이중 납 프레임 고정용 테이프는 납 프레임 메이커에서 일정한 온도, 압력 및 시간하에 펀칭되어 납 프레임에 접착되고 반도체 메이커가 이를 이용해 반도체 칩을 납 프레임 위에 탑제한 후 에폭시 수지 등을 이용하여 패키징 하는데 사용된다.The double lead frame fixing tape is punched under a constant temperature, pressure and time in a lead frame maker to be bonded to the lead frame, and the semiconductor maker uses it to mount a semiconductor chip on the lead frame and then package it using an epoxy resin.

따라서, 접착테이프가 반도체 패키지 내에 내장되므로 접착테이프는 반도체 공정의 일반적 신뢰도 및 테이핑시의 작업상 그리고 반도체 전체 조립 절차에서 견딜 수 있는 충분한 내열성 및 접착력을 가져야 한다.Therefore, since the adhesive tape is embedded in the semiconductor package, the adhesive tape must have general heat resistance and adhesive strength to withstand the general reliability of the semiconductor process and the operation during taping and the overall semiconductor assembly procedure.

일반적으로 반도체용 접착 테이프는 내열성 필름의 적어도 한 면에 일정한 두께의 접착층을 도포한 후 그 위에 보호층을 라미하여 만든다.In general, an adhesive tape for a semiconductor is made by applying an adhesive layer having a predetermined thickness on at least one side of a heat resistant film and laminating a protective layer thereon.

종래의 접착테이프의 예를 들면, 폴리이미드, 폴리파라페닐렌 설파이드, 폴리에테르 이미드 등의 내열성 필름 위에 폴리아크릴로니트릴, 폴리아크릴레이트, 아크릴로니트릴 부타디엔 공중합체 등의 합성 고무계 수지를 단독 또한 혼합 사용해서 접착층을 형성하였는데, 이들 접착테이프는 내열성 및 접착 강도가 약한 문제점이 있었다.Examples of the conventional adhesive tapes include synthetic rubber-based resins such as polyacrylonitrile, polyacrylates, acrylonitrile butadiene copolymers alone and the like on heat resistant films such as polyimide, polyparaphenylene sulfide, and polyether imide. Although the adhesive layer was formed by mixing, these adhesive tapes had problems of poor heat resistance and adhesive strength.

대한민국 특허 공개번호 93-9213호는 상기 접착층으로 사용하는 조성물로서 아크릴로니트릴/부타디엔 공중합체 100 중량부당 페놀 수지 100 내지 500 중량부로 혼합된 조성이 개시되어 있다.Republic of Korea Patent Publication No. 93-9213 discloses a composition used as the adhesive layer is mixed with 100 to 500 parts by weight of phenol resin per 100 parts by weight of acrylonitrile / butadiene copolymer.

대한민국 특허 공개번호 98-016625호에는 아크릴로니트릴, 탄소수 2~10인 알킬기를 가진 아크릴레이트, 아크릴산, 메타크릴산, 히드록시에틸아크릴레이트 또는 히드록시에틸 메타크릴레이트로 구성된 단량체로 제조된 아크릴 수지와, 비스페놀계 에폭시 및 크레졸노볼락계 에폭시로 구성된 에폭시 수지와, 경화제와 그리고 실리콘 수지로 구성된 접착제 조성물이 개시되어 있다.Korean Patent Publication No. 98-016625 discloses an acrylic resin made of a monomer consisting of acrylonitrile, an acrylate having an alkyl group of 2 to 10 carbon atoms, acrylic acid, methacrylic acid, hydroxyethyl acrylate or hydroxyethyl methacrylate. And an epoxy resin composed of a bisphenol epoxy and a cresol novolac epoxy, a curing agent, and an adhesive composition composed of a silicone resin.

일본특허공개 평7-74213호에는 에폭시 수지 등이 염소 이온 불순물로 인해서 전기 저항이 작아짐으로써 절연 노화가 일어나는 문제를 폴리아미드 수지와 비스말레이미드 수지를 첨가하여 가스-염소 이온 농도를 200ppm 이하로 낮춘 조성물이 개시되어 있다.In Japanese Patent Laid-Open No. 7-74213, an epoxy resin or the like has a low electric resistance due to a chlorine ion impurity, thereby reducing the gas-chlorine ion concentration to 200 ppm or less by adding polyamide resin and bismaleimide resin. A composition is disclosed.

일보특허공개 평6-172524호에는 전기 전자 부품에 사용 가능한 가용성 폴리이미드 수지가 개시되어 있다.Japanese Patent Laid-Open No. Hei 6-172524 discloses a soluble polyimide resin usable for electric and electronic components.

본 발명은 앞서 언급한 종래 기술상의 문제점들을 해결하고자 한 것으로, 그 목적은 저온 경화성이 우수하며 테이핑시의 온도 조건은 물론 에폭시 몰딩시의 온도 조건에서도 접착력을 유지할 수 있는 전자 부품용 내열성 접착테이프를 제공하는 데에 있다.
The present invention is to solve the above-mentioned problems in the prior art, the object of the present invention is to provide a heat-resistant adhesive tape for electronic components that is excellent in low-temperature curing properties and can maintain the adhesive force at the temperature conditions during taping as well as the temperature conditions during epoxy molding. To provide.

본 발명의 목적을 달성하기 위한 접착테이프는 내열성 베이스 필름의 적어도 한 면에 실리콘에폭시, 아크릴로니트릴/부타디엔 공중합체, 가황제, 경화촉진제, 난연제 등으로 구성된 접착층이 도포되고 그 위에 다시 보호층이 적층된 것으로, 상온 및 테이핑 온도에서 높은 접착력 및 내열성을 보이며, 에폭시 몰딩 후의 높은 온도 조건(300℃)에서도 높은 접착력을 유지하는 것을 특징으로 한다.Adhesive tape for achieving the object of the present invention is coated on at least one side of the heat-resistant base film of the adhesive layer consisting of silicon epoxy, acrylonitrile / butadiene copolymer, vulcanizing agent, curing accelerator, flame retardant, etc. It is laminated, and exhibits high adhesion and heat resistance at room temperature and taping temperature, and maintains high adhesion even at high temperature conditions (300 ° C.) after epoxy molding.

본 발명에 사용된 내열성 베이스 필름으로는 폴리에테르이미드, 폴리파라페닐렌 설파이드, 폴리이미드, 폴리에테르케톤 등으로 만든 필름과, 에폭시 수지-유리 직물, 에폭시 수지-폴리이미드-유리 직물과 같은 복합필름이 사용될 수 있는데, 내열성 측면이나 구리 합금과의 열팽창계수의 차이가 가장 작은 폴리이미드 필름을 사용하는 바람직하다. 이 베이스 필름은 두께가 통상적으로 10~150㎛, 바람직하게는 25~100㎛인 것이 적당하다.The heat resistant base film used in the present invention includes a film made of polyetherimide, polyparaphenylene sulfide, polyimide, polyether ketone, and the like, and a composite film such as epoxy resin-glass fabric and epoxy resin-polyimide-glass fabric. Although it can be used, it is preferable to use a polyimide film having the smallest difference in thermal expansion coefficient or thermal expansion coefficient with the copper alloy. It is suitable that this base film is 10-150 micrometers in thickness normally, Preferably it is 25-100 micrometers.

본 발명의 접착층으로는 실리콘에폭시와 아크릴로니트릴/부타디엔 공중합체 등으로 조성된 접착조성물을 코팅하여서 된 것이다.The adhesive layer of the present invention is obtained by coating an adhesive composition composed of silicone epoxy and acrylonitrile / butadiene copolymer.

상기 실리콘 에폭시와 아크릴로니트릴/부타디엔 공중합체의 혼합물은 바인더로서, 실리콘 에폭시는 실록산 구조를 말단에 가지고 있는 에폭시 수지로 분자량이 20,000~1,000,000, 바람직하게는 100,000~500,000인 것을 사용한다. 실리콘 에폭시의 분자량이 100,000 이하인 경우에는 내열성이 떨어지며, 500,000 이상인 경우에는 아크릴로나트릴/부타디엔 공중합체와 상용성과 유동성이 떨어지는 경향이 있다.The mixture of the silicone epoxy and the acrylonitrile / butadiene copolymer is a binder, and the silicone epoxy is an epoxy resin having a siloxane structure at its end, and has a molecular weight of 20,000 to 1,000,000, preferably 100,000 to 500,000. When the molecular weight of the silicone epoxy is 100,000 or less, the heat resistance is inferior, and when it is 500,000 or more, the compatibility and fluidity with the acrylonatril / butadiene copolymer tends to be inferior.

아크릴로니트릴/부타디엔 공중합체는 니트릴기의 함량이 5~50중량%, 바람직하게는 10~35중량%인 것이 좋다. 니트릴기 함량이 10중량% 이하이면 반응성이 작아 경화가 불충분하며 35중량% 이상이면 접착층의 유동성이 감소하여 고온에서 접착력이 떨어진다. 또한 아크릴로니트릴/부타디엔 공중합체는 분자량 10,000~500,000, 바람직하게는 50,000~300000인 니트릴 고무를 사용할 수 있다.The acrylonitrile / butadiene copolymer has a content of nitrile group of 5 to 50% by weight, preferably 10 to 35% by weight. If the nitrile group content is 10% by weight or less, the reactivity is insufficient, and curing is insufficient. If the content is 35% by weight or more, the fluidity of the adhesive layer decreases, resulting in poor adhesion at high temperatures. In addition, the acrylonitrile / butadiene copolymer may use a nitrile rubber having a molecular weight of 10,000 to 500,000, preferably 50,000 to 300000.

상기 바인더의 두 성분의 혼합비는 아크릴로니트릴/부타디엔 100중량부당 실리콘에폭시 수지 10~800중량부, 바람직하게는 50~200 중량부인 것이 좋다. 실리콘에폭시 수지가 50 중량부 이하로 혼합되면 접착력은 높으나 내열성이 저하되어 에폭시 몰딩 조건하에서 열에 의해 분해가 일어나 패키지의 불량의 원인이 되며, 200중량부 이상이면 테이핑 작업온도 및 고온에서 접착력이 현저히 떨어지게 된다.The mixing ratio of the two components of the binder is 10 to 800 parts by weight of silicone epoxy resin, preferably 50 to 200 parts by weight, per 100 parts by weight of acrylonitrile / butadiene. When the epoxy resin is mixed at 50 parts by weight or less, the adhesive strength is high, but the heat resistance is deteriorated, resulting in decomposition due to heat under the epoxy molding condition, which may cause the failure of the package. do.

상기 접착 조성물은 실리콘 에폭시와 아크릴로니트릴/부타디엔 공중합체 이외에 필요하다면 가황제, 경화촉진제, 난연제 등을 첨가하여 사용한다.The adhesive composition may be used by adding a vulcanizing agent, a curing accelerator, a flame retardant, etc. if necessary in addition to the silicone epoxy and acrylonitrile / butadiene copolymer.

상기 가황제는 열에 의한 고무성분의 자체 가교성능을 향상시키기 위해 사용하는데, 이로는 황, 디메틸퍼옥사이드 등이 있다. 그 사용량은 0.01~1중량부, 바람직하게는 0.05~0.50중량부 이다. 가황제 첨가량이 0.05 중량부 이하이면 저온 경화 효과가 거의 일어나지 않으며, 0.50 중량부 이상이면 경화 효과가 더 이상 향상되지 않는다.The vulcanizing agent is used to improve the self-crosslinking performance of the rubber component by heat, such as sulfur, dimethyl peroxide and the like. The usage-amount is 0.01-1 weight part, Preferably it is 0.05-0.50 weight part. If the added amount of the vulcanizing agent is 0.05 parts by weight or less, the low-temperature curing effect hardly occurs, and if it is 0.50 parts by weight or more, the curing effect does not improve any more.

상기 경화촉진제는 가황제와 복합체를 이루어 경화 상승효과를 가져오는 것으로, 이로는 아연 화합물을 사용할 수 있다. 구체적으로는 아연(Zinc), 징크 옥사이드(Zinc oxide), 징크 설페이트(Zinc sulfate) 등을 0.02~1중량부, 바람직하게는 0.10~0.50중량부로 사용한다. 아연 화합물 첨가량이 0.10중량부 이하이면 경화 정도의 개선 효과가 없고, 0.50중량부 이상이면 더 이상의 상승 효과가 없다.The curing accelerator is a composite with a vulcanizing agent to bring a curing synergistic effect, which can be used as a zinc compound. Specifically, zinc (Zinc), zinc oxide (Zinc oxide), zinc sulfate (Zinc sulfate) and the like are used in an amount of 0.02 to 1 parts by weight, preferably 0.10 to 0.50 parts by weight. If the amount of the zinc compound added is 0.10 parts by weight or less, there is no improvement effect of the degree of curing, and if it is 0.50 parts by weight or more, there is no further synergistic effect.

상기 난연제는 접착층의 난연성 향상을 위한 것으로 통상 인계 난연제를 첨가 사용한다. 이로는 9,10-디하이드로-9-옥사-10-포스파페난트렌-10-옥사이드, 3-하이드록시페닐 포스피닐 프로파노일산, 다이페닐-1,2-디-하이드록시에틸포스핀 옥사이드 등이 있다. 난연제의 첨가량은 0.02~2중량부, 바람직하게는 0.10~1중량부 이며, 첨가량이 0.10중량부 이하이면 난연성의 개선효과가 없고, 1중량부 이상이면 접착력이 떨어지고 가격적인 면에서 장점이 없다.The flame retardant is to improve the flame retardancy of the adhesive layer is usually used by adding a phosphorus flame retardant. These include 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 3-hydroxyphenyl phosphinyl propanoyl acid, diphenyl-1,2-di-hydroxyethylphosphine oxide Etc. The amount of the flame retardant added is 0.02 to 2 parts by weight, preferably 0.10 to 1 part by weight, and when the amount is 0.10 parts by weight or less, there is no effect of improving flame retardancy.

접착 조성물은 상기 바인더 및 첨가제들을 메틸에틸케톤, 톨루엔, 사이클로헥산 등의 용제에 녹인 후 90℃에서 1시간정도 예비 큐어링을 시켜서 저온 경화성을 향상시킨 것으로 도포에 의해 접착층을 형성한다. 여기서 상기 바인더, 첨가제, 용제의 혼합용액은 콤마 코팅이 가능한 점도을 갖는 것이 좋은데, 그 범위는 100~10,000cps, 바람직하게는 500~5,000cps 이다. 접착층의 피복 두께는 2~50㎛, 바람직하게는 10~25㎛ 인 것이 좋다.In the adhesive composition, the binder and the additives are dissolved in a solvent such as methyl ethyl ketone, toluene, cyclohexane, and then preliminarily cured at 90 ° C. for about 1 hour to improve low temperature curability, thereby forming an adhesive layer by coating. Here, the binder, the additive, the mixed solution of the solvent is good to have a viscosity capable of comma coating, the range is 100 ~ 10,000cps, preferably 500 ~ 5,000cps. The coating thickness of an adhesive layer is 2-50 micrometers, Preferably it is 10-25 micrometers.

상기 보호층은 후공정에 사용하기에 편리하도록 제공되는 것으로, 폴리에틸렌, 폴리프로필렌, 폴리에틸렌테레프탈레이트, 불소수지 필름 등이 사용된다. 끈적거리는 경우엔 실리콘 수지를 사용한 이형필름으로 박리 특성을 부여할 수 있다. 다만 이 경우에는 접착층으로의 실리콘의 전사가 없어야 한다. 보호층의 적정두께는 1~200㎛, 바람직하게는 12~50㎛ 인 것이 좋다.The protective layer is provided to be convenient for use in a later process, and polyethylene, polypropylene, polyethylene terephthalate, a fluororesin film, and the like are used. In the case of stickyness, the peeling property may be imparted with a release film using a silicone resin. In this case, however, there should be no transfer of silicon to the adhesive layer. The proper thickness of the protective layer is 1 ~ 200㎛, preferably 12 ~ 50㎛.

이하, 본 발명에 따른 내열성 접착테이프에 대해 실시예를 참조하여 더욱 더 상세히 설명하고자 한다.Hereinafter, the heat-resistant adhesive tape according to the present invention will be described in more detail with reference to Examples.

실시예 1Example 1

니트릴기 함량이 27%인 Nipol-34(Nippon Zeon사) 20g, 에폭시 실리콘(Tego사 제품, EW Silikoftal, 고형분 80%) 20g을 메틸에틸케톤(MEK)에 80g에 용해시킨 후 황(Sulfur) 0.5g, 징크옥사이드 0.5g, 3-하이드록시페닐 포스피닐 프로파노일산 1g 을 첨가한다. 이 혼합용액을 90℃로 1시간 교반한 후 상온에 3시간 방치한다. 방치한 용액을 50㎛ 두께의 폴리이미드 필름(Kaneka사 제품 Apical NPI)의 한쪽 표면에 콤마 나이프(Comma Knife)를 사용 코팅하여 140℃에서 3분간 경화시켜, 피복두께 18±3㎛인 접착층을 형성한 다음, 무처리된 두께 38㎛의 PET 필름(코오롱사 제품 FD01)에 라미하여 내열성 접착테이프를 만들었다.20 g of Nipol-34 (Nippon Zeon) having a nitrile content of 27% and 20 g of epoxy silicone (Tego, EW Silikoftal, 80% solids) were dissolved in 80 g of methyl ethyl ketone (MEK), followed by sulfur 0.5 g, 0.5 g of zinc oxide, and 1 g of 3-hydroxyphenyl phosphinyl propanoic acid are added. The mixed solution is stirred at 90 ° C. for 1 hour and then left to stand at room temperature for 3 hours. The left solution was coated on one surface of a 50 μm-thick polyimide film (Apical NPI, manufactured by Kaneka) using a comma knife to cure at 140 ° C. for 3 minutes to form an adhesive layer with a coating thickness of 18 ± 3 μm. Thereafter, a heat-resistant adhesive tape was laminated on an untreated PET film having a thickness of 38 μm (KOLON FD01).

실시예 2Example 2

니트릴기 함량이 33%인 Nipol-33(Nipon Zeon사 제품) 20g, 에폭시 실리콘(Tego사 제품 EW Silikoftal, 고형분 80%) 25g을 MEK 80g에 용해시킨 후, 황 0.5g, 징크옥사이드 0.5g, 3-하이드록시페닐 포스피닐 프로파노일산 1g을 첨가한다. 이 혼합용액을 90℃에서 1시간 교반한 후 상온에서 3시간 방치한다. 방치한 용액을 50㎛ 두께의 폴리이미드 필름(Kaneka사 제품 Apical NPI)의 한쪽 표면에 콤마 나이프를 사용 코팅하고 140℃에서 3분간 경화시켜 피복두께 19±1㎛의 접착층을 형성하고, 무처리된 두께 38㎛의 PET 필름(코오롱사 제품 FD01)에 라미하여 접착테이프를 만들었다.20 g of Nipol-33 (made by Nipon Zeon) with a nitrile content of 33% and 25 g of epoxy silicone (EW Silikoftal, 80% solids) made by Tego were dissolved in 80 g of MEK, followed by 0.5 g of sulfur and 0.5 g of zinc oxide, 3 Add 1 g of hydroxyphenyl phosphinyl propanoic acid. The mixed solution is stirred at 90 ° C. for 1 hour and then left to stand at room temperature for 3 hours. The left solution was coated with a comma knife on one surface of a 50 μm thick polyimide film (Apical NPI, manufactured by Kaneka), and cured at 140 ° C. for 3 minutes to form an adhesive layer having a coating thickness of 19 ± 1 μm. An adhesive tape was prepared by laminating a 38-micrometer-thick PET film (KOLON FD01).

비교예 1Comparative Example 1

니트릴기 함량이 41%인 Nipol-20(Nippon Zeon사 제품) 40g, 에폭시 실리콘(Tego사 제품 EW Silikoftal, 고형분 80%) 20g을 MEK 80g에 용해시킨 후, 황 0.5g, 징크옥사이드 0.5g, 3-하이드록시페닐 포스피닐 프로파노일산 1g을 첨가한다. 이 혼합용액을 90℃에서 1시간 교반한 후 상온에서 3시간 방치한다. 방치한 용액을 50㎛ 두께의 폴리이미드 필름(Kaneka사 제품 Apical NPI) 한쪽 표면에 콤마 나이프를 사용 코팅하여 140℃에서 3분간 경화하여 피복 두께 19±2㎛의 접착층을 형성하고, 무처리된 두께 38㎛의 PET 필름(코오롱사 제품 FD01)에 라미하여 접착테이프를 만들었다.40 g of Nipol-20 (manufactured by Nippon Zeon) with a nitrile content of 41% and 20 g of epoxy silicone (EW Silikoftal, 80% solids) by Tego were dissolved in 80 g of MEK, followed by 0.5 g of sulfur and 0.5 g of zinc oxide, 3 Add 1 g of hydroxyphenyl phosphinyl propanoic acid. The mixed solution is stirred at 90 ° C. for 1 hour and then left to stand at room temperature for 3 hours . The left solution was coated with a comma knife on one surface of a 50 μm-thick polyimide film (Apical NPI, manufactured by Kaneka), and cured at 140 ° C. for 3 minutes to form an adhesive layer having a coating thickness of 19 ± 2 μm. An adhesive tape was prepared by laminating on a 38 μm PET film (KOLON FD01).

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비교예 2Comparative Example 2

니트릴기 함량이 27%인 Nipol-34(Nippon Zeon사 제품) 20g, 에폭시 실리콘(Tego사 제품 EW Silikoftal, 고형분 80%) 60g을 MEK 80g에 용해시킨 후, 황 0.5g, 징크옥사이드 0.5g, 3-하이드록시페닐 포스피닐 프로파노일산 1g을 첨가한다. 이 혼합용액을 90℃에서 1시간 교반한 후 상온에 3시간 방치한다. 방치한 용액을 50㎛ 두께의 폴리이미드 필름(Kaneka사 제품 Apical NPI) 한쪽 표면에 콤마 나이프를 사용 코팅하여 140℃에서 3분간 경화시켜 피복 두께 18±3㎛의 접착층을 형성한 다음, 무처리된 38㎛ 두께의 PET필름(코오롱사 제품 FD01)에 라미하여 접착테이프를 만들었다.20 g of Nipol-34 (from Nippon Zeon) and 60 g of epoxy silicone (EW Silikoftal, 80% solids) of 27% nitrile group was dissolved in 80 g of MEK, followed by 0.5 g of sulfur and 0.5 g of zinc oxide, 3 Add 1 g of hydroxyphenyl phosphinyl propanoic acid. The mixed solution is stirred at 90 ° C. for 1 hour and then left to stand at room temperature for 3 hours . The left solution was coated with a comma knife on one surface of a 50 μm-thick polyimide film (Apical NPI, manufactured by Kaneka), and cured at 140 ° C. for 3 minutes to form an adhesive layer having a coating thickness of 18 ± 3 μm. An adhesive tape was prepared by laminating a 38 μm-thick PET film (KOLON FD01).

비교예 3Comparative Example 3

니트릴기 함량이 27%인 Nipol-34(Nippon Zeon사 제품) 20g, 에폭시 실리콘(Tego사 제품 EW Silikoftal, 고형분 80%) 20g을 MEK80g에 용해시킨 후, 90℃에서 1시간 교반한 후 상온에서 3시간 방치한다. 방치한 용액을 두께 50㎛의 폴리이미드 필름(Kaneka사 제품 Apical NPI) 한쪽 표면에 코팅하여 140℃에서 3분간 경화시켜 피복 두께 18±3㎛의 접착층을 형성한 다음 무처리된 38㎛ 두께의 PET필름(코오롱사 제품 FD01)에 라미하여 접착테이프를 만들었다.20 g of Nipol-34 (made by Nippon Zeon) having a nitrile content of 27% and 20 g of epoxy silicone (EW Silikoftal made by Tego, 80% solids) were dissolved in MEK80 g, and stirred at 90 ° C. for 1 hour, followed by 3 at room temperature. Leave time. The left solution was coated on one surface of polyimide film (Apical NPI, manufactured by Kaneka Co., Ltd.) with a thickness of 50 μm, and cured at 140 ° C. for 3 minutes to form an adhesive layer having a coating thickness of 18 ± 3 μm. The adhesive tape was laminated to the film (KOLON FD01).

상기 실시예 및 비교예에서 만든 접착테이프에 대한 접착력, 내열성 및 절연성을 다음과 같은 방법으로 평가하였으며, 그 결과는 표 1에 나타냈다.The adhesive strength, heat resistance, and insulation properties of the adhesive tapes prepared in Examples and Comparative Examples were evaluated by the following methods, and the results are shown in Table 1 below.

접착력Adhesion

각각의 접착테이프를 10mm×100mm의 크기로 자른 후 표준형의 동박 한쪽 면에 HSM(Hot Stamping Machine)을 사용하여 각각 120℃, 180℃, 200℃, 300℃의 온도에서 4atm의 압력으로 0.4초간 압착하여 샘플을 만들고, 만능시험기(Instron 4303, Instron사 제품)에 걸고 100mm/분의 속도로 당겨 동박과 필름의 접착층 사이의 박리력을 측정하였다.Each adhesive tape is cut into 10mm × 100mm size and pressed on one side of standard copper foil using HSM (Hot Stamping Machine) for 0.4 seconds at pressure of 4atm at 120 ℃, 180 ℃, 200 ℃ and 300 ℃, respectively. A sample was prepared, and the peel force between the copper foil and the adhesive layer of the film was measured by pulling on a universal testing machine (Instron 4303, manufactured by Instron) at a speed of 100 mm / min.

내열성Heat resistance

TGA(Thermogravimeteric Analysis)에 의해 300℃ 잔존량을 측정하고, 동박이 접착된 샘플을 로(SYBRON Themolyne 47900 Furnace)에 넣고 300℃에서 3분간 방치한 후 접착면의 깨짐 정도를 관찰하여 평가하였다. 전혀 변화가 없으면 양호, 조금 이라도 이상이 있으면 보통, 접착층의 탄 정도가 심하면 불량으로 하여 표시하였다.The residual amount of 300 ° C. was measured by TGA (Thermogravimeteric Analysis), and a copper foil-bonded sample was placed in a furnace (SYBRON Themolyne 47900 Furnace) and left at 300 ° C. for 3 minutes, and then evaluated by observing the degree of cracking of the adhesive surface. If there is no change at all, it is good, and if there is any abnormality, it is usually displayed as a defect if the degree of burnt of the adhesive layer is severe.

절연성Insulation

각각의 접착 테이프를 항온 항습 조건하에서 24℃, 45% RH하에서 24시간 방치하고, 소정의 장치(High Current Measurement Unit Keithley 238)로 100V의 전압을 걸어 전류량을 측정하였다.Each adhesive tape was allowed to stand for 24 hours at 24 ° C. and 45% RH under constant temperature and humidity conditions, and the amount of current was measured by applying a voltage of 100 V with a predetermined device (High Current Measurement Unit Keithley 238).

표 1. 평가 물성Table 1. Evaluation Properties

실시예Example 비교예Comparative example 1One 22 1One 22 33 44 접착력 (g/㎝)Adhesive force (g / cm) 120℃120 ℃ 8080 7070 2222 2424 77 6666 200℃200 ℃ 250250 265265 212212 231231 9090 251251 300℃300 ℃ 280280 290290 190190 155155 7777 261261 내열성Heat resistance 잔존량(%)Remaining amount (%) 9898 9898 9393 9494 9494 9191 로 시험Test 양호Good 양호Good 보통usually 보통usually 보통usually 보통usually 절연성Insulation 전류값(A)Current value (A) 2×10-12 2 × 10 -12 3×10-12 3 × 10 -12 5×10-11 5 × 10 -11 2×10-11 2 × 10 -11 8×10-12 8 × 10 -12 4×10-10 4 × 10 -10

상기 표 1를 참조하면, 실시예의 접착테이프가 비교예의 접착테이프에 비해 각각의 온도조건하에서 접착력이 우수하고, 내열성과 절연성에 있어서도 우수하게 나타났다. 이러한 결과에 의하면 접착층의 니트릴기 함량과 상기 물성이 밀접한 관계가 있음을 알 수 있다.Referring to Table 1, the adhesive tape of the Example was superior to the adhesive tape of the comparative example under each temperature condition, and also excellent in heat resistance and insulation. These results show that the nitrile group content of the adhesive layer is closely related to the physical properties.

이상에서 상세히 설명한 바와 같이, 본 발명에 따른 내열성 접착테이프는 저온 경화가 가능하고 테이핑 온도에서 탁월한 접착력 및 내열성을 보이고 에폭시 몰딩 온도조건인 300℃에서도 접착력을 유지하여 납 프레임의 치수 안정성을 향상시 킬 수 있는 효과를 갖는다.


















As described in detail above, the heat-resistant adhesive tape according to the present invention can be cured at low temperatures, exhibit excellent adhesion and heat resistance at the taping temperature, and maintain adhesion even at an epoxy molding temperature condition of 300 ° C. to improve the dimensional stability of the lead frame. Has the effect.


















Claims (4)

내열성 베이스 필름 위에 접착층과 보호층이 적층 구성되는 내열성 접착테이프에 있어서, A heat resistant adhesive tape in which an adhesive layer and a protective layer are laminated on a heat resistant base film, 상기 접착층은 니트릴기 함량이 10 내지 35중량%인 아크릴로니트릴/부타디엔 공중합체 100중량부에 대하여 실리콘에폭시 수지 50 내지 200중량부, 가황제 0.05 내지 0.5중량부, 경화촉진제 0.1 내지 0.5중량부 및 난연제 0.1 내지 1중량부로 조성된 것임을 특징으로 하는 내열성 접착테이프.The adhesive layer is 50 to 200 parts by weight of silicone epoxy resin, 0.05 to 0.5 parts by weight of vulcanizing agent, 0.1 to 0.5 parts by weight of curing accelerator, based on 100 parts by weight of acrylonitrile / butadiene copolymer having a nitrile group content of 10 to 35% by weight, and Heat-resistant adhesive tape, characterized in that the composition is composed of flame retardant 0.1 to 1 parts by weight. 제 1 항에 있어서, 접착층은 두께 10~25㎛인 것을 특징으로 하는 내열성 접착테이프.The heat resistant adhesive tape according to claim 1, wherein the adhesive layer has a thickness of 10 to 25 µm. 삭제delete 제 1 항에 있어서, 접착층은 아크릴로니트릴/부타디엔 공중합체와 실리콘에폭시 수지의 혼합비가 중량비로 1:0.5~2인 것을 특징으로 하는 내열성 접착테이프.The heat-resistant adhesive tape according to claim 1, wherein the adhesive layer has a mixing ratio of acrylonitrile / butadiene copolymer and silicone epoxy resin in a weight ratio of 1: 0.5 to 2.
KR1020000002120A 2000-01-18 2000-01-18 Adhesive tape KR100613754B1 (en)

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KR20050100918A (en) * 2004-04-16 2005-10-20 주식회사 코오롱 Adhesive tape having good thermal shrinkable property and gas emission property
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5981369A (en) * 1982-10-30 1984-05-11 Matsushita Electric Works Ltd Adhesive for electric circuit laminate
KR960014763A (en) * 1994-10-17 1996-05-22 전성원 Pneumatic fuel system
KR970042908A (en) * 1995-12-25 1997-07-26 호소이 소지로 Liquid Adhesive and Adhesive Tape for Electronic Components
JPH10279898A (en) * 1997-04-04 1998-10-20 Hitachi Chem Co Ltd Thermosetting adhesive sheet
KR19990019012A (en) * 1997-08-28 1999-03-15 한형수 Heat-resistant adhesive tape for electronic parts
KR0181011B1 (en) * 1997-02-17 1999-04-01 주식회사새한 Adhesive composition for adhesive tape

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5981369A (en) * 1982-10-30 1984-05-11 Matsushita Electric Works Ltd Adhesive for electric circuit laminate
KR960014763A (en) * 1994-10-17 1996-05-22 전성원 Pneumatic fuel system
KR970042908A (en) * 1995-12-25 1997-07-26 호소이 소지로 Liquid Adhesive and Adhesive Tape for Electronic Components
KR0181011B1 (en) * 1997-02-17 1999-04-01 주식회사새한 Adhesive composition for adhesive tape
JPH10279898A (en) * 1997-04-04 1998-10-20 Hitachi Chem Co Ltd Thermosetting adhesive sheet
KR19990019012A (en) * 1997-08-28 1999-03-15 한형수 Heat-resistant adhesive tape for electronic parts

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