KR20020015228A - method for fabricating a Transflective liquid crystal display device and the same - Google Patents

Abstract

PURPOSE: An array substrate for a transflective LCD(Liquid Crystal Display) device is provided to simplify the manufacturing process as well as to remove residual image effect. CONSTITUTION: A gate line(113) and a data line(115) are formed on a substrate(111). A switching element for driving LC, a TFT(Thin Film Transistor,T) is formed at the cross point of the two lines. The TFT includes a gate electrode(117), a source electrode(119), a drain electrode(122) and an active layer(123). A semi-transmissive pixel electrode(121) consisting of a reflective electrode(121a) and a transparent electrode(121b) is formed on a pixel area(P). The reflective electrode integrated in one direction is connected with a common line(125) patterned to the outside of an LCD panel. The common electrode for the transparent electrode is fed regularly via the common line even though the reflective electrode is not directly contacted with the transparent electrode. Therefore, the residual image generated by voltage difference is removed.

Description

Array substrate for reflective transmissive liquid crystal display device and manufacturing method thereof

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a reflective liquid crystal display device capable of selectively using a reflection mode and a transmission mode.

Generally, the transflective liquid crystal display device has the functions of a transmissive liquid crystal display device and a reflective liquid crystal display device, and it is possible to use both a backlight light and an external natural light or artificial light source to limit the surrounding environment. It does not receive, there is an advantage that can reduce the power consumption (power consumption).

FIG. 1 is an exploded perspective view showing a general reflective transmissive color liquid crystal display device.

As shown in the drawing, a general reflection-transmissive liquid crystal display 11 includes a color filter 17 including a black matrix 16, an upper substrate 15 having a transparent common electrode 13 formed on the color filter, and a pixel region. A pixel electrode 19 having a transmissive portion A and a reflecting portion C formed at the same time as the pixel region 19 and a lower substrate 21 having a switching element T and an array wiring formed thereon. ) And the lower substrate 21 are filled with the liquid crystal 23.

The lower substrate 21 is also referred to as an array substrate, and the thin film transistor T, which is a switching element, is positioned in a matrix type, and the gate wiring 25 and the data wiring 27 passing through the plurality of thin film transistors cross each other. Is formed.

In this case, the pixel area P is an area where the gate line 25 and the data line 27 cross each other.

The operation characteristics of the reflective liquid crystal display device having such a configuration will be described with reference to FIG.

2 is a cross-sectional view showing a general reflective transmissive liquid crystal display device.

As shown in the drawing, the schematic reflection-transmissive liquid crystal display device 11 is composed of an upper substrate 15 having the common electrode 13 formed thereon, a reflective electrode 19b including a transmission hole A, and a transparent electrode 19a. A lower substrate 21 on which the pixel electrode 19 is formed, a liquid crystal 23 filled between the upper substrate 15 and the lower substrate 21, and a backlight 41 positioned below the lower substrate 21. It is composed of

When the reflective liquid crystal display device 11 having such a configuration is used in a reflective mode, most of the light is used as an external natural light or an artificial light source.

The operation of the liquid crystal display device in the reflection mode and the transmission mode will be described with reference to the above-described configuration.

In the reflective mode, the liquid crystal display uses an external natural or artificial light source, and the light B incident on the upper substrate 15 of the liquid crystal display is reflected by the reflective electrode 19b to reflect the light. Passing through the liquid crystal 23 arranged by the electric field of the electrode and the common electrode 13, the amount of light (B) passing through the liquid crystal is adjusted according to the arrangement of the liquid crystal 23 to display an image (Image) Will be implemented.

On the contrary, when operating in the transmission mode, the light source uses the light F of the backlight 41 positioned below the lower substrate 21. Light emitted from the backlight 41 enters the liquid crystal 23 through the transparent electrode 19a and is arranged by an electric field of the transparent electrode 19a and the common electrode 13 below the through hole. By adjusting the amount of light incident from the lower backlight 41 by the liquid crystal 23 is implemented an image.

FIG. 3 is an enlarged plan view showing a portion of a conventional array substrate for reflective transmissive liquid crystal display device.

As illustrated, the gate wiring 25 and the data wiring 27 are formed to cross each other, and the gate electrode 32, the source electrode 33, and the drain electrode 35 are formed at the intersections of the two wirings 25 and 27. A thin film transistor (T) comprising a) is configured.

In this case, the transflective pixel electrode 19 positioned in the pixel region P is formed of a transparent electrode 19a and a reflective electrode 19b, and is largely divided into a transmissive portion A and a reflective portion B.

In this case, the reflecting portion B is composed of the center of the pixel P and the transmitting portion A is composed of the edge of the pixel.

Here, in order to give the same signal to the transmitting portion (A) and the reflecting portion (B), the transparent electrode (19a) is in contact with the drain electrode 35 of the thin film transistor (T) through the first contact hole (31) The reflective electrode 19b is formed in contact with the transparent electrode 19a through a second contact hole 37 formed on the transparent electrode 19a.

In this case, the reflective electrode 19b may be formed without contacting the transparent electrode 19a.

Hereinafter, the configuration and manufacturing method of FIG. 3 will be briefly described with reference to FIGS. 4A and 4B.

4A and 4B are cross-sectional views taken along lines II-II and III-III of FIG. 3, wherein the reflective electrode is in contact with the transparent electrode through a contact hole.

As shown in the drawing, after the gate electrode 32 and the gate wiring (25 in FIG. 3) are formed on the substrate 11, the gate insulating film 43 is formed.

Next, a semiconductor layer as an active channel layer is formed on the gate insulating film 43 on the gate electrode 32.

In this case, the semiconductor layer includes an active layer 45 made of pure amorphous silicon and an ohmic contact layer 47 made of amorphous silicon containing impurities.

A source electrode 33, a drain electrode 35, and a data line 27 extending perpendicular to the source electrode 33 are formed on the active layer 45.

Next, an insulating material is deposited on the substrate 11 on which the data line 27 and the like are formed to form the first protective layer 49.

Next, an aluminum (Al) or aluminum-based (AlNd) metal having excellent reflectance and conductivity is deposited and patterned on the first passivation layer 49 to form a reflective electrode 19b as a first pixel electrode.

Next, an insulating material is deposited on the substrate 11 on which the reflective electrode 19b is formed to form a second protective layer 51, and then patterned to form a first contact hole 31 that is a drain contact hole on the drain electrode. ) And a second contact hole 37 is formed on the reflective electrode 19b adjacent to the first contact hole 31.

Next, a transparent conductive material is deposited and patterned to contact the drain electrode 35 through the first contact hole 31 and at the same time to contact the reflective electrode 19b through the second contact hole 37. The transparent electrode 19a, which is a second pixel electrode extending over the reflective electrode, is formed.

In this way, a reflective transmissive liquid crystal display device can be constructed.

In general, the transparent electrode 19a may use a metal oxide such as indium-tin-oxide (ITO) or indium-zinc-oxide.

In this case, the aluminum material used as the reflective electrode 19b has excellent reflectance and conductivity, but tends to be easily oxidized when oxygen is encountered to form an oxide film on the surface.

Therefore, in the first example of the related art, since the transparent electrode 19a and the reflective electrode 19b contact each other through the second contact hole 37, the contact resistance value due to the oxide film generated at the interface between the two electrodes is increased. very big.

As a result, such a large value of contact resistance causes a decrease in the charging characteristics of a liquid crystal capacitor (LC) for driving a liquid crystal.

In consideration of these disadvantages, as shown in FIG. 4B, the conventional second example configures the reflective electrode 19b without contacting the transparent electrode 19a, and the voltage driving the pixel region P is It is configured to have a structure to be applied through the transparent electrode (19a).

However, in this structure, the reflecting electrode 19b is formed to function as a simple reflector.

In detail, since the reflective plate 19b is not connected to the transparent electrode 19a and is positioned between the upper and lower insulating layers 49 and 51 to float, the reflective plate 19b is formed on the reflective plate 19b. When a voltage is applied to the transparent pixel electrode 19a, the charge tends to be induced to the reflecting plate 19b by a minute defect generated on the surface of the protective layer 51 formed on the reflecting plate 19b. This parasitic charge decreases the charging characteristics of the liquid crystal capacitor for orienting the liquid crystal.

In addition, when the two structures are viewed based on a single pixel electrode formed on the pixel area, a problem occurs in that an afterimage occurs due to an uneven voltage application state.

SUMMARY OF THE INVENTION The present invention for solving the above-mentioned problems is not only an afterimage effect, but also an object of the present invention is to manufacture a reflective transmissive liquid crystal display device having a simple process.

1 is an exploded perspective view showing a part of a general reflective transmissive liquid crystal display device;

2 is a cross-sectional view of a general reflective transmissive liquid crystal display device,

3 is an enlarged plan view showing some pixels of a conventional array substrate for a reflective transmissive liquid crystal display device;

4A and 4B are process cross-sectional views cut along II-II and III-III of FIG. 3.

FIG. 5 is an enlarged plan view showing some pixels of an array substrate for a reflective transmissive liquid crystal display device according to a first embodiment of the present invention;

6A to 6C are cross-sectional views illustrating a process sequence of cutting IV-IV and V-V of FIG.

FIG. 7 is an enlarged plan view showing some pixels of an array substrate for a reflective transmissive liquid crystal display device according to a second embodiment of the present invention;

8A to 8C are cross-sectional views illustrating a process sequence, taken along the line VIII-VIII of FIG.

9 is an enlarged plan view showing some pixels of an array substrate for a reflective transmissive liquid crystal display device according to a third embodiment of the present invention;

10A to 10D are cross-sectional views illustrating a process sequence by cutting along VIII-VIII and VIII-VIII of FIG.

11A to 11C are plan views illustrating a first modification of the reflective electrode according to the fourth embodiment of the present invention.

12A to 12C are plan views illustrating a second modified example of the reflective electrode according to the fourth exemplary embodiment of the present invention.

<Description of the symbols for the main parts of the drawings>

111 substrate 113 gate wiring

115: data wiring 117: gate electrode

119 source electrode 122 drain electrode

121: pixel electrode 121a, 121b: reflective electrode, transparent electrode

123: semiconductor layer 125: common wiring

127: first contact hole

According to an aspect of the present invention, there is provided an array substrate for a transflective liquid crystal display device comprising: a substrate; A switching element formed on the substrate, the switching element comprising a gate electrode, a source electrode and a drain electrode; A common wiring formed around the substrate and configured to apply a common voltage; The pixel electrode includes a transparent electrode connected to the drain electrode, and a reflective electrode formed at the same position as the transparent electrode and connected to the common wiring, and defined as a reflecting unit and a transmitting unit.

The transparent electrode and the reflective electrode is characterized by being configured with an insulating layer therebetween.

The reflective electrode may be configured on the same layer as the gate electrode of the switching element, and in this case, the connecting portion connecting each reflective electrode is configured in parallel with the gate wiring.

In this case, the reflective electrode is connected to the drain electrode through a common wiring and a contact hole formed on the same layer.

As another example, the reflective electrode may be configured on the same layer as the drain electrode, and in this case, the connecting portion connecting each reflective electrode is configured in parallel with the data wiring.

In this case, the reflective electrode is connected through a common wiring and a contact hole formed on the same layer as the gate electrode.

As another example, the reflective electrode and the common wiring may be configured on the same layer. In this case, the reflective electrode extends to the common wiring.

The reflective electrode is one selected from the group of conductive metals including aluminum and aluminum alloys having excellent reflectivity and excellent conductivity.

The transparent electrode is one selected from the group of transparent conductive metals including ITO and IZO.

The reflection unit may include a pixel electrode defined to be configured around the transmission unit.

The reflector may include a pixel electrode defined to be configured at the center of the transmission part.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

First Embodiment

In the first embodiment of the present invention, the common wiring connected to the reflective electrode is formed on the same layer as the drain electrode. A description with reference to FIG. 5 is as follows.

5 is an enlarged plan view illustrating some pixels of an array substrate for a reflective transmissive liquid crystal display device according to the present invention.

As shown, the reflective liquid crystal display device defines a pixel area P by crossing the gate line 113 extending in the horizontal direction with respect to the substrate 111 and the gate line and the insulating layer interposed therebetween. The vertical data line 115 is formed.

Here, the thin film transistor T, which is a switching element for driving the liquid crystal, is formed at the intersection of the two wires 113 and 115. In this case, the thin film transistor T includes a gate electrode 117, a source electrode 119, a drain electrode 122, and an active layer 123.

The transflective pixel electrode 121 including the reflective electrode 121a and the transparent electrode 121b is formed on the pixel region P, and the transparent electrode 121b is disposed between the insulating layer 121b and the insulating layer. It is formed in a stacked structure.

In this case, the reflective electrode 121a formed in the arbitrary pixel region is connected to the reflective electrode 121a formed above the adjacent pixel region P. The reflective electrode 121a integrated in one direction in this manner is a liquid crystal. It is formed by connecting with the common wiring 125 patterned on the outer side of the panel.

In this case, the reflective electrode 121 is patterned on the same layer as the gate electrode 117 during the process of the thin film transistor T, and the common wiring 125 contacting the reflective electrode 121a is the drain electrode 122. ) And the drain wiring 115 are connected to the reflective electrode 121a through the contact hole 127.

Hereinafter, a method of manufacturing a reflective transmissive liquid crystal display device according to the present invention will be described with reference to FIGS. 6A to 6C.

6A through 6C are cross-sectional views of the IV-V and the V-V of FIG. 5 and shown in a process sequence.

First, as shown in FIG. 6A, one selected from aluminum (Al), aluminum-based metal (AlNd), molybdenum (Mo), and tungsten (Mo) is deposited and patterned on the substrate 111 to form a gate electrode 117. ) And a gate wiring (113 in FIG. 5) defining the pixel region P intersecting with the data wiring formed later, and a reflective electrode 121a having an "I" shape on the defined pixel region P. Form.

In this case, the reflective electrode 121a formed on the arbitrary pixel region is connected to the reflective electrode formed on the region of the adjacent pixel so as to be integrated in a direction parallel to the gate wiring, and both ends of the liquid crystal panel are formed on the reflective electrode. The contact wiring 121a 'extending from 121a is formed.

Next, an inorganic insulating material including silicon nitride (SiN _x ), silicon oxide (SiO ₂ ), and the like, and benzocyclobuten (Benzocyclobuten) on the entire surface of the substrate 111 including the gate electrode 117 and the reflective electrode 121a. ) And a gate insulating layer 126 is formed by depositing one selected from an organic insulating material including an acrylic resin and the like.

Next, an island type active layer 123a and an ohmic contact 123b layer planarly overlap with the gate electrode 117 is formed.

The active layer 123a is generally formed by depositing pure amorphous silicon, and the ohmic contact layer 123b is formed by depositing amorphous silicon containing n + or p + impurities.

Next, after the active layer is patterned as shown in FIG. 6B, first contact holes 127 are formed on the plurality of contact wires 121a ′, respectively.

Next, a conductive metal such as chromium (Cr), molybdenum (Mo), or tantalum (Ta) is deposited and patterned on the substrate 111 on which the first contact hole 127 is formed, thereby forming the active layer 123. A source electrode 119 overlapping with one side, a drain electrode 122 spaced apart from each other by a predetermined interval, and a data line 115 extending in one direction perpendicular to the source electrode 119 are formed.

At the same time, a common wiring 125 is formed at the edge of the liquid crystal panel 111 to be connected to the plurality of contact wirings 121a 'extending from the plurality of reflective electrodes 121a through the first contact hole. .

Accordingly, the reflective electrode 121a 'is connected to the common wiring 125 and has a constant common voltage applied thereto.

Next, as shown in FIG. 6C, the protective layer 129 is formed by depositing or applying the above-described insulating material on the substrate 111 on which the data wiring 115, the common wiring 125, and the like are formed. Afterwards, a drain contact hole 131 that is a first contact hole is formed on the drain electrode 122.

Next, indium-tin-oxide (ITO) and indium-zinc-oxide (ITO) are formed on the protective layer 129 having the drain contact hole 131 patterned thereon. A pixel electrode 121b formed in a pixel region P formed by depositing and patterning a transparent conductive metal such as a metal, and making contact with the drain electrode 122 through the drain contact hole 131 and having the reflective electrode 121a formed thereon. ).

In this way, the reflective liquid crystal display device according to the first embodiment of the present invention can be manufactured.

Although the reflective electrode 121a according to the structure of the present invention does not directly contact the transparent electrode 121b, a common voltage having less influence on the pixel voltage supplied to the transparent electrode is uniform through the common wiring 125. Since it is applied in such a way, it is possible to eliminate residual images generated by the difference in the applied voltage according to the contact resistance of the conventional reflective electrode and the transparent electrode.

In addition, since the storage capacitance is generated between the reflective electrode 121a and the transparent electrode 121b on the upper side, it can be used as a storage capacitor, so it is necessary to design a storage capacitor for the storage capacitor separately as in the conventional structure. none.

Therefore, the reflective array substrate can be manufactured by a simpler process.

The reflective electrode as described above can be configured in various ways, and the second and third embodiments will be described below.

Second Embodiment

The second embodiment of the present invention proposes a structure and a manufacturing method of an array substrate in which the reflective electrode is formed in the same process as the drain electrode process.

FIG. 7 is an enlarged plan view showing some pixels of an array substrate for a transflective liquid crystal display device according to a second exemplary embodiment of the present invention.

As shown, the reflective electrodes 121a are connected to each other in one direction in parallel with the data wiring 113, and each of the reflective electrodes 121a integrated in one direction is formed on the upper and lower portions of the liquid crystal panel. It is connected to the common wiring 125 configured in the vicinity of the same time.

A method of manufacturing an array substrate having such a structure will be described below with reference to FIGS. 7A to 7C.

8A to 8C are cross-sectional views illustrating a process sequence of FIG. 7 taken along the line VIII-VIII. (Reference numbers use the same numbers in FIG. 5)

First, as shown in FIG. 8A, the conductive metal described in Embodiment 1 is deposited and patterned to form a gate electrode 117 and a gate wiring 113, and at the same time, the gate wiring 113 on the periphery of the substrate 111. ) To form a common wiring 125 parallel to the.

Since the common wiring 125 should be connected to a reflective electrode formed later, the common wiring 125 has a plurality of contact portions 125 ′ extending from the common wiring in the direction of the display area of the array substrate 111.

Next, an inorganic insulating material including silicon nitride (SiN _x ), silicon oxide (SiO ₂ ), and the like on the entire surface of the substrate 111 on which the gate electrode 117, the gate wiring 113, and the common wiring 125 are formed. And one selected from organic insulating materials including benzocyclobuten, acryl-based resin, and the like, to form a gate insulating layer 126.

Next, the island-like active layer 123a using pure amorphous silicon and amorphous silicon containing impurities as described above on the gate insulating layer 126 on the gate electrode 117 and the ohmic contact planarly overlapped therewith. Form layer 123b.

Next, as shown in FIG. 8B, the semiconductor layer 123 including the active layer 123a and the ohmic contact layer 123b is patterned, and then the contact extends a predetermined length in one direction from the common wiring 125. The first contact hole 127 is formed in the upper portion of the wiring.

Next, a conductive metal such as chromium (Cr), molybdenum (Mo), or tantalum (Ta) is deposited and patterned on the substrate 111 on which the first contact hole 127 is formed, thereby forming the active layer 123. A source electrode 119 overlapping with one side of the source electrode, a drain electrode 122 spaced apart from the predetermined distance, and extending in one direction perpendicular to the source electrode 119 and intersecting with the gate wiring 113. The data wiring 115 defining P) is formed.

At the same time, a reflective electrode 121a having an “I” shape is formed on the pixel region.

In this case, the reflective electrode 121 is connected to the reflective electrode of the adjacent pixel and is formed in one direction in parallel with the data line 115 so that the plurality of first contact holes 127 are opposite to each other of the liquid crystal panel. It is connected to the common wiring 125 through.

Next, as shown in FIG. 8C, the protective layer 129 is formed by depositing or applying the above-described insulating material on the substrate 111 on which the data line 115 and the reflective electrode 121a and the like are formed. Afterwards, a drain contact hole 131 that is a second contact hole is formed on the drain electrode 122.

Next, indium-tin-oxide (ITO) and indium-zinc-oxide (IZO) are formed on the protective layer 129 having the drain contact hole 131 patterned thereon. A transparent conductive metal, such as a metal, is deposited and patterned to contact the drain electrode 122 through the drain contact hole 131 and extend above the reflective electrode 121a to form a pixel electrode 121b.

In this way, a reflective liquid crystal display device according to a second exemplary embodiment of the present invention can be manufactured.

Third Embodiment

The third embodiment of the present invention proposes a structure in which the reflective electrode extends in up / down / left / right directions, not only extending in one direction, and a method of manufacturing the same.

FIG. 9 is an enlarged plan view illustrating some pixels of an array substrate for a reflective transmissive liquid crystal display device according to a third exemplary embodiment of the present invention.

As shown in the drawing, the third embodiment of the present invention employs both the first and second embodiments described above, and the reflection electrode 121a formed on the pixel region P has a reflection formed on adjacent pixels. All of the electrodes 121a are connected to each other.

Accordingly, the connection portion connecting two adjacent reflective electrodes crosses the gate wiring 113 and the data wiring 115.

Hereinafter, a method of manufacturing an array substrate for a reflective transmissive liquid crystal display device according to a third embodiment of the present invention will be described with reference to FIGS. 10A to 10C.

In order to form a substrate as shown in FIG. 9, the reflective electrode and the common wiring may not be configured in the same manner as the pattern process of the gate electrode or the drain electrode. Therefore, the present embodiment illustrates a method of forming the reflective electrode after forming the drain electrode.

As shown in FIG. 10A, the above-mentioned conductive metal is deposited and patterned on a substrate to form a gate electrode and a gate wiring.

Next, the above-described insulating material is deposited on the substrate 111 on which the gate electrode 117 and the gate wiring (113 of FIG. 9) are formed to form a gate insulating film 126.

An island-type active layer 123a and an ohmic contact layer 123b overlapping with each other are formed on the gate insulating layer 126 on the gate electrode 117.

Next, as illustrated in FIG. 10B, the above-described conductive metal is deposited and patterned on the substrate 111 on which the semiconductor layer 123 including the active layer 123a and the ohmic contact layer 123b is formed. The source electrode 119 on one side of the semiconductor layer 123, the drain electrode 122 spaced apart from the predetermined distance, and extend in one direction perpendicular to the source electrode 119 and cross the gate wiring 113. The data line 115 defining an area is formed.

Next, the first insulating layer 129 is formed by depositing the above-described insulating material on the substrate 111 on which the drain electrode 122 and the data wiring 115 are formed.

Next, as illustrated in FIG. 10C, aluminum (Al) and aluminum (Al) based conductive materials having excellent reflectance and conductivity are deposited and patterned on the first protective layer 129 to form the pixel region P. FIG. ) Is formed on the reflection electrode 121a of the "I" shape.

In this case, the reflective electrode 121a is formed by connecting all of the reflective electrodes 121a close to the top / bottom / left / right, and the common common line 125 formed on the outer side of the liquid crystal panel along the periphery of the liquid crystal panel. To form.

In this case, the reflective electrode 121a extends to the common wiring 125 to be integrally formed with the common wiring 125.

In this case, the connecting portion A connecting the reflective electrodes 121a at the top, bottom, left, and right sides is formed to cross the gate wiring 113 and the data wiring 115 at the bottom thereof.

Next, a second protective layer 129 is formed by depositing the above-described insulating material on the substrate 111 including the reflective electrode 121a and the common wiring 125, and then patterning the drain electrode 122. A drain contact hole 131 that is a second contact hole is formed in the upper portion.

Next, the transparent conductive metal as described above is deposited and patterned on the substrate 111 on which the drain contact hole is formed, and thus the transparent pixel electrode contacting the drain electrode 122 through the drain contact hole 131. 121b).

In this manner, an array substrate for a liquid crystal display device according to a third exemplary embodiment of the present invention can be manufactured.

In the above-described first, second, third, and exemplary embodiments, the shape of the reflective electrode has been described by taking an “I” shape as an example, but various modifications can be made as shown in the fourth embodiment.

Fourth Embodiment

In the fourth embodiment of the present invention, a modification of the electrode that can employ the structure described in the first to third embodiments described above will be described with reference to the drawings.

11A to 11C and FIGS. 12A to 12C are plan views illustrating some pixels of an array substrate for a transflective liquid crystal display including a reflective electrode according to a first modification and a second modification according to the present invention.

As shown in the drawing, the reflective reflection pixel electrode 121 shown in Figs. 11A to 11C has a reflecting portion D formed at the center of the pixel region, and the transmitting portion E is disposed around the reflecting portion D. 12A to 12C illustrate a shape in which the transmissive portion E is formed in the center of the pixel region and the reflecting portion D is formed around the transmissive portion E as an example.

11A and 12A are the same as those of the first embodiment described above, and each of the reflective electrodes 121a is configured in the same process when the gate wiring 113 and the gate electrode 117 are configured.

That is, the reflective electrodes 121a which are adjacent to each other in a direction parallel to the gate wiring 113 may be connected and integrated.

Next, FIGS. 11B and 12B are the same as those of the above-described second embodiment, respectively, and are the same when the reflective electrode 121a forms the data wiring 113, the source electrode 119, and the drain electrode 122. It consists of a process.

That is, the reflective electrodes 121a adjacent to each other in a direction parallel to the data line 113 may be connected and integrated.

Next, FIGS. 11C and 12C are the same as those of the above-described third embodiment, and the reflective electrodes are connected to all of the reflective electrodes close to the top, bottom, left, right and the like.

In the fourth embodiment according to the present invention, the first modified example and the second modified example of the reflective electrode 121a have been described by way of example. However, the shape of the reflective electrode and the configuration of the reflective electrode and the transmissive electrode may be described. Various modifications can be made without departing from the spirit of the invention.

Therefore, the reflective transmissive liquid crystal display autonomous array substrate according to the present invention has an effect of reducing the unnecessary contact process because the reflective electrode is not first connected to the transparent electrode, thereby increasing the reliability of the process.

Second, it is possible to prevent the deterioration of the accumulation characteristics of the liquid crystal capacitor due to the non-uniformity of the contact resistance generated by the contact between the reflective electrode and the transparent electrode of the aluminum material, it is possible to obtain a uniform image quality.

Third, since the storage capacitor is formed between the reflective electrode and the pixel electrode, it is not necessary to design a storage capacitor separately, and thus the yield of the liquid crystal display device can be improved by simplifying the process.

Claims (11)

A substrate; A switching element formed on the substrate, the switching element comprising a gate electrode, a source electrode and a drain electrode; A common wiring formed around the substrate and configured to apply a common voltage; A pixel electrode including a transparent electrode connected to the drain electrode and a reflective electrode connected to the common wiring, the pixel electrode being defined as a reflection part and a transmission part Array substrate for a liquid crystal display device comprising a. The method of claim 1, And the transparent electrode and the reflective electrode are formed with an insulating layer interposed therebetween. The method of claim 1, And the reflective electrode is formed on the same layer as the gate electrode. The method according to any one of claims 1 to 3, And the reflective electrode is connected to the drain electrode through a common wiring and a contact hole formed on the same layer. The method of claim 1, And the reflective electrode is formed on the same layer as the drain electrode. The method according to any one of claims 1 to 5, And the reflective electrode is connected to the gate electrode through a common wiring and a contact hole formed on the same layer. The method of claim 1, And the reflective electrode is formed on the same layer as the common wiring and extends on the common wiring. The method of claim 1, The reflective electrode is an array substrate for a liquid crystal display device which is selected from the group of conductive metals including aluminum and aluminum alloys having excellent reflectivity and excellent conductivity. The method of claim 1, And the transparent electrode is one selected from a group of transparent conductive metals including ITO and IZO. The method of claim 1, An array substrate for a liquid crystal display device comprising a pixel electrode defined to be formed around the transmission portion. The method of claim 1, And the reflective portion includes a pixel electrode defined to be formed at the center of the transmissive portion.