KR20020011794A - anti-static inductively particle trapping system - Google Patents

Abstract

PURPOSE: An electrostatic induction apparatus for collecting particles is provided to efficiently control the generation of the particles, by using a control method using additional electric energy without a conventional mechanical control method. CONSTITUTION: An electrostatic induction particle collecting unit(130a,130b,130c) is installed in a main process chamber(110), electrically separated from the main process chamber. A power supply terminal unit applies the power necessary for electrostatic induction to the particle collecting unit. A power supply unit(150) supplies power to the power supply terminal unit so that positive and negative particles are efficiently induced to the particle collecting unit.

Description

Electrostatic Induction Particle Dust Collector {anti-static inductively particle trapping system}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic induction particle collecting device which is one of particle generation suppression methods. Particularly, in a semiconductor and industrial chemical vapor deposition and physical vapor deposition process, a large amount of particles generated by a reaction material in a certain amount of charge are charged. The present invention relates to a device for collecting by applying a.

At present, the demand for particle suppression is increasing due to the issue of public debate as the difficulty of process requirements and high mass productivity are emphasized in the semiconductor manufacturing process.

Particles are often classified into mechanical particles and deposition particles according to their source. The former refers to particles that the wafer already has before the process, and is generally solved by washing with water, but there is a possibility that a large amount of particles are generated while moving to the process chamber, and the latter is applied to the product generated by the reaction raw material after the process. After the particle process, it is inevitably generated. This is a factor that is very closely related to the cleaning cycle of the apparatus, which has a direct effect on high-quality product reliability and mass production yield.

In particular, the requirements for the ultra-fine circuit pattern of next-generation memory and non-memory devices in semiconductor device manufacturing must satisfy the geometrical shape of the device as well as the electrical characteristics to serve as a product. The electrical characteristics of the device are very sensitive to the concentration of impurities (number and size of particles), which is an important factor in determining the operation reliability of the device.

Conventionally, there have been efforts to find a solution from a physical point of view, which mainly focuses on kinematic design and material properties, surface state, geometric shape, and fluid flow. have.

Therefore, the technical problem to be achieved by the present invention is to overcome the limitations of the mechanical particle suppression scheme, and to replace the above-mentioned conventional techniques to achieve high quality production and maximization of production yield by effectively suppressing and controlling particle generation. An electrostatic induction particle collection device is provided.

In the present invention, unlike the former method of the present invention as one of the particle suppression scheme that satisfies these requirements, the particle is approached to a certain amount of positive or negatively charged particles, and induced by applying electrical energy to prevent the particles from floating in the process. Provided is an electrostatic induction particle collector which is held in place.

The present invention relates to a process chamber in which a reactant flows into a reaction chamber, and a sight glass detachable electrostatic induction particle collecting device in which a reactive gas is forcedly exhausted after a process, between an exhaust pipe and a pump or next to an exhaust pipe or in a process chamber. , Here it is characterized by consisting of a direct current, alternating current power supply to make the electrostatic induction. The process chamber used here incorporates various mechanisms such as mechanical, thermal, and fluid so that particles are not generated as much as possible. Particularly, the reaction raw materials (often reactors) introduced into the process chamber are partly involved in the reaction, and part of the rest is part of the reaction. The part of the gas exhaust pipe which is not participated and is discharged as a second product by the initial introduction state or the interaction is a part that is likely to accumulate particles in the vortex of the gas and thermodynamically. As an important component to introduce the mechanism, it can be said that it is an important point to minimize the generation of process particles when applying the present invention, such as the main process chamber of the former.

1 is a schematic diagram illustrating an electrostatic induction particle collecting device according to a first embodiment of the present invention.

<Description of the arcs of the main part of the drawing>

110: main process room 120: sight glass

130a ~ 130b: electrostatic induction collecting device 140: power supply cutoff

150: power supply 160: exhaust vent

The electrostatic induction particle collector according to an embodiment of the present invention is a process chamber having a predetermined volume in which a reaction medium is introduced and reacts with an optimal initial vacuum maintaining state and a hydrodynamic design designed to form a uniform fluid flow. Power supply terminal forming unit that can apply a certain amount of power to induce static electricity, exhaust pipe where the reactor body is forcedly exhausted after the process, between sight pipe and pump or next to the exhaust pipe or in the process room. Induction particle collector, characterized in that consisting of direct current, alternating current power supply to make the induction of static electricity. The process chamber used is mechanically, thermally, and fluidly mixed with various complex mechanisms to prevent particles from being generated as much as possible. Particularly, some of the reaction raw materials introduced into the process chamber (sometimes, reactors) participate in the reaction. Part of the gas exhaust pipe that is not partly participated and is discharged as a second product by initial introduction state or interaction is a part that is likely to accumulate particles due to the vortex of the gas and thermodynamically. As an important component to introduce the mechanism, it can be said that it is an important point to minimize the generation of process particles when applying the present invention, such as the main process chamber of the former.

In addition, in order to efficiently capture particles with positive and negative charges, it is necessary to investigate the behavior (especially the charge density) in the process chamber of the introduced reaction materials in advance and determine the applied power source according to the distribution thereof.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail.

1 is a schematic diagram for explaining an electrostatic induction particle collection device according to a first embodiment of the present invention.

Referring to Figure 1, the present invention forms the initial vacuum and uniform fluid flow while the main process chamber 110 and the main process chamber to ensure that the reaction of the incoming reaction materials in the optimum state has a positive, negative charge It is configured to include an electrostatic induction dust collector 130a for collecting the particles by electrostatic induction.

The electrostatic induction dust collector 130a must be electrically isolated from the main process chamber because it needs to receive power for induction of static electricity, and also has a shape, a position, and a surface so as not to disturb the uniform flow in the main process chamber of the reactor. Care must be taken in the selection of materials taking into account the state and electrical conductivity.

In addition, the present invention is configured to include a multi-purpose sight glass 120 that can be used as a sight glass during normal use, the removable electrostatic induction particle collector 130c can be installed at a time when particle control is required.

In addition, the present invention reacts with a power supply terminal forming unit (not shown) that allows a predetermined amount of power to be applied to the correction-induced dust collector 130a to efficiently collect and collect positive and negative charge particles. And an electrostatic induction dust collector 130b which can be attached between the exhaust pipe and the pump (not shown) or next to the exhaust pipe, forcing the gas to be exhausted after the process.

The electrostatic induction dust collector 130b is integrally configured to function as an electrostatic induction dust collector by connecting only the power supply device 150 with the same function as the dust collector 130a in the main process chamber described above. .

In addition, the present invention is a direct-current power supply for supplying power to the power supply terminal installed in each of the electrostatic induction dust collector (130a ~ 130c) so that the electrostatic induction occurs in the electrostatic induction dust collector (130a ~ 130c) It consists of a device.

On the other hand, the present invention is not limited to the above-described specific embodiments, but can be modified and modified in various ways without departing from the gist of the present invention. It should be noted that such variations or modifications are included in the scope of the present invention as long as the features of the present invention are used.

As described above, according to the electrostatic induction particle collecting device according to the present invention, it overcomes the limitations of the conventional mechanical particle suppression method by a control method including additional electric energy, and is increasingly required by effectively suppressing and controlling particle generation. This has the advantage of achieving high quality production and maximizing production yield for demanding semiconductor and industrial applications.

In addition, according to the present invention, the structure of the device is very simple and very easy to apply to mass production, in particular, as described above, in the same position as the exhaust port, if you make an integrated dust collector that can be easily detached and attached to the rear end of the exhaust port The amount of particles to the pump can be minimized to extend the life and service life of the pump.

Claims (6)

An electrostatic induction particle collector installed electrically isolated from the main processing chamber in the main processing chamber; A power supply terminal unit for applying power required for electrostatic induction to the dust collector; Electrostatic induction particle collector comprising a power supply for supplying power to the power supply terminal portion to effectively guide the negative, positively charged particles to the dust collector. A detachable integrated electrostatic induction particle collecting part mounted on the exhaust pipe part to capture particles discharged to the pump at the rear end; A power supply terminal unit for applying power required for electrostatic induction to the dust collector; It includes a power supply for supplying power to the power supply terminal to effectively guide the negatively charged particles to the dust collector, The particle dust collecting unit is characterized in that the electrostatic induction particle collector characterized in that it is mounted so as not to interfere with the exhaust pipe. An electrostatic induction particle collector installed in a sight glass of the main process chamber and electrically isolated from the main process chamber; A power supply terminal unit for applying power required for electrostatic induction to the dust collector; Electrostatic induction particle collector comprising a power supply for supplying power to the power supply terminal portion to effectively guide the negative, positively charged particles to the dust collector. [4] The electrostatic induction type particle dust collector of claim 2 or 3, wherein the dust collector has a clamp type vacuum sealant structure in which a centering is inserted to facilitate removal and attachment of the dust collector. The electrostatic induction particle collector according to any one of claims 1 to 3, wherein the power supply device is selected in consideration of a power supply capacity, a power supply type, and an application time according to the particle charge density distribution of the reaction raw material. . According to claim 1 to 3, wherein the power supply terminal portion of the main process chamber and the electrical isolation and vacuum holding role at the same time easy to remove and attach, the structure for low vacuum silver O-ring vacuum sealing agent, high vacuum, heat-resistant silver metal Electrostatic induction type particle collector characterized in that it consists of a power supply feed-through using a gasket vacuum sealant.