KR20020000206A - Method cleaning Liquid Chrystal Display using Laser and Remote Plasma - Google Patents

Method cleaning Liquid Chrystal Display using Laser and Remote Plasma Download PDF

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Publication number
KR20020000206A
KR20020000206A KR1020000034656A KR20000034656A KR20020000206A KR 20020000206 A KR20020000206 A KR 20020000206A KR 1020000034656 A KR1020000034656 A KR 1020000034656A KR 20000034656 A KR20000034656 A KR 20000034656A KR 20020000206 A KR20020000206 A KR 20020000206A
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South Korea
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lcd
laser
micro
contaminations
remote plasma
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KR1020000034656A
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Korean (ko)
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최승락
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최승락
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/68—Green display, e.g. recycling, reduction of harmful substances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
    • H01L2224/80009—Pre-treatment of the bonding area
    • H01L2224/8001—Cleaning the bonding area, e.g. oxide removal step, desmearing
    • H01L2224/80013—Plasma cleaning

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)

Abstract

PURPOSE: A cleaning method of an LCD(Liquid Crystal Display) using laser and remote plasma is provided to minimize cost required for environmental pollution as well as to cut down cost by using the minimum amount of pure and chemical cleaning material in a cleaning process of an LCD. CONSTITUTION: A cleaning method of an LCD includes a primary cleaning process of removing micro-contaminations by surface-reacting and etching of metals with remote plasma and a secondary cleaning process of removing micro-contaminations from an LCD with laser and then injecting inactive gas such as nitrogen gas through a nozzle. If various wavelength and frequency of laser are used, all of micro-contaminations are removed by a single process effectively. Micro-contaminations including particles, organics and ionic impurities on an LCD are cleaned out by laser while metals and natrium/chemical oxide are removed from the surface of an LCD by surface-reacting and etching of metals with remote plasma based on sources of HCl and H2. The remote plasma removes micro-contaminations by surface-reacting and etching of atomic bonding parts between natrium/chemical oxide and metals through contact with the entire surface of an LCD. The laser separates micro-contaminations bonded by static electricity from an LCD and injects strong nitrogen gas to the LCD to discharge the micro-contaminations to outside. If laser is emitted to micro-contaminations, static electricity between an LCD and micro-contaminations is removed by laser ablation effect. Thereby, the micro-contaminations are removed from the LCD.

Description

레이저와 리모트 플라스마를 이용한 엘씨디 세정 방법{Method cleaning Liquid Chrystal Display using Laser and Remote Plasma}Method of Cleaning Liquid Chrystal Display using Laser and Remote Plasma

본 발명은 평판디스플레이의 한 종류인 LCD의 세정 방법에 관한 것으로서, 특히 LCD 제조 공정 중 LCD 처리 공정에서 각 공정을 수행한 후 LCD의 불량률을 줄이기 위하여 LCD에 흡착된 오염물질을 제거하게 되는 데, 이 공정을 세정액 소스를 기초로 한 리모트 플라스마를 발생시켜 금속 오염 물질을 표면반응과 에칭으로 세정하는 공정 및 레이저와 질소가스를 이용하여 세정함으로써, 세정 장비의 단순화와 세정 비용의 감소 및 세정 소요시간의 단축 등을 이룰 수 있는 레이저와 리모트 플라스마를 이용한 LCD 세정 방법에 관한 것이다.The present invention relates to a method for cleaning an LCD, which is a type of flat panel display, and in particular, to remove contaminants adsorbed on the LCD in order to reduce the defective rate of the LCD after performing each process in the LCD processing process. This process generates a remote plasma based on the cleaning liquid source to clean metal contaminants by surface reaction and etching, and cleans using laser and nitrogen gas, simplifying the cleaning equipment, reducing the cleaning cost, and the time required for cleaning. It relates to an LCD cleaning method using a laser and a remote plasma that can achieve a shortening of the.

LCD 제조 공정 중 LCD를 처리하는 각 공정에서 입자, 유기물, 중금속 및 이온성 불순물, 산화막, 금속 등의 오염물질이 LCD 표면에 흡착되고, 이 오염물질로 인하여 LCD 칩의 불량이 발생되므로 각 공정 후 오염물질을 제거해야 한다.During the LCD manufacturing process, contaminants such as particles, organic matter, heavy metals and ionic impurities, oxide films, and metals are adsorbed on the LCD surface, which causes defects in the LCD chip. Contaminants should be removed.

LCD 표면상에 흡착된 오염물질을 세정하는 방법으로는 크게 습식과 건식으로 분류할 수 있는데, 현재 건식 세정은 오염물질을 충분히 제거할 수 없기 때문에 액체 및 기체 세정제의 화학작용으로 오염물질을 제거하는 습식 세정이 주류를 이루고 있다.The method of cleaning contaminants adsorbed on the LCD surface can be classified into wet and dry. Currently, dry cleaning cannot remove contaminants sufficiently. Wet cleaning is the mainstream.

상기 습식 세정은 LCD를 반송 로봇이 순차적으로 이동해서 LCD를 약액(산 또는 암모니아)조나 수세조에 담구어 세척한 후 LCD를 회전시켜 건조한다.In the wet cleaning, the transfer robot moves the LCD in sequence, soaks the LCD in a chemical (acid or ammonia) bath or a washing bath, and then rotates the LCD to dry it.

개략적으로 상기와 같이 세정하는 장비는 까다로운 조건하에서 작동되며, 로봇의 저발진성, 반송신뢰성, 고속성, 내약품성 등이 필요하며, 반송의 신뢰성이나 고속 반송을 위하여 고기능의 모터를 사용하고 있고, 내약품성에 대해서도 특수한 재질을 선택하여 불소수지에 의한 이중의 봉인(Seal) 등을 하고 있다.In general, the cleaning equipment as described above is operated under demanding conditions, and the robot needs low oscillation, transfer reliability, high speed, and chemical resistance, and a high-performance motor is used for the reliability of the transfer or the high-speed transfer. Special chemical materials are also selected for double sealing with fluorine resin.

LCD를 세정하는 장비로는 통상, 습식장치(Wet Station)이라고 불리는 장비를 사용하는 데, LCD를 회전시키며 그 표면에 순수한 세정액을 분출하여 입자를 브러시로 세척하는 방식을 사용하기도 하며, 고압에서 순수를 분사하여 입자를 제거하는 방식을 사용하기도 하며, 고주파의 초음파를 발진시켜 그 진동력으로 입자를 떨어뜨리는 방식을 사용하기도 한다.The equipment used to clean the LCD is usually called a wet station, which uses a method of rotating the LCD, spraying pure cleaning liquid onto the surface, and then cleaning the particles with a brush. Particles may be sprayed to remove particles, and a method of oscillating high frequency ultrasonic waves may be used to drop particles by vibrating force.

따라서, 상기와 같은 종래의 LCD 세정 장비는, LCD에 있는 오염물질을 제거하기 위하여 순수나 화학물질을 사용하고 있는 바, 그 공정에 있어서 비효율적인 순수의 사용(1,000 gallon/100㎟)이나 화학물질을 사용함으로써, 다량의 VOC류(IPA, Aceton), 산류(불산, 황산), 솔벤트 류가 발생 및 폐수 처리 등의 문제를 야기할 수 있고, 공정의 복잡함에 따른 부수적인 비용이 많이 발생하는 문제점이 있었다.Therefore, the conventional LCD cleaning equipment as described above uses pure water or chemicals to remove contaminants in the LCD, and thus inefficient use of water (1,000 gallon / 100 mm 2) or chemicals in the process. By using, a large amount of VOCs (IPA, Aceton), acids (fluoric acid, sulfuric acid), solvents can cause problems such as generation and wastewater treatment, and additionally expensive due to the complexity of the process There was this.

따라서, 본 발명의 목적은 LCD 제조 공정 중 LCD 처리공정에서 각 공정을 수행 한 후 LCD의 불량율을 줄이기 위하여 LCD에 흡착된 오염물질을 제거하게 되는데, 이 공정을 세정액 소스를 기초로 한 리모트 플라스마를 발생시켜 금속 오염 물질을 표면반응 및 에칭과 레이저와 질소 가스를 이용하여 세정함으로써, 세정장비의 단순화와 세정 비용의 감소 및 세정 소요시간의 단축 등을 이룰 수 있는 레이저와 리모트 플라스마를 이용한 LCD 세정방법을 제공하는데 있다.Therefore, an object of the present invention is to remove the contaminants adsorbed on the LCD in order to reduce the defective rate of the LCD after performing each step in the LCD processing step of the LCD manufacturing process, the remote plasma based on the cleaning solution source Method to clean metal contaminants by surface reaction and etching and laser and nitrogen gas to generate cleaning equipment, reduce cleaning cost and shorten cleaning time. To provide.

상기 목적을 달성하기 위한 본 발명의 기술적 방법은, LCD 제조 공정 중 LCD를 세정하는 공정에 있어서, 상기 LCD를 세정공간으로 자동 이송시키는 단계와; 상기 이송된 LCD에 세정액 소스를 기초로 한 리모트 플라스마를 발생시켜 금속 오염 물질을 표면반응 및 에칭함으로써 제거하는 단계와; 레이저를 방사하여 LCD에 흡착된 오염물질을 분리시키는 단계; 및 상기 분리된 오염물질에 불활성 가스를 분사하여 외부로 토출시켜 세정하는 단계를 구비하는 것을 특징으로 한다.Technical method of the present invention for achieving the above object, the process of cleaning the LCD in the LCD manufacturing process, the step of automatically transferring the LCD to the cleaning space; Generating a remote plasma based on a cleaning liquid source on the transferred LCD to remove the metal contaminants by surface reaction and etching; Radiating a laser to separate contaminants adsorbed on the LCD; And injecting an inert gas into the separated contaminants and discharging them to the outside for cleaning.

본 발명은 습식 세정 공정을 완전히 대체할 수 있는 건식 공정으로서, 종래 기술에 언급한 화학물질의 발생 및 폐수처리 등의 사용량을 획기적으로 줄일 수 있을 뿐만 아니라 기존의 오염물질 제거를 위한 다단계 처리공정을 한 단계 공정으로 줄일 수 있고, 화학물질을 제거하는 공정에서 발생하는 물질을 통한 오염을 최소화 할 수 있는 것이다.The present invention is a dry process that can completely replace the wet cleaning process, it is possible to drastically reduce the use of the generation of chemicals and waste water treatment mentioned in the prior art, as well as to implement a multi-stage treatment process for removing contaminants. It can be reduced to a one-step process, minimizing contamination through materials generated in the process of removing chemicals.

LCD에 포토레지스트를 도포하거나 현상, 식각 및 전극을 형성하는 각 공정을 실시한 후에 LCD를 세정하는 공정을 실행하게 되는데, 상술한 바와 같이 종래에는 순수나 화학물질 및 브러시를 이용하여 LCD에 흡착된 오염물질을 제거하는데 반해, 본 발명은 LCD에 세정액 소스를 기초로 한 리모트 플라스마를 발생시켜 금속 오염 물질을 표면반응 및 에칭함으로써 제거하는 1차 세정과 레이저를 방사하여 정전기로 인해 결합된 오염물질을 LCD 상에서 분리시킨 후 강한 질소 가스등의 불활성 가스를 노즐을 통하여 분출하여 세정하는 2차 세정을 한 공정에서 하게 되므로서 LCD의 제조 공정 상에서 발생되는 모든 오염물질을 제거하게 된다.After the photoresist is applied to the LCD or developed, etched, and formed to form an electrode, the LCD is cleaned. As described above, conventionally, pure water, chemicals, and brushes adsorbed on the LCD using a brush. In contrast to the removal of materials, the present invention generates a remote plasma based cleaning solution source on the LCD to remove the contaminants combined by static electricity by radiating a laser and primary cleaning, which removes by surface reaction and etching of metal contaminants. After the phases are separated, a second cleaning process is performed in which a strong inert gas such as nitrogen gas is ejected through the nozzle and cleaned, thereby removing all contaminants generated in the LCD manufacturing process.

아울러, 레이저의 다양한 파장과 주파수를 이용하면 특정 오염물질에 대해 선택적으로 제거할 수 있어 한 가지 공정으로도 모든 오염물질을 제거할 수 있는 것이다.In addition, various wavelengths and frequencies of the laser can be used to selectively remove specific contaminants, eliminating all contaminants in one process.

LCD에 흡착된 입자(Paticle), 유기물(Organic) 및 이온성 불순물 등은 레이저를 이용하여 세정되며, 중금속류(Metals)와 산화막(Natrium/Chemical Oxide)은 HCl과 H₂의 소스를 기초로 한 리모트 플라스마를 발생시켜 금속 오염물질을 표면반응과 에칭함으로써 LCD 표면에서 제거되어 세정되는 것이다.Particles, organics and ionic impurities adsorbed on the LCD are cleaned using a laser, while heavy metals and oxides (Natrium / Chemical Oxide) are remote plasma based on HCl and H₂ sources. By removing and cleaning the metal contaminants from the LCD surface by surface reaction and etching.

이러한 세정을 통하여 오염물질을 제거할 때 LCD상의 전자회로에 손상이 없어야 하고, LCD 공정에 적합한 세정액과 레이저 파장을 이용해야 한다.In order to remove contaminants through this cleaning, the electronic circuits on the LCD should not be damaged, and the cleaning liquid and laser wavelength suitable for the LCD process should be used.

또한, 세정액 소스를 기초로 한 리모트 플라스마는 LCD의 특정부분에만 접촉되는 것이 아니고 LCD 전체 면에 접촉되어 LCD 표면의 산화막과 금속류의 원자 결합 부분을 표면반응과 엣칭함으로써 제거시키고, 레이저는 LCD의 전체 면으로 방사하여 정전기에 의해 결합된 이물질을 LCD로부터 분리시킨 후 강한 질소가스를 LCD 전면에 분출하여 이물질을 외부로 토출 시킨다.In addition, the remote plasma based on the cleaning liquid source is not only in contact with the specific part of the LCD but in contact with the entire surface of the LCD to remove the oxide bonds on the surface of the LCD and the atomic bonding portions of metals by surface reaction and etching, and the laser is applied to the entire LCD. After spinning to the surface, the foreign matter combined by static electricity is separated from the LCD, and strong nitrogen gas is ejected to the front of the LCD to discharge the foreign matter to the outside.

이물질에 레이저를 방사하면 레이저 어블레이션(Laser Ablation)효과에 의해 LCD와 이물질간의 정전기 현상이 제거되어, 이물질이 LCD에서 분리되는 것이다.When the laser is emitted to the foreign material, the electrostatic phenomenon between the LCD and the foreign material is removed by the laser ablation effect, and the foreign material is separated from the LCD.

상기와 같이 세정액 리모트 플라스마와 레이저를 이용하면 제거할 수 있는 최소 입자의 크기가 0.09㎛까지 가능하고, 세정시간은 200㎟당 25초(25sec/200㎟)이내에 가능하여 분당 LCD의 세척량을 늘릴 수 있고, 레이저의 파장은 248nm를 사용하는 것이 가장 바람직하며, 세정 대상 오염물질에 따라 세정 소스로는 HCl, H₂를, 레이저로는 불화 크립톤 엑사이머(KrF Excimer)레이저를 이용하거나 불화 아르곤 엑사이머(ArF Excimer)레이저를 이용할 수 있다.Using the cleaning liquid remote plasma and laser as described above, the minimum particle size that can be removed can be up to 0.09㎛, and the cleaning time can be within 25 seconds per 200mm2 (25sec / 200mm2) to increase the amount of LCD cleaning per minute. The wavelength of the laser is preferably 248 nm, and depending on the contaminants to be cleaned, HCl and H2 are used as the cleaning source, and a fluorine krypton excimer laser or argon fluoride is used as the laser. ArF Excimer lasers can be used.

상기와 같은 방법으로 LCD를 세정하면, 화학공정을 위한 저장조 및 배관설비의 규모를 획기적으로 줄일 수가 있어 세정공간의 50% 정도나 감소하는 것이 가능하고, 기본 작업 공간의 50% 정도나 줄일 수 있어 작업공간을 혁신적으로 축소시킬 수 있다.By cleaning the LCD in the same way as above, it is possible to drastically reduce the size of the storage tank and plumbing equipment for the chemical process, which can reduce about 50% of the cleaning space and reduce about 50% of the basic working space. Innovate to reduce your workspace.

또한, 기존 세정에 필요한 순수와 화학물질의 최소량 사용으로 인해 생산원가뿐만 아니라 폐수처리 등의 환경 정화 비용을 절감하여 가격에 있어 경쟁력 있는 LCD를 생산할 수 있는 것이다.In addition, due to the use of the minimum amount of pure water and chemicals required for the existing cleaning, it is possible to produce LCDs that are competitive in price by reducing production costs as well as environmental purification costs such as wastewater treatment.

따라서, 본 발명에서는 기존과 다르게 LCD 제조 공정중 세정공정에서 순수와화학약품을 최소량을 사용하여, 화학약품의 구매비용과 폐수처리비용의 절감에 따른 원가를 절감할 수 있을 뿐만 아니라 유해물질의 최소배출로 환경오염에 드는 비용을 최소화 할 수 있는 효과가 있다.Therefore, in the present invention, unlike the conventional method, by using a minimum amount of pure water and chemicals in the cleaning process of the LCD manufacturing process, it is possible not only to reduce the cost of chemical purchase cost and waste water treatment cost, but also to minimize the harmful substances. Emissions have the effect of minimizing the cost of environmental pollution.

또한, 화학공정을 위한 저장조 및 배관설비가 축소되어 작업 공간을 혁신적으로 축소 시킬 수 있어 일정 공간내 작업 생산량을 늘릴 수 있는 효과가 있다.In addition, the storage tank and plumbing equipment for the chemical process can be reduced to innovatively reduce the work space has the effect of increasing the work output in a certain space.

또한 LCD 제조 공정내의 세정부문의 건식화에 성공함으로서 LCD 제조공정의 건식공정화를 100% 이룰 수 있다.In addition, the company has succeeded in the dry cleaning of the LCD manufacturing process, resulting in 100% dry processing of the LCD manufacturing process.

Claims (4)

LCD 제조 공정 중 LCD를 세정하는 공정에 있어서,In the process of cleaning the LCD during the LCD manufacturing process, 상기 LCD를 세정 공간으로 자동 이송시키는 단계;Automatically transferring the LCD to a cleaning space; 상기 이송된 LCD에 중금속류와 산화막은 HCl, H₂소스를 기초로한 리모트 플라스마로 LCD의 금속오염물질을 표면반응 및 에칭함으로써 오염물질을 제거시키는 단계;Removing the contaminants by surface reaction and etching the metal contaminants of the LCD with a remote plasma based on the HCl and H 2 sources on the transported heavy metals and the oxide film; 및 레이저를 방사하여 LCD에 흡착된 입자(Paticle), 유기물(Organic) 및 이온성 불순물 등의 마이크로 콘테미네이션(Micro-contamination)과 같은 오염물질을 분리시키는 단계;Radiating a laser to separate contaminants such as micro-contamination such as particles, organics and ionic impurities adsorbed on the LCD; 및 상기 분리된 오염물질에 불활성 가스를 분사하여 외부로 토출 시켜 세정하는 단계를 구비한 레이저와 리모트 플라스마를 이용한 LCD 세정방법.And injecting an inert gas to the separated contaminants and discharging them to the outside to clean the LCD. 제 1항에 있어서,The method of claim 1, 상기 레이저가 동작하는 진공 챔버와 HCl, H₂소스를 기초로한 리모트 플라스마가 가능한 진공 챔버를 공용으로 이용하는 것을 특징으로 하는 레이저와 리모트 플라스마를 이용한 LCD 세정방법.And a vacuum chamber in which the laser operates and a vacuum chamber capable of remote plasma based on HCl and H2 sources. 제 1항에 있어서,The method of claim 1, 상기 레이저는 불화 크립톤 엑사이머(KrF Excimer)레이저를 이용하는 것을 특징으로 하는 레이저와 리모트 플라스마를 이용한 LCD 세정방법.The laser cleaning method using a laser and a remote plasma, characterized in that using a fluoride krypton excimer (KrF Excimer) laser. 제 1항에 있어서,The method of claim 1, 상기 레이저는 불화 아르곤 엑사이머(ArF Excimer)레이저를 이용하는 것을 특징으로 하는 레이저와 리모트 플라스마를 이용한 LCD 세정방법.The laser cleaning method using a laser and a remote plasma, characterized in that using an argon fluoride (ArF Excimer) laser.
KR1020000034656A 2000-06-23 2000-06-23 Method cleaning Liquid Chrystal Display using Laser and Remote Plasma KR20020000206A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105204202A (en) * 2015-10-30 2015-12-30 宜宾盈泰光电有限公司 Strip washing type process applied to LCD (Liquid Crystal Display) production process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105204202A (en) * 2015-10-30 2015-12-30 宜宾盈泰光电有限公司 Strip washing type process applied to LCD (Liquid Crystal Display) production process

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