KR20020000192A - Method cleaning Plasma Display Panel using Laser and Ar ECR Plasma - Google Patents

Abstract

PURPOSE: A PDP cleaning method using a laser and an ECR plasma is provided to be capable of simplifying cleaning equipment, reducing cleaning costs and shortening cleaning time by separating metal contaminants on a PDP through removing a natural oxide film using Ar ECR plasma and cleaning the PDP using a laser and nitrogen gas. CONSTITUTION: First, a PDP is automatically conveyed to a cleaning space. Then, a natural oxide film is removed from the conveyed PDP by applying an Ar ECR plasma to the conveyed PDP, thereby separating metal contaminants on a surface of the PDP. Next, contaminants absorbed to the PDP are separated by radiating a laser. Finally, the PDP is completely cleaned by injecting inert gas to the separated contaminants and then discharging the inert gas including the contaminants.

Description

Method for Cleaning Plasma Display Panel Using Laser and IAR Plasma {Method cleaning Plasma Display Panel using Laser and Ar ECR Plasma}

The present invention relates to a method for cleaning a PDP, which is a type of flat panel display, and in particular, after performing each step in the PDP processing step of the PDP manufacturing process, to remove the contaminants adsorbed on the PDP to reduce the defect rate of the PDP. This process is cleaned using argon ECR plasma to remove the native oxide film to separate metal impurities on the surface of the PDP, and using laser and nitrogen gas to simplify the cleaning equipment, reduce the cleaning cost and shorten the cleaning time. The present invention relates to a PDP cleaning method using a laser and an Ar ECR plasma.

During the PDP manufacturing process, contaminants such as particles, organic matter, heavy metals and ionic impurities, oxide films, and metals are adsorbed on the surface of the PDP, and defects of the PDP chip are generated after each process. Contaminants should be removed.

The method of cleaning the contaminants adsorbed on the surface of PDP can be largely classified into wet and dry. Currently, dry cleaning cannot remove the contaminants sufficiently. Wet cleaning is the mainstream.

In the wet cleaning, the PDP is sequentially moved by the transfer robot, soaked in the chemical liquid (acid or ammonia) tank or the washing tank, and then rotated to dry the PDP.

In general, the cleaning equipment as described above is operated under demanding conditions, and the robot needs low oscillation, transfer reliability, high speed, and chemical resistance, and a high-performance motor is used for the reliability of the transfer or the high-speed transfer. Special chemical materials are also selected for double sealing with fluorine resin.

PDP cleaning equipment is generally called a wet station, which uses a method of rotating PDP, spraying pure cleaning liquid on its surface, and cleaning the particles with a brush. Particles may be sprayed to remove particles, and a method of oscillating high frequency ultrasonic waves may be used to drop particles by vibrating force.

Therefore, the conventional PDP cleaning equipment as described above uses pure water or chemicals to remove contaminants in the PDP, and thus inefficient use of water (1,000 gallon / 100 mm 2) or chemicals in the process. By using, a large amount of VOCs (IPA, Aceton), acids (fluoric acid, sulfuric acid), solvents can cause problems such as generation and wastewater treatment, and additionally expensive due to the complexity of the process There was this.

Therefore, an object of the present invention is to remove the contaminants adsorbed on the PDP in order to reduce the defect rate of the PDP after performing each step in the PDP treatment process of the PDP manufacturing process, using the argon ECR plasma to remove the natural oxide film PDP using laser and Ar ECR plasma, which can remove the metal impurities on the surface of the PDP and clean it using laser and nitrogen gas, which can simplify the cleaning equipment, reduce the cleaning cost and shorten the cleaning time. It is to provide a cleaning method.

Technical method of the present invention for achieving the above object, in the process of cleaning the PDP during the PDP manufacturing process, the step of automatically transferring the PDP to the cleaning space; Separating the metal oxide on the surface of the PDP by removing the native oxide film using the argon ECR plasma to the transferred PDP; Radiating a laser to separate contaminants adsorbed on the PDP; And injecting an inert gas into the separated contaminants and discharging them to the outside for cleaning.

The present invention is a dry process that can completely replace the wet cleaning process, it is possible to drastically reduce the use of the generation of chemicals and waste water treatment mentioned in the prior art, as well as to implement a multi-stage treatment process for removing contaminants. It can be reduced to a one-step process, minimizing contamination through materials generated in the process of removing chemicals.

After the photoresist is applied to the PDP, or each process of developing, etching, and forming the electrode is performed, the PDP is washed. As described above, conventionally, the soil is adsorbed onto the PDP using pure water, chemicals, and brushes. In contrast to the removal of the material, the present invention uses an argon ECR plasma to remove the native oxide film, and then removes metal impurities on the surface of the PDP. After the separation, the secondary cleaning is performed in a process of blowing and cleaning an inert gas such as a strong nitrogen gas through a nozzle to remove all contaminants generated in the manufacturing process of the PDP.

In addition, various wavelengths and frequencies of the laser can be used to selectively remove specific contaminants, eliminating all contaminants in one process.

Particles, organics and ionic impurities adsorbed on the PDP are cleaned using a laser. Heavy metals and metal oxides (Natrium / Chemical Oxide) are removed by argon ECR plasma The metal impurities on the surface of the PDP are removed.

In order to remove contaminants through this cleaning, there should be no damage to the electronic circuits on the PDP, and cleaning gas and laser wavelength suitable for the PDP process should be used.

In addition, cleaning using an argon ECR plasma is not only in contact with a specific part of the PDP, but in contact with the entire surface of the PDP to remove metal oxides on the surface of the PDP, thereby separating metal impurities on the surface of the PDP, and the laser to the entire surface of the PDP. After spinning, the foreign matter bound by the electrostatics is separated from the PDP, and a strong nitrogen gas is ejected to the front of the PDP to discharge the foreign matter to the outside.

When the laser is emitted to the foreign material, the electrostatic phenomenon between the PDP and the foreign material is removed by the laser ablation effect, and the foreign material is separated from the PDP.

Using the Argon ECR plasma as described above, the minimum particle size that can be removed can be up to 0.09㎛, and the cleaning time can be within 25 seconds (200sec / 200mm2) per 200mm2, which can increase the amount of PDP cleaning per minute. The wavelength of the laser is preferably 248 nm, and depending on the contaminants to be cleaned, HCl, HF / H₂O or HF / alcohol is used as the cleaning liquid, and a krypton fluoride laser is used as the laser. Argon fluoride excimer (ArF Excimer) laser can be used.

If PDP is cleaned in the same way as above, the size of the storage tank and plumbing equipment for the chemical process can be drastically reduced, and it is possible to reduce about 50% of the cleaning space and to reduce about 50% of the basic working space. Innovate to reduce your workspace.

In addition, due to the use of the minimum amount of pure water and chemicals required for the existing cleaning, it is possible to produce PDPs that are competitive in price by reducing production costs as well as environmental purification costs such as wastewater treatment.

Therefore, in the present invention, unlike the conventional method, by using a minimum amount of pure water and chemicals in the cleaning process of the PDP manufacturing process, the cost of chemicals and the cost of reducing wastewater treatment costs can be reduced, as well as the minimum of harmful substances. Emissions have the effect of minimizing the cost of environmental pollution.

In addition, the storage tank and plumbing equipment for the chemical process can be reduced to innovatively reduce the work space has the effect of increasing the work output in a certain space.

In addition, the success of the dry cleaning of the PDP manufacturing process can achieve 100% of the dry process of the PDP manufacturing process.

Claims (4)

In the process of cleaning the PDP during the PDP manufacturing process, Automatically transferring the PDP to a cleaning space; Separating the metal oxide on the surface of the PDP by removing the native oxide film using the argon ECR plasma to the transferred PDP; And radiating a laser to separate contaminants such as micro-contamination such as particles, organics, and ionic impurities adsorbed on the PDP; And injecting an inert gas into the separated contaminants and discharging them to the outside to clean the PDP. The method of claim 1, And a vacuum chamber in which the laser is operated and a vacuum chamber capable of argon ECR plasma are used in common. The method of claim 1, The laser is a PDP cleaning method using a laser and Ar ECR plasma, characterized in that using a fluorine krypton excimer (KrF Excimer) laser. The method of claim 1, The laser is a PDP cleaning method using a laser and Ar ECR plasma, characterized in that using an argon fluoride (ArF Excimer) laser.