KR20020000194A - Method cleaning Electro Luminescence Display using Laser and HCl Annealing - Google Patents

Abstract

PURPOSE: An ELD cleaning method using a laser and an HCl annealing is provided to be capable of simplifying cleaning equipment, reducing cleaning costs and shortening cleaning time by making metal contaminants into metal organics through an annealing process under the diluted mixing gas atmosphere in which cleaning gas and inert gas are mixed and then removing the metal organics, and cleaning the PDP using a laser and nitrogen gas. CONSTITUTION: First, an ELD is automatically conveyed to a cleaning space. Then, metal contaminants are made into metal organics by annealing the ELD under the diluted mixing gas atmosphere in which cleaning gas and inert gas are mixed, thereby removing the metal organics. Next, contaminants absorbed to the ELD are separated by radiating a laser. Finally, the ELD is completely cleaned by injecting inert gas to the separated contaminants and then discharging the inert gas including the contaminants.

Description

Method cleaning Electro Luminescence Display using Laser and HCl Annealing

The present invention relates to a method for cleaning an ELD, which is a type of flat panel display. In particular, after performing each step in the ELD process, the contaminants adsorbed on the ELD are removed to reduce the defective rate of the ELD. This process is performed by mixing a cleaning gas with an inert gas and heat-treating in a dilute gas atmosphere to remove metal contaminants into metal organics, and cleaning using a laser and nitrogen gas. The present invention relates to an ELD cleaning method using laser and HCl annealing that can simplify equipment, reduce cleaning costs, and shorten cleaning time.

In each process of ELD during the ELD manufacturing process, contaminants such as particles, organic matter, heavy metals and ionic impurities, oxide film, and metal are adsorbed on the surface of the ELD, and this contaminant causes defective ELD chips. Contaminants should be removed.

The method of cleaning contaminants adsorbed on the surface of ELD can be classified as wet and dry. Currently, dry cleaning cannot remove contaminants sufficiently. Wet cleaning is the mainstream.

In the wet cleaning, the ELD is sequentially moved by the transfer robot, soaked in the chemical liquid (acid or ammonia) tank or the washing tank, and the ELD is rotated and dried.

In general, the cleaning equipment as described above is operated under demanding conditions, and the robot needs low oscillation, transfer reliability, high speed, and chemical resistance, and a high-performance motor is used for the reliability of the transfer or the high-speed transfer. Special chemical materials are also selected for double sealing with fluorine resin.

As a device for cleaning ELD, a device called a wet station is usually used, and a method of rotating the ELD, spraying a pure cleaning liquid on the surface thereof, and then cleaning the particles with a brush is used. Particles may be sprayed to remove particles, and a method of oscillating high frequency ultrasonic waves may be used to drop particles by vibrating force.

Therefore, the above-described conventional ELD cleaning equipment uses pure water or chemicals to remove contaminants in the ELD. Therefore, inefficient use of pure water (1,000 gallon / 100 mm 2) or chemicals is used in the process. By using, a large amount of VOCs (IPA, Aceton), acids (fluoric acid, sulfuric acid), solvents can cause problems such as generation and wastewater treatment, and additionally expensive due to the complexity of the process There was this.

Therefore, an object of the present invention is to remove the contaminants adsorbed on the ELD in order to reduce the defective rate of the ELD after performing each step in the ELD treatment process of the ELD manufacturing process, by mixing the cleaning gas and inert gas, etc. Heat treatment in a dilute mixed gas atmosphere to remove and remove metal contaminants into metal organics, and cleaning using laser and nitrogen gas, simplifying cleaning equipment, reducing cleaning costs, and time required for cleaning It is to provide an ELD cleaning method using a laser and HCl annealing that can achieve a shortening of.

Technical method of the present invention for achieving the above object, in the process of cleaning the ELD ELD manufacturing process, the step of automatically transferring the ELD to the cleaning space; Mixing the cleaning gas with an inert gas to the transferred ELD and performing heat treatment in a dilute mixed gas atmosphere to form and remove metal contaminants into metal organics; Radiating a laser to separate contaminants adsorbed on the ELD; And injecting an inert gas into the separated contaminants and discharging them to the outside for cleaning.

The present invention is a dry process that can completely replace the wet cleaning process, it is possible to drastically reduce the use of the generation of chemicals and waste water treatment mentioned in the prior art, as well as to implement a multi-stage treatment process for removing contaminants. It can be reduced to a one-step process, minimizing contamination through materials generated in the process of removing chemicals.

After the photoresist is applied to the ELD or developed, etched, and formed to form an electrode, the ELD is washed. As described above, conventionally, the soil is adsorbed onto the ELD using pure water, chemicals, and brushes. In contrast to the removal of substances, the present invention is a primary cleaning for cleaning metal contaminants into metal organics (Metal Organics) by heat treatment in a mixed gas atmosphere in which the concentration of the cleaning gas and inert gas is mixed with ELD. All contaminants generated in the ELD treatment process are caused by the second cleaning process in which the contaminants bound by static electricity are separated on the ELD by emitting a laser and a laser, and then an inert gas such as a strong nitrogen gas is ejected through the nozzle to be cleaned. The material is removed.

In addition, various wavelengths and frequencies of the laser can be used to selectively remove specific contaminants, eliminating all contaminants in one process.

Particles, organics and ionic impurities adsorbed on the ELD are cleaned using a laser, and heavy metals and oxides (Natrium / Chemical Oxide) are mixed with HCl and H₂ gas with NO, N₂, etc. By heat treatment in a dilute mixed gas atmosphere, the metal contaminants are made into metal organics and removed.

In order to remove contaminants through this cleaning, the electronic circuits on the ELD should not be damaged, and cleaning gases and laser wavelengths suitable for the ELD process should be used.

In addition, the heat treatment in the mixed gas atmosphere where NO and N2 are mixed with HCl and H2 gas is not only in contact with the specific part of the ELD, but in contact with the entire surface of the ELD, and the atomic bonding portion of the oxide film and metals on the surface of the ELD The metal is made of metal organs, and the laser radiates to the entire surface of the ELD to separate the foreign matter bound by the static electricity from the ELD, and then ejects the strong nitrogen gas to the front of the ELD to discharge the foreign matter to the outside.

When the laser is emitted to the foreign material, the electrostatic phenomenon between the ELD and the foreign material is removed by the laser ablation effect, and the foreign material is separated from the ELD.

By using HCl annealing and laser as described above, the minimum particle size that can be removed can be up to 0.09㎛, and the cleaning time can be within 25 seconds per 200mm2 (25sec / 200mm2) to increase the amount of ELD cleaning per minute. The wavelength of the laser is most preferably 248 nm, and depending on the contaminants to be cleaned, HCl, HF / H₂O or HF / alcohol is used as the cleaning liquid, and a fluorine krypton excimer laser is used as the laser. Or ArF fluorinated (ArF Excimer) laser.

If ELD is cleaned in the same way as above, the size of the storage tank and plumbing equipment for the chemical process can be drastically reduced, and it is possible to reduce about 50% of the cleaning space and to reduce about 50% of the basic working space. Innovate to reduce your workspace.

In addition, the use of the minimum amount of pure water and chemicals required for the existing cleaning can reduce production costs as well as environmental purification costs such as waste water treatment to produce a competitive price ELD.

Therefore, in the present invention, unlike the conventional, by using a minimum amount of pure water and chemicals in the cleaning process of the ELD manufacturing process, not only can reduce the cost of reducing the cost of purchasing chemicals and waste water treatment costs, but also minimizes the harmful substances. Emissions have the effect of minimizing the cost of environmental pollution.

In addition, the storage tank and plumbing equipment for the chemical process can be reduced to innovatively reduce the work space has the effect of increasing the work output in a certain space.

In addition, the success of the dry cleaning unit in the ELD manufacturing process can achieve a 100% dry process of the ELD manufacturing process.

Claims (4)

In the process of cleaning the ELD in the ELD manufacturing process, Automatically transferring the ELD to a cleaning space; Making heavy metals and oxide films in the transferred ELD by heat treatment in a mixed gas atmosphere having reduced concentration by mixing NO and N 2 with HCl and H 2 gas; And emitting a laser to separate contaminants such as micro-contamination such as particles, organics, and ionic impurities adsorbed on the ELD; And injecting an inert gas to the separated contaminants to discharge the same to the outside to clean the ELD cleaning method. The method of claim 1, And a vacuum chamber capable of HCl annealing and a vacuum chamber in which the laser is operated, in common. An ELD cleaning method using a laser and HCl annealing. The method of claim 1, The laser is an ELD cleaning method using a laser and HCl annealing, characterized in that using a fluorine krypton excimer (KrF Excimer) laser. The method of claim 1, The laser is an ELD cleaning method using a laser and HCl annealing, characterized in that using an argon fluoride (ArF Excimer) laser.