KR20010084456A - a color filter panel for a liquid crystal display and a manufacturing method thereof - Google Patents
a color filter panel for a liquid crystal display and a manufacturing method thereof Download PDFInfo
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- KR20010084456A KR20010084456A KR1020000009504A KR20000009504A KR20010084456A KR 20010084456 A KR20010084456 A KR 20010084456A KR 1020000009504 A KR1020000009504 A KR 1020000009504A KR 20000009504 A KR20000009504 A KR 20000009504A KR 20010084456 A KR20010084456 A KR 20010084456A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134336—Matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134372—Electrodes characterised by their geometrical arrangement for fringe field switching [FFS] where the common electrode is not patterned
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Abstract
Description
본 발명은 액정 표시 장치용 색 필터 기판을 형성하는 방법에 관한 것이다.The present invention relates to a method of forming a color filter substrate for a liquid crystal display device.
액정 표시 장치는 일반적으로 공통 전극과 색 필터(color filter) 등이 형성되어 있는 상부 기판과 박막 트랜지스터와 화소 전극 등이 형성되어 있는 하부 기판 사이에 액정 물질을 주입해 놓고 화소 전극과 공통 전극에 서로 다른 전위를 인가함으로써 전계를 형성하여 액정 분자들의 배열을 변경시키고 이를 통해 빛의 투과율을 조절함으로써 화상을 표현하는 장치이다.In general, a liquid crystal display device injects a liquid crystal material between an upper substrate on which a common electrode, a color filter, and the like are formed, and a lower substrate on which a thin film transistor and a pixel electrode are formed. By applying a different potential to form an electric field to change the arrangement of the liquid crystal molecules and thereby to control the light transmittance through which the image is expressed.
그런데, 액정 표시 장치는 시야각이 좁은 단점이 있다. 이러한 단점을 극복하고자 시야각을 넓히기 위한 다양한 방법이 제시되고 있는데, 액정 분자를 상하 기판에 대하여 수직으로 배향하고 화소 전극과 공통 전극에 개구 패턴을 형성하는 PVA(patterned vertical alignment) 방식이 그 한 예이다.However, the liquid crystal display has a disadvantage in that the viewing angle is narrow. To overcome this drawback, various methods for widening the viewing angle have been proposed. For example, a patterned vertical alignment (PVA) method in which liquid crystal molecules are vertically aligned with respect to the upper and lower substrates and an opening pattern is formed in the pixel electrode and the common electrode is one example. .
그러나, PVA 방식의 경우 상부 기판의 색 필터 위에 형성되어 있는 공통 전극에 개구 패턴을 형성하는 사진 식각 공정이 추가되어야 하며, 공통 전극에 주로 사용되는 ITO 식각시 하부의 색 필터가 손상을 입게 된다.However, in the case of the PVA method, a photolithography process of forming an opening pattern must be added to the common electrode formed on the color filter of the upper substrate, and the lower color filter is damaged during ITO etching, which is mainly used for the common electrode.
본 발명의 과제는 액정 표시 장치의 시야각을 넓히는 것이다.An object of the present invention is to widen the viewing angle of a liquid crystal display device.
본 발명의 다른 과제는 액정 표시 장치의 색 필터의 손상을 방지하는 것이다.Another object of the present invention is to prevent damage to the color filter of the liquid crystal display device.
도 1은 본 발명에 따른 액정 표시 장치를 도시한 것이고,1 illustrates a liquid crystal display device according to the present invention,
도 2 내지 도 6은 본 발명의 제1 실시예에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법을 나타낸 것이며,2 to 6 illustrate a method of manufacturing a color filter substrate for a liquid crystal display device according to a first embodiment of the present invention.
도 7 내지 도 11은 본 발명의 제2 실시예에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법을 나타낸 것이다.7 to 11 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.
이러한 과제를 해결하기 위해 본 발명에서는 색 필터에 홈을 형성하고 전극을 형성한 다음 홈 내부를 유기 물질로 채운다.In order to solve this problem, in the present invention, a groove is formed in the color filter, an electrode is formed, and the inside of the groove is filled with an organic material.
본 발명에 따른 색 필터 기판의 제조 방법에서는 절연 기판 위에 홈을 가지는 색 필터를 형성하고 색 필터를 덮는 전극을 형성한 다음, 홈을 채우는 유기 물질을 형성한다.In the method for manufacturing a color filter substrate according to the present invention, a color filter having a groove is formed on an insulating substrate, an electrode covering the color filter is formed, and then an organic material filling the groove is formed.
여기서, 유기 물질을 형성하는 단계는 유기 물질을 도포하는 단계, 노광 및 현상하여 홈 상부를 제외한 유기 물질을 제거하는 단계, 이어 홈 상부의 유기 물질을 일부 제거하는 단계를 포함할 수 있다.The forming of the organic material may include applying the organic material, exposing and developing the organic material to remove the organic material except the upper part of the groove, and then removing the organic material on the upper part of the groove.
이때, 홈 상부의 유기 물질을 일부 제거하는 단계는 애싱 방법이나 현상액을이용할 수 있다.At this time, the step of removing a portion of the organic material on the upper groove may use an ashing method or a developer.
유기 물질의 비저항은 1×1012Ω㎝ 내지 1×1014Ω㎝ 인 것이 좋으며, 유전 상수는 4이하인 것이 좋다.The specific resistance of the organic material is preferably 1 × 10 12 Ωcm to 1 × 10 14 Ωcm, and the dielectric constant is preferably 4 or less.
여기서, 유기 물질은 블랙 매트릭스로 이루어질 수 있다.Here, the organic material may be made of a black matrix.
또한, 유기 물질은 유기 감광막으로 이루어질 수 있으며, 이때 홈 하부에 블랙 매트릭스를 더 포함하는 것이 좋다.In addition, the organic material may be formed of an organic photoresist film, and in this case, it is preferable to further include a black matrix under the groove.
본 발명에서는 기판 위에 홈을 가지는 색 필터를 형성하고 전극을 형성한 다음 유기 물질로 홈을 채우므로 색 필터가 손상되지 않으면서도 전극을 패터닝한 것과 같은 효과를 가진다. 따라서 액정 표시 장치의 시야각을 넓힐 수 있다.In the present invention, since the color filter having the groove is formed on the substrate, the electrode is formed, and then the groove is filled with the organic material, the color filter is not damaged, and thus the same pattern as the electrode is obtained. Therefore, the viewing angle of the liquid crystal display device can be widened.
그러면, 첨부한 도면을 참조하여 본 발명의 실시예에 따른 액정 표시 장치용 색 필터 기판 및 그 제조 방법에 대해 상세히 설명한다.Next, a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention and a manufacturing method thereof will be described in detail with reference to the accompanying drawings.
도 1은 본 발명의 실시예에 따른 액정 표시 장치의 상부 및 하부 기판을 배치한 상태를 나타내는 도면으로서, 두 기판(1, 5)이 일정한 거리를 두고 마주 보고 있으며, 두 기판(1, 5)의 안쪽면에는 각각 전계 생성 전극인 화소 전극(2) 및 공통 전극(7)이 형성되어 있다. 여기서, 하부 기판(1)의 화소 전극(2)에는 개구부가 형성되어 있으며, 상부 기판(5)의 공통 전극(7) 하부에는 색 필터(6)가 형성되어 있다. 색 필터(6)는 적, 녹, 청의 세가지 색으로 이루어지는데 하나의 색이 하나의 화소와 마주 대하도록 한다. 전극(2, 7) 위에는 각각 수직 배향막(3, 8)이 형성되어 있고, 두 배향막(3, 8) 사이에는 음의 유전율 이방성을 가지는 액정층(10)이 위치하고 있다. 각각의 기판(1, 5) 바깥면에는 액정층(10)으로 들어가는 빛 및 액정층(9)을 통과해 나오는 빛을 편광시키는 편광판(4, 9)이 부착되어 있는데, 하부 기판(1)에 부착된 편광판(4)의 편광축은 상부 기판(5)에 부착된 편광판(9)의 편광축에 대하여 90˚의 각을 이루고 있다.FIG. 1 is a view illustrating a state where upper and lower substrates are disposed in a liquid crystal display according to an exemplary embodiment of the present invention. The pixel electrode 2 and the common electrode 7 which are electric field generating electrodes are respectively formed in the inner surface of. Here, an opening is formed in the pixel electrode 2 of the lower substrate 1, and a color filter 6 is formed under the common electrode 7 of the upper substrate 5. The color filter 6 is composed of three colors of red, green, and blue so that one color faces one pixel. Vertical alignment films 3 and 8 are formed on the electrodes 2 and 7, respectively, and the liquid crystal layer 10 having negative dielectric anisotropy is positioned between the two alignment films 3 and 8. On the outer surface of each of the substrates 1 and 5, polarizers 4 and 9 are attached to the lower substrate 1 to polarize the light entering the liquid crystal layer 10 and the light passing through the liquid crystal layer 9. The polarization axis of the attached polarizing plate 4 forms an angle of 90 degrees with respect to the polarization axis of the polarizing plate 9 attached to the upper substrate 5.
도 2 내지 도 6은 본 발명의 제1 실시예에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법을 도시한 것이다.2 to 6 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.
먼저, 도 2에 도시한 바와 같이 절연 기판(11) 위에 금속막으로 이루어진 블랙 매트릭스(20)를 형성하고, 그 위에 색 필터(30)를 형성한다. 색 필터(30)는 홈(301)을 가지는데, 홈(301)은 블랙 매트릭스(20) 상부에 위치한다.First, as shown in FIG. 2, a black matrix 20 made of a metal film is formed on the insulating substrate 11, and a color filter 30 is formed thereon. The color filter 30 has a groove 301, which is located above the black matrix 20.
다음, 도 3에 도시한 바와 같이 ITO(indium tin oxide)와 같은 투명 도전 물질을 증착하여 색 필터(30) 및 홈(301)을 덮는 공통 전극(40)을 형성한다.Next, as shown in FIG. 3, a transparent conductive material such as indium tin oxide (ITO) is deposited to form a common electrode 40 covering the color filter 30 and the groove 301.
다음, 도 4에 도시한 바와 같이 공통 전극(40) 상부에 저유전율을 가지는 유기 감광막(50)을 코팅한다. 유기 감광막(50)의 비저항은 1×1012Ω㎝ 내지 1×1014Ω㎝ , 유전 상수(dielectric constant)는 4이하인 것이 바람직하다.Next, as shown in FIG. 4, an organic photosensitive film 50 having a low dielectric constant is coated on the common electrode 40. The resistivity of the organic photoresist film 50 is preferably 1 × 10 12 Ωcm to 1 × 10 14 Ωcm and a dielectric constant of 4 or less.
이어, 도 5에 도시한 바와 같이 유기 감광막(50)을 노광 및 현상하여 홈(301) 상부를 제외한 유기 감광막(50)을 제거한다.Subsequently, as illustrated in FIG. 5, the organic photoresist film 50 is exposed and developed to remove the organic photoresist film 50 except for the upper portion of the groove 301.
다음, 도 6에 도시한 바와 같이 애싱(ashing) 방법을 이용하여 남아 있는 유기 감광막(50)의 일부를 제거하는데, 이때 제거 후 남은 유기 감광막(50)의 높이는 색 필터(30) 상부의 공통 전극(40)과 같게 형성할 수 있으며, 더 높거나 더 낮을수도 있다. 이때, 애싱 방법 대신 현상액(developer)에 담그는 시간을 길게 하여 유기 감광막(50)을 제거할 수 있으며, 이 공정은 생략할 수도 있다.Next, as shown in FIG. 6, a part of the remaining organic photoresist film 50 is removed by using an ashing method, and the height of the remaining organic photoresist film 50 after removal is the common electrode above the color filter 30. It can be the same as (40), it may be higher or lower. In this case, the organic photoresist film 50 may be removed by elongating the developer in the developer instead of the ashing method, and the process may be omitted.
여기서, 유기 감광막(50)은 빛을 받은 부분이 현상 후 남아 있는 성질의 음성 감광막(50)을 이용하는데, 이와 반대로 빛을 받지 않은 부분이 현상 후 남게 되는 양성 감광막을 이용할 수도 있다.Here, the organic photoresist film 50 uses a negative photoresist film 50 having a property in which light is left after development. On the contrary, a positive photoresist film may be used in which an unlighted part remains after development.
한편, 본 발명에서 자외선을 흡수하는 색 필터(30)를 사용할 경우에는 색 필터(30)를 마스크로 후면 노광을 실시한 다음 유기 감광막(50)을 현상할 수도 있다.On the other hand, in the case of using the color filter 30 that absorbs ultraviolet rays in the present invention, the organic photosensitive film 50 may be developed after performing the back exposure using the color filter 30 as a mask.
다음, 도 7 내지 도 11은 본 발명의 제2 실시예에 따른 액정 표시 장치용 색 필터 기판을 제조하는 방법을 도시한 것이다.7 to 11 illustrate a method of manufacturing a color filter substrate for a liquid crystal display according to a second embodiment of the present invention.
먼저, 도 7에 도시한 바와 같이 절연 기판(11) 위에 홈(311)을 가지는 색 필터(31)를 형성한다.First, as shown in FIG. 7, the color filter 31 having the grooves 311 is formed on the insulating substrate 11.
다음, 도 8에 도시한 바와 같이 ITO와 같은 투명 도전 물질을 증착하여 색 필터(31) 및 홈(311)을 덮는 공통 전극(41)을 형성한다.Next, as shown in FIG. 8, a transparent conductive material such as ITO is deposited to form a common electrode 41 covering the color filter 31 and the groove 311.
다음, 도 9에 도시한 바와 같이 공통 전극(41) 상부에 감광성 유기 물질로 이루어진 블랙 매트릭스(60)를 코팅한다. 여기서, 블랙 매트릭스(60)의 비저항은 1×1012Ω㎝ 내지 1×1014Ω㎝, 유전 상수는 4이하인 것이 바람직하다.Next, as shown in FIG. 9, a black matrix 60 made of a photosensitive organic material is coated on the common electrode 41. Here, the specific resistance of the black matrix 60 is preferably 1 × 10 12 Ωcm to 1 × 10 14 Ωcm, and the dielectric constant is 4 or less.
이어, 도 10에 도시한 바와 같이 블랙 매트릭스(60)를 노광 및 현상하여 홈(311) 상부를 제외한 블랙 매트릭스(60)를 제거한다.Next, as illustrated in FIG. 10, the black matrix 60 is exposed and developed to remove the black matrix 60 except for the upper portion of the groove 311.
다음, 도 11에 도시한 바와 같이 애싱 방법을 이용하여 남아 있는 블랙 매트릭스(60)의 일부를 제거한다. 이때, 블랙 매트릭스(60)의 높이는 색 필터(31) 상부의 공통 전극(41)과 같게 형성할 수 있으며, 더 높거나 더 낮을 수도 있다. 이때, 애싱 방법 대신 현상액에 담그는 시간을 길게 하여 남아있는 블랙 매트릭스(60)를 제거할 수 있으며, 이 공정은 생략할 수도 있다. 여기서, 자외선을 흡수하는 색 필터(31)를 사용할 경우에는 색 필터(31)를 마스크로 후면 노광을 실시하여 색 필터(31) 상부의 블랙 매트릭스(60)를 현상할 수 있다.Next, as shown in FIG. 11, a part of the remaining black matrix 60 is removed using an ashing method. In this case, the height of the black matrix 60 may be formed to be the same as the common electrode 41 above the color filter 31, and may be higher or lower. At this time, the remaining black matrix 60 can be removed by prolonging the time for immersion in the developer instead of the ashing method, and this step can be omitted. When the color filter 31 absorbing ultraviolet rays is used, the black matrix 60 on the upper portion of the color filter 31 may be developed by performing back exposure using the color filter 31 as a mask.
이와 같이 형성된 홈(311)의 가장자리 부분에서는 공통 전극(41)에 전압이 인가되었을 때 프린지 필드(fringe field)가 생성되는데 유기 물질로 이루어진 블랙 매트릭스(60)가 공통 전극(41) 위에 형성되어 있으므로 프린지 필드의 휘는 정도가 증가한다. 따라서, 본 발명에 따르면 색 필터(31)의 손상을 방지하면서도 공통 전극(41)에 개구 패턴이 형성된 것과 같은 효과를 낼 수 있다.In the edge portion of the groove 311 formed as described above, a fringe field is generated when a voltage is applied to the common electrode 41. Since a black matrix 60 made of an organic material is formed on the common electrode 41, a fringe field is formed. The warp of the fringe field increases. Therefore, according to the present invention, it is possible to prevent the damage of the color filter 31 and to produce the same effect as the opening pattern is formed in the common electrode 41.
또한, 제2 실시예에서는 블랙 매트릭스(60)가 홈(311) 부분에만 형성되므로 제1 실시예에서 보다 개구율이 8% 이상 증가한다.In addition, in the second embodiment, since the black matrix 60 is formed only in the groove 311 portion, the opening ratio is increased by 8% or more than in the first embodiment.
본 발명에서는 색 필터에 홈을 형성한 다음 공통 전극을 형성하고 홈 내부를 유기 블랙 매트릭스로 채움으로써 프린지 필드의 세기를 강화하고 개구율을 증가시킬 수 있다.In the present invention, by forming a groove in the color filter and then forming a common electrode and filling the inside of the groove with the organic black matrix, the strength of the fringe field can be enhanced and the aperture ratio can be increased.
Claims (9)
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| KR1020000009504A KR100686225B1 (en) | 2000-02-25 | 2000-02-25 | Manufacturing method of color filter panel for liquid crystal display |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100710159B1 (en) * | 2002-08-28 | 2007-04-20 | 엘지.필립스 엘시디 주식회사 | Liquid Crystal Display device |
| US8564746B2 (en) | 2010-10-25 | 2013-10-22 | Samsung Display Co., Ltd. | Color filter substrate, method of manufacturing the same, and display panel using the color filter substrate |
| US8981390B2 (en) | 2012-12-10 | 2015-03-17 | Samsung Display Co., Ltd. | Display device |
| US9523877B2 (en) | 2013-12-30 | 2016-12-20 | Samsung Display Co., Ltd | Liquid crystal display and manufacturing method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3521490B2 (en) * | 1994-08-05 | 2004-04-19 | カシオ計算機株式会社 | Liquid crystal display device and method of manufacturing the same |
| JPH08110518A (en) * | 1994-10-07 | 1996-04-30 | Shinto Paint Co Ltd | Color filter and production of liquid crystal display device |
| JP2606162B2 (en) * | 1994-10-28 | 1997-04-30 | 日本電気株式会社 | Liquid crystal display device and method of manufacturing the same |
| JP3556822B2 (en) * | 1998-03-05 | 2004-08-25 | シャープ株式会社 | Manufacturing method of dot matrix type liquid crystal display device |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100710159B1 (en) * | 2002-08-28 | 2007-04-20 | 엘지.필립스 엘시디 주식회사 | Liquid Crystal Display device |
| US8564746B2 (en) | 2010-10-25 | 2013-10-22 | Samsung Display Co., Ltd. | Color filter substrate, method of manufacturing the same, and display panel using the color filter substrate |
| US8981390B2 (en) | 2012-12-10 | 2015-03-17 | Samsung Display Co., Ltd. | Display device |
| US9523877B2 (en) | 2013-12-30 | 2016-12-20 | Samsung Display Co., Ltd | Liquid crystal display and manufacturing method thereof |
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