KR20010061574A - a method of manufacturing Zn-Ni alloy galvanized steel with good surface roughness, adhesion and formability and composition of electrolyte - Google Patents

a method of manufacturing Zn-Ni alloy galvanized steel with good surface roughness, adhesion and formability and composition of electrolyte Download PDF

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KR20010061574A
KR20010061574A KR1019990064070A KR19990064070A KR20010061574A KR 20010061574 A KR20010061574 A KR 20010061574A KR 1019990064070 A KR1019990064070 A KR 1019990064070A KR 19990064070 A KR19990064070 A KR 19990064070A KR 20010061574 A KR20010061574 A KR 20010061574A
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plating
chloride
zinc
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solution
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KR100436905B1 (en
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김현태
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이구택
포항종합제철 주식회사
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

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  • Chemical Kinetics & Catalysis (AREA)
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  • Electroplating Methods And Accessories (AREA)
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Abstract

PURPOSE: A process for preparing the titled alloy steel sheet by adding ammonium chloride and a mixture of sodium salt condensed naphthalene sulfonic acid, sodium sulfate and o-vanillin as an additive to a basic solution is provided. Whereby, the Zn-Ni alloy plated steel sheet has excellent plating layer roughness, adhesion and processability. CONSTITUTION: In a process for producing Zn-Ni alloy plated steel sheet by electroplating under conditions of 0.5 to 2.0 molar concentration of a zinc ion, 0.1 to 0.5 molar concentration of nickel ion, 6.0 to 9.0 molar concentration of a chloride ion, a pH of a plating solution of 2.5 to 4.5, a temperature of the plating solution of 55 to 75deg.C, a current density of 40 to 180A/dm¬2 and a relative speed between the plating solution and the cathode of 0.5 to 2.5m/sec, the ammonium ion of the plating solution is maintained in a concentration of 0.1 to 0.5 mol and a plating solution obtained by adding 0.05 to 5.0g/L o-vanillin to a basic solution is used.

Description

도금층 조도, 밀착성 및 가공성이 양호한 아연-니켈 합금 전기도금강판의 제조방법 및 그 도금액{a method of manufacturing Zn-Ni alloy galvanized steel with good surface roughness, adhesion and formability and composition of electrolyte}A method of manufacturing Zn-Ni alloy galvanized steel with good surface roughness, adhesion and formability and composition of electrolyte}

본 발명은 도금층 조도, 밀착성 및 가공성이 양호한 아연-니켈 합금전기강판의 제조방법 및 그 도금액 조성물에 관한 것으로, 특히 가용성 양극을 사용하는 아연-니켈 합금 전기 도금에 있어서 강판위에 양호한 도금층 조도, 밀착성 및 가공성이 우수한 전기도금강판과 그 도금액 조성물에 관한 것이다.The present invention relates to a method for producing a zinc-nickel alloy electrical steel sheet having good plating roughness, adhesion and workability, and a plating solution composition thereof. The present invention relates to a good plating layer roughness, adhesiveness and The present invention relates to an electroplated steel sheet excellent in workability and a plating solution composition thereof.

종래에 철 위에 금속 도금은 옛날부터 방청, 장식 등을 위해서 많이 사용되어져 왔다. 특히 강판의 내식성을 확보하기 위하여 아연전기도금이 개발되어서 가전, 자동차, 건설 등등의 분야에 널리 사용되어져 왔다. 그러나, 가혹한 분위기 하에서 내식성을 확보하기 이용하여 도금층의 두께를 증가시켜야 하며, 이로 인하여 비용의 증가 및 밀착성, 가공성 등에 좋지 않은 영향을 주었다. 따라서, 이러한 결점을 해결하기 위해서 아연 니켈 합금 전기도금이 개발되어 왔다. 아연-니켈 합금 전기도금은 욕의 성분에 따라서 여러 가지가 있으나, 그 중 산성 욕을 기본으로 한도금재 생산방식이 일반적으로 널리 사용되고 있다. 산성 욕에는 황화물 욕이 기본이 되는 것과 염화물 욕이 기본이 되는 것 등이 있다. 염화물 욕은 황화물 욕에 비하여 전기 전도도가 우수하여 고전류 밀도 도금이 가능하고, 주로 용해성 양극을 사용하여 불용성 양극을 사용하는 황화물 욕에 비하여 용액의 제어가 편리하고 비용이 적게 된다. 가용성 양극은 주로 아연과 니켈을 사용하며 일반적으로 아연이 약 85% 이상이다. 따라서, 아연 양극의 균일한 용해성 즉 슬러지(sludge)나 이물질이 양극에 남아있지 않아야 양호한 도금 제품을 생산할 수 있다. 그러나 아연과 니켈이 염화물 도금욕에서 전위차가 크므로 아연 양극에 니켈의 무 전해 치환에 의한 아연 수산화물 계통의 슬러지가 발생되고 이 슬러지는 양극의 표면에 붙어서 연속 작업의 아연 용해에 불균일 용해로 도금액의 농도 변화가 심하고, 통전을 방해함으로 인하여 도금 전압이 상승하며 도금층의 표면의 관이 균일하지 못하고 전착성의 불균일에 의하여 표면의 조도가 불균일해진다. 또한 슬러지 형태로 박리되어 도금층의 줄무늬 및 양 에지(Edge)에 버닝(Burning)성 얼룩이 발생되고, 슬러지 혼합에 의하여 도금층의 밀착성이 떨어지며, 이들로 인하여 가공성이 열세되는 원인이 된다.Conventionally, metal plating on iron has long been used for rust prevention, decoration, and the like. In particular, zinc electroplating has been developed to secure corrosion resistance of steel sheets and has been widely used in fields such as home appliances, automobiles, construction, and the like. However, it is necessary to increase the thickness of the plated layer by using the corrosion resistance in the harsh atmosphere, thereby adversely affects the increase in cost and adhesion, workability, and the like. Therefore, zinc nickel alloy electroplating has been developed to solve this drawback. There are various kinds of zinc-nickel alloy electroplating according to the components of the bath, but the production method of the plating material based on the acid bath is generally widely used. Acidic baths are based on sulfide baths and on chloride baths. Chloride baths have better electrical conductivity than sulfide baths, which enables high current density plating, and are easier to control and less expensive to control than sulfide baths that use insoluble anodes, mainly using soluble anodes. Soluble anodes mainly use zinc and nickel, and typically have more than about 85% zinc. Therefore, uniform solubility of the zinc anode, i.e., no sludge or foreign matter remains on the anode, can produce a good plated product. However, since zinc and nickel have a large potential difference in the chloride plating bath, sludge in the zinc hydroxide system is generated by electroless substitution of nickel on the zinc anode, and the sludge adheres to the surface of the anode, so that the concentration of the plating solution is caused by uneven dissolution of zinc in continuous operation. The change is severe, the plating voltage increases due to the interruption of the energization, the tube on the surface of the plating layer is not uniform, and the surface roughness is uneven due to the electrodeposition nonuniformity. In addition, peeling in the form of sludge causes burning stains on the stripes and both edges of the plating layer, and the adhesion of the plating layer is degraded by the sludge mixing, thereby causing deterioration of workability.

이러한 결함을 해결하기 위한 종래 기술로서, 일본 특허 소59-211589는 염화아연 및 염화니켈을 주성분으로 하는 염화물 욕 및 유산염을 혼합한 도금액에 염화 암모늄을 일부 첨가하고 도금 조건을 변경하여 석출물에 부수적으로 수반되는 황갈색이나 청자색의 산화물의 혼입 석출을 유효하게 억제하였다고 하였으나, 초기 약 100시간 정도까지는 산화물의 석출이 억제되지만, 그 이상 조업시 다시 석출물이나타나는 결점이 있다. 또한 일반적인 방법으로 알콜의 첨가에 의한 양극의 용해성을 개선하는 방법도 있으나 장시간 사용에 의하여 알콜의 휘발에 의한 소모가 심하며 도금층의 밀착성도 개선되지 못한다. 일본 특허 JP 93-167094에 의하면 유기화합물의 첨가에 의하여 도금층에 탄소량을 0.001∼10 wt% 함유시켜 가공성을 양호하게 하였으나 밀착성이 열악해지는 결점이 있다. 또한 도금액에 암모늄 이온을 첨가하여 양극의 반응성을 개선한 것도 있으나 이것도 양극에 슬러지의 이탈을 가속시켜 용액에 슬러지의 량이 증가된다. 이상의 종래 기술된 Zn-Ni 합금 도금에서 양극의 용해성을 개선으로 도금층의 조도, 밀착성 및 가공성을 개선할려고 하였으나 여의치 못하며 특히 장시간 도금에 의하여는 용액에 슬러지가 다시 증가되거나, 용액의 도금성 변화로 오히려 도금층이 불량해지는 결점이 있다.As a conventional technique for solving such defects, Japanese Patent No. 59-211589 discloses adding a portion of ammonium chloride to a plating solution containing a zinc chloride and nickel chloride as a main component of a chloride bath and a lactate, and altering the plating conditions, thereby adhering to the precipitate. Although it was said that effective mixing of precipitated yellowish brown or blue-violet oxides was effectively suppressed, the precipitation of oxides was suppressed up to about 100 hours at first, but there was a drawback that precipitated again during further operation. In addition, there is a method of improving the solubility of the positive electrode by the addition of alcohol as a general method, but the consumption by the volatilization of alcohol is severe by long time use and the adhesion of the plating layer is not improved. According to Japanese Patent JP 93-167094, the addition of an organic compound contained 0.001 to 10 wt% of carbon in the plating layer to improve workability, but has a disadvantage of poor adhesion. In addition, although ammonium ions are added to the plating solution to improve the reactivity of the positive electrode, this also accelerates the release of sludge in the positive electrode, thereby increasing the amount of sludge in the solution. In the above-described Zn-Ni alloy plating described above, an attempt was made to improve the roughness, adhesion, and workability of the coating layer by improving the solubility of the anode. There is a drawback that the plating layer is poor.

본 발명은 상기의 문제점을 해결하기 위하여 안출된 것으로서, 도금용액으로서 염화 아연과 염화 니켈을 기본으로 염화이온을 염화 칼륨으로 조정한 기본 용액에 염화 암모늄과 첨가제로서 술폰산나트륨(sodium salt condensed naphthalene sulfonic acie)과 황산염 나트륨(Sodium sulfate) 및 오-바닐린을 혼합한 첨가제를 적정량 첨가하여 도금층의 조도와 밀착성 및 가공성을 개선한 전기도금강팡의 제조방법 및 그 도금액 조성물을 제공하는 것을 목적으로 한다.The present invention has been made to solve the above problems, and as a plating solution, sodium salt condensed naphthalene sulfonic acie as an ammonium chloride and an additive in a basic solution of zinc chloride and nickel chloride based on potassium chloride. It is an object of the present invention to provide a method for producing an electroplated steel foil having improved roughness, adhesion and processability of a plating layer by adding an appropriate amount of an additive mixed with sodium sulfate and o-vanillin, and a plating solution composition thereof.

본 발명은 상기 목적을 달성하기 위하여, 염화 아연이 아연 이온 몰농도 : 0.5∼2.0 몰, 염화 니켈의 니켈이온 몰농도 : 0.1∼0.5 몰, 염화 이온의 몰 농도를 6.0∼9.0, 도금액의 pH : 2.5∼4.5, 도금액의 온도 : 55∼70℃, 전류 밀도를40∼180A/dm2및 도금액과 음극의 상대 유속을 0.5∼2.5m/sec의 도금 조건으로 통상 전기 도금하는 염화물욕 아연-니켈 합금 전기도금 강판의 제조방법에 있어서, 상기 도금액의 암모늄 이온의 농도를 0.1∼1.0 몰로 유지하고 이에 대하여 술폰산 나트륨의 몰비가 1:0.001∼0.008이 되고, 술폰산 나트륨과 황산염 나트륨 비가 1:0.1∼0.5로 구성되는 용액에 오바닐린을 0.05∼5.0g/L 첨가한 도금용액을 사용하여 제조하는 도금층 조도, 밀착성 및 가공성이 우수한 아연-니켈 합금 전기도금 강판의 제조방법을 제공하는 것을 특징으로 한다.In order to achieve the above object, the present invention provides a zinc chloride molar concentration of zinc ions: 0.5 to 2.0 moles, nickel ion molar concentration of nickel chloride: 0.1 to 0.5 moles, a molar concentration of chloride ions of 6.0 to 9.0, a pH of a plating solution: 2.5-4.5, Plating solution temperature: 55-70 ° C., Current density 40-180 A / dm 2, Chloride bath zinc-nickel alloy, usually electroplated under plating conditions of the plating liquid and the negative flow rate of 0.5-2.5 m / sec In the method for producing an electroplated steel sheet, the concentration of ammonium ions in the plating liquid is maintained at 0.1 to 1.0 mole, and the molar ratio of sodium sulfonate is 1: 0.001 to 0.008, and the sodium sulfonate and sodium sulfate ratio is 1: 0.1 to 0.5. It is characterized by providing a method for producing a zinc-nickel alloy electroplated steel sheet having excellent plating layer roughness, adhesiveness and workability, which are prepared by using a plating solution in which 0.05 to 5.0 g / L of an anianiline is added to the solution.

이하 본 발명을 더욱 상세히 설명한다.Hereinafter, the present invention will be described in more detail.

상기 목적을 달성하기 위하여 염화 아연이 아연 이온 몰농도 : 0.5∼2.0 몰, 염화 니켈의 니켈이온 몰농도 : 0.1∼0.5 몰, 염화 이온의 몰 농도를 6.0∼9.0을 기본으로 하고, 도금액의 pH : 2.5∼4.5, 도금액의 온도를 55∼70℃, 전류 밀도를 40∼180A/dm2및 도금액과 음극의 상대 유속을 0.5∼2.5/sec의 도금 조건으로 통상 전기 도금하는 염화물 욕 아연-니켈 합금 전기도금 강판을 제조하는 방법에 있어서 도금액에 첨가하는 물질로서 암모늄 이온의 농도를 0.1∼1.0 몰로 유지하고 이에 대하여 술폰산 나트륨의 몰비가 1:0.001∼0.008이 되고, 술폰산 나트륨과 황산염 나트륨 비가 1:0.1∼0.5로 구성되는 용액에 오바닐린을 0.05∼5.0g/L 첨가한 도금용액은 도금재의 물성을 개선시킨다.In order to achieve the above object, zinc chloride has a molar concentration of zinc ion of 0.5 to 2.0 moles, a nickel ion molar concentration of nickel chloride of 0.1 to 0.5 moles, and a molar concentration of chloride ion of 6.0 to 9.0, and the pH of the plating solution: Chloride bath zinc-nickel alloy electroplating, usually electroplating under the plating conditions of 2.5 to 4.5, the plating liquid temperature of 55 to 70 ° C, the current density of 40 to 180 A / dm 2, and the relative flow rates of the plating liquid and the cathode to 0.5 to 2.5 / sec. In the method for producing a coated steel sheet, the concentration of ammonium ions is maintained at 0.1 to 1.0 mol as a substance added to the plating solution, and the molar ratio of sodium sulfonate is 1: 0.001 to 0.008, and the ratio of sodium sulfonate and sodium sulfate is 1: 0.1 to A plating solution in which 0.05 to 5.0 g / L of ovanillin is added to a solution composed of 0.5 improves the physical properties of the plating material.

이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.

도금용액의 아연 이온은 몰 농도 0.5몰 이하에서는 도금에 층금속 이온의 부족으로 검게 그을리는 자국(burning)을 일으키고, 2.0몰 이상에서는 도금층이 분말 형태의 도금이 되어서 밀착성이 떨어진다. 니켈은 몰농도 0.1 몰 이하에서 도금층의 합금에서 니켈 함량이 10%이상 확보되지 않고 내식성이 떨어지며, 몰 농도 0.5몰 이상에서는 도금층의 니켈 함량이 16%이상이 되어서 가공성 및 내식성이 떨어진다. 염화 이온이 6.0 몰 이하에서는 전기전도도의 감소로 인하여 버닝이 다량 발생하고, 9.0 몰 이상에서는 용해도 문제로 염화 이온이 석출된다. 암모늄염은 몰 농도 0.1몰 이하에서 연속 도금작업을 어렵게 하는 찌거기(sludge)가 다량 발생되며, 1.0몰 이상에서는 양극에서 검은색의 피막이 발생되어 도금용액이 오염되고 밀착성이 떨어진다.Zinc ions in the plating solution cause burning blacking due to lack of layer metal ions in the plating at a molar concentration of 0.5 mol or less, and at 2.0 mol or more, the plating layer becomes powder-type plating, resulting in poor adhesion. Nickel is less than 10% of the nickel content in the alloy of the plated layer at a molar concentration of 0.1 mol or less, and corrosion resistance is lowered, and at a molar concentration of 0.5 mol or more, the nickel content of the plated layer is 16% or more, resulting in poor workability and corrosion resistance. When the amount of chloride ions is 6.0 mol or less, a large amount of burning occurs due to a decrease in electrical conductivity, and at 9.0 mol or more, chloride ions are precipitated due to solubility problems. Ammonium salt has a large amount of sludge which makes it difficult to perform continuous plating operation at a molar concentration of 0.1 mol or less, and a black film is generated at the anode at 1.0 mol or more, contaminating the plating solution and inferior in adhesion.

도금용액의 온도가 55℃ 이하에서는 도금층의 색상이 어둡고 도금층의 밀착성이 떨어져서 박리 현상이 나타난다. 도금층의 온도가 70℃ 이상이 되면 도금 줄무늬 현상이 심하며 도금층의 조도가 열악해진다. 도금용액의 pH는 2.5이하에서는 도금 표면이 어둡고 반광택 상태가 되며, 4.5 이상에서는 용액에 녹은 불순이온의 슬러지화에 의하여 도금액이 오염되므로 pH는 1. 5∼5.5로 제한하는 것이 바람직하다.When the temperature of the plating solution is 55 ° C. or lower, the color of the plating layer is dark and the adhesion of the plating layer is inferior, resulting in peeling phenomenon. When the temperature of the plating layer is 70 ° C. or more, the plating streaks are severe and the roughness of the plating layer is poor. When the pH of the plating solution is 2.5 or less, the plating surface becomes dark and semi-gloss, and when the plating solution is contaminated by sludge of impurity ions dissolved in the solution, the pH is preferably limited to 1.5 to 5.5.

술폰산나트륨의 농도가 암모늄 몰 대비 0.001 이하에서는 조업시 양극 피막의 슬러지를 억제하지 못하여 도금층의 조도 및 밀착성이 개선되지 못하며, 0.008 이상 첨가시는 도금층의 전류효율을 떨어뜨려 에지에 버닝성 표면 불량이 발생된다. 술폰산 나트륨 대비 황산염 나트륨의 비가 0.1 이하에서는 표면외관이 노랗게되고 조도가 개선되지 못하며, 0.5 이상에서는 밀착성이 감소된다. 오 바닐린의 농도가 0.05g/L 이하에서는 도금층의 가공성이 개선되지 않으며 5.0g/L 이상에서는 오히려 밀착성이 감소된다.If the concentration of sodium sulfonate is less than 0.001 compared to the ammonium mole, it is impossible to suppress the sludge of the anode film during operation, so that the roughness and adhesion of the coating layer cannot be improved. Is generated. When the ratio of sodium sulfate to sodium sulfate is less than 0.1, the surface appearance becomes yellow and roughness is not improved, and above 0.5, the adhesion is reduced. When the concentration of the o-vanillin is 0.05 g / L or less, the workability of the plated layer is not improved, and at 5.0 g / L or more, the adhesion is reduced.

이하, 실시예를 통하여 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail with reference to Examples.

(실시예)(Example)

냉연강판을 소지금속으로 하여 하기 표 1에 나타난 도금액 조성을 가진 용액을 연속조업으로 5일(120시간)을 도금후의 용액에 전기도금을 양극 반응성 시험장치로서 연속으로 4시간 행한후 도금액에 발생되어 있는 탁도량을 측정하였으며, 도금량은 30g/m2으로 도금하여 제품의 품질을 평가하여 도금층의 조도는 도금층 조도가 원파조도보다 크면 불량으로, 도금층 조도가 원판조도보다 작거나 같으면 양호로 판정하였다. 또한 도금 밀착성은 120°구부린 뒤 Tape에 묻어나는 도금층의 박리량으로 Tape에 박리된 도금층이 보이면 불량으로 나타내었다. 또한 가공성은 편면마찰 시험기에 의하여 방청유를 도포한 후 마찰계수가 0.13이하를 양호, 그 이상은 불량을 나타내었다.5 days (120 hours) in a continuous operation of a solution having the plating solution composition shown in Table 1 below using a cold rolled steel sheet as a base metal, and then electroplating the solution after plating for 4 hours continuously as a positive electrode reactivity test device. The turbidity was measured, and the coating amount was plated at 30 g / m 2 to evaluate the quality of the product. In addition, the plating adhesion was poor when the peeled plating layer on the tape was seen due to the peeling amount of the plating layer deposited on the tape after bending at 120 °. In addition, the machinability showed that the friction coefficient was less than 0.13 after application of antirust oil by a single-side friction tester, and more than that was poor.

구분division 도금액 조성Plating solution 첨가제 조건Additive condition 도금 품질Plating quality Zn2= Zn 2 = Cl- Cl - NH4= NH 4 = NH :술폰산나트륨(몰비)NH: sodium sulfonate (molar ratio) 술폰산나트륨:황산염나트륨(몰비)Sodium sulfonate: Sodium sulfate (molar ratio) 오-바닐량(g/L)O-Vanyl Amount (g / L) 도금액탁도량NTUPlating solution turbidity NTU 조도Roughness 가공성Machinability 도금박피성Plating Peelability 비교예Comparative example 1One 1.11.1 0.150.15 6.56.5 0.80.8 1:0.001: 0.00 0:00: 0 0.50.5 1.01.0 불량Bad 불량Bad 불량Bad 비교예Comparative example 22 1:0.00051: 0.0005 1:0.31: 0.3 0.50.5 0.90.9 불량Bad 불량Bad 불량Bad 발명예Inventive Example 33 1:0.0011: 0.001 1:0.31: 0.3 0.50.5 0.30.3 양호Good 양호Good 양호Good 발명예Inventive Example 44 1:0.0051: 0.005 1:0.31: 0.3 0.50.5 0.20.2 양호Good 양호Good 양호Good 발명예Inventive Example 55 1:0.0081: 0.008 1:0.31: 0.3 0.50.5 0.10.1 양호Good 양호Good 양호Good 비교예Comparative example 66 1:0.011: 0.01 1:0.31: 0.3 0.50.5 0.20.2 불량Bad 불량Bad 양호Good 비교예Comparative example 77 1:0.0051: 0.005 1:0.001: 0.00 0.50.5 0.40.4 불량Bad 불량Bad 양호Good 비교예Comparative example 88 1:0.051: 0.05 0.50.5 0.10.1 불량Bad 불량Bad 양호Good 발명예Inventive Example 99 1:0.11: 0.1 0.50.5 0.20.2 양호Good 양호Good 양호Good 발명예Inventive Example 1010 1:0.31: 0.3 0.50.5 0.20.2 양호Good 양호Good 양호Good 발명예Inventive Example 1111 1:0.51: 0.5 0.50.5 0,30,3 양호Good 양호Good 양호Good 비교예Comparative example 1212 1:0.61: 0.6 0.50.5 0.10.1 양호Good 불량Bad 불량Bad 비교예Comparative example 1313 1:0.31: 0.3 0.040.04 0.10.1 불량Bad 불량Bad 불량Bad 발명예Inventive Example 1414 0.050.05 0.30.3 양호Good 양호Good 양호Good 발명예Inventive Example 1515 0.10.1 0.20.2 양호Good 양호Good 양호Good 발명예Inventive Example 1616 0.50.5 0.20.2 양호Good 양호Good 양호Good 발명예Inventive Example 1717 1.01.0 0.30.3 양호Good 양호Good 양호Good 발명예Inventive Example 1818 3.03.0 0.10.1 양호Good 양호Good 양호Good 발명예Inventive Example 1919 5.05.0 0.20.2 양호Good 양호Good 양호Good 비교예Comparative example 2020 5.15.1 0.30.3 양호Good 불량Bad 불량Bad

상기 표 1에 나타낸 바와 같이 본 발명에 부합되는 발명예는 도금액이 청정화되며 조도, 밀착성 및 가공성이 양호함을 나타낸다.As shown in Table 1, the invention example consistent with the present invention shows that the plating liquid is cleaned and the roughness, adhesion and workability are good.

상술한 바와 같이 본 발명은 염화물계의 도금액에 있어서 아연-니켈 도금 품질에 우수한 효과를 나타낸다.As described above, the present invention shows an excellent effect on the zinc-nickel plating quality in the chloride-based plating solution.

Claims (2)

염화 아연이 아연 이온 몰농도 : 0.5∼2.0 몰, 염화 니켈의 니켈이온 몰농도 : 0.1∼0.5 몰, 염화 이온의 몰 농도를 6.0∼9.0, 도금액의 pH : 2.5∼4.5, 도금액의 온도 : 55∼70℃, 전류 밀도를 40∼180A/dm2및 도금액과 음극의 상대 유속을 0.5∼2.5m/sec의 도금 조건으로 통상 전기 도금하는 염화물욕 아연-니켈 합금 전기도금 강판의 제조방법에 있어서, 상기 도금액의 암모늄 이온의 농도를 0.1∼1.0 몰로 유지하고 이에 대하여 술폰산 나트륨의 몰비가 1:0.001∼0.008이 되고, 술폰산 나트륨과 황산염 나트륨 비가 1:0.1∼0.5로 구성되는 용액에 오바닐린을 0.05∼5.0g/L 첨가한 도금용액을 사용하여 제조하는 것을 특징으로 하는 도금층 조도, 밀착성 및 가공성이 우수한 아연-니켈 합금 전기도금 강판의 제조방법.Zinc chloride molar concentration of zinc ion: 0.5-2.0 mol, nickel ion molar concentration of nickel chloride: 0.1-0.5 mol, molar concentration of chloride ion 6.0-9.0, pH of plating liquid: 2.5-4.5, temperature of plating liquid: 55- In the method for producing a zinc chloride-nickel alloy electroplating steel sheet, which is usually electroplated at a plating condition of 70 to 180 A / dm 2 , a current density of 40 ° C., and a relative flow rate of the plating solution and the cathode to 0.5 to 2.5 m / sec. The concentration of ammonium ions in the plating solution was maintained at 0.1 to 1.0 mole, and the molar ratio of sodium sulfonate was 1: 0.001 to 0.008, and the solution of obaniline was 0.05 to 5.0 in a solution having a sodium sulfonate and sodium sulfate ratio of 1: 0.1 to 0.5. A method of manufacturing a zinc-nickel alloy electroplated steel sheet having excellent plating layer roughness, adhesiveness, and workability, which is prepared using a plating solution added with g / L. 염화 아연이 아연 이온 몰농도 : 0.5∼2.0 몰, 염화 니켈의 니켈이온 몰농도 : 0.1∼0.5 몰, 염화 이온의 몰 농도를 6.0∼9.0, 도금액의 pH : 2.5∼4.5, 도금액의 온도 : 55∼70℃, 전류 밀도를 40∼180A/dm2및 도금액과 음극의 상대 유속을 0.5∼2.5m/sec의 도금 조건으로 아연-니켈 합금 전기도금 강판을 제조하기 위한 도금액에서, 상기 도금액의 암모늄 이온의 농도를 0.1∼1.0 몰로 유지하고 이에 대하여 술폰산 나트륨의 몰비가 1:0.001∼0.008이 되고, 술폰산 나트륨과 황산염 나트륨 비가 1:0.1∼0.5로 구성되는 용액에 오바닐린을 0.05∼5.0g/L 첨가한 것을 특징으로 하는 도금액 조성물.Zinc chloride molar concentration of zinc ion: 0.5-2.0 mol, nickel ion molar concentration of nickel chloride: 0.1-0.5 mol, molar concentration of chloride ion 6.0-9.0, pH of plating liquid: 2.5-4.5, temperature of plating liquid: 55- In a plating solution for producing a zinc-nickel alloy electroplated steel sheet at a plating condition of 70 DEG C, a current density of 40 to 180 A / dm 2 and a relative flow rate of the plating liquid and the cathode of 0.5 to 2.5 m / sec, the ammonium ion of the plating liquid The concentration was maintained at 0.1 to 1.0 mole, and the molar ratio of sodium sulfonate was 1: 0.001 to 0.008, and 0.05 to 5.0 g / L of obaniline was added to the solution composed of 1: 0.1 to 0.5 ratio of sodium sulfonate and sodium sulfate. Plating liquid composition, characterized in that.
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KR100940669B1 (en) * 2002-12-28 2010-02-05 주식회사 포스코 Zn-Ni Alloy Electrodeposition Electrolyte, Preparing Method of Zn-Ni Alloy Electrodeposited Steel Sheet and Steel Sheet Prepared Thereby Having Good Surface Appearance, Adhesion and Anti-Chipping

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KR960006597B1 (en) * 1993-12-27 1996-05-20 포항종합제철주식회사 Zn-ni alloy solution for an electroplating and the method for manufacturing a zn-ni alloy electroplating steel plate using the same
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KR100940669B1 (en) * 2002-12-28 2010-02-05 주식회사 포스코 Zn-Ni Alloy Electrodeposition Electrolyte, Preparing Method of Zn-Ni Alloy Electrodeposited Steel Sheet and Steel Sheet Prepared Thereby Having Good Surface Appearance, Adhesion and Anti-Chipping

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