KR20010045207A - A palladium alloy composite membrane for permeances of hydrogen, and preparation thereof - Google Patents
A palladium alloy composite membrane for permeances of hydrogen, and preparation thereof Download PDFInfo
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- KR20010045207A KR20010045207A KR1019990048413A KR19990048413A KR20010045207A KR 20010045207 A KR20010045207 A KR 20010045207A KR 1019990048413 A KR1019990048413 A KR 1019990048413A KR 19990048413 A KR19990048413 A KR 19990048413A KR 20010045207 A KR20010045207 A KR 20010045207A
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- support
- palladium alloy
- composite membrane
- palladium
- hydrogen gas
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- 239000012528 membrane Substances 0.000 title claims abstract description 63
- 239000002131 composite material Substances 0.000 title claims abstract description 51
- 229910001252 Pd alloy Inorganic materials 0.000 title claims abstract description 50
- 239000001257 hydrogen Substances 0.000 title description 11
- 229910052739 hydrogen Inorganic materials 0.000 title description 11
- 125000004435 hydrogen atom Chemical class [H]* 0.000 title 1
- 238000005984 hydrogenation reaction Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 65
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 238000007747 plating Methods 0.000 claims abstract description 37
- 238000000926 separation method Methods 0.000 claims abstract description 32
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000010409 thin film Substances 0.000 claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 239000011148 porous material Substances 0.000 claims abstract description 15
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 13
- 239000000843 powder Substances 0.000 claims abstract description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 47
- 229910052763 palladium Inorganic materials 0.000 claims description 21
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 7
- 239000002243 precursor Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 3
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229910021472 group 8 element Inorganic materials 0.000 claims description 2
- 239000012510 hollow fiber Substances 0.000 claims description 2
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- 230000004048 modification Effects 0.000 claims description 2
- 238000012986 modification Methods 0.000 claims description 2
- 230000035699 permeability Effects 0.000 abstract description 14
- 239000000126 substance Substances 0.000 abstract description 7
- 230000008569 process Effects 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 26
- 239000007789 gas Substances 0.000 description 13
- 238000009713 electroplating Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000007772 electroless plating Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000010306 acid treatment Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000008040 ionic compounds Chemical class 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- ZZLOQICNGDMUBA-UHFFFAOYSA-N tetraethyl silicate;hydrate Chemical compound O.CCO[Si](OCC)(OCC)OCC ZZLOQICNGDMUBA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
본 발명은 수소기체 분리용 팔라듐 합금 복합막과 이의 제조방법에 관한 것으로서, 더욱 상세하게는 다공성 금속지지체 표면을 니켈 미립 분말로 분산 및 열처리하는 전처리 공정을 수행하여 지지체의 기공 크기 및 거칠음 정도를 완화시켜주고, 또한 지지체와 팔라듐 합금층 사이에는 졸-겔법에 의한 실리카 박막층을 도입하여 금속지지체와 팔라듐 합금층간의 열적 화학적 안정성을 도모함은 물론이고, 팔라듐 합금층 도입방법으로는 진공 도금법을 수행하여 지지체 표면에 존재하는 기공을 깊숙히 막아 줄 뿐만 아니라 도금층의 두께를 2 ㎛ 이하로 박막층을 형성하도록하여 수소기체에 대한 선택 투과성을 향상시키게 되는 수소기체 분리용 팔라듐 합금 복합막과 이의 제조방법에 관한 것이다.The present invention relates to a palladium alloy composite membrane for hydrogen gas separation and a method for manufacturing the same, and more particularly, to reduce the pore size and roughness of the support by performing a pretreatment process of dispersing and heat-treating the porous metal support surface with nickel fine powder. Also, between the support and the palladium alloy layer, a silica thin film layer by sol-gel is introduced to promote thermal and chemical stability between the metal support and the palladium alloy layer, and a vacuum plating method is used as the palladium alloy layer introduction method. The present invention relates to a palladium alloy composite membrane for hydrogen gas separation and a method of manufacturing the same, which not only deeply prevent pores present on the surface, but also form a thin film layer having a thickness of 2 μm or less, thereby improving selective permeability to hydrogen gas.
Description
본 발명은 수소기체 분리용 팔라듐 합금 복합막과 이의 제조방법에 관한 것으로서, 더욱 상세하게는 다공성 금속지지체 표면을 니켈 미립 분말로 분산 및 열처리하는 전처리 공정을 수행하여 지지체의 기공 크기 및 거칠음 정도를 완화시켜주고, 또한 지지체와 팔라듐 합금층 사이에는 졸-겔법에 의한 실리카 박막층을 도입하여 금속지지체와 팔라듐 합금층간의 열적 화학적 안정성을 도모함은 물론이고, 팔라듐 합금층 도입방법으로는 진공 도금법을 수행하여 지지체 표면에 존재하는 기공을 깊숙히 막아 줄 뿐만 아니라 도금층의 두께를 2 ㎛ 이하로 박막층을 형성하도록하여 수소기체에 대한 선택 투과성을 향상시키게 되는 수소기체 분리용 팔라듐 합금 복합막과 이의 제조방법에 관한 것이다.The present invention relates to a palladium alloy composite membrane for hydrogen gas separation and a method for manufacturing the same, and more particularly, to reduce the pore size and roughness of the support by performing a pretreatment process of dispersing and heat-treating the porous metal support surface with nickel fine powder. Also, between the support and the palladium alloy layer, a silica thin film layer by sol-gel is introduced to promote thermal and chemical stability between the metal support and the palladium alloy layer, and a vacuum plating method is used as the palladium alloy layer introduction method. The present invention relates to a palladium alloy composite membrane for hydrogen gas separation and a method of manufacturing the same, which not only deeply prevent pores present on the surface, but also form a thin film layer having a thickness of 2 μm or less, thereby improving selective permeability to hydrogen gas.
일반적으로 팔라듐 계통의 금속막이 수소기체에 대한 선택적 투과성이 우수한 것으로 널리 알려져 있다. 그러나, 팔라듐 자체막을 사용할 경우 수소기체의 압력과 온도에 따라서 다량의 수소를 흡수하고 팔라듐 격자를 상당히 넓히므로써 팔라듐내에 비틀림이 생기고 변형이 일어난다. 이러한 문제점을 해결하기 위해 팔라듐과 다른 금속의 합금막을 제조하여 사용하고 있다.In general, it is widely known that a palladium-based metal film is excellent in selective permeability to hydrogen gas. However, when the palladium self-membrane is used, a large amount of hydrogen is absorbed according to the pressure and temperature of the hydrogen gas, and the palladium lattice is considerably widened, causing twisting and deformation in the palladium. In order to solve this problem, alloy films of palladium and other metals are manufactured and used.
또한, 막의 성능을 보다 높이기 위해 다공성 지지체와 팔라듐을 코팅하여 박막화하는 방법이 고려되고 있으며, 이러한 복합막 형태의 분리막에 관한 연구가 주로 진행중에 있다. 복합막 형태의 막을 사용하지 않고 팔라듐 자체막이나 팔라듐 합금 자체막을 사용할 경우[미국특허 제2,773,561호]에는 사용 온도나 압력에 견디기 위해 25 ∼ 150 ㎛ 정도의 비교적 두꺼운 막을 형성시켜야만 하고, 고가인 팔라듐을 과량 사용해야할 뿐만 아니라 막의 두께가 두꺼워짐에 따라 수소기체의 투과속도가 작아지는 문제가 있다.In addition, in order to further improve the performance of the membrane, a method of coating a porous support and palladium and thinning it is considered, and a study on such a membrane of a composite membrane type is mainly underway. When using a palladium self film or a palladium alloy self film without using a composite film type (US Patent No. 2,773,561), a relatively thick film having a thickness of about 25 to 150 µm must be formed to withstand the use temperature or pressure, and expensive palladium may be formed. In addition to excessive use, as the thickness of the membrane becomes thick, there is a problem that the permeation rate of the hydrogen gas becomes small.
한편, 최근에 연구 개발된 것으로서, 다공성 지지체 표면에 전기도금법에 의해 팔라듐 합금막을 형성하되, 핀홀이 없는 균일한 팔라듐 합금 박막 형성이 가능하게 하기 위하여 지지체 표면을 개질화하고, 특히 전기도금시에는 도금면의 반대쪽에서 진공을 걸어 주어 도금층의 두께를 얇게 조정하여 수소를 함유하는 혼합기체에서의 수소기체에 대한 선택적 투과성을 향상시키게 되는 개선된 수소기체 분리용 복합막의 제조방법이 특허출원된 바도 있다[대한민국특허공개 제99-53804호].On the other hand, as a recent research and development, to form a palladium alloy film on the surface of the porous support by electroplating, to modify the surface of the support in order to enable the formation of a uniform palladium alloy thin film without pinholes, in particular during plating [0004] There has been a patent application for a method for producing a composite membrane for hydrogen gas separation that improves the selective permeability to hydrogen gas in a mixed gas containing hydrogen by applying a vacuum on the opposite side of the surface to reduce the thickness of the plating layer. Republic of Korea Patent Publication No. 99-53804].
본 발명은 상기한 대한민국특허공개 제99-53804호의 개량발명으로서, 니켈 미립 분말로 개질화된 다공성 금속지지체 상부에 진공-전기도금법에 의한 팔라듐 합금막을 도입하기에 앞서서 졸-겔법에 의한 실리카 박막층을 지지체와 팔라듐 합금막 사이에 도입하여 팔라듐 합금층의 금속과 지지체상의 금속간의 열적·화학적 안정성을 도모하는 동시에 뛰어난 수소기체의 투과계수 및 분리성능을 갖는 수소기체 분리용 복합막과 이의 제조방법을 제공하는데 그 목적이 있다.The present invention is an improvement of the above-described Korean Patent Publication No. 99-53804, wherein the silica thin film layer by the sol-gel method prior to introducing the palladium alloy film by the vacuum-electroplating method on the porous metal support modified with nickel fine powder It is introduced between the support and the palladium alloy membrane to provide thermal and chemical stability between the metal of the palladium alloy layer and the metal on the support, and also has a hydrogen gas separation composite membrane having excellent permeability and separation performance of the hydrogen gas and a method of manufacturing the same. Its purpose is to.
도 1a는 다공성 금속지지체층과 팔라듐 합금층으로 구성되는 복합막에 있어,상기한 두 층 사이에 실리카 박막층이 형성되어 있지 않은 복합막에 대한 Electron probe microanalyzer (EPMA) 측정 결과를 나타낸 것이다.FIG. 1A illustrates a Electron Probe Microanalyzer (EPMA) measurement result of a composite membrane including a porous metal support layer and a palladium alloy layer, in which a silica thin film layer is not formed between the two layers.
도 1b는 실리카 박막층이 형성된 복합막에 대한 Electron probe microanalyzer (EPMA) 측정 결과를 나타낸 것이다.Figure 1b shows the results of the Electron probe microanalyzer (EPMA) measurement for the composite film on which the silica thin film layer is formed.
도 2a는 다공성 금속지지체층과 팔라듐 합금층으로 구성되는 복합막에 있어,상기한 두 층 사이에 실리카 박막층이 형성되어 있지 않은 복합막에 대한 기체 투과 실험 결과를 나타낸 것이다.FIG. 2A illustrates a gas permeation test result for a composite membrane in which a silica thin film layer is not formed between the two layers in the composite membrane composed of a porous metal support layer and a palladium alloy layer.
도 2b는 실리카 박막층이 형성된 복합막에 대한 기체 투과 실험 결과를 나타낸 것이다.Figure 2b shows the results of gas permeation experiment for the composite membrane formed silica thin film layer.
본 발명은 다공성 금속지지체 상부에 팔라금 합금의 도금층이 도입되어 있는 공지의 수소기체 분리용 복합막에 있어서, 상기 다공성 금속지지체와 팔라금 합금의 도금층 사이에 실리카 박막층이 형성되어 있는 수소기체 분리용 팔라듐 합금 복합막을 그 특징으로 한다.The present invention relates to a hydrogen gas separation composite membrane in which a plating layer of a palladium alloy is introduced on a porous metal support, wherein a silica thin film layer is formed between the porous metal support and the plating layer of a palladium alloy. It is characterized by the palladium alloy composite film.
또한, 본 발명은 다공성 금속지지체 상부에 팔라금 합금의 도금층이 도입되어 있는 수소기체 분리용 복합막의 제조방법에 있어서, a) 다공성 금속지지체 표면에 니켈 미립 분말을 분산 코팅시킨 후 열처리하는 지지체 표면의 개질화 과정, b) 상기 개질화된 다공성 금속지지체 상부에 테트라에틸오르쏘실리케이트(TEOS)를 가수분해하여 제조한 실리카 졸 전구체를 코팅하여 실리카 박막층을 형성하는 과정, 그리고 c) 상기 실리카 박막층이 형성된 지지체의 한쪽면에 700 Torr 이하로 감압을 걸어주면서 지지체의 다른 한쪽면에 팔라듐 합금의 도금층을 형성하는 과정이 포함되는 수소기체 분리용 팔라듐 합금 복합막의 제조방법을 또다른 특징으로 한다.In addition, the present invention is a method for producing a hydrogen gas separation composite membrane in which a plating layer of a palladium alloy is introduced on the porous metal support, a) the surface of the support surface to be subjected to heat treatment after dispersion coating nickel fine powder on the porous metal support surface A process of reforming, b) coating a silica sol precursor prepared by hydrolyzing tetraethyl orthosilicate (TEOS) on the modified porous metal support to form a silica thin film layer, and c) forming the silica thin film layer Another method is to provide a method for preparing a hydrogen gas separation palladium alloy composite membrane including forming a plating layer of palladium alloy on the other side of the support while applying a reduced pressure of 700 Torr or less on one side of the support.
이와 같은 본 발명을 더욱 상세히 설명하면 다음과 같다.Referring to the present invention in more detail as follows.
본 발명에 따른 복합막의 지지체로서는 다공성 금속을 사용하는 바, 전도성 금속재를 사용하거나 또는 전도성 물질이 코팅된 세라믹재 또는 유리질재를 사용한다. 여기서, 전도성 금속재라 함은 전기도금시 직류전기를 가했을 때 통전할 수 있는 특성을 가지는 것으로 그 예로는 구리, 니켈, 크롬, 카드뮴, 금, 은, 백금, 코발트, 철, 안티몬, 인듐, 망간, 레늄, 로오듐, 팔라듐, 오스늄, 이리듐, 텅스텐 등이 있으며 스텐리스 스틸 등과 같은 합금 종류도 이에 포함된다. 다공성 금속지지체로서 특히 바람직하기로는 다공성 스텐레스 스틸(Mott Metallurgical Corporation, SUS 316L)을 사용할 수 있는 바, 다른 물질에 비해 경제적일 뿐만 아니라 균열이나 부식의 염려가 없고 가공이 용이한 특징을 가지며, 높은 기계적 강도를 갖고 모듈화가 쉽기 때문에 실제 고순도 수소 분리정제 시스템이나 촉매 반응기에의 적용이 용이하다. 다공성 금속지지체는 기공 크기가 0.2 ∼ 0.5 ㎛로서 평막형, 중공사막형, 튜브형 등 여러 형태의 것을 사용하여도 무방하다.As the support of the composite membrane according to the present invention, a porous metal is used, and a conductive metal material or a ceramic or glass material coated with a conductive material is used. Here, the conductive metal material has the property of energizing when direct current is applied to the electroplating, for example, copper, nickel, chromium, cadmium, gold, silver, platinum, cobalt, iron, antimony, indium, manganese, Rhenium, rhodium, palladium, osmium, iridium, tungsten and the like, and alloys such as stainless steel. Particularly preferred as a porous metal support, porous stainless steel (Mott Metallurgical Corporation, SUS 316L) can be used, which is economical compared to other materials, has no fear of cracking or corrosion, and is easy to process, and has high mechanical properties. Because of its strength and easy modularity, it is easy to apply to actual high purity hydrogen separation purification system or catalytic reactor. The porous metal support may have a pore size of 0.2 to 0.5 µm, and may be used in various forms such as flat membrane, hollow fiber membrane, and tubular.
상기한 다공성 금속지지체 표면에 직접 도금층을 형성하게 되면 도금층이 두껍고 다소 핀홀이 존재할 수 있어 기체 분리용으로 부적합한 구조를 갖을 수 있으므로 도금층 형성에 앞서 지지체 표면의 개질화가 필수적이다. 즉, 다공성 금속지지체의 기공 크기나 구조, 표면의 매끄러운 성질이 도금층의 상태에 중요한 영향을 끼치므로 이들을 조절할 필요성이 있다. 이에, 본 발명에서는 지지체 표면에 1 ㎛ 이하의 니켈 미립 분말을 코팅하고, 700 ∼ 800 ℃에서 4 ∼ 6 시간정도 열처리하여 지지체 표면의 거칠음 정도를 완화시켜줄 뿐만 아니라 적당한 기공도와 기공 크기를 유지토록 하였다.When the plating layer is directly formed on the surface of the porous metal support, the plating layer may be thick and somewhat have pinholes, and thus may have an unsuitable structure for gas separation. Therefore, modification of the support surface is essential before forming the plating layer. That is, the pore size, structure, and smoothness of the surface of the porous metal support have a significant effect on the state of the plating layer, and thus, there is a need to adjust them. Therefore, in the present invention, the surface of the support is coated with nickel fine powder of 1 μm or less and heat-treated at 700 to 800 ° C. for about 4 to 6 hours to reduce the roughness of the support surface and to maintain proper porosity and pore size. .
한편, 제조된 복합막을 고온에서 장시간 수소기체 투과 시키면 팔라듐 합금층과 금속지지체 사이의 금속간 확산 현상이 일어남으로써 수소기체의 분리 성능이 현저히 감소하게 된다. 따라서, 본 발명에서는 열적·화학적 안정성을 고려하여 팔라듐 합금층과 지지체 사이에 졸-겔법에 의한 실리카 박막층을 형성시킴으로써 장벽 역할을 해 주어 금속간 확산 현상을 억제하였다. 즉, 테트라에틸오르쏘실리케이트(TEOS)의 가수분해반응을 제어하여 일정한 크기의 실리카 졸 전구체들을 팔라듐 합금층과 지지체 사이에 도포함으로써 이러한 금속간 확산 현상을 방지하였다.Meanwhile, when hydrogen gas permeates the manufactured composite membrane at high temperature for a long time, the intermetallic diffusion phenomenon between the palladium alloy layer and the metal support occurs, thereby significantly reducing the separation performance of the hydrogen gas. Accordingly, in the present invention, in consideration of thermal and chemical stability, the silica thin film layer formed by the sol-gel method between the palladium alloy layer and the support serves as a barrier to suppress the intermetallic diffusion phenomenon. In other words, by controlling the hydrolysis reaction of tetraethyl orthosilicate (TEOS) by applying a predetermined size of silica sol precursors between the palladium alloy layer and the support to prevent such intermetallic diffusion phenomenon.
본 발명에 따른 실리카 박막의 형성과정을 보다 상세히 설명하면 다음과 같다: 우선, 졸(sol) 제조과정에서는 가수분해반응과 축합반응이 일어나며 이 반응에서 주된 변수는 축합 반응속도에 대한 가수분해 속도이다. 실리카 졸(sol)은 폴리머 졸과 콜로이드 졸의 두 가지 종류가 있는데, 두 종류 모두 무기염이나 유기 금속화합물이다. 폴리머 졸의 경우 전구체를 적은 양의 물과 반응시켜 가수분해 속도를 늦추고 이와 같이 해서 생성된 겔은 상호 연결 구조를 갖는다. 이에 반하여, 콜로이드 졸의 경우는 가수분해 속도가 빠른 전구체를 많은 양의 물과 반응시켜 급속히 가수분해시키고 생성된 하이드록사이드나 하이드레드 옥사이드를 재분산시켜 안정화된 콜로이드 용액을 만든다. 처음의 입자크기는 출발 물질이나 반응조건에 따라 3 ∼ 15 ㎚ 정도로 되며, 응집체는 5 ∼ 1000 ㎚ 정도된다. 본 발명에서 사용된 단분산 실리카 구체는 스토버(stober)법에 의해 제조되며, 균일하고 밀도 높은 메조포어(mesopore) 영역의 기공들을 얻기 위해 입자 크기가 균일한 단분산 실리카 졸을 제조하여 실험 예상치 500 ㎚의 95 % 정도 크기의 졸을 제조할 수 있었다. 이상에서 설명한 실리카의 가수분해 및 축합 반응 메카니즘은 다음 반응식 1과 같다.The process of forming the silica thin film according to the present invention will be described in more detail as follows: First, in the sol manufacturing process, a hydrolysis reaction and a condensation reaction occur. . There are two kinds of silica sol, polymer sol and colloidal sol, both of which are inorganic salts or organometallic compounds. In the case of polymer sol, the precursor is reacted with a small amount of water to slow down the hydrolysis rate and the resulting gel has an interconnect structure. In contrast, in the case of a colloidal sol, a fast hydrolysis precursor is reacted with a large amount of water to rapidly hydrolyze and redisperse the resulting hydroxide or hydroxide oxide to form a stabilized colloidal solution. The initial particle size is about 3 to 15 nm depending on the starting material and the reaction conditions, and the aggregate is about 5 to 1000 nm. The monodisperse silica spheres used in the present invention are prepared by the Stober method, and experimentally estimated by preparing a monodisperse silica sol having a uniform particle size in order to obtain pores in a uniform and dense mesopore region. A sol of about 95% size at 500 nm could be prepared. The hydrolysis and condensation reaction mechanism of silica described above is shown in Scheme 1 below.
Si(OH)4→ SiO2+ 2H2OSi (OH) 4 → SiO 2 + 2H 2 O
상기 반응식 1에 나타낸 바와 같이, 테트라에틸오르쏘실리케이트(TEOS) 1 mol 또는 2 mol이 물 4 mol과 반응하여 가수분해가 일어난다. 보통 물과 TEOS 비는 20/1 보다 크며, pH가 아주 높을 때 축합이 촉진된다. 보통 입자 크기는 평균값에서 -5 ∼ 8 % 정도 분포하며, 입자들간의 척력보다는 표면장력이 보다 크기 때문에 표면에서의 실리카 입자들의 응집이 일어난다. 적당한 크기로 성장된 실리카 구들에 의해 니켈 미립 분말로 처리된 지지체의 기공이 메조포아(mesopore) 범위의 균일한 크기를 가짐으로써 기체분리막의 지지체로 적합한 구조를 가질 수 있도록 조절 가능하였다.As shown in Scheme 1, 1 mol or 2 mol of tetraethylorthosilicate (TEOS) reacts with 4 mol of water to undergo hydrolysis. Usually the water-TEOS ratio is greater than 20/1, and condensation is accelerated at very high pH. Usually, the particle size ranges from -5 to 8% in the mean value, and the surface tension is greater than the repulsive force between the particles, so that agglomeration of silica particles occurs on the surface. The pores of the support treated with nickel fine powder by the silica spheres grown to a suitable size had a uniform size in the mesopore (mesopore) range was adjustable to have a suitable structure as the support of the gas separation membrane.
다공성 지지체 위에 팔라듐 막 또는 팔라듐 함유하는 박막이 구성되어 있는 복합막을 제조함에 있어, 현재까지는 주로 무전해 도금법[J. of Memb. Sci., 77 (1993) 181, Ind. Eng. Chem. Res., 32 (1993) 3006], 전기도금법[H.P.Hsieh, Inorganic Membranes for Separation and Reaction, Elservier, 1996], 화학 증착법[Ind. Eng. Chem. Res., 33 (1994) 616, J. of Memb. Sci., 120 (1996) 261], 스퍼터링[J. of Memb. Sci., 94 (1994) 299, J. of Memb. Sci., 104 (1995) 251] 등을 적용시켜 왔다. 금속재질의 다공성 지지체 위에 전기도금에 의한 복합막 제조시 다른 방법에 비해 간단한 공정에 의해 복합막을 제조할 수 있을 뿐만 아니라 막 두께의 조절이 용이하며 무전해 도금법이나 화학 증착법에 비해 적은 시간이 소요되므로 매우 경제적인 방법이라고 할 수 있다. 그러나 통상적인 전기도금법이나 무전해도금법에 의해 핀홀이 없는 균일한 막을 제조하기 위해서는 5 ㎛ 이상의 비교적 두꺼운 도금막을 형성하게 되므로 막의 투과 성능 저하를 가져올 수 있다.In producing a composite membrane comprising a palladium membrane or a palladium-containing thin film on a porous support, up to now, mainly electroless plating method [J. of Memb. Sci., 77 (1993) 181, Ind. Eng. Chem. Res., 32 (1993) 3006], electroplating method [H.P. Hsieh, Inorganic Membranes for Separation and Reaction, Elservier, 1996], chemical vapor deposition method [Ind. Eng. Chem. Res., 33 (1994) 616, J. of Memb. Sci., 120 (1996) 261, sputtering [J. of Memb. Sci., 94 (1994) 299, J. of Memb. Sci., 104 (1995) 251, and the like. When manufacturing a composite membrane by electroplating on a metallic porous support, not only can the composite membrane be prepared by a simple process but also easy to control the thickness of the membrane and takes less time than the electroless plating method or the chemical vapor deposition method. It's a very economical way. However, in order to produce a uniform film without pinholes by a conventional electroplating method or an electroless plating method, a relatively thick plated film of 5 μm or more may be formed, thereby causing a decrease in the permeation performance of the film.
이에, 본 발명에서는 다공성 금속지지체 위에 팔라듐 합금막을 형성하기 위해 전기도금법을 적용시키되, 전기도금시 도금면의 반대쪽에서 700 Torr 이하, 바람직하기로는 500 ∼ 650 Torr 진공을 가해 주면서 전기도금을 수행함으로써 지지체 표면에 존재하는 기공을 깊숙이 막아 줄 뿐만 아니라 도금층의 두께를 2 ㎛ 이하로 줄일 수 있었다. 이로 인해 통상적인 전기도금법에 의해 제조된 막의 경우에 비해 수소기체의 투과 특성이 월등히 향상되었을 뿐만 아니라 종래 기술이 가진 문제점을 해결하고 훨씬 우수한 투과도와 선택도를 보인다.Thus, in the present invention, the electroplating method is applied to form a palladium alloy film on the porous metal support, but when the electroplating, the support by performing the electroplating while applying 700 torr or less, preferably 500 to 650 Torr vacuum on the opposite side of the plating surface In addition to deeply preventing pores present on the surface, the thickness of the plating layer was reduced to 2 μm or less. As a result, the permeation characteristics of the hydrogen gas are significantly improved as compared with the case of the membrane prepared by the conventional electroplating method, and it solves the problems of the prior art and shows much better permeability and selectivity.
한편, 팔라듐의 합금막 제조에 있어, 팔라듐은 팔라듐 착화합물[Hydmen Gijutsu, M. Matsunaga, M. Hara, A. Ablimit, Y. Tsura and K. Hosokawa, 43(10) (1992) 987] 형태로 사용하는 것이 보다 바람직하다. 또한, 팔라듐 금속의 합금금속으로는 전이금속을 사용하며, 전이금속으로는 Pt, Rh, Ir, Fe, Co, Ni 등의 Ⅷ족 원소; Cu, Ag, Au 등의 Ib족 원소; Cr, Mo, W 등의 ⅥA족 원소; Ti, Zr 등의 ⅣA족 원소; Ta, Nb, V 등의 V족 원소이다. 팔라듐과 전이금속간의 합금을 용이하게 해주기 위하여 전이금속은 이온화합물 형태로 사용하는 것이 보다 바람직하다. 또한, 팔라듐 합금층에는 팔라듐의 함량이 50 중량% 이상 되도록 하며, 바람직하기로는 팔라듐/전이금속의 함량비가 50∼90/10∼50 중량% 되도록 하는 것이다.Meanwhile, in the manufacture of palladium alloy films, palladium is used in the form of palladium complexes (Hydmen Gijutsu, M. Matsunaga, M. Hara, A. Ablimit, Y. Tsura and K. Hosokawa, 43 (10) (1992) 987). It is more preferable to do. In addition, a transition metal is used as the alloy metal of the palladium metal, and Group VIII elements such as Pt, Rh, Ir, Fe, Co, and Ni; Group Ib elements, such as Cu, Ag, and Au; VIA group elements such as Cr, Mo, and W; Group IVA elements such as Ti and Zr; Group V elements such as Ta, Nb, and V. In order to facilitate the alloy between the palladium and the transition metal, the transition metal is more preferably used in the form of an ionic compound. In addition, the palladium alloy layer has a content of palladium of 50% by weight or more, and preferably a content ratio of palladium / transition metal of 50-90 / 10-50% by weight.
이상의 제조방법으로 제조된 복합막의 성능을 시험하기 위해서 정상상태 기체 투과도 장치를 이용하여 투과도를 측정하였으며, 수소 분리막과 투과 셀과의 실링은 그라파이트 링을 사용하였고 셀의 바깥측에 전기로를 설치하여 온도를 조절하였다.In order to test the performance of the composite membrane prepared by the above manufacturing method, the permeability was measured by using a steady state gas permeability device. The sealing between the hydrogen separation membrane and the permeation cell was made of graphite ring, and the furnace was installed at the outside of the cell. Was adjusted.
일반적으로 기체 분리막에 사용되는 지지체의 기체 투과 흐름은 투과 기체 분자의 분자량 제곱근에 반비례하는 누센 확산(Knudsen diffusion)에 의해 조절된다. 이 때 수소와 질소의 분리 계수는 3.7 정도이다. 실제로 지지체에 니켈 미립 분말을 코팅하여 준비된 지지체의 수소와 질소의 분리계수는 2.7 정도이며 니켈 미립분말을 코팅한 다음 실리카 층을 형성시켰을 때의 수소와 질소의 분리계수는 3.5 ∼ 3.7 정도로 측정되었는 바, 기체 분리막의 지지체로 적합한 구조를 갖게 되었음을 알 수 있다. 이렇게 준비된 지지체 위에 팔라듐 합금 도금을 실시함으로써 고온에서의 장시간 수소기체 투과 실험에서도 안정된 구조를 유지할 뿐만 아니라 핀홀이 없는 박막 형태의 도금층을 얻을 수 있었다.In general, the gas permeation flow of the support used in the gas separation membrane is controlled by Knudsen diffusion inversely proportional to the square root of the molecular weight of the permeate gas molecules. At this time, the separation coefficient of hydrogen and nitrogen is about 3.7. In fact, the separation coefficient of hydrogen and nitrogen of the support prepared by coating the nickel fine powder on the support was about 2.7, and the separation coefficient of hydrogen and nitrogen was about 3.5 to 3.7 when the nickel fine powder was coated and the silica layer was formed. It can be seen that it has a suitable structure as a support for the gas separation membrane. By performing palladium alloy plating on the thus prepared support, it was possible not only to maintain a stable structure even in a long time hydrogen gas permeation experiment at high temperature, but to obtain a plated layer having a thin film form without pinholes.
이상과 같이 해서 팔라듐 합금의 얇은 막을 형성시킨 복합막은 수소기체의 투과 속도는 온도가 높을수록 크고 수소 분리막의 기체의 압력차가 클수록 커졌으며 수소기체만을 선택적으로 투과하는 실용성 있는 수소기체 분리막으로 사용 가능하였다.As described above, the composite membrane in which the thin film of palladium alloy was formed was increased as the temperature of the hydrogen gas increased and the pressure difference between the gases of the hydrogen separation membrane increased, and it could be used as a practical hydrogen gas separation membrane that selectively permeates only hydrogen gas. .
이와 같은 본 발명은 다음의 실시예에 의거하여 더욱 상세히 설명하겠는 바, 본 발명이 이에 한정되는 것은 아니다.Such a present invention will be described in more detail based on the following examples, but the present invention is not limited thereto.
실시예 1Example 1
0.5 ㎛ 기공크기를 갖는 다공성 스텐레스 스틸 지지체 표면의 거칠음 정도를 완화시키기 위해 한쪽면에 1 ㎛ 이하의 미립 니켈 분말을 아스피레이터(aspirator)를 이용하여 골고루 입힌 후 800 ℃에서 5시간 동안 고진공 분위기하에서 소결시켰다. 콜로이드 졸을 사용하여 500 ㎚ 크기의 실리카 졸이 침적 코팅되도록 한 다음 건조, 소결 과정을 거쳐 실리카 층을 형성시켰다. 콜로이드 졸을 합성하기 위해 테트라에틸오르쏘실리케이트(Aldrich Co., TEOS, 98 %)를 출발물질로 하여 TEOS : H2O : EtOH : NH3를 0.28 : 10.0 : 9.0 : 0.35 mol% 비율로 혼합하여 다음과 같이 제조하였다. 1) H2O에 염기성인 NH3를 가하여 제조된 암모니아 용액을 제조한 다음 2) TEOS에 EtOH를 혼합한 후 3) 상기 1)을 2)에 조금씩 가하면서 오일 중탕에서 50℃로 유지하며 3시간동안 환류시켰다. 니켈로 처리된 다공성 금속지지체의 한쪽면 만 실리카 졸이 침적 코팅되도록 하기 위해 뒷면에 접착 시이트를 붙여 잘 분산된 용액속에 지지체를 직각으로 세워 침적한 채로 1분 정도 머물렀다가 천천히 빼낸 뒤 상온에서 24시간 정도 건조하였다. 소결(sintering)은 전기로에서 정류공기(static air)하에 승온 속도를 0.55 ℃/min로 하여 650℃ 까지 승온하여 2시간 유지한 뒤 냉각속도도 승온속도와 동일하게 하였다.In order to alleviate the roughness of the surface of the porous stainless steel support having a 0.5 μm pore size, fine nickel powder of 1 μm or less is uniformly coated on one side by using an aspirator, and then subjected to a high vacuum atmosphere at 800 ° C. for 5 hours. Sintered. A colloidal sol was used to deposit a 500 nm size silica sol, followed by drying and sintering to form a silica layer. With tetraethyl orthosilicate (Aldrich Co., TEOS, 98% ) as a starting material for the synthesis of colloidal sol TEOS: H 2 O: EtOH: an NH 3 0.28: 10.0: 9.0: 0.35 were mixed in a mol% ratio It was prepared as follows. 1) Prepare ammonia solution prepared by adding basic NH 3 to H 2 O, and then 2) mix EtOH with TEOS. 3) Add 1) little by little to 2) and keep it at 50 ℃ in oil bath. It was refluxed for time. In order to deposit the silica sol on only one side of the nickel-treated porous metal support, an adhesive sheet was attached to the back side, and the support was placed at right angles in a well-dispersed solution. It was dried to some extent. Sintering was carried out in the electric furnace under a constant air (static air) at a heating rate of 0.55 ℃ / min, the temperature was raised to 650 ℃ and maintained for 2 hours, the cooling rate was the same as the heating rate.
상기 방법으로 준비된 지지체는 증류수와 수산화나트륨으로 세척하여 이물질을 제거한 후 5% 산처리를 통하여 표면을 활성화시키는 과정을 거친 다음 팔라듐/니켈 합금 도금을 실시하였다. 전기도금시 도금면의 반대쪽에서 600 Torr의 진공을 걸어준다음 40 ㎃에서 10분 동안 실시한다음 다시 550 Torr로 낮추어 10분 동안 도금하였다. 도금된 막은 증류수로 세척한 다음 상온에서 24시간동안 건조시킨 후, 질소 분위기 하에서 450 ℃에서 2시간 동안 열처리를 실시하였다. 제조된 복합막의 도금 상태는 균일하였으며 팔라듐과 니켈의 조성은 약 80/20 이었다. 수소와 질소 기체에 대한 투과도를 측정하였으며 수소기체가 선택적으로 투과되었고 그 결과는 다음 표 1에 나타내었다. 이때 제조된 복합막의 기체 투과도는 약 40여일 동안 거의 일정하게 관찰되었다.The support prepared by the above method was washed with distilled water and sodium hydroxide to remove foreign substances, and then surface-activated by 5% acid treatment, followed by palladium / nickel alloy plating. During electroplating, a vacuum of 600 Torr was applied on the opposite side of the plating surface, followed by 10 minutes at 40 kPa, and then lowered to 550 Torr for 10 minutes. The plated membrane was washed with distilled water, dried at room temperature for 24 hours, and then heat-treated at 450 ° C. for 2 hours under a nitrogen atmosphere. The plating state of the prepared composite film was uniform and the composition of palladium and nickel was about 80/20. The permeability to hydrogen and nitrogen gas was measured and the hydrogen gas was selectively permeated and the results are shown in Table 1 below. At this time, the gas permeability of the prepared composite membrane was observed almost constant for about 40 days.
실시예 2Example 2
팔라듐 합금 도금을 40 ㎃에서 15분 동안 실시한 것 외에는 상기 실시예 1과 동일한 방법을 수행하여 복합막을 제조하였다.A composite film was prepared in the same manner as in Example 1, except that the palladium alloy plating was performed at 40 kPa for 15 minutes.
실시예 3Example 3
실리카 층의 형성시 콜로이드 졸을 제조하여 실리카 층을 형성시킨 다음 2차적으로 폴리머 졸에 의해 실리카 층을 형성시킨 것 외에는 상기 실시예 1과 같은 방법으로 복합막을 제조하였다. 폴리머 졸을 합성하기 위해 테트라에틸오르쏘실리케이트(Aldrich Co., TEOS, 98 %)를 출발물질로 하여 TEOS : H2O : EtOH : HNO3를 1 : 6.4 : 3.8 : 0.085 mol% 비율로 혼합하여 다음과 같이 제조하였다. 1) H2O에 산성인 HNO3를 가하여 용액을 제조한 다음 2) TEOS에 EtOH를 혼합한 후 3) 상기 1)을 2)에 조금씩 가하면서 오일 중탕에서 50℃로 유지하며 3시간동안 환류시킨 용액을 4) EtOH에 30 배 희석하여 폴리머 졸 용액을 준비하였다. 콜로이드 졸에 의해 실리카 층을 형성시킨 다음 2차적으로 폴리머 졸에 의해 실리카 층을 형성시킨 경우에는 폴리머 졸 용액에 의한 코팅으로 인해 지지체의 표면의 기공의 크기가 많이 줄어 기체의 투과도가 크게 저하되었다.A composite film was prepared in the same manner as in Example 1 except that a colloidal sol was formed to form a silica layer, and then a silica layer was secondly formed by a polymer sol. The HNO 3 1:: tetraethyl orthosilicate (Aldrich Co., TEOS, 98% ) by the TEOS as a starting material for synthesizing the polymer sol: H 2 O: EtOH 6.4: 3.8: 0.085 mol% were mixed at a ratio It was prepared as follows. 1) Prepare a solution by adding acidic HNO 3 to H 2 O, and then 2) mix EtOH with TEOS, 3) add 1) to 2) little by little, keep at 50 ℃ in oil bath and reflux for 3 hours. 4) was diluted 30-fold in EtOH to prepare a polymer sol solution. When the silica layer was formed by the colloidal sol and then the silica layer was formed by the polymer sol, the size of the pores on the surface of the support was greatly reduced due to the coating by the polymer sol solution.
실시예 4Example 4
상기 실시예 1과 동일한 방법으로 지지체를 준비하였고, 다만 도금층으로는 팔라듐/구리 합금층을 형성시켜 복합막을 제조하였다. 열처리는 450 ℃에서 2시간 동안 실시하였다. 제조된 복합막의 도금 상태는 균일하였으며 팔라듐과 구리의 조성은 약 60/40 이었다. 수소와 질소 기체에 대한 투과도를 측정하였으며, 그 결과는 다음 표 1에 나타내었다. 이때 제조된 복합막의 기체 투과도는 약 40여일 이상 거의 일정하게 관찰되었으며, 수소기체가 선택적으로 투과되었으며 그 결과는 도 2b에 나타내었다.A support was prepared in the same manner as in Example 1, except that a palladium / copper alloy layer was formed as a plating layer to prepare a composite film. Heat treatment was carried out at 450 ℃ for 2 hours. The plating state of the prepared composite film was uniform and the composition of palladium and copper was about 60/40. Permeability for hydrogen and nitrogen gas was measured, and the results are shown in Table 1 below. At this time, the gas permeability of the prepared composite membrane was observed almost constant for about 40 days or more, and hydrogen gas was selectively permeated, and the result is shown in FIG. 2B.
비교예 1Comparative Example 1
0.5 ㎛ 기공 크기를 갖는 다공성 스텐레스 스틸 지지체 표면의 거칠음 정도를 완화시키기 위해 한쪽면에 1 ㎛ 이하의 크기의 니켈 분말을 아스퍼레이터(aspirator)를 이용하여 골고루 입힌 후 800 ℃에서 5시간 동안 고진공 분위기하에서 소결시켜 사용하였다. 처리된 지지체는 증류수와 수산화나트륨으로 세척하여 이물질을 제거한 후 5% 산처리를 통하여 표면을 활성화시키는 과정을 거친 다음 기공의 크기를 줄여 지지체로 적합한 구조를 갖고 지지체와 도금층간의 접착력의 강화를 위해 1A에서 2분동안 구리 도금을 실시하였다. 팔라듐 합금 도금은 전류밀도 40 ㎃에서 20분 동안 실시하였으며 제조된 복합막의 도금 상태는 균일하였으며 수소기체가 선택적으로 투과되었으나 고온에서 금속산 확산 현상을 막을 수 있는 장벽역할을 해줄 수 있는 실리카 층이 형성되지 않아 450 ℃에서 20 여일 동안 수소기체 투과 실험을 실시한 후 급속도로 분리성능이 저하되었다. 다음 표 1에 질소와 수소기체 투과도를 나타내었으며 막의 안정성 실험 결과는 도 2a에 나타내었다.In order to alleviate the roughness of the surface of the porous stainless steel support having a 0.5 μm pore size, nickel powder having a size of 1 μm or less is uniformly coated on one side by using an aspirator and then subjected to high vacuum atmosphere at 800 ° C. for 5 hours. It was used by sintering under. The treated support is washed with distilled water and sodium hydroxide to remove foreign substances, and then activated to the surface by 5% acid treatment, and then the pore size is reduced to have a suitable structure as a support and 1A to enhance adhesion between the support and the plating layer. Copper plating was carried out for 2 minutes at. Palladium alloy plating was performed for 20 minutes at a current density of 40 하였으며. The composite film was evenly plated, and hydrogen gas was selectively permeated, but a silica layer was formed to act as a barrier to prevent the diffusion of metallic acids at high temperatures. After the hydrogen gas permeation experiment was conducted at 450 ° C. for about 20 days, the separation performance rapidly decreased. Table 1 shows the permeability of nitrogen and hydrogen gas, and the stability test results of the membrane are shown in FIG. 2A.
비교예 2Comparative Example 2
상기 실시예 1과 동일한 방법으로 수행하되, 팔라듐 합금 도금은 무전해 도금법에 의해 복합막을 제조하였다. 제조된 복합막의 투과 성능, 도금층의 두께, 사용조건은 다음 표 1에 나타내었다.In the same manner as in Example 1, but the palladium alloy plating was prepared by the electroless plating method composite film. The permeation performance of the prepared composite membrane, the thickness of the plating layer, and the use conditions are shown in Table 1 below.
비교예 3Comparative Example 3
상기 실시예 1과 동일한 방법으로 수행하되, 팔라듐 합금 도금은 스퍼터링법에 의해 복합막을 제조하였다. 제조된 복합막의 투과 성능, 도금층의 두께, 사용조건은 다음 표 1에 나타내었다.In the same manner as in Example 1, palladium alloy plating was prepared by a sputtering composite film. The permeation performance of the prepared composite membrane, the thickness of the plating layer, and the use conditions are shown in Table 1 below.
비교예 4Comparative Example 4
상기 실시예 1과 동일한 방법으로 수행하되, 팔라듐 합금 도금은 화학증착법에 의해 복합막을 제조하였다. 제조된 복합막의 투과 성능, 도금층의 두께, 사용조건은 다음 표 1에 나타내었다.In the same manner as in Example 1, but the palladium alloy plating was prepared by a composite film by chemical vapor deposition. The permeation performance of the prepared composite membrane, the thickness of the plating layer, and the use conditions are shown in Table 1 below.
비교예 5Comparative Example 5
25.4 ㎛ 두께를 갖는 Pd/Ag 합금막의 투과성능을 막의 양단간의 압력차 100 psi에서 측정한 결과를 다음 표 1에 나타내었다.The permeation performance of the Pd / Ag alloy membrane having a thickness of 25.4 μm was measured at a pressure difference of 100 psi between the both ends of the membrane.
상기 표 1의 결과에 의하면, 본 발명에 따른 복합막의 수소-질소 분리 성능이 기존의 다른 방법으로 제조된 막들보다 우수한 성능을 지님을 알 수 있다. 이는 사용 압력을 높임으로써 투과도가 증가하는 현상을 감안하면 이러한 현상은 더욱 뚜렷해진다.According to the results of Table 1, it can be seen that the hydrogen-nitrogen separation performance of the composite membrane according to the present invention is superior to the membranes prepared by other conventional methods. This phenomenon becomes more pronounced in view of the phenomenon that the permeability increases by increasing the working pressure.
또한, 첨부도면 도 1a 및 1b는 열적·화학적 안정성을 높이기 위해 개발된 실리카 층이 포함되지 않은 복합막과 실리카 층이 포함된 복합막에 대한 EPMA 실험결과를 나타낸 것이다. 도 1b에 따른 실리카 층을 포함한 복합막의 경우, 실리카 층이 팔라듐 합금층과 지지체 사이의 금속간 확산 현상을 막아주는 장벽 역할을 해주는 것으로 관찰되었다. 즉, 상기 실시예 1에 따른 제조방법에 의해 제조된 실리카 층이 포함된 복합막의 경우에는 450 ℃에서 40일 동안 수소기체 투과실험 후에도 팔라듐 도금층이 실리카 층 이하로 확산해 가는 현상이 없었다. 그러나 비교예 1의 제조방법에 의해 실리카 층을 포함하지 않은 복합막의 경우에는 450 ℃에서 20일 동안 수소기체 투과 실험을 한 후에 관찰한 결과로 팔라듐 도금 층이 서서히 지지체 층으로 확산해가는 현상을 볼 수 있었다.In addition, Figures 1a and 1b shows the results of EPMA experiments for a composite film not containing a silica layer and a silica layer developed to improve the thermal and chemical stability. In the composite film including the silica layer according to Figure 1b, it was observed that the silica layer serves as a barrier to prevent the intermetallic diffusion between the palladium alloy layer and the support. That is, in the case of the composite membrane including the silica layer prepared by the manufacturing method according to Example 1, the palladium plated layer did not diffuse under the silica layer even after 40 days of hydrogen gas permeation experiment. However, the composite membrane containing no silica layer by the manufacturing method of Comparative Example 1 was observed after 20 days of hydrogen gas permeation experiment at 450 ℃ as a result of the phenomenon that the palladium plating layer gradually diffused to the support layer. Could.
도 2a 및 2b는 마찬가지로 상기 비교예 1과 실시예 1에서 제조된 복합막에 대한 투과 실험결과를 비교한 것이며 위의 결과를 잘 뒷받침해 준다.2a and 2b likewise compares the results of the permeation experiment for the composite membrane prepared in Comparative Example 1 and Example 1 and supports the above results well.
이상의 결과로 볼 때 본 발명에서 개발된 수소기체 분리막은 수소기체의 선택적 분리에 매우 우수한 성능을 지니고 있을 뿐만 아니라 고온에서의 열적 안정성을 갖고 있어 장시간의 수소기체 분리에 적용시킬 수 있음을 알 수 있다.As a result, it can be seen that the hydrogen gas separation membrane developed in the present invention not only has a very good performance for selective separation of hydrogen gas, but also has thermal stability at high temperature, so that it can be applied to hydrogen gas separation for a long time. .
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WO2006031080A1 (en) * | 2004-09-15 | 2006-03-23 | Korea Institute Of Energy Research | Preparation method of palladium alloy composite membrane for hydrogen separation |
WO2012030212A1 (en) | 2010-08-30 | 2012-03-08 | Stichting Energieonderzoek Centrum Nederland | New seeding method for deposit of thin selective membrane layers |
KR101494187B1 (en) * | 2013-05-07 | 2015-02-17 | 한국에너지기술연구원 | Hydrogen separation membrane module sing foil separation film and manufacturing method thereof |
KR102567038B1 (en) * | 2022-03-16 | 2023-08-14 | 주식회사 하이젠에너지 | Hydrogen separation layer having superior heat-stability and method for producing the same |
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KR101150873B1 (en) | 2010-02-09 | 2012-06-13 | 한국에너지기술연구원 | Protection layer of hydrogen membrane and preparation method thereof |
KR101349011B1 (en) * | 2012-01-10 | 2014-01-16 | 한국에너지기술연구원 | Heat resistant hydrogen membrane and manufacturing method thereof |
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WO2006031080A1 (en) * | 2004-09-15 | 2006-03-23 | Korea Institute Of Energy Research | Preparation method of palladium alloy composite membrane for hydrogen separation |
WO2012030212A1 (en) | 2010-08-30 | 2012-03-08 | Stichting Energieonderzoek Centrum Nederland | New seeding method for deposit of thin selective membrane layers |
US9156007B2 (en) | 2010-08-30 | 2015-10-13 | Stichting Energieonderzoek Centrum Nederland | Seeding method for deposit of thin selective membrane layers |
KR101494187B1 (en) * | 2013-05-07 | 2015-02-17 | 한국에너지기술연구원 | Hydrogen separation membrane module sing foil separation film and manufacturing method thereof |
KR102567038B1 (en) * | 2022-03-16 | 2023-08-14 | 주식회사 하이젠에너지 | Hydrogen separation layer having superior heat-stability and method for producing the same |
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