KR20010019024A - An apparatus for setting inner walls of polymerization chamber in plasma polymerization system - Google Patents

Abstract

PURPOSE: An equipment for detaching chamber inner skin of a plasma polymerization apparatus is provided to save operation time by additionally introducing an inner skin detaching means inside a chamber, and greatly improve operation efficiency by uniting a counter electrode with an inner skin and an electrode support in a body so as to be positioned inside the chamber. CONSTITUTION: In a plasma polymerization apparatus comprising a polymerization chamber in which a discharge electrode and a counter electrode (4) are installed, an equipment for detaching chamber inner skin of a plasma polymerization apparatus consists an inner skin support part (20) which is fixed and installed at each corners of inner wall of the polymerization chamber, and a sliding guide formed on the inner skin support part (20) in which an inner skin can be inserted into the sliding guide. The sliding guide formed on the inner skin support part (20) consists a horizontal sliding guide and a vertical sliding guide so that the inner skin is positioned neighboring wall surface of up and down and left and right of the polymerization chamber.

Description

Chamber endothelial detachment device of plasma polymerization processing equipment {AN APPARATUS FOR SETTING INNER WALLS OF POLYMERIZATION CHAMBER IN PLASMA POLYMERIZATION SYSTEM}

The present invention relates to a chamber endothelial detachment apparatus of a plasma polymerization processing apparatus.

When a thin film is coated on the surface of a sample such as a metal plate using plasma, a coating layer having excellent hardness, wear resistance, and the like is formed. Products with a coating layer are used for magnetic disks, optical disks, ultra hard tools, and the like. In addition, when the coating film formed on the surface of the steel sheet is subjected to plasma treatment, the coated steel sheet is hardened and excellent in durability, corrosion resistance and the like is obtained. In particular, the surface modification effect of improving the hydrophilicity or hydrophobicity can be obtained by polymerizing the surface of the sample, and the surface-modified material has been applied to various ranges.

A typical example of the plasma polymerization apparatus is the apparatus disclosed in WO 99/28530. (See FIG. 1) The configuration of the apparatus is largely a vacuum chamber 1, an electrode 4 installed in the chamber, and a vacuum for adjusting the pressure of the vacuum chamber. Pumps 5, 6, gauges 7 and 8 for measuring the degree of vacuum, power supplies 3 for generating potential differences in the electrodes, and non-reactive gases such as nitrogen and reactive gases around the sample to be surface treated. It consists of the reaction gas regulators 9, 10 etc. which are injected.

An example of the plasma polymerization treatment by the above apparatus will be described.

After installing the sample (2) in the chamber (1) and starting the rotary pump (5) to confirm that the pressure inside the chamber is maintained in a vacuum of about 10 ^-3 Torr by a thermocouple gauge (7), The diffusion pump 6 is started to confirm with the ion gauge 8 that the pressure inside the chamber is maintained at about 10 ^-6 Torr. The sample is positioned biased to the anode (or active electrode) by the power supply 3, and the opposite electrode 4 is grounded. When the pressure in the chamber is maintained at a constant vacuum, reactive and non-reactive gases are injected in turn around the desired location. The mixing ratio of the gas is controlled by the pressure of the thermoelectric meter. When the pressure in the vacuum chamber reaches a constant pressure, it is discharged by direct current or high frequency. Then, the molecular bonds of the gases are broken in the plasma generated by direct current or high frequency, and the broken chains and activated cations or anions combine to form a polymer on the sample surface placed between the electrodes.

However, in the case of the device, the continuous processing is not possible, so productivity is lowered. On the other hand, the apparatus shown in Fig. 2 is a cross-sectional view showing a part of the apparatus capable of continuously performing plasma polymerization, and is particularly advantageous for thin film coating a large-area sample. In addition, since the opposite electrodes are arranged on both sides of the sample electrode, polymerization can be performed at the same time, which brings a great effect on productivity. The apparatus regulates the pressure inside the chamber by starting the vacuum pump 5 while transferring the sample 2 to the chamber 1 from the inlet 11 to the outlet 12. There is also an electrode 4 for generating a potential difference in the sample. While the pressure in the chamber is maintained at a constant vacuum, the reaction gas is injected into the reactive gas inlet 9 and generates a plasma. During plasma discharge, the molecular bonds of the reaction gases are broken, and the broken chain and the activated cations or anions combine to form a polymer on the sample surface located between the electrodes.

However, the conventional plasma polymerization apparatus has the following problems.

In general, the deposition chamber in which the plasma polymerization process is performed is made of a hexahedron, and in order to protect the inner wall of the chamber during the polymerization process, an inner skin is provided for each surface. That is, six endothelial cells are installed on the inner wall of the chamber, among which the electrode support 19 is fixed to the left and right endothelial cells. A chamber having such a structure is shown in FIG. 3. 4 shows how each endothelium is secured to the chamber inner wall. 4, it can be seen that the endothelium 15 is coupled to the chamber inner wall 16 by a bolt 14 and a nut 13. This fixing method is cumbersome to separate the endothelial for cleaning the inside of the chamber after the plasma treatment, it is time-consuming to separate and reassemble the endothelial each time. Particularly, when the sample and the counter electrode are installed, the inner electrode is installed on the inner wall of the chamber and the counter electrode must be mounted in the chamber, thereby making the work difficult.

The present invention is to solve the above problems, and to provide a method for easily installing and fixing the endothelium on the chamber inner wall and a simple mounting method of the electrode to improve the efficiency of the operation during the plasma polymerization process.

1 is a schematic diagram showing a plasma polymerization processing apparatus according to the prior art.

2 is a cross-sectional view showing a part of an apparatus capable of continuously performing plasma polymerization treatment.

3 is a perspective view showing a state in which the endothelium is installed on the inner wall of the chamber in the prior art.

4 is a cross-sectional view showing that each endothelial is coupled to the chamber inner wall with bolts and nuts in the apparatus of FIG.

5 is a perspective view showing a part of the plasma polymerization processing apparatus provided with the endothelial detachment means according to the present invention.

FIG. 6 is an enlarged view of portion 'A' of FIG. 5, and shows that the endothelial body is vertically fitted to the sliding guide.

Figure 7 is a perspective view showing a state in which the endothelium, the electrode support and the counter electrode are integrally structured in the present foot.

*** Explanation of symbols for the main parts of the drawing ***

1: Deposition chamber 2: Sample (sample electrode)

3: power supply 4: counter electrode

5: rotary pump 6: diffusion pump

7: Thermometer 8: Ion gauge

9: gas regulator 10: gas regulator

11: Inlet 12: Outlet

13: Nut 14: Bolt

15: endothelial 15a: endothelial

15b: Endothelial 15c: Endothelial

15d: endothelial 16: inner wall

19: electrode support 20: endothelial support

20a: Horizontal sliding guide 20b: Vertical sliding guide

The present invention relates to a chamber endothelial detachment apparatus of a plasma polymerization processing apparatus, wherein the means for solving the above problems includes a polymerization chamber provided with a discharge electrode and an opposite electrode, wherein the polymerization chamber comprises: The inner endothelial support is fixed to each corner of the inner wall, and the endothelial support provides a chamber endothelial detachment device of the plasma polymerization processing apparatus, characterized in that the sliding guide is formed to be fitted to the endothelial.

The endothelial detachment means includes an endothelial support portion fixed to each corner of the inner wall of the deposition chamber and a sliding guide to which the endothelial is fitted.

The sliding guide formed in the endothelial support portion is composed of a horizontal sliding guide and a vertical sliding guide so that the endothelial can be positioned adjacent to the upper and lower left and right walls of the polymerization chamber.

Hereinafter, with reference to the drawings will be described in detail with respect to the present invention.

Figure 5 shows a part of the plasma polymerization apparatus equipped with an endothelial detachment means according to the present invention. Sliding guides are formed on the inner skin support part 20 and the inner skin support part 20 fixedly installed at each corner of the deposition chamber as a sliding method rather than a conventional bolt and nut coupling method. It can be seen that the endothelium 15b, 15a, 15c, and 15d are fitted.

FIG. 6 is an enlarged view of a portion 'A' of FIG. 5. The horizontal sliding guide 20a and the vertical sliding guide 20b of the endothelial support 20 are formed in the horizontal and vertical directions on the endothelial support 20, which is fixedly installed at the corners of the chamber, respectively. , 15c) is fitted horizontally and vertically. In addition, the endothelial can be carried out by further forming a handle to facilitate the detachable operation.

Meanwhile, the electrode support 19 is fixed to the endothelial body inserted vertically in the chamber. In the present invention, the electrode support is fixed to both endothelial cells in advance so that the electrode support 19 can be inserted into the chamber in a structured state. In Fig. 7, the endothelium 15c, 15d, the electrode support 19, and the counter electrode 4, which are integrally structured, are shown. By doing the above, the installation of the counter electrode can be performed outside the chamber, and the work efficiency is greatly improved. The endothelial detachment device of the present invention can be easily used without any special effort as long as it is a plasma polymerization device for depositing a substrate surface into a polymer by glow discharge.

According to the present invention, by providing an endothelial detachment means in the chamber, the endothelial separation and reassembly of the endothelial can be avoided, and the endothelial can be easily inserted, thereby saving time. Can be mounted in the chamber, greatly improving the working efficiency.

Claims (2)

In the plasma polymerization processing apparatus comprising a deposition chamber provided with a discharge electrode and a counter electrode, An inner skin support part fixedly installed at each corner of the inner wall of the polymerization chamber; The endothelial support chamber chamber endothelial detachment device of the plasma polymerization processing apparatus, characterized in that the endothelial sliding guide is formed is formed. The chamber endothelial detachment of the plasma polymerization apparatus of claim 1, wherein the sliding guide formed in the endothelial support part comprises a horizontal sliding guide and a vertical sliding guide so that the endothelial can be positioned adjacent to the top, bottom, left and right walls of the integration chamber. Device.