KR20000051531A - Metnod for the preparation of the anisotropic conductive film - Google Patents

Metnod for the preparation of the anisotropic conductive film Download PDF

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Publication number
KR20000051531A
KR20000051531A KR1019990002029A KR19990002029A KR20000051531A KR 20000051531 A KR20000051531 A KR 20000051531A KR 1019990002029 A KR1019990002029 A KR 1019990002029A KR 19990002029 A KR19990002029 A KR 19990002029A KR 20000051531 A KR20000051531 A KR 20000051531A
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film
layer
anisotropic
resin
anisotropic conductive
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KR1019990002029A
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Korean (ko)
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윤주영
임대우
김순식
김진열
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한형수
주식회사 새 한
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Publication of KR20000051531A publication Critical patent/KR20000051531A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive

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  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Adhesive Tapes (AREA)

Abstract

PURPOSE: A preparation of producing of an anisotropic conductive film is provided which has excellent stability in spite of being exposed at room temperature for a long time by separating a resin component having epoxy group, a resin component helping the film is formed and conductive particle with a curing agent to make two film layer. CONSTITUTION: A process comprise steps of: preparing a first layer of the anisotropic film which dissolving a resin helping a film is formed in a solvent such as methylethylketone and adding a curing agent and a conductive particle, followed by coating on one anisotropic PET film to make shape of the film 15 to 40 micrometer thick; preparing a second layer of the anisotropic film which dissolving a resin helping a film is formed and an epoxy resign in a solvent and being dispersed a conductive particle, followed by coating on another anisotropic PET film to make shape of the film 15 to 40 micrometer thick; and being bonded the first layer of the anisotropic film to the second layer of the anisotropic film. On the other hand, the anisotropic conductive film is obtained by coating the first layer of the anisotropic conductive on a anisotropic PET film, followed by coating the second layer of the anisotropic film is sequentially reiterated. Thereby, the anisotropic conductive film is stable at room temperature and is able to connect ITO with TAB at short time.

Description

이방성 도전필름의 제조방법{METNOD FOR THE PREPARATION OF THE ANISOTROPIC CONDUCTIVE FILM}Manufacturing method of anisotropic conductive film {METNOD FOR THE PREPARATION OF THE ANISOTROPIC CONDUCTIVE FILM}

본 발명은 보관안정성이 우수한 이방성 도전필름의 제조방법에 관한 것으로서, 특히 상온에서의 보관안정성이 우수한 이방성 도전필름의 제조방법에 관한 것이다.The present invention relates to a method for producing an anisotropic conductive film having excellent storage stability, and more particularly to a method for producing an anisotropic conductive film having excellent storage stability at room temperature.

현재, 액정표시장치의 고해상도, 칼라화가 진행되면서 픽셀피치(pixel pitch)(현재 50㎛까지 제품화됨, 액정표시장치 패널상에 ITO증착된 미세회로의 한 pad에서 다음 pad까지의 거리)의 감소 및 액정표시장치 패널 위에 인쇄된 리드(lead)의 수가 증가되고 있는 추세에 있다. 이러한 기술적 요구에 의하여 액정표시장치 패널과 드라이버 집적회로 및 인쇄회로기판을 접속하는 액정표시장치 패키징 기술도 이에 대응하여 발전해오고 있다. 회로가 미세화되면서 이에 따른 패키징기술도 여러 가지 방법으로 발전되고 있다. 특히 액정표시장치 패키징 기술중에서도 가장 많이 사용되고 있는 것이 COF(Chip-On-Film)법으로 액정표시장치 패널과 인쇄회로기판의 전기적 접속을 TAB(Tape-Automated Bonding) IC를 이용하여 패킹하는 방법이다. 또한, 차세대 액정표시장치 패키징법으로 Driver IC bare Chip을 액정표시장치 패널위에 직접 IC접속법으로 접속시키고 인쇄회로기판과의 접속은 FPC를 이용하여 이방성 도전필름(ACF; Anisotropic Conductive Film)으로 접속시키는 패키징법이 이용되고 있다.At present, as the resolution and colorization of the liquid crystal display device progress, reduction of pixel pitch (currently commercialized to 50 μm, distance from one pad to the next pad of the microcircuit ITO deposited on the liquid crystal display panel) and There is a trend that the number of leads printed on the liquid crystal display panel is increasing. Due to such technical requirements, a liquid crystal display packaging technology for connecting a liquid crystal display panel, a driver integrated circuit, and a printed circuit board has been developed correspondingly. As circuits become more miniaturized, the packaging technology is also being developed in various ways. Particularly, among the liquid crystal display packaging technologies, the most commonly used method is to pack electrical connection between a liquid crystal display panel and a printed circuit board using a tape-automated bonding (TAB) IC by a chip-on-film (COF) method. In addition, the next-generation liquid crystal display device packaging method is to connect the driver IC bare chip directly to the liquid crystal display panel by IC connection method, and to connect the printed circuit board to an anisotropic conductive film (ACF) using FPC. Law is being used.

이상에서 설명한 액정표시장치 패키징에 접속재료로서 사용되는 이방성 도전필름은 접착제중에 도전성 미립자를 분산시켜 이형처리한 PET필름상에 코팅하여 접착필름 형태로 제조한 Z-축 도전성 접착제 필름을 의미하며, x-y 평면방향으로는 절연성을 가진다. 이러한 이방성 도전필름은 지난 10여년간 일본의 히다찌 화성사(일본공개특허 평5-21094호, 동 5-226020호, 동 7-302666호, 동 7-302667호, 동 7-302668호 등) 및 소니 케미칼사(일본공개특허 평7-211374호, 동 8-311420호, 동 9-199206호, 동 9-199207호, 동 9-31419호, 동 9-63355호, 동 9-115335호 등) 등에 의하여 많은 연구가 진행되어 오고 있으나, 상온에서의 보관안정성이 떨어져 아직까지 많은 개선이 요구되고 있다.The anisotropic conductive film used as the connecting material in the liquid crystal display device packaging described above means a Z-axis conductive adhesive film prepared by dispersing the conductive fine particles in the adhesive and coating it on a release treated PET film in the form of an adhesive film, xy It has insulation in the planar direction. Such anisotropic conductive film has been manufactured by Hidachi Hwaseong Co., Ltd. in Japan for the past 10 years (Japanese Patent Laid-Open Publication Nos. 5-21094, 5-226020, 7-302666, 7-302667, 7-302668, etc.) and Sony. Chemicals (JP-A-7-211374, 8-311420, 9-199206, 9-199207, 9-31419, 9-63355, 9-115335, etc.) Many studies have been conducted, but the storage stability at room temperature is still a lot of improvement is required.

본 발명은 에폭시기를 가지는 수지성분, 필름형성을 돕는 수지성분 및 도전입자를 경화제 성분과 분리하여 2개의 필름층을 만들어 줌으로써 고열,고압압착공정 이전에는 경화반응이 일어나지 않도록 함으로써 상온에서 장시간 노출될 경우에도 보관안정성이 우수한 이방성 도전필름을 얻는 것을 목적으로 한다.In the present invention, when the resin component having an epoxy group, the resin component which helps to form the film, and the conductive particles are separated from the curing agent component to make two film layers, the curing reaction does not occur before the high temperature and high pressure compression process, so that when exposed at room temperature for a long time An object of the present invention is to obtain an anisotropic conductive film having excellent storage stability.

본 발명에 따른 이방성 도전필름은 액정표시장치의 기판에 형성되는 투명전극(ITO) 단자와, 외부구동회로의 구리배선전극(TAB) 단자의 접속에 사용된다. 즉, 이방성 도전필름은 에폭시계 절연성 접착제 내에 금속입자 또는 수지입자에 금속이 코팅된 입자가 분산되어 있는 필름상으로, 액정표시소자와 외부구동회로 등의 2개의 배선패턴간의 접속에 사용된다.The anisotropic conductive film according to the present invention is used to connect a transparent electrode (ITO) terminal formed on a substrate of a liquid crystal display device and a copper wiring electrode (TAB) terminal of an external driving circuit. That is, the anisotropic conductive film is a film in which metal particles or particles coated with metal are dispersed in an epoxy insulating adhesive, and are used for connection between two wiring patterns such as a liquid crystal display device and an external driving circuit.

이를 위하여, 액정표시장치 패널기판과, 외부구동회로기판(TAB 또는 FPC)를 접합한 후, 가열,가압하면 열경화성수지가 경화되는 한편, 금속입자는 패널의 양쪽 배선패턴 사이에 구속되어 전기접속이 이루어진다. 이 때 단시간 내에 접속시키기 위하여 빠른 경화반응성이 요구되는데 기존에 사용되는 이방성 도전막은 제조후 패널접속공정에 이르기까지 일정한 경과시간 동안에 경화가 일부 진행되는 문제점이 있었지만, 본 발명에서는 단시간 접속이 가능하면서도 상온에서 장시간 보관안정성이 우수한 접착제가 제공된다.To this end, the liquid crystal display panel substrate and the external driving circuit board (TAB or FPC) are bonded to each other, and then heated and pressurized to cure the thermosetting resin, while the metal particles are constrained between the wiring patterns on both sides of the panel to prevent electrical connection. Is done. In this case, fast curing reactivity is required in order to connect within a short time, but the conventional anisotropic conductive film has a problem that the curing proceeds for a certain elapsed time until the panel connection process after manufacture, but in the present invention can be connected for a short time, even at room temperature An adhesive with excellent long-term storage stability is provided.

이 접착제는 에폭시기를 가지는 수지성분, 필름형성을 돕는 수지성분, 경화제성분 및 경화촉진제로 구성된다.This adhesive consists of a resin component having an epoxy group, a resin component which assists in film formation, a curing agent component and a curing accelerator.

에폭시계 수지성분으로는 1분자내에 2개 이상의 에폭시기를 가지는 다가 에폭시수지가 사용되는 것이 바람직하다. 구체적인 예로는 페놀노볼락이나 크레졸노볼락의 노볼락수지, 비스페놀A, 비스페놀F, 비스히드록시페닐에테르 등의 다가 페놀류와, 에틸렌글리콜, 네오펜틸글리콜, 글리세린, 트리메틸올프로판, 폴리프로필렌글리콜 등의 다가 알코올류와, 에틸렌디아민, 트리에틸렌테트라아민, 아닐린 등의 폴리아미노화합물과, 프탈산, 이소프탈산 등의 다가 카르복실 화합물과 그 외 다양한 지방족, 방향족 에폭시 수지 등이 있으며, 이것들을 단독 또는 2개 이상 혼합사용하여도 좋다.As the epoxy resin component, a polyvalent epoxy resin having two or more epoxy groups in one molecule is preferably used. Specific examples include polyhydric phenols such as phenol novolac and cresol novolac novolac resins, bisphenol A, bisphenol F, bishydroxyphenyl ether, ethylene glycol, neopentyl glycol, glycerin, trimethylolpropane, polypropylene glycol, and the like. Polyhydric alcohols, polyamino compounds such as ethylenediamine, triethylenetetraamine, and aniline, polyhydric carboxyl compounds such as phthalic acid and isophthalic acid, and various other aliphatic and aromatic epoxy resins, and the like, alone or two You may mix and use more than that.

또한, 필름형성을 돕는 수지로는 선택된 경화제와 화학적인 반응을 하지 않으면서 필름형성이 잘 될 수 있는 수지가 사용된다. 구체적인 예로는 아크릴레이트수지, 에틸렌아크릴레이트공중합체, 에틸렌아크릴산공중합체 등의 아크릴수지와, 에틸렌수지, 에틸렌프로필렌공중합체 등의 올레핀수지와, 부타디엔수지, 아크릴로나이트릴부타디엔공중합체, 스티렌부타디엔블록공중합체, 스티렌부타디엔스티렌블록공중합체, 나이트릴부타디엔고무, 스티렌부타디엔고무, 클로로프렌고무 등의 고무류와, 비닐부틸알수지, 비닐포름수지 등의 비닐류수지와, 폴리에스터, 시아네이트에스터수지 등의 에스터수지류와, 그 외에 페녹시수지, 실리콘 고무, 우레탄수지 등이 있으며, 이것들을 단독 또는 2개 이상 혼합하여 사용할 수 있다.In addition, as a resin to assist film formation, a resin that can form a film well without chemically reacting with a selected curing agent is used. Specific examples include acrylic resins such as acrylate resins, ethylene acrylate copolymers and ethylene acrylic acid copolymers, olefin resins such as ethylene resins and ethylene propylene copolymers, butadiene resins, acrylonitrile butadiene copolymers and styrene butadiene blocks. Rubbers such as copolymers, styrene butadiene styrene block copolymers, nitrile butadiene rubber, styrene butadiene rubber, and chloroprene rubber; vinyl resins such as vinyl butyl resin and vinyl form resin; and esters such as polyester and cyanate ester resin. In addition to resins, there are phenoxy resins, silicone rubbers, urethane resins, and the like, and these may be used alone or in combination of two or more thereof.

또한, 경화제성분으로는 1분자 내에 2개 이상의 활성수소를 가지는 것이라면 사용가능하다. 구체적인 예로는 이미다졸계, 이소시아네이트계, 아민계, 아미드계, 산무수물계가 있으며, 이것들을 단독 또는 2개 이상 혼합하여 사용할 수 있다.In addition, as a hardening | curing agent component, if it has two or more active hydrogens in 1 molecule, it can be used. Specific examples include imidazole series, isocyanate series, amine series, amide series, and acid anhydride series, and these may be used alone or in combination of two or more thereof.

한편, 본 발명에서 사용되는 도전입자는 금속입자나 무기 또는 유기입자에 금속을 코팅한 것으로, 입경이 수 ㎛인 입자가 사용가능하지만 그 입경의 크기는 특별히 제한되지 않고 임의이다. 구체적인 예로는 Fe, Mn, Zn, Au, Ag, Ni 등의 금속입자나 수지입자의 표면을 상기 금속으로 코팅한 입자를 들 수 있으며, 이것들을 단독 또는 2개 이상 혼합하여 사용할 수 있다.On the other hand, the conductive particles used in the present invention are metal particles, inorganic or organic particles coated with a metal, particles having a particle size of several μm can be used, but the size of the particle size is not particularly limited and is arbitrary. Specific examples thereof include metal particles such as Fe, Mn, Zn, Au, Ag, Ni, and particles coated with the metal on the surface of the resin particles, and these may be used alone or in combination of two or more thereof.

본 발명에 따른 제조방법에 의하여 제조되는 이방성 도전필름은 상기한 바와 같은 성분들을 이용하여 2층 구조로 제조된다.The anisotropic conductive film produced by the manufacturing method according to the present invention is manufactured in a two-layer structure using the above components.

이방성 도전필름의 제1층은 필름형성을 돕는 수지, 경화제 및 도전입자로 이루어진다. 즉, 필름형성을 돕는 수지를 메틸에틸케톤(MEK) 등의 적당한 용매에 용해시켜 고형분을 조절하고, 경화제 및 도전입자를 적당한 양으로 첨가한 후 필름형성을 만들기 위해 이형PET필름 위에 15∼40㎛의 두께로 코팅한다.The first layer of the anisotropic conductive film consists of a resin, a curing agent, and conductive particles to assist in film formation. That is, the resin assisting the film formation is dissolved in a suitable solvent such as methyl ethyl ketone (MEK) to control the solid content, and the curing agent and the conductive particles are added in an appropriate amount, and then 15 to 40 μm on the release PET film to form the film. To the thickness of the coating.

이방성 도전필름의 제2층은 필름형성을 돕는 수지와, 에폭시 수지를 용매에 녹여 고형분을 조절한 다음 도전입자를 분산시켜 필름형상을 만들기 위해 별도의 이형PET필름 위에 15∼40㎛의 두께로 코팅한다.The second layer of the anisotropic conductive film is coated with a thickness of 15-40 μm on a separate release PET film to form a film by dissolving the resin and the epoxy resin in the solvent to control the solid content and then dispersing the conductive particles. do.

상기한 바와 같이 이루어진 제1층 및 제2층을 접합함으로써 2층 구조의 이방성 도전필름이 제조될 수 있다.By bonding the first layer and the second layer made as described above can be produced an anisotropic conductive film of a two-layer structure.

한편, 이형PET필름 위에 제1층을 코팅한 후 제2층을 연속적으로 중첩해서 코팅함으로써 이방성 도전필름을 만들 수도 있다.On the other hand, after coating the first layer on the release PET film, it is also possible to make an anisotropic conductive film by coating the second layer continuously overlapping.

상기한 바와 같이 제조된 이방성 도전필름을 액정표시장치 패널기판과 외부구동회로기판 사이에 끼우고 가열, 가압하여 접착하면 제1층과 제2층의 수지는 용융되면서 서로 혼합되고 따라서 제1층의 경화제와 제2층의 에폭시수지가 경화반응을 일으키게 된다. 용융온도 이하에서는 제1층의 경화제와 제2층의 에폭시수지가 서로 혼합되지 않는 상태를 유지하므로, 2개층이 서로 분리될 수 있는 상태가 되며, 대부분 경화반응이 미진행된 상태로 장기간 보관하거나 대기중에 노출되어도 재현성을 유지할 수 있다.When the anisotropic conductive film prepared as described above is sandwiched between the liquid crystal display panel panel and the external driving circuit board and bonded by heating and pressing, the resin of the first layer and the second layer is melted and mixed with each other. The curing agent and the epoxy resin of the second layer cause a curing reaction. Below the melting temperature, since the curing agent of the first layer and the epoxy resin of the second layer are not mixed with each other, the two layers can be separated from each other. Reproducibility can be maintained even when exposed in the air.

<실시예 1><Example 1>

페녹시 수지(90중량%)와 경화제 2-메틸이미다졸(7중량%)을 톨루엔 및 메틸에틸케톤의 혼합용액에 용해시킨 후 입자크기가 5㎛ 정도되는 도전입자(Ni 도금, 3중량%)를 잘 분산시킨 다음, 이형PET필름 위에 코팅하여 건조후 두께 10㎛의 필름 A를 만들었다.After dissolving phenoxy resin (90% by weight) and curing agent 2-methylimidazole (7% by weight) in a mixed solution of toluene and methyl ethyl ketone, conductive particles having a particle size of about 5 μm (Ni plating, 3% by weight) ) Was well dispersed and then coated on a release PET film to make a film A having a thickness of 10㎛.

다음에 비스페놀A형 에폭시수지(에폭시당량 200, 70중량%)와 페녹시 수지(30중량%)를 용매에 녹여 마찬가지로 이형PET필름 위에 코팅하여 건조후 두께 10㎛의 필름 B를 만들었다.Next, bisphenol A type epoxy resin (epoxy equivalent 200, 70% by weight) and phenoxy resin (30% by weight) were dissolved in a solvent and coated on a release PET film in the same manner to make a film B having a thickness of 10 μm.

이 시료를 제조한 직후와 상온에서 30일간 방치한 후의 각각의 경화열을 측정한다. 마찬가지로 각각의 시료를 ITO전극과 TAB전극 사이에 끼우고 170℃에서 20초간 15kg/㎠로 가열,가압하여 접속한 후 접착성 및 전기저항치를 측정하였다.Each heat of cure is measured immediately after preparing this sample and after being left to stand at room temperature for 30 days. Likewise, each sample was sandwiched between the ITO electrode and the TAB electrode, and heated and pressurized at 15 kg / cm 2 for 20 seconds at 170 ° C., and then the adhesiveness and electrical resistance were measured.

<실시예 2><Example 2>

필름형성을 돕는 수지로 실시예 1에서의 페녹시 수지(100중량%)에 대하여 페페녹시 수지(50중량%)와 아크릴 수지(50중량%)의 혼합물로 하고, 나머지는 실시예 1과 동일하게 행하였다.Resin assisted film formation, a mixture of phenoxy resin (50% by weight) and acrylic resin (50% by weight) relative to the phenoxy resin (100% by weight) in Example 1, the rest is the same as in Example 1 It was done.

<실시예 3><Example 3>

경화제로 실시예 1에서의 2-메틸이미다졸(100중량%)에 대하여 다이페닐디아민술폰(200중량%)과 1-도데실이미다졸(20중량%)의 혼합물로 하고, 나머지는 실시예 1과 동일하게 행하였다.As a curing agent, a mixture of diphenyldiaminesulfone (200% by weight) and 1-dodecylimidazole (20% by weight) based on 2-methylimidazole (100% by weight) in Example 1 was carried out. It carried out similarly to Example 1.

<실시예 4><Example 4>

실시예 1에서 제조된 2개층을 라미네이션에 의하여 중첩코팅하지 않고 A층 위에 B층을 연속적으로 중첩코팅하는 방법을 사용하였다.The two layers prepared in Example 1 were used to continuously coat the B layer on the A layer without laminating the layers by lamination.

<실시예 5>Example 5

실시예 2에서 제조된 2개층을 라미네이션에 의하여 중첩코팅하지 않고 A층 위에 B층을 연속적으로 중첩코팅하는 방법을 사용하였다.Instead of coating the two layers prepared in Example 2 by lamination, a method of continuously coating the B layer on the A layer was used.

<실시예 6><Example 6>

실시예 3에서 제조된 2개층을 라미네이션에 의하여 중첩코팅하지 않고 A층 위에 B층을 연속적으로 중첩코팅하는 방법을 사용하였다.Instead of coating the two layers prepared in Example 3 by lamination, a method of continuously coating the B layer on the A layer was used.

<비교예 1>Comparative Example 1

실시예 1 및 실시예 4에서와 같이 2개층으로 분리하지 않고, 처음부터 1개층으로 구성되는 필름으로 만들었다. 즉, 1개층으로 코팅하였다.It did not separate into two layers like Example 1 and Example 4, but was made from the film which consists of one layer from the beginning. That is, it was coated with one layer.

<비교예 2>Comparative Example 2

실시예 2 및 실시예 5에서와 같이 2개층으로 분리하지 않고, 처음부터 1개층으로 구성되는 필름으로 만들었다. 즉, 이방성 도전막을 2개층으로 분리하지 않고 처음부터 1개의 필름으로 만든다. 이를 위하여, 비스페놀A형 에폭시수지(에폭시당량 200, 40중량%)와, 페녹시 수지(50중량%)를 용매에 녹인 다음 경화제로 2-메틸이미다졸(7중량%)을 가하고 여기에 도전입자(Ni도금, 입경 5㎛, 3중량%)를 잘 분산시킨 다음 건조 후 두께 20㎛의 필름 F를 만들었다.It did not separate into two layers like Example 2 and Example 5, but was made into the film comprised from one layer from the beginning. That is, an anisotropic conductive film is made into one film from the beginning without separating into two layers. To this end, bisphenol A type epoxy resin (epoxy equivalent 200, 40% by weight) and phenoxy resin (50% by weight) are dissolved in a solvent, and 2-methylimidazole (7% by weight) is added thereto as a curing agent to conduct the same. Particles (Ni plating, particle size 5㎛, 3% by weight) was well dispersed and dried to make a film F having a thickness of 20㎛.

<비교예 3>Comparative Example 3

실시예 3 및 실시예 6과 같이 2개층으로 분리하지 않고, 처음부터 1개층으로 구성되는 필름으로 만들었다.It did not separate into two layers like Example 3 and Example 6, but was made from the film which consists of one layer from the beginning.

상기한 바와 같이 실시예 및 비교예들에 의하여 제조된 이방성 도전필름을 제조직후 및 실온에서 30일 보관시 관측된 각각의 물성치중 저항값의 변화 및 열경화시의 발열량변화값을 다음의 표 1에 나타내었다.As described above, the change in the resistance value and the change in calorific value at the time of thermal curing of the anisotropic conductive films prepared according to the examples and the comparative examples, which were observed immediately after the manufacture and stored at room temperature for 30 days, are shown in Table 1 below. Shown in

저항치(Ω/□)Resistance value (Ω / □) 경화발열량(J/g)Curing calorific value (J / g) 제조직후Right after manufacturing 30일 방치후After 30 days left 제조직후Right after manufacturing 30일 방치후After 30 days left 실시예 1Example 1 0.80.8 1.01.0 232232 231231 실시예 2Example 2 0.70.7 1.11.1 232232 228228 실시예 3Example 3 0.80.8 0.90.9 217217 218218 실시예 4Example 4 0.80.8 0.90.9 235235 202202 실시예 5Example 5 0.70.7 1.11.1 230230 210210 실시예 6Example 6 0.80.8 0.90.9 224224 196196 비교예 1Comparative Example 1 0.70.7 0.80.8 230230 8181 비교예 2Comparative Example 2 0.70.7 0.80.8 229229 6565 비교예 3Comparative Example 3 0.80.8 0.80.8 225225 7878

상기 표 1에서 알 수 있듯이, 제조직후와 상온에서 30일간 방치한 후의 저항치와 경화발열량을 비교할 때, 실시예들에서는 거의 차이가 없는 반면에 비교예들에서는 급격한 차이를 보이고 있다. 또한 실시예 4 내지 실시예 6에서는 2번째 층을 필름 A에 코팅할 때 용매가 필름 A에 일부 침투함으로써 경화제가 에폭시와 섞여 일부가 경화반응함으로써 실시예 1 내지 실시예 3보다 상온에서의 보관안정성이 떨어짐을 알 수 있다.As can be seen in Table 1, when comparing the resistance value and the curing calorific value immediately after the manufacture and left for 30 days at room temperature, there is almost no difference in the examples, while the comparative example shows a sharp difference. In addition, in Examples 4 to 6, when the second layer was coated on the film A, the solvent partially penetrated the film A, the curing agent was mixed with the epoxy, and some of the curing reactions resulted in storage stability at room temperature than in Examples 1 to 3. It can be seen that this falls.

상기한 바와 같이 구성된 본 발명에 따른 보관안정성이 우수한 이방성 도전필름의 제조방법에 의하면, 에폭시수지와 경화제를 2개층으로 각각 분리한 후 이들을 적층함으로써 상온에서의 보관안정성이 우수하고, 따라서 우수한 전기적 신뢰성을 확보할 수 있다.According to the manufacturing method of the anisotropic conductive film excellent in the storage stability according to the present invention configured as described above, by separating the epoxy resin and the curing agent into two layers, respectively, and then laminated them, excellent storage stability at room temperature, and thus excellent electrical reliability Can be secured.

Claims (1)

필름형성을 돕는 수지를 적당한 용매에 용해시켜 고형분을 조절하고, 경화제 및 도전입자를 적당한 양으로 첨가한 후 이형PET필름 위에 15∼40㎛의 두께로 코팅함으로써 제1층을 만드는 단계와;Preparing a first layer by dissolving a resin helping film formation in a suitable solvent to control solid content, adding a curing agent and conductive particles in an appropriate amount, and coating the release PET film to a thickness of 15 to 40 μm; 필름형성을 돕는 수지와, 에폭시 수지를 용매에 녹여 고형분을 조절한 다음 도전입자를 분산시켜 별도의 이형PET필름 위에 15∼40㎛의 두께로 코팅함으로써 제2층을 만드는 단계와; 그리고,Preparing a second layer by coating a resin having a thickness of 15 to 40 μm on a separate release PET film by dissolving the conductive particles by dissolving the resin and the epoxy resin in a solvent to control solid content, and then dispersing the conductive particles; And, 상기 제1층 및 제2층을 서로 적층함으로써 2층 구조의 이방성 도전필름을 만드는 단계를 포함하여 이루어지는 것을 특징으로 하는 이방성 도전필름의 제조방법.The method of manufacturing an anisotropic conductive film comprising the step of making an anisotropic conductive film of a two-layer structure by laminating the first layer and the second layer to each other.
KR1019990002029A 1999-01-22 1999-01-22 Metnod for the preparation of the anisotropic conductive film KR20000051531A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100436577B1 (en) * 2001-10-30 2004-06-18 엘지전선 주식회사 Manufacturing Method of anisortropic conductive adhesive films
KR100791172B1 (en) * 2006-01-03 2008-01-02 엘에스전선 주식회사 Manufacturing method anisortropic conductive film and Anisortropic conductive film manufactured using the method
KR101067353B1 (en) * 2008-09-05 2011-09-23 팀켐 컴퍼니 Anisotropic conductive material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100436577B1 (en) * 2001-10-30 2004-06-18 엘지전선 주식회사 Manufacturing Method of anisortropic conductive adhesive films
KR100791172B1 (en) * 2006-01-03 2008-01-02 엘에스전선 주식회사 Manufacturing method anisortropic conductive film and Anisortropic conductive film manufactured using the method
KR101067353B1 (en) * 2008-09-05 2011-09-23 팀켐 컴퍼니 Anisotropic conductive material

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