KR20000025768A - Lifter based upon magnetic force in semiconductor facility - Google Patents

Lifter based upon magnetic force in semiconductor facility Download PDF

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Publication number
KR20000025768A
KR20000025768A KR1019980042968A KR19980042968A KR20000025768A KR 20000025768 A KR20000025768 A KR 20000025768A KR 1019980042968 A KR1019980042968 A KR 1019980042968A KR 19980042968 A KR19980042968 A KR 19980042968A KR 20000025768 A KR20000025768 A KR 20000025768A
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South Korea
Prior art keywords
permanent magnet
magnetic force
wafer
lifter
movable body
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KR1019980042968A
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Korean (ko)
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구지언
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윤종용
삼성전자 주식회사
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Priority to KR1019980042968A priority Critical patent/KR20000025768A/en
Publication of KR20000025768A publication Critical patent/KR20000025768A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE: A lifter based upon magnetic force in semiconductor facility is provided to improve the endurance of a component since a sealing member is not needed make it easy to seal a facility and increase the yield of a wafer. CONSTITUTION: By a lifter based upon magnetic force in semiconductor facility, the generation of the mechanical friction is prevented by driving an operation body(30) up and down using a magnetic force. The lifter includes: the operation body which is installed to be able to be moved up and down in order to attach/detach a wafer(1) to/from a top surface where the wafer is loaded, being comprised inside a process chamber(10); a permanent magnet(40) fixed on a bottom end part of the operation body; and an electromagnet(60) which generates a magnetic force as to the permanent magnet according to the operation of a power source(70) in order to move the operation body, being installed facing with the permanent magnet.

Description

반도체 설비의 자력 구동식 리프터Magnetically driven lifters in semiconductor equipment

본 발명은 반도체 설비의 자력 구동식 리프터에 관한 것으로서, 보다 상세하게는, 자력을 이용하여 가동체를 승하강 구동시킴으로써 기계적 마찰의 발생을 방지하게 하는 반도체 설비의 자력 구동식 리프터에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetically driven lifter for semiconductor equipment, and more particularly, to a magnetically driven lifter for semiconductor equipment that prevents the occurrence of mechanical friction by driving a movable body up and down using magnetic force.

일반적으로 반도체 제조공정에서 대부분의 공정챔버에는 웨이퍼 또는 카셋트를 운반하거나 이송하는 리프터 등의 이송장치가 설치된다.In general, in the semiconductor manufacturing process, most process chambers are provided with a transfer device such as a lifter for carrying or transferring a wafer or cassette.

이러한 이송장치의 구동원이라 할 수 있는 실린더, 모터 등은 다수의 파티클이 발생하게 되고, 부분적으로 열화되는 등 공정챔버의 가공조건에 악영향을 끼치는 특성 때문에 통상 상기 공정챔버의 외부에 설치된다.Cylinders, motors, and the like, which are the driving sources of the transfer device, are usually installed outside the process chamber because of the characteristics that adversely affect the processing conditions of the process chamber, such as generating a large number of particles and partially deteriorating them.

따라서, 상기 공정챔버의 내부에서 작동하는 웨이퍼 승하강장치 등의 이송장치는, 상기 공정챔버 내부에 위치하는 가동체가 상기 공정챔버의 외부에 설치된 실린더, 모터 등과 연결부 등에 의해 연결되는 구성이다.Therefore, a transfer device such as a wafer elevating device operating in the process chamber has a configuration in which a movable body located inside the process chamber is connected by a cylinder, a motor, or the like connected to the outside of the process chamber.

특히, 공정챔버의 가공조건이 진공상태를 요하거나 엄격한 외부와의 밀폐가 요구될 때에는 상기 연결부에 반드시 오링과 같은 실링부재를 설치한다.In particular, when the processing conditions of the process chamber require a vacuum state or tight sealing with the outside, a sealing member such as an O-ring must be provided at the connecting portion.

이러한 종래의 반도체 설비의 리프터들 중에서 실린더 구동방식의 리프터를 도1에 도시하였다.The lifter of the cylinder drive type is shown in FIG.

도1에 도시된 바와 같이, 종래의 반도체 설비의 실린더 구동식 리프터는, 챔버(110) 내부의 스테이지(120)에 형성된 일정한 경로를 따라 이동하면서 상기 웨이퍼(1)와 접촉하여 상기 웨이퍼(1)를 승하강시키는 다수개의 가동체(130)와, 상기 가동체(130)들을 고정하는 승강대(140)와, 상기 승강대(140)에 고정되는 피스톤(80) 및 상기 챔버(110)의 외부에 설치되어 상기 피스톤(80)을 승하강시키는 실린더(90)를 구비하여 이루어지는 구성이다.As shown in FIG. 1, a cylinder-driven lifter of a conventional semiconductor installation is in contact with the wafer 1 while moving along a predetermined path formed in the stage 120 inside the chamber 110. Installed on the outside of the chamber 110 and a plurality of movable bodies 130 for lifting and lowering, a platform 140 for fixing the movable bodies 130, a piston 80 fixed to the platform 140, and the chamber 110. And the cylinder 90 which raises and lowers the said piston 80 is comprised.

여기서, 상기 승강대(140)는 상기 실린더(90)에 의해 이동되기 전의 원위치로 복귀가 용이하도록 상기 챔버(110)의 스테이지(120)에 고정된 복귀 스프링(150)에 연결된다.Here, the platform 140 is connected to the return spring 150 fixed to the stage 120 of the chamber 110 to facilitate the return to the original position before being moved by the cylinder (90).

따라서, 최초 상기 가동체(130)가 하강상태에서 대기하다가 상기 실린더(90)가 피스톤(80)을 신장시키면 상기 스프링(150)이 압축되면서 상기 승강대(140)가 승강하여 웨이퍼(1)가 상기 가동체(130)에 의해 승강하게 되는 것이다.Therefore, when the movable body 130 is in the lowered state for the first time and the cylinder 90 extends the piston 80, the spring 150 is compressed and the lifting table 140 is lifted to raise the wafer 1. The movable body 130 moves up and down.

또한, 상기 실린더(90)가 상기 피스톤(80)을 수축시키면 상기 승강대(140)가 하강하면서 상기 가동체(130)가 상기 웨이퍼(1)를 상기 스테이지(120)에 안착시키게 된다.In addition, when the cylinder 90 contracts the piston 80, the lifting platform 140 descends and the movable body 130 seats the wafer 1 on the stage 120.

이때, 상기 스프링(150)의 복귀력에 의해 상기 피스톤(80)의 하강이 신속하고, 확실하게 이루어지게 된다.At this time, the lowering of the piston 80 is made quickly and surely by the return force of the spring 150.

그러나, 이러한 실린더 구동의 리프터는 상기 챔버(110)의 벽과 승강대(140) 사이에 설치된 실링부재의 일종인 오링(111)이 쉽게 노후되어 외부로부터 외기가 유입되고, 상기 오링(111)의 마모 및 열화로 인해 다수의 파티클이 발생하는 등 공정조건에 악영향을 끼치는 문제점이 있었다.However, such a cylinder-driven lifter is an o-ring 111, which is a kind of sealing member installed between the wall of the chamber 110 and the platform 140, is easily aged and external air is introduced from the outside, and the wear of the o-ring 111 is worn. And deterioration has a problem that adversely affect the process conditions, such as generating a large number of particles.

또한, 이러한 오링(111)을 교체 및 관리하는 데 소요되는 공수가 너무 많아 설비의 생산성이 떨어지는 등의 문제점이 있었다.In addition, there is a problem such that the productivity of the facility is too large because the number of times required to replace and manage the O-ring (111).

본 발명은 상기와 같은 종래의 문제점을 해결하기 위한 것으로, 그 목적은 실링부재가 불필요하여 부품의 내구성을 향상시키고, 설비의 실링이 용이하며, 웨이퍼의 수율을 높이는 반도체 설비의 자력 구동식 리프터를 제공함에 있다.SUMMARY OF THE INVENTION The present invention has been made to solve the conventional problems as described above, and its purpose is to provide a magnetically driven lifter for semiconductor equipment that improves the durability of components, facilitates sealing of equipment, and improves the yield of wafers by eliminating the need for a sealing member. In providing.

도1은 종래의 반도체 설비의 실린더 구동식 리프터를 나타낸 개략도이다.1 is a schematic diagram showing a cylinder driven lifter of a conventional semiconductor installation.

도2는 본 발명의 바람직한 일 실시예에 따른 반도체 설비의 자력 구동식 리프터를 나타낸 개략도이다.Figure 2 is a schematic diagram showing a magnetically driven lifter of a semiconductor device according to an embodiment of the present invention.

※ 도면의 주요 부분에 대한 부호의 설명※ Explanation of codes for main parts of drawing

1: 웨이퍼 10, 110: 챔버1: wafer 10, 110: chamber

20, 120: 스테이지 30, 130: 가동체20, 120: stage 30, 130: movable body

40: 영구자석 50, 150: 스프링40: permanent magnet 50, 150: spring

60: 전자석 70: 전원60: electromagnet 70: power

80: 피스톤 90: 실린더80: piston 90: cylinder

111: 오링 140: 승강대111: O-ring 140: platform

상기의 목적을 달성하기 위한 본 발명에 따른 반도체 설비의 자력 구동식 리프터는, 공정챔버의 내부에 구비되어 웨이퍼가 안착되는 스테이지의 상면으로부터 상기 웨이퍼를 착탈할 수 있도록 승강이동이 가능하게 설치된 가동체와, 상기 가동체의 하측단부에 고정되는 영구자석과, 상기 영구자석에 대향하여 설치되고, 상기 가동체가 이동되도록 전원의 조작에 따라 상기 영구자석에 대하여 자력을 발생하는 전자석을 포함하여 이루어지는 것을 특징으로 한다.The magnetically driven lifter of the semiconductor equipment according to the present invention for achieving the above object is a movable body which is provided inside the process chamber so as to be movable up and down so that the wafer can be detached from the upper surface of the stage on which the wafer is seated. And a permanent magnet fixed to the lower end of the movable body, and an electromagnet which is provided to face the permanent magnet and generates magnetic force with respect to the permanent magnet according to the operation of a power source so that the movable body is moved. It is done.

이하, 본 발명의 구체적인 일 실시예를 첨부된 도면을 참조하여 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도2를 참조하여 설명하면, 본 발명의 반도체 설비의 자력 구동식 리프터는, 챔버(10) 내부의 스테이지(20)에 형성된 일정한 경로를 따라 이동하면서 상기 웨이퍼(1)와 접촉하여 상기 웨이퍼(1)를 승하강시키는 다수개의 가동체(30)와, 상기 가동체(30)들을 고정하는 영구자석(40) 및 상기 영구자석(40)에 대향하여 설치되고, 상기 영구자석(40)이 이동되도록 전원(70)의 단속에 따라 상기 영구자석(40)에 대하여 자력을 발생하는 전자석(60)을 구비하여 이루어지는 구성이다.Referring to FIG. 2, the magnetically driven lifter of the semiconductor equipment of the present invention contacts the wafer 1 while moving along a predetermined path formed in the stage 20 inside the chamber 10. A plurality of movable bodies 30 for elevating and lowering), a permanent magnet 40 for fixing the movable bodies 30 and the permanent magnets 40 are installed to face each other, and the permanent magnets 40 are moved. The electromagnet 60 which generates a magnetic force with respect to the permanent magnet 40 according to the interruption of the power supply 70 is comprised.

여기서, 상기 영구자석(40)은 상기 전자석(60)에 의해 이동되기 전의 원위치로 복귀가 용이하도록 상기 챔버(10)의 스테이지(20)에 고정된 복귀 스프링(50)에 연결된다.Here, the permanent magnet 40 is connected to the return spring 50 fixed to the stage 20 of the chamber 10 so as to easily return to the original position before moving by the electromagnet 60.

따라서, 최초 상기 가동체(30)가 하강상태에서 대기하다가 상기 전자석(60)에 전원(70)의 전력이 인가되면 상기 전자석(60)에 상기 영구자석(40)에 대해 반발하는 자력이 발생되어 상기 스프링(50)이 압축되면서 상기 영구자석(40)이 반발력에 의해 승강하여 웨이퍼(1)가 상기 가동체(30)에 의해 승강하게 된다.Therefore, when the movable body 30 waits in the lowered state for the first time and the electric power of the power source 70 is applied to the electromagnet 60, a magnetic force is generated to the electromagnet 60 against the permanent magnet 40. As the spring 50 is compressed, the permanent magnet 40 is lifted by the repulsive force so that the wafer 1 is lifted by the movable body 30.

이때, 상기 전자석(60)과 상기 영구자석(40)의 서로 대향하는 면의 자극은 서로 같아야만 한다.At this time, the magnetic poles of the electromagnet 60 and the permanent magnet 40 facing each other should be the same.

한편, 이와 같이 서로 같은 극 사이의 척력을 이용하는 방법 이외에도 서로 다른 극 사이의 인력을 이용하는 것도 가능한 것이다.On the other hand, in addition to using the repulsive force between the same poles in this way it is also possible to use the attraction between the different poles.

또한, 상기 전자석(60)에 전원(70)의 전력이 끊어지면 상기 전자석(60)의 자력이 상실되어 상기 영구자석(40)이 상기 스프링(50)의 복귀력에 의해 하강하면서 상기 가동체(30)가 상기 웨이퍼(1)를 상기 스테이지(20)에 안착시키게 된다.In addition, when the power of the power source 70 is cut off to the electromagnet 60, the magnetic force of the electromagnet 60 is lost and the permanent magnet 40 is lowered by the return force of the spring 50, the movable body ( 30 causes the wafer 1 to rest on the stage 20.

따라서, 이러한 본 발명의 자력 구동식 리프터는 종래의 오링 등과 같은 실링부재가 불필요하여 기계적 마찰을 방지할 수 있기 때문에 부품의 수명을 향상시킬 수 있으며, 외부로부터 외기가 유입되기 어렵고, 파티클의 발생을 억제하는 등 양질의 웨이퍼를 생산할 수 있는 것이다.Therefore, the magnetically driven lifter of the present invention can improve the life of the parts because it is unnecessary to the sealing member such as a conventional O-ring and can prevent mechanical friction, it is difficult to introduce outside air from the outside, the generation of particles It is possible to produce wafers of high quality such as suppressing them.

또한, 부품의 관리 및 교체가 용이하여 설비의 생산성을 향상할 수 있는 이점이 있다.In addition, there is an advantage that can be easy to manage and replace the parts to improve the productivity of the facility.

이상에서와 같이 본 발명에 따른 반도체 설비의 자력 구동식 리프터에 의하면, 실링부재가 불필요하여 부품의 내구성을 향상시키고, 설비의 실링이 용이하며, 웨이퍼의 수율을 높게 하는 효과를 갖는 것이다.As described above, according to the magnetically driven lifter of the semiconductor device according to the present invention, the sealing member is unnecessary, thereby improving the durability of the parts, facilitating the sealing of the device, and increasing the yield of the wafer.

이상에서 본 발명은 기재된 구체예에 대해서만 상세히 설명되었지만 본 발명의 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다.Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.

Claims (2)

공정챔버의 내부에 구비되어 웨이퍼가 안착되는 스테이지의 상면으로부터 상기 웨이퍼를 착탈할 수 있도록 승강이동이 가능하게 설치된 가동체;A movable body provided inside the process chamber and installed to move up and down to detach the wafer from an upper surface of the stage on which the wafer is seated; 상기 가동체의 하측단부에 고정되는 영구자석; 및A permanent magnet fixed to the lower end of the movable body; And 상기 영구자석에 대향하여 설치되고, 상기 가동체가 이동되도록 전원의 조작에 따라 상기 영구자석에 대하여 자력을 발생하는 전자석;An electromagnet installed opposite to the permanent magnet and generating magnetic force with respect to the permanent magnet according to an operation of a power source to move the movable body; 을 포함하여 이루어지는 것을 특징으로 하는 반도체 설비의 자력 구동식 리프터.Magnetically driven lifter of the semiconductor equipment, characterized in that comprises a. 제 1 항에 있어서,The method of claim 1, 상기 영구자석은 상기 전자석에 의해 이동되기 전의 원위치로 복귀가 용이하도록 상기 스테이지에 고정된 복귀스프링에 연결되는 것을 특징으로 하는 상기 반도체 설비의 자력 구동식 리프터.And the permanent magnet is connected to a return spring fixed to the stage so that the permanent magnet is easily returned to its original position before being moved by the electromagnet.
KR1019980042968A 1998-10-14 1998-10-14 Lifter based upon magnetic force in semiconductor facility KR20000025768A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100523628B1 (en) * 2003-02-04 2005-10-25 동부아남반도체 주식회사 Support roller of a brush cleaner
KR100697460B1 (en) * 2005-01-12 2007-03-20 엘지전자 주식회사 Top burner for Electric oven range
KR100819115B1 (en) * 2006-12-22 2008-04-02 세메스 주식회사 Unit for supporting a substrate, apparatus for processing the substrate and method of supporting the substrate using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100523628B1 (en) * 2003-02-04 2005-10-25 동부아남반도체 주식회사 Support roller of a brush cleaner
KR100697460B1 (en) * 2005-01-12 2007-03-20 엘지전자 주식회사 Top burner for Electric oven range
KR100819115B1 (en) * 2006-12-22 2008-04-02 세메스 주식회사 Unit for supporting a substrate, apparatus for processing the substrate and method of supporting the substrate using the same

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