KR19990025802A - Tube fixing tool of diffusion equipment - Google Patents
Tube fixing tool of diffusion equipment Download PDFInfo
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- KR19990025802A KR19990025802A KR1019970047586A KR19970047586A KR19990025802A KR 19990025802 A KR19990025802 A KR 19990025802A KR 1019970047586 A KR1019970047586 A KR 1019970047586A KR 19970047586 A KR19970047586 A KR 19970047586A KR 19990025802 A KR19990025802 A KR 19990025802A
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- quartz tube
- block
- tube
- wedge
- heating chamber
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Abstract
히팅챔버(Heating Chamber)에 석영관을 삽입하여 셋업(Set-up) 후 석영관의 밀림을 방지하도록 쐐기를 이용해서 고정시킴으로써 온도변화 및 가스누출을 방지하도록 개선시킨 확산설비의 튜브 고정용 도구에 관한 것이다.Insert the quartz tube into the heating chamber and fix it with wedges to prevent the quartz tube from rolling after the set-up. It is about.
본 발명은, 웨이퍼를 탑재하여 챔버에 장착되는 석영관과, 상기 석영관을 고정하는 블록을 구비한 확산설비에 있어서, 상기 석영관과 상기 블록의 사이에 끼워서 상기 석영관과 상기 블록을 고정시키는 쐐기를 구비하여 이루어진다.According to an aspect of the present invention, there is provided a diffusion apparatus including a quartz tube on which a wafer is mounted in a chamber, and a block for fixing the quartz tube, wherein the quartz tube and the block are fixed by being sandwiched between the quartz tube and the block. With wedges.
따라서, 본 발명에 의하면 석영관이 히팅챔버에서 밀리는 현상을 방지하여 작업손실이 감소하고, 공정이 원활히 수행되어서 생산성이 향상되는 효과가 있다.Therefore, according to the present invention, the quartz tube is prevented from being pushed out of the heating chamber, thereby reducing the work loss and smoothly performing the process, thereby improving productivity.
Description
본 발명은 확산설비의 튜브 고정용 도구에 관한 것으로서, 보다 상세하게는 히팅챔버(Heating Chamber)에 석영관을 삽입하여 셋업(Set-up) 후 석영관의 밀림을 방지하도록 쐐기를 이용해서 고정시킴으로써 온도변화 및 가스누출을 방지하도록 개선시킨 확산설비의 튜브 고정용 도구에 관한 것이다.The present invention relates to a tool for fixing a tube of a diffusion apparatus, and more particularly, by inserting a quartz tube into a heating chamber and fixing it using wedges to prevent the quartz tube from rolling after set-up. The present invention relates to a tube fixing tool of a diffusion apparatus that is improved to prevent temperature changes and gas leakage.
반도체 제조공정 중 확산공정은 웨이퍼상에 산화막 성장, 산화막 재배선 또는 불순물을 확산시키기 위한 공정이다. 특히 히팅챔버를 이용한 고온에서 열손실없이 온도를 제어하여야 한다. 히팅챔버에 가스를 주입하고, 온도를 높일 때 석영관에 주입되는 반응가스의 누출을 방지하며, 온도를 일정하게 유지해야 안정적으로 산화막을 형성시킬 수 있다.The diffusion process in the semiconductor manufacturing process is a process for diffusing oxide film growth, oxide film redistribution or impurities on the wafer. In particular, the temperature should be controlled without heat loss at high temperature using the heating chamber. Injecting gas into the heating chamber, preventing the leakage of reaction gas injected into the quartz tube when the temperature is increased, and maintaining the temperature at a constant temperature can stably form an oxide film.
종래 확산공정이 진행되는 히팅챔버에는 웨이퍼를 장착한 석영관이 탑재되고, 고정되면 반응가스가 석영관으로 주입되었다.In the heating chamber in which the conventional diffusion process is performed, a quartz tube equipped with a wafer is mounted, and when fixed, a reaction gas is injected into the quartz tube.
히팅챔버에 탑재되는 석영관은 블록으로 일차 고정되고, 블록은 자동문을 이용하여 밀착시킨 후 밀폐된 상태에서 히팅챔버에 의해 석영관의 온도가 상승한다. 온도가 적정 수준에 도달하면 반응가스가 주입되는데 개폐동작이 지속적으로 이루어지는 자동문이 지지역할을 수행하지 못하여서 석영관이 밀리는 현상이 발생하였고, 석영관이 밀리면서 히팅챔버 내부의 온도가 일정하지 않고, 밀폐가 이루어지지 않아서 독성이 강한 HCl, POCl3등의 가스가 유출되었다.The quartz tube mounted on the heating chamber is first fixed with a block, and the block is closely contacted using an automatic door, and then the temperature of the quartz tube is raised by the heating chamber in a closed state. When the temperature reaches the appropriate level, the reaction gas is injected, and the automatic door that continuously opens and closes does not perform the local area, causing the quartz tube to be pushed out. Since there was no sealing, gases such as HCl and POCl 3 , which are highly toxic, were leaked.
이와 같이 개폐구가 밀폐되지 않아서 석영관이 밀리면 온도 및 균일도가 불량해지고, 가스가 누출되어 장비가 부식되며, 결과적으로 설비가 멈추게 되는 문제점이 있었다.As such, when the quartz tube is pushed because the opening and closing port is not sealed, the temperature and uniformity become poor, the gas leaks, and the equipment is corroded. As a result, the equipment is stopped.
본 발명의 목적은, 확산공정시 석영관이 히팅챔버에 고정된 상태에서 공정이 이루어지도록 쐐기를 이용하여 석영관을 블록에 고정시키는 확산설비의 튜브 고정용 도구를 제공하는 데 있다.SUMMARY OF THE INVENTION An object of the present invention is to provide a tool for fixing a tube of a diffusion apparatus for fixing a quartz tube to a block by using a wedge so that the process is performed while the quartz tube is fixed to the heating chamber during the diffusion process.
도1은 본 발명에 따른 확산설비의 튜브 고정용 도구의 실시예를 나타내는 도면이다.1 is a view showing an embodiment of a tube fixing tool of the diffusion equipment according to the present invention.
도2는 본 발명에 따른 확산설비의 튜브 고정용 도구를 나타내는 사시도이다.Figure 2 is a perspective view showing a tube fixing tool of the diffusion equipment according to the present invention.
※ 도면의 주요 부분에 대한 부호의 설명※ Explanation of codes for main parts of drawing
10 : 히팅챔버 12 : 석영관10: heating chamber 12: quartz tube
14 : 블록 16 : 쐐기14 block 16: wedge
상기 목적을 달성하기 위한 본 발명에 따른 확산설비의 튜브 고정용 도구는, 웨이퍼를 탑재하여 챔버에 장착되는 석영관과, 상기 석영관을 고정하는 블록을 구비한 확산설비에 있어서, 상기 석영관과 상기 블록의 사이에 끼워서 상기 석영관과 상기 블록을 고정시키는 쐐기를 구비하여 이루어진다.In order to achieve the above object, a tube fixing tool of a diffusion apparatus according to the present invention includes a quartz tube mounted on a chamber in which a wafer is mounted, and a diffusion apparatus including a block for fixing the quartz tube. It is provided with a wedge which is sandwiched between the blocks to fix the quartz tube and the block.
그리고, 상기 쐐기는 원통형의 상기 석영관을 고정하기 용이하도록 그 형상은 라운드된 부채꼴 모양으로 이루어짐이 바람직하다.And, the wedge is preferably made of a round fan shape so that the shape is easy to fix the cylindrical quartz tube.
또한, 상기 쐐기는 삽입 및 해체가 용이하도록 삽입되지 않는 부위에 손잡이가 형성되고, 세라믹 재질로 이루어짐이 바람직하다.In addition, the wedge is a handle is formed in a portion that is not inserted to facilitate insertion and disassembly, preferably made of a ceramic material.
이하, 본 발명의 구체적인 실시예를 첨부한 도면을 참조하여 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도1을 참조하면, 본 발명에 따른 실시예는 열을 가해 확산온도를 제공하는 히팅챔버(10) 내부에 웨이퍼가 장착되는 석영관(12)이 탑재된다. 석영관(12)은 링형상의 블록(14)내부에 인입되어서 히팅챔버(10)에 지지되고, 석영관(12)과 블록(14)사이에 쐐기(16)가 인입되어 밀착고정되어 있다.Referring to Fig. 1, in the embodiment according to the present invention, a quartz tube 12 in which a wafer is mounted is mounted inside a heating chamber 10 that applies heat to provide a diffusion temperature. The quartz tube 12 is drawn into the ring-shaped block 14 to be supported by the heating chamber 10, and a wedge 16 is drawn between the quartz tube 12 and the block 14 to be tightly fixed.
전술한 바와 같이 구성된 본 발명에 따른 실시예는, 석영관(12)의 돌출부로부터 반응가스가 주입되면 석영관(12) 내부에 탑재된 웨이퍼에 산화막형성 등의 확산공정이 이루어진다.In the embodiment according to the present invention configured as described above, when the reaction gas is injected from the protrusion of the quartz tube 12, a diffusion process such as oxide film formation is performed on the wafer mounted inside the quartz tube 12.
구체적으로 히팅챔버(10)에 장착된 석영관(12)의 양변부는 블록(14)에 의해 고정되어 있다. 또한 견고한 고정을 위해 석영관(12)과 블록(14) 사이에는 원형의 블록(14)과 석영관(12)을 밀착하는 라운드된 쐐기(16)가 삽입되어 있다. 쐐기(16)에 의해 공정진행시 자동문의 잦은 개폐동작으로 발생되는 석영관(12)의 밀림이 방지됨으로써 온도가 일정하게 유지되고, 가스유출이 사전에 방지된다. 또한 쐐기(16)의 형상은 삽입 및 분리가 용이하도록 손잡이가 형성되어 있다.Specifically, both sides of the quartz tube 12 attached to the heating chamber 10 are fixed by the block 14. In addition, a rounded wedge 16 close to the circular block 14 and the quartz tube 12 is inserted between the quartz tube 12 and the block 14 for firm fixing. By the wedge 16, the temperature of the quartz tube 12 generated by frequent opening and closing operations of the automatic door during the process is prevented, so that the temperature is kept constant and gas leakage is prevented in advance. In addition, the shape of the wedge 16 is formed with a handle to facilitate insertion and removal.
따라서, 본 발명에 의하면 석영관이 히팅챔버에서 밀리는 현상을 방지하여 작업손실이 감소하고, 공정이 원활히 수행되어서 생산성이 향상되는 효과가 있다.Therefore, according to the present invention, the quartz tube is prevented from being pushed out of the heating chamber, thereby reducing the work loss and smoothly performing the process, thereby improving productivity.
이상에서 본 발명은 기재된 구체예에 대해서만 상세히 설명되었지만 본 발명의 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다.Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019970047586A KR19990025802A (en) | 1997-09-18 | 1997-09-18 | Tube fixing tool of diffusion equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019970047586A KR19990025802A (en) | 1997-09-18 | 1997-09-18 | Tube fixing tool of diffusion equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR19990025802A true KR19990025802A (en) | 1999-04-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970047586A KR19990025802A (en) | 1997-09-18 | 1997-09-18 | Tube fixing tool of diffusion equipment |
Country Status (1)
| Country | Link |
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| KR (1) | KR19990025802A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101310476B1 (en) * | 2006-06-23 | 2013-09-24 | 도쿄엘렉트론가부시키가이샤 | Method for baking quartz product and apparatus for baking quartz product |
-
1997
- 1997-09-18 KR KR1019970047586A patent/KR19990025802A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101310476B1 (en) * | 2006-06-23 | 2013-09-24 | 도쿄엘렉트론가부시키가이샤 | Method for baking quartz product and apparatus for baking quartz product |
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