KR19980075049A - Color Plasma Display Panel and Manufacturing Method Thereof - Google Patents

Abstract

The present invention relates to a color plasma display panel and a method of manufacturing the same, comprising: an upper substrate and a lower substrate having electrode lines having a predetermined interval, and a partition wall formed between the upper and lower substrates and formed of photosensitive glass to form one cell. And a groove formed between the barrier rib and the barrier rib, and the manufacturing method includes applying a photosensitive paste with a uniform thickness on the lower substrate, and baking the coated photosensitive paste to form a photosensitive glass layer. And removing the unnecessary portion of the photosensitive glass layer to form a partition wall, thereby manufacturing a high-resolution color plasma display panel.

Description

Color Plasma Display Panel and Manufacturing Method Thereof

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel, and more particularly, to a color plasma display panel and a manufacturing method for forming a partition wall using a photosensitive glass material.

In general, a plasma display panel drives a pixel by forming a sustain electrode and an address electrode in a matrix form between an upper substrate and a lower substrate, and generates discharge therebetween to generate an image using ultraviolet rays generated therein. A flat panel display device to implement.

1 is a diagram illustrating a unit cell cross-sectional structure of a typical plasma display panel.

Referring to FIG. 1, a typical plasma display panel forms a pair of sustain electrodes 11 having a constant width and height on the same surface of the upper substrate 10, and prints the dielectric layer 12 on the sustain electrodes 11. And an upper structure formed by a method, wherein the protective layer 13 is formed on the dielectric layer 12 formed on the sustain electrode 11. In order to form an address electrode 15 having a predetermined width and height on the lower substrate 14, and to prevent crosstalk between adjacent cells occurring in the address electrode 15, the partition wall 16 is formed. And a substructure having phosphors 17 formed on the sidewalls of the partition walls 16 and the address electrodes 15.

An inert gas is enclosed between the upper structure and the lower structure to form a discharge region 18.

The operation of the plasma display panel configured as described above is as follows.

When a driving voltage is applied to the sustain electrode 11, surface discharge occurs in the discharge region 18 on the surfaces of the dielectric layer 12 and the protective layer 13 to generate ultraviolet rays 19.

Color display is performed as the fluorescent material of the surrounding phosphor 17 is excited by the generated ultraviolet light 19.

That is, the main component (space charge) existing in the discharge cell is accelerated by the applied driving voltage, the inert mixed gas filled with a pressure of about 400 to 500 torr in the discharge cell, that is, helium (He) as a main component 147 nm ultraviolet rays are generated when the inert gas is excited by colliding with a phenning mixed gas containing xenon (Xe), neon (Ne) gas, and the like.

Visible light is generated when the ultraviolet rays 19 collide with the phosphor 17 surrounding the address electrode 15 and the partition wall 16.

The manufacturing method of the plasma display panel configured as described above is as follows.

First, a sustain electrode 11 as an upper electrode is formed on the upper insulating substrate 10.

In this case, the sustain electrode 11 uses a transparent electrode (ITO (Indium-Tin Oxide)) on which indium oxide or tin oxide is deposited.

Subsequently, in order to generate wall charges to lower the driving voltage, a dielectric paste is printed on the sustain electrode 11 to form the dielectric layer 12, followed by drying and firing.

The dielectric layer is a low melting glass material mainly composed of lead oxide.

A protective layer 13 is then formed to prevent damage to the dielectric layer 12.

In this case, the protective layer 13 uses magnesium oxide and is formed by electron beam deposition.

Subsequently, the address electrode 15 is formed on the lower insulating substrate 14.

Subsequently, when the address electrode 15 is formed, the partition wall 16 is formed on the lower insulating substrate 14 to prevent color mixing between adjacent discharge cells.

Here, a representative technique of forming the partition wall 16 is by a thick film printing method, which is not a method of forming the partition wall 16 by an etching method, but simply printing a partition material several times in a predetermined area. .

In the thick film printing method, a paste obtained by mixing ceramic powder with an organic binder solvent or the like is printed and dried 10 times using a screen mask and dried, and then fired at 450 ° C to 700 ° C to form a partition.

At this time, the thickness of the partition wall printed once is 13 micrometers-15 micrometers, and the thickness of all the partition walls is 130 micrometers-150 micrometers.

Subsequently, the phosphor 17 is formed on the address electrode 15 and the partition 16.

When the upper and lower substrates thus formed are sealed with the sealant, a sealed space is formed.

At this time, the upper / lower structure seals the discharge gas into the space sealed by the sealant, and the panel sealed through the hole by combining a hole (not shown) and a gas injection glass tube (not shown) drilled in the lower corner portion. When evacuating the negative air and evacuating it, the degree of vacuum is usually about 10 ^-6 to 10 ^-8 torr.

The gas is injected by the gas injection device and the glass tube is sealed with heat to form a panel in which the discharge gas is completely sealed.

The plasma display panel configured as described above is difficult to make a partition of desired quality in the printing process.

In addition, there is a problem that not only the depth control of the partition wall but also costly when making the partition wall.

The present invention has been made to solve the problems according to the prior art, an object of the present invention is to provide a color plasma display panel and a manufacturing method for greatly improving the resolution by forming a partition using a photosensitive glass.

In addition, the present invention provides a color plasma display panel and a method of manufacturing the partition wall which are simple and can reduce the cost.

1 is a view showing a unit cell cross-sectional structure of a general color plasma display panel;

2 is a flowchart illustrating a method of manufacturing a partition wall of a color plasma display panel according to the present invention;

3 is a partial view showing a lower insulating substrate and a photosensitive glass layer of the color plasma display panel according to the present invention;

4 is a view of developing the photosensitive glass layer of the color plasma display panel according to the present invention by a pattern mask;

5 is a view showing a partition of a color plasma display panel according to the present invention;

FIG. 6 is a detailed view of portion A of FIG. 5.

Explanation of symbols for main parts of the drawings

10: upper substrate 11: sustain electrode

12 dielectric layer 13 protective layer

14: lower substrate 15: address electrode

16 bulkhead 17 phosphor

18: discharge area 19: ultraviolet light

20 photosensitive glass layer

Characteristic of the partition and manufacturing method of the plasma display panel according to the present invention, the step of applying a photosensitive paste with a uniform thickness on the lower substrate, baking the applied photosensitive paste to form a photosensitive glass layer, the photosensitive glass Forming unnecessary bulkheads by removing unnecessary portions of the layer.

Hereinafter, a preferred embodiment of the plasma display panel and the manufacturing method according to the present invention.

2 is a flowchart illustrating a method of manufacturing a partition wall of a color plasma display panel according to the present invention.

Referring to FIG. 2, in the method of manufacturing a partition wall of the color plasma display panel according to the present invention, a photosensitive paste is uniformly applied to a thickness of 100 μm on the lower substrate 14 (S101).

Here, the photosensitive paste consists of 73 wt%-82 wt% of silicon oxide (SiO ₂ ), 6 wt%-15 wt% of lithium oxide (Li ₂ O), 4 wt%-20 wt% of aluminum oxide (Al ₂ O ₃ ), and the like.

In addition, the photosensitive paste contains about 0.006 wt% to 0.2 wt% of one or more dopants among cerium (Ce), silver (Ag), gold (Au), and copper (Cu).

The photosensitive paste is placed in an open crucible under neutral to acidic conditions and heat treated at 1350 ° C. to 1400 ° C. for 3 to 4 hours to form crystallized photosensitive glass.

At this time, when the amount of the dopant contained in the photosensitive paste is extremely low, it is under reducing conditions.

If the reducing conditions are required, starch or ammonium chloride is added to form a crystallized photosensitive glass.

In addition, an oxidizing agent is added to make the oxidation condition.

The crystallized photosensitive glass will have a photosensitive property.

The crystallized photosensitive glass is broken and ground by ball milling to a powder.

Another method of preparing the powder is made by the preparation of a suitable composition of photosensitive glass.

When the crystallized photosensitive glass is placed in an oven and heat treated at 500 ° C. to 600 ° C., the crystallized photosensitive glass becomes a powder.

At this time, care should be taken to provide a correct electrochemical environment so that the photosensitive paste does not lose photosensitivity.

Therefore, the oxidizing agent, silver and lithium are ground to the powder and added in the form of salt.

When the photosensitive paste coated with a thickness of 100 μm on the lower insulating substrate 14 is baked at 590 ° C. to 620 ° C. for 1 hour (S102), as shown in FIG. 3, the photosensitive glass layer 20 is formed (S103). ).

Subsequently, when the fired photosensitive glass layer 20 is sufficiently cooled, the pattern mask 21 is mounted on the photosensitive glass layer 20 as shown in FIG. 4 (S104).

The pattern mask 21 is made of quartz.

In addition, the pattern mask 21 includes a metal thin film layer.

Subsequently, the photosensitive glass layer 20 exposed to ultraviolet rays is exposed (S105).

Next, as shown in FIG. 5, the pattern mask 21 is removed (S106).

Subsequently, the photosensitive glass layer 20 is heated and developed at 600 ° C. so as to crystallize the portion exposed to ultraviolet rays (S107).

Subsequently, the exposed portion, that is, the groove 22, is etched until the ideal depth is made (S108).

Thus, as shown in FIG. 5, a plurality of parallel partitions 16 and grooves 22 are formed on the lower insulating substrate 14 between the partitions 16 and 16.

In addition, the partition 16 and the groove 22 are formed on a portion of the lower substrate 14 by etching the inner surface of the lower substrate 14.

The lower substrate 14 includes an etchable glass material therein.

The partition 16 of the lower substrate 14 is made of a glass-ceramic composite, and a nucleating agent is added thereto.

The glass-ceramic consists of a photosensitive glass compound.

Thus, the partition 16 and groove 22 are produced from an etchable glass called glass ceramic with the addition of a nucleating agent suitable for selective crystallization.

The ceramic results from UV exposure and subsequent heat treatment of the substrate itself.

The ceramic can be etched 30 times faster than glass.

Here, the difference in the etching ratio makes the partition having a high aspect ratio when the lower insulating substrate 14 is made.

In addition, the lower insulating substrate 14 may be etched in a 5-10% weak acid HF solution for about 4-10 minutes or virtually all crystallized material may be etched until the partition 16 and groove 22 have an ideal depth. do.

The depth of the groove 22 is 50 µm to 150 µm, and the width is 50 µm to 200 µm.

Here, the depth of the groove 22 should be at least 120㎛, the width should be at least 100㎛.

6, the width | variety and height of the base 23 of the partition 16 have a high aspect ratio of 1: 3-1: 7.

In this case, the aspect ratio is 1: 5.

Plasma display panel and manufacturing method according to the present invention has the effect of reducing the overall process number and material cost by using the photosensitive glass.

In addition, there is an effect that can produce a plasma display panel of low cost and high resolution.

Claims (16)

An upper substrate and a lower substrate having electrode lines at a predetermined interval; Partition walls formed between the upper and lower substrates and formed of photosensitive glass to form one cell; And a groove between the barrier rib and the barrier rib. The method of claim 1, The photosensitive glass is a color plasma display panel, characterized in that the crystalline photosensitive paste. The method of claim 1, The photosensitive glass is a color plasma display panel, characterized in that the silicon oxide (SiO ₂ ), lithium oxide (Li ₂ O), aluminum oxide (Al ₂ O ₃ ) is a mixture of a predetermined ratio. The method of claim 1, The photosensitive glass is a color plasma display panel comprising one or more of cerium (Ce), silver (Ag), gold (Au), copper (Cu). The method of claim 1, And the partition wall has an aspect ratio of a base width and a height of the partition wall larger than 1: 3. The method of claim 1, The groove has a depth of 50 μm to 150 μm and a width of 50 μm to 200 μm. The method of claim 1, The lower substrate is a composite of glass-ceramic, and comprises at least one nucleating agent. The method of claim 1, And the lower substrate is made of an etchable glass material. The method of claim 3, wherein The photosensitive glass is a color plasma display panel, characterized in that the silicon oxide (SiO ₂ ) is mixed by about 73wt% to 82wt% of the total. The method of claim 3, wherein The photosensitive glass is a color plasma display panel, characterized in that the lithium oxide (Li ₂ O) is mixed by about 6wt% to 15wt%. The method of claim 3, wherein The photosensitive glass is a color plasma display panel, characterized in that the aluminum oxide (Al ₂ O ₃ ) is mixed by about 4wt% to 20wt%. The method of claim 4, wherein The photosensitive glass is a color plasma display panel, characterized in that by mixing one or more dopants of cerium (Ce), silver (Ag), gold (Au), copper (Cu) by 0.006wt% to 0.2wt%. The method of claim 5, And the aspect ratio of the partition wall is at least 1: 5. The method of claim 6, And wherein the groove has a depth of at least 120 μm and a width of at least 100 μm. The method of claim 7, wherein And wherein the glass-ceramic is made of a photosensitive glass compound. In the method for forming a color plasma display panel having an upper substrate and a lower substrate, Applying a photosensitive paste with a uniform thickness on the lower substrate; Baking the applied photosensitive paste to form a photosensitive glass layer; And removing the unnecessary portion of the photosensitive glass layer to form a partition wall.