KR102978018B1 - 임프린트 장치, 임프린트 방법, 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법, 및 물품 제조 방법

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Publication number
KR102978018B1
KR102978018B1 KR1020220184226A KR20220184226A KR102978018B1 KR 102978018 B1 KR102978018 B1 KR 102978018B1 KR 1020220184226 A KR1020220184226 A KR 1020220184226A KR 20220184226 A KR20220184226 A KR 20220184226A KR 102978018 B1 KR102978018 B1 KR 102978018B1
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KR
South Korea
Prior art keywords
substrate
imprint
imprint material
light irradiation
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
KR1020220184226A
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English (en)
Korean (ko)
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KR20230106507A (ko
Inventor
요스케 무라카미
가즈키 나카가와
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230106507A publication Critical patent/KR20230106507A/ko
Application granted granted Critical
Publication of KR102978018B1 publication Critical patent/KR102978018B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020220184226A 2022-01-06 2022-12-26 임프린트 장치, 임프린트 방법, 및 물품 제조 방법 Active KR102978018B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2022-001285 2022-01-06
JP2022001285A JP7716343B2 (ja) 2022-01-06 2022-01-06 インプリント装置、インプリント方法、および物品製造方法

Publications (2)

Publication Number Publication Date
KR20230106507A KR20230106507A (ko) 2023-07-13
KR102978018B1 true KR102978018B1 (ko) 2026-06-17

Family

ID=86991525

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220184226A Active KR102978018B1 (ko) 2022-01-06 2022-12-26 임프린트 장치, 임프린트 방법, 및 물품 제조 방법

Country Status (3)

Country Link
US (1) US11899362B2 (enExample)
JP (1) JP7716343B2 (enExample)
KR (1) KR102978018B1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3650937B1 (en) * 2018-11-08 2024-05-22 Canon Kabushiki Kaisha Imprint apparatus and product manufacturing method
JP7804454B2 (ja) * 2021-12-20 2026-01-22 キヤノン株式会社 インプリント方法、インプリント装置および物品製造方法
JP7826362B2 (ja) * 2024-04-19 2026-03-09 キヤノン株式会社 膜形成装置、膜形成方法、および物品の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060154179A1 (en) * 2005-01-07 2006-07-13 Asml Netherlands B. V. Imprint lithography
JP2012164809A (ja) * 2011-02-07 2012-08-30 Canon Inc インプリント装置、および、物品の製造方法
JP2016058735A (ja) * 2014-09-08 2016-04-21 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2019009226A (ja) 2017-06-22 2019-01-17 キヤノン株式会社 インプリント方法、インプリント装置、プログラム、および物品の製造方法
US20200150529A1 (en) 2018-11-08 2020-05-14 Canon Kabushiki Kaisha Imprint apparatus and product manufacturing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0955352A (ja) * 1995-08-16 1997-02-25 Sony Corp 露光装置および露光方法
JP2014229802A (ja) * 2013-05-23 2014-12-08 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、リソグラフィシステム、及び物品の製造方法
JP6869838B2 (ja) * 2017-07-14 2021-05-12 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP7337670B2 (ja) * 2019-11-15 2023-09-04 キヤノン株式会社 インプリント装置、インプリント方法、および、物品の製造方法
JP7403325B2 (ja) * 2020-01-20 2023-12-22 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP7466375B2 (ja) * 2020-05-19 2024-04-12 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
KR102751573B1 (ko) * 2021-08-27 2025-01-10 부산대학교 산학협력단 나노패턴 고분자 필름의 표면 경도 및 인성 제어 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060154179A1 (en) * 2005-01-07 2006-07-13 Asml Netherlands B. V. Imprint lithography
JP2012164809A (ja) * 2011-02-07 2012-08-30 Canon Inc インプリント装置、および、物品の製造方法
JP2016058735A (ja) * 2014-09-08 2016-04-21 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2019009226A (ja) 2017-06-22 2019-01-17 キヤノン株式会社 インプリント方法、インプリント装置、プログラム、および物品の製造方法
US20200150529A1 (en) 2018-11-08 2020-05-14 Canon Kabushiki Kaisha Imprint apparatus and product manufacturing method

Also Published As

Publication number Publication date
JP2023100536A (ja) 2023-07-19
US11899362B2 (en) 2024-02-13
US20230213854A1 (en) 2023-07-06
JP7716343B2 (ja) 2025-07-31
KR20230106507A (ko) 2023-07-13

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