KR102794655B1 - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

Info

Publication number
KR102794655B1
KR102794655B1 KR1020200115846A KR20200115846A KR102794655B1 KR 102794655 B1 KR102794655 B1 KR 102794655B1 KR 1020200115846 A KR1020200115846 A KR 1020200115846A KR 20200115846 A KR20200115846 A KR 20200115846A KR 102794655 B1 KR102794655 B1 KR 102794655B1
Authority
KR
South Korea
Prior art keywords
forming unit
mold
substrate
imprint
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020200115846A
Other languages
English (en)
Korean (ko)
Other versions
KR20210032907A (ko
Inventor
신이치 슈도
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20210032907A publication Critical patent/KR20210032907A/ko
Application granted granted Critical
Publication of KR102794655B1 publication Critical patent/KR102794655B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • H01L21/027—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020200115846A 2019-09-17 2020-09-10 임프린트 장치 및 물품 제조 방법 Active KR102794655B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019168731A JP7373334B2 (ja) 2019-09-17 2019-09-17 インプリント装置及び物品の製造方法
JPJP-P-2019-168731 2019-09-17

Publications (2)

Publication Number Publication Date
KR20210032907A KR20210032907A (ko) 2021-03-25
KR102794655B1 true KR102794655B1 (ko) 2025-04-15

Family

ID=74868501

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200115846A Active KR102794655B1 (ko) 2019-09-17 2020-09-10 임프린트 장치 및 물품 제조 방법

Country Status (3)

Country Link
US (2) US11454885B2 (https=)
JP (1) JP7373334B2 (https=)
KR (1) KR102794655B1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021027107A (ja) * 2019-08-01 2021-02-22 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP7373334B2 (ja) * 2019-09-17 2023-11-02 キヤノン株式会社 インプリント装置及び物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016201485A (ja) * 2015-04-13 2016-12-01 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2017157635A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2019071386A (ja) * 2017-10-11 2019-05-09 キヤノン株式会社 インプリント装置および物品製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017139452A (ja) * 2016-02-03 2017-08-10 キヤノン株式会社 インプリント装置および物品の製造方法
JP2017163039A (ja) * 2016-03-10 2017-09-14 キヤノン株式会社 インプリント装置、及び物品の製造方法
JP2021027107A (ja) 2019-08-01 2021-02-22 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP7373334B2 (ja) * 2019-09-17 2023-11-02 キヤノン株式会社 インプリント装置及び物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016201485A (ja) * 2015-04-13 2016-12-01 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2017157635A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2019071386A (ja) * 2017-10-11 2019-05-09 キヤノン株式会社 インプリント装置および物品製造方法

Also Published As

Publication number Publication date
JP7373334B2 (ja) 2023-11-02
KR20210032907A (ko) 2021-03-25
US20220397821A1 (en) 2022-12-15
US20210080827A1 (en) 2021-03-18
JP2021048192A (ja) 2021-03-25
US11454885B2 (en) 2022-09-27

Similar Documents

Publication Publication Date Title
US11426906B2 (en) Imprint apparatus, imprint method, and article manufacturing method
KR102728654B1 (ko) 성형 장치, 성형 방법 및 물품의 제조 방법
JP7210155B2 (ja) 装置、方法、および物品製造方法
KR102794655B1 (ko) 임프린트 장치 및 물품 제조 방법
US12332562B2 (en) Molding apparatus for molding composition on substrate using mold, molding method, and method for manufacturing article
US11822234B2 (en) Imprint apparatus, imprint method, and article manufacturing method
KR102724399B1 (ko) 임프린트 방법, 임프린트 장치, 및 물품의 제조 방법
KR102537179B1 (ko) 임프린트 장치, 임프린트 방법 및 물품의 제조 방법
KR20190040910A (ko) 임프린트 장치 및 물품 제조 방법
JP2025065992A (ja) 成形方法、成形装置、および物品製造方法
JP7441037B2 (ja) インプリント装置、情報処理装置、インプリント方法及び物品の製造方法
JP2020004798A (ja) インプリント装置、インプリント方法および、物品製造方法
US20240210820A1 (en) Imprint apparatus, imprint method and article manufacturing method
US12174531B2 (en) Imprint apparatus, imprint method, and method of manufacturing article
US20240359394A1 (en) Imprint apparatus, imprint method, method of manufacturing article, determination method, and non-transitory computer-readable storage medium
JP2019117844A (ja) モールド、レプリカモールド、インプリント装置、および物品製造方法
KR20180013732A (ko) 액체 충전 방법, 임프린트 방법 및 물품 제조 방법
JP2019036572A (ja) インプリント装置、インプリント方法および、物品製造方法
KR20250109155A (ko) 막 성형 방법, 막 성형 장치, 및 물품의 제조 방법
KR20190027911A (ko) 임프린트 장치 및 물품 제조 방법

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000