KR102586129B9 - 가스 분해를 위한 구조를 구비한 플라즈마 반응기 - Google Patents
가스 분해를 위한 구조를 구비한 플라즈마 반응기Info
- Publication number
- KR102586129B9 KR102586129B9 KR1020160081397A KR20160081397A KR102586129B9 KR 102586129 B9 KR102586129 B9 KR 102586129B9 KR 1020160081397 A KR1020160081397 A KR 1020160081397A KR 20160081397 A KR20160081397 A KR 20160081397A KR 102586129 B9 KR102586129 B9 KR 102586129B9
- Authority
- KR
- South Korea
- Prior art keywords
- reacator
- decompositon
- plasma
- gas
- plasma reacator
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160081397A KR102586129B1 (ko) | 2016-06-29 | 2016-06-29 | 가스 분해를 위한 구조를 구비한 플라즈마 반응기 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160081397A KR102586129B1 (ko) | 2016-06-29 | 2016-06-29 | 가스 분해를 위한 구조를 구비한 플라즈마 반응기 |
Publications (3)
Publication Number | Publication Date |
---|---|
KR20180002209A KR20180002209A (ko) | 2018-01-08 |
KR102586129B1 KR102586129B1 (ko) | 2023-10-10 |
KR102586129B9 true KR102586129B9 (ko) | 2024-01-16 |
Family
ID=61003508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160081397A KR102586129B1 (ko) | 2016-06-29 | 2016-06-29 | 가스 분해를 위한 구조를 구비한 플라즈마 반응기 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR102586129B1 (ko) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5257917B2 (ja) * | 2006-04-24 | 2013-08-07 | 株式会社ニューパワープラズマ | 多重マグネチックコアが結合された誘導結合プラズマ反応器 |
KR101170926B1 (ko) * | 2010-09-01 | 2012-08-03 | (주) 엔피홀딩스 | 플라즈마 방전을 위한 점화 장치가 장착된 플라즈마 반응기 |
KR101670296B1 (ko) * | 2014-10-28 | 2016-10-28 | 최도현 | 파티클 저감 구조를 갖는 플라즈마 챔버 |
-
2016
- 2016-06-29 KR KR1020160081397A patent/KR102586129B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20180002209A (ko) | 2018-01-08 |
KR102586129B1 (ko) | 2023-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
G170 | Re-publication after modification of scope of protection [patent] |