KR102504431B1 - Simultaneous removal apparatus for SOx and NOx - Google Patents

Simultaneous removal apparatus for SOx and NOx Download PDF

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KR102504431B1
KR102504431B1 KR1020200134913A KR20200134913A KR102504431B1 KR 102504431 B1 KR102504431 B1 KR 102504431B1 KR 1020200134913 A KR1020200134913 A KR 1020200134913A KR 20200134913 A KR20200134913 A KR 20200134913A KR 102504431 B1 KR102504431 B1 KR 102504431B1
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reaction chamber
exhaust gas
chemical liquid
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nitrogen oxides
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손경길
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주식회사 모아엔텍
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
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    • B01D53/60—Simultaneously removing sulfur oxides and nitrogen oxides
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B01D47/063—Spray cleaning with two or more jets impinging against each other
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
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    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
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    • Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
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Abstract

본 발명은 질소산화물 및 황산화물 동시제거 장치에 관한 것으로, 보다 구체적으로는 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버를 포함하여 이루어져, 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치에 관한 것이다. The present invention relates to a device for simultaneously removing nitrogen oxides and sulfur oxides, and more specifically, to a first reaction chamber into which exhaust gas is introduced and a first chemical solution is sprayed to perform an oxidation process, and the exhaust gas passing through the first reaction chamber is introduced, a second reaction chamber in which a neutralization process is performed by spraying a second chemical liquid, and a third reaction chamber in which an exhaust gas passing through the second reaction chamber is introduced and a third chemical liquid is sprayed to perform a reduction process. The present invention relates to a device for simultaneous removal of nitrogen oxides and sulfur oxides, capable of simultaneously removing nitrogen oxides and sulfur oxides, and capable of increasing removal efficiency.

Figure R1020200134913
Figure R1020200134913

Description

질소산화물 및 황산화물 동시제거 장치{Simultaneous removal apparatus for SOx and NOx}Simultaneous removal apparatus for SOx and NOx

본 발명은 질소산화물 및 황산화물 동시제거 장치에 관한 것으로, 보다 구체적으로는 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버를 포함하여 이루어져, 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치에 관한 것이다. The present invention relates to a device for simultaneously removing nitrogen oxides and sulfur oxides, and more specifically, to a first reaction chamber into which exhaust gas is introduced and a first chemical solution is sprayed to perform an oxidation process, and the exhaust gas passing through the first reaction chamber is introduced, a second reaction chamber in which a neutralization process is performed by spraying a second chemical liquid, and a third reaction chamber in which an exhaust gas passing through the second reaction chamber is introduced and a third chemical liquid is sprayed to perform a reduction process. The present invention relates to a device for simultaneous removal of nitrogen oxides and sulfur oxides, capable of simultaneously removing nitrogen oxides and sulfur oxides, and capable of increasing removal efficiency.

일반적으로 각종 발전소나 제철소 등에서는 화석연료 등의 연소에 따라 발생되는 배기가스의 유해 대기오염물질인 질소산화물과 황산화물을 처리하기 위하여 대형의 배기가스 처리장치가 사용된다.In general, in various power plants or steel mills, a large-scale exhaust gas treatment device is used to treat nitrogen oxides and sulfur oxides, which are harmful air pollutants of exhaust gas generated by combustion of fossil fuels.

이러한 배기가스 처리장치는 배기가스의 황산화물을 배연탈황장치(Flue Gas Desulfurization: FGD) 등으로 처리하고 배기가스의 질소산화물을 선택적 환원촉매장치(Selective Catalytic Reduction: SCR) 등으로 처리하게 된다.Such an exhaust gas treatment device treats sulfur oxides of exhaust gas with a flue gas desulfurization (FGD) or the like and treats nitrogen oxides of the exhaust gas with a selective catalytic reduction (SCR) or the like.

여기서, 상기 배연탈황장치는 연소 배기가스 속의 아황산가스(SO2)를 배연탈황법을 통해 제거하는 장치로서, 배연탈황법에는 알칼리 용액 및 금속 산화물 등에 SO2를 흡수시키거나 활성탄 등을 이용하여 SO2를 흡착 제거하는 방식이다. 또한, 상기 선택적 환원촉매장치는 요소용액 등을 산화제로 이용하여 촉매존재하에 질소산화물을 환원시켜 질소가스 등으로 정화처리하여 배출시키는 방식이다.Here, the flue gas desulfurization device is a device for removing sulfur dioxide (SO2) in combustion exhaust gas through a flue gas desulfurization method. way to remove it. In addition, the selective reduction catalyst device uses a urea solution or the like as an oxidizing agent to reduce nitrogen oxides in the presence of a catalyst to purify them with nitrogen gas and discharge them.

하지만, 상기 배연탈황장치와 선택적 환원촉매장치는 대량의 배기가스가 성격이 전혀 다른 탈황 및 탈질의 두 공정을 순차적으로 거치면서 배기가스에 포함된 오염물질을 처리함에 따라 초기 투자비 및 운전비가 상승하게 되고 탈질 및 탈황공정의 최적 공정결합이 요구될 뿐만 아니라, 배연탈황장치의 경우 전체적인 설비규모가 커지고 배압 증가 등의 문제로 인해 사용상에 불편함이 많으며, 선택적 환원촉매장치의 경우에는 400℃ 이상의 고온에서 작동하여 운전조건이 까다롭고 고가의 촉매를 이용해야 하기 때문에 시설비용이 과도하게 소모되는 문제점이 있었다.However, the flue gas desulfurization device and the selective catalyst reduction device increase the initial investment cost and operating cost as a large amount of exhaust gas sequentially undergoes two processes of desulfurization and denitrification, which have completely different characteristics, to treat pollutants contained in the exhaust gas. In the case of a flue gas desulfurization device, the overall scale of the facility increases and there are many inconveniences in use due to problems such as an increase in back pressure. Since the operation conditions are difficult and expensive catalysts must be used, the facility cost is excessively consumed.

또한, 종래의 배기가스 처리장치는 질소산화물과 황산화물의 동시 처리가 어려우며, 배기가스의 배출 유동성이 저하되면서 배기가스를 본체 외측으로 배출시키기 위한 에너지의 사용이 증대되는 문제점이 있었다. 또한, 종래의 배기가스 처리장치는 분사되는 약액과 배기가스의 접촉효율의 한계로 인해, 배기가스에 포함된 오염물질의 제거 효율이 떨어지는 문제점이 있었다.In addition, the conventional exhaust gas treatment apparatus has a problem in that it is difficult to simultaneously treat nitrogen oxides and sulfur oxides, and the use of energy for discharging the exhaust gas to the outside of the main body increases while the discharge fluidity of the exhaust gas is lowered. In addition, the conventional exhaust gas treatment apparatus has a problem in that the removal efficiency of pollutants included in the exhaust gas is lowered due to the limitation of the contact efficiency between the injected chemical liquid and the exhaust gas.

본 발명은 이러한 문제점을 해결하기 위해 안출된 것으로, 본 발명의 목적은 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치를 제공하기 위한 것이다.The present invention has been made to solve these problems, and an object of the present invention is to provide a device for simultaneous removal of nitrogen oxides and sulfur oxides, capable of simultaneously removing nitrogen oxides and sulfur oxides, and capable of increasing the removal efficiency. .

본 발명의 목적들은 이상에서 언급한 목적들로 제한되지 않으며, 언급되지 않은 또 다른 목적들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.The objects of the present invention are not limited to the objects mentioned above, and other objects not mentioned will be clearly understood by those skilled in the art from the description below.

상기의 목적을 달성하기 위하여 본 발명은 질소산화물 및 황산화물을 포함하는 배기가스가 유입되어 냉각되며, 배기가스에 함유된 미세먼지가 필터에 의해 제거되는 전처리 반응부; 상기 전처리 반응부를 통과하여 미세먼지가 제거된 배기가스가 하부에 형성된 제1 유입구를 통해 내부로 유입되며, 내부에 구비된 제1 약액 분사부에 의해 제1 약액이 분사되어 상기 제1 약액과 상기 배기가스의 산화공정이 진행되며, 상부에 형성된 제1 배출구를 통해 배기가스가 배출되는 제1 반응 챔버; 상기 제1 반응 챔버를 통과한 배기가스가 하부에 형성된 제2 유입구를 통해 유입되며, 내부에 구비된 제2 약액 분사부에 의해 제2 약액이 분사되어 중화공정이 진행되며, 상부에 형성된 제2 배출구를 통해 배기가스 배출되는 제2 반응 챔버; 상기 제2 반응 챔버를 통과한 배기가스가 하부에 형성된 제3 유입구를 통해 유입되며, 내부에 구비된 제3 약액 분사부에 의해 제3 약액이 분사되어 환원공정이 수행되며, 상부에 형성된 제3 배출구를 통해 질소산화물 및 황산화물이 제거된 배기가스가 배출되는 제3 반응 챔버;를 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치를 제공한다.In order to achieve the above object, the present invention provides a pretreatment reaction unit in which exhaust gas containing nitrogen oxides and sulfur oxides is introduced and cooled, and fine dust contained in the exhaust gas is removed by a filter; Exhaust gas from which fine dust has been removed through the pretreatment reaction unit is introduced into the interior through a first inlet formed at a lower portion, and a first chemical liquid is sprayed by a first liquid chemical spraying unit provided therein so that the first chemical liquid and the first chemical liquid are injected. A first reaction chamber in which an oxidation process of exhaust gas is performed and exhaust gas is discharged through a first outlet formed thereon; Exhaust gas that has passed through the first reaction chamber is introduced through a second inlet formed at the bottom, and a second chemical liquid is sprayed by a second chemical liquid injection unit provided therein to perform a neutralization process. A second reaction chamber through which the exhaust gas is discharged through the outlet; Exhaust gas passing through the second reaction chamber is introduced through a third inlet formed at the bottom, and a third chemical liquid is sprayed by a third chemical liquid injection unit provided therein to perform a reduction process. It provides an apparatus for simultaneously removing nitrogen oxides and sulfur oxides, characterized in that it comprises a; third reaction chamber through which the exhaust gas from which nitrogen oxides and sulfur oxides are removed is discharged through the outlet.

바람직한 실시예에 있어서, 상기 제1 약액은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되고, 상기 제2 약액은 수산화 나트륨(NaOH)이 이용되며, 상기 제3 약액은 아황산 나트륨(Na2SO3)이 이용된다.In a preferred embodiment, the first chemical solution is sodium hypochlorite (NaClO), sodium chlorite (NaClO2) or sodium chlorate (NaClO3) is used, the second chemical solution is sodium hydroxide (NaOH) is used, the 3 Sodium sulfite (Na2SO3) is used as the chemical solution.

바람직한 실시예에 있어서, 상기 제1 약액 분사부, 상기 제2 약액 분사부 및 상기 제3 약액 분사부는 각 상기 반응 챔버 내부에서 상하방향으로 다단으로 구비된다.In a preferred embodiment, the first chemical spraying part, the second chemical spraying part, and the third chemical liquid spraying part are provided in multiple stages in a vertical direction inside the reaction chamber.

바람직한 실시예에 있어서, 상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는 상하방향으로 이웃하는 약액 분사부 사이와 약액 분사부와 유입구 사이에 설치되어, 배기 가스와 약액과의 반응시간을 증대시키는 폴링;을 더 포함한다.In a preferred embodiment, the first reaction chamber, the second reaction chamber, and the third reaction chamber are installed between the chemical liquid injection parts and between the chemical liquid injection parts and the inlet, which are adjacent in the vertical direction, so that the exhaust gas and the chemical liquid are not separated. Polling to increase the reaction time; further includes.

바람직한 실시예에 있어서, 상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는 각 배출구의 하부에 설치되어, 외부로 수분이 배출되는 것을 방지하는 데미스터를 더 포함한다.In a preferred embodiment, the first reaction chamber, the second reaction chamber, and the third reaction chamber further include a demister installed at a lower portion of each discharge port to prevent moisture from being discharged to the outside.

바람직한 실시예에 있어서, 상기 제2 반응챔버 또는 상기 제3 반응챔버는 다수개의 관통홀이 형성된 플레이트 형상으로, 유입구의 상부에 설치되는 다공 플레이트; 및 상기 다공 플레이트 상에 설치되어, 상방으로 와류를 형성하는 교반 수단;을 더 포함한다.In a preferred embodiment, the second reaction chamber or the third reaction chamber has a plate shape in which a plurality of through holes are formed, and includes a perforated plate installed on an upper portion of the inlet; and a stirring means installed on the perforated plate to form a vortex upward.

본 발명은 다음과 같은 우수한 효과를 가진다.The present invention has the following excellent effects.

본 발명의 질소산화물 및 황산화물 동시제거 장치에 의하면, 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버에 의해 NOx 및 SOx의 동시제거가 가능한 효과가 있다.According to the device for simultaneous removal of nitrogen oxides and sulfur oxides of the present invention, exhaust gas is introduced, a first reaction chamber in which a first liquid chemical is injected and an oxidation process is performed, and exhaust gas passing through the first reaction chamber is introduced, A second reaction chamber in which 2 chemical liquids are sprayed to perform a neutralization process and an exhaust gas passing through the second reaction chamber is introduced, and a third reaction chamber in which a third chemical liquid is sprayed to perform a reduction process simultaneously generates NOx and SOx There is an effect that can be removed.

또한, 본 발명의 질소산화물 및 황산화물 동시제거 장치에 의하면, 다공플레이트, 교반수단 및 폴링수단에 의해 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시킴으로써, 제거효율을 증대시킬 수 있고, 처리 약액의 사용량을 감소시킬 수 있는 장점을 지닌다.In addition, according to the simultaneous removal of nitrogen oxides and sulfur oxides of the present invention, the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber is increased by the perforated plate, the stirring means, and the polling means, thereby increasing the efficiency of contact with the chemical liquid. By increasing the, it is possible to increase the removal efficiency, and has the advantage of reducing the amount of treatment chemicals.

도 1은 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치를 설명하기 위한 모식도이다.
도 2는 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치의 스풀을 설명하기 위한 도면이다.1 is a schematic diagram for explaining an apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to the present invention.
Figure 2 is a view for explaining the spool of the simultaneous removal of nitrogen oxides and sulfur oxides according to the present invention.

본 발명에서 사용되는 용어는 가능한 현재 널리 사용되는 일반적인 용어를 선택하였으나, 특정한 경우는 출원인이 임의로 선정한 용어도 있는데 이 경우에는 단순한 용어의 명칭이 아닌 발명의 상세한 설명 부분에 기재되거나 사용된 의미를 고려하여 그 의미가 파악되어야 할 것이다.The terms used in the present invention have been selected from general terms that are currently widely used as much as possible, but in certain cases, there are terms arbitrarily selected by the applicant. Therefore, its meaning should be understood.

이하, 첨부한 도면에 도시된 바람직한 실시예들을 참조하여 본 발명의 기술적 구성을 상세하게 설명한다.Hereinafter, the technical configuration of the present invention will be described in detail with reference to preferred embodiments shown in the accompanying drawings.

그러나, 본 발명은 여기서 설명되는 실시예에 한정되지 않고 다른 형태로 구체화 될 수도 있다. 명세서 전체에 걸쳐 동일한 참조번호는 동일한 구성요소를 나타낸다.However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Like reference numbers indicate like elements throughout the specification.

도 1은 본 발명의 일 실시예에 따른 질소산화물 및 황산화물 동시제거 장치를 설명하기 위한 도면이다.1 is a view for explaining an apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention.

도 1을 참조하면, 본 발명의 일 실시예에 따른 질소산화물 및 황산화물 동시제거 장치는 배기가스에 함유된 질소산화물과 황산화물을 동시에 처리하기 위한 장치로, 전처리 반응부(110), 제1 반응 챔버(120), 제2 반응 챔버(130) 및 제3 반응 챔버(140)를 포함하여 이루어진다.Referring to FIG. 1, an apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention is a device for simultaneously treating nitrogen oxides and sulfur oxides contained in exhaust gas, and includes a pretreatment reaction unit 110, a first It comprises a reaction chamber 120, a second reaction chamber 130 and a third reaction chamber 140.

상기 전처리 반응부(110)는 상부를 통해 질소산화물 및 황산화물을 포함하는 배기가스(g)가 유입되어 소정 온도로 냉각되며, 중앙부에 구비된 필터를 통과화면서 배기가스에 함유된 미세먼지가 제거된다.Exhaust gas (g) containing nitrogen oxides and sulfur oxides is introduced through the upper portion of the pretreatment reactor 110 and cooled to a predetermined temperature, and fine dust contained in the exhaust gas is removed while passing through a filter provided in the central portion. Removed.

상기 제1 반응 챔버(120)는 배기가스(g)의 산화공정이 수행되는 챔버로, 하부에는 제1 유입구(121)가 형성되고, 내부에는 제1 약액 분사부(122)가 구비되며, 상부에는 제1 배출구(123)가 형성된다.The first reaction chamber 120 is a chamber in which an oxidation process of exhaust gas (g) is performed, a first inlet 121 is formed at the lower part, a first chemical liquid spraying part 122 is provided inside, and an upper part A first outlet 123 is formed.

또한, 상기 제1 약액 분사부(122)는 복수개로 구비되며, 이웃하는 제1 약액 분사부(122)들과의 간격이 서로 동일하게 마련될 수 있다.In addition, a plurality of first chemical liquid spraying parts 122 may be provided, and the distances from neighboring first chemical liquid spraying parts 122 may be equal to each other.

또한, 상기 제1 약액 분사부(122)는 상하방향으로 다단을 이루도록 구비될 수 있다.In addition, the first liquid chemical spraying unit 122 may be provided in multiple stages in the vertical direction.

다시 말하면, 상기 제1 약액 분사부(122) 다수개가 서로 동일한 높이로 설치되어 하나의 단을 이루며, 적어도 두 개의 단이 상하방향으로 배치될 수 있다.In other words, a plurality of the first liquid chemical spraying parts 122 are installed at the same height to form one stage, and at least two stages may be arranged in a vertical direction.

이에 따라, 상기 제1 반응 챔버(120)에서는, 상기 전처리 반응부(110)를 통과한 배기가스(g)가 하부에 형성된 상기 제1 유입구(121)를 통해 내부로 유입되며, 상기 제1 약액 분사부(122)에 의해 분사되는 제1 약액(a)에 의해 상기 배기가스(g)의 산화공정이 진행되며, 상부에 형성된 상기 제1 배출구(123)을 통해 배기가스(g)가 배출된다.Accordingly, in the first reaction chamber 120, the exhaust gas (g) passing through the pretreatment reaction unit 110 is introduced into the inside through the first inlet 121 formed at the bottom, and the first liquid chemical The oxidation process of the exhaust gas (g) is progressed by the first liquid chemical (a) sprayed by the injection unit 122, and the exhaust gas (g) is discharged through the first outlet 123 formed at the top. .

또한, 상기 제1 약액(a)은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되는 것이 바람직하다.In addition, it is preferable that sodium hypochlorite (NaClO), sodium chlorite (NaClO2), or sodium chlorate (NaClO3) is used for the first chemical solution (a).

이에 따라, 상기 제1 반응 챔버(120)는 하기에 기재된 반응식들을 통해 산화공정이 수행될 수 있다.Accordingly, an oxidation process may be performed in the first reaction chamber 120 through the reaction equations described below.

(반응식 1-1) : NO + NaClO → NaCl + NO2 (Scheme 1-1): NO + NaClO → NaCl + NO 2

(반응식 1-2) : 2NO + NaClO2 → NaCl + 2NO2 (Scheme 1-2): 2NO + NaClO 2 → NaCl + 2NO 2

(반응식 1-3) : 3NO + NaClO3 → NaCl + 3NO2 (Scheme 1-3): 3NO + NaClO 3 → NaCl + 3NO 2

(반응식 1-4) : NO2 + OH- → HNO3 (Scheme 1-4): NO 2 + OH - → HNO 3

(반응식 1-5) : SO2 + NaOCl → Na2SO4 + NaCl(Scheme 1-5): SO 2 + NaOCl → Na 2 SO 4 + NaCl

또한, 상기 제1 반응 챔버(120)는 제1 폴링(124)과 제1 데미스터(125)가 더 구비될 수 있다.In addition, the first reaction chamber 120 may further include a first polling 124 and a first demister 125 .

여기서, 상기 제1 폴링(124)은 도 2 (a)에 도시된 바와 같이 금속재질로 마련되거나, 도 2 (b)에 도시된 바와 같이, 합성수지 재질로 마련될 수 있다.Here, the first polling 124 may be made of a metal material as shown in FIG. 2 (a) or made of a synthetic resin material as shown in FIG. 2 (b).

또한, 상기 제1 폴링(124)은 상하 방향으로 이웃하는 약액 분사부(122)들 사이 및 상기 약액 분사부(122)와 상기 제1 유입구(121) 사이에 설치된다.In addition, the first polling 124 is installed between the chemical liquid spraying parts 122 neighboring in the vertical direction and between the chemical liquid spraying parts 122 and the first inlet 121 .

또한, 상기 제1 폴링(124)은 양단이 개방된 원통형상으로, 측면에 다수개의 관통홀이 형성되고, 상부 또는 하부에 십자형상의 격벽이 설치되는 구조로 마련될 수 있으며, 상기 제1 폴링(124)의 상향으로 이동되는 배기가스(g)의 체류시간을 늘림으로써, 상기 제1 폴링(124)에 묻은 제1 약액(a)에 의해 반응되는 반응시간을 증가시켜, 정화 반응 효율을 향상시키킬 수 있게 한다.In addition, the first polling 124 may have a cylindrical shape with both ends open, a plurality of through holes formed on the side surface, and a cross-shaped bulkhead installed at the top or bottom, and the first polling ( 124) by increasing the residence time of the exhaust gas (g) moving upward, thereby increasing the reaction time reacted by the first chemical liquid (a) deposited on the first polling 124, thereby improving the purification reaction efficiency. make it possible to kill

또한, 상기 제1 데미스터(125)는 상기 제1 배출구(123)의 하부 위치에 설치되어, 외부로 수분이 배출되는 것을 방지하는 역할을 한다.In addition, the first demister 125 is installed at a lower position of the first outlet 123 to prevent moisture from being discharged to the outside.

상기 제2 반응 챔버(130)는 배기가스(g)의 중화공정이 수행되는 챔버로, 하부에는 제2 유입구(131)가 형성되고, 내부에는 제2 약액 분사부(132)가 구비되며, 상부에는 제2 배출구(133)가 형성된다.The second reaction chamber 130 is a chamber in which the neutralization process of the exhaust gas (g) is performed, a second inlet 131 is formed in the lower part, a second chemical solution spraying part 132 is provided in the upper part, A second outlet 133 is formed.

이때, 상기 제2 약액 분사부(132)는 상기 제1 약액 분사부(122)와 동일한 형태로 복수개로 구비되고, 이웃하는 제2 약액 분사부(132)들과의 간격은 서로 동일하게 마련되며, 상기 제2 약액 분사부(132)는 상하방향으로 다단을 이루도록 구비될 수 있다.At this time, the second chemical liquid spraying part 132 is provided in a plurality in the same shape as the first chemical liquid spraying part 122, and the distance between neighboring second chemical liquid spraying parts 132 is the same. , The second liquid chemical injection unit 132 may be provided to form multiple stages in the vertical direction.

이에 따라, 상기 제2 반응 챔버(130)에서는, 상기 제1 반응 챔버(120)를 통과한 배기가스(g)가 하부에 형성된 상기 제2 유입구(131)를 통해 내부로 유입되며, 상기 제2 약액 분사부(132)에 의해 제2 약액(b)이 분사되어, 상기 배기가스(g)의 중화공정이 진행되며, 상부에 형성된 상기 제2 배출구(133)을 통해 배기가스(g)가 배출된다.Accordingly, in the second reaction chamber 130, the exhaust gas (g) passing through the first reaction chamber 120 is introduced into the inside through the second inlet 131 formed at the bottom, and the second The second chemical liquid (b) is injected by the chemical liquid spraying unit 132, the neutralization process of the exhaust gas (g) is performed, and the exhaust gas (g) is discharged through the second outlet 133 formed at the top. do.

또한, 상기 제2 약액(b)은 수산화 나트륨(NaOH)이 이용되는 것이 바람직하다.In addition, it is preferable that sodium hydroxide (NaOH) is used as the second chemical solution (b).

이에 따라, 상기 제2 반응 챔버(130)는 하기에 기재된 반응식들을 통해 환원공정이 수행된다.Accordingly, the reduction process is performed in the second reaction chamber 130 through the reaction equations described below.

(반응식 2-1) : 2NO2 + 2NaOH → NaNO2 + NaNO3 + H2O(Scheme 2-1): 2NO 2 + 2NaOH → NaNO 2 + NaNO 3 + H 2 O

(반응식 2-2) : NO + NO2 → N2O3 (Scheme 2-2): NO + NO 2 → N 2 O 3

(반응식 2-3) : N2O3 + 2NaOH → 2NaNO2 + H2O(Scheme 2-3): N 2 O 3 + 2NaOH → 2NaNO 2 + H 2 O

(반응식 2-4) : HNO3 + NaOH → NaNO3 + H2O(Scheme 2-4): HNO 3 + NaOH → NaNO 3 + H 2 O

(반응식 2-5) : SO2 + 2NaOH → Na2SO3 + H2O(Scheme 2-5): SO 2 + 2NaOH → Na 2 SO 3 + H 2 O

또한, 상기 제2 반응 챔버(130)는 제2 폴링(134)과 제2 데미스터(135)가 더 구비될 수 있다.In addition, the second reaction chamber 130 may further include a second polling 134 and a second demister 135 .

여기서, 상기 제2 폴링(134)과 상기 제2 데미스터(135)는 상기 제1 반응챔버(120)의 제1 폴링(124) 및 제1 데미스터(124)와 동일한 구성이므로, 중복되는 설명은 생략하기로 한다.Here, since the second polling 134 and the second demister 135 have the same configuration as the first polling 124 and the first demister 124 of the first reaction chamber 120, overlapping descriptions are given. will be omitted.

또한, 상기 제2 반응 챔버(130)는 제1 다공 플레이트(136)와 제1 교반 수단(137)이 더 구비될 수 있다.In addition, the second reaction chamber 130 may further include a first porous plate 136 and a first stirring unit 137 .

여기서, 상기 제1 다공 플레이트(136)는 다수개의 관통홀이 형성된 플레이트 형상으로, 상기 제2 유입구(131)와 상기 제2 폴링(134)의 사이에 설치되며, 상기 제1 교반 수단(137)은 상기 제1 다공 플레이트(136)상에 설치되어, 상방으로 와류를 형성함으로써, 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시키는 역할을 한다.Here, the first porous plate 136 has a plate shape having a plurality of through holes, and is installed between the second inlet 131 and the second polling 134, and the first stirring means 137 is installed on the first perforated plate 136 to form a vortex upward, thereby increasing the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber to increase the contact efficiency with the chemical solution. do.

상기 제3 반응 챔버(140)는 배기가스(g)의 환원공정이 수행되는 챔버로, 하부에는 제3 유입구(141)가 형성되고, 내부에는 제3 약액 분사부(142)가 구비되며, 상부에는 제3 배출구(143)가 형성된다.The third reaction chamber 140 is a chamber in which a reduction process of exhaust gas (g) is performed, a third inlet 141 is formed at the lower part, a third liquid chemical spraying part 142 is provided inside, and an upper part A third outlet 143 is formed.

이때, 상기 제3 약액 분사부(142)는 상기 제1 약액 분사부(122) 및 상기 제2 약액 분사부(132)와 동일한 형태로 구비되는데, 보다 상세하게는 이웃하는 제3 약액 분사부(142)들과의 간격은 서로 동일하게 마련되며, 상기 제3 약액 분사부(142)는 상하방향으로 다단을 이루도록 구비될 수 있다.At this time, the third chemical liquid spraying unit 142 is provided in the same shape as the first chemical liquid spraying unit 122 and the second chemical liquid spraying unit 132, and more specifically, the neighboring third chemical liquid spraying units ( 142) are provided the same distance from each other, and the third liquid chemical injection unit 142 may be provided to form multiple stages in the vertical direction.

이에 따라, 상기 제3 반응 챔버(140)에서는, 상기 제2 반응 챔버(130)를 통과한 배기가스(g)가 하부에 형성된 상기 제3 유입구(141)를 통해 내부로 유입되며, 상기 제3 약액 분사부(142)에 의해 제3 약액(c)이 분사되어, 상기 배기가스(g)의 환원공정이 진행되며, 상부에 형성된 상기 제3 배출구(143)을 통해 질소산화물 및 황산화물이 제거된 배기가스(g)가 배출된다.Accordingly, in the third reaction chamber 140, the exhaust gas (g) passing through the second reaction chamber 130 is introduced into the inside through the third inlet 141 formed at the bottom, and the third A third chemical liquid (c) is injected by the chemical liquid spraying unit 142, the reduction process of the exhaust gas (g) proceeds, and nitrogen oxides and sulfur oxides are removed through the third outlet 143 formed at the top. exhaust gas (g) is discharged.

또한, 상기 제3 약액(c)은 아황산 나트륨(Na2SO3)이 이용되는 것이 바람직하다.In addition, it is preferable that sodium sulfite (Na2SO3) is used as the third chemical solution (c).

이에 따라, 상기 제3 반응 챔버(140)는 하기에 기재된 반응식들을 통해 환원공정이 수행된다.Accordingly, the reduction process is performed in the third reaction chamber 140 through the reaction equations described below.

(반응식 3-1) : 2NO2 + Na2S → N2 + Na2S2O3 (Scheme 3-1): 2NO 2 + Na 2 S → N 2 + Na 2 S 2 O 3

(반응식 3-2) : Na2S2O3 + 2NaOH + 2O2 → 2Na2SO4 + H2O (Scheme 3-2): Na 2 S 2 O 3 + 2NaOH + 2O 2 → 2Na 2 SO 4 + H 2 O

(반응식 3-3) : 4NO2 + 2Na2SO3 → 2N2 + 2Na2SO4 + 3O2 (Scheme 3-3): 4NO 2 + 2Na 2 SO 3 → 2N 2 + 2Na 2 SO 4 + 3O 2

(반응식 3-4) : 4NO + 2Na2SO3 → 2N2 + 2Na2SO4 + O2 (Scheme 3-4): 4NO + 2Na 2 SO 3 → 2N 2 + 2Na 2 SO 4 + O 2

또한, 상기 제3 반응 챔버(140)는 제3 폴링(144)과 제3 데미스터(145)가 더 구비될 수 있는데, 여기서, 상기 제3 폴링(144)과 상기 제3 데미스터(145)는 상기 제1 반응챔버(120)의 제1 폴링(124) 및 제1 데미스터(124)와 서로 동일한 구성이므로, 중복되는 설명은 생략하기로 한다.In addition, the third reaction chamber 140 may further include a third polling 144 and a third demister 145, wherein the third polling 144 and the third demister 145 Since is the same configuration as the first polling 124 and the first demister 124 of the first reaction chamber 120, overlapping descriptions will be omitted.

또한, 상기 제3 반응 챔버(140)는 제2 다공 플레이트(146)와 제2 교반 수단(147)이 더 구비될 수 있다.In addition, the third reaction chamber 140 may further include a second porous plate 146 and a second stirring means 147.

여기서, 상기 제2 다공 플레이트(146)는 다수개의 관통홀이 형성된 플레이트 형상으로, 상기 제3 유입구(141)의 상부에 설치되며, 상기 제2 교반 수단(147)은 상기 제2 다공 플레이트(146)상에 설치되어, 상방으로 와류를 형성함으로써, 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시키는 역할을 한다.Here, the second porous plate 146 has a plate shape in which a plurality of through holes are formed, and is installed above the third inlet 141, and the second stirring means 147 is the second porous plate 146 ), it serves to increase the contact efficiency with the chemical liquid by increasing the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber by forming a vortex upward.

상술한 바와 같이, 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치에 의하면, 질소산화물 및 황산화물이 함유된 배기가스를 산화, 중화, 환원 처리함으로써, NOx 및 SOx의 동시제거가 가능하며, 다공플레이트, 교반수단 및 폴링수단에 의해 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시킴으로써, 제거효율을 증대시킬 수 있고, 처리 약액의 사용량을 감소시킬 수 있는 장점을 지닌다.As described above, according to the simultaneous removal of nitrogen oxides and sulfur oxides according to the present invention, simultaneous removal of NOx and SOx is possible by oxidizing, neutralizing, and reducing the exhaust gas containing nitrogen oxides and sulfur oxides, and By increasing the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber by the plate, the stirring means, and the polling means, the contact efficiency with the chemical solution is increased, thereby increasing the removal efficiency and reducing the amount of the treatment chemical solution. has the potential to reduce

이상에서 살펴본 바와 같이 본 발명은 바람직한 실시예를 들어 도시하고 설명하였으나, 상기한 실시예에 한정되지 아니하며 본 발명의 정신을 벗어나지 않는 범위 내에서 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자에 의해 다양한 변경과 수정이 가능할 것이다.As described above, the present invention has been shown and described with preferred embodiments, but is not limited to the above embodiments, and to those skilled in the art within the scope of not departing from the spirit of the present invention Various changes and modifications will be possible.

110 : 전처리 반응부
120 : 제1 반응 챔버 121 : 제1 유입구
122 : 제1 약액 분사부 123 : 제1 배출구
124 : 제1 폴링 125 : 제1 데미스터
130 : 제2 반응 챔버 131 : 제2 유입구
132 : 제2 약액 분사부 133 : 제2 배출구
134 : 제2 폴링 135 : 제2 데미스터
136 : 제1 다공 플레이트 137 : 제1 교반수단
140 : 제3 반응 챔버 141 : 제3 유입구
142 : 제3 약액 분사부 143 : 제3 배출구
144 : 제3 폴링 145 : 제3 데미스터
146 : 제2 다공 플레이트 147 : 제2 교반수단110: pretreatment reaction unit
120: first reaction chamber 121: first inlet
122: first liquid injection unit 123: first outlet
124: first polling 125: first demister
130: second reaction chamber 131: second inlet
132: second chemical injection unit 133: second outlet
134: second polling 135: second demister
136: first perforated plate 137: first stirring means
140: third reaction chamber 141: third inlet
142: third chemical injection unit 143: third outlet
144: third polling 145: third demister
146: second perforated plate 147: second stirring means

Claims (6)

질소산화물 및 황산화물을 포함하는 배기가스가 유입되어 냉각되며, 배기가스에 함유된 미세먼지가 필터에 의해 제거되는 전처리 반응부;
상기 전처리 반응부를 통과하여 미세먼지가 제거된 배기가스가 하부에 형성된 제1 유입구를 통해 내부로 유입되며, 내부에 구비된 제1 약액 분사부에 의해 제1 약액이 분사되어 상기 제1 약액과 상기 배기가스의 산화공정이 진행되며, 상부에 형성된 제1 배출구를 통해 배기가스가 배출되는 제1 반응 챔버;
상기 제1 반응 챔버를 통과한 배기가스가 하부에 형성된 제2 유입구를 통해 유입되며, 내부에 구비된 제2 약액 분사부에 의해 제2 약액이 분사되어 중화공정이 진행되며, 상부에 형성된 제2 배출구를 통해 배기가스가 배출되는 제2 반응 챔버;
상기 제2 반응 챔버를 통과한 배기가스가 하부에 형성된 제3 유입구를 통해 유입되며, 내부에 구비된 제3 약액 분사부에 의해 제3 약액이 분사되어 환원공정이 수행되며, 상부에 형성된 제3 배출구를 통해 질소산화물 및 황산화물이 제거된 배기가스가 배출되는 제3 반응 챔버;를 포함하고,
상기 제1 약액은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되고, 상기 제2 약액은 수산화 나트륨(NaOH)이 이용되며, 상기 제3 약액은 아황산 나트륨(Na2SO3)이 이용되는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
a pretreatment reactor in which exhaust gas containing nitrogen oxides and sulfur oxides is introduced and cooled, and fine dust contained in the exhaust gas is removed by a filter;
Exhaust gas from which fine dust has been removed through the pretreatment reaction unit is introduced into the interior through a first inlet formed at a lower portion, and a first chemical liquid is sprayed by a first liquid chemical spraying unit provided therein so that the first chemical liquid and the first chemical liquid are injected. A first reaction chamber in which an oxidation process of exhaust gas is performed and exhaust gas is discharged through a first outlet formed thereon;
Exhaust gas that has passed through the first reaction chamber is introduced through a second inlet formed at the bottom, and a second chemical liquid is sprayed by a second chemical liquid injection unit provided therein to perform a neutralization process. A second reaction chamber through which the exhaust gas is discharged through the outlet;
Exhaust gas passing through the second reaction chamber is introduced through a third inlet formed at the bottom, and a third chemical liquid is sprayed by a third chemical liquid injection unit provided therein to perform a reduction process. A third reaction chamber through which exhaust gas from which nitrogen oxides and sulfur oxides are removed is discharged through an outlet;
The first chemical solution is sodium hypochlorite (NaClO), sodium chlorite (NaClO2) or sodium chlorate (NaClO3), the second chemical solution is sodium hydroxide (NaOH), and the third chemical solution is sodium sulfite ( Nitrogen oxide and sulfur oxide simultaneous removal device, characterized in that Na2SO3) is used.
 삭제delete 제 1항에 있어서,
상기 제1 약액 분사부, 상기 제2 약액 분사부 및 상기 제3 약액 분사부는
각 반응 챔버 내부에서 상하방향으로 다단으로 구비되는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
According to claim 1,
The first chemical spraying unit, the second chemical spraying unit, and the third chemical spraying unit
An apparatus for simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that it is provided in multiple stages in the vertical direction inside each reaction chamber.
 제 3항에 있어서,
상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는
상하방향으로 이웃하는 약액 분사부 사이와 약액 분사부와 유입구 사이에 설치되어, 배기 가스와 약액과의 반응시간을 증대시키는 폴링;을 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
According to claim 3,
The first reaction chamber, the second reaction chamber and the third reaction chamber
An apparatus for simultaneously removing nitrogen oxides and sulfur oxides, characterized in that it further comprises: polling installed between chemical liquid spraying units adjacent to each other in the vertical direction and between the chemical liquid spraying unit and the inlet to increase a reaction time between exhaust gas and chemical liquid.
 제 1항에 있어서,
상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는
각 배출구의 하부에 설치되어, 외부로 수분이 배출되는 것을 방지하는 데미스터를 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
According to claim 1,
The first reaction chamber, the second reaction chamber and the third reaction chamber
An apparatus for simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that it further comprises a demister installed at the bottom of each outlet to prevent water from being discharged to the outside.
 제 1항에 있어서,
상기 제2 반응챔버 또는 상기 제3 반응챔버는
다수개의 관통홀이 형성된 플레이트 형상으로, 유입구의 상부에 설치되는 다공 플레이트; 및
상기 다공 플레이트 상에 설치되어, 상방으로 와류를 형성하는 교반 수단;을 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
According to claim 1,
The second reaction chamber or the third reaction chamber
A plate shape having a plurality of through holes formed therein, a perforated plate installed on top of the inlet; and
An apparatus for simultaneously removing nitrogen oxides and sulfur oxides, characterized in that it further comprises; stirring means installed on the perforated plate to form a vortex upward.
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