KR20220051467A - Simultaneous removal apparatus for SOx and NOx - Google Patents

Simultaneous removal apparatus for SOx and NOx Download PDF

Info

Publication number
KR20220051467A
KR20220051467A KR1020200134913A KR20200134913A KR20220051467A KR 20220051467 A KR20220051467 A KR 20220051467A KR 1020200134913 A KR1020200134913 A KR 1020200134913A KR 20200134913 A KR20200134913 A KR 20200134913A KR 20220051467 A KR20220051467 A KR 20220051467A
Authority
KR
South Korea
Prior art keywords
reaction chamber
exhaust gas
chemical
chemical solution
nitrogen oxides
Prior art date
Application number
KR1020200134913A
Other languages
Korean (ko)
Other versions
KR102504431B1 (en
Inventor
손경길
Original Assignee
주식회사 모아엔텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 모아엔텍 filed Critical 주식회사 모아엔텍
Priority to KR1020200134913A priority Critical patent/KR102504431B1/en
Priority to PCT/KR2020/016841 priority patent/WO2022085852A1/en
Publication of KR20220051467A publication Critical patent/KR20220051467A/en
Application granted granted Critical
Publication of KR102504431B1 publication Critical patent/KR102504431B1/en

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/60—Simultaneously removing sulfur oxides and nitrogen oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B01D47/063—Spray cleaning with two or more jets impinging against each other
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/12—Washers with plural different washing sections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/14—Packed scrubbers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/79—Injecting reactants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/10—Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Treating Waste Gases (AREA)

Abstract

본 발명은 질소산화물 및 황산화물 동시제거 장치에 관한 것으로, 보다 구체적으로는 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버를 포함하여 이루어져, 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치에 관한 것이다. The present invention relates to a device for simultaneous removal of nitrogen oxides and sulfur oxides, and more particularly, the exhaust gas that has passed through the first reaction chamber and the first reaction chamber in which the exhaust gas is introduced, the first chemical is sprayed and the oxidation process is performed. is introduced, a second reaction chamber in which a neutralization process is performed by spraying a second chemical solution, and an exhaust gas passing through the second reaction chamber is introduced, and a third reaction chamber in which a reduction process is performed by spraying a third chemical solution. By doing so, it is possible to simultaneously remove nitrogen oxides and sulfur oxides, and it relates to a nitrogen oxide and sulfur oxide simultaneous removal device capable of increasing the removal efficiency.

Figure P1020200134913
Figure P1020200134913

Description

질소산화물 및 황산화물 동시제거 장치{Simultaneous removal apparatus for SOx and NOx}Simultaneous removal apparatus for SOx and NOx

본 발명은 질소산화물 및 황산화물 동시제거 장치에 관한 것으로, 보다 구체적으로는 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버를 포함하여 이루어져, 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치에 관한 것이다. The present invention relates to a device for simultaneous removal of nitrogen oxides and sulfur oxides, and more particularly, the exhaust gas that has passed through the first reaction chamber and the first reaction chamber in which the exhaust gas is introduced, the first chemical is sprayed and the oxidation process is performed. is introduced, a second reaction chamber in which a second chemical solution is injected to perform a neutralization process, and an exhaust gas that has passed through the second reaction chamber is introduced, and a third reaction chamber in which a third chemical solution is injected and a reduction process is performed. By doing so, it is possible to simultaneously remove nitrogen oxides and sulfur oxides, and it relates to a nitrogen oxide and sulfur oxide simultaneous removal device capable of increasing the removal efficiency.

일반적으로 각종 발전소나 제철소 등에서는 화석연료 등의 연소에 따라 발생되는 배기가스의 유해 대기오염물질인 질소산화물과 황산화물을 처리하기 위하여 대형의 배기가스 처리장치가 사용된다.In general, in various power plants or steel mills, large-scale exhaust gas treatment devices are used to treat nitrogen oxides and sulfur oxides, which are harmful air pollutants of exhaust gas generated by combustion of fossil fuels, etc.

이러한 배기가스 처리장치는 배기가스의 황산화물을 배연탈황장치(Flue Gas Desulfurization: FGD) 등으로 처리하고 배기가스의 질소산화물을 선택적 환원촉매장치(Selective Catalytic Reduction: SCR) 등으로 처리하게 된다.Such an exhaust gas treatment apparatus treats sulfur oxides of exhaust gas with a flue gas desulfurization (FGD), etc., and processes nitrogen oxides of the exhaust gas with a selective catalytic reduction (SCR) or the like.

여기서, 상기 배연탈황장치는 연소 배기가스 속의 아황산가스(SO2)를 배연탈황법을 통해 제거하는 장치로서, 배연탈황법에는 알칼리 용액 및 금속 산화물 등에 SO2를 흡수시키거나 활성탄 등을 이용하여 SO2를 흡착 제거하는 방식이다. 또한, 상기 선택적 환원촉매장치는 요소용액 등을 산화제로 이용하여 촉매존재하에 질소산화물을 환원시켜 질소가스 등으로 정화처리하여 배출시키는 방식이다.Here, the flue gas desulfurization device is a device that removes sulfurous acid gas (SO2) in combustion exhaust gas through flue gas desulfurization method. In the flue gas desulfurization method, SO2 is absorbed in an alkali solution and metal oxide, or SO2 is adsorbed using activated carbon, etc. way to remove it. In addition, the selective reduction catalyst device uses a urea solution or the like as an oxidizing agent to reduce nitrogen oxides in the presence of a catalyst, purify them with nitrogen gas, etc. and discharge them.

하지만, 상기 배연탈황장치와 선택적 환원촉매장치는 대량의 배기가스가 성격이 전혀 다른 탈황 및 탈질의 두 공정을 순차적으로 거치면서 배기가스에 포함된 오염물질을 처리함에 따라 초기 투자비 및 운전비가 상승하게 되고 탈질 및 탈황공정의 최적 공정결합이 요구될 뿐만 아니라, 배연탈황장치의 경우 전체적인 설비규모가 커지고 배압 증가 등의 문제로 인해 사용상에 불편함이 많으며, 선택적 환원촉매장치의 경우에는 400℃ 이상의 고온에서 작동하여 운전조건이 까다롭고 고가의 촉매를 이용해야 하기 때문에 시설비용이 과도하게 소모되는 문제점이 있었다.However, in the flue gas desulfurization device and the selective reduction catalyst device, the initial investment and operation cost increase as a large amount of exhaust gas sequentially goes through two processes of desulfurization and denitrification, which are completely different in nature, and treats pollutants contained in the exhaust gas. In the case of a flue gas desulfurization device, the overall facility scale is large and there are many inconveniences in use due to problems such as an increase in back pressure, and in the case of a selective reduction catalyst device, a high temperature of 400℃ or higher is required. There was a problem in that facility costs were excessively consumed because operating conditions were difficult and expensive catalysts had to be used.

또한, 종래의 배기가스 처리장치는 질소산화물과 황산화물의 동시 처리가 어려우며, 배기가스의 배출 유동성이 저하되면서 배기가스를 본체 외측으로 배출시키기 위한 에너지의 사용이 증대되는 문제점이 있었다. 또한, 종래의 배기가스 처리장치는 분사되는 약액과 배기가스의 접촉효율의 한계로 인해, 배기가스에 포함된 오염물질의 제거 효율이 떨어지는 문제점이 있었다.In addition, the conventional exhaust gas treatment apparatus has a problem in that it is difficult to simultaneously process nitrogen oxides and sulfur oxides, and the use of energy for discharging the exhaust gas to the outside of the main body is increased as the exhaust fluidity of the exhaust gas is decreased. In addition, the conventional exhaust gas treatment apparatus has a problem in that the removal efficiency of pollutants contained in the exhaust gas is lowered due to the limitation in the contact efficiency of the sprayed chemical and the exhaust gas.

본 발명은 이러한 문제점을 해결하기 위해 안출된 것으로, 본 발명의 목적은 질소산화물과 황산화물의 동시제거가 가능하며, 제거 효율을 증대시킬 수 있는 질소산화물 및 황산화물 동시제거 장치를 제공하기 위한 것이다.The present invention has been devised to solve these problems, and an object of the present invention is to provide an apparatus for simultaneous removal of nitrogen oxides and sulfur oxides capable of simultaneously removing nitrogen oxides and sulfur oxides and capable of increasing the removal efficiency .

본 발명의 목적들은 이상에서 언급한 목적들로 제한되지 않으며, 언급되지 않은 또 다른 목적들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.Objects of the present invention are not limited to the objects mentioned above, and other objects not mentioned will be clearly understood by those skilled in the art from the following description.

상기의 목적을 달성하기 위하여 본 발명은 질소산화물 및 황산화물을 포함하는 배기가스가 유입되어 냉각되며, 배기가스에 함유된 미세먼지가 필터에 의해 제거되는 전처리 반응부; 상기 전처리 반응부를 통과하여 미세먼지가 제거된 배기가스가 하부에 형성된 제1 유입구를 통해 내부로 유입되며, 내부에 구비된 제1 약액 분사부에 의해 제1 약액이 분사되어 상기 제1 약액과 상기 배기가스의 산화공정이 진행되며, 상부에 형성된 제1 배출구를 통해 배기가스가 배출되는 제1 반응 챔버; 상기 제1 반응 챔버를 통과한 배기가스가 하부에 형성된 제2 유입구를 통해 유입되며, 내부에 구비된 제2 약액 분사부에 의해 제2 약액이 분사되어 중화공정이 진행되며, 상부에 형성된 제2 배출구를 통해 배기가스 배출되는 제2 반응 챔버; 상기 제2 반응 챔버를 통과한 배기가스가 하부에 형성된 제3 유입구를 통해 유입되며, 내부에 구비된 제3 약액 분사부에 의해 제3 약액이 분사되어 환원공정이 수행되며, 상부에 형성된 제3 배출구를 통해 질소산화물 및 황산화물이 제거된 배기가스가 배출되는 제3 반응 챔버;를 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치를 제공한다.In order to achieve the above object, the present invention provides a pretreatment reaction unit in which exhaust gas containing nitrogen oxides and sulfur oxides is introduced and cooled, and fine dust contained in the exhaust gas is removed by a filter; Exhaust gas from which fine dust has been removed by passing through the pretreatment reaction unit is introduced into the interior through a first inlet formed at the bottom, and a first chemical is sprayed by a first chemical spraying unit provided therein, so that the first chemical and the a first reaction chamber in which an oxidation process of exhaust gas is performed, and exhaust gas is discharged through a first outlet formed thereon; The exhaust gas that has passed through the first reaction chamber is introduced through a second inlet formed at the lower portion, and the second chemical solution is sprayed by the second chemical solution injection unit provided therein to perform a neutralization process, and the second chemical solution formed on the upper portion is injected. a second reaction chamber through which exhaust gas is discharged; The exhaust gas that has passed through the second reaction chamber is introduced through a third inlet formed in the lower portion, and a third chemical liquid is injected by a third chemical liquid injection unit provided therein to perform a reduction process, and the third chemical liquid is formed in the upper part. It provides a nitrogen oxide and sulfur oxide simultaneous removal device comprising a; a third reaction chamber through which the exhaust gas from which nitrogen oxides and sulfur oxides are removed is discharged through the outlet.

바람직한 실시예에 있어서, 상기 제1 약액은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되고, 상기 제2 약액은 수산화 나트륨(NaOH)이 이용되며, 상기 제3 약액은 아황산 나트륨(Na2SO3)이 이용된다.In a preferred embodiment, the first chemical solution is sodium hypochlorite (NaClO), sodium chlorite (NaClO2) or sodium chlorate (NaClO3) is used, the second chemical solution is sodium hydroxide (NaOH) is used, the agent 3 Sodium sulfite (Na2SO3) is used as the chemical solution.

바람직한 실시예에 있어서, 상기 제1 약액 분사부, 상기 제2 약액 분사부 및 상기 제3 약액 분사부는 각 상기 반응 챔버 내부에서 상하방향으로 다단으로 구비된다.In a preferred embodiment, the first chemical liquid injection unit, the second chemical liquid injection unit, and the third chemical liquid injection unit are provided in multi-stage vertical direction inside each of the reaction chambers.

바람직한 실시예에 있어서, 상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는 상하방향으로 이웃하는 약액 분사부 사이와 약액 분사부와 유입구 사이에 설치되어, 배기 가스와 약액과의 반응시간을 증대시키는 폴링;을 더 포함한다.In a preferred embodiment, the first reaction chamber, the second reaction chamber, and the third reaction chamber are installed between the chemical liquid injection part and the chemical liquid injection part and the inlet adjacent in the vertical direction, Polling to increase the reaction time; further includes.

바람직한 실시예에 있어서, 상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는 각 배출구의 하부에 설치되어, 외부로 수분이 배출되는 것을 방지하는 데미스터를 더 포함한다.In a preferred embodiment, the first reaction chamber, the second reaction chamber and the third reaction chamber are installed under each outlet, and further include a demister for preventing moisture from being discharged to the outside.

바람직한 실시예에 있어서, 상기 제2 반응챔버 또는 상기 제3 반응챔버는 다수개의 관통홀이 형성된 플레이트 형상으로, 유입구의 상부에 설치되는 다공 플레이트; 및 상기 다공 플레이트 상에 설치되어, 상방으로 와류를 형성하는 교반 수단;을 더 포함한다.In a preferred embodiment, the second reaction chamber or the third reaction chamber has a plate shape in which a plurality of through-holes are formed, and includes: a porous plate installed above the inlet; and a stirring means installed on the perforated plate to form an upward vortex.

본 발명은 다음과 같은 우수한 효과를 가진다.The present invention has the following excellent effects.

본 발명의 질소산화물 및 황산화물 동시제거 장치에 의하면, 배기 가스가 유입되며, 제1 약액이 분사되어 산화공정이 수행되는 제1 반응 챔버, 제1 반응챔버를 통과한 배기가스가 유입되며, 제2 약액이 분사되어 중화공정이 수행되는 제2 반응 챔버 및 제2 반응챔버를 통과한 배기가스가 유입되며, 제3 약액이 분사되어 환원공정이 수행되는 제3 반응 챔버에 의해 NOx 및 SOx의 동시제거가 가능한 효과가 있다.According to the apparatus for simultaneously removing nitrogen oxides and sulfur oxides of the present invention, exhaust gas is introduced, a first chemical solution is injected to perform an oxidation process, and exhaust gas passing through the first reaction chamber flows in, 2 The second reaction chamber where the chemical solution is injected and the neutralization process is performed, and the exhaust gas that has passed through the second reaction chamber is introduced, and the third reaction chamber where the third chemical solution is injected and the reduction process is performed simultaneously There is an effect that can be removed.

또한, 본 발명의 질소산화물 및 황산화물 동시제거 장치에 의하면, 다공플레이트, 교반수단 및 폴링수단에 의해 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시킴으로써, 제거효율을 증대시킬 수 있고, 처리 약액의 사용량을 감소시킬 수 있는 장점을 지닌다.In addition, according to the device for simultaneously removing nitrogen oxides and sulfur oxides of the present invention, the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber by the perforated plate, the stirring means and the falling means is increased, so that the contact efficiency with the chemical solution is increased. By increasing the amount, the removal efficiency can be increased and the amount of the treatment liquid can be reduced.

도 1은 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치를 설명하기 위한 모식도이다.
도 2는 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치의 스풀을 설명하기 위한 도면이다.1 is a schematic diagram for explaining a device for simultaneously removing nitrogen oxides and sulfur oxides according to the present invention.
2 is a view for explaining the spool of the nitrogen oxide and sulfur oxide simultaneous removal device according to the present invention.

본 발명에서 사용되는 용어는 가능한 현재 널리 사용되는 일반적인 용어를 선택하였으나, 특정한 경우는 출원인이 임의로 선정한 용어도 있는데 이 경우에는 단순한 용어의 명칭이 아닌 발명의 상세한 설명 부분에 기재되거나 사용된 의미를 고려하여 그 의미가 파악되어야 할 것이다.As for the terms used in the present invention, general terms that are currently widely used are selected as possible, but in certain cases, there are also terms arbitrarily selected by the applicant. So the meaning should be understood.

이하, 첨부한 도면에 도시된 바람직한 실시예들을 참조하여 본 발명의 기술적 구성을 상세하게 설명한다.Hereinafter, the technical configuration of the present invention will be described in detail with reference to preferred embodiments shown in the accompanying drawings.

그러나, 본 발명은 여기서 설명되는 실시예에 한정되지 않고 다른 형태로 구체화 될 수도 있다. 명세서 전체에 걸쳐 동일한 참조번호는 동일한 구성요소를 나타낸다.However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Like reference numerals refer to like elements throughout.

도 1은 본 발명의 일 실시예에 따른 질소산화물 및 황산화물 동시제거 장치를 설명하기 위한 도면이다.1 is a view for explaining an apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention.

도 1을 참조하면, 본 발명의 일 실시예에 따른 질소산화물 및 황산화물 동시제거 장치는 배기가스에 함유된 질소산화물과 황산화물을 동시에 처리하기 위한 장치로, 전처리 반응부(110), 제1 반응 챔버(120), 제2 반응 챔버(130) 및 제3 반응 챔버(140)를 포함하여 이루어진다.Referring to FIG. 1 , the apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention is an apparatus for simultaneously treating nitrogen oxides and sulfur oxides contained in exhaust gas, and includes a pretreatment reaction unit 110 , a first It comprises a reaction chamber 120 , a second reaction chamber 130 , and a third reaction chamber 140 .

상기 전처리 반응부(110)는 상부를 통해 질소산화물 및 황산화물을 포함하는 배기가스(g)가 유입되어 소정 온도로 냉각되며, 중앙부에 구비된 필터를 통과화면서 배기가스에 함유된 미세먼지가 제거된다.In the pretreatment reaction unit 110, exhaust gas (g) containing nitrogen oxides and sulfur oxides is introduced through the upper part and cooled to a predetermined temperature, and fine dust contained in the exhaust gas is removed while passing through a filter provided in the central part. is removed

상기 제1 반응 챔버(120)는 배기가스(g)의 산화공정이 수행되는 챔버로, 하부에는 제1 유입구(121)가 형성되고, 내부에는 제1 약액 분사부(122)가 구비되며, 상부에는 제1 배출구(123)가 형성된다.The first reaction chamber 120 is a chamber in which the oxidation process of the exhaust gas (g) is performed, the first inlet 121 is formed in the lower part, the first chemical liquid injection part 122 is provided therein, and the upper part The first outlet 123 is formed.

또한, 상기 제1 약액 분사부(122)는 복수개로 구비되며, 이웃하는 제1 약액 분사부(122)들과의 간격이 서로 동일하게 마련될 수 있다.In addition, the first chemical liquid spraying unit 122 may be provided in plurality, and the first chemical liquid spraying units 122 may have the same distance from each other.

또한, 상기 제1 약액 분사부(122)는 상하방향으로 다단을 이루도록 구비될 수 있다.In addition, the first chemical spraying unit 122 may be provided to form a multi-stage in the vertical direction.

다시 말하면, 상기 제1 약액 분사부(122) 다수개가 서로 동일한 높이로 설치되어 하나의 단을 이루며, 적어도 두 개의 단이 상하방향으로 배치될 수 있다.In other words, a plurality of the first chemical liquid spraying units 122 may be installed at the same height as each other to form one stage, and at least two stages may be arranged in the vertical direction.

이에 따라, 상기 제1 반응 챔버(120)에서는, 상기 전처리 반응부(110)를 통과한 배기가스(g)가 하부에 형성된 상기 제1 유입구(121)를 통해 내부로 유입되며, 상기 제1 약액 분사부(122)에 의해 분사되는 제1 약액(a)에 의해 상기 배기가스(g)의 산화공정이 진행되며, 상부에 형성된 상기 제1 배출구(123)을 통해 배기가스(g)가 배출된다.Accordingly, in the first reaction chamber 120, the exhaust gas (g) that has passed through the pretreatment reaction unit 110 is introduced into the interior through the first inlet 121 formed in the lower portion, and the first chemical solution The oxidation process of the exhaust gas (g) proceeds by the first chemical liquid (a) injected by the injection unit 122, and the exhaust gas (g) is discharged through the first outlet 123 formed in the upper part .

또한, 상기 제1 약액(a)은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되는 것이 바람직하다.In addition, as the first chemical solution (a), sodium hypochlorite (NaClO), sodium chlorite (NaClO2) or sodium chlorate (NaClO3) is preferably used.

이에 따라, 상기 제1 반응 챔버(120)는 하기에 기재된 반응식들을 통해 산화공정이 수행될 수 있다.Accordingly, the oxidation process may be performed in the first reaction chamber 120 through the following reaction equations.

(반응식 1-1) : NO + NaClO → NaCl + NO2 (Scheme 1-1): NO + NaClO → NaCl + NO 2

(반응식 1-2) : 2NO + NaClO2 → NaCl + 2NO2 (Scheme 1-2): 2NO + NaClO 2 → NaCl + 2NO 2

(반응식 1-3) : 3NO + NaClO3 → NaCl + 3NO2 (Scheme 1-3): 3NO + NaClO 3 → NaCl + 3NO 2

(반응식 1-4) : NO2 + OH- → HNO3 (Scheme 1-4): NO 2 + OH - → HNO 3

(반응식 1-5) : SO2 + NaOCl → Na2SO4 + NaCl(Scheme 1-5): SO 2 + NaOCl → Na 2 SO 4 + NaCl

또한, 상기 제1 반응 챔버(120)는 제1 폴링(124)과 제1 데미스터(125)가 더 구비될 수 있다.In addition, the first reaction chamber 120 may further include a first pole ring 124 and a first demister 125 .

여기서, 상기 제1 폴링(124)은 도 2 (a)에 도시된 바와 같이 금속재질로 마련되거나, 도 2 (b)에 도시된 바와 같이, 합성수지 재질로 마련될 수 있다.Here, the first pawl 124 may be made of a metal material as shown in FIG. 2(a) or may be made of a synthetic resin material as shown in FIG. 2(b).

또한, 상기 제1 폴링(124)은 상하 방향으로 이웃하는 약액 분사부(122)들 사이 및 상기 약액 분사부(122)와 상기 제1 유입구(121) 사이에 설치된다.In addition, the first pawling 124 is installed between the chemical liquid injection parts 122 adjacent in the vertical direction and between the chemical liquid injection part 122 and the first inlet 121 .

또한, 상기 제1 폴링(124)은 양단이 개방된 원통형상으로, 측면에 다수개의 관통홀이 형성되고, 상부 또는 하부에 십자형상의 격벽이 설치되는 구조로 마련될 수 있으며, 상기 제1 폴링(124)의 상향으로 이동되는 배기가스(g)의 체류시간을 늘림으로써, 상기 제1 폴링(124)에 묻은 제1 약액(a)에 의해 반응되는 반응시간을 증가시켜, 정화 반응 효율을 향상시키킬 수 있게 한다.In addition, the first pawl 124 may have a cylindrical shape with both ends open, a plurality of through-holes formed on the side surface, and a structure in which a cross-shaped bulkhead is installed at the upper or lower portion, and the first pawl ( By increasing the residence time of the exhaust gas (g) moving upward of 124), the reaction time reacted by the first chemical solution (a) deposited on the first pawling 124 is increased, thereby improving the purification reaction efficiency. make it possible to kill

또한, 상기 제1 데미스터(125)는 상기 제1 배출구(123)의 하부 위치에 설치되어, 외부로 수분이 배출되는 것을 방지하는 역할을 한다.In addition, the first demister 125 is installed at a lower position of the first outlet 123 , and serves to prevent moisture from being discharged to the outside.

상기 제2 반응 챔버(130)는 배기가스(g)의 중화공정이 수행되는 챔버로, 하부에는 제2 유입구(131)가 형성되고, 내부에는 제2 약액 분사부(132)가 구비되며, 상부에는 제2 배출구(133)가 형성된다.The second reaction chamber 130 is a chamber in which the neutralization process of the exhaust gas (g) is performed, a second inlet 131 is formed at a lower portion, a second chemical liquid injection unit 132 is provided therein, and an upper portion thereof is provided. The second outlet 133 is formed.

이때, 상기 제2 약액 분사부(132)는 상기 제1 약액 분사부(122)와 동일한 형태로 복수개로 구비되고, 이웃하는 제2 약액 분사부(132)들과의 간격은 서로 동일하게 마련되며, 상기 제2 약액 분사부(132)는 상하방향으로 다단을 이루도록 구비될 수 있다.At this time, the second chemical liquid injection unit 132 is provided in plurality in the same shape as the first chemical liquid injection unit 122 , and the interval from the neighboring second chemical liquid injection units 132 is equal to each other, , the second chemical liquid injection unit 132 may be provided to form a multi-stage in the vertical direction.

이에 따라, 상기 제2 반응 챔버(130)에서는, 상기 제1 반응 챔버(120)를 통과한 배기가스(g)가 하부에 형성된 상기 제2 유입구(131)를 통해 내부로 유입되며, 상기 제2 약액 분사부(132)에 의해 제2 약액(b)이 분사되어, 상기 배기가스(g)의 중화공정이 진행되며, 상부에 형성된 상기 제2 배출구(133)을 통해 배기가스(g)가 배출된다.Accordingly, in the second reaction chamber 130 , the exhaust gas g that has passed through the first reaction chamber 120 is introduced into the interior through the second inlet 131 formed in the lower portion, and the second The second chemical liquid (b) is injected by the chemical liquid injection unit 132, the neutralization process of the exhaust gas (g) is performed, and the exhaust gas (g) is discharged through the second discharge port 133 formed in the upper part do.

또한, 상기 제2 약액(b)은 수산화 나트륨(NaOH)이 이용되는 것이 바람직하다.In addition, it is preferable that sodium hydroxide (NaOH) is used as the second chemical solution (b).

이에 따라, 상기 제2 반응 챔버(130)는 하기에 기재된 반응식들을 통해 환원공정이 수행된다.Accordingly, the reduction process is performed in the second reaction chamber 130 through the reaction equations described below.

(반응식 2-1) : 2NO2 + 2NaOH → NaNO2 + NaNO3 + H2O(Scheme 2-1): 2NO 2 + 2NaOH → NaNO 2 + NaNO 3 + H 2 O

(반응식 2-2) : NO + NO2 → N2O3 (Scheme 2-2): NO + NO 2 → N 2 O 3

(반응식 2-3) : N2O3 + 2NaOH → 2NaNO2 + H2O(Scheme 2-3): N 2 O 3 + 2NaOH → 2NaNO 2 + H 2 O

(반응식 2-4) : HNO3 + NaOH → NaNO3 + H2O(Scheme 2-4): HNO 3 + NaOH → NaNO 3 + H 2 O

(반응식 2-5) : SO2 + 2NaOH → Na2SO3 + H2O(Scheme 2-5): SO 2 + 2NaOH → Na 2 SO 3 + H 2 O

또한, 상기 제2 반응 챔버(130)는 제2 폴링(134)과 제2 데미스터(135)가 더 구비될 수 있다.In addition, the second reaction chamber 130 may further include a second pole ring 134 and a second demister 135 .

여기서, 상기 제2 폴링(134)과 상기 제2 데미스터(135)는 상기 제1 반응챔버(120)의 제1 폴링(124) 및 제1 데미스터(124)와 동일한 구성이므로, 중복되는 설명은 생략하기로 한다.Here, the second pole ring 134 and the second demister 135 have the same configuration as the first pole ring 124 and the first demister 124 of the first reaction chamber 120, and thus overlapping descriptions is to be omitted.

또한, 상기 제2 반응 챔버(130)는 제1 다공 플레이트(136)와 제1 교반 수단(137)이 더 구비될 수 있다.In addition, the second reaction chamber 130 may further include a first porous plate 136 and a first stirring means 137 .

여기서, 상기 제1 다공 플레이트(136)는 다수개의 관통홀이 형성된 플레이트 형상으로, 상기 제2 유입구(131)와 상기 제2 폴링(134)의 사이에 설치되며, 상기 제1 교반 수단(137)은 상기 제1 다공 플레이트(136)상에 설치되어, 상방으로 와류를 형성함으로써, 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시키는 역할을 한다.Here, the first porous plate 136 has a plate shape having a plurality of through-holes formed therein, and is installed between the second inlet 131 and the second pawling 134 , and the first stirring means 137 . is installed on the first perforated plate 136 and forms a vortex upward, thereby increasing the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber, thereby increasing the contact efficiency with the chemical solution. do.

상기 제3 반응 챔버(140)는 배기가스(g)의 환원공정이 수행되는 챔버로, 하부에는 제3 유입구(141)가 형성되고, 내부에는 제3 약액 분사부(142)가 구비되며, 상부에는 제3 배출구(143)가 형성된다.The third reaction chamber 140 is a chamber in which the reduction process of the exhaust gas (g) is performed, a third inlet 141 is formed in the lower part, a third chemical liquid injection part 142 is provided therein, and the upper part The third outlet 143 is formed.

이때, 상기 제3 약액 분사부(142)는 상기 제1 약액 분사부(122) 및 상기 제2 약액 분사부(132)와 동일한 형태로 구비되는데, 보다 상세하게는 이웃하는 제3 약액 분사부(142)들과의 간격은 서로 동일하게 마련되며, 상기 제3 약액 분사부(142)는 상하방향으로 다단을 이루도록 구비될 수 있다.At this time, the third chemical liquid injection unit 142 is provided in the same shape as the first chemical liquid injection unit 122 and the second chemical liquid injection unit 132 , and in more detail, a neighboring third chemical liquid injection unit ( 142) are provided to be the same as each other, and the third chemical liquid spraying unit 142 may be provided in multiple stages in the vertical direction.

이에 따라, 상기 제3 반응 챔버(140)에서는, 상기 제2 반응 챔버(130)를 통과한 배기가스(g)가 하부에 형성된 상기 제3 유입구(141)를 통해 내부로 유입되며, 상기 제3 약액 분사부(142)에 의해 제3 약액(c)이 분사되어, 상기 배기가스(g)의 환원공정이 진행되며, 상부에 형성된 상기 제3 배출구(143)을 통해 질소산화물 및 황산화물이 제거된 배기가스(g)가 배출된다.Accordingly, in the third reaction chamber 140 , the exhaust gas g that has passed through the second reaction chamber 130 is introduced into the interior through the third inlet 141 formed in the lower portion, and the third The third chemical liquid (c) is injected by the chemical liquid injection unit 142, the reduction process of the exhaust gas (g) proceeds, and nitrogen oxides and sulfur oxides are removed through the third outlet 143 formed in the upper part. exhaust gas (g) is discharged.

또한, 상기 제3 약액(c)은 아황산 나트륨(Na2SO3)이 이용되는 것이 바람직하다.In addition, sodium sulfite (Na2SO3) is preferably used as the third chemical solution (c).

이에 따라, 상기 제3 반응 챔버(140)는 하기에 기재된 반응식들을 통해 환원공정이 수행된다.Accordingly, the reduction process is performed in the third reaction chamber 140 through the reaction equations described below.

(반응식 3-1) : 2NO2 + Na2S → N2 + Na2S2O3 (Scheme 3-1): 2NO 2 + Na 2 S → N 2 + Na 2 S 2 O 3

(반응식 3-2) : Na2S2O3 + 2NaOH + 2O2 → 2Na2SO4 + H2O (Scheme 3-2): Na 2 S 2 O 3 + 2NaOH + 2O 2 → 2Na 2 SO 4 + H 2 O

(반응식 3-3) : 4NO2 + 2Na2SO3 → 2N2 + 2Na2SO4 + 3O2 (Scheme 3-3): 4NO 2 + 2Na 2 SO 3 → 2N 2 + 2Na 2 SO 4 + 3O 2

(반응식 3-4) : 4NO + 2Na2SO3 → 2N2 + 2Na2SO4 + O2 (Scheme 3-4): 4NO + 2Na 2 SO 3 → 2N 2 + 2Na 2 SO 4 + O 2

또한, 상기 제3 반응 챔버(140)는 제3 폴링(144)과 제3 데미스터(145)가 더 구비될 수 있는데, 여기서, 상기 제3 폴링(144)과 상기 제3 데미스터(145)는 상기 제1 반응챔버(120)의 제1 폴링(124) 및 제1 데미스터(124)와 서로 동일한 구성이므로, 중복되는 설명은 생략하기로 한다.In addition, the third reaction chamber 140 may further include a third pole ring 144 and a third demister 145 , wherein the third pole ring 144 and the third demister 145 . is the same configuration as that of the first pole ring 124 and the first demister 124 of the first reaction chamber 120, and thus the overlapping description will be omitted.

또한, 상기 제3 반응 챔버(140)는 제2 다공 플레이트(146)와 제2 교반 수단(147)이 더 구비될 수 있다.In addition, the third reaction chamber 140 may further include a second porous plate 146 and a second stirring means 147 .

여기서, 상기 제2 다공 플레이트(146)는 다수개의 관통홀이 형성된 플레이트 형상으로, 상기 제3 유입구(141)의 상부에 설치되며, 상기 제2 교반 수단(147)은 상기 제2 다공 플레이트(146)상에 설치되어, 상방으로 와류를 형성함으로써, 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시키는 역할을 한다.Here, the second porous plate 146 has a plate shape in which a plurality of through-holes are formed, is installed on the third inlet 141 , and the second stirring means 147 is the second porous plate 146 . ), and by forming a vortex upward, it increases the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber, thereby increasing the contact efficiency with the chemical solution.

상술한 바와 같이, 본 발명에 따른 질소산화물 및 황산화물 동시제거 장치에 의하면, 질소산화물 및 황산화물이 함유된 배기가스를 산화, 중화, 환원 처리함으로써, NOx 및 SOx의 동시제거가 가능하며, 다공플레이트, 교반수단 및 폴링수단에 의해 반응챔버의 내부공간으로 유입되는 배기가스의 분산성(유동성)을 증대시켜 약액과의 접촉 효율을 증대시킴으로써, 제거효율을 증대시킬 수 있고, 처리 약액의 사용량을 감소시킬 수 있는 장점을 지닌다.As described above, according to the apparatus for simultaneously removing nitrogen oxides and sulfur oxides according to the present invention, by oxidizing, neutralizing and reducing exhaust gas containing nitrogen oxides and sulfur oxides, it is possible to simultaneously remove NOx and SOx, and By increasing the dispersibility (fluidity) of the exhaust gas flowing into the inner space of the reaction chamber by means of the plate, stirring means and falling means, and thereby increasing the contact efficiency with the chemical solution, it is possible to increase the removal efficiency and reduce the amount of treatment chemical solution used. have the advantage of being reduced.

이상에서 살펴본 바와 같이 본 발명은 바람직한 실시예를 들어 도시하고 설명하였으나, 상기한 실시예에 한정되지 아니하며 본 발명의 정신을 벗어나지 않는 범위 내에서 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자에 의해 다양한 변경과 수정이 가능할 것이다.As described above, the present invention has been illustrated and described with reference to preferred embodiments, but it is not limited to the above-described embodiments, and those of ordinary skill in the art to which the present invention pertains within the scope not departing from the spirit of the present invention Various changes and modifications will be possible.

110 : 전처리 반응부
120 : 제1 반응 챔버 121 : 제1 유입구
122 : 제1 약액 분사부 123 : 제1 배출구
124 : 제1 폴링 125 : 제1 데미스터
130 : 제2 반응 챔버 131 : 제2 유입구
132 : 제2 약액 분사부 133 : 제2 배출구
134 : 제2 폴링 135 : 제2 데미스터
136 : 제1 다공 플레이트 137 : 제1 교반수단
140 : 제3 반응 챔버 141 : 제3 유입구
142 : 제3 약액 분사부 143 : 제3 배출구
144 : 제3 폴링 145 : 제3 데미스터
146 : 제2 다공 플레이트 147 : 제2 교반수단110: pretreatment reaction unit
120: first reaction chamber 121: first inlet
122: first chemical liquid injection unit 123: first outlet
124: first polling 125: first demister
130: second reaction chamber 131: second inlet
132: second chemical liquid injection unit 133: second outlet
134: second polling 135: second demister
136: first porous plate 137: first stirring means
140: third reaction chamber 141: third inlet
142: third chemical liquid injection unit 143: third outlet
144: third polling 145: third demister
146: second porous plate 147: second stirring means

Claims (6)

질소산화물 및 황산화물을 포함하는 배기가스가 유입되어 냉각되며, 배기가스에 함유된 미세먼지가 필터에 의해 제거되는 전처리 반응부;
상기 전처리 반응부를 통과하여 미세먼지가 제거된 배기가스가 하부에 형성된 제1 유입구를 통해 내부로 유입되며, 내부에 구비된 제1 약액 분사부에 의해 제1 약액이 분사되어 상기 제1 약액과 상기 배기가스의 산화공정이 진행되며, 상부에 형성된 제1 배출구를 통해 배기가스가 배출되는 제1 반응 챔버;
상기 제1 반응 챔버를 통과한 배기가스가 하부에 형성된 제2 유입구를 통해 유입되며, 내부에 구비된 제2 약액 분사부에 의해 제2 약액이 분사되어 중화공정이 진행되며, 상부에 형성된 제2 배출구를 통해 배기가스 배출되는 제2 반응 챔버;
상기 제2 반응 챔버를 통과한 배기가스가 하부에 형성된 제3 유입구를 통해 유입되며, 내부에 구비된 제3 약액 분사부에 의해 제3 약액이 분사되어 환원공정이 수행되며, 상부에 형성된 제3 배출구를 통해 질소산화물 및 황산화물이 제거된 배기가스가 배출되는 제3 반응 챔버;를 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
a pretreatment reaction unit in which exhaust gas containing nitrogen oxides and sulfur oxides is introduced and cooled, and fine dust contained in the exhaust gas is removed by a filter;
Exhaust gas from which fine dust has been removed by passing through the pretreatment reaction unit is introduced into the interior through a first inlet formed at the bottom, and a first chemical is sprayed by a first chemical spraying unit provided therein, so that the first chemical and the above a first reaction chamber in which an oxidation process of exhaust gas is performed and exhaust gas is discharged through a first outlet formed thereon;
The exhaust gas that has passed through the first reaction chamber is introduced through a second inlet formed at the lower portion, and a second chemical solution is sprayed by a second chemical solution injection unit provided therein to perform a neutralization process, and a second chemical solution formed on the upper portion is injected. a second reaction chamber through which exhaust gas is discharged;
The exhaust gas that has passed through the second reaction chamber is introduced through a third inlet formed in the lower portion, and a third chemical solution is injected by a third chemical solution spraying unit provided therein to perform a reduction process, and a third chemical solution formed therein is performed. Simultaneous removal of nitrogen oxides and sulfur oxides comprising a; a third reaction chamber in which exhaust gas from which nitrogen oxides and sulfur oxides are removed is discharged through the outlet.
 제 1항에 있어서,
상기 제1 약액은 차아염소산나트륨(NaClO), 아염소산나트륨(NaClO2) 또는 염소산나트륨(NaClO3)이 이용되고, 상기 제2 약액은 수산화 나트륨(NaOH)이 이용되며, 상기 제3 약액은 아황산 나트륨(Na2SO3)이 이용되는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
The method of claim 1,
The first chemical solution is sodium hypochlorite (NaClO), sodium chlorite (NaClO2) or sodium chlorate (NaClO3) is used, the second chemical solution is sodium hydroxide (NaOH) is used, the third chemical solution is sodium sulfite ( Simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that Na2SO3) is used.
 제 1항에 있어서,
상기 제1 약액 분사부, 상기 제2 약액 분사부 및 상기 제3 약액 분사부는
각 상기 반응 챔버 내부에서 상하방향으로 다단으로 구비되는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
The method of claim 1,
The first chemical liquid injection unit, the second chemical liquid injection unit, and the third chemical liquid injection unit
Simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that provided in multiple stages in the vertical direction inside each of the reaction chambers.
 제 3항에 있어서,
상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는
상하방향으로 이웃하는 약액 분사부 사이와 약액 분사부와 유입구 사이에 설치되어, 배기 가스와 약액과의 반응시간을 증대시키는 폴링;을 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
4. The method of claim 3,
The first reaction chamber, the second reaction chamber and the third reaction chamber
Simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that the apparatus further comprises: a poling installed between the chemical liquid injection parts adjacent in the vertical direction and between the chemical liquid injection part and the inlet to increase the reaction time between the exhaust gas and the chemical liquid.
 제 1항에 있어서,
상기 제1 반응챔버, 상기 제2 반응챔버 및 상기 제3 반응챔버는
각 배출구의 하부에 설치되어, 외부로 수분이 배출되는 것을 방지하는 데미스터를 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
The method of claim 1,
The first reaction chamber, the second reaction chamber and the third reaction chamber
Simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that it further comprises a demister installed at the lower portion of each outlet to prevent moisture from being discharged to the outside.
 제 1항에 있어서,
상기 제2 반응챔버 또는 상기 제3 반응챔버는
다수개의 관통홀이 형성된 플레이트 형상으로, 유입구의 상부에 설치되는 다공 플레이트; 및
상기 다공 플레이트 상에 설치되어, 상방으로 와류를 형성하는 교반 수단;을 더 포함하는 것을 특징으로 하는 질소산화물 및 황산화물 동시제거 장치.
The method of claim 1,
The second reaction chamber or the third reaction chamber is
A plate shape having a plurality of through-holes formed therein, a perforated plate installed on the upper portion of the inlet; and
Simultaneous removal of nitrogen oxides and sulfur oxides, characterized in that it further comprises; a stirring means installed on the perforated plate to form an upward vortex.
KR1020200134913A 2020-10-19 2020-10-19 Simultaneous removal apparatus for SOx and NOx KR102504431B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020200134913A KR102504431B1 (en) 2020-10-19 2020-10-19 Simultaneous removal apparatus for SOx and NOx
PCT/KR2020/016841 WO2022085852A1 (en) 2020-10-19 2020-11-25 Apparatus for simultaneously removing nitrogen oxide and sulfur oxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200134913A KR102504431B1 (en) 2020-10-19 2020-10-19 Simultaneous removal apparatus for SOx and NOx

Publications (2)

Publication Number Publication Date
KR20220051467A true KR20220051467A (en) 2022-04-26
KR102504431B1 KR102504431B1 (en) 2023-02-28

Family

ID=81289841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200134913A KR102504431B1 (en) 2020-10-19 2020-10-19 Simultaneous removal apparatus for SOx and NOx

Country Status (2)

Country Link
KR (1) KR102504431B1 (en)
WO (1) WO2022085852A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102562438B1 (en) * 2023-02-08 2023-08-02 세인이엔씨(주) Deodorization device that improves the deodorization effect by increasing the reaction at the nozzle wall

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030004722A (en) * 2001-07-06 2003-01-15 주식회사 시원기업 Apparatus and method for removal with SOx, NOx and hazardous gas in flue gas using electrolyte water of electrolysis
KR100966737B1 (en) * 2010-01-05 2010-06-29 대명엔텍(주) Deodorizing tower for chemical cleaning
KR101519900B1 (en) * 2014-11-26 2015-05-18 주식회사 정원이앤씨 DeSOx and DeNOx system for plant

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3901559B2 (en) * 2002-03-29 2007-04-04 正憲 田代 Exhaust gas purification device
KR101501910B1 (en) * 2013-12-31 2015-03-12 주식회사 애니텍 Scrubber module system for the removal of toxic substance and toxic substance removal method using thereof of small and medium sized ship
KR102098232B1 (en) * 2018-04-23 2020-04-07 현대머티리얼 주식회사 Scrubber for cleaning exhaust gas and integrated apparatus having the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030004722A (en) * 2001-07-06 2003-01-15 주식회사 시원기업 Apparatus and method for removal with SOx, NOx and hazardous gas in flue gas using electrolyte water of electrolysis
KR100966737B1 (en) * 2010-01-05 2010-06-29 대명엔텍(주) Deodorizing tower for chemical cleaning
KR101519900B1 (en) * 2014-11-26 2015-05-18 주식회사 정원이앤씨 DeSOx and DeNOx system for plant

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102562438B1 (en) * 2023-02-08 2023-08-02 세인이엔씨(주) Deodorization device that improves the deodorization effect by increasing the reaction at the nozzle wall

Also Published As

Publication number Publication date
WO2022085852A1 (en) 2022-04-28
KR102504431B1 (en) 2023-02-28

Similar Documents

Publication Publication Date Title
KR101876413B1 (en) FLUE GAS TREATMENT APPARATUS FOR REMOVING NOx and SOx SIMULTANEOUSLY
CN106659971B (en) Method and apparatus for removing pollutants from exhaust gas
US6936231B2 (en) NOx, Hg, and SO2 removal using ammonia
CA2193638C (en) Exhaust gas treating systems
KR101544280B1 (en) Apparatus for treating exhaust gas using bubble ozone water droplet and method for treating exhaust gas using the same
CA3008430A1 (en) Process for the removal of contaminants from flue gas streams
CN102179146A (en) Smoke desulfuration and denitration system absorbed by dielectric barrier discharge combined lye and process thereof
CN103752151A (en) Technology for flue gas denitration by magnesium sulfite
JP2019531881A (en) Flue gas denitration method
CN106964238A (en) A kind of smoke comprehensive processing method and tandem smoke gas comprehensive treatment system, monoblock type smoke gas comprehensive treatment system
CN105148698A (en) Boiler flue gas desulfurization and denitrification system
JPH08108042A (en) Desulfurization and denitrification of flue gas,method and device for removal of carbon dioxide and catalyst and absorbent used therein
CN102160961A (en) Dielectric barrier discharge reactor, fume desulfurization and denitration system and desulfurizating and denitrating process
RU2698835C2 (en) Method and device for partial removal of contaminants from process gas flow
KR100818309B1 (en) Method and apparatus for removing nitrogen oxide using horizontal wet reactor
KR102504431B1 (en) Simultaneous removal apparatus for SOx and NOx
CN107497265A (en) The integrated fume cleaning system and method for ozone cooperative microwave-excitation flying dust induced radical
CN108786403B (en) Denitration reactor and denitration and desulfurization method
CN205055777U (en) Boiler flue gas desulfurization deNOx systems
KR20220034565A (en) Method of generating microbubble and method of purifying pollutant comprising same
CN106621663A (en) Boiler flue gas treatment device and method
JP4446269B2 (en) Dry simultaneous desulfurization denitration equipment
CN201978662U (en) Dielectric barrier discharge reactor for smoke gas desulphurization and denitrification, and desulphurization and denitrification system
KR102041520B1 (en) Integrated processing system of nitrogen oxides and sulfur oxides
CN110215813B (en) High-temperature industrial flue gas desulfurization and denitrification treatment method

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20201019

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20220527

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20230220

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20230223

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20230223

End annual number: 3

Start annual number: 1

PG1601 Publication of registration