KR102276557B1 - Exhaust gas treatment equipment for removing nitrogen oxide and sulfur oxide - Google Patents

Abstract

According to the present invention, an exhaust gas treatment facility for removing nitrogen oxide and sulfur oxide. The facility comprises: a gas treatment tank for simultaneously removing nitrogen oxides and sulfur oxides contained in a gas to be treated by absorbing the nitrogen oxides and sulfur oxides into an aqueous alkali solution containing an alkali agent; an oxidizing agent spraying device which sprays, in the form of a spray, an oxidizing agent aqueous solution containing an oxidizing agent on the gas to be treated before the gas to be treated is introduced into the gas treatment tank, and oxidizing nitrogen monoxide and sulfur dioxide contained in the gas to be treated into nitrogen dioxide and sulfur trioxide, respectively; and a nitrogen dioxide treatment tank in which nitrogen dioxide contained in the gas discharged from the gas treatment tank is removed by reacting with a reducing agent contained in a reducing agent aqueous solution. An unreacted oxidizing agent in the sprayed oxidizing agent is introduced into the aqueous alkali solution, and the residual nitrogen monoxide and sulfur dioxide in the gas to be treated introduced into the gas treatment tank are oxidized to nitrogen dioxide and sulfur trioxide, respectively. According to the present invention, the removal efficiency of the nitrogen oxide and the sulfur oxide is significantly increased.

Description

Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal {EXHAUST GAS TREATMENT EQUIPMENT FOR REMOVING NITROGEN OXIDE AND SULFUR OXIDE}

The present invention relates to an exhaust gas treatment technology, and more particularly, to an exhaust gas treatment technology for simultaneously removing nitrogen oxides and sulfur oxides classified as fine dust and fine dust-derived substances contained in exhaust gas.

In the boiler, fossil fuels such as coal and air containing excess oxygen are injected for combustion, and as a result of combustion, coal ash, carbon monoxide, carbon dioxide, nitrogen oxides (NO _X ), sulfur oxides (SO _X ), unburned carbon content (HC), etc. The by-products are generated with heat, and unreacted nitrogen and oxygen remain.

As such, when a fuel containing sulfur is burned, sulfur is released into the atmosphere in the form of _{sulfur dioxide (SO 2 ), except as attached to the ashes.} This sulfur dioxide causes air pollution and causes acid rain on the earth, which has a detrimental effect on the environment.

In addition, nitrogen oxides are mainly generated by a reaction between basic oxygen and nitrogen present in the atmosphere at high temperatures where various processes are performed, and are mainly emitted in the form of nitrogen monoxide (NO). These nitrogen oxides not only cause acid rain, but also form ozone and photochemical smog.

Accordingly, in order to protect the environment, large-scale incineration facilities and power plants are usually equipped with a denitration device and a desulfurization device for treating fine dust and nitrogen oxides and sulfur oxides in exhaust gas.

Most of the desulfurization apparatuses are wet flue gas desulfurization apparatuses, and in the wet desulfurization process, the exhaust gas is brought into gas-liquid contact with an absorption fluid containing an alkali such as lime, and thus sulfur dioxide is absorbed and removed from the exhaust gas. At this time, although it is classified variously according to the gas-liquid contact method between the exhaust gas and the absorption fluid, the contact method of the spray method is widely used.

Republic of Korea Patent Publication No. 10-2019-0105283 (2019.09.17.)

SUMMARY OF THE INVENTION It is an object of the present invention to provide an exhaust gas treatment facility that efficiently removes fine dust and nitrogen oxides and sulfur oxides, which are substances caused by fine dust contained in exhaust gas.

In order to achieve the above object of the present invention, according to one aspect of the present invention, there is provided a gas treatment tank for absorbing nitrogen oxides and sulfur oxides contained in a gas to be treated in an aqueous alkali solution containing an alkali agent and simultaneously removing them; Before the gas to be treated is introduced into the gas treatment tank, an oxidizing agent aqueous solution containing an oxidizing agent is sprayed onto the gas to be treated in a spray form to oxidize nitrogen monoxide and sulfur dioxide contained in the gas to be treated to nitrogen dioxide and sulfur trioxide, respectively. Device; and a nitrogen dioxide treatment tank for removing nitrogen dioxide contained in the gas discharged from the gas treatment tank by reacting it with a reducing agent contained in the reducing agent aqueous solution, and the unreacted oxidizing agent in the sprayed oxidizing agent flows into the alkaline agent aqueous solution, An exhaust gas treatment facility for removing nitrogen oxides and sulfur oxides is provided for oxidizing residual nitrogen monoxide and sulfur dioxide in the gas to be treated into nitrogen dioxide and sulfur trioxide, respectively, introduced into the gas treatment tank.

According to the present invention, all of the objects of the present invention described above can be achieved. Specifically, before introducing the gas to be treated into a gas treatment tank that neutralizes and absorbs nitrogen dioxide and sulfur dioxide in sodium hydroxide aqueous solution, an aqueous solution containing chlorine dioxide, a strong oxidizing agent, is sprayed to oxidize nitrogen monoxide and sulfur dioxide into nitrogen dioxide and sulfur trioxide, respectively. By doing this, the neutralization reactivity with the alkali agent is improved, the nitrogen oxides and sulfur oxides trapping reactivity is increased, and a part of nitrogen dioxide remaining in the gas is treated with the reducing agent aqueous solution, thereby significantly improving the removal efficiency of nitrogen oxides and sulfur oxides.

1 is a block diagram showing the configuration of an exhaust gas treatment facility for removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention.
FIG. 2 is a diagram showing the configuration of the first processing apparatus shown in FIG. 1 .
FIG. 3 is a diagram showing the configuration of the second processing apparatus shown in FIG. 1 .
FIG. 4 is a diagram showing the configuration of the third processing apparatus shown in FIG. 1 .
FIG. 5 is a view showing the configuration of the first oxidizing agent spraying device shown in FIG. 1 .

Hereinafter, the configuration and operation of the embodiment of the present invention will be described in detail with reference to the drawings.

First, with reference to the drawings, a preferred embodiment of the present invention will be described in detail focusing on the configuration. 1 shows the configuration of an exhaust gas treatment facility for removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention. Referring to FIG. 1 , an exhaust gas treatment facility 100 for removing nitrogen oxides and sulfur oxides according to an embodiment of the present invention treats an exhaust gas G to be treated and discharges it as a primary treatment gas G1. A first gas processing unit 110a, a second gas processing unit 110b which processes the primary processing gas G1 discharged from the first gas processing unit 110a and discharges it as a secondary processing gas G2, and the second gas The third gas processing unit 110c that processes the secondary processing gas G2 discharged from the processing unit 110b and discharges it as the tertiary processing gas G3, and the first, second, and third gas processing units 110a and 110b , 110c) an oxidizing agent aqueous solution supply unit 170 for supplying an oxidizing agent aqueous solution to each, and an alkali agent supply unit 190 for supplying an alkali agent to each of the first and second gas processing units 110a and 110b, and a third gas processing unit 110c) and a reducing agent supply unit 195 for supplying a reducing agent to the furnace.

The first gas processing unit 110a processes the processing target exhaust gas G and discharges it as the primary processing gas G1. The first gas processing unit 110a includes a first oxidizing agent spraying device 175a that sprays an oxidizing agent on the exhaust gas G to be treated for oxidation treatment, and a first oxidation treatment gas that has passed through the first oxidizing agent spraying device 175a. A first gas treatment tank 120 for treating (G11) using the first treated water L1, which is an aqueous alkali solution, and a first exhaust fan 135a for discharging gas from the first gas treatment tank 120; , a first treated water circulation supply device 140a for circulating and supplying the first treated water L1 discharged from the first gas treatment tank 120 to the first gas treatment tank 120 .

The first oxidizing agent spraying device 175a performs oxidation treatment by spraying an oxidizing agent on the exhaust gas G to be treated. The first oxidizing agent spraying device 175a is installed in the introduction pipe 130 for introducing the exhaust gas G to be treated into the first gas treatment tank 120 , and in the introduction pipe 130 , the first gas treatment tank ( 120), the oxidizing agent aqueous solution is sprayed onto the exhaust gas (G) to be treated. In this embodiment, the oxidizing agent aqueous solution that the first oxidizing agent spraying device 175a sprays on the exhaust gas G to be treated is chlorine dioxide (ClO ₂ ) aqueous solution. The first oxidizing agent spraying device 175a receives an aqueous chlorine dioxide solution from the oxidizing agent aqueous solution supply unit 170 . Although not shown, the first oxidant spraying device 175a includes one or a plurality of spray nozzles for spraying an aqueous chlorine dioxide solution into the introduction pipe 130 . In this embodiment, it will be described that the high concentration chlorine dioxide aqueous solution of 0.6% is sprayed into the inside of the introduction pipe 130 by the first oxidizing agent spraying device 175a.

5 shows an embodiment of the first oxidant spraying device 175a. Referring to FIG. 5 , the first oxidant spraying device 175a is installed on the inlet pipe 130 , and includes a plurality of spray nozzles 1751a for spraying an aqueous chlorine dioxide solution into the inlet pipe 130 in a spray form. do. A plurality of spray nozzles (1751a) are arranged to be uniformly distributed along the longitudinal direction and the circumferential direction in the introduction pipe (130). It is preferable that each of the plurality of spray nozzles 1751a sprays the chlorine dioxide aqueous solution in the introduction tube 130 along the flow direction of the gas flowing in the introduction tube 130 . In the drawings, the first oxidizing agent spraying device 175a is described as being installed in a horizontally extending portion from the inlet pipe 130 , but it may be installed in a vertically extending portion otherwise in the inlet pipe 130 .

At least a portion of nitrogen monoxide (NO) included in the exhaust gas G to be treated flowing through the inlet pipe 130 is chlorine dioxide sprayed into the inlet pipe 130 by the first oxidizing agent spraying device 175a. It reacts with chlorine dioxide contained in the aqueous solution and _{is oxidized to nitrogen dioxide (NO 2} ), and the reaction of nitrogen monoxide and chlorine dioxide reacting to be oxidized to nitrogen monoxide is shown in Reaction Equation 1 below.

[Scheme 1]

5NO + 2ClO ₂ + H ₂ O → 5NO ₂ + 2HCl

_{In addition, at least a portion of the sulfur dioxide (SO 2} ) contained in the exhaust gas to be treated (G) flowing through the introduction pipe 130 is sprayed into the inside of the introduction pipe 130 by the first oxidant spraying device 175a It reacts with chlorine dioxide contained in the chlorine dioxide aqueous solution and _{is oxidized to sulfur trioxide (SO 3} ). The reaction of sulfur dioxide and chlorine dioxide reacting with chlorine dioxide to be oxidized to sulfur trioxide is shown in the following Reaction Equation 2-1.

[Scheme 2]

5SO ₂ + 2ClO ₂ + H ₂ O → 5SO ₃ + 2HCl

SO ₂ + ClO ₂ + 2H ₂ O → H ₂ SO ₄ + ClO + H ₂ O

The first oxidation treatment gas G11 in which at least a portion of nitrogen monoxide and sulfur dioxide is oxidized to nitrogen dioxide and sulfur trioxide, respectively, is introduced into the first gas treatment tank 120 through the first oxidizing agent spraying device 175a.

The first gas treatment tank 120 is a gas treatment tank in which nitrogen oxides and sulfur oxides contained in the first oxidation treatment gas G11 are absorbed into the first treated water L1, which is an aqueous alkali solution, and simultaneously removed. 2 shows the configuration of the first gas treatment tank 120 . Referring to FIG. 2 , the first gas treatment tank 120 provides a first internal space 120a in which the first treatment water L1 for treating the introduced first oxidation treatment gas G11 is stored. The first treated water L1 is an aqueous alkali agent solution in which an alkali agent is added to water. As the first inner space 120a, general industrial water may be supplied and used. In this embodiment, the first treated water (L1) will be described as an aqueous sodium hydroxide solution in which sodium hydroxide (NaOH), an alkali agent, is added to water. The first internal space 120a of the first processing device 120 includes a first storage space 121a and a storage space 2A 121b disposed in the lateral direction (horizontal direction) by the first partition wall 121 . is partitioned into A first connection passage 121c for communicating the 1A storage space 121a and the 2A storage space 121b is formed under the first partition wall 121 . A first intake port 122a is formed at the upper end of the 1A storage space 121a and communicates with the 1A storage space 121a and through which the first oxidation treatment gas G11 is introduced together with the first treatment water L1, A first exhaust port 122b communicating with the 2A storage space 121b and discharging gas is formed at an upper end of the 2A storage space 121b. A first connection pipe 131a connected to the second gas treatment tank 150 is connected to the first exhaust port 122b.

The first gas treatment tank 120 includes a first water tank 123 located in the 1A storage space 121a, a 1A water flow pipe 124 located in the 1A storage space 121a, and a 1A storage space. The first mixing barrel 125 located in (121a), the 2A water flow pipe 126 located in the 1A storage space 121a, and the first atomizing part located in the 2A storage space 121b ( 127), a plurality of first blocking plates 128 positioned in the 2A storage space 121b, and a first eliminator 129 positioned in the 2A storage space 121b. .

The first water tank 123 is located adjacent to the bottom of the first inlet 122a in the storage space 1A (121a). The first treated water L1 supplied from the first treated water circulation supply device 140a is temporarily stored in the first water tank 123 .

The 1A water flow pipe 124 is located under the first water tank 123 in the 1A storage space 121a. The 1A water flow pipe 124 has a shape that becomes narrower downward, and at the lower end of the 1A water flow pipe 124, the first treated water L1 and the first oxidation treatment gas introduced through the first intake port 122a ( A first A outlet (124a) for discharging the G11) downward is formed. As the gas and the first treated water L1 flow downward along the 1A water flow pipe 124 toward the 1A outlet 124a, the contact area between the gas and the first treated water L1 increases. In addition, an aqueous chlorine dioxide solution containing chlorine dioxide that does not react with nitrogen monoxide and sulfur dioxide in the introduction pipe 130 is also introduced through the first intake port 122a, and flows along the 1A water flow pipe 124 while The contact area between the gas and chlorine dioxide is increased to promote the reactions shown in Schemes 1 and 2 above, whereby nitrogen monoxide and sulfur dioxide are oxidized to nitrogen dioxide and sulfur trioxide, respectively.

The first mixing vessel 125 is located below the 1A outlet 124a formed in the 1A water flow pipe 124 in the 1A storage space 121a. The gas discharged through the 1A outlet 124a and the first treated water L1 are temporarily stored in the first mixing tank 125 .

The 2A water flow pipe 126 is located below the first mixing tube 125 in the 1A storage space 121a. The 2A water flow pipe 126 has a shape that becomes narrower toward the bottom, and a 2A outlet 126a for discharging the first treated water L1 and gas downward is formed at the lower end of the 2A water flow pipe 126 . As the gas and the first treated water L1 flow downward along the 2A water flow pipe 126 toward the 2A outlet 126a, the contact area between the gas and the first treated water L1 increases. In addition, while flowing along the 1A water flow pipe 124, the contact area between the gas and chlorine dioxide increases to promote the reactions shown in Reaction Equations 1 and 2 above, so that nitrogen monoxide and sulfur dioxide are oxidized to nitrogen dioxide and sulfur trioxide, respectively.

The first atomizing unit 127 is located in the 2A storage space 121b and converts the gas supplied from the 1A storage space 121a into a minute in the first treated water L1 stored in the 2A storage space 121b. By forming and spraying micro-bubbles (B) as bubbles, the reaction efficiency of sodium hydroxide, which is an alkali agent included in the first treated water (L1), and nitrogen oxides contained in the gas is improved. The first atomizing part 127 includes a first nozzle 127a extending from the first partition wall 121 and a first collision plate 127b positioned at the end of the first nozzle 127a. Due to the microbubbles B formed by the first atomizing part 127 , the contact area between the gas and the first treated water L1 in the storage space 2A 121b increases. In addition, the microbubbles B stay in the first treated water L1 of the 2A storage space 121b for a longer time than a general bubble. Accordingly, the reaction efficiency in the storage space 2A 121b is significantly increased.

The first nozzle 127a is positioned at a relatively lower portion of the storage space 2A 121a and is formed to protrude from the first partition wall 121 . A first inlet 1271a of the first nozzle 127a communicating with the storage space 1A 121a is formed in the first partition wall 121 . An end of the first nozzle 127a extends substantially vertically upward. The first nozzle 127a is formed to have a narrow inner diameter toward the end, so that the gas in the storage space 1A 121a flows toward the end of the first nozzle 127a and increases in speed. A first collision plate 127b is positioned adjacent to an end of the first nozzle 127a that forms the first outlet 127c.

The first collision plate 127b is positioned adjacent to the first outlet 127c, which is an end of the first nozzle 127a. The gas injected from the first nozzle 127a collides with the first collision plate 127b to form microbubbles B. In the present embodiment, the first collision plate 127b is described as having a two-stage structure in which two 1271b and 1272b are disposed in the vertical direction as shown, but the present invention is not limited thereto, and a single-stage structure or A structure having three or more stages is also within the scope of the present invention. In the case of a multi-stage structure, the first upper collision plate 1272b positioned above is larger to cover the entirety of the first lower collision plate 1271b positioned below, and at least one Preferably, the first passage 1273b is formed.

The plurality of first blocking plates 128 are arranged in layers on the first collision plate 127b in the storage space 2A 121b. The rapid rise of the first treated water L1 stored in the storage space 2A 121b is blocked by the plurality of first blocking plates 128 .

The first eliminator 129 is located between the first uppermost blocking plate 128 and the first exhaust port 122b among the plurality of first blocking plates 128 below in the storage space 2A 121b, to remove The first eliminator 129 is made of a synthetic resin material.

An outlet 1274 through which the first treated water L1 overflows and is discharged is formed on the sidewall of the second storage space 121b. The first treated water L1 discharged from the first treatment device 120 through the outlet 1274 is supplied to the first treated water circulation supply device 140a.

Referring to FIG. 1 , the first exhaust fan 135a is installed in the first connection pipe 131a to discharge gas from the first gas treatment tank 120 through the first exhaust port 122b in FIG. 2 . When the first exhaust fan 135a operates, the gas in the 2A storage space 121b of the first processing device 120a is discharged, so that the space above the water surface of the 1A storage space 121a and the 2A storage space 121b are discharged. There is a pressure difference between the space above the water surface of Accordingly, the water level of the first treated water L1 in the storage space 2A 121b rises and the water level of the first treatment water L1 decreases in the storage space 1A 121a.

The first treated water circulation and supply device 140a circulates the first aqueous alkali solution circulating and supplying the first treated water L1, which is an aqueous alkali solution discharged from the first gas treatment tank 120 , to the first gas treatment tank 120 . is the supply device. The first treated water circulation supply device 140a processes the first treated water storage tank 141a in which the first treated water L1 is stored, and the first treated water stored in the first treated water storage tank 141a for a first gas treatment. A first treated water circulation pump 145a sent to the tank 120 is provided.

The first treated water L1 discharged from the first treated water circulation supply device 140a is stored in the first treated water storage tank 141a. The first treated water L1 stored in the first treated water storage tank 141a is an aqueous alkali solution. The aqueous alkali agent solution used as the first treated water (L1) in this embodiment is sodium hydroxide (NaOH) aqueous solution. The alkaline agent sodium hydroxide is supplied to the first treated water storage tank 141a by the alkaline agent supply unit 190 . The first treated water L1 stored in the first treated water storage tank 141a is transferred to the first gas treatment tank 120 by the first treated water circulation pump 145a. The first treated water storage tank 141a may be supplied with general industrial water.

The first treated water circulation pump 145a stores the first treated water L1 stored in the first treated water storage tank 141a through the first treated water supply pipe 146a in the first gas treatment tank 120 . The space 121a is supplied through the first intake port 122a.

In the first gas treatment tank 120 in which sodium hydroxide (NaOH) is used as an alkali agent, a gas treatment reaction with an aqueous alkali solution of sodium hydroxide is the same as the following Reaction Equations 3, 4 and Reaction Equations.

[Scheme 3]

3NO ₂ + H ₂ O → 5HNO ₃ + NO

[Scheme 4]

NO ₂ + NO + (1/2)O ₂ + 2NaOH → NaNO ₂ + NaNO ₃ + H ₂ O

[Scheme 5]

SO ₂ + SO ₃ + 4NaOH → Na ₂ SO ₃ + Na ₂ SO ₄ + 2H ₂ O

Scheme 3 shows that nitrogen dioxide reacts with water in an aqueous sodium hydroxide solution to produce nitric acid (HNO ₃ ) and nitrogen monoxide.

Scheme 4 shows that sodium hydroxide in aqueous sodium hydroxide solution reacts with nitrogen dioxide and nitrogen monoxide to produce sodium nitrite (NaNO ₂ ) and sodium nitrate (NaNO ₃ ) to remove nitrogen oxides.

Scheme 5 shows that sodium hydroxide in an aqueous sodium hydroxide solution _{reacts with sulfur dioxide (SO 2} ) and sulfur trioxide (SO ₃ ) to produce sodium sulfite (Na ₂ SO ₃ ) and sodium sulfate (Na ₂ SO ₄ ) to remove sulfur oxides. . Sodium sulfite further reacts with oxygen to form sodium sulfate.

Schemes 3, 4 and 5 are micro-bubbles (B) in which the gas containing nitrogen oxides and sulfur oxides to be removed is fine bubbles in the first treated water L1 by the first atomizing unit 127 (B) ) is formed and the removal efficiency is improved because it occurs in the sprayed state.

Continuing to refer to FIG. 1 , the second gas processing unit 110b processes the primary processing gas G1 discharged from the first gas processing unit 110a and discharges it as the secondary processing gas G2 . The second gas processing unit 110b includes a second oxidizing agent spraying device 175b for oxidizing the primary processing gas G1 by spraying an oxidizing agent, and a second oxidation processing gas passing through the second oxidizing agent spraying device 175b. A second gas treatment tank 150 for treating (G12) using the second treated water L2, which is an aqueous alkali solution, and a second exhaust fan 135b for discharging gas from the second gas treatment tank 150; and a second treated water circulation supply device 140b for circulating and supplying the second treated water L2 discharged from the second gas treatment tank 150 to the second gas treatment tank 150 .

The second oxidizing agent spraying device 175b performs oxidation treatment by spraying the oxidizing agent into the primary processing gas G1. The second oxidizing agent spraying device 175b is installed in the first connection pipe 131a that communicates the first gas processing tank 120 and the second gas processing tank 150, and is formed in the first connection pipe 131a. 2 The oxidizing agent aqueous solution is sprayed on the primary processing gas G1 flowing into the gas processing tank 150 . In this embodiment, the oxidizing agent aqueous solution that the second oxidizing agent spraying device 175b sprays on the primary processing gas G1 is chlorine dioxide (ClO ₂ ) aqueous solution. The second oxidizing agent spraying device 175b receives an aqueous chlorine dioxide solution from the oxidizing agent aqueous solution supply unit 170 . Although not shown, the second oxidant spraying device 175b includes one or a plurality of nozzles for spraying an aqueous chlorine dioxide solution into the first connecting pipe 131a. The second oxidant spraying device 175b may have the same configuration as the first oxidizing agent spraying device 175a shown in FIG. 5 . In this embodiment, it will be described that a high concentration of 0.6% chlorine dioxide aqueous solution is sprayed into the inside of the first connection pipe 131a by the second oxidizing agent spraying device 175b. _{At least a portion of nitrogen monoxide (NO) and sulfur dioxide (SO 2} ) contained in the primary process gas (G1) flowing through the first connection pipe (131a) is the first connection pipe by the second oxidant spraying device (175b) (131a) reacts with chlorine dioxide contained in an aqueous solution of chlorine dioxide sprayed into the interior and _{is oxidized to nitrogen dioxide (NO 2} ) and sulfur trioxide (SO ₃ ), respectively, a reaction in which nitrogen monoxide and chlorine dioxide react to be oxidized to nitrogen monoxide and The reaction of sulfur dioxide and chlorine dioxide reacting to be oxidized to sulfur trioxide is the same as in Schemes 1 and 2 described above. The second oxidation treatment gas G12 in which at least a portion of nitrogen monoxide and sulfur dioxide is oxidized to nitrogen dioxide and sulfur trioxide, respectively, is introduced into the second gas treatment tank 150 through the second oxidant spraying device 175b.

The second gas treatment tank 150 is a gas treatment tank in which nitrogen oxides and sulfur oxides contained in the second oxidation treatment gas G12 are absorbed into the second treated water L2, which is an aqueous alkali solution, and simultaneously removed. 3 shows the configuration of the first gas treatment tank 150 . Referring to FIG. 3 together with FIG. 1 , the second gas treatment tank 150 has substantially the same configuration as the first gas treatment tank 120 illustrated in FIG. 2 , and processes the introduced second oxidation treatment gas G12 . to provide a second internal space 150a in which the second treated water L2 is stored. The second treated water L2 is an aqueous alkali agent solution in which an alkali agent is added to water. As the second inner space 150a, general industrial water may be supplied and used. In this embodiment, the second treated water (L2) will be described as an aqueous sodium hydroxide solution in which sodium hydroxide (NaOH), an alkali agent, is added to water like the first treated water (L1). The second internal space 150a of the second processing device 150 includes a 1B storage space 151a and a 2B storage space 151b that are arranged in the lateral direction (horizontal direction) by the second partition wall 151 . is partitioned into A second connection passage 151c for communicating the 1B storage space 151a and the 2B storage space 151b is formed under the second partition wall 151 . At the upper end of the 1B storage space 151a, a second intake port 152a is formed in communication with the 1B storage space 151a and through which the second oxidation treatment gas G12 is introduced together with the second treatment water L2, A second exhaust port 152b communicating with the 2B storage space 151b and discharging gas is formed at the upper end of the 2B storage space 151b. A second connection pipe 131b connected to the third gas treatment tank 160 is connected to the second exhaust port 152b.

The second gas treatment tank 150 includes a second water tank 153 located in the 1B storage space 151a, a 1B water flow pipe 154 located in the 1B storage space 151a, and a 1B storage space. A second mixing barrel 155 located in (151a), a 2B water flow pipe 156 located in the 1B storage space 151a, and a second atomizing unit located in the 2B storage space 151b ( 157), a plurality of second blocking plates 158 positioned in the 2B storage space 151b, and a second eliminator 159 positioned in the 2B storage space 151b. .

Since the detailed configuration and operation of the second gas treatment tank 150 are substantially the same as those of the first gas treatment tank 120 described above, a detailed description thereof will be omitted.

Referring to FIG. 1 , the second exhaust fan 135b is installed in the second connection pipe 131b to discharge gas from the second gas treatment tank 150 through the second exhaust port 152b in FIG. 3 . When the second exhaust fan 135b operates, the gas in the 2B storage space 151b of the second gas treatment tank 150 is discharged, so that the space above the water surface of the 1B storage space 151a and the 2B storage space 151b ), a pressure difference occurs between the space above the water surface. Accordingly, the water level of the second treated water L2 in the 2B storage space 151b rises and the water level of the second treated water L2 in the 1B storage space 151a falls.

The second treated water circulation supply device 140b circulates the second alkaline agent aqueous solution circulating and supplying the second treated water L2 that is the alkaline agent aqueous solution discharged from the second gas treatment tank 150 to the second gas treatment tank 150 . is the supply device. The second treated water circulation supply device 140b is configured to discharge the second treated water storage tank 141b in which the second treated water L2 is stored and the second treated water L2 stored in the second treated water storage tank 141b. 2 A second treated water circulation pump 145b sent to the gas treatment tank 150 is provided. The second treated water circulation supply device 140b is substantially the same as the configuration of the first treated water circulation supply device 140a described above.

The second treated water L2 discharged from the second gas treatment tank 150 is stored in the second treated water storage tank 141b. The second treated water L2 stored in the second treated water storage tank 141b is an aqueous alkali solution. The aqueous alkali agent solution used as the second treated water (L2) in this embodiment is sodium hydroxide (NaOH) aqueous solution. Sodium hydroxide, which is an alkali agent, is supplied to the second treated water storage tank 141b by the alkali agent supply unit 190 . The second treated water L2 stored in the second treated water storage tank 141b is transferred to the second gas treatment tank 150 by the second treated water circulation pump 145b. The second treated water storage tank 141b may be supplied with general industrial water.

The second treated water circulation pump 145b stores the second treated water L2 stored in the second treated water storage tank 141b through the second treated water supply pipe 146b to the first B storage of the second gas treatment tank 150 . The space 151a is supplied through the second intake port 152a.

In the second gas treatment tank 150 in which sodium hydroxide (NaOH) is used as an alkali agent, the gas treatment reaction with an aqueous alkali solution of sodium hydroxide is the same as Scheme 3, Scheme 4 and Scheme 5 described above, and accordingly, nitrogen oxide and Sulfur oxides are further removed.

Continuing to refer to FIG. 1 , the third gas processing unit 110c processes the secondary processing gas G2 discharged from the second gas processing unit 110b and discharges it as the final processing gas G3 . The third gas processing unit 110c includes a third oxidizing agent spraying device 175c for oxidizing the secondary processing gas G2 by spraying an oxidizing agent, and a third oxidation processing gas passing through the third oxidizing agent spraying device 175c. A third gas treatment tank 160 for treating (G23) using the third treated water L3, which is an aqueous reducing agent solution, and a third exhaust fan 135c for discharging gas from the third gas treatment tank 160; and a third treated water circulation supply device 140c that circulates and supplies the third treated water L3 discharged from the third gas treatment tank 160 to the third gas treatment tank 160 .

The third oxidizing agent spraying device 175c sprays an oxidizing agent to the secondary processing gas G2 for oxidation treatment. The third oxidizing agent spraying device 175c is installed in the second connection pipe 131b that communicates the second gas processing tank 150 and the third gas processing tank 160, and is formed in the second connection pipe 131b. 3 The oxidizing agent aqueous solution is sprayed on the secondary processing gas G2 flowing into the gas processing tank 160 . In this embodiment, the oxidizing agent aqueous solution that the third oxidizing agent spraying device 175c sprays on the secondary processing gas G2 is chlorine dioxide (ClO ₂ ) aqueous solution. The third oxidizing agent spraying device 175c receives an aqueous chlorine dioxide solution from the oxidizing agent aqueous solution supply unit 170 . Although not shown, the third oxidant spraying device 175c includes one or a plurality of nozzles for spraying the chlorine dioxide aqueous solution into the second connecting pipe 131b. The third oxidant spraying device 175c may have the same configuration as the first oxidizing agent spraying device 175a shown in FIG. 5 . In this embodiment, it will be described that a high concentration of 0.6% chlorine dioxide aqueous solution is sprayed into the inside of the second connection pipe 131b by the third oxidant spraying device 175c. _{At least some of nitrogen monoxide (NO) and sulfur dioxide (SO 2} ) contained in the secondary processing gas (G2) flowing through the second connection pipe (131b) is a second connection pipe by the third oxidant spraying device (175c) (131b) reacts with chlorine dioxide contained in the chlorine dioxide aqueous solution sprayed to the inside and _{is oxidized to nitrogen dioxide (NO 2} ) and sulfur trioxide (SO ₃ ), respectively, and the reaction of oxidizing to nitrogen monoxide by reacting nitrogen monoxide and chlorine dioxide The reaction in which sulfur dioxide and chlorine dioxide are oxidized to sulfur trioxide in half is shown in Schemes 1 and 2 described above. The third oxidation treatment gas G23 in which at least a portion of nitrogen monoxide and sulfur dioxide is oxidized to nitrogen dioxide and sulfur trioxide, respectively, is introduced into the third gas treatment tank 160 through the third oxidizing agent spraying device 175c.

The third gas treatment tank 160 is a nitrogen dioxide treatment tank for reducing the nitrogen dioxide contained in the third oxidation treatment gas G23 by absorbing it into the third treated water L3 that is an aqueous reducing agent solution. 4 shows the configuration of the third gas processing tank 160 . Referring to FIG. 4 together with FIG. 1 , the third gas treatment tank 160 has substantially the same configuration as the first gas treatment tank 120 illustrated in FIG. 2 , and processes the introduced third oxidation treatment gas G23 . to provide a third internal space 160a in which the third treated water L3 is stored. The third treated water L3 is an aqueous reducing agent solution in which a reducing agent is added to water. As the third inner space 160a, general industrial water may be supplied and used. In this embodiment, the third treated water (L3) is a sodium _{sulfite aqueous solution in which sodium sulfite (Na 2} SO ₃ ) is added as a reducing agent to water or a sulfide solution in which sodium sulfide (Na ₂ S) (emulsified soda) is added as a reducing agent to water. It is described as an aqueous sodium solution. The third internal space 160a of the third processing device 160 has a first C storage space 161a and a second C storage space 161b that are arranged in the lateral direction (horizontal direction) by the third partition wall 161 . is partitioned into A third connection passage 161c for communicating the 1C storage space 161a and the 2C storage space 161b is formed under the third partition wall 161 . At the upper end of the 1C storage space 161a, a third intake port 162a is formed in communication with the 1C storage space 161a and through which the third oxidation treatment gas G23 is introduced together with the third treatment water L3, A third exhaust port 162b communicating with the 2C storage space 161b and discharging gas is formed at the upper end of the 2C storage space 161b. An exhaust pipe 131c is connected to the third exhaust port 162b.

The third gas treatment tank 160 includes a third water tank 163 located in the 1C storage space 161a, a 1C water flow pipe 164 located in the 1C storage space 161a, and a 1C storage space. The third mixing vessel 155 located in the 161a, the 2C water flow pipe 166 located in the 1C storage space 161a, and the third atomizing part 167 located in the 2C storage space 161b ), a plurality of third blocking plates 168 positioned in the 2C storage space 161b, and a third eliminator 169 positioned in the 2C storage space 161b.

Since the detailed configuration and operation of the third gas treatment tank 160 are substantially the same as those of the first gas treatment tank 120 described above, a detailed description thereof will be omitted.

Referring again to FIG. 1 , the third exhaust fan 135c is installed in the exhaust pipe 131c to discharge gas from the third gas treatment tank 160 through the third exhaust port 162b in FIG. 4 . When the third exhaust fan 135c operates, the gas in the 2C storage space 161b of the third gas treatment tank 160 is discharged, so that the space above the water surface of the 1C storage space 161a and the 2C storage space 161b are discharged. ), a pressure difference occurs between the space above the water surface. Accordingly, the water level of the third treated water L3 in the 2C storage space 161b rises and the water level of the third treated water L3 in the 1C storage space 161a falls.

The third treated water circulation supply device 140c circulates and supplies the third treated water L3 that is the reducing agent aqueous solution discharged from the third gas treatment tank 160 to the third gas treatment tank 160 which is the nitrogen dioxide treatment tank. It is a circulating supply. The third treated water circulation supply device 140c is configured to remove the third treated water storage tank 141c in which the third treated water L3 is stored and the third treated water L3 stored in the third treated water storage tank 141c. 3 A third treated water circulation pump 145c sent to the gas treatment tank 160 is provided. The third treated water circulation supply device 140c is substantially the same as the configuration of the first treated water circulation supply device 140a described above.

The third treated water L3 discharged from the third gas treatment tank 160 is stored in the third treated water storage tank 141c. The third treated water L3 stored in the third treated water storage tank 141c is an aqueous reducing agent solution. In this embodiment, the reducing agent aqueous solution used as the third treated water (L3) is sodium sulfite (Na ₂ SO ₃ ) aqueous solution or sodium sulfide (Na ₂ S) aqueous solution. The reducing agent, sodium sulfite or sodium sulfide, is supplied to the third treated water storage tank 141c by the reducing agent supply unit 195 . The third treated water L3 stored in the third treated water storage tank 141c is transferred to the third gas treatment tank 160 by the third treated water circulation pump 145c. The third treated water storage tank 141c may be supplied with general industrial water.

The third treated water circulation pump 145c stores the third treated water L3 stored in the third treated water storage tank 141c through the third treated water supply pipe 146c in the first C storage of the third gas treatment tank 160 . The space 161a is supplied through the third intake port 162a.

When sodium sulfite (Na ₂ SO ₃ ) is used as the reducing agent, the nitrogen oxide treatment reaction by the sodium sulfite aqueous solution, which is the reducing agent aqueous solution, in the third gas treatment tank 160 is shown in the following Reaction Equation 6.

[Scheme 6]

2NO ₂ + 4Na ₂ SO ₃ → N ₂ + 4Na ₂ SO ₄

Scheme 6 shows that sodium sulfite (Na ₂ SO ₃ ) in an _{aqueous sodium sulfite solution reacts with nitrogen dioxide (NO 2} ) to produce nitrogen (N ₂ ) and sodium sulfate (Na ₂ SO ₄ ), thereby removing nitrogen dioxide.

When sodium sulfide (Na ₂ S) is used as the reducing agent, the nitrogen oxide treatment reaction by the reducing agent aqueous sodium sulfide aqueous solution in the third gas treatment tank 160 is shown in the following Reaction Equation 7.

[Scheme 7]

2NO ₂ + Na ₂ S → N ₂ + Na ₂ SO ₄

Scheme 7 shows that sodium sulfide (Na ₂ S) in an _{aqueous solution of sodium sulfide reacts with nitrogen dioxide (NO 2} ) to produce nitrogen (N ₂ ) and sodium sulfate (Na ₂ SO ₄ ) to remove nitrogen dioxide.

The oxidizing agent aqueous solution supply unit 170 supplies an oxidizing agent aqueous solution to each of the first oxidizing agent spraying device 175a, the second oxidizing agent spraying device 175b, and the third oxidizing agent spraying device 175c. The oxidizing agent aqueous solution supply unit 170 is a supply pipe connecting the oxidizing agent aqueous solution storage tank 171 in which the oxidizing agent aqueous solution is stored, the oxidizing agent aqueous solution storage tank 171 and the first, second, and third oxidizing agent spray devices 175a, 175b, 175c. (173) and the oxidizing agent supply pump 172 for sending the oxidizing agent aqueous solution stored in the oxidizing agent aqueous solution storage tank 171 to the first, second, and third oxidizing agent spraying devices 175a, 175b, 175c through the supply pipe part 173 to provide

The oxidizing agent aqueous solution storage tank 171 stores the chlorine dioxide aqueous solution which is an oxidizing agent aqueous solution supplied to the first, second, and third oxidizing agent spraying devices 175a, 175b, 175c. The chlorine dioxide aqueous solution stored in the oxidizing agent aqueous solution storage tank 171 is supplied to the first, second, and third oxidizing agent spraying devices 175a, 175b, and 175c by the oxidizing agent supply pump 172 through the supply pipe part 173 .

The supply pipe part 173 connects the oxidizing agent aqueous solution storage tank 171 and the first, second, and third oxidizing agent spraying devices 175a, 175b, and 175c. The chlorine dioxide aqueous solution stored in the oxidizing agent aqueous solution storage tank 171 through the supply pipe part 173 is supplied to the first, second, and third oxidizing agent spraying devices 175a, 175b, 175c. The supply pipe part 173 includes a main solution supply pipe 173 extending from the oxidizing agent aqueous solution storage tank 171, and first, second, and third individual solution supply pipes 173a, 173b, which branch and extend from the main solution supply pipe 173, 173c). The first individual solution supply pipe 173a communicates with the first oxidant spraying device 175a, the second individual solution supply pipe 173b communicates with the second oxidant spraying device 175b, and a third individual solution supply pipe 173c is in communication with the third oxidant spraying device 175c. Accordingly, the chlorine dioxide aqueous solution stored in the oxidizing agent aqueous solution storage tank 171 is supplied to the first oxidizing agent spraying device 175a through the main solution supply pipe 173 and the first individual solution supply pipe 173a, and the main solution supply pipe 173 ) and the second individual solution supply pipe 173b are supplied to the second oxidizer spraying device 175b, and through the main solution supply pipe 173 and the third individual solution supply pipe 173c to the third oxidant spraying device 175c. is supplied A first flow rate control valve 174b is installed in the second individual solution supply pipe 173b, so that the amount of chlorine dioxide aqueous solution sprayed to the second oxidant spraying device 175b is adjusted according to the nitrogen oxide treatment rate in the first gas processing unit 110a can be In addition, a second flow rate control valve 174c is installed in the third individual solution supply pipe 173c, so that the amount of chlorine dioxide aqueous solution sprayed to the third oxidant spraying device 175b according to the nitrogen oxide treatment rate in the second gas processing unit 110b This can be adjusted. The first flow rate control valve 174b and the second flow rate control valve 174c may be formed of an on/off valve. Although not shown, a flow rate control valve or an on/off valve is also installed in the first individual solution supply pipe 173a so that the amount of the chlorine dioxide aqueous solution supplied to the first oxidizing agent spraying device 175a can be adjusted.

The alkali agent supply unit 190 supplies sodium hydroxide as an alkali agent to the first treated water storage tank 141a and the second treated water storage tank 141b. The alkali agent supply unit 190 may be configured such that the amount of the alkali agent supplied to each of the first treated water storage tank 141a and the second treated water storage tank 141b is independently adjusted.

_{The reducing agent supply unit 195 supplies sodium sulfite (Na 2} SO ₃ ) or sodium sulfide (Na ₂ S) as a reducing agent to the third treated water storage tank 141c. The reducing agent supply unit 195 may be configured to adjust the amount of the reducing agent supplied to the third treated water storage tank (141c).

Now, with reference to Figs. 1 to 4, the above embodiment described above as a center of construction will be described as a center of action.

Initially, the first inner space 120a of the first gas treatment tank 120 , the second inner space 150a of the second gas treatment tank 150 , and the third inner space of the third gas treatment tank 160 ( 160a), each of the treated water (L1, L2, L3) is filled up to the position indicated by the dotted line as shown in FIGS. 2, 3 and 4, respectively, and nitrogen oxides (NO _X ) and sulfur oxides (SO _X ) As the exhaust gas (G) to be treated including, passes through the first oxidizing agent spraying device 175a, nitrogen monoxide is oxidized to nitrogen dioxide and sulfur dioxide is oxidized to sulfur trioxide, and then the first intake port 122a of the first gas treatment tank 120 is introduced into the storage space 1A 121a through the In this state, when the first exhaust fan 135a, the second exhaust fan 135b, and the third exhaust fan 135c operate, the first gas processing tank 120, the second gas processing tank 150, and the second exhaust fan are operated. 3 The gas treatment tank 160 operates in the form shown in FIGS. 2, 3, and 4, respectively.

First, describing the operation of the first gas treatment tank 120 shown in detail in FIG. 2 , the water level of the first A storage space 121a is lowered by the operation of the first exhaust fan 135a and the second A storage space ( The water level of 121b) increases, so that a water level difference occurs between the two storage spaces 121a and 121b. The water level in the storage space 121b 2A rises above the first collision plate 127b and the water level in the storage space 1A 121a is lowered to form a first partition wall 121 in the storage space 1A 121a. The first inlet 1271a of the nozzle 127a is opened. Accordingly, the gas of the storage space 1A 121a passes through the first nozzle 127a and is strongly sprayed upward from the storage space 2A 121b. The gas injected from the first nozzle 127a collides with the plurality of first collision plates 127b to form microbubbles B. As the gas is formed into microbubbles (B) and injected, the contact area between the gas and the first treated water (L1) is increased, so that sodium hydroxide as an alkali agent contained in the first treated water (L1) and nitrogen oxides contained in the gas and The reaction efficiency of sulfur oxide is improved. In addition, the microbubbles B stay in the first treated water L1 of the 2A storage space 121b for a longer time than a general bubble. Accordingly, the oxidation reaction efficiency in the storage space 2A 121b is significantly increased.

The primary processing gas G1 discharged from the first gas processing tank 120 passes through the second oxidizer spraying device 175b, and after nitrogen monoxide included in the first processing gas G1 is oxidized to nitrogen dioxide, the second It flows into the 1B storage space 151a through the first intake port 152a of the gas treatment tank 150 .

When explaining the operation of the second gas treatment tank 150 shown in detail in FIG. 3 , the water level of the first B storage space 151a is lowered by the operation of the second exhaust fan 135b and the second B storage space 151b is operated. The water level of is increased so that a water level difference occurs between the two storage spaces 151a and 151b. The water level in the 2B storage space 151b rises above the second collision plate 157b and the water level in the 1B storage space 151a lowers, so that the second partition wall 151 is formed in the 1B storage space 151a. The second inlet 1571a of the nozzle 157a is opened. Accordingly, the gas of the 1B storage space 151a introduced through the second intake port 152a passes through the second nozzle 157a and is strongly sprayed upward from the 2B storage space 151b. The gas injected from the second nozzle 157a collides with the plurality of second collision plates 157b to form microbubbles B. As the gas is formed into microbubbles (B) and sprayed, the contact area between the gas and the second treated water (L2) is increased, so that sodium hydroxide as an alkali agent contained in the second treated water (L2) and nitrogen oxides contained in the gas and The reaction efficiency of sulfur oxide is improved. In addition, the microbubbles B stay in the second treated water L2 of the 2B storage space 151b for a longer time than normal bubbles. Accordingly, the removal efficiency of nitrogen oxides and sulfur oxides in the 2B storage space 151b is significantly increased.

The secondary processing gas G2 discharged from the second gas processing tank 150 passes through the third oxidizing agent spraying device 175c, and after nitrogen monoxide included in the second processing gas G2 is oxidized to nitrogen dioxide, the third It flows into the 1C storage space 161a through the first intake port 162a of the gas treatment tank 160 .

When explaining the operation of the third gas treatment tank 160 illustrated in detail in FIG. 4 , the water level of the 1C storage space 161a is lowered by the operation of the third exhaust fan 135c and the 2C storage space 161b is lowered. The water level of is increased, so that a water level difference occurs between the two storage spaces 161a and 161b. The water level in the 2C storage space 161b rises above the third collision plate 167b and the water level in the 1C storage space 161a lowers, so that the third partition wall 161 is formed in the first C storage space 161a. A third inlet 1571a of the nozzle 167a is opened. Accordingly, the gas of the 1C storage space 161a introduced through the third intake port 162a passes through the third nozzle 167a and is strongly sprayed upward from the 2C storage space 161b. The gas injected from the third nozzle 167a collides with the plurality of third collision plates 167b to form microbubbles B. As the gas is formed into microbubbles (B) and injected, the contact area between the gas and the third treated water (L3) increases, so that sodium sulfite or sodium sulfide, which is a reducing agent included in the second treated water (L3), and the gas contained in the gas The reaction efficiency of nitrogen dioxide is improved. In addition, the microbubbles B stay in the third treated water L3 of the 2C storage space 161b for a longer time than the general bubbles. Accordingly, the removal efficiency of nitrogen dioxide in the second C storage space 161b is significantly increased.

The exhaust gas treatment facility 100 for removing nitrogen oxides and sulfur oxides shown in FIG. 1 removes nitrogen oxides and sulfur oxides contained in the exhaust gas (G) to be treated, and at the same time, included in the exhaust gas (G) to be treated. Dust including fine dust can also be removed. Dust including fine dust included in the exhaust gas G to be treated is absorbed in the treated water L1, L2, and L3 of each gas treatment tank 12, 150, 160 and may be collected in a wet manner.

In the above embodiment, it is described that there are three gas processing units 110a, 110b, and 110c, but the present invention is not limited thereto, and two or less or four or more may be used, and this also falls within the scope of the present invention. When two or more gas processing units are used, they are preferably used in series as in this embodiment of three.

In the above embodiment, it is described that the first, second, and third exhaust fans 135a, 135b, and 135c are provided in correspondence with the first, second, and third gas treatment tanks 120, 150, and 160, respectively. Alternatively, the first and second exhaust fans 135a and 135b may not be provided, but only the third exhaust fan 135c may be provided, which is also within the scope of the present invention.

In the above embodiment, it is described that the first gas treatment tank 120 and the second gas treatment tank 150 process the gas using an alkali agent, and the third gas treatment tank 160 processes the gas using a reducing agent. However, unlike this, the first gas treatment tank 120 processes the gas using an alkali agent, and the second gas treatment tank 150 and the third gas treatment tank 160 are configured to process the gas using a reducing agent. and this is also within the scope of the present invention. That is, according to the present invention, at least one gas treatment tank for treating gas using an alkali agent is provided on the upstream side, and at least one gas treatment tank for treating gas using a reducing agent is provided on the downstream side.

Although the present invention has been described through the above examples, the present invention is not limited thereto. The above embodiments may be modified or changed without departing from the spirit and scope of the present invention, and those skilled in the art will recognize that such modifications and changes also belong to the present invention.

100: exhaust gas treatment facility 110a: first gas treatment unit
110b: second gas processing unit 110c: third gas processing unit
120: first gas treatment tank 150: second gas treatment tank
160: third gas treatment tank 135a: first exhaust fan
135b: second exhaust fan 135c: third exhaust fan
140a: first treated water circulation supply device 140b: second treated water circulation supply device
140c: third treated water circulation supply unit 170: oxidizing agent aqueous solution supply unit
175a: first oxidizing agent spraying device 175b: second oxidizing agent spraying device
175c: third oxidizing agent spraying device 190: alkali agent supply unit
195: reducing agent supply unit

Claims (13)

a gas treatment tank for simultaneously removing nitrogen oxides and sulfur oxides contained in the gas to be treated by absorbing them into an aqueous alkali solution containing an alkali agent;
Before the gas to be treated is introduced into the gas treatment tank, an oxidizing agent aqueous solution containing an oxidizing agent is sprayed onto the gas to be treated in a spray form to oxidize nitrogen monoxide and sulfur dioxide contained in the gas to be treated to nitrogen dioxide and sulfur trioxide, respectively. Device; and
and a nitrogen dioxide treatment tank for removing nitrogen dioxide contained in the gas discharged from the gas treatment tank by reacting with a reducing agent contained in the reducing agent aqueous solution,
The unreacted oxidizing agent in the sprayed oxidizing agent is introduced into the aqueous alkali solution, and the residual nitrogen monoxide and sulfur dioxide in the gas to be treated introduced into the gas treatment tank are oxidized to nitrogen dioxide and sulfur trioxide, respectively,
The gas treatment tank includes a water flow pipe through which the gas to be treated passes together with the unreacted oxidizing agent and the alkaline agent aqueous solution,
The unreacted oxidizing agent oxidizes nitrogen monoxide contained in the gas to be treated to nitrogen dioxide while passing through the water flow pipe in the form of an aqueous solution,
Exhaust gas treatment facility for removing nitrogen oxides and sulfur oxides. The method according to claim 1,
The reducing agent is sodium sulfite (Na ₂ SO ₃ ) or sodium sulfide (Na ₂ S),
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
The oxidizing agent is chlorine dioxide (ClO ₂ ),
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
The alkali agent is sodium hydroxide (NaOH),
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
The oxidizer spraying device is installed in an introduction pipe for introducing the gas to be treated into the gas treatment tank, and sprays the oxidizing agent aqueous solution into the gas to be treated flowing in the introduction pipe,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
Further comprising an exhaust fan for discharging gas from each of the gas treatment tank and the nitrogen dioxide treatment tank,
Each of the gas treatment tank and the nitrogen dioxide treatment tank includes a first storage space communicating with an intake port through which gas is introduced and storing treated water, and a second storage space communicating with a first exhaust port through which gas is discharged and storing the treated water; and an atomizing unit located in the second storage space and communicating with the first storage space, between the space above the water surface of the first storage space and the space above the water surface of the second storage space by the operation of the exhaust fan As a pressure difference occurs, the water level in the second storage space increases and the water level in the first storage space decreases, so that the gas in the first storage space forms microbubbles by the atomizing unit and enters the second storage space. sprayed with the stored aqueous solution,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
The gas treatment tank is a plurality,
The plurality of gas treatment tanks are connected in series,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. 8. The method of claim 7,
The oxidizer spraying device is installed corresponding to the gas treatment tank disposed at the most upstream of the plurality of gas treatment tanks,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. The method according to claim 1,
Before the gas discharged from the gas treatment tank flows into the nitrogen dioxide treatment tank, an oxidizing agent aqueous solution containing an oxidizing agent is sprayed onto the gas in the form of a spray, and nitrogen monoxide and sulfur dioxide contained in the gas discharged from the gas treatment tank are respectively applied to nitrogen dioxide and sulfur trioxide. Further comprising an additional oxidizing agent spraying device to oxidize to
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. 10. The method of claim 9,
Further comprising an oxidizing agent aqueous solution supply unit for supplying the oxidizing agent aqueous solution to each of the oxidizing agent spraying device and the additional oxidizing agent spraying devices,
The oxidizing agent aqueous solution supply unit controls the amount of the oxidizing agent aqueous solution supplied to each of the oxidizing agent spraying device and the additional oxidizing agent spraying devices,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. 11. The method of claim 10,
The oxidizing agent aqueous solution supply unit further comprising a valve for controlling the amount of the oxidizing agent aqueous solution supplied to each of the oxidizing agent spraying device and the additional oxidizing agent spraying device,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal. delete The method according to claim 1,
The water pipe has a shape that becomes narrower as it goes down,
Exhaust gas treatment facility for nitrogen oxide and sulfur oxide removal.

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