KR102465485B1 - Method of forming corrosion resistance and superhydrophobic oxide film on the surface of stainless steel for water and sewage materials - Google Patents
Method of forming corrosion resistance and superhydrophobic oxide film on the surface of stainless steel for water and sewage materials Download PDFInfo
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- KR102465485B1 KR102465485B1 KR1020210069055A KR20210069055A KR102465485B1 KR 102465485 B1 KR102465485 B1 KR 102465485B1 KR 1020210069055 A KR1020210069055 A KR 1020210069055A KR 20210069055 A KR20210069055 A KR 20210069055A KR 102465485 B1 KR102465485 B1 KR 102465485B1
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- stainless steel
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- 238000005260 corrosion Methods 0.000 title claims abstract description 47
- 230000007797 corrosion Effects 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 229910001220 stainless steel Inorganic materials 0.000 title claims abstract description 32
- 239000010935 stainless steel Substances 0.000 title claims abstract description 31
- 239000000463 material Substances 0.000 title claims abstract description 24
- 230000003075 superhydrophobic effect Effects 0.000 title claims abstract description 20
- 239000010865 sewage Substances 0.000 title claims description 19
- 238000002048 anodisation reaction Methods 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 23
- 239000002094 self assembled monolayer Substances 0.000 claims description 23
- 239000013545 self-assembled monolayer Substances 0.000 claims description 23
- 238000000576 coating method Methods 0.000 claims description 19
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- VIFIHLXNOOCGLJ-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl VIFIHLXNOOCGLJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000007743 anodising Methods 0.000 claims description 9
- 230000005764 inhibitory process Effects 0.000 claims description 8
- 101710162828 Flavin-dependent thymidylate synthase Proteins 0.000 claims description 7
- 101710135409 Probable flavin-dependent thymidylate synthase Proteins 0.000 claims description 7
- 229910017855 NH 4 F Inorganic materials 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 6
- 238000009832 plasma treatment Methods 0.000 claims description 5
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- RCHUVCPBWWSUMC-UHFFFAOYSA-N trichloro(octyl)silane Chemical compound CCCCCCCC[Si](Cl)(Cl)Cl RCHUVCPBWWSUMC-UHFFFAOYSA-N 0.000 claims description 2
- 239000011148 porous material Substances 0.000 abstract description 17
- 230000008569 process Effects 0.000 abstract description 5
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- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000010801 machine learning Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000000059 patterning Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 44
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000005259 measurement Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910021607 Silver chloride Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- -1 oxygen ions Chemical class 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
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- 239000005871 repellent Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- 241000931705 Cicada Species 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000000349 field-emission scanning electron micrograph Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/142—Pretreatment
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03B—INSTALLATIONS OR METHODS FOR OBTAINING, COLLECTING, OR DISTRIBUTING WATER
- E03B7/00—Water main or service pipe systems
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03F—SEWERS; CESSPOOLS
- E03F3/00—Sewer pipe-line systems
- E03F3/04—Pipes or fittings specially adapted to sewers
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Water Supply & Treatment (AREA)
- Public Health (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrochemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Description
본 발명은 파이프, 밸브, 필터 등의 상하수도 자재용 스테인리스 스틸 표면에 내식성 및 초소수성 산화막을 형성하는 방법에 관한 것으로, 본 발명에서 얻은 양극산화처리 조건 데이터들은 스테인리스 스틸 표면처리 기술 개발을 위한 머신러닝(Machine learning) 데이터베이스로 유용할 수 있다.The present invention relates to a method of forming a corrosion-resistant and superhydrophobic oxide film on a stainless steel surface for water and sewage materials such as pipes, valves, filters, etc. (Machine learning) It can be useful as a database.
스테인리스 스틸은 크롬을 첨가하여 녹이 슬지 않는 금속 합금으로 가공성, 경제성 및 우수한 내식성 등의 특성을 가지므로 해양, 기계, 전자 부품, 배관, 발전, 원자력 등 여러 산업분야에서 활용되고 있다. 그러나 스테인리스 스틸은 이와 같은 장점에도 불구하고 가스 배관 및 해양산업 등 혹독한 환경과 같은 환경에서 내식성이 취약하다는 단점을 가지고 있다.Stainless steel is a metal alloy that does not rust by adding chromium, and has characteristics such as machinability, economy, and excellent corrosion resistance. However, despite these advantages, stainless steel has a disadvantage in that it has poor corrosion resistance in harsh environments such as gas pipelines and marine industries.
이런 단점을 해결하기 위해 내식성을 향상하기 위한 부식 방지 표면처리 기술 연구가 활발히 이루어지고 있다. 최근 젖음성 거동을 이용한 연구를 통해 초발수성 표면을 구현하는 연구가 주목받고 있다.In order to solve these shortcomings, research on anti-corrosion surface treatment technology to improve corrosion resistance is being actively conducted. Recently, research using a wettability behavior to implement a superhydrophobic surface is attracting attention.
초발수성 표면은 발수성(Water Repellency), 자기세정(Self-Cleaning), 발유성(Oil Repellency), 결빙방지(Anti-Icing), 착상방지(Anti-Frost)등 여러가지 특성을 활용할 수 있으며, 첨단 디스플레이, 광학필름, 반도체, 박막 코팅 등 다양한 산업에서 이용할 수 있다.The super water-repellent surface can utilize various characteristics such as water repellency, self-cleaning, oil repellency, anti-icing, anti-frost, etc. , optical film, semiconductor, thin film coating, etc. can be used in various industries.
젖음성 거동은 소재의 표면에너지에 의해 결정되며, 표면 에너지를 감소시켜 표면 접촉각이 150° 이상이 되어 초발수성이 구현된다. 이와 같은 초발수성 표면은 연 꽃잎, 매미날개, 벼 잎 등 여러가지 자연 소재를 보고 개발되었으며, 마이크로 및 나노크기의 구조를 제작하여 표면에너지를 감소시켜 제작하는 등 다양한 방법들이 연구되고 있다.Wettability behavior is determined by the surface energy of the material, and by reducing the surface energy, the surface contact angle becomes more than 150° to realize super water repellency. Such a superhydrophobic surface was developed by looking at various natural materials such as lotus petals, cicada wings, and rice leaves, and various methods are being studied, such as fabricating micro- and nano-sized structures to reduce surface energy.
하지만 금속에 마이크로 및 나노 크기의 구조물을 균일하게 구현할 수 있는 방법이 제한적이다. 다양한 표면처리법 중 양극산화 방법은 금속에 인위적으로 균일하고 두꺼운 산화 피막을 형성시킬 수 있다.However, methods for uniformly implementing micro- and nano-sized structures on metal are limited. Among the various surface treatment methods, the anodization method can artificially form a uniform and thick oxide film on the metal.
양극산화 법으로 만들어진 산화피막은 장벽형 피막과 기공형 피막으로 나누어지며, 장벽형 피막은 기공과 같은 빈 공간 없이 산화막 내부가 치밀하게 형성된 피막을 말하며, 기공형 피막은 기공구조가 규칙적으로 배열되는 나노 구조를 가지는 다공성 피막과 기공과 기공사이에 빈공간이 존재하는 나노 튜브형 피막으로 나누어진다.The oxide film made by the anodization method is divided into a barrier film and a pore film. The barrier film refers to a film in which the inside of the oxide film is densely formed without empty spaces such as pores. It is divided into a porous film having a nanostructure and a nanotubular film in which pores and empty spaces exist between pores.
여기서, 상기 양극산화는 금속의 표면 처리방법 중 가장 널리 알려진 처리방법의 하나로서, 전해액에 침적된 금속 모재를 양극으로 하여 통전하는 경우, 양극에서 발생하는 산소에 의하여 모재의 표면이 산화되면서 산화피막을 형성하여 모재의 물성을 향상하는 처리방법이다.Here, the anodic oxidation is one of the most widely known treatment methods among the surface treatment methods of metal. When electricity is energized using a metal base material immersed in an electrolyte as an anode, the surface of the base material is oxidized by oxygen generated from the anode to form an oxide film. It is a treatment method to improve the physical properties of the base material by forming
즉, 상기 전해액 중의 산소이온이나 수산이온이 모재의 표면에 형성되어 있던 산화피막으로 침투하여 금속이온과 결합하여 산화층을 형성함으로써, 상기 모재와 상기 산화층의 계면 부근에 기공성의 산화피막과 수산화피막이 성장하여 상기 모재의 물성을 더욱 향상시키게 되는 것이다.That is, oxygen ions or hydroxide ions in the electrolyte penetrate into the oxide film formed on the surface of the base material and combine with metal ions to form an oxide layer, whereby a porous oxide film and hydroxide film grow near the interface between the base material and the oxide layer. Thus, the physical properties of the base material are further improved.
양극산화에 의해 금속 모재의 물성을 증대함에 있어서, 상기 양극산화의 가장 핵심적인 변수로는 양극산화처리 전압, 시간, 그리고 모재 금속의 순도와 같은 다양한 함수를 적절히 세팅하는 것이 무엇보다도 중요하다.In increasing the physical properties of the metal base material by anodization, it is most important to properly set various functions such as anodization voltage, time, and purity of the base metal as the most essential parameters of the anodization.
스테인리스 스틸에도 성분 함량에 따라 다양한 합금 종류가 있고, 성분 함량에 따라서 목적하는 양극산화처리의 조건은 달라질 수 있어, 처리대상 모재의 성분 함량은 매우 중요하다 할 수 있다.Stainless steel also has various types of alloys depending on the component content, and the desired conditions for anodization may vary depending on the component content, so the component content of the base material to be treated is very important.
본 발명자는 상하수도 자재용 SUS 304계열 스테인리스 스틸을 모재로 하여 양극산화처리 시간 및 전압을 최적화하여 초소수성 및 부식 억제율이 향상된 양극산화막을 형성하는 조건을 알아내고, 본 발명을 완성하였다.The present inventors found conditions for forming an anodized film with improved superhydrophobicity and corrosion inhibition rate by optimizing the anodization time and
본 발명의 목적은 상하수도 자재용 스테인리스 스틸 표면에 내식성(Corrosion resistance) 및 초소수성 산화막을 형성하는 방법을 제공하는 것이다.It is an object of the present invention to provide a method of forming a corrosion resistance and superhydrophobic oxide film on a stainless steel surface for water and sewage materials.
본 발명의 다른 목적은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 파이프를 제공하는 것이다.Another object of the present invention is to provide a pipe for water and sewage in which a corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
본 발명의 다른 목적은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 밸브를 제공하는 것이다.Another object of the present invention is to provide a valve for water supply and sewerage in which the corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
본 발명의 다른 목적은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 필터를 제공하는 것이다.Another object of the present invention is to provide a filter for water and sewage in which the corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
상기 목적을 달성하기 위하여,In order to achieve the above object,
본 발명은 상하수도 자재용 스테인리스 스틸 표면을 세척하고 건조하는 단계(단계 1);The present invention comprises the steps of washing and drying the stainless steel surface for water and sewage materials (step 1);
65-75 V 인가 전압에서 2.5-3.5 시간 동안 양극산화처리하여, 스테인리스 스틸 표면에 양극산화막을 형성하는 단계(단계 2);forming an anodization film on the stainless steel surface by anodizing at a voltage of 65-75 V for 2.5-3.5 hours (step 2);
플라즈마 처리하여 유기 잔여물을 제거하고 양극산화막 표면을 친수성으로 만드는 단계(단계 3); 및Plasma treatment to remove organic residues and make the surface of the anodized film hydrophilic (step 3); and
SAM(Self-Assembled Monolayer) 코팅 가능한 소수성 코팅제로 코팅하는 단계(단계 4);를 포함하는,Including the; SAM (Self-Assembled Monolayer) coating with a coatingable hydrophobic coating agent (step 4);
상하수도 자재용 스테인리스 스틸 표면에 내식성(Corrosion resistance) 및 초소수성 산화막을 형성하는 방법을 제공한다.A method of forming a corrosion-resistant and super-hydrophobic oxide film on a stainless steel surface for water and sewage materials is provided.
상기 상하수도 자재는 파이프, 밸브, 필터 등을 사용할 수 있다.The water and sewage material may be a pipe, a valve, a filter, and the like.
상기 스테인리스 스틸은 다양한 스테인리스 스틸에 적용가능하나, 바람직하게는 SUS 304 또는 SUS 304L에 적용할 수 있다.The stainless steel is applicable to various stainless steels, preferably
상기 단계 2의 양극산화처리에서 전해질(electrolyte)은 0.05-0.15M의 NH4F, 0.05-0.15M의 물이 포함된 에틸렌글리콜을 사용할 수 있고, 바람직하게는 0.08-0.12M의 NH4F, 0.08-0.12M의 물이 포함된 에틸렌글리콜을 사용할 수 있으며, 더욱 바람직하게는 0.09-0.11M의 NH4F, 0.09-0.11M의 물이 포함된 에틸렌글리콜을 사용할 수 있고, 본 발명에서는 일례로서 0.1M의 NH4F, 0.1M의 물이 포함된 에틸렌글리콜을 전해질로서 사용하였으나 이에 제한하지 않는다.In the anodization treatment of step 2, the electrolyte may be 0.05-0.15M of NH 4 F, 0.05-0.15M of ethylene glycol containing water, preferably 0.08-0.12M of NH 4 F, Ethylene glycol containing water of 0.08-0.12M may be used, and more preferably, ethylene glycol containing water of 0.09-0.11M NH 4 F and 0.09-0.11M water may be used, and in the present invention, as an example Ethylene glycol containing 0.1M of NH 4 F and 0.1M of water was used as an electrolyte, but is not limited thereto.
상기 단계 2는 세척된 스테인리스 스틸을 65-75 V에서 2.5-3.5시간 동안 양극산화처리할 수 있고, 바람직하게는 68-72 V에서 2.8-3.2시간, 더욱 바람직하게는 69-71 V에서 2.9-3.1시간 실시할 수 있다.In step 2, the cleaned stainless steel may be anodized at 65-75 V for 2.5-3.5 hours, preferably at 68-72 V for 2.8-3.2 hours, more preferably at 69-71 V for 2.9- It can be performed for 3.1 hours.
접촉각 160° 이상의 초소수성 및 부식 억제율 90% 이상을 구현하기 위해서는, 69-71 V에서 2.9-3.1시간 양극산화처리하는 것이 바람직하고, 이 조건을 벗어날 경우 초소수성 구현이 안되거나 부식 억제율이 낮은 문제점이 있을 수 있다.In order to realize superhydrophobicity with a contact angle of 160° or more and corrosion inhibition rate of 90% or more, it is desirable to anodize at 69-71 V for 2.9-3.1 hours. This can be.
상기 단계 4의 SAM 코팅 가능한 소수성 코팅제의 표면에너지가 6mJ/m2 내지 20mJ/m2인 플루오르카본 체인 수가 1 내지 20개인 퍼플로로알킬실란, 탄소수가 1 내지 20개인 알킬실란 등을 사용할 수 있고, 일례로 1H,1H,2H,2H-퍼플로로데실트리클로로실란(FDTS), 트리클로로옥틸실란(OTS), 옥타데실트리클로로실란(ODTS) 등을 사용할 수 있다.The surface energy of the hydrophobic coating agent capable of SAM coating of step 4 is 6mJ/m 2 to 20mJ/m 2 Perfluoroalkylsilane having 1 to 20 fluorocarbon chains, alkylsilane having 1 to 20 carbon atoms, etc. may be used. , For example, 1 H ,1 H ,2 H ,2 H -Perfluorodecyltrichlorosilane (FDTS), trichlorooctylsilane (OTS), octadecyltrichlorosilane (ODTS) and the like may be used.
또한, 본 발명은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 파이프를 제공한다.In addition, the present invention provides a pipe for water and sewage in which the corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
나아가, 본 발명은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 밸브를 제공한다.Furthermore, the present invention provides a valve for water and sewage in which the corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
또한, 본 발명은 상기 방법으로 제조된 내식성 및 초소수성 양극산화막이 형성된 상하수도용 필터를 제공한다.In addition, the present invention provides a filter for water and sewage in which the corrosion-resistant and superhydrophobic anodized film manufactured by the above method is formed.
본 발명에 따른 상하수도 자재용 스테인리스 스틸 표면에 내식성(Corrosion resistance) 및 초소수성 산화막을 형성하는 방법은, 종래의 균일한 다공성 산화막을 형성하기 위한 프리패터닝(pre-patterning) 공정 없이도 균일한 다공성 산화막을 형성할 수 있고, 또한 종래의 양극산화처리 후에 기공확장 단계 없이도 초소수성 및 내식성이 현저히 우수한 효과가 있어 제조단가를 절감할 수 있다.The method of forming a corrosion resistance and superhydrophobic oxide film on a stainless steel surface for water and sewage materials according to the present invention is a uniform porous oxide film without a conventional pre-patterning process for forming a uniform porous oxide film. It can be formed, and it is possible to reduce the manufacturing cost because it has remarkably excellent effects in superhydrophobicity and corrosion resistance without a pore expansion step after conventional anodizing treatment.
도 1은 실시예의 단계 1 내지 단계 3까지 실시한 후 얻은 3개의 샘플에 대한 EDS 측정 결과이다.
도 2는 실시예에서 단계 1 내지 3까지 실시한 후 얻은 3개의 샘플 표면에 형성된 산화막의 표면 형상을 FE-SEM으로 관찰한 이미지이다.
도 3은 실시예에서 단계 1 내지 단계 3까지만 실시한 샘플(SAM 코팅 미실시)의 접촉각을 측정한 결과이다.
도 4는 실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플(SAM 코팅 실시)의 접촉각을 측정한 결과이다.
도 5는 실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플의 동전위분극 곡선을 나타낸 도면이다.1 is an EDS measurement result for three samples obtained after performing
2 is an image observed by FE-SEM of the surface shape of the oxide film formed on the surfaces of three samples obtained after performing
3 is a result of measuring the contact angle of the sample (SAM coating not carried out) carried out only to
4 is a result of measuring the contact angle of the samples (SAM coating is performed) all performed from
5 is a view showing the co-potential polarization curve of the samples performed all the
이하, 본 발명을 하기의 실시예에 의하여 더욱 상세하게 설명한다. 단, 하기의 실시예는 본 발명을 예시하는 것일 뿐, 본 발명의 내용이 하기의 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the following examples only illustrate the present invention, and the content of the present invention is not limited by the following examples.
<실시예 1-1 내지 1-3> 스테인리스 스틸(SUS 304)의 양극산화처리<Examples 1-1 to 1-3> Anodizing treatment of stainless steel (SUS 304)
단계 1: 스테인리스 스틸(SUS 304) 기판의 준비Step 1: Preparation of stainless steel (SUS 304) substrate
20 mm × 30 mm × 0.5 mm 크기의 스테인리스 스틸 SUS 304을 각각 사용하였다. 표면 이물질 제거 및 표면 클리닝을 위해 에탄올과 아세톤에 침지시켜 초음파 세척을 실시하였으며, 증류수를 이용하여 한번 더 세척한 후 건조하였다.Stainless steel SUS 304 having a size of 20 mm × 30 mm × 0.5 mm was used, respectively. Ultrasonic cleaning was performed by immersing in ethanol and acetone to remove foreign substances on the surface and cleaning the surface. After washing again with distilled water, it was dried.
스테인리스 스틸은 SUS 200계열, 300계열 400계열이 널리 사용되고 있고, 각 계열마다 포함 성분의 함량에는 유의미한 차이가 있다. SUS 300계열에서 대표적으로 널리 사용되고 있는 SUS 304, SUS 304L, SUS 316, SUS 316L의 성분 함량을 하기에 나타내었다. 참조로, 금속의 종류, 합금의 종류에 따라서 초친수성 산화막을 형성하기 위한 최적의 양극산화 처리조건에는 상당한 차이가 있고, 본 발명에서는 SUS 304 및 SUS 304L에 초점을 맞추어 초친수성 산화막을 형성하기 위한 최적의 양극산화 처리조건을 찾아내었다.As for stainless steel, SUS 200 series, 300 series and 400 series are widely used, and there is a significant difference in the content of components in each series. The component contents of SUS 304, SUS 304L, SUS 316, and SUS 316L, which are typically widely used in the SUS 300 series, are shown below. For reference, there is a significant difference in optimal anodization treatment conditions for forming a superhydrophilic oxide film depending on the type of metal and the type of alloy, and the present invention focuses on
단계 2: 양극산화 처리Step 2: Anodizing
양극산화 공정은 양극에 스테인리스 스틸, 음극에 백금을 사용하였으며, 전극간 거리는 5cm 로 유지했다. 에틸렌글리콜 용액을 기반으로 0.1 M NH4F, 0.1 M H2O을 첨가한 전해질 용액에서 이중 자켓 비커와 수냉식 냉각기를 이용하여 0℃의 온도로 유지하였다. 인가전압을 30V(실시예 1-1), 50V(실시예 1-2), 70V(실시예 1-3)로 하여 3시간 동안 진행하였으며, 양극산화 후 시편을 증류수로 세척, 건조하였다.In the anodization process, stainless steel was used for the anode and platinum was used for the cathode, and the distance between the electrodes was maintained at 5 cm. Based on the ethylene glycol solution, 0.1 M NH 4 F, 0.1 MH 2 O was added to the electrolyte solution, which was maintained at a temperature of 0° C. using a double jacket beaker and a water-cooled cooler. The applied voltage was 30V (Example 1-1), 50V (Example 1-2), and 70V (Example 1-3) for 3 hours, and after anodization, the specimen was washed with distilled water and dried.
단계 3: 플라즈마 처리Step 3: Plasma Treatment
플라즈마 장치를 이용하여 표면에 15분 동안 산소 플라즈마로 유기 잔여물 제거하고 친수성으로 만든 후 공기 중에서 가열 교반기를 사용하여 150℃에서 10분 동안 건조하였다. 플라즈마 처리 조건은 200W, 50KHz, O2 50sccm, RIE 모드로 15분 동안 플라즈마 처리하였다.Using a plasma apparatus, organic residues were removed from the surface with oxygen plasma for 15 minutes, made hydrophilic, and then dried in air at 150° C. for 10 minutes using a heating stirrer. Plasma treatment conditions were 200W, 50KHz, O 2 50sccm, plasma treatment for 15 minutes in RIE mode.
단계 4: 자기조립 단분자막(Self-Assembled Monolayer, SAM) 코팅Step 4: Self-Assembled Monolayer (SAM) Coating
플라즈마 처리가 완료된 양극산화 샘플에 초발수 특성을 부여하기 위해, 자기조립 단분자막(Self-Assembled Monolayer, SAM) 코팅을 낮은 표면에너지를 가지는 물질인 FDTS(1H, 1H, 2H, 2H-Perfluorodecyltrichlorosilane) 용액을 사용하여 수행하였다.In order to give super water-repellent properties to the plasma-treated anodized sample, the self-assembled monolayer (SAM) coating was coated with FDTS (1H, 1H, 2H, 2H-Perfluorodecyltrichlorosilane) solution, which is a material with low surface energy. was carried out using
<실험예 1> EDS(Energy dispersive spectroscopy)를 이용한 산화막 형성 평가<Experimental Example 1> Evaluation of oxide film formation using EDS (Energy dispersive spectroscopy)
실시예에서 단계 1 내지 단계 3까지(SAM 코팅 미실시) 실시한 후 얻은 3개의 스테인리스 스틸(SUS 304) 샘플에 대해서 EDS(모델명: X-MAX, 제조사: OXFORD) 측정을 하여, 산화막 형성 여부를 평가하였고, 그 결과를 도 1에 나타내었다.EDS (model name: X-MAX, manufacturer: OXFORD) was measured for three stainless steel (SUS 304) samples obtained after performing
도 1은 실시예의 단계 1 내지 단계 3까지 실시한 후 얻은 3개의 샘플에 대한 EDS 측정 결과이다.1 is an EDS measurement result for three samples obtained after performing
도 1에 나타난 바와 같이, 양극산화 후에 산소와 철이 주성분으로 나타나 있으며, 그 외에 크롬, 망간, 니켈 등이 검출되었으며 탄소는 샘플을 스테이지에 고정하기 위한 카본테이프에 영향으로 노이즈에 해당한다. 이 결과를 통해 스테인리스 스틸 표면에 산화막이 형성된 것을 확인할 수 있다.As shown in FIG. 1, after anodization, oxygen and iron are shown as main components, and in addition, chromium, manganese, nickel, etc. were detected, and carbon corresponds to noise due to the influence of the carbon tape for fixing the sample to the stage. From this result, it can be confirmed that an oxide film is formed on the surface of the stainless steel.
<실험예 2> FE-SEM(Field Emission Scanning Electron Microscope)을 이용한 표면 형상 관찰<Experimental Example 2> Observation of surface shape using FE-SEM (Field Emission Scanning Electron Microscope)
실시예에서 단계 1 내지 단계 3까지(SAM 코팅 미실시) 실시한 스테인리스 스틸(SUS 304) 표면에 형성된 산화막의 표면 형상을 FE-SEM(모델명: MIRA 3 LMH In-Beam Detector, 제조사: TESCAN)을 이용하여 관찰하였고, 그 결과를 도 2에 나타내었다.In the example, the surface shape of the oxide film formed on the surface of the stainless steel (SUS 304) performed from
구체적으로, 샘플의 표면 형상을 관찰하기 위하여 샘플을 절단하여 카본 테이프로 스테이지에 고정하고, 양극산화로 만들어진 구조물은 비전도성인 산화물이므로 백금 코팅을 40초간 수행한 후 관찰하였다.Specifically, in order to observe the surface shape of the sample, the sample was cut and fixed to the stage with carbon tape, and the structure made by anodization was a non-conductive oxide, so platinum coating was performed for 40 seconds and then observed.
도 2는 실시예에서 단계 1 내지 3까지 실시한 후 얻은 3개의 샘플 표면에 형성된 산화막의 표면 형상을 FE-SEM으로 관찰한 이미지이다.2 is an image observed by FE-SEM of the surface shape of the oxide film formed on the surfaces of three samples obtained after performing
도 2에 나타난 바와 같이, (a)와 (b)는 30V, 50V의 인가전압에서의 이미지이며, (a)와 (b)에서는 장벽형 산화피막이 형성되어 표면에 기공은 관찰하지 못하였다. 그러나 (c)에서는 앞의 (a)와 (b)의 조건과 다르게 다공성 구조가 형성되어지는 것을 관찰할 수 있었다.As shown in FIG. 2, (a) and (b) are images at applied voltages of 30V and 50V, and in (a) and (b), a barrier-type oxide film was formed and no pores were observed on the surface. However, in (c), it was observed that a porous structure was formed differently from the conditions of (a) and (b).
표 1에 도 2의 FE-SEM 이미지를 이용하여 양극산화 후 표면에 생성되어진 기공 직경(Pore Diameter, Dp), 기공사이의 간격(Interpore Distance, Dint), 고체분율(Solid Fraction)을 측정한 결과를 나타내었다. 고체분율은 고체-액체 비율을 하기 수학식 (1)에 의해 산출되었다.In Table 1, using the FE-SEM image of FIG. 2, the pore diameter (Pore Diameter, D p ), the interpore distance (D int) , and the solid fraction generated on the surface after anodization were measured. One result was shown. The solid fraction was calculated by the following equation (1) for the solid-liquid ratio.
[수학식 1][Equation 1]
f SL : 고체 분율(Solid Fraction) f SL : Solid Fraction
a: 기공간의 거리a: distance of air space
r: 기공의 반지름r: the radius of the pore
표 1에 나타난 바와 같이, 도 2에서 70V 전압 조건의 샘플(c) 다공성 표면에서 기공 직경은 115.59nm, 기공간의 거리는 137.06nm, 고체분율은 0.355이다. 이를 통해 30V, 50V 전압조건에서는 양극산화 피막에서 내부의 기공과 같은 빈 공간이 존재하지 않고 치밀하게 형성된 피막이 형성되었으며, 70V의 전압 조건에서 다소 규칙적인 기공을 가지는 다공성 피막이 형성됨을 관찰하였다. 고체분율(Solid Fraction)은 거칠기율을 의미한다. As shown in Table 1, the pore diameter is 115.59 nm, the pore distance is 137.06 nm, and the solid fraction is 0.355 on the porous surface of the sample (c) under the 70V voltage condition in FIG. 2 . Through this, it was observed that under the voltage conditions of 30V and 50V, a densely formed film was formed without empty spaces such as internal pores in the anodized film, and a porous film with somewhat regular pores was formed under the voltage condition of 70V. The solid fraction refers to the roughness ratio.
<실험예 3> 접촉각 평가<Experimental Example 3> Contact angle evaluation
실시예에서 단계 1 내지 단계 3까지만 실시한 샘플과 단계 1 내지 단계 4까지 모두 실시한 샘플의 표면 젖음성을 알아보기 위해 접촉각을 측정하였고, 그 결과를 도 3, 도 4 및 표 2에 나타내었다.In Examples, the contact angle was measured to determine the surface wettability of the samples subjected to
구체적으로, 측정 시에 기준 액체로 3.5㎕의 증류수를 사용하였다. 표면 위에 액적을 떨어뜨린 후 5초의 시간후에 접촉각을 측정하였고, 시편 당 10번 측정을 하였다.Specifically, 3.5 μl of distilled water was used as a reference liquid in the measurement. After dropping the droplet on the surface, the contact angle was measured after 5 seconds, and measurements were made 10 times per specimen.
도 3은 실시예에서 단계 1 내지 단계 3까지만 실시한 샘플(SAM 코팅 미실시)의 접촉각을 측정한 결과이다.3 is a result of measuring the contact angle of the sample (SAM coating not carried out) carried out only to
도 4는 실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플(SAM 코팅 실시)의 접촉각을 측정한 결과이다.4 is a result of measuring the contact angle of the samples (SAM coating is performed) all performed from
도 3 및 도 4의 결과를 하기 표 2에 정리하여 나타내었다.The results of FIGS. 3 and 4 are summarized in Table 2 below.
표 2에 나타난 바와 같이, SAM 코팅 미실시 샘플의 경우 인가전압 30 V에서 59.26°, 50 V에서 44.87°인 반면에 70 V에서 17.04°로 초친수성이 나타남을 확인하였다. 이는 낮은 표면에너지를 가진 FDTS용액으로 SAM 코팅 실시 전의 샘플로서 형성된 양극산화 피막으로 인하여 친수성을 나타낸다. 낮은 표면에너지를 가진 FDTS용액으로 SAM 코팅 실시 샘플의 경우 인가전압 30 V에서 115.02°, 50 V 에서는 119.69°인 반면에 70 V에서는 161.8°로 초발수이 나타남을 확인하였다.As shown in Table 2, it was confirmed that, in the case of the sample not coated with SAM, superhydrophilicity was shown at 59.26° at 30 V and 44.87° at 50 V, while 17.04° at 70 V. It shows hydrophilicity due to the anodization film formed as a sample before SAM coating with an FDTS solution with low surface energy. In the case of the sample coated with SAM with FDTS solution with low surface energy, it was confirmed that super water repellency appeared at 115.02° at 30 V and 119.69° at 50 V, whereas at 70 V, it was 161.8°.
다공성 산화막을 가진 표면에서는 코팅으로 인하여 기공 또는 고체 표면사이에서 공기가 물방울을 떠받드는 형상이 될 수 있음으로 인해 초발수성 표면이 형성된다.On a surface with a porous oxide film, a superhydrophobic surface is formed because the coating can be shaped to hold water droplets between pores or solid surfaces.
<실험예 4> 내식성(Corrosion resistance) 평가<Experimental Example 4> Corrosion resistance evaluation
실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플의 내식성을 평가하였고, 그 결과를 도 5 및 표 3에 나타내었다.In Examples, the corrosion resistance of the samples performed from
구체적으로, 내식성은 전기화학적 방법인 동전위분극시험(Potentio-Dynamic Polarization Test, PDP)으로 상온의 3.5 wt% NaCl 용액에서 진행하였다. 분석 시험 진행 전 1시간 동안 상온에서 3.5 wt.% NaCl 용액에 샘플을 침지 시킨 후 측정하였다. 분극 시험은 3전극 시스템으로 작업전극으로는 샘플을 사용하였고 상대전극으로는 백금(Pt)을 사용하였으며 기준전극으로는 은/염화은(Ag/AgCl) 전극을 이용하였다. 측정 조건은 -500 mV 내지 +14000 mV(vs. Ag/AgCl) 범위를 1 mV/sec의 주사 속도로 전기화학적 특성 분석을 통해 내식성을 평가하였다.Specifically, corrosion resistance was conducted in a 3.5 wt% NaCl solution at room temperature by an electrochemical method, Potentio-Dynamic Polarization Test (PDP). Measurements were made after immersing the sample in 3.5 wt.% NaCl solution at room temperature for 1 hour before proceeding with the analysis test. The polarization test is a three-electrode system, using a sample as a working electrode, platinum (Pt) as a counter electrode, and a silver/silver chloride (Ag/AgCl) electrode as a reference electrode. The measurement conditions were -500 mV to +14000 mV (vs. Ag/AgCl) range, and corrosion resistance was evaluated through electrochemical characterization at a scanning rate of 1 mV/sec.
도 5는 실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플의 동전위분극 곡선을 나타낸 도면이다.5 is a view showing the co-potential polarization curve of the samples performed all the
도 5의 결과를 정리하여 하기 표 3에 나타내었다.The results of FIG. 5 are summarized and shown in Table 3 below.
Ecorr: 부식전위E corr : corrosion potential
Icorr: 질량의 손실을 나타내는 부식전류밀도I corr : Corrosion current density representing the loss of mass
IE: 무처리 SUS 304 대비 실시예 처리 샘플의 부식 억제율(Inhibition Efficiency)IE: Inhibition Efficiency of Example Treated Samples vs.
표 3에 나타난 바와 같이, 부식전위(Ecorr)는 아무 처리하지 않은 스테인리스 스틸(Bare SUS304, -37.8 mV)과 비교하여 30V의 인가전압(112 mV), 50V의 인가전압(199 mV), 70V의 인가전압(254 mV)의 표면 개질을 한 구조에서 양의 방향을 이동하였음을 확인하였다. 또한 부식전류밀도(Icorr)은 아무 처리하지 않은 스테인리스 스틸(1.12Х10-8 A/cm2)과 비교하여 30V 인가전압에서(5.04Х10-8 A/cm2), 50V 인가전압(9.97Х10-8 A/cm2), 70V 인가전압(1.19Х10-9 A/cm2)의 표면 개질을 한 구조에서 인가 전압의 증가 따라 부식전류밀도가 감소한 것을 확인할 수 있었다. 부식전류는 질량 손실 반응이 부식에 직접적인 관련 있으므로, Icorr값을 이용하여 부식억제율을 평가하는 데 사용하였다. 부식전류밀도를 이용하여 계산되어진 부식억제율은 하기 수학식 2로 계산하였다. 가장 중요한 지표인 부식 억제율은 30V에서 77.58%, 50V에서 88.67%, 70V에서 90.50%로 나타났다. 이는 양극산화 처리를 통한 표면 형상을 구현한 후 SAM 코팅을 실시할 경우 내식성이 현저히 향상될 수 있음을 나타내는 결과이다. As shown in Table 3, the corrosion potential (E corr ) was 30V applied voltage (112 mV), 50V applied voltage (199 mV), 70V compared to untreated stainless steel (Bare SUS304, -37.8 mV). It was confirmed that the positive direction was shifted in the structure subjected to surface modification of the applied voltage (254 mV). In addition, the corrosion current density (I corr ) was compared to untreated stainless steel (1.12Х10 -8 A/cm 2 ) at 30V applied voltage (5.04Х10 -8 A/cm 2 ), 50V applied voltage (9.97Х10 - 8 A/cm 2 ) and 70V applied voltage (1.19Х10 -9 A/cm 2 ), it was confirmed that the corrosion current density decreased as the applied voltage increased in the structure with the surface modification. The corrosion current was used to evaluate the corrosion inhibition rate using the I corr value because the mass loss reaction is directly related to corrosion. The corrosion inhibition rate calculated using the corrosion current density was calculated by Equation 2 below. The most important index, corrosion inhibition, was 77.58% at 30V, 88.67% at 50V, and 90.50% at 70V. This result indicates that corrosion resistance can be remarkably improved when SAM coating is performed after realizing the surface shape through anodization.
즉, 다공성 산화피막은 친수성을 가지므로 발수성 구현을 위해 FDTS으로 SAM 코팅하여 기공 내에 공기를 가두어 부식방지 효율 특성을 향상시켰다. 다공성 구조물 및 산화피막이 두꺼워 기공내 많은 공기를 가둘 수 있으므로 내식성의 향상이 가능한 것으로 사료된다.That is, since the porous oxide film has hydrophilicity, it was coated with FDTS with FDTS to achieve water repellency, thereby improving corrosion prevention efficiency by trapping air in the pores. The porous structure and the thick oxide film can trap a lot of air in the pores, so it is thought that corrosion resistance can be improved.
[수학식 2][Equation 2]
i: 실시예에서 단계 1 내지 단계 4까지 모두 실시한 샘플의 부식전류밀도i: Corrosion current density of all samples performed from
i0: 무처리 SUS 304의 부식전류밀도i 0 : Corrosion current density of
IE: 무처리 SUS 304 대비 실시예 처리 샘플의 부식 억제율IE: Corrosion inhibition rate of Example treated samples compared to
<실험예 5> 초발수성 구현을 위한 양극산화 최적 조건(시간 및 전압) 평가<Experimental Example 5> Evaluation of optimal conditions for anodization (time and voltage) for realization of super water repellency
상기 실험예 1 내지 4를 통해 양극산화 처리 조건으로 3시간 및 70V 처리할 경우 내식성이 가장 우수함을 확인하였다. 이에, 본 실험예 5에서는 양극산화 처리 조건 3시간 및 70V를 기준으로 하여 최적 조건을 알아보았고, 그 결과를 표 4 및 표 5에 나타내었다. 양극산화 처리 시간 및 전압을 달리한 것을 제외하고는 실시예와 동일하게 샘플(SAM 코팅 실시)을 제조하였다.Through Experimental Examples 1 to 4, it was confirmed that the corrosion resistance was the best when treated with anodizing conditions for 3 hours and 70V. Therefore, in this Experimental Example 5, the optimum conditions were investigated based on the anodization treatment condition of 3 hours and 70V, and the results are shown in Tables 4 and 5. A sample (SAM coating was performed) was prepared in the same manner as in Example, except that the anodization treatment time and voltage were changed.
(= 실시예 1-3)Example 2-3
(= Examples 1-3)
(= 실시예 1-3)Example 3-3
(= Examples 1-3)
표 4 및 표 5에 나타난 바와 같이, 초발수성 및 내식성 측면에서 양극산화 처리 시간 2.9-3.1 h 및 인가 전압 69-71 V에서 가장 우수한 결과를 확인할 수 있었다.As shown in Tables 4 and 5, the best results were confirmed at an anodization time of 2.9-3.1 h and an applied voltage of 69-71 V in terms of super water repellency and corrosion resistance.
이제까지 본 발명에 대하여 그 바람직한 실시예들을 중심으로 살펴보았다. 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자는 본 발명이 본 발명의 본질적인 특성에서 벗어나지 않는 범위에서 변형된 형태로 구현될 수 있음을 이해할 수 있을 것이다. 그러므로 개시된 실시예들은 한정적인 관점이 아니라 설명적인 관점에서 고려되어야 한다. 본 발명의 범위는 전술한 설명이 아니라 특허 청구범위에 나타나 있으며, 그와 동등한 범위 내에 있는 모든 차이점은 본 발명에 포함된 것으로 해석되어야 할 것이다.So far, with respect to the present invention, the preferred embodiments have been looked at. Those of ordinary skill in the art to which the present invention pertains will understand that the present invention may be implemented in a modified form without departing from the essential characteristics of the present invention. Therefore, the disclosed embodiments are to be considered in an illustrative rather than a restrictive sense. The scope of the present invention is indicated in the claims rather than in the foregoing description, and all differences within the scope equivalent thereto should be construed as being included in the present invention.
Claims (12)
65-75 V 인가 전압에서 2.5-3.5 시간 동안 양극산화처리하여, 스테인리스 스틸 표면에 양극산화막을 형성하는 단계(단계 2);
플라즈마 처리하여 유기 잔여물을 제거하고 양극산화막 표면을 친수성으로 만드는 단계(단계 3); 및
SAM(Self-Assembled Monolayer) 코팅 가능한 소수성 코팅제로 코팅하는 단계(단계 4);를 포함하고,
상기 단계 2의 양극산화처리에 사용하는 전해질은 0.09-0.11M의 NH4F 및 0.09-0.11M의 물이 포함된 에틸렌글리콜이고, 상기 전해질의 온도는 -1 내지 1℃인 것을 특징으로 하는,
상하수도 자재용 스테인리스 스틸 표면에 내식성(Corrosion resistance) 및 초소수성 산화막을 형성하는 방법.
cleaning and drying the stainless steel surface for water and sewage materials (step 1);
forming an anodization film on the stainless steel surface by anodizing at a voltage of 65-75 V for 2.5-3.5 hours (step 2);
Plasma treatment to remove organic residues and make the surface of the anodized film hydrophilic (step 3); and
Including; coating with a hydrophobic coating agent capable of self-assembled monolayer (SAM) coating (step 4);
The electrolyte used for the anodizing treatment of step 2 is ethylene glycol containing 0.09-0.11M of NH 4 F and 0.09-0.11M of water, and the temperature of the electrolyte is -1 to 1°C, characterized in that,
A method of forming a corrosion-resistant and super-hydrophobic oxide film on the surface of stainless steel for water and sewage materials.
상기 상하수도 자재는 파이프, 밸브 및 필터 중 1종인 것을 특징으로 하는 방법.
According to claim 1,
The method, characterized in that the water and sewage material is one of a pipe, a valve and a filter.
상기 스테인리스 스틸은 SUS 304 또는 SUS 304L인 것을 특징으로 하는 방법.
According to claim 1,
The method, characterized in that the stainless steel is SUS 304 or SUS 304L.
상기 단계 2의 양극산화처리는 68-72 V 인가 전압에서 2.8-3.2 시간 동안 처리하는 것을 특징으로 하는 방법.
According to claim 1,
The anodizing treatment of step 2 is characterized in that the treatment is performed at a voltage of 68-72 V for 2.8-3.2 hours.
상기 단계 2의 양극산화처리는 69-71 V 인가 전압에서 2.9-3.1 시간 동안 처리하는 것을 특징으로 하는 방법.
6. The method of claim 5,
The anodizing treatment in step 2 is characterized in that the treatment is performed at a voltage of 69-71 V for 2.9-3.1 hours.
상기 SAM 코팅 가능한 소수성 코팅제는 1H,1H,2H,2H-퍼플로로데실트리클로로실란(FDTS), 트리클로로옥틸실란(OTS) 및 옥타데실트리클로로실란(ODTS) 중 어느 하나인 것을 특징으로 하는 방법.
The method of claim 1,
The SAM coatable hydrophobic coating agent is any one of 1 H ,1 H ,2 H ,2 H -perfluorodecyltrichlorosilane (FDTS), trichlorooctylsilane (OTS) and octadecyltrichlorosilane (ODTS) A method characterized in that.
스테인리스 스틸 표면에 접촉각 160° 이상의 양극산화막이 형성되는 것을 특징으로 하는 방법.
According to claim 1,
A method, characterized in that an anodization film is formed on the surface of the stainless steel with a contact angle of 160° or more.
스테인리스 스틸 표면에 부식 억제율 90% 이상의 양극산화막이 형성되는 것을 특징으로 하는 방법.
The method of claim 1,
A method, characterized in that an anodization film having a corrosion inhibition rate of 90% or more is formed on the surface of the stainless steel.
A pipe for water and sewage in which a corrosion-resistant and superhydrophobic anodized film manufactured by the method of claim 1 is formed.
A valve for water and sewage with a corrosion-resistant and superhydrophobic anodized film manufactured by the method of claim 1 .
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