KR102364305B1 - Heat Treatment Chamber And Inline Heat Treatment Apparatus - Google Patents

Abstract

Disclosed are a heat treatment chamber and an inline heat treatment apparatus. One embodiment of the present disclosure provides the heat treatment chamber comprising: a chamber which includes an outer frame that has an aperture on one side and is configured to block microwave of the inside, wherein a heat treatment material including a target for the heat treatment is disposed in the outer frame; at least one microwave oscillation unit configured to oscillate microwave into the inside of the chamber; at least one dispersion member which is disposed on an inner wall of the outer frame and is configured to disperse the incident microwave to the inside of the chamber; and a heating unit which is disposed inside the chamber and is configured to generate heat by the microwave oscillation unit. The heat treatment chamber uniformly heats the target for the heat treatment using the dispersion member and ferroelectrics.

Description

Heat Treatment Chamber And Inline Heat Treatment Apparatus

The present disclosure relates to a heat treatment chamber and an inline heat treatment apparatus.

The content described in this section merely provides background information for the present disclosure and does not constitute the prior art.

Polyimide refers to a polymer of an imide monomer, and is converted into a condensation reaction of PAA (Poly Amic Acid), which is mainly achieved through an imidization pathway by heat.

PAA containing solvent is applied to the cleaned glass surface, dried in a vacuum for a certain period of time, and then heated while varying the temperature step by step for a certain period of time to induce a condensation reaction. In this case, an IR-type heat treatment chamber is generally used to heat the PAA, which is a heat treatment target. That is, the existing heat treatment chamber uses a method of increasing the internal temperature using infrared rays.

When the imide monomer is imidized by heat, each range is agglomerated and a segregation phenomenon occurs and a condensation reaction occurs, and then is combined with each other at the boundary of each segregated polyimide and converted into a single polyimide as a whole do.

The process of thermosetting polyimide should be done within a predetermined time, and if imidization of PAA is not made within a predetermined time, there is a problem that the quality of polyimide is deteriorated.

In addition, in the process of curing PAA, a gas called fume is generated as PAA is imidized. If the time to thermally cure polyimide becomes longer, the time to discharge the fume is insufficient, so that the fume is completely discharged to the outside in the heat treatment chamber The problem arises that it doesn't. The fume that is not discharged to the outside adheres to the inner wall of the heat treatment chamber and deteriorates the performance of the heat treatment chamber.

Accordingly, the present disclosure can uniformly heat a heat treatment target using microwaves, a dispersion member, and ferroelectrics.

In addition, the present disclosure can shorten the heat treatment time of the heat treatment target.

In addition, the present disclosure may prevent the gas generated while the heat treatment target is hardened from sticking to the inner wall of the heat treatment chamber.

In addition, the present disclosure can save power consumption of the heat treatment chamber.

The problems to be solved by the present invention are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

According to an embodiment of the present disclosure, an opening is formed on one side and includes an external frame configured to block the microwave inside, a chamber in which a heat treatment material containing a subject of heat treatment is disposed inside the outer frame; at least one microwave oscillator configured to oscillate microwaves into the chamber; at least one dispersing member disposed on the inner wall of the outer frame and configured to disperse the incident microwave into the interior of the chamber; and a microwave heating unit disposed in the chamber and configured to generate heat by the microwave oscillation unit.

According to an embodiment of the present disclosure, a chamber including an outer frame having an opening formed on one side, and a heat treatment material including a subject to be subjected to heat treatment is disposed inside the outer frame; a heat treatment material support portion configured to support at least a portion of the heat treatment material; And it provides a heat treatment chamber comprising a heat treatment material vibrating unit arranged to transmit vibrations having a first frequency and a first amplitude to the object to be heat treated.

According to an embodiment of the present disclosure, a chamber including an outer frame having an opening formed on one side, and a heat treatment material including a subject to be subjected to heat treatment is disposed inside the outer frame; a heat treatment material support portion configured to support at least a portion of the heat treatment material; And it provides a heat treatment chamber comprising a frame vibrating unit arranged to transmit the vibration to the outer frame.

According to an embodiment of the present disclosure, it is formed to include an inner frame having an opening formed on one side and an inner chamber configured to carry in or take out a subject to be subjected to heat treatment from the opening of the inner frame, and an outer frame to surround the outside of the inner frame. a chamber comprising an outer chamber configured to be configured to insulate the inner chamber; a heat treatment material support portion configured to support at least a portion of the heat treatment material; And it provides a heat treatment chamber comprising a frame vibrating unit arranged to transmit the vibration to the inner frame.

According to an embodiment of the present disclosure, a housing having an inlet through which a heat treatment material including a subject of heat treatment enters is formed on one side and an outlet through which a heat treatment material advances on the other side is formed; at least one microwave oscillator configured to oscillate microwaves into the housing; at least one dispersing member disposed on the inner wall of the housing and configured to disperse the incident microwave into the interior of the housing; a transfer unit disposed inside the housing and transferring the heat treatment material from the inlet to the outlet; And it provides an in-line heat treatment apparatus including a microwave heating part made of a ferroelectric is disposed on the upper portion of the transfer unit to be spaced apart from the transfer unit by a predetermined distance.

As described above, according to the present embodiment, the heat treatment chamber has the effect of uniformly heating the heat treatment target by uniformly irradiating microwaves using the dispersion member.

In addition, the heat treatment chamber has an effect of efficiently removing harmful gases by heating the surface of the heat treatment target using a ferroelectric and a dispersing member and simultaneously heating the inside of the heat treatment target.

In addition, there is an effect that can increase the efficiency of the production process by shortening the heat treatment time of the heat treatment target.

In addition, by arranging a vibration unit that causes vibration in the heat treatment target, there is an effect that can shorten the heat treatment time of the heat treatment target.

In addition, there is an effect that the material attached to the inner wall can be dropped by disposing a vibrating unit that causes vibration on the inner wall of the heat treatment chamber.

1 is a perspective view of a heat treatment chamber according to an embodiment of the present disclosure;
2 is a front view illustrating an internal structure of a heat treatment chamber according to an embodiment of the present disclosure;
3 is a perspective view of a dispersing member according to an embodiment of the present disclosure.
4 is a view for explaining the microwave reflection characteristics of the dispersing member according to an embodiment of the present disclosure.
5 is an example for explaining the principle of the dispersing member of the present disclosure.
FIG. 6 is a view for explaining a change in wavelength when microwaves pass through a microwave heating unit made of a ferroelectric.
7 is a front view illustrating an internal structure of a heat treatment chamber according to another embodiment of the present disclosure.
8 is a schematic diagram of an in-line heat treatment apparatus according to an embodiment of the present disclosure.

Hereinafter, some embodiments of the present disclosure will be described in detail with reference to exemplary drawings. In adding reference numerals to components in each drawing, it should be noted that the same components are given the same reference numerals as much as possible even though they are indicated in different drawings. In addition, in describing the present disclosure, if it is determined that a detailed description of a related known configuration or function may obscure the gist of the present disclosure, the detailed description thereof will be omitted.

In describing the components of the embodiment according to the present disclosure, reference numerals such as first, second, i), ii), a), b) may be used. These signs are only for distinguishing the elements from other elements, and the essence, order, or order of the elements are not limited by the signs. In the specification, when a part 'includes' or 'includes' a certain element, it means that other elements may be further included, rather than excluding other elements, unless explicitly stated otherwise. .

1 is a perspective view of a heat treatment chamber according to an embodiment of the present disclosure; 2 is a front view illustrating an internal structure of a heat treatment chamber according to an embodiment of the present disclosure; 3 is a perspective view of a dispersing member according to an embodiment of the present disclosure. 4 is a view for explaining the microwave reflection characteristics of the dispersing member according to an embodiment of the present disclosure. 5 is an example for explaining the principle of the dispersing member of the present disclosure. FIG. 6 is a view for explaining a change in wavelength when microwaves pass through a microwave heating unit made of a ferroelectric.

1 and 2 , the heat treatment chamber 10 includes an outer chamber 100 , an inner chamber 200 , a microwave oscillation unit 300 , a dispersion member 400 , a heat treatment material support unit 500 , and a heat treatment material vibration unit 530 , the frame vibration unit 540 , the temperature sensor 510 , the gas circulation device 600 , the microwave heating unit 700 , and all or part of the heat reflection plate 800 .

The outer chamber 100 includes an inner frame 210 and is configured to heat-treat the heat treatment material 520 positioned therein. The inner frame 210 has an opening formed on one side. The opening is opened in the direction toward the door unit 130 , and is formed so as to be opened and closed by the door unit 130 . The heat treatment material 520 positioned therein contains the subject of heat treatment. For example, the object to be subjected to heat treatment may be polyimide.

The inner chamber 200 includes all or a part of the outer frame 110 and the heat insulating material (not shown). The outer chamber 100 is formed to completely surround the outside of the inner frame 210 and is configured to insulate the inner chamber 200 and block microwaves. The outer frame 110 includes the door unit 130 disposed on the inner frame 210 . A heat insulating material (not shown) is disposed on the inner wall of the outer frame 110 to prevent heat from escaping to the outside of the outer frame 110 .

The insulator (not shown) is preferably disposed on the inner wall of the outer frame 110, but is not limited thereto and is disposed so as to insulate the inner chamber 200 regardless of the location where the insulator (not shown) is disposed. enough

The outer frame 110 may be configured to block microwaves in the outer chamber 100 and the inner chamber 200 as well as thermal insulation.

The dispersing member 400 may be disposed in the outer chamber 100 . A heat insulating material (not shown) is disposed on the inner wall of the outer frame 110 , so that when the inner chamber 200 is heated, the space of the outer chamber 100 is also heated.

The microwave oscillation unit 300 is configured to oscillate microwaves to at least one of the inner chamber 200 and the outer chamber 100 . The microwave oscillator 300 may be disposed outside the outer frame 110 . When a plurality of microwave oscillation units 300 are disposed, they may be disposed to be spaced apart from each other by a predetermined distance or more. Referring to FIG. 2 , four microwave oscillation units 300 are disposed at left and right sides of the heat treatment chamber 10 , respectively, with two being spaced apart from each other. In the microwave oscillator 300, the intensity of the oscillating microwave increases in proportion to the intensity of the supplied current. The intensity of the microwave may be adjusted by controlling the intensity of the current supplied to the microwave oscillator 300 by a controller (not shown).

The heat treatment material support unit 500 is configured to support the heat treatment material 520 when the heat treatment material 520 having a heat treatment target enters the inner chamber 200 . The heat treatment material support unit 500 may be disposed in the form of a column perpendicular to the lower surface of the inner frame 210 . At least a portion of the heat treatment material support unit 500 may be formed through the inner frame (210). The heat treatment material support unit 500 may be configured in plurality to stably support the heat treatment material 520 . The heat treatment material 520 may be configured to be detachable from the heat treatment material support unit 500 , but is not limited thereto, and may be configured in a state coupled to the heat treatment material support unit 500 .

The heat treatment material vibrating unit 530 is disposed to transmit vibrations having a first frequency and a first amplitude to the subject of heat treatment. The heat treatment material vibrating unit 530 may be disposed in contact with at least a portion of the heat treatment material 520 or at least a portion of the heat treatment material support unit 500 . The heat treatment material vibrating unit 530 may generate vibration in an ultrasonic manner, but is not limited thereto. When heating the heat treatment material 520 having the object to be heat treated, if the heat treatment material 520 is vibrated, the time for heating and curing the heat treatment material 520 can be shortened. For example, when the subject of heat treatment is poly amic acid (PAA), a segregation phenomenon in which a portion of the PAA is cured before another portion may occur in the process of thermosetting the PAA to a polyimide. When vibration is generated in the heat treatment material 520, this segregation phenomenon can be prevented and the PAA can be uniformly heated. In addition, fume is generated while the PAA is thermally cured into polyimide. When the inside of the PAA is heated and fume gas is generated, the fume may be trapped inside the PAA and the quality of the polyimide may be deteriorated. When vibration is generated in the heat treatment material 520, there is an effect of releasing the fume gas trapped inside the PAA. Here, the first frequency may be 20,000 Hz or more, but is not limited thereto.

A plurality of heat treatment material vibrating units 530 may be disposed on the lower surface of the heat treatment material 520 or the upper surface of the heat treatment material 520 . The heat treatment material vibrating unit 530 may be disposed adjacent to a corner portion of the heat treatment material 520 .

The frame vibrator 540 may be disposed to transmit vibrations having a second frequency and a second amplitude to the inner frame 210 . Here, the second frequency refers to a frequency lower than the first frequency, and the second amplitude refers to an amplitude greater than the first amplitude. For example, the second frequency may be 15,000 Hz to 20,000 Hz, but is not limited thereto. The frame vibrator 540 may generate vibration in an ultrasonic manner. The frame vibrating unit 540 may have a larger amplitude than the heat treatment material vibrating unit 530 to drop foreign substances that are generated during the heat treatment process and adhere to the inner wall of the inner frame 210 . Here, the foreign material may be fumes generated during the curing process of the PAA. Foreign substances falling from the inner wall of the inner frame 210 may be discharged to the outside through the gas exhaust unit 640 .

A plurality of frame vibrating units 540 may be disposed on the inner wall of the inner frame 210 , and at least one may be disposed on each side of the inner wall of the inner frame 210 . The frame vibrating unit 540 may be disposed on the outer wall of the inner frame 210 .

In FIG. 2, the heat treatment material vibrating unit 530 and the frame vibrating unit 540 are shown together in the heat treatment apparatus for heating using microwaves, but the present invention is not limited thereto. can For example, in the case of an IR-type heat treatment apparatus, the heat treatment material vibrating unit 530 may be disposed in a heat treatment material or a portion adjacent to the heat treatment material in order to vibrate the object to be heat treated, and the frame vibrating unit 540 is a foreign material as in the present disclosure. It may be placed in a portion adjacent to the frame to vibrate the inner wall of the clinging frame.

The temperature sensor 510 is disposed in the inner chamber 200 region. In order for the controller (not shown) to determine whether the region of the inner chamber 200 is uniformly heated, a plurality of temperature sensors 510 may be disposed to be spaced apart from each other. According to an embodiment of the present disclosure, the plurality of temperature sensors 510 may be disposed at an end of the heat treatment material support unit 500 . When it is disposed at the end of the heat treatment material support unit 500, the temperature can be sensed at a position close to the heat treatment material 520 having a heat treatment target. By disposing the temperature sensor 510 in a position close to the heat treatment material 520 having the heat treatment target, it is possible to more accurately determine whether the heat treatment target is uniformly heated. The temperature sensor 510 does not necessarily have to be disposed at the end of the heat treatment material support unit 500 , but may be disposed to sense the temperature of the inner chamber 200 region.

The temperature of the inner chamber 200 region is controlled by a controller (not shown). The controller (not shown) may receive a signal related to temperature sensing from the temperature sensor 510 and receive the measured temperature as feedback to control the temperature of the inner chamber 200 region. The controller (not shown) may control the temperature using PI control or PID control.

The controller (not shown) may receive feedback from some of the plurality of temperature sensors 510 and control the temperature of the region of the inner chamber 200 . For example, the controller (not shown) may perform temperature control using one temperature sensor 510 among the plurality of temperature sensors 510 . Alternatively, the controller (not shown) may use two temperature sensors 510 among the plurality of temperature sensors 510 to perform temperature control using an average value of the temperatures measured from the two temperature sensors 510 .

The gas circulation device 600 may include a gas pipe 610 , a gas injector 620 , a gas injector 630 , and a gas exhauster 640 . The gas pipe 610 is configured to pass through the outer frame 110 and the inner frame 210 . The gas injector 630 is configured to inject the gas moving through the gas pipe 610 into the inner chamber 200 . At least one gas injector 630 may be arranged, and when a plurality of gas injectors 630 are arranged, they may be arranged to be spaced apart from each other by a predetermined distance in order to evenly inject gas into the inner chamber 200 .

When the heat treatment material is heat treated at a high temperature, gas may come out of the heat treatment material 520 while the heat treatment material 520 is hardened, and this gas must be discharged from the inner chamber 200 . For example, when polyimide is heat-treated, fume is generated while the polyimide is cured. Since the fume causes a malfunction of the heat treatment chamber 10 or deteriorates the heating function, it must be discharged to the outside for treatment. When fume is generated, gas is injected into the gas injector 620 . The gas is injected into the inner chamber 200 by the gas injector 630 through the gas pipe 610 . Here, the gas may be nitrogen or argon as an inert gas.

The gas exhauster 640 is a device configured to exhaust at least a portion of the gas in the inner chamber 200 . At least one gas exhauster 640 may be disposed, and when a plurality of gas exhausters 640 are disposed, they may be disposed to be spaced apart from each other by a predetermined distance in order to effectively discharge gas in the inner chamber 200 . The gas exhauster 640 mainly discharges the fume in the air of the inner chamber 200 .

The dispersing member 400 is disposed on the inner wall of the outer frame 110 , and is configured to disperse the incident microwave to at least one of the inner chamber 200 and the outer chamber 100 . The dispersing member 400 is formed to reflect the irradiated microwaves in various directions so that the microwaves heat the entire interior of the heat treatment chamber 10 uniformly.

The dispersing member 400 may be made of a material that reflects microwaves, such as aluminum.

A plurality of dispersion members 400 may be disposed on at least one inner wall of the plurality of inner walls of the outer frame 110 .

One dispersion member 400 may include a plurality of reflection units 410 . Referring to FIG. 3 , the dispersing member 400 includes first to fifth reflecting units 410a to 410e. The first to fifth reflection parts 410a to 410e may be formed to extend in a direction perpendicular to the bottom surface 420 of the dispersion member 400 .

At least two of the plurality of reflectors 410 may have different heights l. Preferably, unlike shown in FIG. 5 , the plurality of reflective units 410 may be formed to have different heights l.

Each reflector 410 may include an upper surface formed at one end of the reflector 410 and a side surface extending vertically from the upper surface. The reflector 410 does not necessarily have to face only and may have a curved top or side surface.

A plurality of dispersing members 400 may be separately disposed on the inner circumferential surface of the outer frame 110 , but may be formed integrally. That is, each shape and arrangement structure of the plurality of reflective units 410 may be set as one reflective pattern, and the dispersion member 400 in which the reflective pattern is repeated may be formed. One such integrated dispersing member 400 may be disposed on each wall surface of the outer frame 110 .

The shape of the dispersing member 400 is not limited to the above-described shape, and any shape capable of reflecting the phase of microwaves differently by varying the height l corresponds to the dispersing member 400 according to the present disclosure. For example, the dispersing member 400 may include a reflective portion having a hemisphere shape.

In FIG. 3 , the third reflective part 410c is formed to have a wider width than the other reflective parts, but the present invention is not limited thereto, and the first to fifth reflective parts 410a to 410e may be formed to have the same width f. can In addition, although the dispersion member is formed symmetrically with respect to the center line (C) in FIG. 3, this is exemplary and may not necessarily be formed symmetrically.

Each reflector 410 may have an upper surface, which is a region where microwaves are mainly reflected, and a side surface perpendicular to the upper surface. Each surface is formed as a facing, but may also be formed as a curved surface.

The shape of the dispersing member 400 shown in FIG. 3 is exemplary, and at least two reflective units 410 having different heights l among the reflective units 410 included in the dispersing member 400 are formed. If yes, it falls under the present disclosure.

Since the dispersing member 400 is composed of a plurality of reflection units 410 having different heights l, the height of the reflection unit 410 when the microwave reflects each reflection unit 410 of the dispersing member 400 ( l) Microwaves with different phases are generated according to the difference. As the phases of the reflected microwaves are varied, there is a technical feature of irradiating the microwaves with a uniform intensity to the region of the inner chamber 200 .

That is, when the microwave is incident on the dispersing member 400 , it collides with the surface of each reflective unit 410 and is reflected, collides with each reflective unit 410 of the dispersing member 400 on the opposite side, and is reflected back. Since it is repeated, microwaves may be evenly distributed in the area of the inner chamber 200 . Microwaves having different phases are formed by being reflected by each of the reflection units 410 and having different phases according to the difference in length of the reflection units 410 .

For example, referring to FIG. 4 , when the first microwave m1 is reflected by one reflective part, the reflected second microwave m2 is reflected by the reflective part disposed on the opposite side, and the height of the opposite reflective part is When different from each other and reflected by the third microwave m3, microwaves having different phases may be formed.

FIG. 5A is a graph illustrating a case in which microwaves reflect a general reflective surface, and FIG. 5B is a graph illustrating a case in which microwaves reflect a dispersion member according to an embodiment of the present disclosure.

When a flat reflector, not the dispersion member 400 according to an embodiment of the present disclosure, is disposed inside the outer frame 110, the phase does not vary even when irradiated with microwaves, so that the chamber has a pattern as shown in (a) of FIG. 5 . Microwaves flow through it. In this case, the area (Y) where the intensity of the microwave is weak will not be heated, and there is a disadvantage that only a specific area (X) having the intensity of the microwave is locally heated. In order to solve this problem, it is necessary to oscillate with various microwaves having different frequencies, but under the current law, the frequencies of microwaves available for commercial use are limited. That is, a single frequency must be used. If the heat treatment material 520 to which the heat treatment is applied contains a component that is ignited at a high temperature, there is a possibility that a fire such as a spark may occur due to excessive heating of some areas due to local heating.

Referring to FIG. 5B , when the dispersing member 400 according to an embodiment of the present disclosure is used, the microwaves are reflected by the reflectors 410 having different heights, so that microwaves of various phases are generated inside. A region of the chamber 200 may be irradiated. In the case of the present disclosure, dangerous situations such as spark generation can be prevented by irradiating microwaves with uniform intensity to all regions as shown in FIG. 7B , and excessive local heating does not occur in some regions. That is, the dispersing member 400 can uniformly heat the subject of heat treatment by forming microwaves having different phases while maintaining the wavelength of the microwave as it is.

In the case of an embodiment according to the present disclosure, the time of the heat treatment process can be shortened by effectively heat-treating using the microwave and the dispersing member 400 . That is, it is possible to sufficiently secure a time for removing the gas generated from the heat treatment material 520 by using the gas circulation device 600 by shortening the time for thermosetting at a high temperature. As a result, there is a technical feature that can prevent contamination and malfunction of the heat treatment chamber 10 by fume than other prior art.

Insertion parts 220 may be disposed on the left and right sides of the inner chamber 200 so that the heat treatment material 520 can be inserted in the slide manner in the inner chamber 200 . In addition to the heat treatment material 520 , the microwave heating unit 700 and the heat reflector 800 may be inserted into the insertion unit 220 in a slide manner.

A plurality of insertion grooves are formed in the insertion part 220 , so that a plurality of heat treatment materials 520 may be inserted therein.

The microwave heating unit 700 is spaced apart from the upper or lower portion of the heat treatment material 520 in the inner chamber 200, and is configured to be heated by microwaves. When the microwave heating unit 700 is irradiated with microwaves, it is heated and the temperature of the microwave heating unit 700 rises. The microwave heating unit 700 having an increased temperature increases the temperature in the inner chamber 200 . The shorter the distance h between the microwave heating part 700 and the heat treatment material 520, the more the heat treatment efficiency increases.

The microwave heating unit 700 may be formed of a ferroelectric. When the microwave heating unit 700 is formed of a ferroelectric material, the microwave heating unit 700 may be heated by 500 degrees or more by microwaves. In addition, as shown in FIG. 6 , the microwave heating unit 700 made of a ferroelectric may transmit microwaves f0.

As the microwave f0 passes through the microwave heating unit 700 , some energy is lost, thereby forming first to third transmitted waves f1 to f3 having a long wavelength. The first to third transmitted waves f1 to f3 shown in FIG. 6 are exemplary, and the microwave heating unit 700 made of a ferroelectric may form transmitted waves having various types of wavelengths.

A plurality of wavelengths of various lengths formed by passing through the microwave heating unit 700 made of a ferroelectric are irradiated to the heat treatment material 520 to be subjected to heat treatment, so that the heat treatment target can be heated more evenly. That is, even if the microwave oscillation unit 300 oscillates a wavelength of a single frequency, the heat treatment material 520 may be irradiated with wavelengths of various frequencies by the microwave heating unit 700 made of a ferroelectric. The microwave heating unit 700 may be heated to a high temperature to heat the surface of the target to be heat treated, and may irradiate various types of transmitted waves to the target to be heat treated.

In the present disclosure, microwaves emitted from the microwave oscillation unit 300 heat the inside of the object to be subjected to heat treatment, and at the same time, the heat generated from the microwave heating unit 700 and transmitted waves having various wavelengths are external to the object and By heating the inside, the time of the heat treatment process can be shortened and the heat treatment target can be uniformly heated.

The heat reflection plate 800 may be disposed adjacent to the microwave heating unit 700 to reflect heat generated from the microwave heating unit 700 . In the case of FIG. 2 , since the heat treatment material 520 is disposed below the microwave heating unit 700 , the heat reflection plate 800 may be disposed above the microwave heating unit 700 . By disposing the heat reflection plate 800 on the microwave heating part 700, it is possible to prevent heat from being dissipated.

However, when the heat treatment material 520 is additionally disposed on the microwave heating part 700 , the configuration of the heat reflector 800 may be omitted.

7 is a front view illustrating an internal structure of a heat treatment chamber according to another embodiment of the present disclosure. The heat treatment chamber shown in FIG. 7 is configured as a single chamber unlike that shown in FIGS. 1 to 3 . Although the gas circulation device 600 is omitted in FIG. 7 for convenience of explanation, a gas injector and a gas exhauster penetrating a part of the outer frame 110 may be disposed.

The heat treatment chamber shown in FIG. 7 may be used to heat an object to be heat treated that does not form contaminants during heat treatment. Accordingly, the gas circulation device 600 configured to discharge contaminants in the chamber may be omitted. If the inner frame 210 and the gas circulation device 600 are additionally configured in the heat treatment chamber shown in FIG. 7, the heat treatment chamber of FIG. 2 may be the same.

As shown in FIG. 7 , the heat treatment chamber may include a chamber, a microwave oscillation unit 300 , and a dispersion member 400 . The chamber is configured to have an opening formed on one side and include an external frame configured to insulate the inside, and to carry in or take out the subject of heat treatment from the opening. The microwave oscillator 300 is configured to oscillate microwaves into the chamber. A plurality of microwave oscillation units 300 may be disposed. The dispersing member 400 is disposed on the inner wall of the outer frame 110 and is configured to disperse the incident microwave into the interior of the chamber. A plurality of dispersing members 400 may be disposed.

As shown in FIG. 7 , the dispersion member 400 is disposed on the inner wall of the outer frame 110 , and the heat treatment material 520 is placed on the heat treatment material support unit 500 in the chamber that is the space inside the outer frame 110 . supported and placed by A microwave heating unit 700 may be disposed on the upper portion of the heat treatment material 520 . The subject of the heat treatment may be disposed on the heat treatment material 520 to be heat treated, but is not limited thereto and may be configured in a sliding manner or a tray method as shown in FIG. 2 .

As shown in FIG. 7 , unlike the heat treatment chamber shown in FIG. 2 , the frame vibrating unit 540 may be disposed on the inner wall of the outer frame 110 . However, the present invention is not limited thereto, and the frame vibrating unit 540 may be disposed on the outer wall of the outer frame 110 .

According to the present disclosure, the microwave does not simply heat the outside, but induction heats the liquid component present inside the object to be heat treated, so that the fumes can be emitted while the inside is hardened before the surface part is hardened. Therefore, it is possible to increase the production process efficiency by shortening the time to remove the fume, there is a technical feature that can also save the power consumed in the heat treatment chamber (10).

If thermal curing was performed between 450 and 500 degrees in the conventional IR method due to the characteristics of these microwaves, an embodiment according to the present disclosure can be performed at a lower temperature and in a shorter time than conventional heat treatment chambers even between 350 and 400 degrees. Heat treatment is possible.

The present disclosure has a technical feature in that the region of the inner chamber 200 can be uniformly heated using a microwave having a single frequency.

8 is a schematic diagram of an in-line heat treatment apparatus according to an embodiment of the present disclosure. The in-line heat treatment apparatus shown in FIG. 8 is exemplary. A description of the configuration overlapping with the heat treatment apparatus of the present disclosure among the configurations shown in FIG. 8 will be omitted.

Referring to FIG. 8 , the inline heat treatment apparatus may include a microwave oscillation unit 300 , a dispersion member 400 , a microwave heating unit 700 , a transfer unit 910 , and a housing 920 .

The transfer unit 910 is a device for transferring the object to be heat treated from the inlet side to the outlet side while the subject to be heat treated is heat treated in the housing 920 . The transfer unit 910 may include a transfer roller 911 and a transfer belt, and by rotating the plurality of transfer rollers 911, at least one heat treatment material 520 disposed on the transfer belt may be moved to the exit side. .

A heat treatment material vibrating unit 530 may be disposed on one surface of the heat treatment material 520 . A frame vibrating unit 540 may be disposed on an inner wall of the housing 920 . The microwave heating unit 700 is disposed to be spaced apart from the transfer unit 910 by a predetermined distance. The microwave heating unit 700 is disposed on the upper portion of the transfer unit 910 to be spaced apart from each other by a predetermined distance. The microwave heating unit 700 may be formed of a ferroelectric.

In the housing 920 of the in-line heat treatment apparatus, a shielding wall may be disposed to prevent external air from being introduced while the object to be heat treated is heat treated inside. The housing 920 has an inlet through which the subject of heat treatment can enter on one side, and an outlet through which the subject of heat treatment can advance at the other side.

Although not shown in FIG. 8 , the inline heat treatment apparatus may further include a gas circulation device, like the heat treatment chamber illustrated in FIG. 2 .

The above description is merely illustrative of the technical idea of this embodiment, and various modifications and variations will be possible without departing from the essential characteristics of the present embodiment by those skilled in the art to which this embodiment belongs. Accordingly, the present embodiments are intended to explain rather than limit the technical spirit of the present embodiment, and the scope of the technical spirit of the present embodiment is not limited by these embodiments. The protection scope of this embodiment should be interpreted by the following claims, and all technical ideas within the scope equivalent thereto should be interpreted as being included in the scope of the present embodiment.

10: heat treatment chamber 100: outer chamber
200: inner chamber 300: microwave oscillation unit
400: dispersion member 410: reflector
500: heat treatment material support 600: gas circulation device
700: microwave heating part 800: heat reflector

Claims (14)

A chamber having an opening formed on one side and including an external frame configured to block the microwave inside, the heat treatment material containing the subject of heat treatment is disposed inside the external frame;
at least one microwave oscillator configured to oscillate the microwave into the chamber;
at least one dispersing member disposed on the inner wall of the outer frame and configured to disperse the incident microwave into the chamber;
a microwave heating unit disposed in the chamber and configured to generate heat by the microwave oscillation unit;
a heat treatment material vibrating unit disposed to transmit vibrations having a first frequency and a first amplitude to the subject of the heat treatment; and
A frame vibrator disposed to transmit vibrations having a second frequency lower than the first frequency and a second amplitude greater than the first amplitude to the external frame
A heat treatment chamber comprising a. The method of claim 1,
The chamber is
an inner chamber including an inner frame having an opening formed on one side and configured to carry in or take out a subject to be heat treated from the opening of the inner frame; and
An outer chamber including the outer frame, formed to surround the outside of the inner frame, and configured to insulate the inner chamber
A heat treatment chamber comprising a. According to claim 1,
The heat treatment chamber according to claim 1, further comprising a heat reflecting plate disposed adjacent to the microwave heating unit and configured to reflect heat generated from the microwave heating unit. According to claim 1,
The microwave heat treatment chamber, characterized in that the ferroelectric. According to claim 1,
A heat treatment chamber, characterized in that the microwave heating part is disposed in a plurality of upper and lower portions of the heat treatment material. a chamber including an outer frame having an opening formed on one side, and in which a heat treatment material containing a subject to be heat treated is disposed inside the outer frame;
a heat treatment material support portion configured to support at least a portion of the heat treatment material;
a heat treatment material vibrating unit disposed to transmit vibrations having a first frequency and a first amplitude to the subject of the heat treatment; and
A frame vibrator disposed to transmit vibrations having a second frequency lower than the first frequency and a second amplitude greater than the first amplitude to the external frame
A heat treatment chamber comprising a. 7. The method of claim 6,
Heat treatment chamber, characterized in that the heat treatment material vibrating unit is disposed in contact with at least a portion of the heat treatment material support portion or at least a portion of the heat treatment material. delete 7. The method of claim 6,
The heat treatment chamber, characterized in that the frame vibration unit is disposed on the inner wall or the outer wall of the outer frame. 7. The method of claim 6,
The chamber is
an inner chamber including an inner frame having an opening formed on one side and configured to carry in or take out a subject to be heat treated from the opening of the inner frame; and
An outer chamber including the outer frame, formed to surround the outside of the inner frame, and configured to insulate the inner chamber
A heat treatment chamber comprising a. 11. The method of claim 10,
The heat treatment chamber, characterized in that the frame vibration unit is disposed on the inner wall or the outer wall of the inner frame. delete delete delete

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