KR101476987B1 - Heat treatment apparatus - Google Patents

Abstract

The present invention relates to a heat treatment apparatus. The heat treatment apparatus according to the present invention includes a chamber (10) which includes a receiving space in which an object (1) to be heated is arranged and an opening part on one side thereof, a lamp heater (20) which is arranged outside the chamber (10) and heats the object (1) to be heated by emitting infrared rays (3) to one side of the chamber (10), and a filter (30) which seals the chamber (10) by covering the opening part and transmits only the infrared rays (3) with a preset wavelength region to the object (1) to be heated by filtering the infrared rays (3) emitted from the lamp heater (20).

Description

[0001] HEAT TREATMENT APPARATUS [0002]

The present invention relates to a heat treatment apparatus.

In the process of manufacturing an electronic device based on a substrate, a liquid metal, an inorganic material, an organic material, and the like are attached to the substrate through a heat treatment process in a thin film form. Such heat treatment processes heat and cool the material, such as drying, annealing, sintering, etc., to improve the properties of the material. The liquid material deposited on the substrate undergoes a process such as phase change and crystallization in a heat treatment process. Generally, a hot air drying method is used to dry a thin film attached to a substrate. Here, the hot air drying method is a method in which heated air is blown into a thin film of a substrate to evaporate the solvent. However, in the hot air drying method, since the temperature inside the thin film must rise to a temperature necessary for evaporation, it takes a long time to dry. In the hot air drying method, since heated air is blown to the surface of the thin film, there is also a problem that the thickness of the thin film becomes uneven by the air current. In addition, since the hot air drying method is dried from the surface of the thin film to harden it, the solvent inside the thin film can not be evaporated, and bubbles are formed, which causes a failure of the electronic device.

In order to solve the problem of the hot air drying method, an infrared heat type heat treatment apparatus has been devised as disclosed in the following prior patent documents. Such an infrared heating type heat treatment apparatus includes an infrared heater and transfers heat to the inside of the thin film in the form of infrared energy, so that the thin film is dried quickly and uniformly. Meanwhile, an infrared heater used in a conventional infrared heating type heat treatment apparatus is composed of a glass tube into which a vacuum or an inert gas is injected and an infrared ray generating coil disposed in the glass tube. At this time, when the infrared ray generating coil is supplied with power, the infrared ray radiates heat while generating heat, so that convection heat is also generated in the infrared ray heater. Therefore, in the conventional infrared heating type heat treatment apparatus, convection heat is transferred to the surface of the thin film as in the hot air drying method, so that unevenness in thickness and bubble are generated. On the other hand, since the heating temperature differs depending on the kind of the thin film and the drying, annealing and firing processes, a suitable infrared wavelength range also differs. However, in the conventional infrared heating type heat treatment apparatus, since a specific infrared heater is fixed, there is a disadvantage that it can be used only in a specific temperature condition and a wavelength condition.

Accordingly, there is a desperate need for a solution to the problem occurring in the conventional heat treatment apparatus.

KR 2001-0078862 A

SUMMARY OF THE INVENTION The present invention has been made in order to solve the problems of the conventional art described above. One aspect of the present invention is to provide a lamp heater for heating an object to be heated by radiating infrared rays and a filter for filtering infrared rays, And to provide a heat treatment apparatus which performs heat treatment to prevent thickness irregularity and bubble generation of the thin film.

Another aspect of the present invention is to provide a heat treatment apparatus for transferring stable infrared energy to an object to be heated by providing a shielding film detachably disposed between the lamp heater and the filter.

The heat treatment apparatus according to an embodiment of the present invention includes a chamber having a storage space in which an object to be heated is disposed and having an opening formed on one surface thereof, A lamp heater for heating the heated object, and a filter for sealing the chamber by covering the opening, filtering the infrared ray emitted from the lamp heater, and transmitting only the infrared ray having a predetermined wavelength range to the object to be heated do.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the apparatus further includes a cooling unit for cooling the convection heat generated in the lamp heater.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the cooling section includes a cooling pipe disposed on the outer wall of the case for housing the lamp heater, and the cooling water flowing therein.

In the heat treatment apparatus according to the embodiment of the present invention, a reflector is disposed on the lamp heater and reflects the infrared ray emitted from the lamp heater and concentrates the infrared ray on the filter.

In addition, in the heat treatment apparatus according to the embodiment of the present invention, a blocking film, which is detachably disposed between the lamp heater and the filter, and blocks the infrared ray emitted from the lamp heater.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the shielding film is disposed until the temperature of the lamp heater is increased and becomes constant, and the radiation amount of the infrared ray is fixed due to the constant temperature of the lamp heater Removed.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the filter is made of quartz glass.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the lamp heater and the filter are detachably arranged and replaceable.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the vacuum pump further comprises a vacuum pump for forming the storage space in a vacuum state.

Further, in the heat treatment apparatus according to the embodiment of the present invention, a gas nozzle for injecting a protective gas into the storage space is further included.

Further, in the heat treatment apparatus according to the embodiment of the present invention, the object to be heated is a flexible substrate to which a thin film is attached.

According to the present invention, since the lamp heater for heating the object to be heated by emitting infrared rays and the filter for filtering the infrared ray and blocking the convection heat are provided, only infrared rays of a specific wavelength range are transmitted to the object to be heated, It is not transferred to water, so that heat treatment is performed quickly, and thickness irregularity and bubble generation are prevented.

Further, according to the present invention, since the infrared ray is passed after the infrared radiation amount of the lamp heater is stabilized by providing the blocking film detachably disposed between the lamp heater and the filter, there is an advantage of transmitting stable infrared energy to the object to be heated .

1 is a perspective view of a heat treatment apparatus according to an embodiment of the present invention.
2 is an exploded perspective view of a heat treatment apparatus according to an embodiment of the present invention.
3 is a cross-sectional view taken along the line AA 'in a state where the blocking film shown in FIG. 1 is removed.
4 is a cross-sectional view taken along the line AA 'in a state where the blocking film shown in FIG. 1 is disposed.
5 to 6 are graphs showing temperature changes with time of the lamp heater according to the embodiment of the present invention.
7 is a perspective view of a heat treatment apparatus according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The objectives, specific advantages and novel features of the present invention will become more apparent from the following detailed description taken in conjunction with the accompanying drawings, in which: FIG. It should be noted that, in the present specification, the reference numerals are added to the constituent elements of the drawings, and the same constituent elements are assigned the same number as much as possible even if they are displayed on different drawings. Also, the terms "first "," second ", and the like are used to distinguish one element from another element, and the element is not limited thereto. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following description of the present invention, detailed description of related arts which may unnecessarily obscure the gist of the present invention will be omitted.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view of a heat treatment apparatus according to an embodiment of the present invention, FIG. 2 is an exploded perspective view of a heat treatment apparatus according to an embodiment of the present invention, FIG. And FIG. 4 is a cross-sectional view taken along line AA 'in a state where the blocking film shown in FIG. 1 is arranged.

1 to 4, a thermal processing apparatus according to an embodiment of the present invention includes a chamber 10 having a storage space in which an object 1 to be heated is disposed, an opening formed on one surface of the chamber 10, A lamp heater 20 disposed outside the chamber 10 for heating the object 1 to emit an infrared ray 3 to one surface of the chamber 10 and a chamber 10 for covering the opening 10, And a filter 30 for filtering the infrared rays 3 emitted from the lamp heater 20 and transmitting only the infrared rays 3 having a predetermined wavelength range to the object 1 to be heated.

The heat treatment apparatus according to the present invention includes a chamber 10, a lamp heater 20 and a filter 30 for performing a heat treatment process of the object 1 using only infrared rays 3 of a specific wavelength range .

Here, the heat treatment process refers to a process such as drying, annealing, sintering, etc. used in the process of manufacturing a substrate-based electronic device. Therefore, the object 1 to be heated is a substrate used for an electronic device, and a thin film 1b formed of a metal, an organic active layer or the like is attached because an electric circuit is knitted. The thin film 1b may be formed by printing and coating a liquid material on a substrate, followed by heating and drying. However, the material for forming the thin film 1b is not limited to the liquid material formed by heating and drying in the substrate, but includes all materials which are heated and subjected to a process such as phase change and crystallization. On the other hand, the substrate may be a flexible substrate 1a formed of a flexible material such as polycarbonate (PC), PMMA (Poly Methl Methacrylate) or the like and bent without any damage. Generally, the flexible substrate 1a is vulnerable to heat, but since the heat treatment apparatus according to the present invention uses infrared (3) heating, the flexible substrate 1a with the thin film 1b attached thereto can also be heated. However, the substrate may be formed of a material having high hardness such as silicon and glass in addition to the flexible substrate 1a. Therefore, although the substrate will be described as the flexible substrate 1a in the following, it is not limited to the flexible substrate 1a.

The chamber 10 is a place where the object 1 to be heated is placed and heated, and a storage space and an opening are formed. Here, the storage space is provided inside the chamber 10 where the heated object 1 is disposed. At this time, an inlet is formed in the chamber 10 to allow the object 1 to be heated and cooled, and a door for opening and closing the inlet can be installed. In addition, the outer wall of the chamber 10 may be formed of a transparent member so that the state of the object 1 to be inspected can be visually confirmed from the outside. At this time, the transparent member is formed on the entire outer wall or part of the chamber 10. On the other hand, the opening is a passage through which the infrared ray 3 emitted from the lamp heater 20 passes, and one surface of the chamber 10 is opened.

Here, the lamp heater 20 is a heating device that heats the object 1 to be heated by emitting infrared rays 3. Specifically, the lamp heater 20 includes a glass tube into which a vacuum state or an inert gas is injected, and an infrared ray generating coil disposed inside the glass tube, so that the lamp heater 20 generates heat when power is supplied to emit the infrared ray 3. However, the lamp heater 20 is not necessarily limited to this, and includes all known heating devices that emit the infrared rays 3. On the other hand, the heating of the infrared ray (3) means that the material is irradiated with the infrared ray (3) having a strong heat action. Specifically, when the infrared ray 3, which is in a frequency region substantially equal to the natural frequency of the object 1 to be heated, strikes the object 1 to be heated, electromagnetic resonance phenomenon occurs and energy is absorbed by the object 1 to be heated , Heat energy is generated due to vibration or rotation of the molecule.

On the other hand, the lamp heater 20 is disposed outside the chamber 10. Therefore, the convection heat 5 generated on the lamp surface of the lamp heater 20 is not transferred to the object 1 to be heated, because the storage space of the lamp heater 20 and the chamber 10 is spatially separated. Since the lamp heater 20 emits the infrared ray 3 from one side of the chamber 10 to the other side of the chamber 10, the infrared ray 3 passes through the opening of the chamber 10, .

The filter 30 is a member that selectively transmits the infrared rays 3 according to wavelengths and is disposed on one side of the chamber 10 to cover the openings. The filter 30 filters the infrared rays 3 emitted from the lamp heater 20 and outputs the infrared rays 3 having a predetermined wavelength range Only the infrared rays 3 having the infrared rays 3 are transmitted to the object 1 to be heated. Here, the predetermined wavelength region means an optimum infrared (3) wavelength region that is absorbed only in the thin film 1b while transmitting through the flexible substrate 1a. Therefore, in the flexible substrate 1a, generation of heat energy due to vibration of molecules is suppressed, so that even if the flexible substrate 1a which is susceptible to heat is subjected to the heat treatment process, it is not deformed. Thus, the filter 30 controls the transmission wavelength region of the infrared (3) energy which can not be controlled by the lamp heater 20 alone. At this time, the filter 30 may be formed of quartz glass.

On the other hand, since the filter 30 covers the opening, the chamber 10 is sealed. Therefore, the inside of the chamber 10 can be provided with an atmosphere necessary for a heat treatment such as a vacuum state. Details will be described later.

Further, the filter 30 blocks transmission of the convection heat 5 generated on the lamp surface of the lamp heater 20. [ As described above, the lamp heater 20 emits the infrared ray 3 while the infrared ray generating coil generates heat, so that the convection heat 5 also occurs. However, since the filter 30 is disposed between the lamp heater 20 and the object 1 to be heated while sealing the chamber 10, the convection heat 5 is prevented from being transmitted to the object 1 to be heated.

Therefore, in the heat treatment apparatus according to the present invention, the infrared ray 3 transmits heat with a specific wavelength of radiation energy in a state in which the convection heat 5 is blocked, so that the object 1 is not affected by hot air. Therefore, the thin film 1b has a uniform thickness and a stabilized shape. Since the radiant energy is uniformly dispersed and absorbed in the thin film 1b without the use of a heating medium, the infrared ray 3 can efficiently absorb the solvent inside the thin film 1b and prevent bubbles from being generated therein There are advantages.

Meanwhile, the lamp heater 20 and the filter 30 may be detachably arranged so that the infrared ray 3 energy suitable for the light absorbing characteristic of the object 1 to be heated is transferred thereto . Here, the wavelength of the infrared ray 3 to be emitted differs depending on the type of the lamp heater 20, and the wavelength range to be transmitted by the filter 30 differs depending on the type. Therefore, the heat treatment apparatus according to the present invention can selectively use the lamp heater 20 and the filter 30 according to the light absorbing characteristics of the object 1, because the lamp heater 20 and the filter 30 can be replaced. .

Meanwhile, the heat treatment apparatus according to the embodiment of the present invention may further include a cooling unit 40 for cooling the convection heat 5 generated in the lamp heater 20. As described above, since the convection heat 5 generated in the lamp heater 20 affects the flexible substrate 1a and the thin film 1b, the cooling part 40 cools the convection heat 5, Thereby preventing damage to the flexible substrate 1a and the thin film 1b due to the heat 5. [ Specifically, the cooling section 40 may include a water-cooled cooling pipe 41. [ Here, the cooling pipe 41 is a pipe through which cooling water flows. At this time, since the cross section of the cooling pipe 41 can be variously formed, it is not necessarily limited to a circular shape. This cooling pipe 41 is disposed on the outer wall of the case 21 that houses the lamp heater 20 and cools the convection heat 5 by heat transfer. At this time, the cooling pipe 41 may be in close contact with the wall surface of the case 21, or may form a wall surface thereof. On the other hand, the cooling section 40 may further include a pump for circulating cooling water.

Meanwhile, the heat treatment apparatus according to the embodiment of the present invention may further include a reflector 50 so that the infrared ray 3 is efficiently concentrated on the object 1 to be heated. Here, the reflector 50 is disposed on the upper side of the lamp heater 20 as a reflector, and reflects the infrared rays 3 emitted from the lamp heater 20 and concentrates the reflected infrared rays 3 on the filter 30. Therefore, since the infrared ray 3 concentrated on the filter 30 is transmitted through the filter 30 to the object 1 to be heated, the energy efficiency can be improved.

Meanwhile, the heat treatment apparatus according to the embodiment of the present invention may further include a shielding film 60 so that stable infrared rays 3 are transmitted to the object 1 to be heated. Here, the shielding film 60 blocks infrared rays 3 generated in the lamp heater 20. Specifically, the shielding film 60 is detachably disposed between the lamp heater 20 and the filter 30. Therefore, when the blocking film 60 is removed, the infrared ray 3 emitted from the lamp heater 20 is transmitted to the heated object 1 through the filter 30 (see FIG. 3) The infrared ray 3 is not transmitted to the object 1 to be heated because the infrared ray 3 is blocked when the object 1 is placed. This shielding film 60 is for transmitting stable infrared rays 3 to the object 1 to be heated, and will be described in detail below.

5 to 6 are graphs showing temperature changes with time of the lamp heater according to the embodiment of the present invention.

As shown in FIG. 5, when the lamp heater 20 (see FIG. 3) is turned on, the temperature rises continuously, and when the constant time is reached, the temperature becomes constant. For example, the temperature of the lamp heater 20 (see FIG. 3) becomes constant after 8 seconds in the case of a 800 W lamp heater, and 9 seconds in the case of a 600 W lamp heater, but 9 It is not fixed even after seconds. When the temperature becomes constant, each of the lamp heaters 20 (see FIG. 3) emits a stable infrared ray 3 (see FIG. 3). On the other hand, since the infrared rays 3 (see FIG. 3) emitted during the continuous rise of the temperature are not stabilized, the infrared rays 3 (see FIG. 3) are transmitted to the object 1 , A defect occurs in the thin film 1b (see FIG. 3). More specifically, when the emitter is at a high temperature, it radiates a short-wave radiant energy having a high energy intensity, while at a low temperature emits a long-wave radiant energy. That is, the wavelength of the radiant energy differs depending on the temperature of the radiator. With the same principle, since the temperature of the lamp heater 20 (see Fig. 3) rises for a certain period of time, the wavelength of the infrared ray 3 (see Fig. 3) energy changes from relatively longwave to shortwave. For example, in the case of a heat treatment process at a relatively high temperature, an infrared ray 3 (see FIG. 3) of shortwave should be used, and a long infrared ray 3 (see FIG. 3) emitted from the lamp heater 20 ) Is preferentially transferred to the object 1 (see Fig. 3), defects may occur in the thin film 1b (see Fig. 3). 4) is disposed until the temperature of the lamp heater 20 (see FIG. 4) is raised and becomes constant, that is, until the stabilized infrared ray 3 (see FIG. 4) The infrared rays 3 (see FIG. 3) are transmitted to the object 1 (see FIG. 3) by being removed when the temperature of the lamp heater 20 (see FIG.

6, even when the lamp heater 20 (see FIG. 4) is turned off, the temperature is lowered for a predetermined time and residual heat is generated, so that the infrared ray 3 (see FIG. 4) is emitted. At this time, by disposing the shielding film 60 (see Fig. 4), unstable infrared rays 3 (see Fig. 4) can be prevented from being transmitted to the object 1 (see Fig. 4).

7 is a perspective view of a heat treatment apparatus according to another embodiment of the present invention.

As shown in FIG. 7, the heat treatment apparatus according to another embodiment of the present invention may further include a vacuum pump 80 to create a vacuum atmosphere in the chamber 10. Here, the vacuum pump 80 discharges the gas molecules present in the chamber 10 in the chamber 10 to the outside of the chamber 10, thereby making the interior of the chamber 10 in a vacuum state. On the other hand, during the heat treatment process, the process may be performed in a vacuum state as in the case of depositing an organic semiconductor on a substrate. Accordingly, the heat treatment apparatus according to the present invention can form the chamber 10 in a vacuum atmosphere, if necessary, and perform the heat treatment process without being affected by the external gas.

Further, the heat treatment apparatus according to the present invention may further include a gas nozzle 80 so that a protective gas can be injected into the chamber 10. Here, the gas nozzle 80 is a tube for injecting a protective gas such as nitrogen, argon or the like into the storage space of the chamber 10. Since the protective gas is an inert gas, the object 1 (see FIG. 3) is protected from oxygen and moisture during the heat treatment process.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the same is by way of illustration and example only and is not to be construed as limiting the present invention. It is obvious that the modification or improvement is possible.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

1: Heating object 1a: Flexible substrate
1b: thin film 3: infrared
5: convection column 10: chamber
20: Lamp heater 21: Case
30: filter 40: cooling section
41: Cooling tube 50: Reflector
60: blocking membrane 70: vacuum pump
80: Gas nozzle

Claims (11)

A chamber having a storage space in which an object to be heated is disposed and having an opening formed on one surface thereof;
A lamp heater disposed outside the chamber, the lamp heater emitting infrared rays to one side of the chamber to heat the object; And
A filter that covers the opening to seal the chamber and filter the infrared rays emitted from the lamp heater to transmit only the infrared rays having a predetermined wavelength range to the object;
Lt; / RTI >
A cooling unit for cooling the convection heat generated in the lamp heater;
Further comprising:
The cooling unit includes:
And a cooling pipe disposed on an outer wall of the case for accommodating the lamp heater and through which cooling water flows,
Wherein the cooling pipe is in close contact with a wall surface of the case or forms a wall surface of the case itself to cool the inside of the case,
A blocking film detachably disposed between the lamp heater and the filter to block the infrared rays emitted from the lamp heater;
, ≪ / RTI >
The shielding film is disposed until the temperature of the lamp heater is increased and becomes constant, and the radiation amount of the infrared ray is fixed after the temperature of the lamp heater is fixed,
And the removed barrier film is rearranged when the lamp heater is turned off. delete delete The method according to claim 1,
And a reflector disposed on the lamp heater for reflecting the infrared ray emitted from the lamp heater and focusing the infrared ray on the filter. delete delete The method according to claim 1,
Wherein the filter is quartz glass. The method according to claim 1,
Wherein the lamp heater and the filter are detachably arranged and replaceable. The method according to claim 1,
A vacuum pump for creating the storage space in a vacuum state;
Further comprising: The method according to claim 1,
A gas nozzle for injecting a protective gas into the storage space;
Further comprising: The method according to claim 1,
Wherein the object to be heated is a flexible substrate to which a thin film is attached.

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