KR102358551B1 - 자동 시료편 제작 장치 - Google Patents

자동 시료편 제작 장치 Download PDF

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Publication number
KR102358551B1
KR102358551B1 KR1020150120990A KR20150120990A KR102358551B1 KR 102358551 B1 KR102358551 B1 KR 102358551B1 KR 1020150120990 A KR1020150120990 A KR 1020150120990A KR 20150120990 A KR20150120990 A KR 20150120990A KR 102358551 B1 KR102358551 B1 KR 102358551B1
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KR
South Korea
Prior art keywords
sample piece
needle
sample
computer
columnar portion
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KR1020150120990A
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English (en)
Korean (ko)
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KR20160026752A (ko
Inventor
사토시 도미마츠
마코토 사토
요 야마모토
Original Assignee
가부시키가이샤 히다치 하이테크 사이언스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20160026752A publication Critical patent/KR20160026752A/ko
Application granted granted Critical
Publication of KR102358551B1 publication Critical patent/KR102358551B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/081—Investigating materials by wave or particle radiation secondary emission incident ion beam, e.g. proton
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020150120990A 2014-08-29 2015-08-27 자동 시료편 제작 장치 KR102358551B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-176241 2014-08-29
JP2014176241 2014-08-29

Publications (2)

Publication Number Publication Date
KR20160026752A KR20160026752A (ko) 2016-03-09
KR102358551B1 true KR102358551B1 (ko) 2022-02-04

Family

ID=55420589

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150120990A KR102358551B1 (ko) 2014-08-29 2015-08-27 자동 시료편 제작 장치

Country Status (2)

Country Link
KR (1) KR102358551B1 (zh)
CN (1) CN105388048B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6931214B2 (ja) * 2017-01-19 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6885576B2 (ja) * 2017-01-19 2021-06-16 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6974820B2 (ja) * 2017-03-27 2021-12-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、試料加工方法
JP6541161B2 (ja) * 2017-11-17 2019-07-10 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP7141682B2 (ja) * 2018-02-28 2022-09-26 株式会社日立ハイテクサイエンス 試料製造装置および試料片の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171364A (ja) 1998-12-02 2000-06-23 Hitachi Ltd 試料作製装置
JP3547143B2 (ja) * 1997-07-22 2004-07-28 株式会社日立製作所 試料作製方法
JP2005322419A (ja) 2004-05-06 2005-11-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP2008026312A (ja) 2006-06-23 2008-02-07 Fei Co 平面ビュー・サンプル作製
JP2009224788A (ja) 2009-04-27 2009-10-01 Hitachi Ltd プローブ装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3677968B2 (ja) 1997-10-01 2005-08-03 株式会社日立製作所 試料解析方法および装置
US8859963B2 (en) * 2011-06-03 2014-10-14 Fei Company Methods for preparing thin samples for TEM imaging
EP2749863A3 (en) * 2012-12-31 2016-05-04 Fei Company Method for preparing samples for imaging
JP5723801B2 (ja) * 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
JP6105204B2 (ja) * 2012-02-10 2017-03-29 株式会社日立ハイテクサイエンス Ｔｅｍ観察用試料作製方法
JP5852474B2 (ja) * 2012-03-01 2016-02-03 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9129773B2 (en) * 2012-06-08 2015-09-08 Hitachi High-Technologies Corporation Charged particle beam apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3547143B2 (ja) * 1997-07-22 2004-07-28 株式会社日立製作所 試料作製方法
JP2000171364A (ja) 1998-12-02 2000-06-23 Hitachi Ltd 試料作製装置
JP2005322419A (ja) 2004-05-06 2005-11-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP2008026312A (ja) 2006-06-23 2008-02-07 Fei Co 平面ビュー・サンプル作製
JP2009224788A (ja) 2009-04-27 2009-10-01 Hitachi Ltd プローブ装置

Also Published As

Publication number Publication date
KR20160026752A (ko) 2016-03-09
CN105388048B (zh) 2019-11-05
CN105388048A (zh) 2016-03-09

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