KR102348514B9 - Shield for sputter and manufacturing method thereof - Google Patents

Shield for sputter and manufacturing method thereof

Info

Publication number
KR102348514B9
KR102348514B9 KR1020200013174A KR20200013174A KR102348514B9 KR 102348514 B9 KR102348514 B9 KR 102348514B9 KR 1020200013174 A KR1020200013174 A KR 1020200013174A KR 20200013174 A KR20200013174 A KR 20200013174A KR 102348514 B9 KR102348514 B9 KR 102348514B9
Authority
KR
South Korea
Prior art keywords
sputter
shield
manufacturing
Prior art date
Application number
KR1020200013174A
Other languages
Korean (ko)
Other versions
KR20200100535A (en
KR102348514B1 (en
Inventor
최종백
김대근
이문기
Original Assignee
아이원스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아이원스 주식회사 filed Critical 아이원스 주식회사
Publication of KR20200100535A publication Critical patent/KR20200100535A/en
Application granted granted Critical
Publication of KR102348514B1 publication Critical patent/KR102348514B1/en
Publication of KR102348514B9 publication Critical patent/KR102348514B9/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3441—Dark space shields
KR1020200013174A 2019-02-18 2020-02-04 Shield for sputter and manufacturing method thereof KR102348514B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020190018459 2019-02-18
KR20190018459 2019-02-18

Publications (3)

Publication Number Publication Date
KR20200100535A KR20200100535A (en) 2020-08-26
KR102348514B1 KR102348514B1 (en) 2022-01-07
KR102348514B9 true KR102348514B9 (en) 2023-04-12

Family

ID=72242398

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200013174A KR102348514B1 (en) 2019-02-18 2020-02-04 Shield for sputter and manufacturing method thereof

Country Status (1)

Country Link
KR (1) KR102348514B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102634206B1 (en) 2023-09-19 2024-02-06 동양엠더블유주식회사 Manufacturing Method of Shield with improved Surface Area and Surface Roughness

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11236667A (en) * 1998-02-20 1999-08-31 Trace Storage Technol Corp Shield for sputtering device and treatment of surface of the same
KR20030073931A (en) * 2002-03-14 2003-09-19 삼성전자주식회사 Apparatus for sputtering
JP2005133183A (en) * 2003-10-31 2005-05-26 Optrex Corp Sputtering apparatus and sputtering method
KR101545122B1 (en) 2015-04-21 2015-08-18 김규선 Shield Plate Manufacturing Method for Sputtering Device and Shield Plate Thereof

Also Published As

Publication number Publication date
KR20200100535A (en) 2020-08-26
KR102348514B1 (en) 2022-01-07

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Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]