KR102344201B1 - Stretchable substrate and electronic device comprising the same - Google Patents

Abstract

The present application relates to a stretchable polymer film having a depression on at least one surface; and a non-stretchable pattern provided in the recessed portion of the stretchable polymer film, wherein at least one surface of the non-stretchable pattern is exposed to the outside, and an edge of the exposed surface is surrounded by the stretchable polymer film It relates to a stretchable substrate and an electronic device.

Description

Stretchable substrate and electronic device including same

The present specification relates to a stretchable substrate and an electronic device including the same.

Conventionally, the display device includes an unbreakable display, a curved display, a bent display, a foldable display, and a rollable display. has been developed

Currently, the commercialization stage is about the mobile field in the form of a curved display, and it is expected that the mobile field using a foldable display will appear in earnest. In addition, the development speed of the electric field using pOLED is dazzling.

In particular, recently, according to the paradigm change of the display, a stretchable display that exceeds the characteristic of a display that can be wound has been developed, and a stretchable display needs to be easily stretched and contracted regardless of the direction. It is essential to develop a stretchable base material having high elongation and restoring force.

In the case of a stretchable display device including an electronic device, such as an organic light emitting device, since the electronic device does not include flexibility, a change in surface area due to stretching of the stretchable substrate may significantly reduce durability of the electronic device.

It is suggested that it can be applied to a display for medical purposes, starting with a touch screen panel as an application field of a stretchable display, and then as a wearable display using fiber. .

According to the above necessity, in forming the electronic device on the stretchable substrate, the durability of the electronic device can be maintained and there is a need to develop a stretchable substrate having excellent stretchability.

Japanese Patent Laid-Open No. 2006-299283

An object of the present application is to provide a stretchable substrate and an electronic device including the same.

An exemplary embodiment of the present application is a stretchable polymer film having a depression on at least one surface; and a non-stretchable pattern provided in the recessed portion of the stretchable polymer film, wherein at least one surface of the non-stretchable pattern is exposed to the outside, and an edge of the exposed surface is surrounded by the stretchable polymer film An object of the present invention is to provide a stretchable substrate.

In addition, an exemplary embodiment of the present application is a stretchable substrate according to an exemplary embodiment of the present application; and an electronic device provided on the adhesive layer of the stretchable substrate, wherein the electronic device is formed on a position where the non-stretchable pattern of the stretchable substrate is buried.

The stretchable substrate according to the exemplary embodiment of the present application is provided with a non-stretchable pattern having a structure recessed into the stretchable polymer film. It has a characteristic that the durability of the device is greatly improved.

In addition, the stretchable substrate according to the present application has a structure in which the non-stretchable pattern is embedded in the stretchable polymer film, at least one surface of the non-stretchable pattern is exposed to the outside, and an edge of the exposed surface is the stretchable polymer film It has a shape surrounded by , so it is possible to prevent loss of the non-stretchable pattern during the manufacturing process of the stretchable substrate, and to minimize the separation at the boundary between the stretchable polymer film and the non-stretchable pattern.

1 is a side view illustrating a stretchable substrate according to an exemplary embodiment of the present application.
2 is a side view illustrating a stretchable substrate according to an exemplary embodiment of the present application.
3 is an enlarged view of a side view of a stretchable substrate according to an exemplary embodiment of the present application.
4 is an enlarged top view of a stretchable substrate according to an exemplary embodiment of the present application.
5 shows an SEM image of the upper surface of the stretchable substrate manufactured according to Example 1 of the present application.
6 shows an SEM image of the upper surface of the stretchable substrate manufactured according to Example 2 of the present application.
7 shows an SEM image of the upper surface of the stretchable substrate prepared according to Comparative Example 1 of the present application.

Hereinafter, the present specification will be described in more detail.

Embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those of ordinary skill in the art to which the present invention pertains can easily carry out the present invention. However, the present invention may be embodied in several different forms and is not limited to the embodiments described herein.

An exemplary embodiment of the present application is a stretchable polymer film having a depression on at least one surface; and a non-stretchable pattern provided in the recessed portion of the stretchable polymer film, wherein at least one surface of the non-stretchable pattern is exposed to the outside, and an edge of the exposed surface is surrounded by the stretchable polymer film An object of the present invention is to provide a stretchable substrate.

The stretchable substrate has a depression in at least one surface of the stretchable polymer film, the non-stretch pattern is provided in the depression in the stretchable polymer film, at least one surface is exposed to the outside, and the edge of the exposed surface is the Having a shape surrounded by a stretchable polymer film, as shown in FIG. 1 , the non-stretchable pattern has a structure buried inside the stretchable polymer film, and at least one surface of the non-stretchable pattern is exposed to the outside.

In an exemplary embodiment of the present application, one side of the non-stretchable pattern is exposed to the outside, the other side is in contact with the stretchable polymer film, and the edge of the exposed surface is surrounded by the stretchable polymer film. A substrate is provided.

In the present application, the edge portion is a portion corresponding to the periphery of the end of one surface of the non-stretchable pattern, as can be seen in FIG. 4 . Specifically, FIG. 4 corresponds to a top view of the stretchable substrate according to the present application, where the portion indicated by a solid line indicates the position of the depression of the stretchable polymer film, and the portion indicated by the dotted line is the non-stretch pattern, at this time the edge The area corresponds to the area between the solid line indicating the position of the depression and the dotted line of the non-stretchable pattern.

In an exemplary embodiment of the present application, the Young's Modulus of the stretchable polymer film is G1, the Young's Modulus of the non-stretchable pattern is G2, and G1 and G2 satisfy the following Equations 1 to 3 It provides a stretchable substrate that is.

[Equation 1]

G1 ≤ 2 MPa

[Equation 2]

G2 ≥ 1000 MPa

[Equation 3]

G2/G1 ≥ 500

The Young's modulus of the stretchable polymer film and the non-stretchable pattern can be measured using Zwick/Roell's Z010 UTM equipment. Specifically, the stretchable polymer film and the non-stretchable material in the form of a film are 25±2° C., 50±5% Under RH (relative humidity), the Young's modulus can be obtained by measuring the stress/strain by fixing both ends in the longitudinal direction so that the width becomes 25mm and the length becomes 165mm, and then stretches it in the longitudinal direction at a speed of 100mm/min.

In the exemplary embodiment of the present application, Equation 1 may be G1 ≤ 2 MPa, preferably G1 ≤ 1.7 MPa, more preferably G1 ≤ 1.5 MPa.

In another exemplary embodiment, in Formula 1, G1 ≥ 0.01 MPa, preferably G1 ≥ 0.1 MPa, more preferably G1 ≥ 0.3 MPa.

In an exemplary embodiment of the present application, Equation 2 is G2 ≥ 1000 MPa, preferably G2 ≥ 2000 MPa, more preferably G2 ≥ 4000 MPa can be

In another exemplary embodiment, in Equation 2, G2 ≤ 10000 MPa, preferably G2 ≤ 9000 MPa, more preferably G2 ≤ 8000 MPa can be

In the exemplary embodiment of the present application, Equation 1 may be 0.01 MPa ≤ G1 ≤ 2 MPa, preferably 0.1 MPa ≤ G1 ≤ 1.7 MPa, more preferably 0.3 MPa ≤ G1 ≤ 1.5 MPa.

In an exemplary embodiment of the present application, Equation 2 may be 1000 MPa ≤ G2 ≤ 10000 MPa, preferably 2000 MPa ≤ G2 ≤ 8000 MPa, more preferably 4000 MPa ≤ G2 ≤ 8000 MPa.

As the stretchable substrate satisfies the ranges of Equations 1 and 2, when the stretchable substrate is uniaxially stretched, no separation occurs at the interface between the non-stretchable pattern and the stretchable polymer film, and accordingly, the durability of the electronic device in the future It is possible to have this excellent characteristic.

In an exemplary embodiment of the present application, Equation 3 satisfies G2/G1 ≥ 500, preferably G2/G1 ≥ 1000, and more preferably G2/G1 ≥ 3000.

In another exemplary embodiment, Equation 3 satisfies G2/G1 ≤ 60000, preferably G2/G1 ≤ 30000, and more preferably G2/G1 ≤ 20000.

In an exemplary embodiment of the present application, Equation 3 satisfies 500 ≤ G2/G1 ≤ 60000, preferably 2000 ≤ G2/G1 ≤ 30000, and more preferably 3000 ≤ G2/G1 ≤ 20000.

As the ratio of the stretchable polymer film to the non-stretchable pattern Young's modulus of the stretchable substrate satisfies the above range as shown in Equation 3, the stretchable substrate has excellent elongation and excellent durability.

In the exemplary embodiment of the present application, the non-stretchable pattern has a structure recessed into the stretchable polymer film in the structure of two or more islands spaced apart, the line width of the non-stretchable pattern is D1, and the stretchable polymer A distance between two adjacent non-stretchable patterns recessed into the film is D2, and D1 and D2 provide a stretchable substrate that satisfies Equations 4 and 5 below.

[Equation 4]

30μm ≤ D1 ≤ 1000μm

[Equation 5]

D2/D1 ≤ 4

The fact that the non-stretch pattern has a structure recessed into the stretchable polymer film with two or more islands spaced apart is a structure in which the non-stretch pattern is recessed inside at regular intervals, or the non-stretch pattern It is possible to include all structures recessed into the interior with this irregular spacing.

In the present application, the meaning of adjacent means that it is adjacent to or closest to the target configuration, and specifically, that the non-stretchable pattern embedded in the stretchable polymer film is adjacent means that it is adjacent to a specific one ratio. Based on the elastic pattern, it means that the distance between the center of the specific non-stretch pattern and the center of the adjacent non-stretch pattern is the closest. The central portion of the pattern means a central portion on one surface of the pattern.

1 is a side view of a stretchable substrate according to an exemplary embodiment of the present application, and a structure in which a non-stretchable pattern is depressed into a depression of a stretchable polymer film can be confirmed.

2 is a side view of a stretchable substrate according to an exemplary embodiment of the present application. Specifically, a line width 100 of a non-stretchable pattern and a distance 200 between adjacent non-stretchable patterns can be confirmed.

In the exemplary embodiment of the present application, the non-stretchable pattern may have a polygonal cross-section in the line width direction of the non-stretchable pattern.

In the exemplary embodiment of the present application, the non-stretchable pattern may have a cross-section in the line width direction of the non-stretchable pattern selected from the group consisting of a circle, a triangle, a quadrangle, a pentagon, and a hexagon.

In another exemplary embodiment, the non-stretchable pattern may have a quadrangular cross-section in the line width direction of the non-stretchable pattern.

In an exemplary embodiment of the present application, Equation 4 may be 30 μm ≤ D1 ≤ 1000 μm, preferably 30 μm ≤ D1 ≤ 500 μm, and more preferably 30 μm ≤ D1 ≤ 100 μm.

In the exemplary embodiment of the present application, Equation 5 may be D1/D2 ≤ 4, preferably D1/D2 ≤ 2, more preferably D1/D2 ≤ 1.

In another exemplary embodiment, in Equation 5, D1/D2 ≥ 0.1, preferably D1/D2 ≥ 0.5, more preferably D1/D2 ≥ 0.8.

In an exemplary embodiment of the present application, the D2 may be 30 μm ≤ D2 ≤ 1000 μm, preferably 30 μm ≤ D2 ≤ 500 μm, more preferably 50 μm ≤ D2 ≤ 100 μm.

As the stretchable substrate according to the present application satisfies the ranges of Equations 4 and 5, there is no gap between the non-stretchable pattern and the stretchable polymer film when the stretchable substrate of the present application is stretched, and the stretchability and hardness are satisfied. It has the characteristics of being able to manufacture a substrate.

In an exemplary embodiment of the present application, the line height of the non-stretchable pattern may be 5 μm or more and 100 μm or less.

The line height of the non-stretch pattern means a height in a direction perpendicular to the line width direction of the non-stretch pattern. Specifically, the line 600 of the non-stretch pattern can be confirmed in FIG. 2 .

In another exemplary embodiment, the line height of the non-stretch pattern may be 5 μm or more and 100 μm or less, preferably 10 μm or more and 100 μm or less, and more preferably 10 μm or more and 50 μm or less.

When the height of the non-stretchable pattern satisfies the above range, the electronic device is not deformed when the electronic device is subsequently stacked, and the distance between the non-stretchable pattern and the stretchable polymer film does not occur, so that the durability of the electronic device is improved. It has good characteristics.

In an exemplary embodiment of the present application, a depth of the non-stretchable pattern to be depressed into the stretchable polymer film may be 10 μm or more and 70 μm or less.

In another exemplary embodiment, the depth of the indentation into the stretchable polymer film of the non-stretchable pattern is 10 μm or more and 70 μm or less, preferably 10 μm or more and 60 μm or less, more preferably 10 μm or more and 40 μm or less. can

The depression depth of the non-stretchable pattern into the stretchable polymer film means the depth from the height of the stretchable polymer film having the depression to one surface exposed to the outside of the non-stretch pattern, and the height of the stretchable polymer film having the depression is It refers to the height from the one surface not having the depression to the one surface having the depression.

Specifically, it can be confirmed by the depression depth 300 of the non-stretchable pattern into the stretchable polymer film in FIG. 3 .

Since the depth of the non-stretchable pattern to be depressed into the stretchable polymer film has the above range, it is possible to prevent loss of the non-stretch pattern during the manufacturing process of the stretchable substrate, and the stretchable polymer film and the non-stretchable pattern It has a feature that can minimize the separation at the boundary between the two, and when an electronic device is formed later, the durability of the electronic device is particularly excellent.

In the exemplary embodiment of the present application, the width of the portion surrounded by the stretchable polymer film among the one surface exposed to the outside of the non-stretchable pattern may be 10 μm or more and 70 μm or less in the line width direction of the non-stretchable pattern.

In another embodiment, the width of the portion surrounded by the stretchable polymer film among the one surface exposed to the outside of the non-stretch pattern is 10 μm or more and 70 μm or less, preferably 10 μm in the line width direction of the non-stretch pattern. It may be 50 μm or more, and more preferably 10 μm or more and 40 μm or less.

The meaning of the width of the portion surrounded by the stretchable polymer film among the one surface exposed to the outside of the non-stretch pattern is the surface exposed to the outside of the non-stretch pattern, the surface of the non-stretch pattern in contact with the stretch polymer film It means length.

Specifically, it can be confirmed by the width 400 of a portion surrounded by the stretchable polymer film among one surface exposed to the outside of the non-stretchable pattern in FIG. 3 .

Since the width of a portion surrounded by the stretchable polymer film among the one surface exposed to the outside of the non-stretchable pattern has the above range, it is possible to prevent loss of the non-stretch pattern during the manufacturing process of the stretchable substrate, and the stretchable polymer It has a feature that can minimize the separation at the boundary between the film and the non-stretchable pattern.

In an exemplary embodiment of the present application, the thickness of the stretchable polymer film may be 100 μm or more and 1000 μm or less.

In another exemplary embodiment, the thickness of the stretchable polymer film may be 100 μm or more and 1000 μm or less, preferably 100 μm or more and 700 μm or less, and more preferably 200 μm or more and 500 μm or less.

As the stretchable polymer film satisfies the thickness range, the stretchable substrate of the present application has excellent elongation, and by having the thickness range, fracture does not occur with respect to high elongation force, and the interface portion between the non-stretchable pattern and the stretchable polymer film It has the characteristic that no separation occurs in the

2 shows a side view of the stretchable substrate of the present application, and the thickness 500 of the stretchable polymer film can be confirmed. That is, the thickness of the stretchable polymer film means the thickness in the height direction from the ground on the stretchable substrate.

In an exemplary embodiment of the present application, the non-stretchable pattern can be used without particular limitation as long as it satisfies the Young's modulus of Equation 2, and is a photo-curable polymer material, specifically, a dry film resist for forming an electronic circuit board, a column spacer It may be selected from the group consisting of a photosensitive resin composition and a photosensitive resin composition for forming an organic insulating pattern.

In an exemplary embodiment of the present application, there is provided a stretchable substrate of polydimethylsiloxane (PDMS) having an elongation at break of 100% or more of the stretchable polymer film.

In another exemplary embodiment, the elongation at break of the stretchable polymer film may be 100% or more, preferably 110% or more, and more preferably 130% or more.

In another exemplary embodiment, the elongation of the stretchable polymer film may be 180% or less, preferably 170% or less.

The elongation at break of the stretchable polymer film means [(L2-L1)/L1]*100(%) when the initial length of the stretchable polymer film is L1 and the length at which breakage occurs by stretching it is L2.

As the elongation rate of the stretchable polymer film satisfies the above range, the elongation rate of the stretchable substrate having a structure in which the non-stretchable pattern is embedded later has a characteristic that can satisfy a specific range, and the stretchable polymer film in the manufacturing process of the stretchable substrate As the elongation rate of is within the above range, handling is easy.

In an exemplary embodiment of the present application, the stretchable polymer film may be used without particular limitation as long as it satisfies the Young's modulus of Formula 1, and a polydimethylsiloxane polymer material may be used, specifically, a condensation polymerization type polydimethylsiloxane; It may be selected from the group consisting of addition polymerization type polydimethylsiloxane and radical polymerization type polydimethylsiloxane.

In an exemplary embodiment of the present application, the stretchable polymer film may be polydimethylsiloxane.

In an exemplary embodiment of the present application, an elongation of the stretchable substrate may be 20% or more.

In another exemplary embodiment, the stretchable substrate may have an elongation of 20% or more, preferably 35% or more, more preferably 50% or more, and may satisfy a range of 150% or less, preferably 130% or less. have.

The elongation of the stretchable substrate means the maximum elongation at which no separation occurs between the stretchable polymer film and the non-stretchable pattern, and the occurrence of the separation between the stretchable polymer film and the non-stretchable pattern means that lifting occurs. do.

That is, in the present application, the elongation rate of the stretchable substrate is the maximum at which the separation does not occur according to the line width (D1) of the non-stretchable pattern provided in the recessed portion of the stretchable polymer film and the distance (D2) between adjacent non-stretchable patterns. This means the elongation, and when the stretchable substrate according to the present application satisfies the conditions of Equations 4 and 5, it may mean the maximum elongation at which the separation does not occur.

The elongation rate of the stretchable substrate is that the stretchable substrate having a size of 1.5 cm * 5 cm is stretched left and right in the long axis direction, and the elongation rate at the time when the separation occurs at the boundary between the non-stretchable pattern and the stretchable polymer film can be measured.

In the case of the stretchable substrate, the non-stretchable pattern has a structure recessed into the stretchable polymer film, and even when the stretch rate of the stretchable substrate has the above range, a gap occurs between the non-stretchable pattern and the stretchable polymer film. It is possible to manufacture a stretchable substrate that does not do this.

In the exemplary embodiment of the present application, there is provided a stretchable substrate in which the depth of the depression is greater than the height of the non-stretchable pattern.

As the depth of the depression is formed to be greater than the line height of the non-stretchable pattern, in the case of the stretchable substrate according to the present application, as can be seen in FIG. It is possible to prevent loss of the non-stretchable pattern during substrate processing and to prevent separation at the interface between the non-stretchable pattern and the stretchable polymer film.

In an exemplary embodiment of the present application, the stretchable substrate according to the present application; and an electronic device provided on the stretchable polymer film of the stretchable substrate, wherein the electronic device is formed on a position in which the non-stretchable pattern of the stretchable substrate is depressed.

In the exemplary embodiment of the present application, the electronic device may be a display device, a touch panel, or a semiconductor panel.

In the exemplary embodiment of the present application, the electronic device may be selected from the group consisting of an organic photoelectric device, an organic transistor, an organic solar cell, an organic light emitting device, and a micro LED device.

When the electronic device according to the present application is used in a display device, it may include a stretchable display, and as the electronic device is formed on the position where the non-stretchable pattern of the stretchable substrate is recessed, stretching and returning are repeated by repeating Since it is possible to minimize the application of external force to the conductive electronic device itself, it is possible to provide a display device having excellent elongation and excellent durability.

A stretchable substrate according to an exemplary embodiment of the present application includes the steps of preparing a copper foil; Laminating a protective film on one side of the copper foil; forming a non-stretchable pattern on a surface of the copper foil opposite to the surface in contact with the protective film; Half-etching the surface of the copper foil on which the non-stretch pattern is formed; forming a stretchable polymer film on the copper foil on which the non-stretch pattern is formed; and removing the protective film and removing the copper foil.

The protective film may include a base film and a pressure-sensitive adhesive layer provided on one surface of the base film.

The pressure-sensitive adhesive layer is used for bonding the base film and the copper foil, and is not limited thereto, and a commercially available adhesive layer may be used if there is an adhesive force.

The base film is not limited as long as it can prevent damage to the copper foil during the process, but PET (polyethylene terephthalate), polyester, PC (polycarbonate), PI (polyimide), PEN (polyethylene naphthalate), PEEK ( It may be selected from the group consisting of polyether ether ketone), polyarylate (PAR), polycylicolefin (PCO), polynorbornene, polyethersulphone (PES), and cycloolefin polymer (COP).

In the exemplary embodiment of the present application, the forming of the non-stretchable pattern may be formed using a photolithography process.

In an exemplary embodiment of the present application, the copper foil may be removed using an etchant, and the etchant may be an iron chloride-based copper etchant.

Hereinafter, the present specification will be described in more detail through examples. However, the following examples are only for illustrating the present specification, and not for limiting the present specification.

<Production Example>

[Example 1] Preparation of stretchable substrate

A 50 μm thick copper foil having a protective film laminated on one side was prepared. After laminating 10㎛ TPF (Transparent Photosensitive Film, Hitachi Chemical) as a photocurable polymer material on the copper foil, a square non-stretchable pattern with a pattern line width of 82㎛ and an inter-pattern distance of 85㎛ is formed through a photo process did The exposed copper foil was removed (half-etched) by 15 µm in the thickness direction by spray-etching on the upper portion of the laminate provided with the non-stretchable pattern at room temperature for 2 minutes using a ferric chloride-based copper etchant. KE-4896 (Shinetsu) as a polydimethylsiloxane material was applied to the upper part of the laminate with the non-stretch pattern provided and the thickness of the exposed copper foil reduced by 15 µm to a thickness of 300 µm, and then cured at room temperature for 24 hours at 100 °C Heat treatment was further carried out for 1 hour. After removing the protective film from the laminate provided with the polydimethylsiloxane polymer layer, the exposed copper foil was removed using a ferric chloride-based copper etchant to prepare a stretchable substrate having a non-stretchable pattern embedded therein.

5 shows an SEM image of the upper surface of the stretchable substrate manufactured according to Example 1. Referring to FIG. As can be seen in FIG. 5 , in the case of Example 1 of the present application, it can be confirmed that the stretchable polymer film has a depression and a non-stretch pattern is embedded in the depression.

[Example 2]

In Example 1, using a ferric chloride-based copper etchant on the upper part of the laminate provided with the non-stretchable pattern, spray-etched for 3 minutes at room temperature to remove 25 µm of the exposed copper foil in the thickness direction (half etching) except that and manufactured in the same manner as in the manufacturing method of the stretchable substrate in Example 1 to prepare a stretchable substrate.

6 shows an SEM image of the upper surface of the stretchable substrate manufactured in Example 2 above. As can be seen in FIG. 6 , in the case of Example 1 of the present application, it can be confirmed that the stretchable polymer film has a depression and a non-stretch pattern is embedded in the depression.

[Comparative Example 1]

A stretchable substrate was manufactured in the same manner as in Example 1, except that in Example 1, a separate etching process was not performed on the upper portion of the laminate provided with the non-stretchable pattern.

7 shows an SEM image of the upper surface of the stretchable substrate prepared according to Comparative Example 1. Referring to FIG. As can be seen in FIG. 7 , in the case of Comparative Example 1 of the present application, a separate etching process was not performed on the upper portion of the laminate provided with the non-stretchable pattern, so that the non-stretchable pattern was completely buried inside the stretchable polymer film. You can see that it doesn't work.

The physical properties and properties of the stretchable polymer films according to Examples 1, 2 and Comparative Example 1 are shown in Table 1 below.

Example 1 Example 2 Comparative Example 1 Modulus (MPa) of stretchable polymer film, G1 1.31 1.31 1.31 Modulus (MPa) of non-stretch pattern, G2 4,800 4,800 4,800 G2/G1 3,664 3,664 3,664 Non-stretch pattern line width (㎛), D1 82 82 82 Distance between non-stretch patterns (㎛), D2 85 85 85 D1/D2 0.96 0.96 0.96 Non-stretchable pattern line (㎛) 10 10 10 Elongation at break of stretchable polymer film (%) 280 280 280 Depth of depression (㎛) 15 25 0 Line width of stretchable polymer film on top of non-stretchable pattern (㎛) 10 20 0 Elongation Durability (%) 50 or more 50 or more 15 or less

1) Modulus measurement: The stretchable polymer film and the non-stretchable material in the form of a film were measured using Zwick/Roell's Z010 UTM equipment, respectively. Specifically, the stretchable polymer film and the non-stretchable material in the form of a film were measured at 25±2℃, 50 Under ±5% RH (relative humidity), both ends in the longitudinal direction were fixed so that the width became 25 mm and the length was 165 mm, and then the stress/strain was measured by stretching it in both directions in the longitudinal direction at a speed of 100 mm/min.

2) Measurement of elongation at break of stretchable polymer film : The elongation at break of the stretchable polymer film can be measured using Zwick/Roell's Z010 UTM equipment. Specifically, the stretchable polymer film was subjected to 25±2° C., 50±5% RH. Under (relative humidity), both ends in the longitudinal direction were fixed to become 25 mm in width and 165 mm in length, and then stretched in both directions in the longitudinal direction at a rate of 100 mm/min to measure the strain point at which the stretchable polymer film breaks. (fracture point)

3) Elongation durability evaluation: After fixing both ends in the longitudinal direction to a stretch jig prepared separately on an optical microscope stage of a 1.5 cm * 5 cm stretchable substrate, stretch it in the longitudinal direction at the boundary between the non-stretchable pattern and the stretchable polymer pattern. Observe whether separation occurs. When the length at which the separation occurs is referred to as L (cm), the tensile durability was calculated through the formula of [(L-5)/5]*100.

As can be seen in Table 1, in the case of the stretchable substrates (Examples 1 and 2) according to the present application, they are stretchable substrates having a non-stretch pattern located inside the depression of the stretchable polymer film, and the stretch durability is comparative example. It was confirmed that it was superior to 1.

This means that, in the stretchable substrates corresponding to Examples 1 and 2, there is no separation between the non-stretchable pattern and the stretchable polymer film compared to Comparative Example 1 even when stretched and recovered by a strong external force, which will be used as an electronic device in the future In this case, it means that the durability can be excellent even after repeated stretching/recovery of the electronic device.

In the case of Comparative Example 1, the non-stretchable pattern is not completely recessed into the stretchable polymer film, but one surface is exposed to the outside and the stretchable polymer film is not provided at the edge of the exposed surface. In this case, it was confirmed that the stretch durability was not good compared to the stretchable substrates of Examples 1 and 2.

In addition, in the case of the stretchable substrate corresponding to Comparative Example 1, the non-stretchable pattern is not completely depressed into the inside of the stretchable polymer film, but one side is exposed to the outside and the stretchable polymer film is not provided at the edge of the exposed side, It was confirmed that the non-stretchable pattern was lost in the manufacturing process of the stretchable substrate.

1: Stretchable polymer film
2: Non-stretch pattern
100: line width of non-stretch pattern
200: distance between adjacent non-stretch patterns
300: depression depth
400: the width of the portion surrounded by the elastic polymer film
500: the thickness of the stretchable polymer film
600: verdict of inelastic pattern

Claims (13)

a stretchable polymer film having a depression on at least one surface; and
a non-stretchable pattern provided in the depression of the stretchable polymer film;
As a stretchable substrate comprising a,
At least one surface of the non-stretchable pattern is exposed to the outside, and an edge of the exposed surface is surrounded by the stretchable polymer film,
The Young's Modulus of the stretchable polymer film is G1,
The Young's Modulus of the non-stretchable pattern is G2,
Wherein G1 and G2 satisfy the following formulas 1 to 3,
[Equation 1]
G1 ≤ 2 MPa
[Equation 2]
G2 ≥ 1000 MPa
[Equation 3]
G2/G1 ≥ 500
The non-stretchable pattern includes a photocurable polymer material,
The stretchable substrate, wherein the depth from the height of the stretchable polymer film having the depression to the one surface exposed to the outside of the non-stretchable pattern is 10 μm or more and 70 μm or less. delete The method according to claim 1,
The non-stretchable pattern has a structure recessed into the stretchable polymer film in the structure of two or more islands spaced apart,
The line width of the non-stretch pattern is D1,
A distance between two adjacent non-stretchable patterns recessed into the stretchable polymer film is D2,
Wherein D1 and D2 is a stretchable substrate that satisfies Equations 4 and 5 below:
[Equation 4]
30μm ≤ D1 ≤ 1000μm
[Equation 5]
D2/D1 ≤ 4. The method according to claim 1,
The stretchable substrate will have a line height of 5 μm or more and 100 μm or less of the non-stretchable pattern. delete The method according to claim 1,
The width of the portion surrounded by the stretchable polymer film among the one surface exposed to the outside of the non-stretchable pattern is 10 μm or more and 70 μm or less in the line width direction of the non-stretchable pattern. The method according to claim 1,
The stretchable substrate of polydimethylsiloxane (PDMS) having an elongation at break of 100% or more of the stretchable polymer film. The method according to claim 1,
The stretchable substrate has a thickness of 100 μm or more and 1000 μm or less of the stretchable polymer film. The method according to claim 1,
One side of the non-stretchable pattern is exposed to the outside, the other side is in contact with the stretchable polymer film, and an edge of the exposed surface is surrounded by the stretchable polymer film. The method according to claim 1,
The stretchable substrate having an elongation of 20% or more of the stretchable substrate. The method according to claim 1,
The stretchable substrate having a depth of the recessed portion greater than a height of the non-stretchable pattern. The stretchable substrate according to any one of claims 1, 3, 4, and 6 to 11; and
an electronic device provided on the stretchable polymer film of the stretchable substrate;
An electronic device comprising:
and the electronic device is formed on a position in which the non-stretchable pattern of the stretchable substrate is depressed. 13. The method of claim 12,
The electronic device is
An electronic device selected from the group consisting of an organic photoelectric device, an organic transistor, an organic solar cell, an organic light emitting device, and a micro LED device.

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