KR102335365B1 - Removing agent for rust-preventive film - Google Patents

Removing agent for rust-preventive film Download PDF

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KR102335365B1
KR102335365B1 KR1020180016035A KR20180016035A KR102335365B1 KR 102335365 B1 KR102335365 B1 KR 102335365B1 KR 1020180016035 A KR1020180016035 A KR 1020180016035A KR 20180016035 A KR20180016035 A KR 20180016035A KR 102335365 B1 KR102335365 B1 KR 102335365B1
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component
rust
rust preventive
acid
remover
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KR20180092887A (en
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카즈타카 젠후쿠
타카하시 다나카
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아라까와 가가꾸 고교 가부시끼가이샤
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    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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    • C09D9/005Chemical paint or ink removers containing organic solvents

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Abstract

<과제>
2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막을 단시간에 제거할 수 있는 방청막용 제거제를 제공하는 것에 있다.
<해결 수단>
일반식 (1)로 표시되는 알칸올아민(A), 글리콜에테르 용제(B), 그리고 유기 카복실산 및/또는 그 염(C)을 포함하는 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막용 제거제.
R1-(NHCH2CH2)n-OH ···(1)
(식 (1) 중 R1은 수소 또는 탄소수 1~4의 알킬기, n은 1~2의 정수를 나타낸다)
<task>
It is to provide the removal agent for rust preventive films which can remove the rust preventive film which consists of a nitrogen-containing heterocyclic compound which has two or more nitrogen atoms in a short time.
<Solutions>
Rust prevention comprising an alkanolamine (A) represented by the general formula (1), a glycol ether solvent (B), and a nitrogen-containing heterocyclic compound having two or more nitrogen atoms containing an organic carboxylic acid and/or a salt (C) thereof membrane remover.
R 1 -(NHCH 2 CH 2 ) n -OH ... (1)
(In formula (1), R 1 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 2)

Description

방청막용 제거제{REMOVING AGENT FOR RUST-PREVENTIVE FILM}Remover for rust prevention film {REMOVING AGENT FOR RUST-PREVENTIVE FILM}

본 발명은 방청막용 제거제, 특히 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막용 제거제에 관한 것이다.This invention relates to the removal agent for rust prevention films, especially the removal agent for rust prevention films which consists of a nitrogen-containing heterocyclic compound which has 2 or more nitrogen atoms.

금속 표면의 방청을 목적으로 하여, 종래부터 이미다졸류 또는 트리아졸, 벤조트리아졸 등의 2 이상의 질소 원자를 가지는 함질소 복소환 화합물이 방청제로서 이용되고 있다. 특히, 프린트 배선판이나 인터포저(interposer) 등의 동 범프, 스루홀(through hole), 얼라인먼트 마크(alignment mark), 식별번호 부분 등의 동면에는 이들 방청제가 범용되고 있고, 형성된 방청막은 동과 킬레이트 결합함으로써 동면을 보호하여 높은 방청 효과를 가진다.For the purpose of rust prevention of metal surfaces, imidazoles or nitrogen-containing heterocyclic compounds having two or more nitrogen atoms, such as triazole and benzotriazole, are conventionally used as rust inhibitors. In particular, these rust preventives are generally used in copper bumps, such as printed wiring boards or interposers, through holes, alignment marks, identification number parts, etc., and the formed rust preventive film is chelated with copper. By doing so, it protects the hibernation and has a high anti-rust effect.

그렇지만, 상기 방청막은 동면에의 도포 후에 열화하거나 땜납 접합 공정에서의 열에 노출되는 등으로 착색되는 경우가 있다. 특히 얼라인먼트 마크나 식별번호 부분 등이 착색되면, 제조 장치의 센서로 기판이 인식되지 않기도 하고, 위치맞춤을 할 수 없는 등의 문제가 생기는 경우가 있다.However, the rust preventive film may deteriorate after application to the copper surface or be colored due to exposure to heat in the solder bonding process. In particular, when an alignment mark or an identification number portion is colored, there are cases in which the substrate is not recognized by the sensor of the manufacturing apparatus, and problems such as not being able to perform alignment may occur.

상기 과제를 해결하기 위해, 방청막을 제거하는 기술로서, 예를 들면 제4급 암모늄 수산화물 용액을 이용하여 동 및 동 합금 표면의 착체 피막을 제거하는 방법이 공지이지만, 당해 발명은 미세배선 형성 기술이 필요한 첨단 전자부품 제조에서는 유용하지만, 방청막을 완전히 제거하기 때문에 단기간에 동면이 재차 변색된다.In order to solve the above problems, as a technique for removing the rust preventive film, for example, a method of removing the complex film on the surface of copper and copper alloy using a quaternary ammonium hydroxide solution is known, but the present invention is a fine wiring forming technique It is useful in the manufacturing of high-tech electronic components required, but since the rust-preventing film is completely removed, the hibernation is discolored again in a short period of time.

일본국 특허공개 2002-097587호 공보Japanese Patent Laid-Open No. 2002-097587

본 발명의 과제는, 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막을 단시간에 제거할 수 있는 방청막용 제거제를 제공하는 것에 있다.The subject of this invention is providing the removal agent for rust preventive films which can remove the rust preventive film which consists of a nitrogen-containing heterocyclic compound which has two or more nitrogen atoms in a short time.

본 발명자는 예의 검토한 결과, 특정의 알칸올아민, 그리고 글리콜에테르 용제 및 유기 카복실산을 함유하는 방청막용 제거제가, 상기 방청막에 있어서의 과제를 해결하는 것을 알아내어 본 발명을 완성시키기에 이르렀다. 즉, 본 발명은 이하의 방청막용 제거제에 관한 것이다.As a result of earnest examination, this inventor discovered that the remover for rust preventive films containing a specific alkanolamine, a glycol ether solvent, and organic carboxylic acid solves the subject in the said rust preventive film, and came to complete this invention. That is, this invention relates to the following removal agents for rust preventive films.

1. 일반식 (1)로 표시되는 알칸올아민(A), 글리콜에테르 용제(B), 그리고 유기 카복실산 및/또는 그 염(C)을 포함하는 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막용 제거제.1. A nitrogen-containing heterocyclic compound having two or more nitrogen atoms comprising an alkanolamine (A) represented by the general formula (1), a glycol ether solvent (B), and an organic carboxylic acid and/or a salt (C) thereof A remover for an anti-rust film.

R1-(NHCH2CH2)n-OH ···(1)R 1 -(NHCH 2 CH 2 ) n -OH ... (1)

(식 (1) 중 R1은 수소 또는 탄소수 1~4의 알킬기, n은 1~2의 정수를 나타낸다)(In formula (1), R 1 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 2)

2. (A) 성분이 N-메틸에탄올아민, N-에틸에탄올아민, N-n-부틸에탄올아민 및 N-(2-아미노에틸)에탄올아민으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는 전항 1의 방청막용 제거제.2. The preceding paragraph, wherein the component (A) contains at least one selected from the group consisting of N-methylethanolamine, N-ethylethanolamine, N-n-butylethanolamine and N-(2-aminoethyl)ethanolamine. 1. Rust-preventive film remover.

3. (B) 성분이 일반식 (2)로 표시되는 전항 1 또는 2의 방청막용 제거제.3. (B) The anti-rust film removal agent of the preceding paragraph 1 or 2 in which a component is represented by General formula (2).

R2-(OCH2CHX)m-OH ···(2)R 2 -(OCH 2 CHX) m -OH ... (2)

(식 (2) 중 R2는 탄소수 1~4의 알킬기, X는 수소 또는 메틸기, m은 1~3의 정수를 나타낸다)(In formula (2), R 2 is an alkyl group having 1 to 4 carbon atoms, X is hydrogen or a methyl group, and m is an integer of 1 to 3)

4. (C) 성분이 유기 모노카복실산, 유기 디카복실산, 유기 트리카복실산 및 이들의 염으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는 전항 1~3 중 어느 한 항의 방청막용 제거제.4. (C) The remover for rust preventive films in any one of the preceding paragraphs 1-3 in which a component contains at least 1 sort(s) chosen from the group which consists of organic monocarboxylic acid, organic dicarboxylic acid, organic tricarboxylic acid, and these salts.

5. (A) 성분이 N-알킬디에탄올아민을 더 포함하는 전항 1~4 중 어느 한 항의 방청막용 제거제.5. (A) The removal agent for rust prevention films in any one of the preceding paragraphs 1-4 in which component further contains N-alkyldiethanolamine.

6. 제거제 중의 함유 비율이 (A) 성분 1~20중량%, (B) 성분 75~98.5중량% 및 (C) 성분 0.1~5중량%인 전항 1~5 중 어느 한 항의 방청막용 제거제.6. The removal agent for rust preventive films in any one of the preceding paragraphs 1-5 whose content rate in a remover is 1 to 20 weight% of (A) component, 75 to 98.5 weight% of (B) component, and 0.1 to 5 weight% of (C) component.

7. 기판 상에 인쇄된 얼라인먼트 마크 및/또는 식별번호 부분에 형성되는 상기 방청막을 제거하는 전항 1~6 중 어느 한 항의 방청막용 제거제.7. The rust preventive film remover according to any one of the preceding items 1 to 6, which removes the rust preventive film formed on the alignment mark and/or the identification number printed on the substrate.

본 발명의 방청막용 제거제에 의하면, 기판 상에 형성된, 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막을 단시간에 제거할 수 있지만, 완전히 제거하는 것이 아니라 방청막의 막두께를 수십nm 정도 남기기 때문에 방청 효과도 유지된다.According to the remover for a rust preventive film of the present invention, the rust preventive film formed on the substrate formed of a nitrogen-containing heterocyclic compound having two or more nitrogen atoms can be removed in a short time, but it is not completely removed, but the film thickness of the rust preventive film is left about several tens of nm Therefore, the rust prevention effect is maintained.

본 발명의 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막용 제거제(이하 간결하게“방청막용 제거제”라고도 한다)는, 일반식 (1)로 표시되는 알칸올아민(A)(이하 (A) 성분이라고 한다), 글리콜에테르 용제(B)(이하 (B) 성분이라고 한다), 그리고 유기 카복실산 및/또는 그 염(C)(이하 (C) 성분이라고 한다)을 함유한다.The rust preventive film removal agent (hereinafter also simply referred to as "rust preventive film remover") comprising a nitrogen-containing heterocyclic compound having two or more nitrogen atoms of the present invention is an alkanolamine (A) represented by the general formula (1) (hereinafter ( A) component), glycol ether solvent (B) (hereinafter referred to as (B) component), and organic carboxylic acid and/or its salt (C) (hereinafter referred to as (C) component) are contained.

(A) 성분으로서는 식 (1)로 표시되는 것이 방청막을 단시간에 제거하기 위해 필요한 성분이다.(A) As a component, what is represented by Formula (1) is a component required in order to remove a rust preventive film in a short time.

R1-(NHCH2CH2)n-OH ···(1)R 1 -(NHCH 2 CH 2 ) n -OH ... (1)

(식 (1) 중 R1은 수소 또는 탄소수 1~4의 알킬기, n은 1~2의 정수를 나타낸다)(In formula (1), R 1 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 2)

식 (1)로 표시되는 것으로서는 예를 들면, 모노에탄올아민, N-메틸에탄올아민, N-에틸에탄올아민, N-n-프로필에탄올아민, N-이소프로필에탄올아민, N-n-부틸에탄올아민, N-이소부틸에탄올아민, N-sec-부틸에탄올아민, N-tert-부틸에탄올아민, N-(2―아미노에틸)에탄올아민 등을 들 수 있고, 이들은 단독으로도 2종 이상을 조합해도 좋다. 이들 중에서도 제거제의 헹굼성의 점에서, N-메틸에탄올아민, N-에틸에탄올아민, N-n-부틸에탄올아민 또는 N-(2-아미노에틸)에탄올아민이 바람직하다.As what is represented by Formula (1), monoethanolamine, N-methylethanolamine, N-ethylethanolamine, N-n-propylethanolamine, N-isopropylethanolamine, N-n-butylethanolamine, for example. amine, N-isobutylethanolamine, N-sec-butylethanolamine, N-tert-butylethanolamine, N-(2-aminoethyl)ethanolamine, etc. are mentioned, These are independent, and they combine 2 or more types. good to do Among these, the point of the rinse property of a removal agent to N-methylethanolamine, N-ethylethanolamine, N-n-butylethanolamine, or N-(2-aminoethyl) ethanolamine is preferable.

본 발명의 방청막용 제거제 중에 있어서의 (A) 성분의 중량 비율은 특히 한정되지 않지만, 제거제의 헹굼성 및 제거 효과의 밸런스(balance)로부터, 고형분 환산으로 통상은 1~20중량% 정도, 바람직하게는 1~15중량% 정도, 보다 바람직하게는 1~10중량% 정도이다.Although the weight ratio of (A) component in the remover for rust preventive films of this invention is not specifically limited, From the balance of the rinse property of a remover and a removal effect, in conversion of solid content, normally about 1-20 weight%, Preferably is about 1 to 15% by weight, more preferably about 1 to 10% by weight.

(B) 성분으로서는 특히 한정되지 않고 각종 공지의 것을 사용할 수 있지만, 예를 들면, 하기 식 (2)로 표시되는 것 등을 들 수 있다.(B) It does not specifically limit as a component, Although various well-known things can be used, For example, the thing represented by following formula (2), etc. are mentioned.

R2-(OCH2CHX)m-OH ···(2)R 2 -(OCH 2 CHX) m -OH ... (2)

(식 (2) 중 R2는 탄소수 1~4의 알킬기, X는 수소 또는 메틸기, m은 1~3의 정수를 나타낸다)(In formula (2), R 2 is an alkyl group having 1 to 4 carbon atoms, X is hydrogen or a methyl group, and m is an integer of 1 to 3)

식 (2)로 표시되는 것으로서는, m의 값으로 이하의 것을 각각 들 수 있다.As a thing represented by Formula (2), the following are mentioned as a value of m, respectively.

m=1로서는 메틸글리콜, 에틸글리콜, n-프로필글리콜, 이소프로필글리콜, n-부틸글리콜, 이소부틸글리콜, sec-부틸글리콜, tert-부틸글리콜, 메틸프로필렌글리콜, 에틸프로필렌글리콜, n-프로필프로필렌글리콜, 이소프로필프로필렌글리콜, n-부틸프로필렌글리콜, 이소부틸프로필렌글리콜, sec-부틸프로필렌글리콜, tert-부틸프로필렌글리콜 등을 들 수 있다.As m=1, methyl glycol, ethyl glycol, n-propyl glycol, isopropyl glycol, n-butyl glycol, isobutyl glycol, sec-butyl glycol, tert-butyl glycol, methyl propylene glycol, ethyl propylene glycol, n- propyl propylene Glycol, isopropyl propylene glycol, n-butyl propylene glycol, isobutyl propylene glycol, sec- butyl propylene glycol, tert- butyl propylene glycol, etc. are mentioned.

m=2로서는 메틸디글리콜, 에틸디글리콜, n-프로필디글리콜, 이소프로필디글리콜, n-부틸디글리콜, 이소부틸디글리콜, sec-부틸디글리콜, tert-부틸디글리콜, 메틸프로필렌디글리콜, 에틸프로필렌디글리콜, n-프로필프로필렌디글리콜, 이소프로필프로필렌디글리콜, n-부틸프로필렌디글리콜, 이소부틸프로필렌디글리콜, sec-부틸프로필렌디글리콜, tert-부틸프로필렌디글리콜 등을 들 수 있다.As m=2, methyldiglycol, ethyldiglycol, n-propyldiglycol, isopropyldiglycol, n-butyldiglycol, isobutyldiglycol, sec-butyldiglycol, tert-butyldiglycol, methylpropylenediglycol , ethylpropylene diglycol, n-propyl propylene diglycol, isopropyl propylene diglycol, n-butyl propylene diglycol, isobutyl propylene diglycol, sec-butyl propylene diglycol, tert-butyl propylene diglycol, etc. are mentioned. .

m=3으로서는 메틸트리글리콜, 에틸트리글리콜, n-프로필트리글리콜, 이소프로필트리글리콜, n-부틸트리글리콜, 이소부틸트리글리콜, sec-부틸트리글리콜, tert-부틸트리글리콜, 메틸프로필렌트리글리콜, 에틸프로필렌트리글리콜, n-프로필프로필렌트리글리콜, 이소프로필프로필렌트리글리콜, n-부틸프로필렌트리글리콜, 이소부틸프로필렌트리글리콜, sec-부틸프로필렌트리글리콜, tert-부틸프로필렌트리글리콜 등을 들 수 있다.As m=3, methyltriglycol, ethyltriglycol, n-propyltriglycol, isopropyltriglycol, n-butyltriglycol, isobutyltriglycol, sec-butyltriglycol, tert-butyltriglycol, methylpropylenetriglycol , ethyl propylene triglycol, n-propyl propylene triglycol, isopropyl propylene tri glycol, n-butyl propylene tri glycol, isobutyl propylene tri glycol, sec-butyl propylene tri glycol, tert- butyl propylene tri glycol, etc. are mentioned. .

이들 (B) 성분은 단독으로도 2종 이상을 조합해도 좋다. 이들 중에서도 제거제의 제거 효과 및 환경 특성의 점에서, 식 (2)에서 R2가 탄소수 3 또는 4의 알킬기를 가지는 것이 바람직하고, n-부틸글리콜, n-프로필프로필렌글리콜, n-프로필디글리콜, n-부틸디글리콜 및 n-부틸트리글리콜로 이루어지는 군에서 선택되는 적어도 1종이 보다 바람직하다.These (B) components may be individual or may combine 2 or more types. Among these, it is preferable that R<2> has a C3 or C4 alkyl group in Formula (2) from the point of the removal effect and environmental characteristic of a removal agent, n-butyl glycol, n-propyl propylene glycol, n-propyl diglycol; At least one selected from the group consisting of n-butyldiglycol and n-butyltriglycol is more preferable.

본 발명의 방청막용 제거제 중에 있어서의 (B) 성분의 중량 비율은 특히 한정되지 않지만, 제거제의 제거 효과의 점에서, 고형분 환산으로 통상은 75~98.5중량% 정도, 바람직하게는 80~97중량% 정도이다.Although the weight ratio of (B) component in the remover for rust preventive films of this invention is not specifically limited, From the point of the removal effect of a remover, it is about 75 to 98.5 weight% normally in conversion of solid content, Preferably it is 80 to 97 weight%. it is about

(C) 성분으로서는 특히 한정되지 않고 각종 공지의 것을 사용할 수 있고, 예를 들면, 폼산, 초산, 프로피온산, 유산, 안식향산, 살리실산 등의 유기 모노카복실산; 옥살산, 말론산, 호박산, 글루타르산, 아디프산, 세박산, 아젤라산, 도데칸 이산, 사과산, 프탈산, 이소프탈산, 테레프탈산 등의 유기 디카복실산; 트리카발릴산, 구연산, 트리멜리트산 등의 유기 트리카복실산; 에틸렌테트라카복실산, 부탄테트라카복실산 등의 유기 테트라카복실산 등을 들 수 있다. 또 그 염으로서는 암모늄염 등을 들 수 있다. 이들은 단독으로도 2종 이상을 조합해도 좋다. 이들 중에서도 제거제의 제거 효과의 점에서, 유기 모노카복실산, 유기 디카복실산, 유기 트리카복실산 및 이들의 염으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는 것이 바람직하고, 폼산, 초산, 초산암모늄, 구연산, 호박산, 사과산, 유산, 말론산 및 살리실산으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는 것이 보다 바람직하다.(C) The component is not particularly limited, and various known ones can be used, for example, organic monocarboxylic acids such as formic acid, acetic acid, propionic acid, lactic acid, benzoic acid, and salicylic acid; oxalic acid, malonic acid, succinic acid, glutaric acid, Organic dicarboxylic acids such as dipic acid, sebacic acid, azelaic acid, dodecane diacid, malic acid, phthalic acid, isophthalic acid, and terephthalic acid; of organic tetracarboxylic acid. Moreover, an ammonium salt etc. are mentioned as the salt. These may be individual or may combine 2 or more types. Among these, from the viewpoint of the removal effect of the removing agent, it is preferable to contain at least one selected from the group consisting of organic monocarboxylic acids, organic dicarboxylic acids, organic tricarboxylic acids and salts thereof, formic acid, acetic acid, ammonium acetate, citric acid, It is more preferable to include at least one selected from the group consisting of succinic acid, malic acid, lactic acid, malonic acid and salicylic acid.

본 발명의 방청막용 제거제 중에 있어서의 (C) 성분의 중량 비율은 특히 한정되지 않지만, 제거제의 제거 효과의 점에서, 고형분 환산으로 통상은 0.1~5중량% 정도, 바람직하게는 0.1~4중량% 정도, 보다 바람직하게는 0.1~3중량% 정도이다.Although the weight ratio of (C)component in the remover for rust preventive films of this invention is not specifically limited, From the point of the removal effect of a remover, it is about 0.1 to 5 weight% normally in conversion of solid content, Preferably it is 0.1 to 4 weight%. It is about 0.1 to 3 weight% more preferably.

본 발명의 방청막용 제거제에는, 제거제의 헹굼성의 점에서, (A) 이외의 알칸올아민(D)(이하 (D) 성분이라고 한다)을 더 포함해도 좋다. (D) 성분으로서는 특히 한정되지 않지만, 예를 들면, N-메틸디에탄올아민, N-에틸디에탄올아민, N-n-프로필디에탄올아민, N-이소프로필디에탄올아민, N-n-부틸디에탄올아민, N-이소부틸디에탄올아민, N-sec-부틸디에탄올아민, N-tert-부틸디에탄올아민 등의 N-알킬디에탄올아민; N, N-디메틸에탄올아민, N, N-디에틸에탄올아민, N, N-디-n-프로필에탄올아민, N, N-디이소프로필에탄올아민, N, N-디-n-부틸에탄올아민, N, N-디이소부틸에탄올아민, N, N-디-sec-부틸에탄올아민, N, N-디-tert-부틸에탄올아민, N, N-디(2―아미노에틸)에탄올아민 등의 N, N-디알킬에탄올아민; 디에탄올아민 등을 들 수 있다. 이들은 단독으로도 2종 이상을 조합해도 좋다.The removal agent for rust preventive films of this invention may further contain alkanolamines (D) (henceforth (D) component) other than (A) from the point of the rinse property of a removal agent. (D) Although it does not specifically limit as a component, For example, N-methyldiethanolamine, N-ethyldiethanolamine, N-n-propyl diethanolamine, N-isopropyl diethanolamine, N-n-butyl N-alkyldiethanolamines such as diethanolamine, N-isobutyldiethanolamine, N-sec-butyldiethanolamine and N-tert-butyldiethanolamine; N,N-dimethylethanolamine, N,N- Diethylethanolamine, N,N-di-n-propylethanolamine, N,N-diisopropylethanolamine, N,N-di-n-butylethanolamine, N,N-diisobutylethanolamine, N N,N-dialkylethanolamines such as , N-di-sec-butylethanolamine, N,N-di-tert-butylethanolamine, and N,N-di(2-aminoethyl)ethanolamine; diethanolamine and the like. These may be individual or may combine 2 or more types.

본 발명의 방청막용 제거제 중에 있어서의 (D) 성분의 중량 비율은 특히 한정되지 않지만, 고형분 환산으로 0.1~10중량% 정도가 바람직하다.Although the weight ratio of (D)component in the remover for rust preventive films of this invention is not specifically limited, About 0.1 to 10 weight% is preferable in conversion of solid content.

본 발명의 방청막용 제거제는 인화성의 점에서, 필요에 따라 물을 포함해도 좋다. 본 발명의 제거제 중에 있어서의 물의 중량 비율도 특히 한정되지 않지만, 2~30중량% 정도가 바람직하다.The removal agent for rust preventive films of this invention may contain water as needed from a flammable point. Although the weight ratio of the water in the removal agent of this invention is not specifically limited, either, About 2 to 30 weight% is preferable.

본 발명의 방청막용 제거제는 각종 공지의 첨가제를 포함해도 좋다. 첨가제로서는 특히 한정되지 않고, 예를 들면, 킬레이트제, 산화방지제, 소포제, pH 조정제, 이미다졸계 방청제, 트리아졸계 방청제, 안정화제, 분산제, 계면활성제 등을 들 수 있다. 또, 첨가제의 사용량도 특히 한정되지 않지만, 통상은 방청막용 제거제 100중량부에 대해 1중량부 미만이다.The removal agent for rust preventive films of this invention may contain various well-known additives. It does not specifically limit as an additive, For example, a chelating agent, antioxidant, an antifoamer, a pH adjuster, an imidazole-type rust preventive agent, a triazole-type rust preventive agent, a stabilizer, a dispersing agent, surfactant, etc. are mentioned. Moreover, the usage-amount of an additive is although it does not specifically limit, either, Usually, it is less than 1 weight part with respect to 100 weight part of removal agents for rust preventive films.

본 발명의 방청막용 제거제는 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막에 적용한다. 상기 함질소 복소환 화합물로서는 특히 한정되지 않지만, 예를 들면, 이미다졸류 또는 트리아졸류 등을 들 수 있고, 이들은 단독으로도 2종 이상을 조합해도 좋다.The removal agent for rust preventive films of this invention is applied to the rust preventive film which consists of a nitrogen-containing heterocyclic compound which has two or more nitrogen atoms. Although it does not specifically limit as said nitrogen-containing heterocyclic compound, For example, imidazole, triazole, etc. are mentioned, These may be used individually or in combination of 2 or more types.

이미다졸류로서는 특히 한정되지 않지만, 예를 들면, 이미다졸, 2-메틸이미다졸, 2-에틸이미다졸, 2-프로필이미다졸, 2-이소프로필이미다졸, 2-부틸이미다졸, 2-t-부틸이미다졸, 2-펜틸이미다졸, 2-헥실이미다졸, 2-헵틸이미다졸, 2-(1-에틸펜틸)이미다졸, 2-옥틸이미다졸, 2-노닐이미다졸, 2-데실이미다졸, 2-운데실이미다졸, 2-도데실이미다졸, 2-트리데실이미다졸, 2-테트라데실이미다졸, 2-펜타데실이미다졸, 2-헥사데실이미다졸, 2-헵타데실이미다졸, 2-(1-메틸펜틸)이미다졸, 2-(1-에틸펜틸)이미다졸, 2-(1-헵틸디실)이미다졸, 2-(5-헥세닐)이미다졸, 2-(9-옥테닐)이미다졸, 2-(8-헵타데세닐)이미다졸, 2-(4-클로로부틸)이미다졸, 2-(9-히드록시노닐)이미다졸, 2-에틸-4-메틸이미다졸, 2-운데실-4-메틸이미다졸, 2-헵타데실-4-메틸이미다졸, 2-페닐이미다졸, 2-페닐-4-메틸이미다졸, 2-(1-나프틸)이미다졸, 2-(1-나프틸)-4-메틸이미다졸, 2-(2-나프틸)이미다졸, 2-(2-나프틸)-4-메틸이미다졸, 2-메틸-4-페닐이미다졸, 4-페닐이미다졸, 4-메틸이미다졸, 4-이소프로필이미다졸, 4-옥틸이미다졸, 2, 4, 5-트리메틸이미다졸 등을 들 수 있다.Although it does not specifically limit as imidazole, For example, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-propyl imidazole, 2-isopropyl imidazole, 2-butylimidazole Sol, 2-t-butylimidazole, 2-pentylimidazole, 2-hexylimidazole, 2-heptylimidazole, 2-(1-ethylpentyl)imidazole, 2-octylimidazole; 2-nonylimidazole, 2-decylimidazole, 2-undecylimidazole, 2-dodecylimidazole, 2-tridecylimidazole, 2-tetradecylimidazole, 2-pentadecyl Imidazole, 2-hexadecylimidazole, 2-heptadecylimidazole, 2-(1-methylpentyl)imidazole, 2-(1-ethylpentyl)imidazole, 2-(1-heptyldisyl) Imidazole, 2-(5-hexenyl)imidazole, 2-(9-octenyl)imidazole, 2-(8-heptadecenyl)imidazole, 2-(4-chlorobutyl)imidazole, 2- (9-hydroxynonyl)imidazole, 2-ethyl-4-methylimidazole, 2-undecyl-4-methylimidazole, 2-heptadecyl-4-methylimidazole, 2-phenylimida Sol, 2-phenyl-4-methylimidazole, 2-(1-naphthyl)imidazole, 2-(1-naphthyl)-4-methylimidazole, 2-(2-naphthyl)imidazole , 2-(2-naphthyl)-4-methylimidazole, 2-methyl-4-phenylimidazole, 4-phenylimidazole, 4-methylimidazole, 4-isopropylimidazole, 4-octylimidazole, 2, 4, 5- trimethylimidazole, etc. are mentioned.

트리아졸류로서는 특히 한정되지 않지만, 예를 들면, 1, 2, 3-트리아졸, 1, 2, 4-트리아졸, 1-메틸-1, 2, 4-트리아졸, 1-에틸-1, 2, 4-트리아졸, 1-프로필-1, 2, 4-트리아졸, 1-이소프로필-1, 2, 4-트리아졸, 1-부틸-1, 2, 4-트리아졸, 1-메틸-1, 2, 3-트리아졸, 1-에틸-1, 2, 3-트리아졸, 1-프로필-1, 2, 3-트리아졸, 1-이소프로필-1, 2, 3-트리아졸, 1-부틸-1, 2, 3-트리아졸, 1-메틸벤조트리아졸 등을 들 수 있다.Although it does not specifically limit as triazole, For example, 1,2,3-triazole, 1,2,4-triazole, 1-methyl-1, 2, 4-triazole, 1-ethyl-1, 2 , 4-triazole, 1-propyl-1, 2, 4-triazole, 1-isopropyl-1, 2, 4-triazole, 1-butyl-1, 2, 4-triazole, 1-methyl- 1, 2, 3-triazole, 1-ethyl-1, 2, 3-triazole, 1-propyl-1, 2, 3-triazole, 1-isopropyl-1, 2, 3-triazole, 1 -Butyl-1, 2, 3-triazole, 1-methylbenzotriazole, etc. are mentioned.

본 발명의 방청막용 제거제는 특히 한정되지 않고, 예를 들면, 프린트 기판이나 인터포저 등의 동 랜드(땜납 접합면), 스루홀, 얼라인먼트 마크, 식별번호 부분 등에 형성된 방청막 등을 제거할 수 있다.The rust preventive film remover of the present invention is not particularly limited, and for example, it can remove the rust preventive film formed on copper lands (solder bonding surfaces) such as printed circuit boards and interposers, through holes, alignment marks, identification numbers, etc. .

본 발명의 방청막용 제거제로의 처리에 즈음해서는, 특히 한정되지 않지만, 제거제의 제거 효과의 점에서, 온도 50~75℃ 정도, 시간 1~5분 정도로 행하는 것이 바람직하다. 이에 의해 단시간에 막두께 50nm 이하까지 제거할 수 있고, 또한 제거 후의 기판에는 방청막도 얇게 남기 때문에 방청 효과도 가진다. 또, 상기 제거제의 사용 방법도 특히 한정되지 않고, 예를 들면 샤워, 침지, 스프레이, 초음파 등을 들 수 있다.Although it does not specifically limit on the occasion of the process to the remover for rust preventive films of this invention, From the point of the removal effect of a remover, it is preferable to carry out for about 50-75 degreeC at temperature, and about 1 to 5 minutes for time. Thereby, it can remove to a film thickness of 50 nm or less in a short time, and also has a rust prevention effect because a rust prevention film remains thin on the board|substrate after removal. Moreover, the usage method of the said removal agent is not specifically limited, either, For example, shower, immersion, spray, ultrasonic wave etc. are mentioned.

<실시예><Example>

이하, 본 발명을 실시예 및 비교예를 통하여 상세히 설명하지만, 그들에 의해 본 발명의 범위가 제한되지 않는 것은 물론이다. 또, 실시예 중의 「부」 및 「%」는 특히 언급이 없는 한 중량 기준을 의미한다.Hereinafter, the present invention will be described in detail through Examples and Comparative Examples, but it goes without saying that the scope of the present invention is not limited thereto. In addition, "part" and "%" in an Example mean a weight basis unless there is particular notice.

실시예Example 1 One

200ml의 비커에 N-메틸에탄올아민(이하 MEM이라고 한다) 1부, n-부틸디글리콜(이하 BDG라고 한다) 93.7부, 구연산 0.3부 및 물 5부를 실온에서 균일하게 될 때까지 혼합하여 방청막용 제거제를 조제하였다. 표 1에 조성을 나타낸다(이하 마찬가지).In a 200 ml beaker, 1 part of N-methylethanolamine (hereinafter referred to as MEM), 93.7 parts of n-butyldiglycol (hereinafter referred to as BDG), 0.3 parts of citric acid, and 5 parts of water are mixed until uniform at room temperature to form a rust preventive film. A remover was prepared. A composition is shown in Table 1 (the same below).

실시예Example 2~23, 2-23, 비교예comparative example 1~12 1 to 12

표 1에 나타내는 것 같은 조성으로 실시예 1과 마찬가지로 행하여 방청막용 제거제를 각각 얻었다.With a composition as shown in Table 1, it carried out similarly to Example 1, and obtained the removers for rust preventive films, respectively.

동판(인탈산 동판 C1220P(JIS H3100에 규정), 치수: 50mm×50mm×0.5mm)의 동면에, 막두께가 300nm로 되도록, 시판의 이미다졸(상품명: 터프에이스 F2(LX), 시고쿠화성공업(주)제)을 이용하여 소정 시간 침지한 후, 탈수, 건조하여 방청막을 형성시킨 시험용 동판을 만들었다. 상기 시험용 동판을 60℃로 가온한 실시예 1의 제거제에 침지하여 1분간 초음파 세정을 행하였다. 다음에 순수로 헹구고, 질소 블로우로 시험용 동판의 표면을 탈수한 후, 상온에서 감압 건조를 행하였다. 또, 실시예 2~23 및 비교예 1~12의 제거제에 대해서도 마찬가지로 행하였다.Commercially available imidazole (trade name: Tough Ace F2 (LX), Shigoku Chemical Co., Ltd.) so that the film thickness is 300 nm on the copper plate (phosphoric acid copper plate C1220P (as stipulated in JIS H3100), dimensions: 50 mm x 50 mm x 0.5 mm). Industrial Co., Ltd. product), after immersion for a predetermined time, dehydration and drying, a copper plate for testing in which a rust-preventive film was formed was prepared. The copper plate for testing was immersed in the removal agent of Example 1 heated to 60° C., followed by ultrasonic cleaning for 1 minute. Then, it was rinsed with pure water, and the surface of the copper plate for test was dehydrated by blowing with nitrogen, and then dried under reduced pressure at room temperature. Moreover, it carried out similarly also about the removal agent of Examples 2-23 and Comparative Examples 1-12.

(제거 효과)(removal effect)

시험용 동판의 동면을 ESCA(장치명: PHI5000 VersaProbe Ⅱ, 얼박파이(주)제)로 측정하고, 질소 원자가 검출되지 않게 될 때까지 에칭을 행하고, 그 시간부터 시험용 동판의 동면에 잔류한 방청막의 막두께를 산출하였다.Measure the hibernation of the copper plate for testing with ESCA (device name: PHI5000 VersaProbe II, manufactured by Ervac Pie Co., Ltd.), and etch until nitrogen atoms are no longer detected. From that time, the film thickness of the rust preventive film remaining on the hibernation of the copper plate for testing. was calculated.

◎: 처리 후의 막두께가 30nm 미만(에칭 시간: 2분 이내)(double-circle): The film thickness after treatment is less than 30 nm (etching time: within 2 minutes)

○: 처리 후의 막두께가 30nm 이상 60nm 미만(에칭 시간: 2~4분)○: The film thickness after treatment is 30 nm or more and less than 60 nm (etching time: 2 to 4 minutes)

△: 처리 후의 막두께가 60nm 이상 90nm 미만(에칭 시간: 4~6분)Δ: The film thickness after treatment is 60 nm or more and less than 90 nm (etching time: 4 to 6 minutes)

×: 처리 후의 막두께가 90nm 이상(에칭 시간: 6분 이상)x: The film thickness after treatment is 90 nm or more (etching time: 6 minutes or more)

Figure 112018014300900-pat00001
Figure 112018014300900-pat00001

※ 각 성분의 사용량에 대해서는 중량%로 나타낸다.※ The amount used for each component is expressed in weight %.

표 1 중의 약호는 이하의 화합물을 나타낸다.The symbol in Table 1 shows the following compounds.

<(A) 성분><(A) component>

·MEM: N-에틸에탄올아민·MEM: N-ethylethanolamine

·MMA: N-메틸에탄올아민MMA: N-methylethanolamine

·EA: N-(2-아미노에틸)에탄올아민EA: N-(2-aminoethyl)ethanolamine

·MBM: N-n-부틸에탄올아민·MBM: N-n-butylethanolamine

<(D) 성분><(D) component>

·MBD: N-n-부틸디에탄올아민MBD: N-n-butyldiethanolamine

·MDA: N-메틸디에탄올아민MDA: N-methyldiethanolamine

<(B) 성분><(B) component>

·BDG: n-부틸디글리콜BDG: n-butyldiglycol

·BG: n-부틸글리콜BG: n-butyl glycol

·BTG: n-부틸트리글리콜・BTG: n-butyltriglycol

·PDG: n-프로필디글리콜PDG: n-propyldiglycol

·PFG: n-프로필프로필렌글리콜·PFG: n-propylpropylene glycol

Claims (7)

일반식 (1)로 표시되는 알칸올아민(A), 글리콜에테르 용제(B), 그리고 유기 카복실산 및/또는 그 염(C)을 포함하고,
(A) 성분이 N-메틸에탄올아민, N-에틸에탄올아민 및 N-n-부틸에탄올아민으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는, 2 이상의 질소 원자를 가지는 함질소 복소환 화합물로 이루어지는 방청막용 제거제.
R1-(NHCH2CH2)n-OH ···(1)
(식 (1) 중 R1은 수소 또는 탄소수 1~4의 알킬기, n은 1~2의 정수를 나타낸다)
containing an alkanolamine (A) represented by the general formula (1), a glycol ether solvent (B), and an organic carboxylic acid and/or a salt (C) thereof,
The component (A) consists of a nitrogen-containing heterocyclic compound having two or more nitrogen atoms containing at least one selected from the group consisting of N-methylethanolamine, N-ethylethanolamine and N-n-butylethanolamine. Anti-rust film remover.
R 1 -(NHCH 2 CH 2 ) n -OH ... (1)
(In formula (1), R 1 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 2)
제1항에 있어서,
(B) 성분이 일반식 (2)로 표시되는 것을 특징으로 하는 방청막용 제거제.
R2-(OCH2CHX)m-OH ···(2)
(식 (2) 중 R2는 탄소수 1~4의 알킬기, X는 수소 또는 메틸기, m은 1~3의 정수를 나타낸다)
According to claim 1,
(B) A component is represented by General formula (2), The removal agent for rust prevention films characterized by the above-mentioned.
R 2 -(OCH 2 CHX) m -OH ... (2)
(In formula (2), R 2 is an alkyl group having 1 to 4 carbon atoms, X is hydrogen or a methyl group, and m is an integer of 1 to 3)
제1항 또는 제2항에 있어서,
(C) 성분이 유기 모노카복실산, 유기 디카복실산, 유기 트리카복실산 및 이들의 염으로 이루어지는 군에서 선택되는 적어도 1종을 포함하는 것을 특징으로 하는 방청막용 제거제.
3. The method of claim 1 or 2,
(C) A component contains at least 1 sort(s) chosen from the group which consists of organic monocarboxylic acid, organic dicarboxylic acid, organic tricarboxylic acid, and these salts, The removal agent for rust prevention films characterized by the above-mentioned.
제1항 또는 제2항에 있어서,
N-알킬디에탄올아민을 더 포함하는 것을 특징으로 하는 방청막용 제거제.
3. The method of claim 1 or 2,
N-alkyldiethanolamine is further included, The removal agent for rust prevention films characterized by the above-mentioned.
제1항 또는 제2항에 있어서,
(A)~(C) 성분의 중량 비율이 (A) 성분 1~20중량%, (B) 성분 75~98.5중량% 및 (C) 성분 0.1~5중량%인 것을 특징으로 하는 방청막용 제거제.
3. The method of claim 1 or 2,
(A) to (C) The weight ratio of the component is (A) component 1 to 20% by weight, (B) component 75 to 98.5% by weight, and (C) component 0.1 to 5% by weight, the remover for a rust preventive film.
제1항 또는 제2항에 있어서,
기판 상에 인쇄된 얼라인먼트 마크 및/또는 식별번호 부분에 형성되는 상기 방청막을 제거하는 것을 특징으로 하는 방청막용 제거제.
3. The method of claim 1 or 2,
A rust preventive film remover, characterized in that it removes the rust preventive film formed on the alignment mark and/or the identification number printed on the substrate.
삭제delete
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