JP3112744B2 - Surface protective agent for printed wiring boards - Google Patents

Surface protective agent for printed wiring boards

Info

Publication number
JP3112744B2
JP3112744B2 JP04157615A JP15761592A JP3112744B2 JP 3112744 B2 JP3112744 B2 JP 3112744B2 JP 04157615 A JP04157615 A JP 04157615A JP 15761592 A JP15761592 A JP 15761592A JP 3112744 B2 JP3112744 B2 JP 3112744B2
Authority
JP
Japan
Prior art keywords
group
benzimidazole
solder
acid
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04157615A
Other languages
Japanese (ja)
Other versions
JPH05186888A (en
Inventor
康通 笹原
誠治 柴田
Original Assignee
タムラ化研株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by タムラ化研株式会社 filed Critical タムラ化研株式会社
Priority to JP04157615A priority Critical patent/JP3112744B2/en
Publication of JPH05186888A publication Critical patent/JPH05186888A/en
Application granted granted Critical
Publication of JP3112744B2 publication Critical patent/JP3112744B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はプリント配線板の表面保
護剤に関するものである。特にプリント配線板金属の表
面の高温下における酸化又は高湿下における錆の発生を
防止する効果の優れたプリント配線板用表面保護剤に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface protective agent for a printed wiring board. In particular, the present invention relates to a surface protective agent for a printed wiring board having an excellent effect of preventing oxidation of a metal surface of a printed wiring board at high temperature or generation of rust under high humidity.

【0002】[0002]

【従来の技術】従来、プリント配線板は一般にその回路
表面に銅又は銅合金からなる金属板が用いられ、このプ
リント配線板の表面保護方法として、樹脂コーティング
法、はんだコーティング法、化学薬品によるコーティン
グ法に大別される。上記の樹脂コーティング法としては
一般にロジン類、合成樹脂などを有機溶剤に溶解させ
て、ローラー、刷毛、浸漬、噴霧等の手段でプリント配
線板上全面に塗布し、後乾燥して被膜を成形する方法で
ある。また、はんだコーティング法は、プリント配線板
の回路表面に溶融はんだをレベラー等によって薄くコー
ティングして保護する方法である。上記の樹脂コーティ
ング法においては、樹脂の有機溶剤溶液を用いるため、
有機溶剤の気化、逸散によって、作業者の中毒、作業上
の火災等の環境衛生上極めて不都合であった。また、予
めはんだコーティング法はプリント配線板の高温あるい
は高湿下での保護特性は優れているが、はんだコーティ
ングによるはんだ被膜の厚さが一定せず、現在の部品の
高密度実装には不適当である。また、はんだをコーティ
ングするためにコストが割高となって工業的量産上にお
いて不利である。
2. Description of the Related Art Conventionally, a printed circuit board generally uses a metal plate made of copper or a copper alloy on a circuit surface thereof. As a method for protecting the surface of the printed circuit board, a resin coating method, a solder coating method, and a coating with a chemical agent are used. The law is roughly divided. As the above resin coating method, generally, rosins, synthetic resins, and the like are dissolved in an organic solvent, applied to the entire surface of the printed wiring board by means of a roller, brush, dipping, spraying, etc., and then dried to form a coating. Is the way. Further, the solder coating method is a method of protecting a circuit surface of a printed wiring board by coating a thin layer of molten solder with a leveler or the like. In the above resin coating method, since an organic solvent solution of the resin is used,
The vaporization and dissipation of the organic solvent is extremely inconvenient in terms of environmental hygiene such as worker poisoning and work fire. In addition, although the solder coating method has excellent protection characteristics of the printed wiring board under high temperature or high humidity, the thickness of the solder coating by the solder coating is not constant, so it is not suitable for high-density mounting of current parts It is. In addition, the cost for coating the solder is relatively high, which is disadvantageous in industrial mass production.

【0003】上述のプリント配線板保護法の欠点を除く
ため、化学薬品による防錆被膜保護法が開発された。そ
して、その防錆用薬剤としてイミダゾール誘導体を用い
て銅及び銅合金の防錆する方法が開示されている(特公
昭46-17046号公報、特公昭46-34214号公報)。しかし、
これらの薬剤は高温高湿下におけるはんだ付け性を悪く
する欠点があった。そこで、更に上記の欠点を解決すべ
く試みられた保護剤としてベンゾイミダゾール誘導体が
開示されている(特開平3-124395号公報)。
In order to eliminate the above-mentioned drawbacks of the printed wiring board protection method, a method for protecting a rust-preventive film with a chemical has been developed. A method for preventing rust of copper and copper alloys using an imidazole derivative as a rust preventive agent is disclosed (JP-B-46-17046, JP-B-46-34214). But,
These chemicals have the drawback of deteriorating the solderability under high temperature and high humidity. Accordingly, a benzimidazole derivative has been disclosed as a protective agent which has been attempted to further solve the above-mentioned disadvantages (Japanese Patent Laid-Open No. 3-124395).

【0004】[0004]

【発明が解決しようとする課題】前項で述べた従来技術
のベンズイミダゾール誘導体を主成分とする保護剤にお
いても、近年のプリント配線板の部品実装の高密度化及
び表面実装化が急迫しつつある。また、はんだ付け時の
みならず硬化炉、リフロー炉等のプリント配線板が高温
下に被曝される時間が増加したような条件においては、
十分な防錆効果を奏することが困難であった。本発明は
置換ベンズイミダゾール誘導体を主成分とする保護剤を
プリント配線板に使用した前述の過酷な条件においても
十分満足し得る新規な保護剤を提供することを目的とす
るものである。
Even with the prior art protective agent containing a benzimidazole derivative as a main component as described in the preceding paragraph, recent years have seen an urgent need to increase the density and surface mounting of components on printed wiring boards. . In addition, not only at the time of soldering, but also under conditions where the time of exposure of the printed wiring board to a high temperature, such as a curing oven or a reflow oven, is increased.
It was difficult to achieve a sufficient rust prevention effect. An object of the present invention is to provide a novel protective agent which can sufficiently satisfy the above-mentioned severe conditions using a protective agent containing a substituted benzimidazole derivative as a main component in a printed wiring board.

【0005】[0005]

【課題を解決するための手段】本発明者は前述の現在の
プリント配線板の過酷な処理条件に対しても十分その効
果を有する保護剤を鋭意研究の結果〈化1〉で表わされ
る置換ベンズイミダゾール誘導体及びその塩がその要求
を満足し得ることを見出し本発明を完成した。
The inventor of the present invention has conducted intensive studies on a protective agent having a sufficient effect even under the above-mentioned severe processing conditions for a printed wiring board. The inventors have found that an imidazole derivative and a salt thereof can satisfy the requirement, and have completed the present invention.

【0006】本発明は〈化1〉で表わされる化合物を有
効成分とするプリント配線板用表面保護剤である。
The present invention is a surface protective agent for a printed wiring board containing a compound represented by the formula (1) as an active ingredient.

【化1】 (式中Xは同一又は異なりて炭素数1〜7個のアルキル
基、ハロゲン原子、アミノ基、ジ低級アルキルアミノ
基、ヒドロキシ基、低級アルコキシ基、シアノ基、アセ
チル基、ベンゾイル基、カルバモイル基、ホルミル基、
カルボキシル基、低級アルコキシカルボニル基又はニト
ロ基を示し、n,pは0〜4の整数を示し、mは1〜10
の整数を示す)
Embedded image (Where X is the same or different and is an alkyl group having 1 to 7 carbon atoms, a halogen atom, an amino group, a di-lower alkylamino group, a hydroxy group, a lower alkoxy group, a cyano group, an acetyl group, a benzoyl group, a carbamoyl group, Formyl group,
A carboxyl group, a lower alkoxycarbonyl group or a nitro group; n and p each represent an integer of 0 to 4;
Indicates an integer)

【0007】本発明の保護剤の有効成分である〔化1〕
で表わされる化合物としては2-(8-フェニルオクチ
ル)ベンズイミダゾール、5,6-ジメチル-2-(2-フ
ェニルエチル)ベンズイミダゾール、4-クロロ-2-(3
-フェニルプロピル)ベンズイミダゾール、6-ジメチル
アミノ-2-(9-フェニルノニル)ベンズイミダゾー
ル、4,7-ジヒドロキシ-2-ベンジルベンズイミダゾ
ール、4-シアノ-2-(6-フェニルヘキシル)ベンズイ
ミダゾール、5,6-ジニトロ-2-ベンジルベンズイミ
ダゾール、4,7-ジエトキシ-2-(2-フェニルエチ
ル)ベンズイミダゾール、6-アミノ-2-(4-フェニル
ブチル)ベンズイミダゾール、6-アセチル-2-ベンジ
ルベンズイミダゾール、4-ベンゾイル-2-(5-フェニ
ルペンチル)ベンズイミダゾール、6-カルバモイル-2
-(7-フェニルヘプチル)ベンズイミダゾール、6-エ
トキシカルボニル-2-ベンジルベンズイミダゾール、
4,5,6-トリメトキシ-2-(2-フェニルエチル)ベ
ンズイミダゾール、5,6-ジメチル-7-ベンゾイル-2
-(3-フェニルプロピル)ベンズイミダゾール、4,5
-ジクロロ-6-n-ブチル-2-(9-フェニルノニル)ベ
ンズイミダゾール、4-フルオロ-6-ホルミル-2-ベン
ジルベンズイミダゾール、6-カルバモイル-5-エトキ
シ-2-(10-フェニルデシル)ベンズイミダゾール、
5,6-ジメチル-2-{(4-メトキシフェニル)ブチ
ル}ベンズイミダゾール、6-クロロ-2-{(2-ニトロ
フェニル)エチル}ベンズイミダゾール、6-カルボエ
トキシ-2-(3-ブロモベンジル)ベンズイミダゾー
ル、4-ヒドロキシ-2-{(4-シアノフェニル)プロピ
ル}ベンズイミダゾール、6-ジメチルアミノ-2-
{(4-ホルミルフェニル)プロピル}ベンズイミダゾ
ール、6-ベンゾイル-2-{(4-tert-ブチルフェニ
ル)エチル}ベンズイミダゾール、2-{(2-アセチル
フェニル)ペンチル}ベンズイミダゾール、6-カルバ
モイル-2-{(2,4-ジヒドロキシフェニル)エチ
ル}ベンズイミダゾール等が挙げられる。
[0007] The active ingredient of the protective agent of the present invention [Chemical Formula 1]
Examples of the compound represented by are 2- (8-phenyloctyl) benzimidazole, 5,6-dimethyl-2- (2-phenylethyl) benzimidazole, and 4-chloro-2- (3
-Phenylpropyl) benzimidazole, 6-dimethylamino-2- (9-phenylnonyl) benzimidazole, 4,7-dihydroxy-2-benzylbenzimidazole, 4-cyano-2- (6-phenylhexyl) benzimidazole, 5,6-dinitro-2-benzylbenzimidazole, 4,7-diethoxy-2- (2-phenylethyl) benzimidazole, 6-amino-2- (4-phenylbutyl) benzimidazole, 6-acetyl-2- Benzylbenzimidazole, 4-benzoyl-2- (5-phenylpentyl) benzimidazole, 6-carbamoyl-2
-(7-phenylheptyl) benzimidazole, 6-ethoxycarbonyl-2-benzylbenzimidazole,
4,5,6-trimethoxy-2- (2-phenylethyl) benzimidazole, 5,6-dimethyl-7-benzoyl-2
-(3-phenylpropyl) benzimidazole, 4,5
-Dichloro-6-n-butyl-2- (9-phenylnonyl) benzimidazole, 4-fluoro-6-formyl-2-benzylbenzimidazole, 6-carbamoyl-5-ethoxy-2- (10-phenyldecyl) Benzimidazole,
5,6-dimethyl-2-{(4-methoxyphenyl) butyl} benzimidazole, 6-chloro-2-{(2-nitrophenyl) ethyl} benzimidazole, 6-carbethoxy-2- (3-bromobenzyl ) Benzimidazole, 4-hydroxy-2-{(4-cyanophenyl) propyl} benzimidazole, 6-dimethylamino-2-
{(4-formylphenyl) propyl} benzimidazole, 6-benzoyl-2-{(4-tert-butylphenyl) ethyl} benzimidazole, 2-{(2-acetylphenyl) pentyl} benzimidazole, 6-carbamoyl- 2-{(2,4-dihydroxyphenyl) ethyl} benzimidazole and the like.

【0008】本発明の有効成分である〔化1〕で表わさ
れる化合物を本発明のプリント配線板用表面保護剤とす
るには、同化合物を水、又水に任意の割合で混和する水
性溶剤に溶解あるいは乳化させた状態にするのが使用上
都合がよい。〈化1〉で表わされる化合物は一般に水に
不溶性であるので、この化合物を無機酸又は有機酸によ
り塩を形成し水溶液とすると使用し易い保護剤となる。
この場合塩を形成する酸としては、ギ酸、酢酸、プロピ
オン酸、酪酸、グリコール酸、乳酸、クロロ酢酸、ジク
ロロ酢酸、トリクロロ酢酸、ブロモ酢酸、ジブロモ酢
酸、フルオロ酢酸、ジフルオロ酢酸、トリフルオロ酢
酸、シュウ酸、マロン酸、コハク酸、アジピン酸、リン
ゴ酸、酒石酸、クエン酸、マレイン酸、フマール酸、パ
ラトルエンスルホン酸、メタンスルホン酸等の有機酸、
塩酸、硫酸、リン酸、亜リン酸、次亜リン酸、硝酸等の
無機酸が用いられる。また、水に任意に混和する溶剤と
してはメタノール、エタノール、イソプロパノール、ア
セトン、メチルエチルケトン、テトラヒドロフラン、ジ
オキサン、ジメチルスルフォキシド、ジメチルホルムア
ミド等が挙げられ、本発明の保護剤の場合はこれらの溶
剤を必要に応じて適宜加えてもよい。本溶液又は乳化液
に含有される有効成分の含有量は0.05〜30%(重量)、
望ましくは0.1〜5%(重量)である。なお有効成分の
含量が0.05%(重量)未満では、本剤を使用してプリン
ト配線板を塗布しても充分な保護効果は得られないし、
30%(重量)を超えると不溶解分が多くなり易くまた経
済的上も不利である。
In order to use the compound represented by the formula (1) as the active ingredient of the present invention as the surface protective agent for a printed wiring board of the present invention, the compound is mixed with water or an aqueous solvent in which water is mixed at an arbitrary ratio. It is convenient for use to be dissolved or emulsified in water. Since the compound represented by the formula (1) is generally insoluble in water, when this compound is formed into a salt with an inorganic acid or an organic acid to form an aqueous solution, it becomes an easily usable protective agent.
In this case, the acid forming a salt includes formic acid, acetic acid, propionic acid, butyric acid, glycolic acid, lactic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, bromoacetic acid, dibromoacetic acid, fluoroacetic acid, difluoroacetic acid, trifluoroacetic acid, and oxalic acid. Organic acids such as acid, malonic acid, succinic acid, adipic acid, malic acid, tartaric acid, citric acid, maleic acid, fumaric acid, paratoluenesulfonic acid, methanesulfonic acid, etc.
Inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid, phosphorous acid, hypophosphorous acid and nitric acid are used. Examples of the solvent arbitrarily miscible with water include methanol, ethanol, isopropanol, acetone, methyl ethyl ketone, tetrahydrofuran, dioxane, dimethyl sulfoxide, and dimethylformamide.In the case of the protective agent of the present invention, these solvents are necessary. May be added as appropriate. The content of the active ingredient contained in the present solution or emulsion is 0.05 to 30% (weight),
Desirably, it is 0.1 to 5% (weight). If the content of the active ingredient is less than 0.05% (weight), a sufficient protective effect cannot be obtained even when a printed wiring board is applied using this agent,
If it exceeds 30% (weight), the amount of insoluble matter tends to increase, and it is economically disadvantageous.

【0009】本発明のプリント配線板用保護剤には上記
の有効成分の他、例えば銅との錯体被膜形成助剤として
例えばギ酸銅、塩化銅、シュウ酸銅、酢酸銅、リン酸
銅、硫酸銅、ギ酸銅、ギ酸マンガン、塩化マンガン、シ
ュウ酸マンガン、硫酸マンガン、等の重金属塩を添加す
ると好適である。その他本発明の用途に用いられる保護
剤に普通に添加される助剤を適宜加えてもよい。
In addition to the above-mentioned active ingredients, the protective agent for printed wiring boards of the present invention includes, for example, copper formate, copper chloride, copper oxalate, copper acetate, copper phosphate, sulfuric acid as a complex film forming aid with copper. It is preferable to add heavy metal salts such as copper, copper formate, manganese formate, manganese chloride, manganese oxalate, and manganese sulfate. Other auxiliaries usually added to the protective agent used for the purpose of the present invention may be appropriately added.

【0010】本発明の保護剤でプリント配線板上に保護
膜を形成する方法は、一般の被膜方法に準じて、プリン
ト配線板の銅回路表面を機械もしくは化学研磨によって
仕上げ、引き続き本発明の保護剤の液に浸漬する。浸漬
は普通0〜60℃の範囲で実施できるが、10〜50℃が好適
である。浸漬時間は5秒〜1時間、好ましくは10秒〜10
分間である。なお、他の塗布法例えば噴霧法、刷毛、ロ
ーラー等による塗布方法でもよい。以上のようにして得
られた被膜は高温、高湿下でもはんだ付け性が極めて良
好である。
In the method of forming a protective film on a printed wiring board with the protective agent of the present invention, the copper circuit surface of the printed wiring board is finished by mechanical or chemical polishing according to a general coating method, and then the protective film of the present invention is protected. Immerse in the agent solution. Immersion can usually be carried out in the range of 0-60 ° C, but 10-50 ° C is preferred. Immersion time is 5 seconds to 1 hour, preferably 10 seconds to 10 hours.
Minutes. It should be noted that other coating methods such as a spraying method, a brush, a roller and the like may be used. The coating film obtained as described above has extremely good solderability even under high temperature and high humidity.

【0011】次に本発明の実施例並びにその効果を示
す。
Next, embodiments of the present invention and effects thereof will be described.

【0012】[0012]

【実施例】【Example】

例1 2(重量)%の酒石酸水溶液100gに、硫酸銅0.1g、2
-(8-フェニルオクチル)ベンズイミダゾール1.0g、2
5%アンモニア水0.1gを順次加えて混和し、2-(8-フ
ェニルオクチル)ベンズイミダゾール水溶液を得た。こ
の液に、30.0mm×7.5mm×0.3mmの銅板を研磨、脱脂、ソ
フトエッチング及び水洗し表面を清浄にした試験片を50
℃で2分間浸漬した。このコーティングの後、水洗、温
風乾燥し後空気循環式オーブン中で200℃で5分、10
分、15分、20分熱劣化させ、測定前にポストフラックス
を塗布してはんだ濡れ試験方法(平衡法)をJIS-C-0053
に準拠して行った。また、はんだ拡がり率試験はJIS-Z-
3197に準拠して行った。この結果を〈表1〉、更に90%
の湿度において40℃の条件で、0,100,200,500,100
0時間後はんだ濡れ試験並びにはんだ拡がり試験を前試
験と同様に行った結果を〈表2〉に示す。
Example 1 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
-(8-phenyloctyl) benzimidazole 1.0 g, 2
0.1 g of 5% aqueous ammonia was sequentially added and mixed to obtain an aqueous solution of 2- (8-phenyloctyl) benzimidazole. A test piece of 30.0 mm x 7.5 mm x 0.3 mm copper plate was polished, degreased, soft-etched and washed with water to clean the surface.
C. for 2 minutes. After this coating, it is washed with water, dried with hot air, and then placed in an air-circulating oven at 200 ° C for 5 minutes.
Min, 15 min, 20 min heat deterioration, apply post flux before measurement and apply solder wetting test method (equilibrium method) to JIS-C-0053
Performed according to. The solder spread rate test is JIS-Z-
Performed according to 3197. The results are shown in Table 1 and 90%
0,100,200,500,100 under the condition of 40 ° C in the humidity of
Table 2 shows the results of the solder wetting test and the solder spread test performed after 0 hour in the same manner as the previous test.

【0013】例2 2(重量)%の酒石酸水溶液100gに、硫酸銅0.1g、
5,6-ジメチル-2-(2-フェニルエチル)ベンズイミ
ダゾール1.0g、25%アンモニア水0.1gを順次加えて混
和し、5,6-ジメチル-2-(2-フェニルエチル)ベン
ズイミイダゾール水溶液を得た。この液に例1と同様の
試験片を浸漬し、同様にはんだ濡れ試験、はんだ広がり
率試験並びに高湿度下のはんだ濡れ試験、はんだ広がり
率試験を行い、その結果を〈表1〉及び〈表2〉に示し
た。
Example 2 0.1 g of copper sulfate was added to 100 g of a 2% (by weight) aqueous solution of tartaric acid.
1.0 g of 5,6-dimethyl-2- (2-phenylethyl) benzimidazole and 0.1 g of 25% aqueous ammonia were sequentially added and mixed, and the mixture was mixed with 5,6-dimethyl-2- (2-phenylethyl) benzimidazole. An aqueous solution was obtained. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0014】例3 2(重量)%の酒石酸水溶液100gに、4-クロロ-2-
(3-フェニルプロピル)ベンズイミダゾール1.0gを加
えて混和し、4-クロロ-2-(3-フェニルプロピル)ベ
ンズイミイダゾール水溶液を得た。この液に例1と同様
の試験片を浸漬し、同様にはんだ濡れ試験、はんだ広が
り率試験並びに高湿度下のはんだ濡れ試験、はんだ広が
り率試験を行い、その結果を〈表1〉及び〈表2〉に示
した。
Example 3 To 100 g of a 2% (by weight) aqueous solution of tartaric acid was added 4-chloro-2-
1.0 g of (3-phenylpropyl) benzimidazole was added and mixed to obtain an aqueous solution of 4-chloro-2- (3-phenylpropyl) benzimidazole. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0015】例4 3(重量)%の酒石酸水溶液75gにエタノール25g及び
6-ジメチルアミノ-2-(9-フェニルノニル)ベンズイ
ミダゾール10gを加えて混和し、6-ジメチルアミノ-2
-(9-フェニルノニル)ベンズイミダゾール水溶液を得
た。この液に例1と同様の試験片を浸漬し、同様にはん
だ濡れ試験、はんだ広がり率試験並びに高湿度下のはん
だ濡れ試験、はんだ広がり率試験を行い、その結果を
〈表1〉及び〈表2〉に示した。
Example 4 To 75 g of a 3% (by weight) aqueous solution of tartaric acid, 25 g of ethanol and 10 g of 6-dimethylamino-2- (9-phenylnonyl) benzimidazole were added and mixed, followed by mixing with 6-dimethylamino-2.
An aqueous solution of-(9-phenylnonyl) benzimidazole was obtained. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0016】例5 3(重量)%の酒石酸水溶液100gに4,7-ジヒドロキ
シ-2-ベンジルベンズイミダゾール1.0gを加えて混和
し、4,7-ジヒドロキシ-2-ベンジルベンズイミダゾ
ール水溶液を得た。この液に例1と同様の試験片を浸漬
し、同様にはんだ濡れ試験、はんだ広がり率試験並びに
高湿度下のはんだ濡れ試験、はんだ広がり率試験を行
い、その結果を〈表1〉及び〈表2〉に示した。
Example 5 1.0 g of 4,7-dihydroxy-2-benzylbenzimidazole was added to 100 g of a 3% (by weight) aqueous solution of tartaric acid and mixed to obtain an aqueous solution of 4,7-dihydroxy-2-benzylbenzimidazole. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0017】例6 2(重量)%の酒石酸水溶液100gにギ酸マンガン0.1
g、4-シアノ-2-(6-フェニルヘキシル)ベンズイミ
ダゾール1.0gを加えて混和し、4-シアノ-2-(6-フ
ェニルヘキシル)ベンズイミダゾール水溶液を得た。こ
の液に例1と同様の試験片を浸漬し、同様にはんだ濡れ
試験、はんだ広がり率試験並びに高湿度下のはんだ濡れ
試験、はんだ広がり率試験を行い、その結果を〈表1〉
及び〈表2〉に示した。
Example 6 0.1 g of manganese formate was added to 100 g of a 2% (by weight) aqueous solution of tartaric acid.
g, 4-cyano-2- (6-phenylhexyl) benzimidazole (1.0 g) was added and mixed to obtain an aqueous solution of 4-cyano-2- (6-phenylhexyl) benzimidazole. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread rate test, a solder wetness test under high humidity, and a solder spread rate test were similarly performed.
And <Table 2>.

【0018】例7 2(重量)%の酒石酸水溶液100gにギ酸マンガン0.1
g、5,6-ジニトロ-2-ベンジルベンズイミダゾール
1.0gを加えて混和し、5,6-ジニトロ-2-ベンジルベ
ンズイミダゾールの水溶液を得た。この液に例1と同様
の試験片を浸漬し、同様にはんだ濡れ試験、はんだ広が
り率試験並びに高湿度下のはんだ濡れ試験、はんだ広が
り率試験を行い、その結果を〈表1〉及び〈表2〉に示
した。
EXAMPLE 7 0.1 g of manganese formate was added to 100 g of a 2% (by weight) aqueous solution of tartaric acid.
g, 5,6-dinitro-2-benzylbenzimidazole
1.0 g was added and mixed to obtain an aqueous solution of 5,6-dinitro-2-benzylbenzimidazole. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0019】例8 2(重量)%の酒石酸水溶液100gに4,7-ジエトキシ-
2-(2-フェニルエチル)ベンズイミイダゾール1.0g
を加えて、この液に、例1と同様の試験片を浸漬し、同
様にはんだ濡れ試験、はんだ広がり率試験並びに高湿度
下のはんだ濡れ試験、はんだ広がり率試験を行い、その
結果を〈表1〉及び〈表2〉に示した。
Example 8 4,7-Diethoxy- was added to 100 g of a 2% (by weight) aqueous solution of tartaric acid.
1.0 g of 2- (2-phenylethyl) benzimidazole
Then, the same test piece as in Example 1 was immersed in this liquid, and the solder wetness test, the solder spread rate test, the solder wetness test under high humidity, and the solder spread rate test were performed in the same manner. 1> and <Table 2>.

【0020】例9 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、5,
6-ジメチル-2-{(4-メトキシフェニル)ブチル}ベ
ンズイミダゾール1.0g、25%アンモニア水0.1gを順次
加えて混和し、5,6-ジメチル-2-{(4-メトキシフ
ェニル)ブチル}ベンズイミダゾール水溶液を得た。こ
の液に例1と同様の試験片を浸漬し、同様にはんだ濡れ
試験、はんだ広がり率試験並びに高湿度下のはんだ濡れ
試験、はんだ広がり率試験を行い、その結果を〈表1〉
及び〈表2〉に示した。
EXAMPLE 9 0.1 g of copper sulfate was added to 100 g of a 2% (by weight) aqueous solution of tartaric acid.
6-dimethyl-2-{(4-methoxyphenyl) butyl} 1.0 g of benzimidazole and 0.1 g of 25% aqueous ammonia are sequentially added and mixed to give 5,6-dimethyl-2-{(4-methoxyphenyl) butyl}. An aqueous solution of benzimidazole was obtained. A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread rate test, a solder wetness test under high humidity, and a solder spread rate test were similarly performed.
And <Table 2>.

【0021】例10 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、6-
クロロ-2-{(2-ニトロフェニル)エチル}ベンズイ
ミダゾール1.0g、25%アンモニア水0.1gを順次加えて
混和し、6-クロロ-2-{(2-ニトロフェニル)エチ
ル}ベンズイミダゾール水溶液を得た。この液を例1と
同様の試験片を用い、同様に試験した結果を〈表1〉及
び〈表2〉に示した。
Example 10 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
Chloro-2-{(2-nitrophenyl) ethyl} benzimidazole (1.0 g) and 25% aqueous ammonia (0.1 g) were sequentially added and mixed, and 6-chloro-2-{(2-nitrophenyl) ethyl} benzimidazole aqueous solution was added. Obtained. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0022】例11 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、6-
カルボエトキシ-2-(3-ブロモベンジル)ベンズイミ
ダゾール1.0g、25%アンモニア水0.1gを順次加えて混
和し、6-カルボエトキシ-2-(3-ブロモベンジル)ベ
ンズイミダゾール水溶液を得た。この液を例1と同様の
試験片を用い、同様に試験した結果を〈表1〉及び〈表
2〉に示した。
EXAMPLE 11 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
1.0 g of carbethoxy-2- (3-bromobenzyl) benzimidazole and 0.1 g of 25% aqueous ammonia were sequentially added and mixed to obtain an aqueous solution of 6-carbethoxy-2- (3-bromobenzyl) benzimidazole. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0023】例12 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、4-
ヒドロキシ-2-{(4-シアノフェニル)プロピル}ベ
ンズイミダゾール1.0g、25%アンモニア水0.1gを順次
加えて混和し、4-ヒドロキシ-2-{(4-シアノフェニ
ル)プロピル}ベンズイミダゾール水溶液を得た。この
液を例1と同様の試験片を用い、同様に試験した結果を
〈表1〉及び〈表2〉に示した。
Example 12 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
1.0 g of hydroxy-2-{(4-cyanophenyl) propyl} benzimidazole and 0.1 g of 25% aqueous ammonia were sequentially added and mixed, and an aqueous solution of 4-hydroxy-2-{(4-cyanophenyl) propyl} benzimidazole was added. Obtained. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0024】例13 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、6-
ジメチルアミノ-2-{(4-ホルミルフェニル)プロピ
ル}ベンズイミダゾール1.0g、25%アンモニア水0.1g
を順次加えて混和し、6-ジメチルアミノ-2-{(4-ホ
ルミルフェニル)プロピル}ベンズイミダゾール水溶液
を得た。この液を例1と同様の試験片を用い、同様に試
験した結果を〈表1〉及び〈表2〉に示した。
Example 13 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
1.0 g of dimethylamino-2-{(4-formylphenyl) propyl} benzimidazole, 0.1 g of 25% aqueous ammonia
Were sequentially added and mixed to obtain an aqueous solution of 6-dimethylamino-2-{(4-formylphenyl) propyl} benzimidazole. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0025】例14 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、6-
ベンゾイル-2-{(4-tert-ブチルフェニル)エチル}
ベンズイミダゾール1.0g、25%アンモニア水0.1gを順
次加えて混和し、6-ベンゾイル-2-{(4-tert-ブチ
ルフェニル)エチル}ベンズイミダゾール水溶液を得
た。この液を例1と同様の試験片を用い、同様に試験し
た結果を〈表1〉及び〈表2〉に示した。
EXAMPLE 14 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
Benzoyl-2-{(4-tert-butylphenyl) ethyl}
1.0 g of benzimidazole and 0.1 g of 25% aqueous ammonia were sequentially added and mixed to obtain an aqueous solution of 6-benzoyl-2-{(4-tert-butylphenyl) ethyl} benzimidazole. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0026】例15 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、2-
{(2-アセチルフェニル)ペンチル}ベンズイミダゾ
ール1.0g、25%アンモニア水0.1gを順次加えて混和
し、2-{(2-アセチルフェニル)ペンチル}ベンズイ
ミダゾール水溶液を得た。この液を例1と同様の試験片
を用い、同様に試験した結果を〈表1〉及び〈表2〉に
示した。
Example 15 0.1 g of copper sulfate and 100 g of a 2% (by weight) aqueous solution of tartaric acid
1.0 g of {(2-acetylphenyl) pentyl} benzimidazole and 0.1 g of 25% aqueous ammonia were sequentially added and mixed to obtain an aqueous solution of 2-{(2-acetylphenyl) pentyl} benzimidazole. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0027】例16 2(重量)%の酒石酸水溶液100gに硫酸銅0.1g、6-
カルバモイル-2-{(2,4-ジヒドロキシフェニル)
エチル}ベンズイミダゾール1.0g、25%アンモニア水
0.1gを順次加えて混和し、6-カルバモイル-2-
{(2,4-ジヒドロキシフェニル)エチル}ベンズイ
ミダゾール水溶液を得た。この液を例1と同様の試験片
を用い、同様に試験した結果を〈表1〉及び〈表2〉に
示した。
Example 16 0.1 g of copper sulfate, 6-
Carbamoyl-2-{(2,4-dihydroxyphenyl)
1.0 g of ethyl @ benzimidazole, 25% ammonia water
0.1 g is added sequentially and mixed, and 6-carbamoyl-2-
An aqueous solution of {(2,4-dihydroxyphenyl) ethyl} benzimidazole was obtained. This liquid was tested in the same manner as in Example 1 using the same test piece, and the results are shown in Tables 1 and 2.

【0028】比較例1 例1の2-(8-フェニルオクチル)ベンズイミダゾール
に代えて、4-メチル-2-ウンデシルイミダゾールを同
量加えてて、4-メチル-2-n-ウンデシルイミダゾール
の水溶液を得、この液に例1と同様の試験片を常温で30
秒浸漬した。かくして得られた試験片を例1と同様には
んだ濡れ試験、はんだ広がり率試験並びに高湿度下のは
んだ濡れ試験、はんだ広がり率試験を行い、その結果を
〈表1〉及び〈表2〉に示した。
Comparative Example 1 In place of 2- (8-phenyloctyl) benzimidazole in Example 1, 4-methyl-2-undecylimidazole was added in the same amount to give 4-methyl-2-n-undecylimidazole. Aqueous solution, and the same test piece as in Example 1 was added to this solution at room temperature for 30 minutes.
Dipped for 2 seconds. The test piece thus obtained was subjected to a solder wetting test, a solder spread test, a solder wet test under high humidity and a solder spread test in the same manner as in Example 1, and the results are shown in Tables 1 and 2. Was.

【0029】比較例2 ベンズイミダゾール1gと酢酸2gを300mlのビーカー
に入れ溶解するまで撹拌した。次に水100g入れ、塩化
銅0.05gとアンモニア水0.5gを溶解し、液温を50℃に
して1(重量)%のベンズイミダゾール水溶液を得た。
この液に例1と同様の試験片を浸漬し、同様にはんだ濡
れ試験、はんだ広がり率試験並びに高湿度下のはんだ濡
れ試験、はんだ広がり率試験を行い、その結果を〈表
1〉及び〈表2〉に示した。
Comparative Example 2 1 g of benzimidazole and 2 g of acetic acid were placed in a 300 ml beaker and stirred until dissolved. Next, 100 g of water was added, 0.05 g of copper chloride and 0.5 g of aqueous ammonia were dissolved, and the liquid temperature was adjusted to 50 ° C. to obtain a 1% (by weight) aqueous solution of benzimidazole.
A test piece similar to that of Example 1 was immersed in this liquid, and a solder wetness test, a solder spread test, a solder wet test under high humidity, and a solder spread test were similarly performed. 2>.

【0030】[0030]

【表1】 [Table 1]

【0031】[0031]

【表2】 以上の結果から明らかな通り、本発明の保護剤は比較例
の保護剤に対し、はんだ濡れ時間が少なく、かつ高湿下
の防錆効果及びはんだ濡れ時間が良好であった。
[Table 2] As is clear from the above results, the protective agent of the present invention had a shorter solder wetting time, a better rust-preventive effect under high humidity, and a better solder wet time than the protective agent of the comparative example.

【0032】[0032]

【発明の効果】本発明のプリント配線板用表面保護剤は
プリント配線板回路上の銅及び合金表面に耐熱性並びに
高湿下に曝された後でも非常に良好な被膜を形成し、プ
リント配線板の保護並びに部品実装後のはんだ付け性に
極めて顕著な効果を示す有用な発明である。
As described above, the surface protective agent for printed wiring boards of the present invention forms a very good film on the surfaces of copper and alloy on the printed wiring board circuit even after being exposed to heat and high humidity. The present invention is a useful invention which has a very remarkable effect on the protection of the board and the solderability after component mounting.

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C23F 11/00 H05K 3/28 C09D 5/08 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) C23F 11/00 H05K 3/28 C09D 5/08

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 〈化1〉で表わされる化合物を有効成分
とすることを特徴とするプリント配線板用表面保護剤。 【化1】 (式中Xは同一又は異なりて炭素数1〜7個のアルキル
基、ハロゲン原子、アミノ基、ジ低級アルキルアミノ
基、ヒドロキシ基、低級アルコキシ基、シアノ基、アセ
チル基、ベンゾイル基、カルバモイル基、ホルミル基、
カルボキシル基、低級アルコキシカルボニル基又はニト
ロ基を示し、n,pは0〜4の整数を示し、mは1〜10
の整数を示す)
1. A surface protective agent for printed wiring boards, comprising a compound represented by the formula (1) as an active ingredient. Embedded image (Where X is the same or different and is an alkyl group having 1 to 7 carbon atoms, a halogen atom, an amino group, a di-lower alkylamino group, a hydroxy group, a lower alkoxy group, a cyano group, an acetyl group, a benzoyl group, a carbamoyl group, Formyl group,
A carboxyl group, a lower alkoxycarbonyl group or a nitro group; n and p each represent an integer of 0 to 4;
Indicates an integer)
【請求項2】 〈化1〉で表わされる化合物の塩の水溶
液を有効成分とする請求項1記載の保護剤。
2. The protective agent according to claim 1, which comprises an aqueous solution of a salt of the compound represented by the formula (1) as an active ingredient.
JP04157615A 1991-09-12 1992-06-17 Surface protective agent for printed wiring boards Expired - Fee Related JP3112744B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04157615A JP3112744B2 (en) 1991-09-12 1992-06-17 Surface protective agent for printed wiring boards

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3-232877 1991-09-12
JP23287791 1991-09-12
JP04157615A JP3112744B2 (en) 1991-09-12 1992-06-17 Surface protective agent for printed wiring boards

Publications (2)

Publication Number Publication Date
JPH05186888A JPH05186888A (en) 1993-07-27
JP3112744B2 true JP3112744B2 (en) 2000-11-27

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TW263534B (en) * 1993-08-11 1995-11-21 Makkusu Kk
US5735973A (en) * 1993-12-20 1998-04-07 Tamura Kaken Corporation Printed circuit board surface protective agent
JP2550915B2 (en) * 1994-06-21 1996-11-06 日本電気株式会社 Method for forming surface protective agent and surface protective film for printed wiring board
JP2587597B2 (en) * 1994-11-22 1997-03-05 富山日本電気株式会社 Manufacturing method of printed wiring board
TW453930B (en) * 2000-04-17 2001-09-11 Fujitsu Ltd Solder bonding
JP2003031929A (en) 2001-07-19 2003-01-31 Tamura Kaken Co Ltd Water-soluble pre-flux, printed circuit board, and metal surface treating method of the same
KR101074640B1 (en) 2004-06-10 2011-10-19 시코쿠가세이고교가부시키가이샤 Phenylnaphthylimidazoles for use on copper surfaces during soldering
JP4883996B2 (en) 2005-05-24 2012-02-22 四国化成工業株式会社 Water-soluble preflux and its use
DE102005032142B4 (en) 2005-07-07 2014-10-09 Infineon Technologies Ag A method of contacting semiconductor devices with a test contact
JP5615227B2 (en) 2011-05-23 2014-10-29 四国化成工業株式会社 Surface treatment agent for copper or copper alloy and use thereof
JP5615233B2 (en) 2011-06-20 2014-10-29 四国化成工業株式会社 Surface treatment agent for copper or copper alloy and use thereof
JP5657761B1 (en) * 2013-08-30 2015-01-21 株式会社タムラ製作所 Semiconductor substrate surface treatment method, semiconductor package manufacturing method, and water-soluble preflux used in these methods

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