JPH05345984A - Surface treating agent for copper and copper alloy - Google Patents

Surface treating agent for copper and copper alloy

Info

Publication number
JPH05345984A
JPH05345984A JP17931392A JP17931392A JPH05345984A JP H05345984 A JPH05345984 A JP H05345984A JP 17931392 A JP17931392 A JP 17931392A JP 17931392 A JP17931392 A JP 17931392A JP H05345984 A JPH05345984 A JP H05345984A
Authority
JP
Japan
Prior art keywords
copper
benzimidazole
compd
acid
chemical conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17931392A
Other languages
Japanese (ja)
Inventor
Hirohiko Hirao
浩彦 平尾
Takayuki Murai
孝行 村井
Yoshimasa Kikukawa
芳昌 菊川
Takashi Yoshioka
隆 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shikoku Chemicals Corp
Original Assignee
Shikoku Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shikoku Chemicals Corp filed Critical Shikoku Chemicals Corp
Priority to JP17931392A priority Critical patent/JPH05345984A/en
Publication of JPH05345984A publication Critical patent/JPH05345984A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability

Abstract

PURPOSE:To obtain the chemical conversion film excellent in rust preventing property and thermal resistance by specifying the benzimidazole compd. which is contained in the pre-fluxing agent used at the copper circuit part of the hard and flexible printed circuit plate. CONSTITUTION:This surface treating agent contains 2-(cyclohexylalkyl) benzimidazole compd. (B) expressed by the formula as active component. In the formula, n is 0-6, each of R1, R2 is H atom, lower alkyl group or halogen atom and may be the same or different with each other. By allowing to contact the aq. soln. of this surface treating agent with the surface of copper or copper alloy, the chemical conversion film of compd. B which is locally formed into a copper complex is obtained. By allowing to stand or by heating this chemical conversion film, the compd. B is changed to the described copper complex, and thermally and chemically stable film is obtained. Further, because the compd. B is hardly soluble in water, the compd. B is dissolved using an acid.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、銅及び銅合金の表面に
化成被膜を形成する水溶液系表面処理剤関するものであ
り、特に硬質プリント配線板及びフレキシブルプリント
配線板における銅回路部のプレフラックス処理剤として
好適なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aqueous surface treatment agent for forming a chemical conversion film on the surfaces of copper and copper alloys, and particularly to a pre-flux of a copper circuit portion in a hard printed wiring board and a flexible printed wiring board. It is suitable as a treating agent.

【0002】[0002]

【従来の技術】銅あるいは銅合金の表面に、2位長鎖ア
ルキルイミダゾール化合物の被膜を形成する表面処理方
法としては、特公昭46-17046号、同48-11454号、同48-2
5621号、同49- 1983号、同49-26183号、同58-22545号、
同61-41988号及び特開昭61-90492号公報に記載されてい
る。
2. Description of the Related Art As a surface treatment method for forming a film of a 2-position long-chain alkylimidazole compound on the surface of copper or a copper alloy, Japanese Patent Publication Nos. 46-17046, 48-11454 and 48-2 are available.
No. 5621, No. 49-1983, No. 49-26183, No. 58-22545,
No. 61-41988 and JP-A No. 61-90492.

【0003】また銅あるいは銅合金の表面にベンズイミ
ダゾール系化合物の化成被膜を形成する方法としては、
5−メチルベンズイミダゾールを用いる処理方法が特開
昭 58-501281号公報に、2−アルキルベンズイミダゾー
ル類を用いる処理方法が特開平4-72072 号、同4-80375
号及び同4-99285 号公報に記載されている。他に、メル
カプトベンズイミダゾールを用いる銅又は銅合金の防錆
方法が、特開昭55-83157号、同62-77600号及び同63-118
598 号公報に開示されている。
As a method for forming a chemical conversion coating film of a benzimidazole compound on the surface of copper or copper alloy,
A treatment method using 5-methylbenzimidazole is disclosed in JP-A-58-501281, and a treatment method using 2-alkylbenzimidazoles is disclosed in JP-A-4-72072 and 4-80375.
And 4-99285. In addition, a method of rust prevention of copper or copper alloy using mercaptobenzimidazole, JP-A-55-83157, 62-77600 and 63-118.
It is disclosed in Japanese Patent No. 598.

【0004】[0004]

【発明が解決しようとする課題】近時プリント配線板に
対する電子部品の接合方法として、表面実装法が多く採
用されるようになり、チップ部品の仮止め、部品装置の
両面装着あるいはチップ部品とディスクリート部品の混
載などにより、プリント配線板が高温下に曝されるよう
になった。
Recently, as a method of joining electronic components to a printed wiring board, a surface mounting method has come to be widely used, and temporary mounting of chip components, double-sided mounting of component devices or chip components and discrete components. Printed wiring boards have come to be exposed to high temperatures due to mixed components.

【0005】従来知られている2位長鎖アルキルイミダ
ゾール化合物を用いてプリント配線板の表面処理を行な
った場合、高温に曝されると表面処理された銅面が変色
し、その後のはんだ付けに際して支障を生じるおそれが
あった。また、特開昭58−501281号公報に記載の5−メ
チルベンズイミダゾールを用いる処理方法では、この化
合物が水に比較的溶け易いため、好ましい膜厚と認めら
れる0.08μm 以上の化成被膜を形成することができず、
高温下において下地銅を保護し難い欠点があった。
When a surface treatment of a printed wiring board is performed using a conventionally known 2-position long-chain alkylimidazole compound, the surface-treated copper surface is discolored when exposed to high temperature, and the soldering is performed thereafter. There was a risk of trouble. Further, in the treatment method using 5-methylbenzimidazole described in JP-A-58-501281, since this compound is relatively soluble in water, a chemical conversion film of 0.08 μm or more, which is recognized as a preferable film thickness, is formed. I can't
There was a drawback that it was difficult to protect the copper base under high temperature.

【0006】また特開昭55-83157号及び同62-77600号公
報に記載の2−メルカプトベンズイミダゾールを用いた
防錆方法は、2−メルカプトベンズイミダゾールをメタ
ノール等の有機溶剤に溶かして、基材に塗布し乾燥する
方法であり、有機溶剤を使用するため人体に対する悪影
響や工場の保安面で問題があった。特開昭63-118598号
公報に記載の方法については2−メルカプトベンズイミ
ダゾールの薄膜を形成するのに、約3時間の浸漬処理を
必要としており、高生産性、高速処理を要求されるプリ
ント配線板業界の実情に適合しないものであった。
Further, the rust-preventing method using 2-mercaptobenzimidazole described in JP-A-55-83157 and JP-A-62-77600 is a method in which 2-mercaptobenzimidazole is dissolved in an organic solvent such as methanol to give a base solution. It is a method of applying it to a material and drying it. Since it uses an organic solvent, it has a bad effect on the human body and has a problem in safety of the factory. According to the method described in Japanese Patent Laid-Open No. 63-118598, a printed wiring that requires a high productivity and a high-speed treatment requires a dipping treatment for about 3 hours to form a thin film of 2-mercaptobenzimidazole. It did not fit the actual situation of the board industry.

【0007】また、特開平4-72072 号、同4-80375 号及
び同4-99285 号公報に記載の2−アルキルベンズイミダ
ゾール類を用いた場合は、2−位長鎖アルキルイミダゾ
ール化合物を用いた場合と比べると、高温に曝された後
のはんだ付け性は大幅に向上するが、それでも充分に満
足できる程度とは言えない。
When 2-alkylbenzimidazoles described in JP-A-4-72072, JP-A-4-80375 and JP-A-4-99285 are used, a 2-position long-chain alkylimidazole compound is used. Compared with the case, the solderability after exposure to high temperature is significantly improved, but it is still not sufficiently satisfactory.

【0008】このようにプリント配線板の表面実装法に
対応しうる、耐熱性が高く且つ作業環境を悪化させない
プレフラックス、即ち高温に曝されたのちもはんだ付け
性に優れた水溶液系のプレフラックスが望まれていた。
As described above, the pre-flux which can be applied to the surface mounting method of the printed wiring board and has a high heat resistance and does not deteriorate the working environment, that is, an aqueous solution-based pre-flux which is excellent in solderability even after being exposed to a high temperature. Was desired.

【0009】[0009]

【課題を解決するための手段】本発明者等は、このよう
な事情に鑑み鋭意研究を行なった結果、銅あるいは銅合
金の表面に、化1で示される2−(シクロヘキシルアル
キル)ベンズイミダゾール化合物を有効成分として含有
する水溶液系表面処理剤を接触させることにより、防錆
性・耐熱性に優れた化成被膜が形成されることを見い出
し、本発明を完遂するに至った。
Means for Solving the Problems The inventors of the present invention have conducted extensive studies in view of such circumstances, and as a result, on the surface of copper or a copper alloy, a 2- (cyclohexylalkyl) benzimidazole compound represented by Chemical formula 1 It was found that a chemical conversion coating film excellent in rust prevention and heat resistance is formed by contacting with an aqueous solution surface treatment agent containing as an active ingredient, and the present invention has been completed.

【0010】[0010]

【化1】 [Chemical 1]

【0011】(但し、式中nは0から6までの整数、R
1 及びR2 は同一又は異なって水素原子、低級アルキル
基又はハロゲン原子を表す。)
(Where n is an integer from 0 to 6 and R is
1 and R 2 are the same or different and each represents a hydrogen atom, a lower alkyl group or a halogen atom. )

【0012】本発明方法の実施に適する2−(シクロヘ
キシルアルキル)ベンズイミダゾール化合物としては、
2−シクロヘキシルベンズイミダゾール、2−(シクロ
ヘキシルメチル)ベンズイミダゾール、2−(2−シク
ロヘキシルエチル)ベンズイミダゾール、2−(3−シ
クロヘキシルプロピル)ベンズイミダゾール、2−(4
−シクロヘキシルブチル)ベンズイミダゾール、2−
(5−シクロヘキシルベンチル)ベンズイミダゾール、
2−(6−シクロヘキシルヘキシル)ベンズイミダゾー
ル、2−シクロヘキシル−5−メチルベンズイミダゾー
ル、2−(シクロヘキシルメチル)−5−メチルベンズ
イミダゾール、2−(2−シクロヘキシルエチル)−5
−メチルベンズイミダゾール、2−(3−シクロヘキシ
ルプロピル)−5−メチルベンズイミダゾール、2−
(4−シクロヘキシルブチル)−5−メチルベンズイミ
ダゾール、2−(5−シクロヘキシルペンチル)−5−
メチルベンズイミダゾール、2−(6−シクロヘキシル
ヘキシル)−5−メチルベンズイミダゾール、2−シク
ロヘキシル−5,6−ジメチルベンズイミダゾール、2
−(シクロヘキシルメチル)−5,6−ジメチルベンズ
イミダゾール、2−(2−シクロヘキシルエチル)−
5,6−ジメチルベンズイミダゾール、2−(3−シク
ロヘキシルプロピル)−5,6−ジメチルベンズイミダ
ゾール、2−(4−シクロヘキシルブチル)−5,6−
ジメチルベンズイミダゾール、2−(5−シクロヘキシ
ルペンチル)−5,6−ジメチルベンズイミダゾール、
2−(6−シクロヘキシルヘキシル)−5,6−ジメチ
ルベンズイミダゾール、2−シクロヘキシル−5−クロ
ロベンズイミダゾール、2−(シクロヘキシルメチル)
−5−クロロベンズイミダゾール、2−(シクロヘキシ
ルエチル)−5−クロロベンズイミダゾール、2−(3
−シクロヘキシルプロピル)−5−クロロベンズイミダ
ゾール、2−(4−(シクロヘキシルブチル)−5−ク
ロロベンズイミダゾール、2−(5−(シクロヘキシル
ペンチル)−5−クロロベンズイミダゾール、2−(6
−(シクロヘキシルヘキシル)−5−クロロベンズイミ
ダゾールなどであり、これらの2−(シクロヘキシルア
ルキル)ベンズイミダゾール化合物は公知の方法で合成
することができる。
The 2- (cyclohexylalkyl) benzimidazole compounds suitable for carrying out the method of the present invention include:
2-cyclohexylbenzimidazole, 2- (cyclohexylmethyl) benzimidazole, 2- (2-cyclohexylethyl) benzimidazole, 2- (3-cyclohexylpropyl) benzimidazole, 2- (4
-Cyclohexylbutyl) benzimidazole, 2-
(5-cyclohexylbenzyl) benzimidazole,
2- (6-cyclohexylhexyl) benzimidazole, 2-cyclohexyl-5-methylbenzimidazole, 2- (cyclohexylmethyl) -5-methylbenzimidazole, 2- (2-cyclohexylethyl) -5
-Methylbenzimidazole, 2- (3-cyclohexylpropyl) -5-methylbenzimidazole, 2-
(4-Cyclohexylbutyl) -5-methylbenzimidazole, 2- (5-cyclohexylpentyl) -5-
Methylbenzimidazole, 2- (6-cyclohexylhexyl) -5-methylbenzimidazole, 2-cyclohexyl-5,6-dimethylbenzimidazole, 2
-(Cyclohexylmethyl) -5,6-dimethylbenzimidazole, 2- (2-cyclohexylethyl)-
5,6-Dimethylbenzimidazole, 2- (3-cyclohexylpropyl) -5,6-dimethylbenzimidazole, 2- (4-cyclohexylbutyl) -5,6-
Dimethylbenzimidazole, 2- (5-cyclohexylpentyl) -5,6-dimethylbenzimidazole,
2- (6-cyclohexylhexyl) -5,6-dimethylbenzimidazole, 2-cyclohexyl-5-chlorobenzimidazole, 2- (cyclohexylmethyl)
-5-chlorobenzimidazole, 2- (cyclohexylethyl) -5-chlorobenzimidazole, 2- (3
-Cyclohexylpropyl) -5-chlorobenzimidazole, 2- (4- (cyclohexylbutyl) -5-chlorobenzimidazole, 2- (5- (cyclohexylpentyl) -5-chlorobenzimidazole, 2- (6
-(Cyclohexylhexyl) -5-chlorobenzimidazole and the like, and these 2- (cyclohexylalkyl) benzimidazole compounds can be synthesized by a known method.

【0013】即ち、オルトフェニレンジアミン化合物と
シクロヘキサンカルボン酸又はシクロヘキシル基をもつ
脂肪酸を反応させることによって得ることができる。こ
れを反応式で表せば、次示のとおりである。
That is, it can be obtained by reacting an orthophenylenediamine compound with a cyclohexanecarboxylic acid or a fatty acid having a cyclohexyl group. This is shown in the following reaction formula.

【0014】[0014]

【化2】 [Chemical 2]

【0015】(式中、n,R1 ,R2 は前記と同じ。)
本発明の実施においては、有効成分として2−(シクロ
ヘキシルアルキル)ベンズイミダゾール化合物を0.01
〜10重量%の割合、好ましくは0.1〜5重量%の割合
で含有する水溶液系の表面処理剤を使用する。
(In the formula, n, R 1 and R 2 are the same as above.)
In the practice of the present invention, a 2- (cyclohexylalkyl) benzimidazole compound was added as an active ingredient in an amount of 0.01
An aqueous solution type surface treatment agent is used which is contained in a proportion of from 10 to 10% by weight, preferably from 0.1 to 5% by weight.

【0016】2−(シクロヘキシルアルキル)ベンズイ
ミダゾール化合物は、水に対して難溶性であるため、有
機酸または無機酸を用いて水溶液化させる。また、水と
混和することができる有機溶媒を有機酸または無機酸と
併用して、2−(シクロヘキシル)アルキルベンズイミ
ダゾール化合物を水溶液化しても良い。なお、前記化1
で示される2−(シクロヘキシルアルキル)ベンズイミ
ダゾール化合物は、式中のnが7以上になれば、水に対
する溶解性が著しく低下するので実用に適さない。
Since the 2- (cyclohexylalkyl) benzimidazole compound is poorly soluble in water, it is made into an aqueous solution by using an organic acid or an inorganic acid. Further, a 2- (cyclohexyl) alkylbenzimidazole compound may be made into an aqueous solution by using an organic solvent miscible with water together with an organic acid or an inorganic acid. Note that the above chemical formula 1
The 2- (cyclohexylalkyl) benzimidazole compound represented by is not suitable for practical use when n in the formula is 7 or more because the solubility in water is significantly reduced.

【0017】この際に用いられる有機酸としては、ギ
酸、酢酸、プロピオン酸、酪酸、カプリン酸、グリコー
ル酸、乳酸、アクリル酸、安息香酸、パラニトロ安息香
酸、パラトルエンスルホン酸、サリチル酸、ピクリン
酸、シュウ酸、コハク酸、マレイン酸、フマール酸、酒
石酸、アジピン酸等であり、無機酸としては、塩酸、リ
ン酸、硫酸、硝酸等である。これらの酸は、水溶液に対
し0.01〜40重量%の割合、好ましくは0.2〜2
0重量%の割合になるように添加すれば良い。
Organic acids used in this case include formic acid, acetic acid, propionic acid, butyric acid, capric acid, glycolic acid, lactic acid, acrylic acid, benzoic acid, paranitrobenzoic acid, paratoluenesulfonic acid, salicylic acid, picric acid, Oxalic acid, succinic acid, maleic acid, fumaric acid, tartaric acid, adipic acid and the like, and inorganic acids include hydrochloric acid, phosphoric acid, sulfuric acid, nitric acid and the like. These acids are contained in an amount of 0.01 to 40% by weight, preferably 0.2 to 2 with respect to the aqueous solution.
It suffices to add it in a proportion of 0% by weight.

【0018】また、この際に用いられる有機溶媒として
は、メタノール、エタノール、イソプロピルアルコール
などの低級アルコール類や、アセトン、N,N−ジメチ
ルホルムアミドなどの水と混和させることのできるもの
である。
As the organic solvent used at this time, lower alcohols such as methanol, ethanol and isopropyl alcohol, and water such as acetone and N, N-dimethylformamide can be mixed.

【0019】本発明の表面処理剤で銅あるいは銅合金の
表面を処理する条件としては、処理剤の液温を約20℃
〜60℃、接触時間を1秒ないし10分間の範囲が適当
である。接触方法は、浸漬、噴霧、塗布などである。
The condition for treating the surface of copper or copper alloy with the surface treating agent of the present invention is that the temperature of the treating agent is about 20.degree.
Appropriately, the contact time is from 1 second to 10 minutes at -60 ° C. The contact method includes dipping, spraying, coating and the like.

【0020】本発明の表面処理剤に使用に際して、金属
表面における化成被膜の形成速度を高めるために銅化合
物を添加してもよく、また形成された化成被膜の耐熱性
を向上させるために亜鉛化合物を添加してもよい。
When used in the surface treatment agent of the present invention, a copper compound may be added to increase the rate of formation of a chemical conversion coating on a metal surface, and a zinc compound may be added to improve the heat resistance of the formed chemical conversion coating. May be added.

【0021】前記の方法において使用できる銅化合物の
代表的なものとしては、塩化第一銅、塩化第二銅、水酸
化銅、リン酸銅、酢酸銅、硫酸銅、硝酸銅、臭化銅等で
あり、また亜鉛化合物の代表的なものとしては、酸化亜
鉛、蟻酸亜鉛、酢酸亜鉛、蓚酸亜鉛、乳酸亜鉛、クエン
酸亜鉛、硫酸亜鉛、硝酸亜鉛、リン酸亜鉛等であり、い
ずれも水溶液に対して0.01〜10重量%の割合、好ま
しくは0.02〜5重量%の割合で添加すれば良い。
Typical copper compounds that can be used in the above method are cuprous chloride, cupric chloride, copper hydroxide, copper phosphate, copper acetate, copper sulfate, copper nitrate, copper bromide and the like. Further, typical examples of the zinc compound include zinc oxide, zinc formate, zinc acetate, zinc oxalate, zinc lactate, zinc citrate, zinc sulfate, zinc nitrate, zinc phosphate, etc. On the other hand, 0.01 to 10% by weight, preferably 0.02 to 5% by weight may be added.

【0022】このように、銅化合物あるいは亜鉛化合物
を用いる場合には、有機酸あるいは無機酸の他にアンモ
ニアあるいはアミン類等の緩衝作用を有する物質を添加
して溶液のpHを安定にすることが望ましい。また本発
明方法の実施においては、化成被膜上に熱可塑性樹脂の
二重構造を形成し、耐熱性を向上させることも可能であ
る。
As described above, when using a copper compound or a zinc compound, it is possible to stabilize the pH of the solution by adding a substance having a buffering action such as ammonia or amines in addition to the organic acid or the inorganic acid. desirable. Further, in carrying out the method of the present invention, it is also possible to form a double structure of a thermoplastic resin on the chemical conversion film to improve heat resistance.

【0023】即ち銅あるいは銅合金の表面に2−(シク
ロヘキシルアルキル)ベンズイミダゾール化合物の化成
被膜を形成したのち、ロジン、ロジンエステル等のロジ
ン誘導体、テルペン樹脂、テルペンフェノール樹脂等の
テルペン樹脂誘導体または芳香族炭化水素樹脂、脂肪族
炭化水素樹脂、脂環族炭化水素樹脂等の炭化水素樹脂あ
るいはこれらの混合物等からなる耐熱性に優れた熱可塑
性樹脂をトルエン、酢酸エチル、IPA等の溶媒に溶解
し、ロールコーター法等により化成被膜上に膜厚1〜30
μmの厚みになるように均一に塗布して化成被膜と熱可
塑性樹脂の二層構造を形成すれば良い。
That is, after forming a conversion coating of a 2- (cyclohexylalkyl) benzimidazole compound on the surface of copper or a copper alloy, a rosin derivative such as rosin or rosin ester, a terpene resin derivative such as a terpene resin or a terpene phenol resin, or an aroma. A thermoplastic resin having excellent heat resistance composed of a hydrocarbon resin such as an aromatic hydrocarbon resin, an aliphatic hydrocarbon resin, an alicyclic hydrocarbon resin or a mixture thereof is dissolved in a solvent such as toluene, ethyl acetate or IPA. , 1 to 30 on the chemical conversion film by roll coater method, etc.
The two-layer structure of the chemical conversion coating and the thermoplastic resin may be formed by uniformly coating the coating so as to have a thickness of μm.

【0024】[0024]

【作用】銅あるいは銅合金の表面に有効成分として2−
(シクロヘキシルアルキル)ベンズイミダゾール化合物
を含有する水溶液系表面処理剤を接触させると、2−
(シクロヘキシルアルキル)ベンズイミダゾール化合物
と銅との錯体形成反応及び2−(シクロヘキシルアルキ
ル)ベンズイミダゾール化合物間の水素結合とファンデ
ルワールス力の両作用により、局部的に銅錯体となった
2−(シクロヘキシルアルキル)ベンズイミダゾール化
合物の化成被膜が銅あるいは銅合金表面上に形成され
る。
[Function] As an active ingredient on the surface of copper or copper alloy, 2-
When an aqueous surface treatment agent containing a (cyclohexylalkyl) benzimidazole compound is brought into contact,
2- (Cyclohexylalkyl) was locally converted to a copper complex by the complex formation reaction of the (cyclohexylalkyl) benzimidazole compound with copper and the hydrogen bond between the 2- (cyclohexylalkyl) benzimidazole compound and the Van der Waals force. A conversion coating of an alkyl) benzimidazole compound is formed on the copper or copper alloy surface.

【0025】前記の化成被膜を放置あるいは加熱するこ
とにより銅表面から銅の移行が起こり、2−(シクロヘ
キシルアルキル)ベンズイミダゾール化合物の大部分は
2−(シクロヘキシルアルキル)ベンズイミダゾール化
合物の銅錯体になる。前記の銅錯体からなる化成被膜
は、熱的にもまた化学的にも安定であり、下地の銅ある
いは銅合金を高温に曝すことによる酸化、また長期放置
による錆の発生から保護しうるものである。
When the above chemical conversion coating is left standing or heated, copper is transferred from the copper surface, and most of the 2- (cyclohexylalkyl) benzimidazole compound becomes a copper complex of the 2- (cyclohexylalkyl) benzimidazole compound. .. The chemical conversion coating consisting of the above copper complex is stable both thermally and chemically, and can protect the underlying copper or copper alloy from oxidation due to exposure to high temperatures and from rust due to long-term storage. is there.

【0026】[0026]

【実施例】以下、実施例及び比較例によって、本発明方
法を具体的に説明する。なお、これらの試験において金
属表面における化成被膜の厚さは、所定の大きさの銅試
験片を0.5%の塩酸水溶液に浸漬して、2−(シクロヘ
キシルアルキル)ベンズイミダゾール化合物を抽出し、
紫外分光光度計を用いて、この抽出液中に含まれる2−
(シクロヘキシルアルキル)ベンズイミダゾール化合物
の濃度を測定し、化成被膜の厚さに換算したものであ
る。
EXAMPLES The method of the present invention will be specifically described below with reference to Examples and Comparative Examples. In these tests, the thickness of the chemical conversion coating on the metal surface was determined by immersing a copper test piece of a predetermined size in a 0.5% hydrochloric acid aqueous solution to extract a 2- (cyclohexylalkyl) benzimidazole compound,
Using an ultraviolet spectrophotometer, 2-
The concentration of the (cyclohexylalkyl) benzimidazole compound was measured and converted into the thickness of the chemical conversion film.

【0027】また、はんだ濡れ時間の測定は、テストピ
ースとして5mm×50mm× 0.3mmの大きさの銅板または真
鍮板を用い、テストピースは脱脂してソフトエッチング
したのち、各処理剤による浸漬処理をしてテストピース
表面に化成被膜を形成し、各所定条件で放置し、テスト
ピースを加熱処理したのち、ポストフラックス(商品
名:「JS−64」、(株)弘輝製)に浸漬付着させ、
はんだ濡れ時間を測定した。測定に当たっては、半田濡
れ性試験器(「SAT2000」、(株)レスカ製)を用
い、その測定条件は半田温度 250℃、浸漬深さ2mm、浸
漬スピード16mm/秒とした。
The solder wetting time was measured by using a copper plate or a brass plate having a size of 5 mm × 50 mm × 0.3 mm as a test piece. The test piece was degreased, soft-etched, and then dipped with each treatment agent. After that, a chemical conversion film is formed on the surface of the test piece, and the test piece is allowed to stand under each predetermined condition, and after the test piece is heat-treated, it is dipped and attached to Postflux (trade name: "JS-64", manufactured by Hiroki Co., Ltd.),
The solder wetting time was measured. In the measurement, a solder wettability tester (“SAT2000”, manufactured by Reska Co., Ltd.) was used, and the measurement conditions were a solder temperature of 250 ° C., an immersion depth of 2 mm, and an immersion speed of 16 mm / sec.

【0028】銅板のテストピースを脱脂、ソフトエッチ
ング、水洗し、これを表1に示した組成からなる表面処
理剤に所定の温度で、それぞれ所定の時間浸漬した後、
取り出し水洗、乾燥し、テストピースの表面にそれぞれ
0.25μmの化成被膜を形成した。被膜形成処理がな
されたテストピースは表1に示した条件で放置した後、
さらに加熱処理し、その後のはんだ濡れ時間を測定し
た。加熱処理は、120℃の熱風オーブンで5分間及び
215℃の蒸気相(スリーエム社製「フロリナートFC
−70」)で5分間それぞれ加熱する操作を交互に3回
ずつ繰り返す方法を用いた。
A test piece of a copper plate was degreased, soft-etched, washed with water, and immersed in a surface treatment agent having the composition shown in Table 1 at a predetermined temperature for a predetermined time.
It was taken out, washed with water and dried to form a 0.25 μm chemical conversion coating on the surface of each test piece. After leaving the test piece subjected to the film formation treatment under the conditions shown in Table 1,
Further heat treatment was performed, and the solder wetting time thereafter was measured. The heat treatment was performed in a hot air oven at 120 ° C. for 5 minutes and at a vapor phase of 215 ° C.
-70 "), the operation of heating each for 5 minutes was alternately repeated three times.

【0029】(実施例1)テストピースを表面処理剤が
2−(シクロヘキシルアルキル)ベンズイミダゾール
0.50重量%、ギ酸0.75重量%及び酢酸銅0.0
6重量%から成る水溶液に、液温50℃で180秒間浸
漬した後、取り出し水洗、乾燥した。その後表1に示す
条件で放置し、加熱処理を行なった結果、はんだ濡れ性
の測定結果は表1に示すとおりであった。
Example 1 A test piece was treated with a surface treatment agent containing 2- (cyclohexylalkyl) benzimidazole (0.50% by weight), formic acid (0.75% by weight) and copper acetate (0.0%).
After dipping in a 6 wt% aqueous solution for 180 seconds at a liquid temperature of 50 ° C., it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0030】(実施例2)テストピースを表面処理剤が
2−(シクロヘキシルメチル)ベンズイミダゾール0.
50重量%及びギ酸1.25重量%から成る水溶液に、
液温50℃で300秒間浸漬した後、取り出し水洗、乾
燥した。その後表1に示す条件で放置し、加熱処理を行
なった結果、はんだ濡れ性の測定結果は表1に示すとお
りであった。
(Example 2) The test piece was treated with 2- (cyclohexylmethyl) benzimidazole (0.1%) as the surface treatment agent.
In an aqueous solution consisting of 50% by weight and 1.25% by weight formic acid,
After immersing at a liquid temperature of 50 ° C. for 300 seconds, it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0031】(実施例3)テストピースを表面処理剤が
2−(2−シクロヘキシルエチル)ベンズイミダゾール
0.50重量%、ギ酸4.0重量%及び酢酸銅0.06
重量%から成る水溶液に、液温40℃で160秒間浸漬
した後、取り出し水洗、乾燥した。その後表1に示す条
件で放置し、加熱処理を行なった結果、はんだ濡れ性の
測定結果は表1に示すとおりであった。
(Example 3) The test piece of the test piece was treated with 0.5-wt% of 2- (2-cyclohexylethyl) benzimidazole, 4.0 wt% of formic acid and 0.06 of copper acetate.
After dipping for 160 seconds at a liquid temperature of 40 ° C. in an aqueous solution of wt%, it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0032】(実施例4)テストピースを表面処理剤が
2−(3−シクロヘキシルブロピル)ベンズイミダゾー
ル0.50重量%、ギ酸4.5重量%及び酢酸銅0.0
6重量%から成る水溶液に、液温40℃で160秒間浸
漬した後、取り出し水洗、乾燥した。その後表1に示す
条件で放置し、加熱処理を行なった結果、はんだ濡れ性
の測定結果は表1に示すとおりであった。
Example 4 The test piece was treated with a surface treatment agent containing 2- (3-cyclohexylbropyr) benzimidazole (0.50% by weight), formic acid (4.5% by weight) and copper acetate (0.0%).
After immersing in a 6 wt% aqueous solution at a liquid temperature of 40 ° C. for 160 seconds, it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0033】(実施例5)テストピースを表面処理剤が
2−(4−シクロヘキシルブチル)ベンズイミダゾール
0.50重量%、ギ酸17.5重量%及び酢酸銅0.0
6重量%から成る水溶液に、液温40℃で12秒間浸漬
した後、取り出し水洗、乾燥した。その後表1に示す条
件で放置し、加熱処理を行なった結果、はんだ濡れ性の
測定結果は表1に示すとおりであった。
Example 5 A test piece was treated with a surface treatment agent containing 2- (4-cyclohexylbutyl) benzimidazole (0.50% by weight), formic acid (17.5% by weight) and copper acetate (0.0%).
After dipping in a 6 wt% aqueous solution for 12 seconds at a liquid temperature of 40 ° C., it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0034】(実施例6)テストピースを表面処理剤が
2−(5−シクロヘキシルペンチル)ベンズイミダゾー
ル0.20重量%、ギ酸19.0重量%及び酢酸銅0.
06重量%から成る水溶液に、液温30℃で16秒間浸
漬した後、取り出し水洗、乾燥した。その後表1に示す
条件で放置し、加熱処理を行なった結果、はんだ濡れ性
の測定結果は表1に示すとおりであった。
Example 6 A test piece was treated with a surface treatment agent of 0.20% by weight of 2- (5-cyclohexylpentyl) benzimidazole, 19.0% by weight of formic acid and 0.1% of copper acetate.
It was immersed in an aqueous solution of 06 wt% at a liquid temperature of 30 ° C. for 16 seconds, taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0035】(実施例7)テストピースを表面処理剤が
2−(6−シクロヘキシルヘキシル)ベンズイミダゾー
ル0.30重量%、塩酸3.0重量%、塩化第二銅0.
05重量%及びイソプロパノール10.0重量%から成
る水溶液に、液温40℃で45秒間浸漬した後、取り出
し水洗、乾燥した。その後表1に示す条件で放置し、加
熱処理を行なった結果、はんだ濡れ性の測定結果は表1
に示すとおりであった。
Example 7 A test piece was treated with a surface treatment agent of 2- (6-cyclohexylhexyl) benzimidazole 0.30% by weight, hydrochloric acid 3.0% by weight, cupric chloride 0.
It was immersed in an aqueous solution containing 05% by weight and 10.0% by weight of isopropanol at a liquid temperature of 40 ° C. for 45 seconds, taken out, washed with water and dried. Then, the sample was left under the conditions shown in Table 1 and subjected to heat treatment.
It was as shown in.

【0036】(実施例8)テストピースを表面処理剤が
2−(2−シクロヘキシルエチル)−5−メチルベンズ
イミダゾール0.50重量%、ギ酸2.5重量%及び塩
化第二銅0.08重量%から成る水溶液に、液温40℃
で180秒間浸漬した後、取り出し水洗、乾燥した。そ
の後表1に示す条件で放置し、加熱処理を行なった結
果、はんだ濡れ性の測定結果は表1に示すとおりであっ
た。
Example 8 The test piece was treated with a surface treatment agent containing 2- (2-cyclohexylethyl) -5-methylbenzimidazole (0.50% by weight), formic acid (2.5% by weight) and cupric chloride (0.08% by weight). %, An aqueous solution of 40%
After immersing for 180 seconds, the product was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0037】(実施例9)テストピースを表面処理剤が
2−(ジクロヘキシルメチル)−5,6−ジメチルベン
ズイミダゾール0.50重量%、酢酸4.0重量%及び
臭化第二銅0.03重量%から成る水溶液に、液温50
℃で360秒間浸漬した後、取り出し水洗、乾燥した。
その後表1に示す条件で放置し、加熱処理を行なった結
果、はんだ濡れ性の測定結果は表1に示すとおりであっ
た。
(Example 9) The test piece was treated with the surface treatment agent of 2- (dichlorohexylmethyl) -5,6-dimethylbenzimidazole (0.50% by weight), acetic acid (4.0% by weight) and cupric bromide (0.1% by weight). Aqueous solution consisting of 03% by weight, liquid temperature 50
After dipping at 360 ° C. for 360 seconds, it was taken out, washed with water and dried.
After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0039】(実施例10)テストピースを表面処理剤
が2−シクロヘキシル−5−クロロベンズイミダゾール
0.50重量%、酢酸4.0重量%及び塩化亜鉛0.0
4重量%から成る水溶液に、液温50℃で420秒間浸
漬した後、取り出し水洗、乾燥した。その後表1に示す
条件で放置し、加熱処理を行なった結果、はんだ濡れ性
の測定結果は表1に示すとおりであった。
(Example 10) The test piece was treated with a surface treatment agent containing 0.50% by weight of 2-cyclohexyl-5-chlorobenzimidazole, 4.0% by weight of acetic acid and 0.0% of zinc chloride.
After dipping in a 4 wt% aqueous solution at a liquid temperature of 50 ° C. for 420 seconds, it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0040】(比較例1)テストピースを表面処理剤が
2−ウンデシルイミダゾール1.0重量%及び酢酸1.
6重量%から成る水溶液に、液温50℃で25秒間浸漬
した後、取り出し水洗、乾燥した。その後表1に示す条
件で放置し、加熱処理を行なった結果、はんだ濡れ性の
測定結果は表1に示すとおりであった。
(Comparative Example 1) A test piece containing 1.0% by weight of 2-undecylimidazole as a surface treatment agent and 1.
After dipping in a 6 wt% aqueous solution at a liquid temperature of 50 ° C. for 25 seconds, it was taken out, washed with water and dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0041】(比較例2)テストピースを表面処理剤が
2−ペンチルベンズイミダゾール0.35重量%、酢酸
1.0重量%及び酢酸銅0.05重量%から成る水溶液
に、液温50℃で20秒間浸漬した後、取り出し水洗、
乾燥した。その後表1に示す条件で放置し、加熱処理を
行なった結果、はんだ濡れ性の測定結果は表1に示すと
おりであった。
Comparative Example 2 A test piece was immersed in an aqueous solution containing 0.35% by weight of 2-pentylbenzimidazole, 1.0% by weight of acetic acid and 0.05% by weight of copper acetate at a liquid temperature of 50 ° C. After soaking for 20 seconds, take out and wash with water,
Dried. After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

【0042】[0042]

【表1】 [Table 1]

【0043】(実施例11)真鍮板のテストピースを脱
脂、ソフトエッチング、水洗し、実施例3と同じ処理剤
に同一条件で浸漬し、水洗、乾燥したところ厚さ0.2
0μmの化成被膜が形成された。
(Embodiment 11) A test piece of a brass plate was degreased, soft-etched, washed with water, immersed in the same treatment agent as in Example 3 under the same conditions, washed with water and dried to obtain a thickness of 0.2.
A conversion film of 0 μm was formed.

【0044】[0044]

【発明の効果】銅あるいは銅合金を2−(シクロヘキシ
ルアルキル)ベンズイミダゾール化合物を主成分とする
水溶液に浸漬処理することにより、その表面に長期保存
安定性に富み、且つ耐熱性に優れた化成被膜を形成する
ことができるので、プリント配線板の表面実装法におけ
るはんだ付け性を向上することができる。
Effects of the Invention By immersing copper or a copper alloy in an aqueous solution containing a 2- (cyclohexylalkyl) benzimidazole compound as a main component, the surface of the chemical conversion coating film has excellent long-term storage stability and excellent heat resistance. Therefore, the solderability in the surface mounting method of the printed wiring board can be improved.

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成4年8月6日[Submission date] August 6, 1992

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0003[Name of item to be corrected] 0003

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0003】また銅あるいは銅合金の表面にベンズイミ
ダゾール系化合物の化成被膜を形成する方法としては、
5−メチルベンズイミダゾールを用いる処理方法が特開
昭 58-501281号公報に、2−アルキルベンズイミダゾー
ル類を用いる処理方法が特開平4-72072 号、同4-80375
号及び同4-99285 号公報に記載されている。他に、2−
メルカプトベンズイミダゾールを用いる銅又は銅合金の
防錆方法が、特開昭55-83157号、同62-77600号及び同63
-118598 号公報に開示されている。
As a method for forming a chemical conversion coating film of a benzimidazole compound on the surface of copper or copper alloy,
A treatment method using 5-methylbenzimidazole is disclosed in JP-A-58-501281, and a treatment method using 2-alkylbenzimidazoles is disclosed in JP-A-4-72072 and 4-80375.
And 4-99285. Besides, 2-
A method for preventing rust of copper or copper alloy using mercaptobenzimidazole is disclosed in JP-A-55-83157, JP-A-62-77600 and JP-A-63-63600.
-118598 publication.

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0012[Correction target item name] 0012

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0012】本発明方法の実施に適する2−(シクロヘ
キシルアルキル)ベンズイミダゾール化合物としては、
2−シクロヘキシルベンズイミダゾール、2−(シクロ
ヘキシルメチル)ベンズイミダゾール、2−(2−シク
ロヘキシルエチル)ベンズイミダゾール、2−(3−シ
クロヘキシルプロピル)ベンズイミダゾール、2−(4
−シクロヘキシルブチル)ベンズイミダゾール、2−
(5−シクロヘキシルベンチル)ベンズイミダゾール、
2−(6−シクロヘキシルヘキシル)ベンズイミダゾー
ル、2−シクロヘキシル−5−メチルベンズイミダゾー
ル、2−(シクロヘキシルメチル)−5−メチルベンズ
イミダゾール、2−(2−シクロヘキシルエチル)−5
−メチルベンズイミダゾール、2−(3−シクロヘキシ
ルプロピル)−5−メチルベンズイミダゾール、2−
(4−シクロヘキシルブチル)−5−メチルベンズイミ
ダゾール、2−(5−シクロヘキシルペンチル)−5−
メチルベンズイミダゾール、2−(6−シクロヘキシル
ヘキシル)−5−メチルベンズイミダゾール、2−シク
ロヘキシル−5,6−ジメチルベンズイミダゾール、2
−(シクロヘキシルメチル)−5,6−ジメチルベンズ
イミダゾール、2−(2−シクロヘキシルエチル)−
5,6−ジメチルベンズイミダゾール、2−(3−シク
ロヘキシルプロピル)−5,6−ジメチルベンズイミダ
ゾール、2−(4−シクロヘキシルブチル)−5,6−
ジメチルベンズイミダゾール、2−(5−シクロヘキシ
ルペンチル)−5,6−ジメチルベンズイミダゾール、
2−(6−シクロヘキシルヘキシル)−5,6−ジメチ
ルベンズイミダゾール、2−シクロヘキシル−5−クロ
ロベンズイミダゾール、2−(シクロヘキシルメチル)
−5−クロロベンズイミダゾール、2−(シクロヘキシ
ルエチル)−5−クロロベンズイミダゾール、2−(3
−シクロヘキシルプロピル)−5−クロロベンズイミダ
ゾール、2−(4−シクロヘキシルブチル)−5−クロ
ロベンズイミダゾール、2−(5−シクロヘキシルペン
チル)−5−クロロベンズイミダゾール、2−(6−シ
クロヘキシルヘキシル)−5−クロロベンズイミダゾー
ルなどであり、これらの2−(シクロヘキシルアルキ
ル)ベンズイミダゾール化合物は公知の方法で合成する
ことができる。
The 2- (cyclohexylalkyl) benzimidazole compounds suitable for carrying out the method of the present invention include:
2-cyclohexylbenzimidazole, 2- (cyclohexylmethyl) benzimidazole, 2- (2-cyclohexylethyl) benzimidazole, 2- (3-cyclohexylpropyl) benzimidazole, 2- (4
-Cyclohexylbutyl) benzimidazole, 2-
(5-cyclohexylbenzyl) benzimidazole,
2- (6-cyclohexylhexyl) benzimidazole, 2-cyclohexyl-5-methylbenzimidazole, 2- (cyclohexylmethyl) -5-methylbenzimidazole, 2- (2-cyclohexylethyl) -5
-Methylbenzimidazole, 2- (3-cyclohexylpropyl) -5-methylbenzimidazole, 2-
(4-Cyclohexylbutyl) -5-methylbenzimidazole, 2- (5-cyclohexylpentyl) -5-
Methylbenzimidazole, 2- (6-cyclohexylhexyl) -5-methylbenzimidazole, 2-cyclohexyl-5,6-dimethylbenzimidazole, 2
-(Cyclohexylmethyl) -5,6-dimethylbenzimidazole, 2- (2-cyclohexylethyl)-
5,6-Dimethylbenzimidazole, 2- (3-cyclohexylpropyl) -5,6-dimethylbenzimidazole, 2- (4-cyclohexylbutyl) -5,6-
Dimethylbenzimidazole, 2- (5-cyclohexylpentyl) -5,6-dimethylbenzimidazole,
2- (6-cyclohexylhexyl) -5,6-dimethylbenzimidazole, 2-cyclohexyl-5-chlorobenzimidazole, 2- (cyclohexylmethyl)
-5-chlorobenzimidazole, 2- (cyclohexylethyl) -5-chlorobenzimidazole, 2- (3
- cyclohexylpropyl) -5-chloro-benzimidazole, 2- (4 - cyclo hexyl-butyl) -5-chloro-benzimidazole, 2- (5 - cyclo hexyl pentyl) -5-chloro-benzimidazole, 2- (6 - Shi <br/> black hexyl hexyl) and the like 5-chloro-benzimidazole, these 2- (cyclohexyl-alkyl) benzimidazole compound can be synthesized by a known method.

【手続補正3】[Procedure 3]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0037[Name of item to be corrected] 0037

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0037】(実施例9)テストピースを表面処理剤が
2−(クロヘキシルメチル)−5,6−ジメチルベン
ズイミダゾール0.50重量%、酢酸4.0重量%及び
臭化第二銅0.03重量%から成る水溶液に、液温50
℃で360秒間浸漬した後、取り出し水洗、乾燥した。
その後表1に示す条件で放置し、加熱処理を行なった結
果、はんだ濡れ性の測定結果は表1に示すとおりであっ
た。
[0037] (Example 9) Test pieces of the surface treatment agent is 2- (cyclo-hexyl methyl) -5,6-dimethyl benzimidazole 0.50 wt%, acetic acid 4.0 weight% and cupric bromide 0 Aqueous solution consisting of 0.03% by weight, liquid temperature 50
After dipping at 360 ° C. for 360 seconds, it was taken out, washed with water and dried.
After that, the sample was left to stand under the conditions shown in Table 1 and subjected to a heat treatment. As a result, the solder wettability measurement results were as shown in Table 1.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 化1で示される2−(シクロヘキシルア
ルキル)ベンズイミダゾール化合物を有効成分として含
有することを特徴とする銅及び銅合金の表面処理剤。 【化1】 (但し、式中nは0から6までの整数、R1 及びR2
同一又は異なって水素原子、低級アルキル基又はハロゲ
ン原子を表す。)
1. A surface treatment agent for copper and copper alloys, which contains a 2- (cyclohexylalkyl) benzimidazole compound represented by Chemical formula 1 as an active ingredient. [Chemical 1] (However, in the formula, n is an integer from 0 to 6, and R 1 and R 2 are the same or different and represent a hydrogen atom, a lower alkyl group or a halogen atom.)
JP17931392A 1992-06-12 1992-06-12 Surface treating agent for copper and copper alloy Pending JPH05345984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17931392A JPH05345984A (en) 1992-06-12 1992-06-12 Surface treating agent for copper and copper alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17931392A JPH05345984A (en) 1992-06-12 1992-06-12 Surface treating agent for copper and copper alloy

Publications (1)

Publication Number Publication Date
JPH05345984A true JPH05345984A (en) 1993-12-27

Family

ID=16063652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17931392A Pending JPH05345984A (en) 1992-06-12 1992-06-12 Surface treating agent for copper and copper alloy

Country Status (1)

Country Link
JP (1) JPH05345984A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012172154A (en) * 2011-02-17 2012-09-10 Jx Nippon Mining & Metals Corp Copper discoloration preventing solution
EP3677704A1 (en) * 2017-08-28 2020-07-08 Xiamen University Anticorrosion treatment method for copper-containing material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012172154A (en) * 2011-02-17 2012-09-10 Jx Nippon Mining & Metals Corp Copper discoloration preventing solution
EP3677704A1 (en) * 2017-08-28 2020-07-08 Xiamen University Anticorrosion treatment method for copper-containing material
EP3677704A4 (en) * 2017-08-28 2021-08-11 Xiamen University Anticorrosion treatment method for copper-containing material

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