KR102325235B1 - 전자 빔 시스템에서의 수차 정정을 위한 방법 및 시스템 - Google Patents

전자 빔 시스템에서의 수차 정정을 위한 방법 및 시스템 Download PDF

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KR102325235B1
KR102325235B1 KR1020197019547A KR20197019547A KR102325235B1 KR 102325235 B1 KR102325235 B1 KR 102325235B1 KR 1020197019547 A KR1020197019547 A KR 1020197019547A KR 20197019547 A KR20197019547 A KR 20197019547A KR 102325235 B1 KR102325235 B1 KR 102325235B1
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South Korea
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electro
electron beam
deflector assembly
optical system
bin filter
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Korean (ko)
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KR20190085157A (ko
Inventor
신롱 지앙
크리스토퍼 시어스
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케이엘에이 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1508—Combined electrostatic-electromagnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020197019547A 2016-12-07 2017-12-06 전자 빔 시스템에서의 수차 정정을 위한 방법 및 시스템 Active KR102325235B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/371,557 2016-12-07
US15/371,557 US10090131B2 (en) 2016-12-07 2016-12-07 Method and system for aberration correction in an electron beam system
PCT/US2017/064958 WO2018106833A1 (en) 2016-12-07 2017-12-06 Method and system for aberration correction in electron beam system

Publications (2)

Publication Number Publication Date
KR20190085157A KR20190085157A (ko) 2019-07-17
KR102325235B1 true KR102325235B1 (ko) 2021-11-10

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KR1020197019547A Active KR102325235B1 (ko) 2016-12-07 2017-12-06 전자 빔 시스템에서의 수차 정정을 위한 방법 및 시스템

Country Status (7)

Country Link
US (1) US10090131B2 (https=)
EP (1) EP3552222A4 (https=)
JP (2) JP2019537228A (https=)
KR (1) KR102325235B1 (https=)
CN (1) CN110036456B (https=)
TW (1) TWI743262B (https=)
WO (1) WO2018106833A1 (https=)

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KR102662658B1 (ko) 2019-03-27 2024-05-03 에이에스엠엘 네델란즈 비.브이. 멀티빔 검사 장치에서 2차 빔의 정렬을 위한 시스템 및 방법
KR102857915B1 (ko) * 2020-07-20 2025-09-11 주식회사 히타치하이테크 에너지 필터, 및 그것을 구비한 에너지 애널라이저 및 하전 입자빔 장치
WO2022135842A1 (en) 2020-12-22 2022-06-30 Asml Netherlands B.V. Electron optical column and method for directing a beam of primary electrons onto a sample
WO2023017107A1 (en) * 2021-08-13 2023-02-16 Eldico Scientific Ag Charged-particle beam device for diffraction analysis
US11791128B2 (en) * 2021-10-13 2023-10-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method of determining the beam convergence of a focused charged particle beam, and charged particle beam system
US12165831B2 (en) 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US12283453B2 (en) 2022-06-01 2025-04-22 Kla Corporation Creating multiple electron beams with a photocathode film
US20250112017A1 (en) * 2023-09-30 2025-04-03 Kla Corporation Imaging thousands of electron beams during workpiece inspection
US20250357066A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Electron beam metrology having a source energy spread with filtered tails
US20250357067A1 (en) * 2024-05-17 2025-11-20 Kla Corporation Aberration corrector for scanning electron microscope with multiple electron beams

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JP2002367552A (ja) * 2001-06-12 2002-12-20 Hitachi Ltd 荷電粒子線装置
US20160329189A1 (en) * 2015-05-08 2016-11-10 Kla-Tencor Corporation Method and System for Aberration Correction in an Electron Beam System

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JPS61240553A (ja) * 1985-04-18 1986-10-25 Jeol Ltd イオンビ−ム描画装置
JP2821153B2 (ja) * 1988-11-24 1998-11-05 株式会社日立製作所 荷電粒子線応用装置
KR19980079377A (ko) * 1997-03-25 1998-11-25 요시다쇼이치로 하전립자선 전사장치
US6452175B1 (en) * 1999-04-15 2002-09-17 Applied Materials, Inc. Column for charged particle beam device
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JP2002367552A (ja) * 2001-06-12 2002-12-20 Hitachi Ltd 荷電粒子線装置
US20160329189A1 (en) * 2015-05-08 2016-11-10 Kla-Tencor Corporation Method and System for Aberration Correction in an Electron Beam System

Also Published As

Publication number Publication date
JP7194849B2 (ja) 2022-12-22
WO2018106833A1 (en) 2018-06-14
KR20190085157A (ko) 2019-07-17
CN110036456B (zh) 2022-04-05
EP3552222A4 (en) 2020-07-22
TW201833969A (zh) 2018-09-16
JP2022058942A (ja) 2022-04-12
US10090131B2 (en) 2018-10-02
US20180158644A1 (en) 2018-06-07
JP2019537228A (ja) 2019-12-19
EP3552222A1 (en) 2019-10-16
TWI743262B (zh) 2021-10-21
CN110036456A (zh) 2019-07-19

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