KR102320333B1 - Manufacturing Method for Middle or Large-sized Ceramic Parts of Plasma Enhanced Chemical Vapor Deposition Equipment and Middle or Large-sized Ceramic Parts - Google Patents

Abstract

The present invention relates to a method for manufacturing middle to large-sized ceramic parts for plasma enhanced chemical vapor deposition equipment and middle to large-sized ceramic parts for plasma enhanced chemical vapor deposition equipment manufactured by the same, comprising: (A) a step of designing a middle to large-sized ceramic part; (B) a step of molding a ceramic material to produce a ceramic molded body; (C) a step of thermally treating the ceramic molded body to manufacture a ceramic sintered body; and (D) a step of grinding the ceramic sintered body by using a grinder. The grinder comprises a grinder main body; a support assembly; a grinding wheel; an in-processing dressing part; and a cooling water spray part. According to the present invention, middle to large-sized ceramic parts for plasma-enhanced chemical vapor deposition equipment having desired dimensions and shapes can be easily manufactured with excellent quality, and problems such as chipping, cracking, and fracture which occur frequently during processing of workpieces can be eliminated.

Description

Manufacturing method for medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment and medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment manufactured thereby -sized Ceramic Parts}

The present invention relates to a method for manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition (hereinafter referred to as 'PECVD') equipment, and to a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment manufactured by the method, and more particularly, to A method for manufacturing medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment that enables easy production and high-quality production of medium-to-large ceramic parts having dimensions and shapes, and medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment manufactured thereby will be.

In general, PECVD (Plasma Enhanced Chemical Vapor Deposition) is a chemical vapor deposition process that deposits a thin film in a solid state on a substrate in a gaseous state (vapor), and is one of the core deposition methods used in the semiconductor manufacturing process. .

In order to perform such a PECVD method, PECVD equipment is essentially used. PECVD equipment performs a process of depositing a thin film device for display on a glass substrate through a chemical reaction during the LCD and OLED manufacturing process, which is a high vacuum maintenance auxiliary chamber. It includes a Load Lock Chamber, a Transfer Chamber that transfers a glass substrate, and a Process Chamber that deposits chemicals on the glass substrate.

Here, the process chamber includes core parts such as a center shaft and a susceptor, which must have sufficient rigidity for stable operation of equipment and are parts that require high processing precision for precision. .

However, in the prior art, in the production of medium and large-sized parts used in PECVD equipment, mechanical strength and processing precision cannot be increased. As this occurs, there is a problem that only the unit price increases.

In addition, in the prior art, when producing medium-to-large-sized parts used in PECVD equipment, polishing processing is performed for precision processing, and dressing processing is performed to remove particle residues of the workpiece fused to the surface of the polishing wheel side according to the polishing processing. In the past, the dressing was performed entirely by hand.

In addition, when medium-to-large parts for conventional PECVD equipment are applied and used in the field, serious problems such as chipping, cracks, or fractures occur, and interference with other assembly parts used in mutual assembly There was a problem that this occurred.

Furthermore, in the prior art, when processing or manufacturing medium-to-large parts for PECVD equipment, even in processing equipment or manufacturing equipment used, chipping or cracking in areas that are in contact with parts due to long-time compressive stress due to equipment use, etc. This causes various processing defects, which is a factor that causes delay in delivery, an increase in unit price, and deterioration of the properties of parts.

Accordingly, most of the medium and large-sized parts for PECVD equipment depend on imports from overseas companies, so technology development and improvement for localization are urgently required.

Republic of Korea Patent Publication No. 10-2053894 Republic of Korea Patent Publication No. 10-2095159 Republic of Korea Patent Publication No. 10-2020-0052876

The present invention has been devised in consideration of solving the above-mentioned problems of the prior art, and is a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment that can easily manufacture medium-to-large ceramic components having desired dimensions and shapes and produce excellent quality. An object of the present invention is to provide a manufacturing method and a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment manufactured thereby.

The present invention enables abrasive machining to be performed without the need to separate the abrasive wheel and the workpiece from the abrasive machine during the abrasive machining operation, and at the same time also performs the dressing work, thereby automating the traditional manual dressing work. It can dramatically reduce the working time according to the overall abrasive processing, and prevent chipping or cracking due to operator carelessness when separating the workpiece from the grinding machine for the dressing operation. Problems such as chipping, cracking, and fracture that occur when applied to the field can be eliminated because the difference in the polishing environment (which causes stress accumulation and surface level difference in the workpiece) deteriorates characteristics such as compressive strength and flexural strength of the workpiece. An object of the present invention is to provide a method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment and to provide a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment manufactured thereby.

Plasma reinforcement to improve the problem of chipping or cracks on the part side in contact with the equipment due to frictional vibration and long-time compressive stress according to the use of the used processing equipment or manufacturing equipment, etc., resulting in processing defects An object of the present invention is to provide a method for manufacturing a medium-to-large ceramic component for chemical vapor deposition equipment and a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment manufactured thereby.

The present invention makes it possible to localize medium and large-sized parts for PECVD equipment, which have been entirely dependent on imports from foreign companies, and to eliminate the factors of delay in delivery, increase in unit price, and deterioration of parts characteristics that have occurred in the past. An object of the present invention is to provide a method for manufacturing a medium to large-sized ceramic component for equipment and a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment manufactured thereby.

A method for manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment according to the present invention for achieving the above object, comprises the steps of: (A) designing to secure the desired dimensions and shape of the medium to large-sized ceramic component for final completion; (B) manufacturing a ceramic molded body having a predetermined shape and dimensions by molding a ceramic material based on the design; (C) manufacturing a ceramic sintered body by heat-treating the ceramic compact; (D) after mounting the ceramic sintered body on a polishing machine, polishing the surface of the ceramic sintered body using a polishing wheel to have the dimensions and shape referenced in the design; a grinding main body having a headstock and a tailstock facing each other and spaced apart while maintaining a distance; a support assembly having both ends fixedly coupled to the headstock and tailstock of the polishing main body and horizontally disposed to set the ceramic sintered body, which is a medium-large ceramic structure, as a workpiece and to provide support; a polishing wheel for polishing the surface of the ceramic sintered body fixedly arranged and supported on the polishing main body through the support assembly and provided to be movable and installed to rotate; an in-processing dressing unit for continuously and automatically performing a dressing process for removing particle residues of the ceramic sintered body fused to the outer peripheral surface of the abrasive wheel during abrasive processing; and a coolant spraying unit for spraying coolant to the abrasive processing portion of the abrasive wheel.

Here, the In-Processing Dressing unit is installed and spaced so as to face the surface of the polishing wheel, and a jig body installed so as to be movable in a position is connected and assembled to the jig body and a pair provided to fasten and fix the dressing stick. Dressing stick mounting jig having a fastening member of; It may include; a dressing stick which is fixed and protruded to the fastening member of the dressing stick mounting jig and plays a role in removing the particle debris of the ceramic sintered body fused to the outer circumferential surface of the abrasive wheel.

Here, the dressing stick mounting jig may be made of S45C or SM45C, which is carbon steel for mechanical structure, and the dressing stick may be made of stone.

Here, the support assembly includes: a first buffer block made of a polymer-based material in which one side is fixedly coupled to the headstock of the polishing main body, the other side is exposed, and a first fastening hole having an internal thread is formed; a second buffer block made of a polymer-based material having one side fixedly coupled to the tailstock of the polishing main body, the other side disposed exposed, and having a second fastening hole having an internal thread; The first and second buffer blocks are provided to support them by fastening and assembly, and a metal shaft having external threads formed on both ends thereof; includes, wherein the first buffer block and the second buffer block have excellent dimensions It is made of polyoxymethylene, which is wear-resistant and highly rigid while exhibiting stability, and the ceramic sintered body is inserted and disposed to be located on the outside of the metal shaft, and both ends are inserted into the first buffer block and the second buffer block. Support coupling and fixed arrangement may be provided.

Here, the surfaces of the first buffer block and the second buffer block that provide mutual adhesion and support by inserting the ceramic sintered body are worn on the surfaces of the first and second buffer blocks during long-term polishing on the side of the ceramic sintered body. You can attach diamond sandpaper to prevent it from becoming dirty.

Here, the ceramic material may be alumina (Al ₂ O ₃ ).

Here, in the step (B), the ceramic compact is manufactured by 120% to 130% larger than the actual size of the ceramic part for final completion by a CIP (Cold Isostatic Pressing) method or a SLIP CASTING method; In the step (C), the ceramic sintered body is manufactured as a sintered body that is 105% to 110% larger than the actual size of the ceramic component for final completion; Through the grinding process in step (D), it can be processed into a real size having a desired size and shape.

Here, the abrasive wheel is provided with a large number of dedicated abrasive wheels for each shape for machining the curved surface and groove shape of the ceramic sintered body, and is selected and used for each machining part. Center (MCT) can be used.

In addition, the medium and large-sized ceramic parts for plasma enhanced chemical vapor deposition equipment according to the present invention for achieving the above object is characterized in that it is manufactured by the manufacturing method having the above-described manufacturing process.

According to the present invention, medium and large-sized ceramic parts having desired dimensions and shapes can be easily and stably manufactured and manufactured with excellent quality.

According to the present invention, it is possible to perform abrasive machining while performing abrasive machining without separating the abrasive wheel and the workpiece from the abrasive machine during the abrasive machining operation. It is possible to drastically reduce the working time due to abrasive processing, and it is possible to prevent chipping or cracking due to operator negligence when separating the workpiece from the grinding machine for the dressing operation. The difference (which causes stress accumulation and surface level difference in the workpiece) deteriorates characteristics such as compressive strength and flexural strength of the workpiece, so that problems such as chipping, cracking, and fracture that occurred when applied to the field can be eliminated.

According to the present invention, it is possible to improve the problem that machining defects are caused by chipping or cracks on the part side in contact with the equipment due to frictional vibration and long-time compressive stress due to the use of the used processing equipment or manufacturing equipment. In addition, it is possible to localize medium and large-sized parts for PECVD equipment, which are dependent on imports from foreign companies, and eliminate the factors of delay in delivery, increase in unit price, and deterioration of characteristics of parts that have occurred in the past.

1 is a process flow chart showing a method of manufacturing a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment according to an embodiment of the present invention.
FIG. 2 is a block diagram showing a polishing machine used in a method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment according to an embodiment of the present invention; FIG.
3 is a configuration diagram illustrating an in-processing dressing unit used in a method of manufacturing a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment according to an embodiment of the present invention.
4 is a cross-sectional configuration diagram illustrating a support assembly used in a method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment according to an embodiment of the present invention.

Preferred embodiments of the present invention will be described with reference to the accompanying drawings, and the purpose and configuration of the present invention and its features will be better understood through such detailed description.

As shown in FIGS. 1 to 4, the method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment according to an embodiment of the present invention includes a design step (S10), a forming step (S20), a sintering step (S30), and polishing It consists of a configuration including a processing step (S40), a primary polishing step (S50), an MCT processing step (S60), and a secondary polishing step (S70).

The design step (S10) is a step of designing to secure a desired size and shape for a medium-to-large sized ceramic part to be finally completed.

The design step ( S10 ) is a step of modeling as a 3D work as well as a 2D work, and a process design for machining may be performed together through a shape analysis of the designed 3D modeling.

The forming step (S20) is a step of forming a ceramic material based on the design to manufacture a ceramic compact having a predetermined shape and dimensions.

The ceramic material may be alumina (Al ₂ O ₃ ).

The ceramic compact is manufactured by 120% to 130% larger than the actual size of the ceramic part for final completion by a CIP (Cold Isostatic Pressing) method or a SLIP CASTING method.

At this time, in the SLIP CASTING method, a ceramic molded body can be manufactured using a PVHSC (Pressure-Vacuum Hybrid Slip Casting) method.

The ceramic compact may be referred to as a ceramic structure having a tubular structure.

The sintering step (S30) is a step of manufacturing the ceramic sintered body by heat-treating the ceramic compact.

The ceramic sintered body is manufactured by 105% to 110% larger than the actual size of a medium-to-large ceramic component for final completion through high-temperature firing.

In the polishing processing step (S40), the ceramic sintered body 1 is mounted on the abrasive machine 100, and then the surface of the ceramic sintered body is polished to have the dimensions and shape based on the design by using the polishing wheel 130. is a step

Here, as shown in FIGS. 2 to 4, the polishing machine 100 has a main body ( 110), and both ends are fixedly coupled to the headstock 111 and the tailstock 112 of the abrasive main body 110 to be horizontally disposed. A support assembly 120 to provide In-Processing Dressing for continuously and automatically performing a dressing process for removing the particle residues of the installed abrasive wheel 130 and the fused ceramic sintered body on the outer circumferential surface of the abrasive wheel 130 during abrasive machining. It is provided to include a part 140 and a coolant spraying part 150 for spraying coolant to the abrasive processing portion of the abrasive wheel 130 .

The headstock 111 and the tailstock 112 on the side of the polishing main body 110 are provided so as to be rotatable in the same direction.

The support assembly 120 is a first buffer block made of a polymer-based material in which one side is fixedly coupled to the headstock 111 on the side of the polishing main body 110, the other side is exposed, and a first fastening hole having an internal thread is formed ( 121), a second buffer block 122 made of a polymer-based material, in which one side is fixedly coupled to the tailstock 112 on the polishing main body 110 side, the other side is exposed, and a second fastening hole having an internal thread is formed; , The first cushioning block 121 and the second cushioning block 122 are provided to support them by being fastened and assembled, and include a metal shaft 123 having external threads formed at both ends.

At this time, it is preferable that the first buffer block 121 and the second buffer block 122 are made of polyoxymethylene, which is an engineering plastic having physical properties of abrasion resistance and high rigidity while exhibiting excellent dimensional stability.

Here, in the state where the ceramic sintered body is inserted and disposed to be located outside the metal shaft 123, both ends are inserted and fitted into the first buffer block 121 and the second buffer block 122 to support coupling and fixed arrangement. .

Here, one end of the metal shaft 123 is disposed through the first fastening hole on the first buffer block 121 side.

That is, the support assembly 120 has a strong adhesion to the ceramic sintered body as a workpiece through the first buffer block 121 and the second buffer block 122, and the first buffer block ( 121) and the second buffer block 122, it is possible to completely transmit the rotational power of the grinding machine to the ceramic sintered body, which is a workpiece, and it is possible to withstand even the frictional force on the side of the rotating grinding wheel 130, and stable grinding processing is performed. support you to do it.

In addition, the first buffering block 121 and the second buffer block 122, which provide mutual adhesion and support by inserting and fitting the ceramic sintered body, are in contact with the surfaces of the ceramic sintered body on the polishing machine for a long period of time during polishing. It is desirable to have a configuration for attaching the diamond sandpaper 124 in order to prevent the surfaces of the block 121 and the second buffer block 122 from being easily worn.

Using the support assembly 120 having such a configuration, in particular, by using the first buffer block 121 and the second buffer block 122 made of polyoxymethylene, which is an engineering plastic, a ceramic structure as a ceramic structure. It is possible to suppress chipping and cracks that occurred in the ceramic sintered body when the sintered body is polished, and through this, the delivery date can be shortened, the defect rate can be lowered, and the economical additional effect that can reduce the manufacturing cost can be obtained.

The in-processing dressing unit 140 is installed and spaced to face the surface (outer peripheral surface) of the polishing wheel 130, and the jig body 141a installed so as to be movable on the polishing main body 110 and the It includes a dressing stick mounting jig 141 connected to the jig body 141a and having a pair of fastening members 141b provided to fasten and fix the dressing stick 142.

In addition, as being fastened and fixed to the fastening member 141b of the dressing stick mounting jig 141 and arranged to protrude, the front end surface of the abrasive wheel 130 serves to substantially remove the particle debris of the fused ceramic sintered body to the outer circumferential surface. Includes a dressing stick 142 responsible for the.

The dressing stick mounting jig 141 is preferably made of S45C or SM45C, which is carbon steel for mechanical structure, and the dressing stick 142 is preferably made of stone such as a grindstone.

The dressing stick mounting jig 141 may be provided at the lower side of the ceramic sintered body 1 set on the polishing main body 110 using the support assembly 120 so as not to contact each other, and to modify the installation state or It will be said that transformation can be made.

Through the in-processing dressing unit 140 having such a configuration, there is no need to separate the ceramic sintered body as a workpiece from the polishing machine, only the position of the dressing stick mounting jig 141 is moved toward the polishing wheel 130, and polishing It can provide the advantage of being able to perform both the processing operation and the dressing operation at the same time.

Accordingly, compared to the existing dressing operation, the overall polishing processing time can be dramatically reduced, and chipping or cracking caused by operator negligence, which has occurred a lot in the past, can be prevented. It is possible to solve the problem of defects such as chipping, cracking, and fracture that occurred when applied to the field because the difference in the environment (which causes stress accumulation and surface level difference of the object to be polished) deteriorates the characteristics such as compressive strength and flexural strength of the object to be polished. have.

Through the abrasive processing step (S40), the outer surface may be processed to a real size having a desired size and shape, thereby completing a medium-to-large ceramic part.

Here, the abrasive wheel 130 is preferably provided with a plurality of dedicated abrasive wheels for each shape for processing the curved surface and the groove shape on the side of the ceramic sintered body to be selectively used for each processing part.

The first polishing step (S50) is a step of polishing to remove the marks on the polishing wheel 130 side after performing the polishing processing step (S40).

In the first polishing step (S50), it is preferable to perform a manual operation primarily using sand paper, and then perform secondary polishing using an electric grinder.

In this case, when using the electric grinder, it is preferable to perform the wheel mark removal operation of the grinding wheel while applying the diamond powder to the grinding pad of the electric grinder.

Here, it is preferable to sequentially apply diamond powder from large particles to gradually smaller particles, for example, #400 (1st) → #800 (2nd) → #3000 (3rd) sequentially can do.

The MCT processing step (S60) is a step of performing finishing processing on the dimensions and shape of the bottom surface, inner diameter, angle, and length finishing, etc., using an MCT machine for the workpiece after the first polishing step (S50) is performed. .

The secondary polishing step (S70) is a step of polishing after completing the MCT processing step (S60) to remove the electrodeposited wheel mark by the MCT processing.

The secondary polishing step (S70) may be performed under the same conditions and methods as the above-described primary polishing step (S50).

The medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment manufactured through the manufacturing method having the above-described manufacturing process are a tube including a center shaft or a side shaft used in a chamber for PECVD equipment. It may be a part of a body structure.

Accordingly, through the manufacturing method having the above-described manufacturing process, medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment having desired dimensions and shapes can be easily manufactured and manufactured with excellent quality, and chipping, which is frequently generated during processing of workpieces, can be manufactured. , Crack, Fracture, etc. can be provided with the advantage of eliminating problems.

The embodiments described above are only to describe preferred embodiments of the present invention and are not limited to these embodiments, and various modifications and variations by those skilled in the art within the spirit and claims of the present invention Or it will be said that the substitution of steps may be made, and this will be said to be within the scope of the technical rights of the present invention.

100: grinding machine 110: grinding main body
120: support assembly 121: first buffer block
122: second buffer block 123: metal shaft
124: diamond sandpaper 130: abrasive wheel
140: In-Processing Dressing unit 141: Dressing stick mounting jig
142: dressing stick 150: coolant injection unit
200: tool dynamometer

Claims (9)

(A) designing to secure a desired dimension and shape for a medium-to-large-sized ceramic part for final completion; (B) manufacturing a ceramic molded body having a predetermined shape and dimensions by molding a ceramic material based on the design; (C) manufacturing a ceramic sintered body by heat-treating the ceramic compact; (D) after mounting the ceramic sintered body in a polishing machine, polishing the surface of the ceramic sintered body using a polishing wheel to have dimensions and shapes based on the design; includes,
The polishing machine includes: a polishing main body having a headstock and a tailstock facing each other and spaced apart from each other while maintaining a predetermined distance at both ends; a support assembly for setting and supporting the ceramic sintered body, which is a medium-large ceramic structure, as a work piece, as both end portions are fixedly coupled to the headstock and tailstock of the polishing main body and horizontally disposed; a polishing wheel for polishing the surface of the ceramic sintered body fixedly arranged and supported on the polishing main body through the support assembly, which is provided to be movable in position and installed to rotate; an in-processing dressing unit for continuously and automatically performing a dressing process for removing particle residues of the ceramic sintered body fused to the outer peripheral surface of the abrasive wheel during abrasive processing; a coolant spraying unit for spraying coolant to the abrasive processing portion of the polishing wheel; including,
The support assembly includes: a first buffer block made of a polymer-based material in which one side is fixedly coupled to the headstock of the polishing main body, the other side is exposed, and a first fastening hole having an internal thread is formed; a second buffer block made of a polymer-based material having one side fixedly coupled to the tailstock of the polishing main body, the other side disposed exposed, and having a second fastening hole having an internal thread; A metal shaft provided to support them by fastening and assembling the first and second cushioning blocks, and having external threads formed at both ends; includes,
The first buffer block and the second buffer block are made of polyoxymethylene, which is abrasion resistance and high rigidity while exhibiting excellent dimensional stability,
The ceramic sintered body is a medium-large type for plasma-enhanced chemical vapor deposition equipment, characterized in that both ends are inserted and fitted into the first and second buffer blocks in a state where they are inserted and disposed to be located on the outside of the metal shaft, thereby supporting coupling and fixed arrangement. Method for manufacturing ceramic parts. The method of claim 1,
The In-Processing Dressing unit,
A dressing stick having a jig body that is installed and spaced so as to face the surface of the polishing wheel and is installed so as to be movable on the polishing machine, and a pair of fastening members connected to the jig body and provided to fasten and fix the dressing stick. Jig;
a dressing stick which is fastened and protruded to the fastening member of the dressing stick mounting jig, and serves to remove the particle debris of the ceramic sintered body fused to the outer circumferential surface of the abrasive wheel; A method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment comprising a. 3. The method of claim 2,
The dressing stick mounting jig is made of S45C or SM45C, which is carbon steel for mechanical structure,
The dressing stick is a method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment, characterized in that made of stone. delete The method of claim 1,
The surface of the first buffer block and the second buffer block providing mutual adhesion and support by inserting the ceramic sintered body into the surface of the ceramic sintered body to prevent the surfaces of the first buffer block and the second buffer block from being abraded during long-term polishing A method of manufacturing medium-to-large ceramic parts for plasma-enhanced chemical vapor deposition equipment, characterized in that diamond sandpaper is attached to it. The method of claim 1,
The ceramic material is alumina (Al ₂ O ₃ ) Method of manufacturing a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment, characterized in that. The method of claim 1,
In the above (B), the ceramic formed body,
CIP (Cold Isostatic Pressing) method or SLIP CASTING method to produce a molded body 120% to 130% larger than the actual size of the ceramic part for final completion;
In the step (C), the ceramic sintered body is
Produced with a sintered body 105% to 110% larger than the actual size of the ceramic part for final completion;
A method of manufacturing a medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment, characterized in that it is processed into an actual size having a desired dimension and shape through the polishing process in step (D). The method of claim 1,
The abrasive wheel is provided with a large number of dedicated abrasive wheels for each shape for processing the curved surface and groove shape of the ceramic sintered body, and is selected and used for each processing part,
The ceramic sintered body side bottom surface and inner diameter, angle and length finishing machining method of manufacturing a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment, characterized in that using a machining center (MCT). A medium-to-large ceramic component for plasma-enhanced chemical vapor deposition equipment, characterized in that it is manufactured by the method for manufacturing a medium-to-large ceramic component for plasma enhanced chemical vapor deposition equipment according to any one of claims 1 to 3 and 5 to 8.

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