KR102284404B1 - Fine Metal Mask manufacturing system and method - Google Patents

Abstract

Disclosed are a system and a method for manufacturing a fine metal mask (FMM) which can uniformly form pattern holes on a mask sheet when manufacturing a fine metal mask (FMM) for manufacturing a high-resolution OLED display panel. The system for manufacturing a fine metal mask comprises: a roll sheet rolled in a roll shape, and having photoresist formed on both sides thereof; a roll sheet supply unit supplying the roll sheet to a first process line in which an etching process is carried out; a first etching unit provided on one side of the first process line, and carrying out an etching process on a first surface which is one surface of the roll sheet; and a second etching unit carrying out an etching process on a second surface which is the other surface of the roll sheet. Pattern holes of the photoresist are arranged and formed without any change in the X position while the change in the Y position becomes larger as the X coordinate increases from the center coordinate positioned at the center of the photoresist.

Description

Fine Metal Mask manufacturing system and method

The present invention relates to an apparatus and method for manufacturing a fine metal mask, and more particularly, to a fine metal mask (FMM) for manufacturing a high-resolution OLED (Organic Light Emitting Diodes) display panel. A fine metal mask manufacturing system and method for allowing pattern holes to be uniformly formed.

As a technology for forming pixels in the OLED manufacturing process, the FMM (Fine Metal Mask) method is mainly used to deposit an organic material at a desired location by attaching a thin metal mask to the substrate.

In order to manufacture a mask through the mask manufacturing system, the mask sheet, which is the raw material of the mask, must go through several processes in stages to manufacture the mask.

Among various processes for manufacturing the mask, an etching process for forming pattern holes on the mask sheet may be included. A simultaneous surface etching process can be applied.

However, when a pattern hole is formed by performing a simultaneous etching process on both surfaces, the etching defect rate is very high due to a structural or method limitation. For example, in a metal plate of 1 sheet, pattern holes according to the etching process are not uniformly generated and there may be a problem that deviation occurs.

In the case of ultra-high-definition OLED, the current QHD image quality is 500-600 PPI (pixel per inch) with a pixel size of about 30-50 μm, and 4K UHD and 8K UHD high-definition are higher than this: ~860 PPI, ~1600 PPI, etc. has a resolution of As such, it is necessary to reduce the alignment error between cells by several μm in consideration of the pixel size of the ultra-high-definition OLED, and an error outside of this may lead to product failure, and thus the yield may be very low.

Accordingly, there is a need for a mask manufacturing system capable of reducing the etching defect rate while increasing the productivity of the fine metal mask.

As a related prior patent document, there is Republic of Korea Patent Publication No. 10-2018-0127257 (published on November 28, 2018), which discloses a multi-structured ultra-fine metal mask having a frame sheet and a manufacturing method thereof. is described.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a system and method for manufacturing a fine metal mask so that pattern holes can be uniformly formed on a mask sheet when manufacturing a fine metal mask (FMM) for manufacturing a high-resolution OLED display panel.

A fine metal mask manufacturing system according to an embodiment of the present invention for achieving the above object, the roll sheet wound in a roll (roll) shape, photoresist is formed on both sides of the roll sheet (roll sheet); a roll sheet supply unit for supplying the roll sheet to a first process line in which an etching process is performed; a first etching unit provided on one side of the first process line and performing an etching process on a first surface that is one surface of the roll sheet; and a second etching unit for performing an etching process on a second surface, which is the other surface of the roll sheet, wherein the pattern holes of the photoresist have larger X coordinates based on the central coordinates located at the center of the photoresist. A fine metal mask manufacturing system that is formed with a larger change in the Y position and no change in the X position.

The reinforcing adhesive material having higher interfacial adhesion with the photoresist than the fine metal plate may be applied to both surfaces of the fine metal plate.

The pattern of the through-holes in the fine metal plate is not formed along the bending curvature of the fine metal plate bonded to the photoresist, but along imaginary lines parallel to the imaginary line in the center of the fine metal plate. It may be uniformly formed at regular intervals.

The pattern holes of the photoresist, based on the central coordinates in the center of the photoresist, according to the following Equation, the change in the Y position increases as the X coordinate increases, and the pattern holes in the photoresist may be arranged without a change in the X position.

Here, y represents the Y position, α represents the target inclination (bending angle), x represents the X position, and c represents the value of the Y-intercept (target bending value).

The reinforcing adhesive material may include: a filler made of particles having a size of 2 nm to 500 nm; and a binder for fixing the filler.

The adhesive force between the reinforcing adhesive material and the photoresist may be 1.5 kgf/in to about 2.5 kgf/in.

The adhesive force between the reinforcing adhesive material and the micrometal plate may be 2.0 kgf/in to about 3.0 kgf/in.

On the other hand, the method for manufacturing a fine metal mask according to an embodiment of the present invention for achieving the above object is a method for manufacturing a fine metal mask for forming a pattern of through holes in a fine metal plate, (a) providing the fine metal plate ; (b) applying a reinforcing adhesive material to both sides of the fine metal plate (Coating); (c) adhering a photoresist on both sides of the fine metal plate by the reinforcing adhesive material; (d) forming pattern holes in the photoresist positioned on both sides of the fine metal plate; and (e) forming a pattern of the through holes in the fine metal plate by introducing an etching solution into the pattern holes of the photoresist and etching the fine metal plate, wherein in step (d) The pattern holes of the photoresist are formed in a manner that the Y position increases as the X coordinate increases with respect to the central coordinate located at the center of the photoresist, and is arranged without a change in the X position.

In the step (b), the reinforcing adhesive material having higher interfacial adhesion with the photoresist than that of the fine metal plate is applied to both surfaces of the fine metal plate, a method of manufacturing a fine metal mask.

In the step (d), pattern holes may be formed in the photoresist by exposure and development of a photo mask, or pattern holes may be formed by using a laser direct imaging method.

In the step (e), the pattern of the through holes is not formed along the bending curvature of the fine metal plate adhered to the photoresist, but is parallel to the imaginary line in the center of the fine metal plate. A method of manufacturing a fine metal mask, which is uniformly formed at regular intervals along the

In step (d), the pattern holes of the photoresist are arranged without a change in the X position, as the X coordinate increases according to the following equation, based on the central coordinate in the center of the photoresist. A method of manufacturing a fine metal mask, which is formed by being

Here, y represents the Y position, α represents the target inclination (bending angle), x represents the X position, and c represents the value of the Y-intercept (target bending value).

The reinforcing adhesive material may include: a filler made of particles having a size of 2 nm to 500 nm; and a binder for fixing the filler.

The present invention can prevent the arrangement of the through-holes for the fine metal mask from becoming significantly non-uniform so that they are uniformly formed during manufacturing.

The fine metal mask manufacturing system 100 according to the present invention can lead to mass production of the fine metal mask 10, and in particular, it can significantly reduce the etching defect rate by separating the etching process for both surfaces and proceeding individually. can

The system 100 for manufacturing a fine metal mask according to the present invention performs several processes on a first process line (a) for etching one side of the fine metal mask and a second process line (b) for etching the other side of the fine metal mask. It is possible to automatically manufacture the fine metal mask 10 through sequential steps.

In addition, due to the action of the reinforcing adhesive material, as the amount of the etching solution penetrating into the interface between the fine metal plate and the photoresist in the metal etching step is reduced, the degree of non-uniform additional etching may be reduced. That is, as the arrangement of the through holes becomes more uniform, deposition precision may be improved.

1A is a view showing a plan view of a fine metal mask manufactured by the system for manufacturing a fine metal mask according to an embodiment of the present invention.
1B is a view showing a plan view of a fine metal mask manufactured before applying the fine metal mask manufacturing system according to an embodiment of the present invention.
1C is a diagram illustrating an example of correcting the arrangement of pattern holes in a photoresist according to an embodiment of the present invention.
2 is a schematic configuration diagram of a system for manufacturing a fine metal mask according to an embodiment of the present invention.
3 is a block diagram of a system for manufacturing a fine metal mask according to an embodiment of the present invention.
FIG. 4 is an enlarged view of the area of the tape laminating unit for etching resistance shown in FIG. 3 .
FIG. 5 is an enlarged view of the first etching unit shown in FIG. 3 .
6 is an enlarged view of the functional specific non-water washing unit area shown in FIG. 3 .
FIG. 7 is an enlarged view of the area of the tape peeling unit for etching resistance shown in FIG. 3 .
FIG. 8 is an enlarged view of the area of the etching resistor application unit shown in FIG. 3 .
9 is an enlarged view of the roll sheet cutting unit area shown in FIG.
FIG. 10 is an enlarged view of the second etching unit shown in FIG. 3 .
11 is a diagram illustrating an operation flowchart for explaining a method of manufacturing a fine metal mask according to an embodiment of the present invention.
12 is a configuration diagram illustrating a configuration of a reinforcing adhesive material for bonding a fine metal mask and a photoresist according to an embodiment of the present invention.
13 illustrates an arrangement state of pattern holes formed after photoresist exposure of a fine metal mask according to an embodiment of the present invention.

Advantages and features of the present invention, and methods for achieving them, will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be embodied in various different forms, only this embodiment allows the disclosure of the present invention to be complete, and common knowledge in the technical field to which the present invention belongs It is provided to fully inform the possessor of the scope of the invention, and the present invention is only defined by the scope of the claims. Accordingly, in some embodiments, well-known process steps, well-known device structures, and well-known techniques have not been specifically described in order to avoid obscuring the present invention. Like reference numerals refer to like elements throughout.

In order to clearly express various layers and regions in the drawings, the thicknesses are enlarged. Throughout the specification, like reference numerals are assigned to similar parts. When a part of a layer, film, region, plate, etc. is said to be “on” another part, it includes not only cases where it is “directly on” another part, but also cases where there is another part in between. Conversely, when we say that a part is "just above" another part, we mean that there is no other part in the middle. Also, when a part of a layer, film, region, plate, etc. is said to be “under” another part, it includes not only the case where the other part is “directly under” but also the case where there is another part in between. Conversely, when we say that a part is "just below" another part, it means that there is no other part in the middle.

Spatially relative terms "below", "beneath", "lower", "above", "upper", etc. It can be used to easily describe a correlation between an element or components and other elements or components. Spatially relative terms should be understood as terms including different orientations of the device during use or operation in addition to the orientation shown in the drawings. For example, when an element shown in the figures is turned over, an element described as "beneath" or "beneath" another element may be placed "above" the other element. Accordingly, the exemplary term “below” may include both directions below and above. The device may also be oriented in other orientations, and thus spatially relative terms may be interpreted according to orientation.

In the present specification, when a part is said to be connected to another part, it includes not only a case in which it is directly connected, but also a case in which it is electrically connected with another element interposed therebetween. In addition, when it is said that a part includes a certain component, this means that other components may be further included, rather than excluding other components, unless otherwise stated.

In this specification, terms such as first, second, third, etc. may be used to describe various components, but these components are not limited by the terms. The above terms are used for the purpose of distinguishing one component from other components. For example, without departing from the scope of the present invention, the first component may be referred to as a second or third component, and similarly, the second or third component may also be alternately named.

Unless otherwise defined, all terms (including technical and scientific terms) used herein may be used with the meaning commonly understood by those of ordinary skill in the art to which the present invention belongs. In addition, terms defined in a commonly used dictionary are not to be interpreted ideally or excessively unless clearly specifically defined.

Hereinafter, with reference to the accompanying drawings, a metal support-based all-solid-state composite electrode according to a preferred embodiment of the present invention, a manufacturing method thereof, and an all-solid-state secondary battery having the same will be described in detail as follows.

1A is a view showing a plan view of a fine metal mask manufactured by the system for manufacturing a fine metal mask according to an embodiment of the present invention, and FIG. 1B is a view showing a plan view of a fine metal mask manufacturing system according to an embodiment of the present invention It is a view showing a plan view of a fine metal mask, FIG. 1C is a view showing an example of correcting the arrangement of pattern holes of a photoresist according to an embodiment of the present invention, FIG. 2 is a fine metal mask according to an embodiment of the present invention It is a schematic configuration diagram of a manufacturing system, FIG. 3 is a configuration diagram of a fine metal mask manufacturing system according to an embodiment of the present invention, and FIG. 4 is an enlarged view of the area of the tape laminating unit for etching resistance shown in FIG. 5 is an enlarged view of the first etching unit shown in FIG. 3 , FIG. 6 is an enlarged view of the functional specific gravity washing unit area shown in FIG. 3 , and FIG. 7 is an etching resistance tape peeling unit area shown in FIG. 3 . is an enlarged view of, FIG. 8 is an enlarged view of the area of the etching resistor application unit shown in FIG. 3, FIG. 9 is an enlarged view of the area of the roll sheet cutting unit shown in FIG. 3, and FIG. It is an enlarged view of the second etching unit.

Referring to these drawings, the fine metal mask manufacturing system 100 according to an embodiment of the present invention can lead to mass production of the fine metal mask 10 , and in particular, the etching process for both surfaces is separated and individually By proceeding, the etching defect rate can be significantly reduced.

The system 100 for manufacturing a fine metal mask according to an embodiment of the present invention that can provide such an effect sequentially performs various processes on the first process line (a) and the second process line (b) as shown in FIG. The metal mask 10 can be automatically manufactured.

For reference, although the first process line (a) and the second process line (b) are separated in FIG. 3 , these lines may form a unified inline. Accordingly, FIGS. 2 and 3 are merely illustrative of one of the embodiments according to the present invention, and are not limited thereto, and the scope of the present invention is not limited to the shape of the drawings.

However, hereinafter, for convenience, a line for performing a primary etching process on the roll sheet 30 through the first etching unit 150 is referred to as a first process line (a), and a unit through the second etching unit 270 is referred to as a first process line (a). A line for performing a secondary etching process on the sheet 20 will be referred to as a second process line (b) and separately described.

Of course, many units or devices for the etching process other than the first etching unit 150 and the second etching unit 270 may be provided in the first process line (a) and the second process line (b).

Prior to a detailed description of a system for manufacturing a fine metal mask according to an embodiment of the present invention, the structure of the fine metal mask 10 will be briefly described with reference to FIG. 1A .

Referring to FIG. 1A , the fine metal mask 10 manufactured by the system 100 for manufacturing a fine metal mask according to an embodiment of the present invention is a mask sheet formed by cutting a predetermined region from a unit sheet 20 to be described later. (11) and a plurality of mask pattern portions 12 formed on the mask sheet 11 may be included.

One side of the mask sheet 11 may be used as a clamping part within the facility when the mask 10 is put into the process facility.

The mask pattern part 12 is a part formed on the mask sheet 11 by an etching process to be described later. Although the figure shows the fine metal mask 10 in which a plurality of mask pattern portions 12 are formed, a single mask pattern portion 12 may be formed on the mask sheet 11 .

In addition, unlike the drawings, several lines of mask pattern portions 12 may be formed on the mask sheet 11 , all of which should fall within the scope of the present invention.

A plurality of pattern holes 13 are formed in the mask pattern unit 12 to pass a deposition material during a deposition process of a substrate used as a display such as a mobile phone, particularly an OLED substrate.

The plurality of pattern holes 13 of the fine metal mask 10 manufactured by the system 100 for manufacturing a fine metal mask according to an embodiment of the present invention are spaced at regular intervals along imaginary lines parallel to the imaginary line in the center of the fine metal plate. is formed uniformly with

In addition, in the embodiment of the present invention, all of the pattern holes 13 formed on the mask pattern part 12 may have the same rectangular shape. Of course, since the pattern hole 13 may be changed to a polygon, a circle, an oval, etc., the scope of the present invention is not limited to the shape of the drawing.

In order to manufacture such a fine metal mask 10, in particular, mass-produce it in a continuous method, a fine metal mask manufacturing system having a structure as shown in FIG. 3 is provided.

However, before the system 100 for manufacturing a fine metal mask according to an embodiment of the present invention is applied, the pattern holes formed in the fine metal mask are not uniformly formed as shown in FIG. 1B, and variations occur.

That is, in the fine metal mask manufactured by the existing fine metal mask manufacturing system, the metal plate is bent as bending (deflection) occurs due to gravity when the photoresist (PR) is exposed during the roll-to-roll process. Accordingly, in the fine metal mask, as shown in FIG. 1B , a plurality of pattern holes are not uniformly formed along the curved curvature of the fine metal plate, but deviations occur.

However, in the plurality of pattern holes 13 of the fine metal mask 10 manufactured by the system 100 for manufacturing a fine metal mask according to an embodiment of the present invention, the fine metal plate is not formed by gravity during exposure, and the fine metal plate is not formed. It is formed uniformly at regular intervals along the imaginary lines parallel to the imaginary line at the center of

Accordingly, in the embodiment of the present invention, the pattern holes of the photo resist (PR) are formed uniformly at regular intervals as shown in the plan view of FIG. 1A in the fine metal mask. Correction is performed to have an arrangement opposite to the pattern holes of the fine metal mask shown in Fig.

That is, as shown in FIG. 1C for the pattern holes of the photoresist, based on the central coordinate at the center of the photoresist, according to Equation 1 below, as the X coordinate increases, the change in the Y position increases, and the change in the X position increases. It is formed to be arranged without change. Such correction is referred to as bending correction in the present invention. 1C is a diagram illustrating an example of correcting the arrangement of pattern holes in a photoresist according to an embodiment of the present invention. Accordingly, when the etchant is introduced into the pattern hole of the photoresist PR in a state in which the photoresist PR having the arrangement of the pattern holes corrected in this way is applied to the roll sheet 30 of the fine metal mask 10, FIG. 1A is shown in FIG. It is possible to obtain a fine metal mask having a plurality of uniform pattern holes as shown.

In Equation 1, y represents the Y position, α represents the target inclination (bending angle), x represents the X position, and c represents the value of the Y-intercept (target bending value).

On the other hand, when pattern holes having an arrangement opposite to that of FIG. 1B, that is, as shown in FIG. 1C, are formed in the fine metal mask, the pattern holes of the photoresist are opposite to the pattern holes of the fine metal mask in the same way. It is to expose and develop the photoresist so that it has an arrangement. That is, when the pattern holes of the fine metal mask are formed along the curvature of the fine metal plate as shown in FIG. 1C , based on the central coordinates in the center so that the pattern holes are arranged with respect to the photoresist as shown in FIG. 1B, according to Equation 1 As the X coordinate increases, the change in the Y position increases, and exposure and development are performed so that they are arranged and formed without a change in the X position.

In the above-described embodiment, the pattern hole of the photoresist PR is formed by exposure and development through a photo mask, but the present invention is not limited thereto, and the pattern hole is formed by using a laser direct imaging method. It can be carried out so that they are formed. Hereinafter, an example in which pattern holes are formed in the photoresist PR by exposure and development of the photomask will be described.

As described above, by proceeding to the following process in a state in which the photoresist (PR) having the arrangement of the pattern holes corrected is applied to the roll sheet 30, the arrangement of the pattern holes is arranged at regular intervals as shown in FIG. 1A. A uniform fine metal mask can be manufactured.

As mentioned above, in the first process line (a) and the second process line (b) constituting the fine metal mask manufacturing system, in addition to the first etching unit 150 and the second etching unit 270 , many units or Devices are provided, and the fine metal mask 10 of good quality can be mass-produced through their organic mechanisms.

However, since the structure of the fine metal mask manufacturing system of FIG. 3 is rather complicated, in order to help understanding, only some key components among the components constituting the fine metal mask manufacturing system of FIG. 3 are extracted and schematically created with reference to FIG. 2 A schematic structure and operation of a fine metal mask manufacturing system according to an embodiment of the present invention will be briefly described.

Referring to FIG. 2 , the fine metal mask manufacturing system 100 according to an embodiment of the present invention is a roll sheet 30 formed by being wound in a roll shape for mass production of the fine metal mask 10 . sheet) is used.

The roll sheet 30 means that a metal, for example, a thin plate-shaped metal made of an invar material is wound in a roll shape as shown in FIG. 2A . For reference, invar is an alloy of 63.5% iron and 36.5% nickel added with a small coefficient of thermal expansion.

A photoresist PR is formed on both surfaces of the roll sheet 30 made of an invar material. Photoresist (PR) refers to a polymer resin that causes a chemical change when irradiated with light. A photoresist is called a negative type photoresist, where the polymer resin is insolubilized only in the portion exposed to light, leaving a photoresist, and a positive type photoresist is referred to as a positive type photoresist when the polymer solubilizes only the portion exposed to light. The photoresist PR may be pre-coated on both surfaces of the roll sheet 30 .

In addition, as shown in FIG. 1C , as the X coordinate of each pattern hole increases according to Equation 1, the change in the Y position increases, and the change in the X position, based on the central coordinate in the center, as shown in FIG. 1C . It can be formed to be arranged without.

In addition, as shown in FIG. 1B , the change in the Y position of the photoresist PR increases as the X coordinate of each pattern hole increases according to Equation 1 based on the central coordinate (0, 0) at the center. , may be formed to be arranged without changing the X position.

The roll sheet supply unit 110 supplies the roll sheet 30 to a first process line in which an etching process is performed.

The first etching unit 150 is provided on one side of the first process line, and an etching process is performed on the first surface, which is one surface of the roll sheet.

The second etching unit 270 performs an etching process on the second surface, which is the other surface of the roll sheet 30 .

In order to manufacture the fine metal mask 10 using the roll sheet 30 as described above, an etching resistance tape 33 is attached to one side of the roll sheet 30 as shown in FIG. 2 (b), That is, it may be laminated.

The etching resistance tape 33 serves to resist etching so that etching does not proceed on the surface on which the etching resistance tape 33 is laminated. In an embodiment of the present invention, the etching resistance tape 33 may be an Ultraviolet Ray (UV) tape 13 .

The roll sheet 30 on which the etching resistance tape 33 is laminated is introduced into the first etching unit 150 as shown in FIG. 2C . Then, the first surface, which is one surface of the roll sheet 30 , is etched through the first etching unit 150 . In other words, approximately half of the cross section of the roll sheet 30 is etched and cut into a groove shape.

As is known in the art, etching (or etching process) means eroding a metal or semiconductor such as the roll sheet 30 according to an embodiment of the present invention, and the roll sheet 30 not covered with a photoresist (PR). ) (pattern holes in the photoresist) are removed with a chemical, that is, an etchant (etchant). In the case of the embodiment of the present invention, since the etching resistance tape 13 is previously laminated on the second surface of the roll sheet 30 , the second surface of the roll sheet 30 during the etching process through the first etching unit 150 . The face region is not etched and only the first face, which is one face of the roll sheet 30 , is etched.

After the roll sheet 30 on which the first surface is etched is taken out from the first etching unit 150, it is inverted as shown in FIG. 2(d). That is, in the drawing, it is turned over so that the etched first surface is placed on top.

Then, an etching resistance agent 14 is applied to the etched first surface region as shown in (e) of FIG. 2 . Since the first surface of the roll sheet 30 has already been etched and, for example, a half-section has been dug in the form of a groove, it is difficult to laminate the above-described etch-resisting tape 33 here. Therefore, instead of the etching resistance tape 33 as shown in FIG. 2E , the etching resistance agent 14 having the same function is applied.

After the etching resistance agent 14 is applied to the etched first surface area of the roll sheet 30 , the roll sheet 30 is cut to form a unit sheet 20 of a unit size, and then a second etching unit An etching process is performed on the second surface region that has not yet been etched through 270 .

At this time, since the unit sheet 20 cut to the unit size is very thin and thin, transport may not be smooth. ) is transferred. The carrier 50 is made of a glass material, and is laminated with the unit sheet 20 to transfer the unit sheet 20 to the second etching unit 270 and a rear process thereof.

As such, the unit sheet 20 laminated to the carrier 50 is introduced into the second etching unit 270 as shown in FIG. 2(f). The second surface, which is the remaining surface of the unit sheet 20 , is etched through the second etching unit 270 . In other words, the remaining half of the cross section of the unit sheet 20 is etched to form a pattern hole 13 (refer to FIG. 1 ). Hereinafter, the pattern hole 13 of the fine metal mask 10 may be referred to as a 'through hole(s) pattern' to distinguish it from the pattern hole of the photoresist PR.

After the pattern hole 13 is formed through the so-called secondary etching through the second etching unit 270, the etching resistor 14 and the photoresist PR remaining buried in the unit sheet 20 are removed, Then, the unit sheet 20 is separated from the carrier 50 while a certain portion is cut, so that the fine metal mask 10 may be finally manufactured.

The simple structure and operation of the fine metal mask manufacturing system described above are extracted from only a core part of the components constituting the actual fine metal mask manufacturing system of FIG. 3, and in order to substantially implement the fine metal mask manufacturing system, a roll Means for transferring the sheet 30 , means for removing the etching resistance tape 33 , means for washing the roll sheet 30 or unit sheet 20 before and after etching, and the roll sheet 30 for the unit sheet 20 ), means for removing the etch-resistor 14 and the photoresist (PR), etc., several components must be placed on the system first process line to work organically with the surrounding components. Accordingly, a practical detailed structure of a fine metal mask manufacturing system according to an embodiment of the present invention and other operations and methods thereof will be described below with reference to FIGS. 3 to 6 .

Referring to FIG. 3 , the mask manufacturing system according to the present embodiment largely includes a first process line (a) for performing a primary etching process on a roll sheet 30 through a first etching unit 150 , and a second A second process line (b) for performing a secondary etching process on the unit sheet 20 through the second etching unit 270 is included. As mentioned above, the first process line (a) and the second process line (b) may be a unified in-line that is not separated.

Hereinafter, for convenience of description, it will be sequentially described from the front of the first process line (a). In the first process line (a), the roll sheet supply unit 110, the tape laminating unit for etching resistance 120, the pre-etching unit 140, the pre-cleaning and water removal unit 145, 1 An etching unit 150 , a functional non-water washing unit 160 , an etching resistance tape peeling unit 180 , and a roll sheet collecting unit 112 are disposed.

As shown in FIGS. 3 and 4 , the roll sheet supply unit 110 applies a roll sheet 30 (refer to FIG. 2 ) formed by winding in a roll shape for manufacturing the fine metal mask 10 . It is supplied to the first process line (a) in which the differential etching process is performed.

A first roll sheet driving roller 101 (refer to FIG. 7 ) and a plurality of roll sheet guide rollers 103 so that the roll sheet 30 is unwound through the roll sheet supply unit 110 and supplied to the first process line a ) is provided.

The first roll sheet driving roller 101 is disposed on the first process line a between the roll sheet supply unit 110 and the roll sheet recovery unit 112 as shown in FIG. It serves to drive toward the recovery unit 112 . The first roll sheet driving roller 101 pulls the roll sheet 30 by the driving force of a motor (not shown) and moves it toward the roll sheet collecting unit 112, which is a post-process.

A plurality of roll sheet guide rollers 103 are disposed on the first process line (a), and guide the transport of the roll sheet 30 . The roll sheet guide roller 103 is disposed in various places in both the first process line (a) and the second process line (b) in FIG. 3 to provide tension to the roll sheet 30 while feeding the roll sheet 30 . serves as a guide.

Referring to FIG. 4 , in addition to the roll sheet guide roller 103 , a roll sheet spreading guide 107 for flatly spreading and supplying the roll sheet 30 is provided around the roll sheet supply unit 110 . The roll sheet spreading guide 107 may be applied to the periphery of the roll sheet supply unit 210 after etching in the same manner as in FIG. 8 .

The tape laminating unit 120 for etching resistance is provided behind the process of the roll sheet supply unit 110 . The etching resistance tape laminating unit 120 is disposed between the roll sheet supply unit 110 and the first etching unit 150 , as shown in FIGS. 3 and 4 , and the first surface of the roll sheet 30 . Before the etching process for , tape (refer to FIG. 2) serves to laminating (laminating). The etching resistance tape 33 allows only the first surface, which is one surface of the roll sheet 30 , to be etched through the first etching unit 150 .

In the present embodiment, in the tape laminating unit 120 for etch resistance, the roll sheet 30 is disposed on one side of the first process line (a), and the roll in which the etch resistance tape 33 in the shape of a roll is being transferred. It is applied to the tape laminating unit 120 for etch resistance during transfer, which is continuously supplied to the second side of the sheet 30 for laminating. In this way, a continuous process can be led by laminating the etch-resistance tape 33 on one surface in the process of transferring the roll sheet 30, thereby improving productivity.

The etch-resisting tape laminating unit 120 includes a tape supply roller 121 , a laminating drive roller 122 , a laminating driven roller 123 , a tape transfer roller 124 , and a protective film recovery roller 125 .

The tape supply roller 121 supplies the tape 13 for etching resistance. In the case of an embodiment of the present invention, a roll-shaped etch-resisting tape 33 is used to implement a continuous process.

The laminating driving roller 122 is rotatably disposed on the second surface of the roll sheet 30 , and receives the etching resistance tape 33 supplied from the tape supply roller 121 to receive the second surface of the roll sheet 30 . It acts as a lamination on the surface.

The laminating driven roller 123 is a roller rotatably disposed on the opposite side of the laminating driving roller 122 with the roll sheet 30 interposed therebetween. While the laminating driving roller 122 is operated by a motor or the like, the laminating driven roller 123 may be a freely rotating roller.

The tape transfer roller 124 is disposed between the tape supply roller 121 and the laminating driving roller 122, the etch resistance tape 13 passes through, and the etch resistance tape supplied from the tape supply roller 121 ( 13) serves to transfer the laminating drive roller 122 . Application of the protective film recovery roller 125 may be facilitated by the tape transfer roller 124 .

The protective film recovery roller 125 is disposed adjacent to the tape delivery roller 124 to interact with the tape delivery roller 124, and a protective film ( (not shown) plays a role in recovering. The protective film recovered through the protective film recovery roller 125 is discarded.

The first roll sheet buffer unit 130 , the pre-etching unit 140 , and the pre-cleaning and water removal unit 145 are sequentially disposed behind the process of the etching-resisting tape laminating unit 120 .

The first roll sheet buffer unit 130 is disposed between the etching resistance tape laminating unit 120 and the pre-etching unit 130, as shown in FIGS. 3 and 4, and the etching resistance tape laminating unit 120 ) and the pre-etching unit 130 serves to control the process speed.

As shown in FIG. 3 , the pre-etching unit 140 is disposed between the etch-resisting tape laminating unit 120 and the first etching unit 150 on the first process line a, and the roll sheet 30 . is introduced into the first etching unit 150 and serves to pre-etch the roll sheet 30 before proceeding with the etching process.

The pre-etching unit 140 is provided in the pre-etching tank 141 filled with the etching solution and the pre-etching tank 141 , and the roll sheet 30 is dipped in the etching solution in the pre-etching tank 141 . A plurality of pre-etching guide rollers 142 for guiding the transport of the roll sheet 30 to be discharged may be included.

After the roll sheet 30 has been subjected to the pre-etching unit 140 once, the etching efficiency may be increased by allowing the roll sheet 30 to be etched primarily through the first etching unit 150 . However, in some cases, the pre-etching unit 140 may be omitted in the process. As such, it should be said that the system in which the pre-etching unit 140 is omitted also falls within the scope of the present invention.

As shown in FIG. 3 , the pre-cleaning and water removal unit 145 is disposed between the pre-etching unit 130 and the first etching unit 150 , and washes and drains the roll sheet 30 on which the pre-etching process has been performed. serves to remove Since the roll sheet 30 is light and simply pre-etched by the pre-etching unit 140 , the pre-cleaning and water removal unit 145 is also light and simple to clean.

In an embodiment of the present invention, the pre-cleaning and water remover 145 includes a pre-washer 146 for washing the roll sheet 30 while spraying water toward the roll sheet 30, and a roll sheet ( 30) may include an air knife 147 to remove residual moisture on the surface of the wind. Since the pre-washing and drying unit 145 is similar to some structures of the functional non-water washing unit 160 to be described below, for a detailed description of the pre-washing and drying unit 145, refer to the functional non-specific water washing unit 160 to be described later. Hereinafter, a description thereof will be omitted.

The first etching unit 150 is provided after the pre-cleaning and desiccant 145 process. As shown in FIGS. 2, 3 and 5 , the first etching unit 150 serves to perform an approximately 1/2 etching process on the first surface, which is one surface of the roll sheet 30 .

The first etching unit 150 includes a roll sheet etching cabinet 151 . The roll sheet etching cabinet 151 has a cabinet structure, and a plurality of etching rooms 151a for performing an etching process on the roll sheet 30 are formed therein. The etching rooms 151a communicate with each other.

The roll sheet etching cabinet 151 is provided with a roll sheet lead-in roller unit 152 and a roll sheet take-out roller unit 153 . The roll sheet pulling roller unit 152 is disposed in the entrance area of the roll sheet etching cabinet 151 and serves to draw the roll sheet 30 into the roll sheet etching cabinet 151 . In addition, the roll sheet take-out roller unit 153 is disposed in the exit region of the roll sheet etching cabinet 151 and serves to draw out (discharge) the roll sheet 30 to the outside of the roll sheet etching cabinet 151 .

A plurality of first etchant spray modules 154 are provided in the roll sheet etching cabinet 151 . The first etchant spray modules 154 spray the etchant toward the roll sheet 30 being transported in the roll sheet etching cabinet 151 in a spray manner, and approximately 1/ of the first surface, which is one side of the roll sheet 30 . 2 Let the etching process proceed. Although the second etchant spray module 273 to be described later is also the same, since the plurality of first etchant spray modules 154 spray the etchant in a spray manner, uniformity of the etchant spray can be ensured.

A functional non-water washing unit 160 is provided behind the process of the first etching unit 150 . The functional non-water washing unit 160 is directly connected to the outlet of the first etching unit 150 as shown in FIGS. 3 and 6 , and the etching process is performed using washing water or water mixed with a cleaning agent. It serves to remove the etching solution or foreign material remaining on the completed roll sheet 30 .

This functional non-water washing unit 160 includes a unit cabinet 161, a non-specific water washing module 162, first to third washing modules 167 to 169, and a water removal module 178 on the unit cabinet 161. It has a structure which is mounted integrally. As described above, the non-specific water washing module 162, the first to third washing modules 167 to 169, and the water removal module 178, which have different functions and roles, are mounted on the unit cabinet 161 for each position, so that one functional specific water washing module is installed. When the unit 160 is implemented, there is an advantage in that it is easy to install in the system as well as the position movement is free. Accordingly, the functional non-water washing unit 160 may be easily applied not only to the rear of the process of the first etching unit 150 but also to the rear of the process of the second etching unit 270 as shown in FIG. 3 .

The unit cabinet 161 forms the exterior of the functional non-water washing unit 160 . Since the non-specific water washing module 162, the first to third washing modules 167 to 169, and the water removal module 178 must be mounted in the unit cabinet 161 for each position, the unit cabinet 161 is made of metal with excellent rigidity. made into a frame.

A foot 161a for height adjustment and ground support may be disposed at the lower end of the unit cabinet 161 . On the rear side of the unit cabinet 161, means for supplying the washing water or water mixed with the cleaning agent to the non-specific water washing module 162 and the first to third washing modules 167 to 169 in a fixed quantity and a positive pressure are provided.

A first drain part 179a and a second drain part 179b are provided under the unit cabinet 161 . The first drain part 179a is disposed on one lower side of the unit cabinet 161 , and receives the washing water mixed with the washing agent falling from the non-specific water washing module 162 and drains it. In addition, the second drain part 179b is disposed on the other lower side of the unit cabinet 161, and receives water falling from the first to third flushing modules 167 to 169 to drain it.

The non-specific water washing module 162 is provided on one upper side of the unit cabinet 161 and serves to remove the etching solution remaining on the roll sheet 30 on which the etching process is completed by using the washing water mixed with the cleaning agent. Although the first to third washing modules 167 to 169 and the water removal module 178 are the same, the non-specific washing module 162 has a cabinet or drawer structure. Therefore, it is easy to install or maintain the internal components.

The non-specific water washing module 162 may include a non-specific water washing module housing 163 , a roll sheet transfer unit 164 , an upper pipe unit 165 , a lower pipe unit 166 , and a pipe driving unit 170 .

The non-water washing module housing 163 is an exterior frame having a box-shaped cabinet shape. An inlet 163a into which the roll sheet 30 is introduced is formed at one side of the non-specific water washing module housing 163 . The roll sheet 30 introduced into the inlet 163a passes through the non-specific water washing module 162, the first to third water washing modules 167 to 169, and the water removal module 178 in order, and then the water removal module housing It is discharged to the discharge part 178c of the 178a, and is then directed to the first roll sheet drying unit 105.

The roll sheet transfer unit 164 is disposed in the non-specific water washing module housing 163 and serves to transfer the roll sheet 30 passing through the inlet 163a to the first to third washing modules 167 to 169. . The roll sheet transfer unit 164 formed by a combination of a plurality of rollers and gears (including bevel gears) may be provided in the first to third washing modules 167 to 169 in the same shape.

The upper pipe part 165 is a pipe disposed above the roll sheet transfer part 164 . The upper pipe part 165 is provided with a plurality of upper spray nozzles 165a for downwardly spraying the washing water mixed with the cleaning agent toward the roll sheet 30 being transported by the action of the roll sheet transport part 164 .

The lower pipe part 166 is a pipe disposed under the upper pipe part 165 . A plurality of lower injection nozzles 166a are provided in the lower pipe part 166 to upwardly spray the washing water mixed with the cleaning agent toward the roll sheet 30 being transported by the action of the roll sheet transport part 164 .

On the other hand, the pipe driving unit 170 is connected to the upper pipe part 165 and the lower pipe part 166, and the upper pipe part ( 165) and serves to drive the lower pipe portion 166 in at least one direction. For example, the pipe driving unit 170 may alternately drive the upper pipe unit 165 and the lower pipe unit 166 forward and backward. As such, when the pipe driving unit 170 alternately drives the upper pipe unit 165 and the lower pipe unit 166 forward and backward while the washing water mixed with the washing agent is sprayed onto the roll sheet 30, it is possible to prevent stains from occurring. and can improve the uniformity of washing.

The pipe driving unit 170 is provided in a form in which parts are coupled to the driving housing 171 coupled to one side of the unit cabinet 161 . The pipe driving unit 170 is connected to the upper pipe unit 165 and connected to the upper slider 172 for slidingly driving the upper pipe unit 165 , and is disposed on the driving housing 171 and connected to the upper slider 172 . and an upper sliding plate 173 slidingly moved in the direction in which the upper pipe part 165 is driven, and a lower slider 174 connected to the lower pipe part 166 and slidingly driving the lower pipe part 166; It is disposed on the upper portion of the driving housing 171 and is connected to the lower slider 174 and includes a lower sliding plate 175 that slides in a direction in which the lower pipe part 166 is driven.

In this structure, a slider driving unit 176 is provided in the pipe driving unit 170 to alternately drive the upper slider 172 and the lower slider 174 . The slider driving unit 176 is provided in the driving housing 171 and connected to the upper sliding plate 173 and the lower sliding plate 175, and serves to alternately drive the upper slider 172 and the lower slider 174. do. As such, as the slider driving unit 176 alternately drives the upper slider 172 and the lower slider 174, the upper pipe part 165 and the lower pipe part 166 can be alternately driven back and forth. , since the washing water mixed with the washing agent is sprayed onto the roll sheet 30 through this action, it is possible to improve the uniformity of washing.

The slider driving unit 176 is disposed between the speed reducer 176a and the servomotor 176b for generating power, and the upper sliding plate 173 and the lower sliding plate 175 in the driving housing 171, The rotating shaft 176c connected to the servomotor 176b and rotated by the operation of the servomotor 176b, and the upper cam connected to the upper end of the rotating shaft 176c and rotated in the same manner as the rotating shaft 176c The plate 176d, the upper coupling member 176e coupled to the upper cam plate 176d via the upper long hole 173a of the upper sliding plate 173, and the lower end of the rotating shaft 176c are connected to the rotate A lower cam plate 176f co-rotated with the ting shaft 176c, and a lower coupling member 176g coupled to the lower cam plate 176f via the lower long hole 175a of the lower sliding plate 175. can With this configuration, when the servomotor 176b is operated and the rotating shaft 176c is rotated, the upper cam plate 176d and the lower cam plate 176f are rotated, respectively, so that the upper slider 172 and the lower slider 174 may be alternately driven back and forth.

The first to third water washing modules 167 to 169 are disposed adjacent to the non-specific water washing module 162 on the unit cabinet 161, and use water for the roll sheet 30 that has passed the non-specific water washing module 162. It serves to remove foreign substances remaining on the roll sheet 30 .

In the case of an embodiment of the present invention, three first to third washing modules 167 to 169 may be included. Of course, the scope of the present invention is not limited to the numerical value thereof. The first to third flushing modules 167 to 169 are arranged to be adjacent to each other in the lateral direction, and the spraying strength of water is gradually weakened toward a later process.

All of the first to third flushing modules 167 to 169 are disposed on the upper and lower portions of the flushing module housings 167a to 169a and the roll sheet 30 being transported in the flushing module housings 167a to 169a, and corresponding It may include a plurality of water sprayers (167b ~ 169b) for spraying the water toward the roll sheet 30 in the position. The number of water sprayers 167b to 169b provided in the first to third flushing modules 167 to 169 is different, but the number of water sprayers 167b to 169b provided in the first to third flushing modules 167 to 169 is different. The role is the same. Similar to the non-specific water washing module 162 , since the water sprayers 167b to 169b wash in the form of spraying water, stains do not occur, and it is advantageous to ensure uniformity.

The water removal module 178 is disposed adjacent to the third washing module 169 on the unit cabinet 161 , and remains on the roll sheet 30 with respect to the roll sheet 30 passing through the third washing module 169 . It serves to remove as much water as possible with the wind.

The water removal module 178 is disposed on the upper and lower portions of the water removal module housing 178a and the roll sheet 30 being transported in the water removal module housing 178a, and removes the roll sheet 30 at the corresponding positions. It includes a plurality of air knives (178b, air knife) for jetting straight air toward. Since strong wind (air) is sprayed from the straight outlet of the air knife 178b and directed toward the roll sheet 30 , the remaining water on the roll sheet 30 may be removed.

A first roll sheet drying unit 105 , an etching resistance tape peeling unit 180 , and a roll sheet recovery unit 112 are sequentially disposed behind the functional non-water washing unit 160 .

As shown in FIG. 3 , the first roll sheet drying unit 105 is disposed behind the process of the functional non-specific water washing unit 160 , and passes the functional non-specific water washing unit 160 to wash the roll sheet 30 . It acts as a drying agent. The first roll sheet drying unit 105 may be hot air drying, and the roll sheet 30 passing through the first roll sheet drying unit 105 assumes a state of no moisture.

The etching resistance tape peeling unit 180 is disposed behind the process of the first etching unit 150, as shown in FIGS. 3 and 7, and the etching resistance tape 33 that has been laminated for the first etching process. serves to delaminate. The etching resistance tape peeling unit 180 may include a peeling light irradiator 181 and an etching resistance tape recovery unit 183 .

The peeling light irradiator 181 serves to irradiate light toward the etching resistance tape 33 so that the etching resistance tape 33 is peeled off from the roll sheet 30 . In this case, the light may be ultraviolet light.

The etching resistance tape recovery unit 183 is disposed behind the process of the peeling light irradiator 181 , and recovers the etching resistance tape 33 peeled from the roll sheet 30 by the action of the peeling light irradiator 181 . plays a role The etch-resistance tape 33 recovered through the etch-resistance tape recovery unit 183 is discarded.

The etching resistance tape collecting device 183 includes a tape peeling drive roller 184 for peeling the etching resistance tape 33 from the roll sheet 30 while being rotated in contact with the etching resistance tape 33 , and the roll sheet 30 . ), a driven roller 185 for tape peeling rotatably disposed on the opposite side of the driving roller 184 for tape peeling between and a tape guide roller 187 disposed between the tape peeling driving roller 184 and the tape collecting roller 186 and guiding the collected tape.

As described above, since the tape recovery device 183 for etching resistance is driven in a roll type to peel and recover the tape 33 for etching resistance, there is no need to stop the process, which can contribute to productivity improvement.

As shown in FIGS. 3 and 7 , the roll sheet collecting unit 112 is disposed on the opposite side of the roll sheet supply unit 110 on the first process line a, and the first side of the roll sheet 30 is It serves to recover the roll sheet 30 that has been etched and the etch-resistance tape 33 has been peeled off. Of course, as described above, the roll sheet collecting unit 112 may be connected to the roll sheet supply unit 210 after etching and used as one functional device.

On the other hand, in the second process line (b), the after-etching roll sheet supply unit 210 , the etching resistance agent application unit 220 , the second roll sheet drying unit 231 , and the etching resistance agent curing along the direction in which the process is performed A unit 235 , a roll sheet cutting unit 250 , a carrier laminating unit 260 , and a second etching unit 270 are disposed.

After etching, the roll sheet supply unit 210 transfers the roll sheet 30 on which the etching process for the first surface is completed through the first process line (a) to the second process line ( b) serves to supply.

After etching, when the roll sheet supply unit 210 supplies the roll sheet 30 to the second process line (b), the surface etched in the first process line (a) faces upward. Then, the roll sheet 30 on which the etching process for the first surface has been completed is supplied to the second process line (b) by the action of the second roll sheet driving roller 102 (refer to FIG. 9 ). In other words, the second roll sheet driving roller 102 drives the roll sheet 30 of the roll sheet supply unit 210 toward the roll sheet cutting unit 250 after etching. The second roll sheet driving roller 102 plays the same role as the above-described first roll sheet driving roller 101 , that is, it pulls and moves the roll sheet 30 by the driving force of the motor.

After etching, a second roll sheet buffer unit 218 is provided behind the process of the roll sheet supply unit 210 . The second roll sheet buffer unit 218 is disposed between the post-etching roll sheet supplying unit 210 and the etching-resisting agent applying unit 220, as shown in Figs. 3 and 8, and the post-etching roll sheet supplying unit It serves to adjust the process speed between the 210 and the etch-resistor applying unit 220 .

The etching resistance agent application unit 220 is provided after the process of the second roll sheet buffer unit 218 . As shown in FIGS. 2, 3, and 8, the etching resistor applying unit 220 performs etching on the first surface of the roll sheet 30 on which the 1/2 etching process is completed on the first process line (a). It serves to apply a resistive etch-resisting agent 14 . Since the first surface of the roll sheet 30 has already been etched and, for example, a half-section has been dug in the form of a groove, it is difficult to laminate the above-described etch-resisting tape 33 here. Therefore, instead of the etching resistance tape 33 as shown in FIG. 2E , the etching resistance agent 14 having the same function is applied.

A second roll sheet drying unit 231 and an etching resistance curing unit 235 are sequentially disposed behind the process of the etching resistance agent application unit 220 .

The second roll sheet drying unit 231 is disposed between the etching resistance agent application unit 220 and the etching resistance agent curing unit 235 as shown in FIGS. 3 and 8 , and the etching resistance agent 14 is It serves to dry the applied roll sheet 30 . The second roll sheet drying unit 231 may also be dried by hot air like the above-described first roll sheet drying unit 105 .

The etch-resistant curing unit 235 is disposed behind the process of the etch-resistor application unit 220 , and serves to cure the etch-resistant 14 . The etching resistance agent 14 applied to the first surface of the roll sheet 30 through the etching resistance agent application unit 220 may be of a gel type. Allow the etching resistance agent 14 applied to the first surface to be cured through the etching resistance agent curing unit 235 .

A roll sheet cutting unit 250 is provided behind the process of the etching resistance agent curing unit 235 on the second process line (b). The roll sheet cutting unit 250 is disposed behind the process of the etching resistance agent application unit 220 as shown in FIGS. 3 and 9 , and cuts the roll sheet 30 into a unit sheet 20 of a unit size. plays a role The unit size may be various, such as a mobile phone size or a monitor size.

9 shows the roll sheet cutting unit 250 extremely schematically, the roll sheet cutting unit 250 is driven up and down and a cutter 251 for cutting the roll sheet 30 being transported, and cutting It may include a cutting die 252 that supports the roll sheet 30 of the subject.

A spreading roller 253 that spreads the roll sheet 30 may be rotatably disposed in front of the cutting die 252 to increase the cutting efficiency while being cut to an accurate size.

When the roll sheet 30 is cut, the transfer of the roll sheet 30 may be temporarily stopped. At this time, in order to compensate for the flow of the roll sheet 30 in progress in the previous process, the electric buffer roll 254 is a spreading roller 253 may be disposed in front.

The carrier laminating unit 260 is disposed behind the process of the roll sheet cutting unit 250 as shown in FIGS. 3 and 9 , and the carrier 50 on the unit sheet 20 for transport of the unit sheet 20 . , it plays a role of laminating the carrier.

Since the roll sheet 30 is a roll-to-roll type, it is not difficult to transport, but it is difficult for the unit sheet 20 in the form of a thin film to be transported alone. Accordingly, the carrier 50 is laminated to the unit sheet 20 in order to support the unit sheet 20 and transport the unit sheet 20 . The carrier 50 may be made of glass, and is laminated on the unit sheet 20 . An intermediate moving roller 262 is disposed between the carrier laminating unit 260 and the sheet etching unit 270 .

The sheet etching unit 270 is disposed behind the process of the carrier laminating unit 260 as shown in FIGS. 2, 3 and 10 , and an etching process for the second surface of the unit sheet 20 is performed. plays a role As the etching process proceeds primarily through the first etching unit 150 in the state of the roll sheet 30 and the etching process secondarily proceeds through the sheet etching unit 270 in the state of the unit sheet 20 , the unit sheet The above-described pattern hole 33 (refer to FIG. 1 ) may be formed only in (20).

On the other hand, the sheet etching unit 260 applied to the embodiment of the present invention is a variable speed type second etching unit 270 in which the speed is accelerated at the inlet and outlet through which the carrier 50 is introduced and discharged.

As such, when the speed is accelerated at the entrance and exit through which the carrier 50 is introduced and discharged, defects at the entrance and exit can be reduced. In fact, considering that the defect rate is high in the inlet/outlet area where the unit sheet 20 is introduced and discharged, there is an advantage in that the defect rate can be reduced by applying the second etching unit 270 . The second etching unit 270 includes a sheet-type unit body 271 , a carrier moving module 272 , a plurality of second etching solution spray modules 273 , and a carrier acceleration module 274 .

The sheet-shaped unit body 271 forms the exterior of the second etching unit 270 . The sheet-shaped unit body 271 has a cabinet shape.

The carrier moving module 272 is provided in the sheet-type unit body 271 and serves to move the carrier 50 . The carrier moving module 272 may be applied as a roller strong against the etching solution.

A plurality of second etchant spray modules 273 are provided in the sheet-type unit body portion 271, and the etchant is directed toward the unit sheet 20 that is moving through the carrier movement module 272 in the sheet-type unit body portion 271. It acts as a spray method. Since the etchant is sprayed by a spray method, the uniformity of the etchant spray can be ensured.

The carrier acceleration module 274 is disposed on at least one side of an inlet portion 271a through which the carrier 50 is introduced and an outlet portion 271b through which the carrier 50 is discharged, and relatively quickly moves the carrier 50 at the corresponding position. acts as an accelerator. In an embodiment of the present invention, the carrier acceleration module 274 is applied to both the inlet 271a through which the carrier 50 is introduced and the outlet 271b through which the carrier 50 is discharged. However, the carrier acceleration module 274 may be applied to only one of the inlet 271a and the outlet 271b. The carrier acceleration module 274 includes an inlet side carrier acceleration module 275 and an outlet side carrier acceleration module 276 .

The inlet-side carrier acceleration module 275 is provided on the inlet portion 271a side of the sheet-type unit body portion 271, and the carrier 50 introduced into the sheet-type unit body portion 271 from the carrier laminating unit 260 side. It serves to accelerate the speed relatively faster than the speed of the carrier moving module 272 .

And the discharge-side carrier acceleration module 276 is provided on the discharge portion 271b side of the sheet-type unit body portion 271, the etching process is completed, the carrier 50 discharged from the inside of the sheet-type unit body portion 271 to the outside ) serves to accelerate the speed relatively faster than the speed of the carrier moving module 272 .

Both the inlet side carrier acceleration module 275 and the discharge side carrier acceleration module 276 may be applied as rollers. A position sensing unit 278 and a controller 280 are further provided for the operation of the inlet-side carrier acceleration module 275 and the discharge-side carrier acceleration module 276 .

The position detecting unit 278 detects whether the carrier 50 on which the unit sheet 20 is laminated has reached the inlet 271a or the outlet 271b side. The position detecting unit 278 may be, for example, a proximity sensor, and may be disposed in various places inside and outside the sheet-type unit body 271 .

The controller 280 controls the operation of the carrier acceleration module 274, that is, the operation of the inlet-side carrier acceleration module 275 and the discharge-side carrier acceleration module 276, based on the detection signal of the position detection unit 278. . That is, when the carrier 50 on which the unit sheet 20 is laminated reaches the inlet 271a or the outlet 271b side, the inlet carrier acceleration module 275 and the outlet carrier acceleration module 276 are operated. By doing so, the speed of the carrier 50 introduced into the sheet-type unit body 271 and the carrier 50 discharged from the sheet-type unit body 271 is relatively quickly accelerated, so that defects do not occur here.

The controller 280 performing this role may include a central processing unit (CPU) 281, a memory (282, MEMORY), and a support circuit (283, SUPPORT CIRCUIT).

The central processing unit 281 may be one of various computer processors that can be industrially applied to control the operation of the carrier acceleration module 274 based on the detection signal of the position detection unit 278 in an embodiment of the present invention. there is.

The memory 282 (MEMORY) is connected to the central processing unit (281). The memory 282 is a computer-readable recording medium, which may be installed locally or remotely, and may be easily available such as random access memory (RAM), ROM, floppy disk, hard disk, or any digital storage form. It may be at least one memory.

A support circuit 283 (SUPPORT CIRCUIT) is coupled to the central processing unit 281 to support typical operations of the processor. The support circuit 283 may include a cache, a power supply, a clock circuit, an input/output circuit, a subsystem, and the like.

In an embodiment of the present invention, the controller 280 controls the operation of the carrier acceleration module 274 based on the detection signal of the position detection unit 278, and a series of control processes and the like may be stored in the memory 282. there is. Typically, software routines may be stored in memory 282 . Software routines may also be stored or executed by other central processing units (not shown).

Although the process according to the present invention has been described as being executed by a software routine, it is also possible that at least some of the processes of the present invention are performed by hardware. As such, the processes of the present invention may be implemented in software executed on a computer system, implemented in hardware such as an integrated circuit, or implemented by a combination of software and hardware.

The functional non-water washing unit 160 provided in the above-described first process line (a) is equally applied to the rear of the second etching unit 270 . The functional non-water washing unit 160 applied after the process of the second etching unit 270 is also directly connected to the outlet of the second etching unit 270, and is etched using washing water or water mixed with a cleaning agent. It serves to remove the etching solution or foreign material remaining on the unit sheet 20 on which the process is completed. The description of the functional non-water washing unit 160 disposed behind the process of the second etching unit 270 is replaced with the above description, and repeated description is avoided.

11 is a diagram illustrating an operation flowchart for explaining a method of manufacturing a fine metal mask according to an embodiment of the present invention.

Referring to FIG. 11 , in the system 100 for manufacturing a fine metal mask according to an embodiment of the present invention, a fine metal plate is first provided ( S1110 ).

Here, for cleaning the fine metal plate, degreasing, pickling, water washing, and drying processes are sequentially performed. The degreasing process removes oil and organic matter attached to the surface of the fine metal plate. The pickling process refines the surface of the fine metal plate. The water washing process cleans the fine metal plate. The drying process dries the fine metal plate. When the drying process is completed, the surface treatment is performed on the fine metal plate by plasma of a linear ion source. In the case of an embodiment of the present invention, an argon (Ar) source may be employed as the linear ion source. Due to the action of such a linear ion source, the surface purity of the fine metal plate may be increased. By adding the linear ion source process as described above, the adhesion between the reinforcing adhesive material and the fine metal plate may be increased in the next process.

Then, a reinforcing adhesive material is applied to both surfaces of the fine metal plate (Coating) (S1120).

In this case, a reinforcing adhesive material having a stronger interfacial adhesion with the photoresist PR than the fine metal plate may be applied to both surfaces of the fine metal plate. Here, the reinforcing adhesive material may be applied to both surfaces of the fine metal plate by an electroplating or sputtering process.

According to the experiment, 1 nano-meter (nm) to 1 micro-meter (m) is suitable as the range of the thickness of the applied reinforcing adhesive material. This may increase the efficiency of the manufacturing process by maintaining the state in which the fine metal plate and the photoresist are adhered until the manufacturing process of the fine metal mask 10 is finished. In addition, the reinforcing adhesive material 1200 includes, as shown in FIG. 12 , a filler 1201 made of particles having a size of 2 nm to 500 nm; and a binder 1202 for fixing the filler. 12 is a block diagram illustrating a configuration of a reinforcing adhesive material for bonding a fine metal mask and a photoresist according to an embodiment of the present invention. The filler 1201 is one selected from the group consisting of BaSO4, TiO2, SiO2, and carbon black. The filler 1201 has a size of 2 nm to 500 nm, and may have a circular shape, a rod shape, or an irregular shape. The binder 1202 is one selected from the group consisting of an acrylic resin and an epoxy resin.

Next, the photoresist PR is adhered to both sides of the fine metal plate by an adhesion-reinforcing material (S1130).

Here, the adhesive force between the reinforcing adhesive material 1200 and the photoresist PR may be 1.5 kgf/in to about 2.5 kgf/in. In addition, the adhesive force between the reinforcing adhesive material 1200 and the fine metal plate may be 2.0 kgf/in to about 3.0 kgf/in. The reinforcing adhesive material 1200 is an adhesion-reinforcing metal having a stronger interfacial adhesion with the photoresist than that of the fine metal plate, or a material in which the adhesion-reinforcing metal is oxidized.

Then, pattern holes are formed in the photoresist located on both sides of the fine metal plate (S1140).

In this case, in the photoresist PR, pattern holes may be formed by exposure and development of a photomask, or pattern holes may be formed by using a laser direct imaging method.

In addition, as shown in FIG. 1B , the pattern holes of the photoresist PR are based on the central coordinate (0,0) at the center of the photoresist PR, and as the X coordinate increases according to Equation 1, the Y It may be formed so that the change of the position becomes large and the X position is arranged without change.

In addition, the pattern holes of the photoresist, as shown in FIG. 1C , based on the central coordinates in the center of the photoresist, according to Equation 1, as the X coordinate increases, the change in the Y position increases, and the change in the X position increases without a change in the X position. It may be formed to be arranged and formed.

Then, an etching solution is introduced into the pattern holes of the photoresist to etch the fine metal plate, thereby forming a pattern of through holes in the fine metal plate (S1150).

Here, the pattern of the through holes in the fine metal mask 10 is based on the central coordinate in the center of the fine metal plate adhered to the photoresist. As the X coordinate increases, the Y position changes and the X position changes. It is not formed to be arranged without being arranged, but may be formed to be uniformly arranged at regular intervals along imaginary lines parallel to the imaginary centerline in the center as shown in FIG. 13 . 13 illustrates an arrangement state of pattern holes formed after photoresist exposure of a fine metal mask according to an embodiment of the present invention. The fine metal mask 10 according to an embodiment of the present invention may reduce the overall thickness d to reduce the strain. For example, the thickness of the fine metal mask 10 may be 30 μm or less or 30 to 50 μm.

In an embodiment of the present invention, the fine metal plate may be an alloy of nickel (Ni)-iron (Fe). In addition, the reinforced adhesive material 1200 may be selected from among copper, iron, nickel, palladium, gold, platinum, copper oxide, iron oxide, nickel oxide, and palladium oxide. It may be any one, or two or more alloy materials.

When the etching solution of the fine metal plate is a solution of copper chloride, the reinforcing adhesive material 1200 may be copper or copper oxide. In addition, when the etching solution is a solution of iron chloride, the reinforced adhesive material 1200 may include iron, nickel, palladium, gold, platinum, iron oxide, nickel oxide, and It may be any one of palladium oxide (palladium oxide), or two or more alloy materials.

As described above, according to the present invention, when manufacturing a fine metal mask (FMM) for manufacturing a high-resolution OLED display panel, it is possible to realize a system and method for manufacturing a fine metal mask that allows pattern holes to be uniformly formed on the mask sheet. can
The present invention provides a method for manufacturing a fine metal mask for forming a pattern of through holes in a fine metal plate,
(a) providing the fine metal plate;
(b) applying a reinforcing adhesive material to both sides of the fine metal plate (Coating);
(c) adhering a photoresist on both sides of the fine metal plate by the reinforcing adhesive material;
(d) forming pattern holes in the photoresist positioned on both sides of the fine metal plate; and
(e) forming a pattern of the through holes in the fine metal plate by introducing an etching solution into the pattern holes of the photoresist and etching the fine metal plate;
including,
In step (d), the pattern holes of the photoresist are formed in an arrangement without a change in the X position, the change in the Y position increases as the X coordinate increases with respect to the central coordinate located in the center of the photoresist,
The micro-metal plate includes a mask pattern portion in which the pattern of the through holes is formed in a mask sheet by an etching process, and the mask sheet is made fine through a plurality of processes on a first process line and a second process line sequentially. Manufactured as a metal mask, the first process line performs a primary etching process on a roll sheet through a first etching unit, and the second process line performs a secondary etching process on a unit sheet through a second etching unit proceed with,
The roll sheet is supplied to the first process line through which an etching process is performed by a roll sheet supply unit, and the first etching unit provided on one side of the first process line is applied to a first surface that is one side of the roll sheet. an etching process is performed, and the second etching unit performs an etching process on a second surface that is the other surface of the roll sheet, and an etching resistance tape is laminated on one surface of the roll sheet, The roll sheet on which the etching resistance tape is laminated is introduced into the first etching unit, and the first surface, which is one side of the roll sheet, is etched through the first etching unit,
The roll sheet on which the first side is etched is taken out from the first etching unit and then inverted so that the etched first side is placed on top, and then an etching resistance agent is applied to the area of the etched first side; After the etching resistance agent is applied to the etched first surface region of the roll sheet, the roll sheet is cut to form a unit sheet of a unit size, and then through the second etching unit, the unetched second surface The etching process for the area proceeds,
A carrier is laminated on the unit sheet, and the unit sheet laminated on the carrier is introduced into the second etching unit and the second surface, which is the remaining surface of the unit sheet, is etched through the second etching unit, a pattern is formed,
The first process line includes a roll sheet supply unit, a tape laminating unit for etching resistance, a pre-etching unit, a pre-cleaning and water removal unit, a first etching unit, a functional non-water washing unit, and a tape peeling for etching resistance along the direction in which the process is performed. A unit, and a roll sheet recovery unit are disposed,
The roll sheet supply unit supplies the roll sheet, which is wound and formed in a roll shape, to the first process line in which a primary etching process is performed,
A first roll sheet driving roller and a plurality of roll sheet guide rollers are provided to release the roll sheet through the roll sheet supply unit and supply it to the first process line,
The first roll sheet driving roller is disposed on the first process line between the roll sheet supply unit and the roll sheet recovery unit, and pulls the roll sheet with a driving force of a motor to move it toward the roll sheet recovery unit;
The roll sheet guide roller is disposed in various places in both the first process line and the second process line to guide the transport of the roll sheet while applying tension to the roll sheet,
The etching resistance tape laminating unit is disposed between the roll sheet supply unit and the first etching unit, and is released from the roll sheet supply unit before the etching process on the first surface of the roll sheet is performed to perform the first etching Laminating a tape for etching resistance on a second surface that is the other side of the roll sheet supplied to the unit,
The etch-resisting tape laminating unit includes a tape supply roller, a laminating drive roller, a laminating driven roller, a tape transfer roller, and a protective film recovery roller,
The tape supply roller supplies the etching resistance tape, the laminating driving roller is rotatably disposed on the second surface of the roll sheet, and receives the etching resistance tape supplied from the tape supply roller to receive the roll laminating on a second side of a sheet, wherein the laminating driven roller is rotatably disposed opposite the laminating drive roller with the roll sheet interposed therebetween, and the tape transfer roller is disposed between the tape supply roller and the laminating drive roller is disposed to pass the etch-resistance tape, and transfers the etch-resistance tape supplied from the tape supply roller to the laminating drive roller, and the protective film recovery roller is disposed adjacent to the tape transfer roller to deliver the tape transfer roller interacts with and recovers the protective film on the etch-resistance tape passing through the tape transfer roller,
A first roll sheet buffer unit, a pre-etching unit, and a pre-washing water remover are sequentially disposed behind the process of the etching-resisting tape laminating unit, and the first roll sheet buffer unit is disposed between the etching-resisting tape laminating unit and the pre-etching unit. is disposed to adjust a process speed between the tape laminating unit for etching resistance and the pre-etching unit, the pre-etching unit being disposed between the tape laminating unit for etching resistance and the first etching unit on the first process line, , performing pre-etching on the roll sheet before the roll sheet is drawn into the first etching unit and proceeds with the etching process,
The pre-etching unit includes a pre-etching tank filled with an etching solution, and a plurality of pre-etching guides provided in the pre-etching tank to guide the transport of the roll sheet so that the roll sheet can be discharged by being deepened in the etching solution in the pre-etching tank including a roller;
The pre-cleaning water eliminator is disposed between the pre-etching unit and the first etching unit, and washes and removes water from the roll sheet on which the pre-etching process has been performed, and the pre-cleaning water remover is disposed toward the roll sheet with water ( a pre-washer for washing the roll sheet while spraying water), and an air knife for removing water remaining on the surface of the roll sheet after washing is completed with wind, wherein the first An etching unit is provided,
The first etching unit includes a roll sheet etching cabinet, the roll sheet etching cabinet has a cabinet structure, and a plurality of etching rooms for performing an etching process for the roll sheet are formed therein, the etching rooms are communicated with each other, , the roll sheet etching cabinet is provided with a roll sheet inlet roller part and a roll sheet take out roller part, and the roll sheet inlet roller part is disposed in an entrance area of the roll sheet etching cabinet, and the roll sheet is disposed inside the roll sheet etching cabinet. and the roll sheet take-out roller unit is disposed in an exit area of the roll sheet etching cabinet and draws out (discharges) the roll sheet to the outside of the roll sheet etching cabinet, and a plurality of first An etchant spray module is provided, and the first etchant spray modules spray an etchant in a spray manner toward the roll sheet being transported in the roll sheet etching cabinet to etch half of the first surface, which is one side of the roll sheet. let the process go on,
A functional non-water washing unit is provided behind the process of the first etching unit, the functional non-water washing unit is directly connected to the outlet of the first etching unit, and the etching process is performed using washing water or water mixed with a cleaning agent. Remove the etching solution or foreign material remaining on the completed roll sheet,
In the functional non-specific water washing unit, a unit cabinet, a non-specific water washing module, first to third washing modules, and a water removal module are integrally mounted on the unit cabinet,
The unit cabinet forms the exterior of the functional non-specific water washing unit, and a foot for height adjustment and ground support is disposed at a lower end of the unit cabinet, and the non-specific water washing module and the first to third flushing modules are located on the rear side of the unit cabinet. Means for supplying the washing water or water mixed with the cleaning agent to the module in a fixed amount and a positive pressure are provided, and a first drain part and a second drain part are provided under the unit cabinet, and the first drain part is a part of the unit cabinet. It is disposed on one side of the lower part and receives washing water mixed with washing chemicals falling from the non-specific water washing module and drains it, and the second drain part is disposed on the other lower side of the unit cabinet and falls from the first to third washing modules. Receive and drain the water,
The non-specific water washing module is provided on an upper side of the unit cabinet and uses washing water mixed with a cleaning agent to remove the etching solution remaining on the roll sheet on which the etching process is completed,
The non-specific water washing module includes a non-specific water washing module housing, a roll sheet transfer part, an upper pipe part, a lower pipe part, and a pipe driving part,
The non-specific water washing module housing is an exterior frame having a box-shaped cabinet shape, an inlet through which the roll sheet flows is formed on one side of the non-specific water washing module housing, and the roll sheet flowing into the inlet includes the non-specific water washing module and the first After passing through the first to third washing modules and the water removal module in sequence, the water is discharged to the discharge part of the water removal module housing and then directed to the first roll sheet drying unit,
The roll sheet transport unit is disposed in the non-specific water washing module housing, transports the roll sheet passing through the inlet to the first to third washing modules, and is formed by a combination of a plurality of rollers and gears, and the upper pipe part A plurality of upper injection nozzles are provided on the upper portion of the roll sheet transfer unit, and the upper pipe portion sprays down washing water mixed with a cleaning agent toward the roll sheet being transferred under the action of the roll sheet transfer unit, and the lower portion The pipe part is disposed under the upper pipe part, and the lower pipe part is provided with a plurality of lower injection nozzles for upwardly spraying the washing water mixed with the cleaning agent toward the roll sheet being transported by the action of the roll sheet conveying part, The pipe driving part is connected to the upper pipe part and the lower pipe part, and drives the upper pipe part and the lower pipe part in at least one direction in order to ensure the uniformity of spraying of the washing water mixed with the washing chemical sprayed onto the roll sheet, , The pipe driving unit is provided in a form in which parts are coupled to a driving housing coupled to one side of the unit cabinet,
The pipe driving part includes an upper slider connected to the upper pipe part and slidingly driving the upper pipe part, and an upper sliding plate disposed on the driving housing and connected to the upper slider and slidingly moved in a direction in which the upper pipe part is driven. and a lower slider connected to the lower pipe part and slidingly driving the lower pipe part; do,
A slider driving unit is provided in the pipe driving unit to alternately drive the upper slider and the lower slider, and the slider driving unit is provided in the driving housing and connected to the upper sliding plate and the lower sliding plate to form the upper slider and the lower slider. alternately driving the lower slider,
The slider driving unit includes a servomotor to which a speed reducer is connected and generating power, and a rotor disposed between the upper sliding plate and the lower sliding plate in the driving housing and connected to the servomotor and rotated by the operation of the servomotor. a rotating shaft; an upper cam plate connected to an upper end of the rotating shaft and rotating in the same manner as the rotating shaft; and an upper coupling member coupled to the upper cam plate via an upper long hole of the upper sliding plate; A lower cam plate connected to the lower end of the rotating shaft and co-rotated with the rotating shaft, and a lower coupling member coupled to the lower cam plate via a lower long hole of the lower sliding plate,
The first to third washing modules are disposed adjacent to the non-specific water washing module on the unit cabinet, and remove foreign substances remaining on the roll sheet by using water with respect to the roll sheet passing through the non-specific water washing module,
The first to third flush modules include a flush module housing and a plurality of water sprayers disposed on the upper and lower portions of the roll sheet being transported in the flush module housing and spraying water toward the roll sheet at corresponding positions. including,
The water removal module is disposed adjacent to the third flushing module on the unit cabinet, and with respect to the roll sheet that has passed the third flushing module, removes the remaining water on the roll sheet with wind,
The water removal module is disposed on the water removal module housing and the upper and lower portions of the roll sheet being transported in the water removal module housing, and a plurality of air spraying straight air toward the roll sheet at the corresponding position including a knife,
A first roll sheet drying unit, a tape peeling unit for etching resistance, a light irradiator for peeling, a tape recovery machine for etching resistance, and a roll sheet recovery unit are sequentially disposed behind the functional non-water washing unit process,
The first roll sheet drying unit is disposed behind the process of the functional non-water washing unit and dries the roll sheet that has been washed through the functional non-water washing unit, and the etching resistance tape peeling unit is the first etching unit. The etch-resistance tape is peeled off the etch-resistance tape disposed behind the process and laminated for the primary etching process, and the release light irradiator is directed toward the etch-resistance tape so that the etch-resistance tape is peeled from the roll sheet. ), and the etching resistance tape recovery device is disposed behind the process of the peeling light irradiator to recover the etching resistance tape peeled from the roll sheet by the action of the peeling light irradiator,
The etch-resistance tape collecting device includes a tape peeling driving roller that peels the etch-resistive tape from the roll sheet while rotating in contact with the etch-resisting tape, and the opposite side of the tape peeling driving roller with the roll sheet interposed therebetween A driven roller for tape peeling rotatably disposed on the a tape guide roller;
the roll sheet recovery unit is disposed opposite the roll sheet supply unit on the first process line, and recovers the roll sheet from which the first surface of the roll sheet is etched and the etching resistance tape is peeled;
In the second process line, an after-etching roll sheet supply unit, an etching resistance agent application unit, a second roll sheet drying unit, an etching resistance agent curing unit, a roll sheet cutting unit, a carrier laminating unit, and a second processing line along the direction in which the process is performed 2 etching units are arranged,
The post-etching roll sheet supply unit supplies the roll sheet, on which the etching process for the first surface is completed, to the second process line through the first process line,
After the etching, when the roll sheet supply unit supplies the roll sheet to the second process line, the surface etched in the first process line faces upward and the roll sheet on which the etching process for the first surface is completed is supplied to the second process line by the action of the second roll sheet driving roller, the second roll sheet driving roller driving the roll sheet of the roll sheet supply unit toward the roll sheet cutting unit after etching;
A second roll sheet buffer unit is provided behind the process of the post-etching roll sheet supply unit, wherein the second roll sheet buffer unit is disposed between the post-etched roll sheet supply unit and the etch-resistant applying unit, and after the etching adjusting the process speed between the roll sheet supply unit and the etch resistance agent application unit;
The etching resistor applying unit is provided behind the process of the second roll sheet buffer unit, and the etching resistor applying unit is applied to the first surface of the roll sheet on which the 1/2 etching process is completed on the first process line. Apply an etch-resistor,
The second roll sheet drying unit and the etching resistance curing unit are sequentially disposed behind the process of the etching resistance agent application unit,
The second roll sheet drying unit is disposed between the etch-resistant applying unit and the etch-resistant curing unit to dry the roll sheet on which the etch-resist is applied, and the etch-resistor-curing unit applies the etch-resistor disposed behind the unit to cure the etch resistance;
On the second process line, the roll sheet cutting unit is provided behind the process of the etching resistance curing unit, the roll sheet cutting unit is disposed behind the process of the etching resistor applying unit, and the roll sheet is cut into a unit size. cut into unit sheets,
The roll sheet cutting unit comprises a cutter (cutter) for cutting the roll sheet being transported while driving up and down, and a cutting die supporting the roll sheet to be cut,
An electric buffer roll is disposed in front of the spreading roller to compensate for the flow of the roll sheet in progress when the transfer of the roll sheet is stopped during the cutting operation of the roll sheet,
The carrier laminating unit is disposed behind the process of the roll sheet cutting unit and laminates a carrier on the unit sheet for transferring the unit sheet, and is intermediate between the carrier laminating unit and the sheet etching unit. a moving roller is disposed,
The sheet etching unit is disposed behind the process of the carrier laminating unit and performs an etching process on the second surface of the unit sheet,
A main pattern is formed on the unit sheet as the etching process is primarily performed through the first etching unit in the state of the roll sheet and the etching process is performed secondarily through the sheet etching unit in the state of the unit sheet,
The sheet etching unit is a variable speed second etching unit in which the speed is accelerated at the inlet and outlet through which the carrier is introduced and discharged,
The second etching unit includes a sheet-type unit body, a carrier moving module, a plurality of second etching solution spray modules, and a carrier acceleration module,
The sheet-type unit body part forms an exterior of the second etching unit, the sheet-type unit body part has a cabinet shape, and the carrier moving module is provided in the sheet-type unit body part and serves to move the carrier, and the carrier moves The module is applied with a roller strong against the etching solution, and the plurality of second etching solution spray modules are provided in the sheet-like unit body and spray the etching solution toward the unit sheet moving through the carrier moving module in the sheet-like unit body. and the carrier acceleration module is disposed on at least one side of an inlet through which the carrier is introduced and an outlet through which the carrier is discharged and serves to accelerate the carrier at the corresponding position,
The carrier acceleration module includes an inlet-side carrier acceleration module and an outlet-side carrier acceleration module, wherein the inlet-side carrier acceleration module is provided on the inlet side of the sheet-type unit body, and moves from the carrier laminating unit side into the sheet-type unit body. Accelerates the incoming speed of the carrier faster than the speed of the carrier moving module, the discharge-side carrier acceleration module is provided on the discharge side of the sheet-type unit body portion, the etching process is completed from the inside of the sheet-type unit body to the outside Accelerate the speed of the carrier discharged to the faster than the speed of the carrier moving module,
A position sensing unit and a controller are further provided for the operation of the inlet-side carrier acceleration module and the discharge-side carrier acceleration module,
The position sensing unit detects whether the carrier on which the unit sheet is laminated has reached the inlet or outlet side, and the controller determines the operation of the carrier acceleration module and the inlet side based on the detection signal of the position sensing unit. It is possible to provide a method of manufacturing a fine metal mask for controlling the operation of the carrier acceleration module and the operation of the discharge-side carrier acceleration module.
The present invention, a roll sheet wound in the shape of a roll, the photoresist is formed on both sides of the roll sheet (roll sheet);
a roll sheet supply unit for supplying the roll sheet to a first process line in which an etching process is performed;
a first etching unit provided on one side of the first process line and performing an etching process on a first surface that is one surface of the roll sheet; and
a second etching unit for performing an etching process on a second surface, which is the other surface of the roll sheet;
including,
The pattern holes of the photoresist are formed in an arrangement without a change in the X position, the change in the Y position increases as the X coordinate increases with respect to the central coordinate located in the center of the photoresist,
By the etching process, a fine metal plate having a pattern of through holes formed on the mask sheet is generated, and a reinforcing adhesive material is applied to both surfaces of the fine metal plate, so that the photoresist is formed on both sides of the fine metal plate by the reinforcing adhesive material. is adhered, and the mask sheet is manufactured into a fine metal mask by sequentially passing through a plurality of processes on a first process line and a second process line, and the first process line is first etched on the roll sheet through a first etching unit A process is performed, and the second process line performs a secondary etching process on the unit sheet through a second etching unit,
The roll sheet is supplied to the first process line through which an etching process is performed by a roll sheet supply unit, and the first etching unit provided on one side of the first process line is applied to a first surface that is one side of the roll sheet. an etching process is performed, and the second etching unit performs an etching process on a second surface that is the other surface of the roll sheet, and an etching resistance tape is laminated on one surface of the roll sheet, The roll sheet on which the etching resistance tape is laminated is introduced into the first etching unit, and the first surface, which is one side of the roll sheet, is etched through the first etching unit,
The roll sheet on which the first side is etched is taken out from the first etching unit and then inverted so that the etched first side is placed on top, and then an etching resistance agent is applied to the area of the etched first side; After the etching resistance agent is applied to the etched first surface region of the roll sheet, the roll sheet is cut to form a unit sheet of a unit size, and then through the second etching unit, the unetched second surface The etching process for the area proceeds,
A carrier is laminated on the unit sheet, and the unit sheet laminated on the carrier is introduced into the second etching unit and the second surface, which is the remaining surface of the unit sheet, is etched through the second etching unit, a pattern is formed,
The first process line includes a roll sheet supply unit, a tape laminating unit for etching resistance, a pre-etching unit, a pre-cleaning and water removal unit, a first etching unit, a functional non-water washing unit, and a tape peeling for etching resistance along the direction in which the process is performed. A unit, and a roll sheet recovery unit are disposed,
The roll sheet supply unit supplies the roll sheet, which is wound and formed in a roll shape, to the first process line in which a primary etching process is performed,
A first roll sheet driving roller and a plurality of roll sheet guide rollers are provided to release the roll sheet through the roll sheet supply unit and supply it to the first process line,
The first roll sheet driving roller is disposed on the first process line between the roll sheet supply unit and the roll sheet recovery unit, and pulls the roll sheet with a driving force of a motor to move it toward the roll sheet recovery unit;
The roll sheet guide roller is disposed in various places in both the first process line and the second process line to guide the transport of the roll sheet while applying tension to the roll sheet,
The etching resistance tape laminating unit is disposed between the roll sheet supply unit and the first etching unit, and is released from the roll sheet supply unit before the etching process on the first surface of the roll sheet is performed to perform the first etching Laminating a tape for etching resistance on a second surface that is the other side of the roll sheet supplied to the unit,
The etch-resisting tape laminating unit includes a tape supply roller, a laminating drive roller, a laminating driven roller, a tape transfer roller, and a protective film recovery roller,
The tape supply roller supplies the etching resistance tape, the laminating driving roller is rotatably disposed on the second surface of the roll sheet, and receives the etching resistance tape supplied from the tape supply roller to receive the roll laminating on a second side of a sheet, wherein the laminating driven roller is rotatably disposed opposite the laminating drive roller with the roll sheet interposed therebetween, and the tape transfer roller is disposed between the tape supply roller and the laminating drive roller is disposed to pass the etch-resistance tape, and transfers the etch-resistance tape supplied from the tape supply roller to the laminating drive roller, and the protective film recovery roller is disposed adjacent to the tape transfer roller to deliver the tape transfer roller interacts with and recovers the protective film on the etch-resistance tape passing through the tape transfer roller,
A first roll sheet buffer unit, a pre-etching unit, and a pre-washing water remover are sequentially disposed behind the process of the etching-resisting tape laminating unit, and the first roll sheet buffer unit is disposed between the etching-resisting tape laminating unit and the pre-etching unit. is disposed to adjust a process speed between the tape laminating unit for etching resistance and the pre-etching unit, the pre-etching unit being disposed between the tape laminating unit for etching resistance and the first etching unit on the first process line, , performing pre-etching on the roll sheet before the roll sheet is drawn into the first etching unit and proceeds with the etching process,
The pre-etching unit includes a pre-etching tank filled with an etching solution, and a plurality of pre-etching guides provided in the pre-etching tank to guide the transport of the roll sheet so that the roll sheet can be discharged by being deepened in the etching solution in the pre-etching tank including a roller;
The pre-cleaning water eliminator is disposed between the pre-etching unit and the first etching unit, and washes and removes water from the roll sheet on which the pre-etching process has been performed, and the pre-cleaning water remover is disposed toward the roll sheet with water ( a pre-washer for washing the roll sheet while spraying water), and an air knife for removing water remaining on the surface of the roll sheet after washing is completed with wind, wherein the first An etching unit is provided,
The first etching unit includes a roll sheet etching cabinet, the roll sheet etching cabinet has a cabinet structure, and a plurality of etching rooms for performing an etching process for the roll sheet are formed therein, the etching rooms are communicated with each other, , the roll sheet etching cabinet is provided with a roll sheet inlet roller part and a roll sheet take out roller part, and the roll sheet inlet roller part is disposed in an entrance area of the roll sheet etching cabinet, and the roll sheet is disposed inside the roll sheet etching cabinet. and the roll sheet take-out roller unit is disposed in an exit area of the roll sheet etching cabinet and draws out (discharges) the roll sheet to the outside of the roll sheet etching cabinet, and a plurality of first An etchant spray module is provided, and the first etchant spray modules spray an etchant in a spray manner toward the roll sheet being transported in the roll sheet etching cabinet to etch half of the first surface, which is one side of the roll sheet. let the process go on,
A functional non-water washing unit is provided behind the process of the first etching unit, the functional non-water washing unit is directly connected to the outlet of the first etching unit, and the etching process is performed using washing water or water mixed with a cleaning agent. Remove the etching solution or foreign material remaining on the completed roll sheet,
In the functional non-specific water washing unit, a unit cabinet, a non-specific water washing module, first to third washing modules, and a water removal module are integrally mounted on the unit cabinet,
The unit cabinet forms the exterior of the functional non-specific water washing unit, and a foot for height adjustment and ground support is disposed at a lower end of the unit cabinet, and the non-specific water washing module and the first to third flushing modules are located on the rear side of the unit cabinet. Means for supplying the washing water or water mixed with the cleaning agent to the module in a fixed amount and a positive pressure are provided, and a first drain part and a second drain part are provided under the unit cabinet, and the first drain part is a part of the unit cabinet. It is disposed on one side of the lower part and receives washing water mixed with washing chemicals falling from the non-specific water washing module and drains it, and the second drain part is disposed on the other lower side of the unit cabinet and falls from the first to third washing modules. Receive and drain the water,
The non-specific water washing module is provided on an upper side of the unit cabinet and uses washing water mixed with a cleaning agent to remove the etching solution remaining on the roll sheet on which the etching process is completed,
The non-specific water washing module includes a non-specific water washing module housing, a roll sheet transfer part, an upper pipe part, a lower pipe part, and a pipe driving part,
The non-specific water washing module housing is an exterior frame having a box-shaped cabinet shape, an inlet through which the roll sheet flows is formed on one side of the non-specific water washing module housing, and the roll sheet flowing into the inlet includes the non-specific water washing module and the first After passing through the first to third washing modules and the water removal module in sequence, the water is discharged to the discharge part of the water removal module housing and then directed to the first roll sheet drying unit,
The roll sheet transport unit is disposed in the non-specific water washing module housing, transports the roll sheet passing through the inlet to the first to third washing modules, and is formed by a combination of a plurality of rollers and gears, and the upper pipe part A plurality of upper injection nozzles are provided on the upper portion of the roll sheet transfer unit, and the upper pipe portion sprays down washing water mixed with a cleaning agent toward the roll sheet being transferred under the action of the roll sheet transfer unit, and the lower portion The pipe part is disposed under the upper pipe part, and the lower pipe part is provided with a plurality of lower injection nozzles for upwardly spraying the washing water mixed with the cleaning agent toward the roll sheet being transported by the action of the roll sheet conveying part, The pipe driving part is connected to the upper pipe part and the lower pipe part, and drives the upper pipe part and the lower pipe part in at least one direction in order to ensure the uniformity of spraying of the washing water mixed with the washing chemical sprayed onto the roll sheet, , The pipe driving unit is provided in a form in which parts are coupled to a driving housing coupled to one side of the unit cabinet,
The pipe driving part includes an upper slider connected to the upper pipe part and slidingly driving the upper pipe part, and an upper sliding plate disposed on the driving housing and connected to the upper slider and slidingly moved in a direction in which the upper pipe part is driven. and a lower slider connected to the lower pipe part and slidingly driving the lower pipe part; do,
A slider driving unit is provided in the pipe driving unit to alternately drive the upper slider and the lower slider, and the slider driving unit is provided in the driving housing and connected to the upper sliding plate and the lower sliding plate to form the upper slider and the lower slider. alternately driving the lower slider,
The slider driving unit includes a servomotor to which a speed reducer is connected and generating power, and a rotor disposed between the upper sliding plate and the lower sliding plate in the driving housing and connected to the servomotor and rotated by the operation of the servomotor. a rotating shaft; an upper cam plate connected to an upper end of the rotating shaft and rotating in the same manner as the rotating shaft; and an upper coupling member coupled to the upper cam plate via an upper long hole of the upper sliding plate; A lower cam plate connected to the lower end of the rotating shaft and co-rotated with the rotating shaft, and a lower coupling member coupled to the lower cam plate via a lower long hole of the lower sliding plate,
The first to third washing modules are disposed adjacent to the non-specific water washing module on the unit cabinet, and remove foreign substances remaining on the roll sheet by using water with respect to the roll sheet passing through the non-specific water washing module,
The first to third flush modules include a flush module housing and a plurality of water sprayers disposed on the upper and lower portions of the roll sheet being transported in the flush module housing and spraying water toward the roll sheet at corresponding positions. including,
The water removal module is disposed adjacent to the third flushing module on the unit cabinet, and with respect to the roll sheet that has passed the third flushing module, removes the remaining water on the roll sheet with wind,
The water removal module is disposed on the water removal module housing and the upper and lower portions of the roll sheet being transported in the water removal module housing, and a plurality of air spraying straight air toward the roll sheet at the corresponding position including a knife,
A first roll sheet drying unit, a tape peeling unit for etching resistance, a light irradiator for peeling, a tape recovery machine for etching resistance, and a roll sheet recovery unit are sequentially disposed behind the functional non-water washing unit process,
The first roll sheet drying unit is disposed behind the process of the functional non-water washing unit and dries the roll sheet that has been washed through the functional non-water washing unit, and the etching resistance tape peeling unit is the first etching unit. The etch-resistance tape is peeled off the etch-resistance tape disposed behind the process and laminated for the primary etching process, and the release light irradiator is directed toward the etch-resistance tape so that the etch-resistance tape is peeled from the roll sheet. ), and the etching resistance tape recovery device is disposed behind the process of the peeling light irradiator to recover the etching resistance tape peeled from the roll sheet by the action of the peeling light irradiator,
The etch-resistance tape collecting device includes a tape peeling driving roller that peels the etch-resistive tape from the roll sheet while rotating in contact with the etch-resisting tape, and the opposite side of the tape peeling driving roller with the roll sheet interposed therebetween A driven roller for tape peeling rotatably disposed on the a tape guide roller;
the roll sheet recovery unit is disposed opposite the roll sheet supply unit on the first process line, and recovers the roll sheet from which the first surface of the roll sheet is etched and the etching resistance tape is peeled;
In the second process line, an after-etching roll sheet supply unit, an etching resistance agent application unit, a second roll sheet drying unit, an etching resistance agent curing unit, a roll sheet cutting unit, a carrier laminating unit, and a second processing line along the direction in which the process is performed 2 etching units are arranged,
The post-etching roll sheet supply unit supplies the roll sheet, on which the etching process for the first surface is completed, to the second process line through the first process line,
After the etching, when the roll sheet supply unit supplies the roll sheet to the second process line, the surface etched in the first process line faces upward and the roll sheet on which the etching process for the first surface is completed is supplied to the second process line by the action of the second roll sheet driving roller, the second roll sheet driving roller driving the roll sheet of the roll sheet supply unit toward the roll sheet cutting unit after etching;
A second roll sheet buffer unit is provided behind the process of the post-etching roll sheet supply unit, wherein the second roll sheet buffer unit is disposed between the post-etched roll sheet supply unit and the etch-resistant applying unit, and after the etching adjusting the process speed between the roll sheet supply unit and the etch resistance agent application unit;
The etching resistor applying unit is provided behind the process of the second roll sheet buffer unit, and the etching resistor applying unit is applied to the first surface of the roll sheet on which the 1/2 etching process is completed on the first process line. Apply an etch-resistor,
The second roll sheet drying unit and the etching resistance curing unit are sequentially disposed behind the process of the etching resistance agent application unit,
The second roll sheet drying unit is disposed between the etch-resistant applying unit and the etch-resistant curing unit to dry the roll sheet on which the etch-resist is applied, and the etch-resistor-curing unit applies the etch-resistor disposed behind the unit to cure the etch resistance;
On the second process line, the roll sheet cutting unit is provided behind the process of the etching resistance curing unit, the roll sheet cutting unit is disposed behind the process of the etching resistor applying unit, and the roll sheet is cut into a unit size. cut into unit sheets,
The roll sheet cutting unit comprises a cutter (cutter) for cutting the roll sheet being transported while driving up and down, and a cutting die supporting the roll sheet to be cut,
An electric buffer roll is disposed in front of the spreading roller to compensate for the flow of the roll sheet in progress when the transfer of the roll sheet is stopped during the cutting operation of the roll sheet,
The carrier laminating unit is disposed behind the process of the roll sheet cutting unit and laminates a carrier on the unit sheet for transferring the unit sheet, and is intermediate between the carrier laminating unit and the sheet etching unit. a moving roller is disposed,
The sheet etching unit is disposed behind the process of the carrier laminating unit and performs an etching process on the second surface of the unit sheet,
A main pattern is formed on the unit sheet as the etching process is primarily performed through the first etching unit in the state of the roll sheet and the etching process is performed secondarily through the sheet etching unit in the state of the unit sheet,
The sheet etching unit is a variable speed second etching unit in which the speed is accelerated at the inlet and outlet through which the carrier is introduced and discharged,
The second etching unit includes a sheet-type unit body, a carrier moving module, a plurality of second etching solution spray modules, and a carrier acceleration module,
The sheet-type unit body part forms an exterior of the second etching unit, the sheet-type unit body part has a cabinet shape, and the carrier moving module is provided in the sheet-type unit body part and serves to move the carrier, and the carrier moves The module is applied with a roller strong against the etching solution, and the plurality of second etching solution spray modules are provided in the sheet-like unit body and spray the etching solution toward the unit sheet moving through the carrier moving module in the sheet-like unit body. and the carrier acceleration module is disposed on at least one side of an inlet through which the carrier is introduced and an outlet through which the carrier is discharged and serves to accelerate the carrier at the corresponding position,
The carrier acceleration module includes an inlet-side carrier acceleration module and an outlet-side carrier acceleration module, wherein the inlet-side carrier acceleration module is provided on the inlet side of the sheet-type unit body, and moves from the carrier laminating unit side into the sheet-type unit body. Accelerates the incoming speed of the carrier faster than the speed of the carrier moving module, the discharge-side carrier acceleration module is provided on the discharge side of the sheet-type unit body portion, the etching process is completed from the inside of the sheet-type unit body to the outside Accelerate the speed of the carrier discharged to the faster than the speed of the carrier moving module,
A position sensing unit and a controller are further provided for the operation of the inlet-side carrier acceleration module and the discharge-side carrier acceleration module,
The position detecting unit detects whether the carrier on which the unit sheet is laminated has reached the inlet or outlet, and the controller determines the operation of the carrier acceleration module and the inlet side based on the detection signal of the position detecting unit. It is possible to provide a fine metal mask manufacturing system for controlling the operation of the carrier acceleration module and the operation of the discharge-side carrier acceleration module.

In the above, the embodiments of the present invention have been mainly described, but various changes or modifications can be made at the level of those skilled in the art to which the present invention pertains. Such changes and modifications can be said to belong to the present invention as long as they do not depart from the scope of the technical spirit provided by the present invention. Accordingly, the scope of the present invention should be judged by the claims described below.

10: mask 11: mask sheet
12: pattern part 13: pattern hole
14: etching resistance agent 20: unit sheet
30: roll sheet 33: tape for etching resistance
50: carrier 100: fine metal mask manufacturing system
110: roll sheet supply unit 112: roll sheet recovery unit
120: tape laminating unit for etching resistance 130: first roll sheet buffer unit
140: pre-etching unit 145: pre-cleaning and desiccant
150: first etching unit 160: functional non-water washing unit
162: non-specific water washing module 170: pipe driving part
180: Tape peeling unit for etching resistance 210: Roll sheet supply unit after etching
220: etching resistance agent application unit 231: second roll sheet drying unit
235: etching resistance curing unit 250: roll sheet cutting unit
260: carrier laminating unit 270: second etching unit
278: position detection unit 280: controller
1200: reinforced adhesive material 1201: filler
1202: binder

Claims (12)

A method of manufacturing a fine metal mask for forming a pattern of through holes in a fine metal plate, the method comprising:
(a) providing the fine metal plate;
(b) applying a reinforcing adhesive material to both sides of the fine metal plate (Coating);
(c) adhering a photoresist on both sides of the fine metal plate by the reinforcing adhesive material;
(d) forming pattern holes in the photoresist positioned on both sides of the fine metal plate; and
(e) forming a pattern of the through holes in the fine metal plate by introducing an etching solution into the pattern holes of the photoresist and etching the fine metal plate;
including,
In step (d), the pattern holes of the photoresist are formed in an arrangement without a change in the X position, the change in the Y position increases as the X coordinate increases with respect to the central coordinate located in the center of the photoresist,
The micro-metal plate includes a mask pattern portion in which the pattern of the through holes is formed in a mask sheet by an etching process, and the mask sheet is made fine through a plurality of processes on a first process line and a second process line sequentially. Manufactured as a metal mask, the first process line performs a primary etching process on a roll sheet through a first etching unit, and the second process line performs a secondary etching process on a unit sheet through a second etching unit proceed with,
The roll sheet is supplied to the first process line through which an etching process is performed by a roll sheet supply unit, and the first etching unit provided on one side of the first process line is applied to a first surface that is one side of the roll sheet. an etching process is performed, and the second etching unit performs an etching process on a second surface that is the other surface of the roll sheet, and an etching resistance tape is laminated on one surface of the roll sheet, The roll sheet on which the etching resistance tape is laminated is introduced into the first etching unit, and the first surface, which is one side of the roll sheet, is etched through the first etching unit,
The roll sheet on which the first side is etched is taken out from the first etching unit and then inverted so that the etched first side is placed on top, and then an etching resistance agent is applied to the area of the etched first side; After the etching resistance agent is applied to the etched first surface region of the roll sheet, the roll sheet is cut to form a unit sheet of a unit size, and then through the second etching unit, the unetched second surface The etching process for the area proceeds,
A carrier is laminated on the unit sheet, and the unit sheet laminated on the carrier is introduced into the second etching unit and the second surface, which is the remaining surface of the unit sheet, is etched through the second etching unit, a pattern is formed,
The first process line includes a roll sheet supply unit, a tape laminating unit for etching resistance, a pre-etching unit, a pre-cleaning and water removal unit, a first etching unit, a functional non-water washing unit, and a tape peeling for etching resistance along the direction in which the process is performed. A unit, and a roll sheet recovery unit are disposed,
The roll sheet supply unit supplies the roll sheet, which is wound and formed in a roll shape, to the first process line in which a primary etching process is performed,
A first roll sheet driving roller and a plurality of roll sheet guide rollers are provided to release the roll sheet through the roll sheet supply unit and supply it to the first process line,
The first roll sheet driving roller is disposed on the first process line between the roll sheet supply unit and the roll sheet recovery unit, and pulls the roll sheet with a driving force of a motor to move it toward the roll sheet recovery unit;
The roll sheet guide roller is disposed in various places in both the first process line and the second process line to guide the transport of the roll sheet while applying tension to the roll sheet,
The etching resistance tape laminating unit is disposed between the roll sheet supply unit and the first etching unit, and is released from the roll sheet supply unit before the etching process on the first surface of the roll sheet is performed to perform the first etching Laminating a tape for etching resistance on a second surface that is the other side of the roll sheet supplied to the unit,
The etch-resisting tape laminating unit includes a tape supply roller, a laminating drive roller, a laminating driven roller, a tape transfer roller, and a protective film recovery roller,
The tape supply roller supplies the etching resistance tape, the laminating driving roller is rotatably disposed on the second surface of the roll sheet, and receives the etching resistance tape supplied from the tape supply roller to receive the roll laminating on a second side of a sheet, wherein the laminating driven roller is rotatably disposed opposite the laminating drive roller with the roll sheet interposed therebetween, and the tape transfer roller is disposed between the tape supply roller and the laminating drive roller is disposed to pass the etch-resistance tape, and transfers the etch-resistance tape supplied from the tape supply roller to the laminating drive roller, and the protective film recovery roller is disposed adjacent to the tape transfer roller to deliver the tape transfer roller interacts with and recovers the protective film on the etch-resistance tape passing through the tape transfer roller,
A first roll sheet buffer unit, a pre-etching unit, and a pre-washing water remover are sequentially disposed behind the process of the etching-resisting tape laminating unit, and the first roll sheet buffer unit is disposed between the etching-resisting tape laminating unit and the pre-etching unit. is disposed to adjust a process speed between the tape laminating unit for etching resistance and the pre-etching unit, the pre-etching unit being disposed between the tape laminating unit for etching resistance and the first etching unit on the first process line, , performing pre-etching on the roll sheet before the roll sheet is drawn into the first etching unit and proceeds with the etching process,
The pre-etching unit includes a pre-etching tank filled with an etching solution, and a plurality of pre-etching guides provided in the pre-etching tank to guide the transport of the roll sheet so that the roll sheet can be discharged by being deepened in the etching solution in the pre-etching tank including a roller;
The pre-cleaning water eliminator is disposed between the pre-etching unit and the first etching unit, and washes and removes water from the roll sheet on which the pre-etching process has been performed, and the pre-cleaning water remover is disposed toward the roll sheet with water ( a pre-washer for washing the roll sheet while spraying water), and an air knife for removing water remaining on the surface of the roll sheet after washing is completed with wind, wherein the first An etching unit is provided,
The first etching unit includes a roll sheet etching cabinet, the roll sheet etching cabinet has a cabinet structure, and a plurality of etching rooms for performing an etching process for the roll sheet are formed therein, the etching rooms are communicated with each other, , the roll sheet etching cabinet is provided with a roll sheet inlet roller part and a roll sheet take out roller part, and the roll sheet inlet roller part is disposed in an entrance area of the roll sheet etching cabinet, and the roll sheet is disposed inside the roll sheet etching cabinet. and the roll sheet take-out roller unit is disposed in an exit area of the roll sheet etching cabinet and draws out (discharges) the roll sheet to the outside of the roll sheet etching cabinet, and a plurality of first An etchant spray module is provided, and the first etchant spray modules spray an etchant in a spray manner toward the roll sheet being transported in the roll sheet etching cabinet to etch half of the first surface, which is one side of the roll sheet. let the process go on,
A functional non-water washing unit is provided behind the process of the first etching unit, the functional non-water washing unit is directly connected to the outlet of the first etching unit, and the etching process is performed using washing water or water mixed with a cleaning agent. Remove the etching solution or foreign material remaining on the completed roll sheet,
In the functional non-specific water washing unit, a unit cabinet, a non-specific water washing module, first to third washing modules, and a water removal module are integrally mounted on the unit cabinet,
The unit cabinet forms the exterior of the functional non-specific water washing unit, and a foot for height adjustment and ground support is disposed at a lower end of the unit cabinet, and the non-specific water washing module and the first to third flushing modules are located on the rear side of the unit cabinet. Means for supplying the washing water or water mixed with the cleaning agent to the module in a fixed amount and a positive pressure are provided, and a first drain part and a second drain part are provided under the unit cabinet, and the first drain part is a part of the unit cabinet. It is disposed on one side of the lower part and receives washing water mixed with washing chemicals falling from the non-specific water washing module and drains it, and the second drain part is disposed on the other lower side of the unit cabinet and falls from the first to third washing modules. Receive and drain the water,
The non-specific water washing module is provided on an upper side of the unit cabinet and uses washing water mixed with a cleaning agent to remove the etching solution remaining on the roll sheet on which the etching process is completed,
The non-specific water washing module includes a non-specific water washing module housing, a roll sheet transfer part, an upper pipe part, a lower pipe part, and a pipe driving part,
The non-specific water washing module housing is an exterior frame having a box-shaped cabinet shape, an inlet through which the roll sheet flows is formed on one side of the non-specific water washing module housing, and the roll sheet flowing into the inlet includes the non-specific water washing module and the first After passing through the first to third washing modules and the water removal module in sequence, the water is discharged to the discharge part of the water removal module housing and then directed to the first roll sheet drying unit,
The roll sheet transport unit is disposed in the non-specific water washing module housing, transports the roll sheet passing through the inlet to the first to third washing modules, and is formed by a combination of a plurality of rollers and gears, and the upper pipe part A plurality of upper injection nozzles are provided on the upper portion of the roll sheet transfer unit, and the upper pipe portion sprays down washing water mixed with a cleaning agent toward the roll sheet being transferred under the action of the roll sheet transfer unit, and the lower portion The pipe part is disposed under the upper pipe part, and the lower pipe part is provided with a plurality of lower injection nozzles for upwardly spraying the washing water mixed with the cleaning agent toward the roll sheet being transported by the action of the roll sheet conveying part, The pipe driving part is connected to the upper pipe part and the lower pipe part, and drives the upper pipe part and the lower pipe part in at least one direction in order to ensure the uniformity of spraying of the washing water mixed with the washing chemical sprayed onto the roll sheet, , The pipe driving unit is provided in a form in which parts are coupled to a driving housing coupled to one side of the unit cabinet,
The pipe driving part includes an upper slider connected to the upper pipe part and slidingly driving the upper pipe part, and an upper sliding plate disposed on the driving housing and connected to the upper slider and slidingly moved in a direction in which the upper pipe part is driven. and a lower slider connected to the lower pipe part and slidingly driving the lower pipe part; do,
A slider driving unit is provided in the pipe driving unit to alternately drive the upper slider and the lower slider, and the slider driving unit is provided in the driving housing and connected to the upper sliding plate and the lower sliding plate to form the upper slider and the lower slider. alternately driving the lower slider,
The slider driving unit includes a servomotor to which a speed reducer is connected and generating power, and a rotor disposed between the upper sliding plate and the lower sliding plate in the driving housing and connected to the servomotor and rotated by the operation of the servomotor. a rotating shaft; an upper cam plate connected to an upper end of the rotating shaft and rotating in the same manner as the rotating shaft; and an upper coupling member coupled to the upper cam plate via an upper long hole of the upper sliding plate; A lower cam plate connected to the lower end of the rotating shaft and co-rotated with the rotating shaft, and a lower coupling member coupled to the lower cam plate via a lower long hole of the lower sliding plate,
The first to third washing modules are disposed adjacent to the non-specific water washing module on the unit cabinet, and remove foreign substances remaining on the roll sheet by using water with respect to the roll sheet passing through the non-specific water washing module,
The first to third flush modules include a flush module housing and a plurality of water sprayers disposed on the upper and lower portions of the roll sheet being transported in the flush module housing and spraying water toward the roll sheet at corresponding positions. including,
The water removal module is disposed adjacent to the third flushing module on the unit cabinet, and with respect to the roll sheet that has passed the third flushing module, removes the remaining water on the roll sheet with wind,
The water removal module is disposed on the water removal module housing and the upper and lower portions of the roll sheet being transported in the water removal module housing, and a plurality of air spraying straight air toward the roll sheet at the corresponding position including a knife,
A first roll sheet drying unit, a tape peeling unit for etching resistance, a light irradiator for peeling, a tape recovery machine for etching resistance, and a roll sheet recovery unit are sequentially disposed behind the functional non-water washing unit process,
The first roll sheet drying unit is disposed behind the process of the functional non-water washing unit and dries the roll sheet that has been washed through the functional non-water washing unit, and the etching resistance tape peeling unit is the first etching unit. The etch-resistance tape is peeled off the etch-resistance tape disposed behind the process and laminated for the primary etching process, and the release light irradiator is directed toward the etch-resistance tape so that the etch-resistance tape is peeled from the roll sheet. ), and the etching resistance tape recovery device is disposed behind the process of the peeling light irradiator to recover the etching resistance tape peeled from the roll sheet by the action of the peeling light irradiator,
The etch-resistance tape collecting device includes a tape peeling driving roller that peels the etch-resistive tape from the roll sheet while rotating in contact with the etch-resisting tape, and the opposite side of the tape peeling driving roller with the roll sheet interposed therebetween A driven roller for tape peeling rotatably disposed on the a tape guide roller;
the roll sheet recovery unit is disposed opposite the roll sheet supply unit on the first process line, and recovers the roll sheet from which the first surface of the roll sheet is etched and the etching resistance tape is peeled;
In the second process line, an after-etching roll sheet supply unit, an etching resistance agent application unit, a second roll sheet drying unit, an etching resistance agent curing unit, a roll sheet cutting unit, a carrier laminating unit, and a second processing line along the direction in which the process is performed 2 etching units are arranged,
The post-etching roll sheet supply unit supplies the roll sheet, on which the etching process for the first surface is completed, to the second process line through the first process line,
After the etching, when the roll sheet supply unit supplies the roll sheet to the second process line, the surface etched in the first process line faces upward and the roll sheet on which the etching process for the first surface is completed is supplied to the second process line by the action of the second roll sheet driving roller, the second roll sheet driving roller driving the roll sheet of the roll sheet supply unit toward the roll sheet cutting unit after etching;
A second roll sheet buffer unit is provided behind the process of the post-etching roll sheet supply unit, wherein the second roll sheet buffer unit is disposed between the post-etched roll sheet supply unit and the etch-resistant applying unit, and after the etching adjusting the process speed between the roll sheet supply unit and the etch resistance agent application unit;
The etching resistor applying unit is provided behind the process of the second roll sheet buffer unit, and the etching resistor applying unit is applied to the first surface of the roll sheet on which the 1/2 etching process is completed on the first process line. Apply an etch-resistor,
The second roll sheet drying unit and the etching resistance curing unit are sequentially disposed behind the process of the etching resistance agent application unit,
The second roll sheet drying unit is disposed between the etch-resistant applying unit and the etch-resistant curing unit to dry the roll sheet on which the etch-resist is applied, and the etch-resistor-curing unit applies the etch-resistor disposed behind the unit to cure the etch resistance;
On the second process line, the roll sheet cutting unit is provided behind the process of the etching resistance curing unit, the roll sheet cutting unit is disposed behind the process of the etching resistor applying unit, and the roll sheet is cut into a unit size. cut into unit sheets,
The roll sheet cutting unit comprises a cutter (cutter) for cutting the roll sheet being transported while driving up and down, and a cutting die supporting the roll sheet to be cut,
An electric buffer roll is disposed in front of the spreading roller to compensate for the flow of the roll sheet in progress when the transfer of the roll sheet is stopped during the cutting operation of the roll sheet,
The carrier laminating unit is disposed behind the process of the roll sheet cutting unit and laminates a carrier on the unit sheet for transferring the unit sheet, and is intermediate between the carrier laminating unit and the sheet etching unit. a moving roller is disposed,
The sheet etching unit is disposed behind the process of the carrier laminating unit and performs an etching process on the second surface of the unit sheet,
A main pattern is formed on the unit sheet as the etching process is primarily performed through the first etching unit in the state of the roll sheet and the etching process is performed secondarily through the sheet etching unit in the state of the unit sheet,
The sheet etching unit is a variable speed second etching unit in which the speed is accelerated at the inlet and outlet through which the carrier is introduced and discharged,
The second etching unit includes a sheet-type unit body, a carrier moving module, a plurality of second etching solution spray modules, and a carrier acceleration module,
The sheet-type unit body part forms an exterior of the second etching unit, the sheet-type unit body part has a cabinet shape, and the carrier moving module is provided in the sheet-type unit body part and serves to move the carrier, and the carrier moves The module is applied with a roller strong against the etching solution, and the plurality of second etching solution spray modules are provided in the sheet-like unit body and spray the etching solution toward the unit sheet moving through the carrier moving module in the sheet-like unit body. and the carrier acceleration module is disposed on at least one side of an inlet through which the carrier is introduced and an outlet through which the carrier is discharged and serves to accelerate the carrier at the corresponding position,
The carrier acceleration module includes an inlet-side carrier acceleration module and an outlet-side carrier acceleration module, wherein the inlet-side carrier acceleration module is provided on the inlet side of the sheet-type unit body, and moves from the carrier laminating unit side into the sheet-type unit body. Accelerates the incoming speed of the carrier faster than the speed of the carrier moving module, the discharge-side carrier acceleration module is provided on the discharge side of the sheet-type unit body portion, the etching process is completed from the inside of the sheet-type unit body to the outside Accelerate the speed of the carrier discharged to the faster than the speed of the carrier moving module,
A position sensing unit and a controller are further provided for the operation of the inlet-side carrier acceleration module and the discharge-side carrier acceleration module,
The position detecting unit detects whether the carrier on which the unit sheet is laminated has reached the inlet or outlet, and the controller determines the operation of the carrier acceleration module and the inlet side based on the detection signal of the position detecting unit. A method of manufacturing a fine metal mask for controlling the operation of the carrier acceleration module and the operation of the discharge-side carrier acceleration module.
The method of claim 1,
In the step (b), the reinforcing adhesive material having a stronger interfacial adhesion with the photoresist than that of the fine metal plate is applied to both surfaces of the fine metal plate, a method of manufacturing a fine metal mask.
The method of claim 1,
In step (e), the pattern of the through holes is not formed by gravity during exposure of the fine metal plate adhered to the photoresist correspondingly, but is constant along imaginary lines parallel to the imaginary line in the center of the fine metal plate. A method of manufacturing a fine metal mask, which is uniformly formed at intervals.
The method of claim 1,
In step (d), the pattern holes of the photoresist are arranged without a change in the X position, as the X coordinate increases according to the following equation, based on the central coordinate at the center of the photoresist. A method of manufacturing a fine metal mask that is formed.

Here, y represents the Y position, α represents the target inclination (bending angle), x represents the X position, and c represents the value of the Y-intercept (target bending value).
The method of claim 1,
The reinforcing adhesive material is
a filler consisting of particles having a size of 2 nm to 500 nm; and
a binder for fixing the filler;
A method of manufacturing a fine metal mask comprising a.
a roll sheet wound in a roll shape and having photoresist formed on both sides thereof;
a roll sheet supply unit for supplying the roll sheet to a first process line in which an etching process is performed;
a first etching unit provided on one side of the first process line and performing an etching process on a first surface that is one surface of the roll sheet; and
a second etching unit for performing an etching process on a second surface, which is the other surface of the roll sheet;
including,
The pattern holes of the photoresist are formed in an arrangement without a change in the X position, the change in the Y position increases as the X coordinate increases with respect to the central coordinate located in the center of the photoresist,
By the etching process, a fine metal plate having a pattern of through holes formed on the mask sheet is generated, and a reinforcing adhesive material is applied to both surfaces of the fine metal plate, so that the photoresist is formed on both sides of the fine metal plate by the reinforcing adhesive material. is adhered, and the mask sheet is manufactured into a fine metal mask by sequentially passing through a plurality of processes on a first process line and a second process line, and the first process line is first etched on the roll sheet through a first etching unit A process is performed, and the second process line performs a secondary etching process on the unit sheet through a second etching unit,
The roll sheet is supplied to the first process line through which an etching process is performed by a roll sheet supply unit, and the first etching unit provided on one side of the first process line is applied to a first surface that is one side of the roll sheet. an etching process is performed, and the second etching unit performs an etching process on a second surface that is the other surface of the roll sheet, and an etching resistance tape is laminated on one surface of the roll sheet, The roll sheet on which the etching resistance tape is laminated is introduced into the first etching unit, and the first surface, which is one side of the roll sheet, is etched through the first etching unit,
The roll sheet on which the first side is etched is taken out from the first etching unit and then inverted so that the etched first side is placed on top, and then an etching resistance agent is applied to the area of the etched first side; After the etching resistance agent is applied to the etched first surface region of the roll sheet, the roll sheet is cut to form a unit sheet of a unit size, and then through the second etching unit, the unetched second surface The etching process for the area proceeds,
A carrier is laminated on the unit sheet, and the unit sheet laminated on the carrier is introduced into the second etching unit and the second surface, which is the remaining surface of the unit sheet, is etched through the second etching unit, a pattern is formed,
The first process line includes a roll sheet supply unit, a tape laminating unit for etching resistance, a pre-etching unit, a pre-cleaning and water removal unit, a first etching unit, a functional non-water washing unit, and a tape peeling for etching resistance along the direction in which the process is performed. A unit, and a roll sheet recovery unit are disposed,
The roll sheet supply unit supplies the roll sheet, which is wound and formed in a roll shape, to the first process line in which a primary etching process is performed,
A first roll sheet driving roller and a plurality of roll sheet guide rollers are provided to release the roll sheet through the roll sheet supply unit and supply it to the first process line,
The first roll sheet driving roller is disposed on the first process line between the roll sheet supply unit and the roll sheet recovery unit, and pulls the roll sheet with a driving force of a motor to move it toward the roll sheet recovery unit;
The roll sheet guide roller is disposed in various places in both the first process line and the second process line to guide the transport of the roll sheet while applying tension to the roll sheet,
The etching resistance tape laminating unit is disposed between the roll sheet supply unit and the first etching unit, and is released from the roll sheet supply unit before the etching process on the first surface of the roll sheet is performed to perform the first etching Laminating a tape for etching resistance on a second surface that is the other side of the roll sheet supplied to the unit,
The etch-resisting tape laminating unit includes a tape supply roller, a laminating drive roller, a laminating driven roller, a tape transfer roller, and a protective film recovery roller,
The tape supply roller supplies the etching resistance tape, the laminating driving roller is rotatably disposed on the second surface of the roll sheet, and receives the etching resistance tape supplied from the tape supply roller to receive the roll laminating on a second side of a sheet, wherein the laminating driven roller is rotatably disposed opposite the laminating drive roller with the roll sheet interposed therebetween, and the tape transfer roller is disposed between the tape supply roller and the laminating drive roller is disposed to pass the etch-resistance tape, and transfers the etch-resistance tape supplied from the tape supply roller to the laminating drive roller, and the protective film recovery roller is disposed adjacent to the tape transfer roller to deliver the tape transfer roller interacts with and recovers the protective film on the etch-resistance tape passing through the tape transfer roller,
A first roll sheet buffer unit, a pre-etching unit, and a pre-washing water remover are sequentially disposed behind the process of the etching-resisting tape laminating unit, and the first roll sheet buffer unit is disposed between the etching-resisting tape laminating unit and the pre-etching unit. is disposed to adjust a process speed between the tape laminating unit for etching resistance and the pre-etching unit, the pre-etching unit being disposed between the tape laminating unit for etching resistance and the first etching unit on the first process line, , performing pre-etching on the roll sheet before the roll sheet is drawn into the first etching unit and proceeds with the etching process,
The pre-etching unit includes a pre-etching tank filled with an etching solution, and a plurality of pre-etching guides provided in the pre-etching tank to guide the transport of the roll sheet so that the roll sheet can be discharged by being deepened in the etching solution in the pre-etching tank including a roller;
The pre-cleaning water eliminator is disposed between the pre-etching unit and the first etching unit, and washes and removes water from the roll sheet on which the pre-etching process has been performed, and the pre-cleaning water remover is disposed toward the roll sheet with water ( a pre-washer for washing the roll sheet while spraying water), and an air knife for removing water remaining on the surface of the roll sheet after washing is completed with wind, wherein the first An etching unit is provided,
The first etching unit includes a roll sheet etching cabinet, the roll sheet etching cabinet has a cabinet structure, and a plurality of etching rooms for performing an etching process for the roll sheet are formed therein, the etching rooms are communicated with each other, , the roll sheet etching cabinet is provided with a roll sheet inlet roller part and a roll sheet take out roller part, and the roll sheet inlet roller part is disposed in an entrance area of the roll sheet etching cabinet, and the roll sheet is disposed inside the roll sheet etching cabinet. and the roll sheet take-out roller unit is disposed in an exit area of the roll sheet etching cabinet and draws out (discharges) the roll sheet to the outside of the roll sheet etching cabinet, and a plurality of first An etchant spray module is provided, and the first etchant spray modules spray an etchant in a spray manner toward the roll sheet being transported in the roll sheet etching cabinet to etch half of the first surface, which is one side of the roll sheet. let the process go on,
A functional non-water washing unit is provided behind the process of the first etching unit, the functional non-water washing unit is directly connected to the outlet of the first etching unit, and the etching process is performed using washing water or water mixed with a cleaning agent. Remove the etching solution or foreign material remaining on the completed roll sheet,
In the functional non-specific water washing unit, a unit cabinet, a non-specific water washing module, first to third washing modules, and a water removal module are integrally mounted on the unit cabinet,
The unit cabinet forms the exterior of the functional non-specific water washing unit, and a foot for height adjustment and ground support is disposed at a lower end of the unit cabinet, and the non-specific water washing module and the first to third flushing modules are located on the rear side of the unit cabinet. Means for supplying the washing water or water mixed with the cleaning agent to the module in a fixed amount and a positive pressure are provided, and a first drain part and a second drain part are provided under the unit cabinet, and the first drain part is a part of the unit cabinet. It is disposed on one side of the lower part and receives washing water mixed with washing chemicals falling from the non-specific water washing module and drains it, and the second drain part is disposed on the other lower side of the unit cabinet and falls from the first to third washing modules. Receive and drain the water,
The non-specific water washing module is provided on an upper side of the unit cabinet and uses washing water mixed with a cleaning agent to remove the etching solution remaining on the roll sheet on which the etching process is completed,
The non-specific water washing module includes a non-specific water washing module housing, a roll sheet transfer part, an upper pipe part, a lower pipe part, and a pipe driving part,
The non-specific water washing module housing is an exterior frame having a box-shaped cabinet shape, an inlet through which the roll sheet flows is formed on one side of the non-specific water washing module housing, and the roll sheet flowing into the inlet includes the non-specific water washing module and the first After passing through the first to third washing modules and the water removal module in sequence, the water is discharged to the discharge part of the water removal module housing and then directed to the first roll sheet drying unit,
The roll sheet transport unit is disposed in the non-specific water washing module housing, transports the roll sheet passing through the inlet to the first to third washing modules, and is formed by a combination of a plurality of rollers and gears, and the upper pipe part A plurality of upper injection nozzles are provided on the upper portion of the roll sheet transfer unit, and the upper pipe portion sprays down washing water mixed with a cleaning agent toward the roll sheet being transferred under the action of the roll sheet transfer unit, and the lower portion The pipe part is disposed under the upper pipe part, and the lower pipe part is provided with a plurality of lower injection nozzles for upwardly spraying the washing water mixed with the cleaning agent toward the roll sheet being transported by the action of the roll sheet conveying part, The pipe driving part is connected to the upper pipe part and the lower pipe part, and drives the upper pipe part and the lower pipe part in at least one direction in order to ensure the uniformity of spraying of the washing water mixed with the washing chemical sprayed onto the roll sheet, , The pipe driving unit is provided in a form in which parts are coupled to a driving housing coupled to one side of the unit cabinet,
The pipe driving part includes an upper slider connected to the upper pipe part and slidingly driving the upper pipe part, and an upper sliding plate disposed on the driving housing and connected to the upper slider and slidingly moved in a direction in which the upper pipe part is driven. and a lower slider connected to the lower pipe part and slidingly driving the lower pipe part; do,
A slider driving unit is provided in the pipe driving unit to alternately drive the upper slider and the lower slider, and the slider driving unit is provided in the driving housing and connected to the upper sliding plate and the lower sliding plate to form the upper slider and the lower slider. alternately driving the lower slider,
The slider driving unit includes a servomotor to which a speed reducer is connected and generating power, and a rotor disposed between the upper sliding plate and the lower sliding plate in the driving housing and connected to the servomotor and rotated by the operation of the servomotor. a rotating shaft; an upper cam plate connected to an upper end of the rotating shaft and rotating in the same manner as the rotating shaft; and an upper coupling member coupled to the upper cam plate via an upper long hole of the upper sliding plate; A lower cam plate connected to the lower end of the rotating shaft and co-rotated with the rotating shaft, and a lower coupling member coupled to the lower cam plate via a lower long hole of the lower sliding plate,
The first to third washing modules are disposed adjacent to the non-specific water washing module on the unit cabinet, and remove foreign substances remaining on the roll sheet by using water with respect to the roll sheet passing through the non-specific water washing module,
The first to third flush modules include a flush module housing and a plurality of water sprayers disposed on the upper and lower portions of the roll sheet being transported in the flush module housing and spraying water toward the roll sheet at corresponding positions. including,
The water removal module is disposed adjacent to the third flushing module on the unit cabinet, and with respect to the roll sheet that has passed the third flushing module, removes the remaining water on the roll sheet with wind,
The water removal module is disposed on the water removal module housing and the upper and lower portions of the roll sheet being transported in the water removal module housing, and a plurality of air spraying straight air toward the roll sheet at the corresponding position including a knife,
A first roll sheet drying unit, a tape peeling unit for etching resistance, a light irradiator for peeling, a tape recovery machine for etching resistance, and a roll sheet recovery unit are sequentially disposed behind the functional non-water washing unit process,
The first roll sheet drying unit is disposed behind the process of the functional non-water washing unit and dries the roll sheet that has been washed through the functional non-water washing unit, and the etching resistance tape peeling unit is the first etching unit. The etch-resistance tape is peeled off the etch-resistance tape disposed behind the process and laminated for the primary etching process, and the release light irradiator is directed toward the etch-resistance tape so that the etch-resistance tape is peeled from the roll sheet. ), and the etching resistance tape recovery device is disposed behind the process of the peeling light irradiator to recover the etching resistance tape peeled from the roll sheet by the action of the peeling light irradiator,
The etch-resistance tape collecting device includes a tape peeling driving roller that peels the etch-resistive tape from the roll sheet while rotating in contact with the etch-resisting tape, and the opposite side of the tape peeling driving roller with the roll sheet interposed therebetween A driven roller for tape peeling rotatably disposed on the a tape guide roller;
the roll sheet recovery unit is disposed opposite the roll sheet supply unit on the first process line, and recovers the roll sheet from which the first surface of the roll sheet is etched and the etching resistance tape is peeled;
In the second process line, an after-etching roll sheet supply unit, an etching resistance agent application unit, a second roll sheet drying unit, an etching resistance agent curing unit, a roll sheet cutting unit, a carrier laminating unit, and a second processing line along the direction in which the process is performed 2 etching units are arranged,
The post-etching roll sheet supply unit supplies the roll sheet, on which the etching process for the first surface is completed, to the second process line through the first process line,
After the etching, when the roll sheet supply unit supplies the roll sheet to the second process line, the surface etched in the first process line faces upward and the roll sheet on which the etching process for the first surface is completed is supplied to the second process line by the action of the second roll sheet driving roller, the second roll sheet driving roller driving the roll sheet of the roll sheet supply unit toward the roll sheet cutting unit after etching;
A second roll sheet buffer unit is provided behind the process of the post-etching roll sheet supply unit, wherein the second roll sheet buffer unit is disposed between the post-etched roll sheet supply unit and the etch-resistant applying unit, and after the etching adjusting the process speed between the roll sheet supply unit and the etch resistance agent application unit;
The etching resistor applying unit is provided behind the process of the second roll sheet buffer unit, and the etching resistor applying unit is applied to the first surface of the roll sheet on which the 1/2 etching process is completed on the first process line. Apply an etch-resistor,
The second roll sheet drying unit and the etching resistance curing unit are sequentially disposed behind the process of the etching resistance agent application unit,
The second roll sheet drying unit is disposed between the etch-resistant applying unit and the etch-resistant curing unit to dry the roll sheet on which the etch-resist is applied, and the etch-resistor-curing unit applies the etch-resistor disposed behind the unit to cure the etch resistance;
On the second process line, the roll sheet cutting unit is provided behind the process of the etching resistance curing unit, the roll sheet cutting unit is disposed behind the process of the etching resistor applying unit, and the roll sheet is cut into a unit size. cut into unit sheets,
The roll sheet cutting unit comprises a cutter (cutter) for cutting the roll sheet being transported while driving up and down, and a cutting die supporting the roll sheet to be cut,
An electric buffer roll is disposed in front of the spreading roller to compensate for the flow of the roll sheet in progress when the transfer of the roll sheet is stopped during the cutting operation of the roll sheet,
The carrier laminating unit is disposed behind the process of the roll sheet cutting unit and laminates a carrier on the unit sheet for transferring the unit sheet, and is intermediate between the carrier laminating unit and the sheet etching unit. a moving roller is disposed,
The sheet etching unit is disposed behind the process of the carrier laminating unit and performs an etching process on the second surface of the unit sheet,
A main pattern is formed on the unit sheet as the etching process is primarily performed through the first etching unit in the state of the roll sheet and the etching process is performed secondarily through the sheet etching unit in the state of the unit sheet,
The sheet etching unit is a variable speed second etching unit in which the speed is accelerated at the inlet and outlet through which the carrier is introduced and discharged,
The second etching unit includes a sheet-type unit body, a carrier moving module, a plurality of second etching solution spray modules, and a carrier acceleration module,
The sheet-type unit body part forms an exterior of the second etching unit, the sheet-type unit body part has a cabinet shape, and the carrier moving module is provided in the sheet-type unit body part and serves to move the carrier, and the carrier moves The module is applied with a roller strong against the etching solution, and the plurality of second etching solution spray modules are provided in the sheet-like unit body and spray the etching solution toward the unit sheet moving through the carrier moving module in the sheet-like unit body. and the carrier acceleration module is disposed on at least one side of an inlet through which the carrier is introduced and an outlet through which the carrier is discharged and serves to accelerate the carrier at the corresponding position,
The carrier acceleration module includes an inlet-side carrier acceleration module and an outlet-side carrier acceleration module, wherein the inlet-side carrier acceleration module is provided on the inlet side of the sheet-type unit body, and moves from the carrier laminating unit side into the sheet-type unit body. Accelerates the incoming speed of the carrier faster than the speed of the carrier moving module, the discharge-side carrier acceleration module is provided on the discharge side of the sheet-type unit body portion, the etching process is completed from the inside of the sheet-type unit body to the outside Accelerate the speed of the carrier discharged to the faster than the speed of the carrier moving module,
A position sensing unit and a controller are further provided for the operation of the inlet-side carrier acceleration module and the discharge-side carrier acceleration module,
The position detecting unit detects whether the carrier on which the unit sheet is laminated has reached the inlet or outlet, and the controller determines the operation of the carrier acceleration module and the inlet side based on the detection signal of the position detecting unit. A fine metal mask manufacturing system for controlling the operation of the carrier acceleration module and the operation of the discharge-side carrier acceleration module.
7. The method of claim 6,
The reinforcing adhesive material having a stronger interfacial adhesion with the photoresist than that of the fine metal plate is applied to both surfaces of the fine metal plate, the fine metal mask manufacturing system.
7. The method of claim 6,
The pattern of the through holes in the fine metal plate is not formed by gravity during exposure of the fine metal plate adhered to the photoresist correspondingly, but at regular intervals along imaginary lines parallel to the imaginary line in the center of the fine metal plate. A uniformly formed, fine metal mask manufacturing system.
7. The method of claim 6,
The pattern holes of the photoresist, based on the central coordinates in the center of the photoresist, according to the following equation, the change in the Y position increases as the X coordinate increases, and the change in the Y position increases, and is formed to be arranged without a change in the X position, fine metal Mask manufacturing system.

Here, y represents the Y position, α represents the target inclination (bending angle), x represents the X position, and c represents the value of the Y-intercept (target bending value).
7. The method of claim 6,
The reinforcing adhesive material is
a filler consisting of particles having a size of 2 nm to 500 nm; and
a binder for fixing the filler;
A fine metal mask manufacturing system comprising a.
7. The method of claim 6,
The adhesive force between the reinforcing adhesive material and the photoresist is 1.5 kgf/in to 2.5 kgf/in.
7. The method of claim 6,
The adhesive force between the reinforcing adhesive material and the micrometal plate is 2.0 kgf/in to 3.0 kgf/in.

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