KR102244468B1 - Photosensitive resin composition, black pixel defining layer using the same and display device - Google Patents

Abstract

(상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)(A) alkali-soluble resin containing a polymer having a structural unit represented by the following formula (1); (B) a black colorant; (C) photopolymerizable monomer; (D) photoinitiator; And (E) a photosensitive resin composition containing a solvent, a black pixel partition layer prepared using the same, and a display device including the black pixel partition layer layer.
[Formula 1]

(In Formula 1, each substituent is as defined in the specification.)

Description

Photosensitive resin composition, black pixel barrier layer and display device using the same {PHOTOSENSITIVE RESIN COMPOSITION, BLACK PIXEL DEFINING LAYER USING THE SAME AND DISPLAY DEVICE}

The present description relates to a photosensitive resin composition, a black pixel partition wall layer and a display device using the same.

The photosensitive resin composition is an essential material for manufacturing display devices such as color filters, liquid crystal display materials, display devices such as organic light emitting devices, and display device panel materials. For example, a color filter such as a color liquid crystal display requires a black pixel partition layer at the boundary between colored layers such as red, green, and blue in order to increase the display contrast or color development effect. , This black pixel partition wall layer is mainly formed of a photosensitive resin composition.

In particular, the pixel barrier layer used as a material for the display panel is mostly a transparent material, and has problems such as outdoor visibility, a viewing angle, and high reflection of external light.

Accordingly, in order to increase the optical density, a black pixel partition layer was also manufactured using a photosensitive resin composition using carbon black as a colorant, but in this case, the transmittance of light in the infrared region is low, making it difficult to patterning processes such as alignment. There is this. In addition, even if the patterning process is possible by using an organic black pigment instead of carbon black as a colorant, the transmittance to light in the UV region is low, and thus there is a problem such as a decrease in heat resistance due to a decrease in the light crosslinking rate, and inability to realize a step difference. Accordingly, the composition used for manufacturing the black pixel partition layer had to use an excessive amount of initiator for proper sensitivity, and thus the outgas characteristics were inevitably bad.

Accordingly, research to develop a photosensitive resin composition for manufacturing a black pixel barrier layer capable of solving the above problem is ongoing.

One embodiment is to provide a photosensitive resin composition capable of significantly reducing outgassing and improving sensitivity by increasing a photocrosslinking rate by using a polymer having high heat resistance into which a reactive group capable of photocrosslinking is introduced as an alkali-soluble resin.

Another embodiment is to provide a black pixel partition wall layer manufactured using the photosensitive resin composition.

Another embodiment is to provide a display device including the black pixel barrier layer.

One embodiment is (A) an alkali-soluble resin containing a polymer having a structural unit represented by the following formula (1); (B) a black colorant; (C) photopolymerizable monomer; (D) photoinitiator; And (E) It provides a photosensitive resin composition containing a solvent.

[Formula 1]

In Formula 1,

L ¹ is represented by the following formula (2),

L ² is a substituted or unsubstituted C1 to C20 alkylene group,

[Formula 2]

In Chemical Formula 2,

R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

L ³ is a single bond or represented by the following formula (3),

[Formula 3]

In Chemical Formula 3,

L ⁴ and L ⁵ are each independently a substituted or unsubstituted C1 to C10 alkylene group,

n is an integer from 0 to 5.

Formula 2 may be represented by the following Formula 2-1.

[Formula 2-1]

In Formula 2-1,

R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

L ³ is a single bond or represented by Chemical Formula 3.

R ¹ may be a hydrogen atom.

The polymer may include a functional group represented by the following formula (4) at both ends.

[Formula 4]

In Chemical Formula 4,

R ² is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group.

R ² may be a substituted or unsubstituted C1 to C10 alkyl group.

The polymer may further include a silicone diamine structural unit.

The silicone diamine structural unit may be represented by the following formula (5).

[Formula 5]

In Chemical Formula 5,

L ⁶ to L ⁸ are each independently a substituted or unsubstituted C1 to C20 alkylene group,

R ³ to R ⁶ are each independently a substituted or unsubstituted C1 to C20 alkyl group.

The polymer may have a weight average molecular weight of 5,000 g/mol to 20,000 g/mol.

The black colorant may include an inorganic black pigment, an organic black pigment, or a combination thereof.

The organic black pigment may be a mixture of two or more selected from the group consisting of a red pigment, a green pigment, a blue pigment, and a violet pigment.

The photosensitive resin composition, based on the total amount of the photosensitive resin composition, the (A) alkali-soluble resin 1% by weight to 20% by weight; (B) 1% to 20% by weight of the black colorant; 1% to 15% by weight of the (C) photopolymerizable monomer; (D) 0.1% to 5% by weight of the photopolymerization initiator; And the residual amount of the (E) solvent.

The photosensitive resin composition may further include an additive of malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a fluorine-based surfactant, a radical polymerization initiator, or a combination thereof.

Another embodiment provides a black pixel defining layer manufactured using the photosensitive resin composition.

Another embodiment provides a display device including the black pixel barrier layer.

The display device may be a liquid crystal display device (LCD) or an organic light emitting device (OLED).

Other specifics of aspects of the present invention are included in the detailed description below.

The photosensitive resin composition according to an embodiment may provide a black pixel partition wall layer having high sensitivity and low out-gas characteristics by including a polymer in which a reactor having excellent heat resistance and advantageous for photocrosslinking is introduced as an alkali-soluble resin.

Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified in the specification, "alkyl group" refers to a C1 to C20 alkyl group, "alkenyl group" refers to a C2 to C20 alkenyl group, and "cycloalkenyl group" refers to a C3 to C20 cycloalkenyl group. , "Heterocycloalkenyl group" refers to a C3 to C20 heterocycloalkenyl group, "aryl group" refers to a C6 to C20 aryl group, and "arylalkyl group" refers to a C6 to C20 arylalkyl group, and "alkylene group" Refers to a C1 to C20 alkylene group, "arylene group" refers to a C6 to C20 arylene group, "alkylarylene group" refers to a C6 to C20 alkylarylene group, and "heteroarylene group" refers to a C3 to C20 hetero It means an arylene group, and the "alkoxyl group" means a C1 to C20 alkoxyl group.

Unless otherwise specified in the specification, "substituted" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or salt thereof, sulfonic acid group or salt thereof, phosphoric acid or salt thereof, C1 To C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 To C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof.

In addition, unless otherwise specified in the specification, "hetero" means that at least one hetero atom of at least one of N, O, S, and P is included in the formula.

In addition, unless otherwise specified in the specification, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" refers to "acrylic acid" and "methacrylic acid. "It means both are possible.

Unless otherwise specified in the specification, "combination" means mixing or copolymerization.

Unless otherwise specified in the specification, the unsaturated bond includes not only multiple bonds between carbon-carbon atoms, but also other molecules such as carbonyl bonds and azo bonds.

Unless otherwise specified in the specification, the maximum transmittance and maximum absorbance range refers to a range within a range of 330 nm to 900 nm, and a range of less than 330 nm and more than 900 nm is not considered.

In addition, unless otherwise specified in the specification, "*" means a moiety connected with the same or different atom or chemical formula.

The photosensitive resin composition according to an embodiment includes (A) an alkali-soluble resin including a polymer having a structural unit represented by the following formula (1); (B) a black colorant; (C) photopolymerizable monomer; (D) photoinitiator; And (E) a solvent.

[Formula 1]

In Formula 1,

L ¹ is represented by the following formula (2),

L ² is a substituted or unsubstituted C1 to C20 alkylene group,

[Formula 2]

In Chemical Formula 2,

R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

L ³ is a single bond or represented by the following formula (3),

[Formula 3]

In Chemical Formula 3,

L ⁴ and L ⁵ are each independently a substituted or unsubstituted C1 to C10 alkylene group,

n is an integer from 0 to 5.

The pixel barrier layer, which is currently applied to a display device, is a transparent material and has problems such as outdoor visibility, a viewing angle, and high reflection of external light. In order to compensate for these problems, there is a growing need in the industry for a pixel barrier layer with improved optical properties. Specifically, there is a growing demand for a pixel barrier layer having improved sensitivity and outgas characteristics while retaining the advantages of the existing pixel barrier layer such as heat resistance and low-out gas.

In the conventional case, carbon black (inorganic black) or organic black was used to sufficiently use a light source, and an excessive amount of initiator had to be used for proper sensitivity. As a result, it was an inevitable phenomenon that the outgas characteristics were deteriorated. In order to solve this problem, it has come to develop a photosensitive resin composition capable of producing a pixel partition layer having high sensitivity and low out-gas characteristics using a polymer having high heat resistance into which a photo-crosslinkable reactor is introduced.

Hereinafter, each component will be described in detail.

(A) alkali-soluble resin

The alkali-soluble resin constituting the photosensitive resin composition according to an embodiment includes a polymer having a structural unit represented by Chemical Formula 1. By including the polymer, it has excellent heat resistance, and the sensitivity and outgas characteristics can be improved. In particular, since the linking group represented by Chemical Formula 2 favors optical crosslinking, it may play a large role in reducing outgassing.

Formula 2 may be represented by the following Formula 2-1.

[Formula 2-1]

In Formula 2-1,

R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

L ³ is a single bond or represented by Chemical Formula 3.

For example, R ¹ may be a hydrogen atom. When R ¹ is a hydrogen atom, the polymer has an acrylic group in the structure, and thus it may be more effective in reducing outgassing.

The polymer may include a functional group represented by the following formula (4) at both ends.

[Formula 4]

In Chemical Formula 4,

R ² is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group.

For example, R ² may be a substituted or unsubstituted C1 to C10 alkyl group. When R ² is an alkyl group, the polymer has an acrylic group substituted with an alkyl group such as a methacrylic group at both ends, and thus it may be more effective in reducing outgassing.

That is, when the polymer has an acrylic group (without substitution of an alkyl group, etc.) in a structure other than the terminal, and has a methacrylic group (with an alkyl group or the like substituted) at both ends, the outgas characteristics will be greatly improved (outgas reduction). I can.

The polymer may further include a silicone diamine structural unit.

When the polymer further includes the silicone diamine structural unit, the taper angle of the pattern is lowered, thereby helping to improve patternability and processability.

The silicone diamine structural unit may be represented by the following formula (5).

[Formula 5]

In Chemical Formula 5,

L ⁶ to L ⁸ are each independently a substituted or unsubstituted C1 to C20 alkylene group,

R ³ to R ⁶ are each independently a substituted or unsubstituted C1 to C20 alkyl group.

For example, the polymer may have a weight average molecular weight of 5,000 g/mol to 20,000 g/mol, for example, 6,000 g/mol to 10,000 g/mol. When the weight average molecular weight of the polymer is within the above range, it has excellent pattern formation, and the prepared thin film may have excellent mechanical and thermal properties.

The alkali-soluble resin may be included in an amount of 1% to 20% by weight, such as 5% to 15% by weight, such as 10% to 15% by weight, based on the total amount of the photosensitive resin composition. When the alkali-soluble resin is included within the above range, excellent sensitivity, developability, resolution, and straightness of the pattern can be obtained.

(B) black colorant

The black colorant may include a pigment, dye, or a combination thereof having high transmittance in the ultraviolet region (300 nm to 400 nm wavelength region) and high light-shielding property in the visible region in order to increase photocuring efficiency.

Specifically, the black colorant has a value of "maximum transmittance in a wavelength range of 350nm to 400nm / transmittance in a wavelength of 550nm" of 1.5 or more.

The inventors of the present invention, after repeated research, when using a black colorant having a value of 1.5 or more of "maximum transmittance in the 350nm to 400nm wavelength range / transmittance in the 550nm wavelength" when preparing a photosensitive resin composition, In addition, through a light source in the UV range, it has excellent heat resistance by increasing photocurability. Also, the high transmittance of the UV range makes it possible to easily align, so that the exposure process can be easily performed. It was confirmed that it can be implemented. The 550nm wavelength is the wavelength at the time of measuring the optical density, and 350nm to 400nm is the wavelength range where the photopolymerization initiator most efficiently initiates the photoinitiation reaction.The photopolymerization initiator is the most efficient photoinitiation reaction compared to the transmittance at the wavelength at the time of measuring the optical density. The higher the maximum transmittance in the wavelength region causing the light, the better the light blocking of visible light and the heat resistance through the light source in the UV region can be obtained.In particular, the photopolymerization initiator is the most efficient initiating light compared to the transmittance at the wavelength when measuring the optical density. When the maximum transmittance in the wavelength region causing the reaction has a value of 1.5 times or more, the photocombination efficiency and heat resistance can be greatly increased, and at the same time, the transmittance in the infrared wavelength region is also high, making the exposure process easier and 1㎛ It is also possible to implement a level of step difference.

For example, the black colorant may include an inorganic black pigment, an organic black pigment, or a combination thereof.

For example, the black colorant may be an organic black pigment.

When inorganic black pigments such as aniline black, perylene black, titanium black, and carbon black are used alone as a black colorant, excellent light-shielding properties can be achieved, but the development process is performed in a state where only surface curing is performed without internal curing. It can be difficult to maximize the process margin.

For example, the organic black pigment may include a red pigment, a green pigment, a blue pigment, a violet pigment, or a combination thereof. For example, the organic black pigment may be a mixture of two or more selected from the group consisting of a red pigment, a green pigment, a blue pigment, and a violet pigment.

The red pigment is CI red pigment 179, CI red pigment 254, CI red pigment 255, CI red pigment 264, CI red pigment 270, CI red pigment 272, CI red pigment 177, CI red pigment within the Color Index. 89 and the like may be used, and these may be used alone or in combination of two or more, but are not limited thereto.

The green pigment is C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Green 37, C.I. Pigment Green 58, C.I. Pigment Green 59, C.I. Pigment green 62 and the like may be mentioned, and these may be used alone or in combination of two or more, but are not limited thereto.

The blue pigment is C.I. Blue pigment 15:6, C.I. Blue pigment 15:0, C.I. Blue pigment 15:1, C.I. Blue pigment 15:2, C.I. Blue pigment 15:3, C.I. Blue pigment 15:4, C.I. Blue pigment 15:5, C.I blue pigment 15:6, C.I. Blue pigment 16 and the like may be used, and these may be used alone or in combination of two or more, but are not limited thereto.

The violet pigment is C.I. Violet pigment 29, dioxazine violet, first violet B, methyl violet lake, indanthrene brilliant violet, and the like may be used, and these may be used alone or in combination of two or more, but are not limited thereto.

For example, the black colorant according to an embodiment may be used in the form of a dispersion, and the dispersion may include a solid pigment, a dispersant, a solvent, and the like. In this case, the solid content of the pigment may be included in 5% by weight to 30% by weight, such as 8% by weight to 15% by weight, such as 8% by weight to 12% by weight, based on the total amount of the pigment dispersion. In this case, effective dispersion of the pigment can be achieved, and dispersion stability can be ensured.

The black colorant may have a maximum transmittance value in a wavelength region of 800 nm or more than a maximum transmittance value in a wavelength region of 450 nm to 700 nm. That is, the black colorant also has a high transmittance to light in the infrared region, so that the patterning process is efficiently performed.

The black colorant may be included in an amount of 1% to 20% by weight, such as 2% to 15% by weight, based on a solid content based on the total amount of the photosensitive resin composition. When the solid content of the black colorant is included within the above range, the coloring effect and development performance are excellent.

(C) photopolymerizable monomer

The photopolymerizable monomer may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.

Since the photopolymerizable monomer has the ethylenically unsaturated double bond, sufficient polymerization can occur during exposure in the pattern formation process to form a pattern having excellent heat resistance, light resistance and chemical resistance.

The photopolymerizable monomer is, for example, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, neopentyl glycol di ( Meth)acrylate, 1,4-butanedioldi(meth)acrylate, 1,6-hexanedioldi(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritoldi(meth)acrylate, penta Erythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate , Dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylolpropane tri (meth) Acrylate, tris(meth)acryloyloxyethylphosphate, novolacepoxy(meth)acrylate　, or a combination thereof.

For example, commercially available products of the photopolymerizable monomer are as follows. The (meth) acrylic acid is one example of a polyfunctional ester, doah Gosei cultivating the T (weeks)社Aronix M-101 ^®, the same M-111 ^®, the same M-114 ^®, and the like; ^{KAYARAD TC-110S ®} of Nihon Kayaku Co., Ltd., TC-120S ^®, etc.; Osaka yukki cultivate may be a T (weeks)社of ^{V-158 ®, V-2311} ® and the like. The (meth) transfer function of an example esters of acrylic acid are, doah Gosei cultivating the T (weeks)社of Aronix M-210 ^®, copper or the like M-240 ^®, the same M-6200 ^{®; KAYARAD HDDA ®} , HX-220 ^® , R-604 ^{® of} Nihon Kayaku Co., Ltd.; ^{Examples include V-260 ®} , V-312 ^® , and V-335 HP ^{® from} Osaka Yuki Chemical High School Co., Ltd. Examples of the tri-functional ester of (meth) acrylic acid, doah Gosei the cultivating T (weeks)社of Aronix M-309 ^®, the same M-400 ^®, the same M-405 ^®, the same M-450 ^®, Dong M ^® -7100, Dong M-8030 ^®, same M-8060 ^®, and the like; Nippon Kayaku (Note)社of KAYARAD TMPTA ^®, copper DPCA-20 ^{®, ®} copper -30, -60 ^® copper, copper ^® -120 and the like; ^{V-295 ®} , East-300 ^® , East-360 ^® , East-GPT ^® , East-3PA ^® , and East-400 ^{® from} Osaka Yukigayaku High School Co., Ltd. are listed. The above products can be used alone or in combination of two or more.

The photopolymerizable monomer may be used after treatment with an acid anhydride in order to impart better developability.

The photopolymerizable monomer may be included in an amount of 1% to 15% by weight, such as 3% to 10% by weight, based on the total amount of the photosensitive resin composition. When the photopolymerizable monomer is included within the above range, 　 curing occurs sufficiently during exposure in the pattern formation process, resulting in excellent reliability, heat resistance, light resistance and chemical resistance of the pattern, and resolution and adhesion are also excellent.

(D) photopolymerization initiator

The photopolymerization initiator may have a maximum absorbance at 350 nm to 400 nm. For example, the photopolymerization initiator may have a maximum absorbance at 360 nm to 390 nm.

When preparing the photosensitive resin composition, when the photopolymerization initiator is used together with the aforementioned black colorant, internal curing is efficiently performed while showing black color, thereby maximizing the process margin, and also improving the photocuring efficiency.

As the photoinitiator, a benzophenone compound, a thioxanthone compound, a benzoin compound, a triazine compound, an oxime compound, an acetophenone compound, or a combination thereof may be used.

Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylate benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-Bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

Examples of the thioxanthone-based compound include thioxanthone, 2-methyl thioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- And chlorothioxanthone.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4' -Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine , 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine , 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)- 4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4 -Bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, 2-[4 -(4-ethylphenyl)-phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine, etc. are mentioned.

Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. Can be used. Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-oneoxime-O-acetate, 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime- O-acetate can be used.

For example, the photopolymerization initiator having a maximum absorbance at 350 nm to 400 nm may be an oxime compound. For example, the photopolymerization initiator having a maximum absorbance at 350 nm to 400 nm may include an O-acyloxime compound, but is not limited thereto.

Examples of the acetophenone-based compound include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -One, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, bis(2,4,6-trimethybenzoyl)phenylphosphine oxide, etc. are mentioned. .

In addition to the above compounds, the photoinitiator may be a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, or a biimidazole compound.

The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and becoming excited and then transferring the energy.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, etc. Can be mentioned.

The photopolymerization initiator may be included in an amount of 0.1% to 5% by weight, such as 0.5% to 3% by weight, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, curing occurs sufficiently during exposure in the pattern formation process to obtain excellent reliability, excellent heat resistance, light resistance, and chemical resistance of the pattern, excellent resolution and adhesion, and an unreacted initiator It is possible to prevent the decrease in transmittance due to.

(E) solvent

The solvent may be materials that have compatibility with the black colorant, the photopolymerization initiator, the photopolymerizable monomer, and the alkali-soluble resin, but do not react.

Examples of the solvent include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol dimethyl ether (EDM); Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; Carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; Lactate esters such as methyl lactate and ethyl lactate; Oxyacetate alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxyacetic acid alkyl esters such as methyl methoxy acetate, ethyl methoxy acetate, butyl methoxy acetate, methyl ethoxy acetate, and ethyl ethoxy acetate; 3-oxypropionic acid alkyl esters such as 3-oxypropionate methyl and 3-oxypropionate ethyl; 3-alkoxypropionic acid alkyl esters such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as 2-oxypropionate methyl, 2-oxypropionate ethyl, and 2-oxypropionate propyl; 2-alkoxypropionic acid alkyl esters such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methylpropionic acid esters such as 2-oxy-2-methylpropionate methyl and 2-oxy-2-methylethylpropionate, 2-methoxy-2-methylpropionate methyl, 2-ethoxy-2- Monooxymonocarboxylic acid alkyl esters of alkyl 2-alkoxy-2-methylpropionic acid such as ethyl methylpropionate; Esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutanoate; Ketone acid esters such as ethyl pyruvate, etc., and also N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, capronic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid And high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.

Among these, in consideration of compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, and ethylene glycol diethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as ethyl 2-hydroxypropionate; Carbitols such as diethylene glycol monomethyl ether and diethylene glycol ethyl methyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate may be used.

The solvent may be included in a balance, such as 30% to 80% by weight, such as 30% to 70% by weight, based on the total amount of the photosensitive resin composition. When the solvent is included within the above range, the photosensitive resin composition has an appropriate viscosity, and thus the processability is excellent in manufacturing the black pixel barrier layer.

(F) other additives

Meanwhile, the photosensitive resin composition may further include an additive of malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a fluorine-based surfactant, a radical polymerization initiator, or a combination thereof.

The silane-based coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, or an epoxy group in order to improve adhesion to the substrate.

Examples of the silane-based coupling agent include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanate propyltriethoxysilane, and γ-gly Cidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane-based coupling agent is included within the above range, adhesion and storage properties are excellent.

In addition, the photosensitive resin composition may further include a surfactant, such as a fluorine-based surfactant, to improve coating properties and prevent defects from being generated, if necessary.

The fluorine is a surfactant, the ^{BM Chemie社BM-1000 ®,} BM-1100 ® , and the like; ^{Mechapack F 142D ®} , F 172 ^® , F 173 ^® , F 183 ^® , F 554 ^{® of} Dai Nippon Ink and Chemical High School Co., Ltd.; Sumitomo M. (Note)社Pro rod FC-135 ^®, the same FC-170C ^®, copper FC-430 ^®, the same FC-431 ^®, and the like; Asahi Grass Co., Saffron S-112 ^® of社, such S-113 ^®, the same S-131 ^®, the same S-141 ^®, the same S-145 ^®, and the like; Toray Silicone ^® (Note)社SH-28PA, the same -190 ^®, may be used a fluorine-containing surfactants commercially available under the name such as copper ^{-193 ®, SZ-6032 ®,} SF-8428 ®.

The fluorine-based surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included within the above range, coating uniformity is ensured, stains do not occur, and wetting properties for IZO substrates or glass substrates are excellent.

In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.

As the photosensitive resin composition according to an embodiment has the above-described composition, the near-infrared transmittance may be 40% or more, for example, 90% or more, and thus the exposure process may be easily performed. In general, the near-infrared transmittance must have a certain level, for example, a value of about 40% or more to align the alignment, so that the exposure process can be easily performed and patterning is possible (if the value is about 90% or more, the exposure process becomes very easy). The near-infrared transmittance becomes one of the criteria for determining whether or not the photosensitive resin composition can be patterned.

Another embodiment provides a black pixel partition wall layer prepared by exposing, developing, and curing the above-described photosensitive resin composition.

A method of manufacturing the black pixel barrier layer is as follows.

(1) Application and film formation step

After applying the photosensitive resin composition to a desired thickness on a substrate such as a glass substrate or an IZO substrate subjected to a predetermined pretreatment by using a spin or slit coating method, a roll coating method, a screen printing method, or an applicator method, 70 The photosensitive resin film is formed by heating at °C to 110 °C for 1 to 10 minutes to remove the solvent.

(2) exposure step

After interposing a mask to form a necessary pattern on the obtained photosensitive resin film, active rays of 200 nm to 500 nm are irradiated. As a light source used for irradiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. may be used, and in some cases, an X-ray, an electron beam, and the like may be used.

The exposure amount varies depending on the type, blending amount and dry film thickness of each component of the composition, but is 500 mJ/cm ² or less (by 365 nm sensor) when a high-pressure mercury lamp is used.

(3) development stage

As a developing method, after the exposure step, an alkaline aqueous solution is used as a developer to dissolve and remove unnecessary portions, thereby forming a pattern by leaving only the exposed portions.

(4) Post-processing step

There is a post-heating process for obtaining an excellent pattern in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, and storage stability for the image pattern obtained by development in the above process. For example, after development, it may be heated in a convection oven at 250° C. for 1 hour.

Another embodiment provides a display device including the black pixel barrier layer.

The display device may be a liquid crystal display device (LCD) or an organic light emitting device (OLED).

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.

(Example)

(Polymer synthesis)

Synthesis Example 1

While passing nitrogen through a 4-neck flask equipped with a stirrer, temperature controller, nitrogen gas injection device, and cooler, add 86.6 g of N-methyl-2-pyrrolidone (NMP) and 4,4'-hexafluoroisopropyl 12.3 g of leaden diphthalic anhydride (6-FDA) was added and dissolved. When the solid was completely dissolved, 1.52 g of diaminobenzoic acid was added, stirred at room temperature for 1 hour, and then 1.75 g of silicon diamine (PAM-E, Shin-Etsu Chemical Co., Ltd.) was added and stirred at room temperature for 2 hours. After the temperature was raised to 90 °C, 7.96 g of pyridine and 5.14 g of acetic anhydride (Ac ₂ O) were added, followed by stirring for 3 hours. After cooling the temperature in the reactor to room temperature, 0.33 g of 2-hydroethyl methacrylate (HEMA) was added, stirred for 6 hours, and then pyridine was removed through a distillation process, and 1.28 g of glycidyl acrylate and toluene sulfonic solution Into the seed 0.2g was stirred for 3 hours. Thereafter, the reaction mixture was added to water to generate a precipitate, the precipitate was filtered and sufficiently washed with water, and then dried under vacuum at 50 °C for 24 hours or more to prepare a polymer represented by the following formula A-1. The weight average molecular weight of the synthesized polymer determined by GPC method in terms of standard polystyrene was 6,500 g/mol, and the dispersion degree was 1.85.

[Formula A-1]

Synthesis Example 2

While passing nitrogen through a 4-neck flask equipped with a stirrer, temperature controller, nitrogen gas injection device, and cooler, 86.6 g of N-methyl-2-pyrrolidone (NMP) was added, and 4,4'-hexafluoroiso 12.3 g of propylidene diphthalic anhydride (6-FDA) was added and dissolved. When the solid was completely dissolved, 1.52 g of diaminobenzoic acid was added, stirred at room temperature for 1 hour, and then 1.75 g of silicon diamine (PAM-E, Shin-Etsu Chemical Co., Ltd.) was added and stirred at room temperature for 2 hours. After the temperature was raised to 90 ° C., 7.96 g of pyridine and 5.14 g of acetic anhydride (Ac2O) were added, followed by stirring for 3 hours. After cooling the reactor to room temperature, 0.33 g of 2-hydroethyl methacrylate (HEMA) was added, stirred for 6 hours, and then pyridine was removed through a distillation process, and 4-hydroxybutyl acrylate glycidyl ether 2.00 g and 0.2 g of toluene sulfonic acid were added and stirred for 3 hours. Thereafter, the reaction mixture was added to water to generate a precipitate, the precipitate was filtered and sufficiently washed with water, and then dried under vacuum at a temperature of 50 °C for 24 hours or more to prepare a polymer represented by the following formula A-2. The weight average molecular weight of the synthesized polymer determined by GPC method in terms of standard polystyrene was 7,000 g/mol, and the dispersion degree was 1.88.

[Formula A-2]

Synthesis Example 3

While passing nitrogen through a 4-neck flask equipped with a stirrer, temperature controller, nitrogen gas injection device, and cooler, 86.6 g of N-methyl-2-pyrrolidone (NMP) was added, and 4,4'-hexafluoroiso 12.3 g of propylidene diphthalic anhydride (6-FDA) was added and dissolved. When the solid was completely dissolved, 1.52 g of diaminobenzoic acid was added, stirred at room temperature for 1 hour, and then 1.75 g of silicon diamine (PAM-E, Shin-Etsu Chemical Co., Ltd.) was added and stirred at room temperature for 2 hours. After the temperature was raised to 90 ° C., 7.96 g of pyridine and 5.14 g of acetic anhydride (Ac2O) were added, followed by stirring for 3 hours. After cooling the reactor to room temperature, 0.33 g of 2-hydroethyl methacrylate (HEMA) was added and stirred for 6 hours, and then pyridine was removed through a distillation process, and 1.00 g of acrylic chloride was added and stirred for 3 hours. . Thereafter, the reaction mixture was added to water to generate a precipitate, the precipitate was filtered and sufficiently washed with water, and then dried under vacuum at a temperature of 50 °C for 24 hours or more to prepare a polymer represented by the following formula A-3. The weight average molecular weight of the synthesized polymer determined by GPC method in terms of standard polystyrene was 6,200 g/mol, and the dispersion degree was 1.81.

[Formula A-3]

Synthesis Example 4

While passing nitrogen through a 4-neck flask equipped with a stirrer, temperature controller, nitrogen gas injection device, and cooler, 86.6 g of N-methyl-2-pyrrolidone (NMP) was added, and 4,4'-hexafluoroiso 12.3 g of propylidene diphthalic anhydride (6-FDA) was added and dissolved. When the solid was completely dissolved, 1.52 g of diaminobenzoic acid was added, stirred at room temperature for 1 hour, and then 1.75 g of silicon diamine (PAM-E, Shin-Etsu Chemical Co., Ltd.) was added and stirred at room temperature for 2 hours. After the temperature was raised to 90 ° C., 7.96 g of pyridine and 5.14 g of acetic anhydride (Ac2O) were added, followed by stirring for 3 hours. After cooling the temperature in the reactor to room temperature, 0.33 g of 2-hydroethyl methacrylate (HEMA) was added and stirred for 6 hours, and the reaction mixture was added to water to generate a precipitate, and the precipitate was filtered and sufficiently washed with water. Thereafter, drying was performed for 24 hours or more under vacuum at a temperature of 50° C. to prepare a polymer represented by the following Formula A-4. The weight average molecular weight of the synthesized polymer determined by GPC method in terms of standard polystyrene was 6,400 g/mol, and the dispersion degree was 1.82.

[Formula A-4]

Synthesis Example 5

A polymer represented by the following formula (A-5) was prepared in the same manner as in Synthesis Example 1, except that silicone diamine (PAM-E, Shin-Etsu Chemical Co., Ltd.) was not added. The synthesized polymer had a weight average molecular weight of 6,900 g/mol and a dispersion degree of 1.81 determined by GPC method in terms of standard polystyrene.

[Formula A-5]

(Production of photosensitive resin composition)

Examples 1 to 4, Comparative Example 1 and Comparative Example 2

In the composition shown in Table 1 below, after dissolving a photopolymerization initiator in a solvent, the mixture was stirred at room temperature for 2 hours. To this, an alkali-soluble resin and a photopolymerizable monomer were added, and the mixture was stirred at room temperature for 1 hour. Thereafter, a fluorine-based surfactant (other additives) and a black colorant were added, followed by stirring at room temperature for 1 hour, and then the entire solution was stirred for 2 hours. The solution was filtered three times to remove impurities to prepare a photosensitive resin composition.

(Unit: g) Example 1 Example 2 Example 3 Example 4 Comparative Example 1 Comparative Example 2 Alkali-soluble resin A-1 15 - - - - - A-2 - 15 - - - - A-3 - - 15 - - - A-4 - - - - 15 15 A-5 - - - 15 - - Black colorant B-1 40 40 40 40 40 - B-2 - - - - - 40 Photopolymerizable monomer 5 5 5 5 5 5 Photopolymerization initiator D-1 0.4 0.4 0.4 0.4 0.4 0.4 D-2 0.4 0.4 0.4 0.4 0.4 0.4 menstruum E-1 29 29 29 29 29 29 E-2 10.2 10.2 10.2 10.2 10.2 10.2 Other additives 0.03 0.03 0.03 0.03 0.03 0.03

(A) alkali-soluble resin

(A-1) Polymer prepared in Synthesis Example 1

(A-2) Polymer prepared in Synthesis Example 2

(A-3) Polymer prepared in Synthesis Example 3

(A-4) Polymer prepared in Synthesis Example 4

(A-5) Polymer prepared in Synthesis Example 5

(B) Black colorant (dispersion)

(B-1) RGB mixed color black pigment mill base (CI-IM-R176, SAKATA; RGB solid content 30% by weight)

(B-2) organic black pigment mill base (CI-IM-193, SAKATA; organic black pigment solid content 30% by weight)

(C) photopolymerizable monomer

Dipentaerythritol hexa(meth)acrylate (DPHA, Japanese explosives)

(D) photopolymerization initiator

(D-1) oxime initiator (NCI-831, ADEKA)

(D-2) Oxime initiator (SPI-02, Samyang)

(E) solvent

(E-1) Propylene glycol monomethyl ether acetate (Sigma-Aldrich)

(E-2) Diethylene glycol ethylmethyl ether (Sigma-Aldrich)

(F) other additives

Fluorine-based surfactant (F-554, DIC company)

Evaluation 1: heat resistance

From the photosensitive resin compositions of Examples 1 to 4 and Comparative Examples 1 and 2, coating, exposure, development, and post-baking were completed and patterned specimens were subjected to TGA analysis to obtain 1 wt% loss temp., and heat resistance was measured. , The results are shown in Table 2 below. (1wt% loss temp. means the temperature at which the weight decreases by 1wt% relative to the total weight of the specimen before measurement.)

Evaluation 2: optical density

The photosensitive resin compositions of Examples 1 to 4, Comparative Examples 1 and 2 were coated, exposed, developed, and post-baked, and the patterned specimens were measured for optical density per 1 μm using an OD meter, The results are shown in Table 2 below.

Evaluation 3: sensitivity

After coating the photosensitive resin composition according to Examples 1 to 4, Comparative Example 1 and Comparative Example 2 on a glass substrate using a spin coater from Mikasa, it was heated on a hot plate at 100° C. for 1 minute to a thickness of 1 μm. A coating film of was formed. After exposing the substrate coated with the coating film using a Ushio exposure machine (UX-1200SM) using a mask with patterns of various sizes, changing the exposure amount, and developing it with a 2.38% TMAH solution at room temperature for 60 seconds. , After removing the exposed part by dissolving, it was washed with pure water for 30 seconds to form a pattern. As for the sensitivity, the energy at which a 20 µm hole was formed was confirmed based on the size of the 20 µm hole pattern measured using Hitachi's S-9260, and the sensitivity measurement results are shown in Table 2 below.

Assessment 4: Outgas

From the photosensitive resin compositions of Examples 1 to 4 and Comparative Examples 1 and 2, coating, exposure, development, and post-baking were completed, and the patterned specimen was cut into a size of 1 cm x 5 cm, and then placed in a collection tube 230 The gas generated for 30 minutes at °C was collected and the sum of the total area of the gas detected using GC-MS was confirmed, and is shown in Table 2 below.

Evaluation 5: taper angle

After curing the wafer and glass measured in Evaluation 3 at 250° C. for 1 hour in a nitrogen atmosphere, the taper angle was measured with Hitachi's S-4300 (FE-SEM equipment), and the results are shown in Table 2 below. Shown in.

Sensitivity (mJ/㎠) OD(/um) 1wt% loss Temp(℃) Outgas Taper angle (°) Example 1 60 1.2 328.5 359462 21 Example 2 60 1.2 322.7 384042 25 Example 3 60 1.2 326.2 362417 24 Example 4 60 1.2 335.8 335274 42 Comparative Example 1 90 1.2 318.5℃ 742098 30 Comparative Example 2 150 1.2 315.4℃ 1583647 35

From Table 2 above, it was confirmed that when the polymer having the structural unit represented by Formula 1 is used as an alkali-soluble resin, the optical properties can be maintained at the same level as in the prior art, while reduction, low outgas and high heat resistance can be secured. I can. Furthermore, it can be seen that when the polymer further includes a silicone diamine structural unit, the taper angle can be lowered, thereby contributing to improvement in patternability and processability.

The present invention is not limited to the above embodiments, but may be manufactured in a variety of different forms, and those of ordinary skill in the art to which the present invention pertains, other specific forms without changing the technical spirit or essential features of the present invention. It will be appreciated that it can be implemented with. Therefore, it should be understood that the embodiments described above are illustrative in all respects and are not limiting.

Claims (13)

(A) an alkali-soluble resin containing a polymer having a structural unit represented by the following formula (1) and a silicone diamine structural unit;
(B) a black colorant;
(C) photopolymerizable monomer;
(D) photoinitiator; And
(E) solvent
Photosensitive resin composition comprising:
[Formula 1]

In Formula 1,
L ¹ is represented by the following formula (2),
L ² is a substituted or unsubstituted C1 to C20 alkylene group,
[Formula 2]

In Chemical Formula 2,
R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
L ³ is a single bond or represented by the following formula (3),
[Formula 3]

In Chemical Formula 3,
L ⁴ and L ⁵ are each independently a substituted or unsubstituted C1 to C10 alkylene group,
n is an integer from 0 to 5.
The method of claim 1,
Formula 2 is a photosensitive resin composition represented by the following Formula 2-1:
[Formula 2-1]

In Formula 2-1,
R ¹ is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
L ³ is a single bond or represented by Chemical Formula 3.
The method of claim 1,
The polymer is a photosensitive resin composition comprising a functional group represented by the following formula (4) at both ends:
[Formula 4]

In Chemical Formula 4,
R ² is a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group.
delete The method of claim 1,
The silicone diamine structural unit is a photosensitive resin composition represented by the following formula (5):
[Formula 5]

In Chemical Formula 5,
L ⁶ to L ⁸ are each independently a substituted or unsubstituted C1 to C20 alkylene group,
R ³ to R ⁶ are each independently a substituted or unsubstituted C1 to C20 alkyl group.
The method of claim 1,
The polymer is a photosensitive resin composition having a weight average molecular weight of 5,000 g / mol to 20,000 g / mol.
The method of claim 1,
The black colorant is a photosensitive resin composition comprising an inorganic black pigment, an organic black pigment, or a combination thereof.
The method of claim 1,
The black colorant is a photosensitive resin composition that is a mixture of two or more selected from the group consisting of a red pigment, a green pigment, a blue pigment, and a violet pigment.
The method of claim 1,
The photosensitive resin composition is based on the total amount of the photosensitive resin composition
(A) 1 to 20% by weight of the alkali-soluble resin;
(B) 1% to 40% by weight of the black colorant;
1% to 15% by weight of the (C) photopolymerizable monomer;
(D) 0.1% to 5% by weight of the photopolymerization initiator; And
30% to 80% by weight of the solvent (E)
Photosensitive resin composition comprising a.
The method of claim 1,
The photosensitive resin composition further comprises an additive of malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a fluorine-based surfactant, a radical polymerization initiator, or a combination thereof.
A black pixel defining layer prepared by using the photosensitive resin composition of any one of claims 1 to 3 and 5 to 10.
A display device comprising the black pixel barrier layer of claim 11.
The method of claim 12,
The display device is a liquid crystal display device (LCD) or an organic light emitting device (OLED).