KR102240445B1 - Manufacturing method of thin-film glass for L chamfer type cover window - Google Patents

Manufacturing method of thin-film glass for L chamfer type cover window Download PDF

Info

Publication number
KR102240445B1
KR102240445B1 KR1020200171633A KR20200171633A KR102240445B1 KR 102240445 B1 KR102240445 B1 KR 102240445B1 KR 1020200171633 A KR1020200171633 A KR 1020200171633A KR 20200171633 A KR20200171633 A KR 20200171633A KR 102240445 B1 KR102240445 B1 KR 102240445B1
Authority
KR
South Korea
Prior art keywords
glass
cell
etching
dfr
chamfer
Prior art date
Application number
KR1020200171633A
Other languages
Korean (ko)
Inventor
김태환
김경민
Original Assignee
주식회사 진우엔지니어링
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 진우엔지니어링 filed Critical 주식회사 진우엔지니어링
Priority to KR1020200171633A priority Critical patent/KR102240445B1/en
Application granted granted Critical
Publication of KR102240445B1 publication Critical patent/KR102240445B1/en

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033—Apparatus for opening score lines in glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/037—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment

Abstract

The present invention relates to a method for manufacturing thin-film glass for an L-chamfer type cover window capable of improving durability by preventing notch brittleness through L-chamfer formation in a both-end cutting unit which is cut by a cell cutting line of glass. The present invention relates to a method for manufacturing thin-film glass for a cover window capable of forming cell glass of a cell unit with original plate glass supplied through an original plate glass supplying step through a DFR lamination step, a cross-section jig irradiation double-sided exposure step, a DFR lamination PREBAKE step, a non-exposure DFR lamination phenomenon step, a residual DFR lamination HARDBAKE step, a cell cutting groove processing step, and a cell glass separating step; and including a step of forming an L-chamfer through an L-chamfer chemical etching step including a step of etching the cell glass to etch an L-chamfer unit by chemical etching. Therefore, the present invention improves durability by preventing the notch brittleness through the L-chamfer formation in the both-end cutting unit which is cut by the cell cutting line of the glass.

Description

L 챔퍼형 커버윈도우용 박막글라스 제조방법{Manufacturing method of thin-film glass for L chamfer type cover window}Manufacturing method of thin-film glass for L chamfer type cover window

본 발명은 L 챔퍼형 커버윈도우용 박막글라스 제조방법에 관한 것으로서, 더욱 상세하게는 커버윈도우용 박막글라스 제조방법에 있어서, 원판글라스공급과정을 통하여 공급된 원판글라스를 DFR라미과정과 단면지그조사양면노광과정,DFR라미PREBAKE과정,비노광DFR라미현상과정, 잔류DFR라미HARDBAKE과정, 셀커팅홈가공과정 및 셀글라스분리과정을 통하여 셀단위의 셀글라스를 형성하고, 상기 셀글라스를 화학에칭에 의하여 L챔퍼부가 식각형성되게 에칭하는 과정으로 이루어진 L챔퍼화학에칭과정을 통하여 L챔퍼 형성하여서, 글라스의 셀커팅선에 의하여 절단형성된 양단 절단부에 L챔퍼 형성을 통하여 노치 취성을 방지하여 내구성을 향상시킬 수 있도록 함을 목적으로 한 것이다.The present invention relates to a method of manufacturing a thin film glass for an L chamfer type cover window, and more particularly, in a method of manufacturing a thin film glass for a cover window, the original glass supplied through the original glass supply process is subjected to a DFR lamination process and a cross-sectional jig irradiation on both sides. Through the exposure process, DFR lamy PREBAKE process, non-exposure DFR lamy development process, residual DFR lamy hardbake process, cell cutting groove processing process, and cell glass separation process, cell-unit cell glass is formed, and the cell glass is subjected to chemical etching. L chamfer is formed through the L chamfer chemical etching process, which consists of etching the L chamfer part to be etched, and by forming the L chamfer at both ends cut by the cell cutting line of the glass, it is possible to improve durability by preventing notch brittleness. It is for the purpose of making it possible.

일반적으로, 스마트폰용 커버윈도우용 박막글라스는 스마트폰의 디스플레이의 전면에 구비되어 디스플레이를 보호하고 디스플레이의 화상이 잘 투과될 수 있도록 하는 것이다.In general, a thin-film glass for a cover window for a smart phone is provided on the front of a display of a smart phone to protect the display and allow an image of the display to be transmitted well.

이상과 같은 스마트폰용 커버윈도우용 박막글라스는 스마트폰의 경량화와 박막화에 따라 그 두께가 매우 얇게 가공되어 사용되는 것이다.The thin-film glass for cover windows for smartphones as described above is used after being processed to have a very thin thickness according to the weight reduction and thinning of the smartphone.

그러나, 상기한 바와 같이 스마트폰용 커버윈도우용 박막글라스는 그 가공과정의 박막화 원판글라스에서 셀글라스의 분리를 위한 셀커팅선의 형성에 있어 셀글라스의 테두리에 절단부가 형성되는데 상기 절단부의 마감 가공이 이루어지지 않아 외부에서 가해지는 충격에 대하여 노치 현상에 따른 취성을 유발하고 손상 파손되는 문제점이 있었다.However, as described above, in the case of forming the cell cutting line for separating the cell glass from the thin-filmed original glass during the processing process, a cut portion is formed at the edge of the cell glass. Due to the notch phenomenon, there was a problem of damage and damage due to the impact applied from the outside because it is not supported.

대한민국 특허공개 제10-2019-0045730호Korean Patent Publication No. 10-2019-0045730

이에, 본 발명은 상기한 바와 같이 스마트폰용 커버윈도우용 박막글라스가 그 가공과정의 박막화 원판글라스에서 셀글라스의 분리를 위한 셀커팅선의 형성에 있어 셀글라스의 테두리에 절단부가 형성되는데 상기 절단부의 마감 가공이 이루어지지 않아 외부에서 가해지는 충격에 대하여 노치 현상에 따른 취성을 유발하고 손상 파손되는 문제점을 해결하고자 하는 것이다.Accordingly, in the present invention, in the formation of the cell cutting line for separating the cell glass from the thin-filmed original glass during the processing of the thin film glass for a cover window for a smartphone as described above, a cut portion is formed on the edge of the cell glass. This is to solve the problem of causing brittleness due to the notch phenomenon and damage to the impact applied from the outside because processing is not performed.

즉, 본 발명은 커버윈도우용 박막글라스 제조방법에 있어서, 원판글라스를 공급하는 과정으로 이루어진 원판글라스공급과정과 상기 원판글라스공급과정을 통하여 공급된 원판글라스의 상하 양면에 DFR필름을 부착하는 과정으로 이루어진 DFR라미과정, 상기 DFR라미과정을 통하여 DFR필름이 부착된 원판글라스의 일측면에 절단마스킹부를 갖는 노광지그를 밀착시키고 UV를 조사하여 UV가 조사면의 DFR필름을 관통하여 반대 측면의 DFR필름까지 노광경화시키는 과정으로 이루어진 단면지그조사양면노광과정, 상기 단면지그조사양면노광과정을 통하여 DFR필름의 단면지그조사양면노광이 완료된 원판글라스의 노광 경화된 DFR필름이 원판글라스에 밀착되게 가온 건조하는 과정으로 이루어진 DFR라미PREBAKE과정, 상기 DFR라미PREBAKE과정을 통하여 노광 경화된 DFR필름의 밀착이 완료된 원판글라스의 비노광 비경화 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 비노광DFR라미현상과정, 상기 비노광DFR라미현상과정을 통하여 비노광 비경화 DFR필름이 제거된 원판글라스의 잔류 DFR필름의 들뜬 부위를 원판글라스에 밀착시키는 과정으로 이루어진 잔류DFR라미HARDBAKE과정, 상기 잔류DFR라미HARDBAKE과정을 통하여 노출된 원판글라스의 커팅부 중앙에 레이저로 셀커팅선을 형성하는 과정으로 이루어진 셀커팅홈가공과정, 상기 셀커팅홈가공과정을 통하여 셀커팅선이 형성된 원판글라스를 셀글라스단위로 절단하는 과정으로 이루어진 셀글라스분리과정, 상기 셀글라스분리과정을 통하여 셀글라스로 분리되고 절단부위의 상하면이 노출된 셀글라스를 화학에칭에 의하여 L챔퍼부가 식각형성되게 에칭하는 과정으로 이루어진 L챔퍼화학에칭과정, 상기 L챔퍼화학에칭과정을 통하여 L챔퍼부가 형성된 셀글라스 양면의 DFR필름을 박리액에 의하여 제거하는 과정으로 이루어진 DFR박리과정, 상기 L챔퍼화학에칭과정을 통하여 에칭형성된 셀글라스의 L챔퍼의 거친표면을 부드러운면이 형성되게 저농도애칭하는 과정으로 이루어진 L챔퍼힐링과정, 상기 L챔퍼힐링과정을 통하여 셀글라스의 표면의 이물질을 제거하는 과정으로 이루어진 세정과정 및 상기 세정과정을 통하여 세정이 완료된 셀글라스의 전체외면을 질산칼슘으로 강화하는 강화과정으로 이루어진 것을 특징으로 하는 것이다.That is, the present invention is a method of manufacturing a thin film glass for a cover window, in which the original glass supply process consisting of the process of supplying the original glass and the process of attaching the DFR film on the upper and lower sides of the original glass supplied through the original glass supply process. Through the DFR lamination process made, the DFR lamination process, through the DFR lamination process, an exposure jig having a cut masking part is in close contact with one side of the original glass to which the DFR film is attached, and UV irradiation penetrates the DFR film on the irradiated surface to penetrate the DFR film on the opposite side. Through the single-sided jig irradiation double-sided exposure process consisting of exposure and curing up to, exposure of the original glass on which the single-sided jig irradiation double-sided exposure of the DFR film is completed through the single-sided jig irradiation double-sided exposure process is heated and dried in close contact with the original glass. The DFR Lamy PREBAKE process consisting of a process, the non-exposed DFR Lami development process consisting of a process of removing the unexposed, uncured DFR film of the original glass on which the exposure-cured DFR film has been adhered through the DFR Lami PREBAKE process with a developer solution, the above Exposed through the residual DFR ramie HardBAKE process consisting of a process of intimately adhering the excitation part of the residual DFR film of the original glass from which the non-exposed non-cured DFR film has been removed to the original glass through the non-exposed DFR ramie development process, and the residual DFR ramie hardbake process. A cell cutting groove processing process consisting of forming a cell cutting line with a laser in the center of the cut portion of the original glass, and a process of cutting the original glass on which the cell cutting line is formed through the cell cutting groove processing process. The L chamfer chemical etching process consisting of a process of etching the cell glass into a cell glass through the cell glass separation process and the cell glass separation process and the top and bottom surfaces of the cut portion exposed so that the L chamfer portion is etched by chemical etching, and the L The DFR peeling process consisting of removing the DFR film on both sides of the cell glass on which the L chamfer is formed through a chemical chamfer etching process, and the rough surface of the L chamfer of the cell glass etched through the L chamfer chemical etching process is smooth. L chamfer healing process consisting of a process of nicknamed low concentration so that the surface is formed, the It is characterized in that it consists of a cleaning process consisting of removing foreign substances from the surface of the cell glass through the L chamfer healing process, and a reinforcing process in which the entire outer surface of the washed cell glass through the cleaning process is reinforced with calcium nitrate.

본 발명은 상기 L챔퍼화학에칭과정은 셀글라스를 에칭지그의 셀안착면에 안착하는 단계로 이루어진 지그안착단계와 상기 지그안착단계를 통하여 셀안착면에 안착된 셀글라스의 안착면 반대면에 결속지그판을 밀착시키고 셀안착판과 결속지그판 중 어느 일측에 자석을 구비하여 셀글라스를 자력 안착시키는 단계로 이루어진 지그자력결속단계, 상기 지그자력결속단계를 통하여 셀글라스가 자력결속된 에칭지그를 에칭액이 저장된 에칭조에 침지하는 단계로 이루어진 지그에칭액침지단계, 상기 지그에칭액침지단계를 통하여 에칭액에 침지된 셀글라스가 에칭액에 의하여 DFR필름이 부착되지 않은 절단부의 상하 양면과 단부면이 면상으로 에칭되는 면상에칭부를 형성하는 단계로 이루어진 절단부면에칭단계, 상기 절단부면에칭단계를 통하여 셀글라스의 절단부 상하 양면이 일정 깊이 침식 에칭되어 DFR필름 부착면 하부로의 단차가 형성되면 상기 단차 형성부위로 에칭액이 작용되어서 절단부의 면상에칭부 깊이에 비례하여 DFR필름의 하부로 침식에칭에 의하여 경사에칭부가 에칭형성되는 단계로 이루어진 DFR필름면경사에칭단계 및 상기 DFR필름면경사에칭단계를 통하여 셀글라스의 면상에칭부와 경사에칭부가 일정길이로 형성되면 에칭지그를 에칭조로부터 꺼내고 에칭지그로부터 셀글라스를 분리하는 단계로 이루어진 에칭완료단계로 이루어진 특징으로 하는 것이다.In the present invention, the L-chamfer chemical etching process is a jig seating step consisting of seating the cell glass on the cell seating surface of the etching jig, and binding to the opposite surface of the cell glass seating surface through the jig seating step. A jig magnetic binding step consisting of magnetically seating the cell glass by attaching the jig plate in close contact with the cell mounting plate and a magnet on either side of the binding jig plate, and the etching jig in which the cell glass is magnetically bound through the jig magnetic binding step. A jig etching solution immersion step consisting of immersing in an etching bath in which the etching solution is stored, the cell glass immersed in the etching solution through the jig etching solution immersion step is etched by the etching solution on both upper and lower sides and end surfaces of the cut part to which the DFR film is not attached. When the upper and lower sides of the cut part of the cell glass are etched to a certain depth through the step of forming a surface etching part, and the upper and lower sides of the cut part of the cell glass are etched to a certain depth to form a step under the DFR film adhesion surface, the etching solution is applied to the step forming part. The surface of the cell glass is etched through the DFR film surface gradient etching step and the DFR film surface gradient etching step consisting of a step in which an inclined etching portion is formed by erosion etching under the DFR film in proportion to the depth of the surface etching portion of the cut portion. It is characterized by an etching completion step consisting of removing the etching jig from the etching bath and separating the cell glass from the etching jig when the negative and oblique etching portions are formed to have a predetermined length.

따라서, 본 발명은 원판글라스공급과정을 통하여 공급된 원판글라스를 DFR라미과정과 단면지그조사양면노광과정, DFR라미PREBAKE과정, 비노광DFR라미현상과정, 잔류DFR라미HARDBAKE과정, 셀커팅홈가공과정, 셀글라스분리과정 및 상기 셀글라스분리과정을 통하여 셀글라스로 분리되고 절단부위의 상하면이 노출된 셀글라스를 화학에칭에 의하여 L챔퍼부가 식각형성되게 에칭하는 과정으로 이루어진 L챔퍼화학에칭과정으로 이루어짐으로써, 글라스의 셀커팅선에 의하여 절단형성된 양단 절단부에 L챔퍼 형성을 통하여 노치 취성을 방지하여 내구성을 향상되는 효과를 갖는 것이다.Accordingly, the present invention provides the original glass supplied through the original glass supply process, the DFR lamy process and the single-sided jig irradiation double-sided exposure process, the DFR lamy PREBAKE process, the non-exposed DFR lamy phenomenon process, the residual DFR lamy hardbreak process, and the cell cutting groove processing process. , Cell glass separation process and L chamfer chemical etching process consisting of a process of etching the L chamfer portion to be etched by chemical etching to the cell glass separated into cell glass through the cell glass separation process and the top and bottom surfaces of the cut portion are exposed. As a result, it has the effect of improving durability by preventing notch brittleness through L chamfer formation at both ends cut by the cell cutting line of the glass.

도 1 과 도 2 는 본 발명의 공정 예시도.
도 3 은 본 발명의 공정에 있어 L챔퍼화학에칭과정의 상세 예시도.
도 4 와 5 는 본 발명에 따른 에칭지그의 예시도.
도 6 은 본 발명에 따른 에칭지그 에칭조 거치 예시도.
도 7 은 본 발명에 따른 L챔퍼 상세 사진.1 and 2 are diagrams illustrating the process of the present invention.
3 is a detailed illustration of the L chamfer chemical etching process in the process of the present invention.
4 and 5 are exemplary views of an etching jig according to the present invention.
Figure 6 is an example of mounting the etching jig etching bath according to the present invention.
7 is a detailed photo of the L chamfer according to the present invention.

이하, 첨부된 도면에 의하여 상세히 설명하면 다음과 같다.Hereinafter, it will be described in detail with reference to the accompanying drawings.

본 발명은 글라스의 셀커팅선에 의하여 절단형성된 양단 절단부의 취성에 대한 내구성이 향상되도록 한 것으로서, 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니 되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.The present invention is to improve the durability against brittleness of both ends cut by the cell cutting line of the glass, and the terms or words used in the specification and claims should not be construed as being limited to a conventional or dictionary meaning, The inventor should be interpreted as a meaning and concept consistent with the technical idea of the present invention based on the principle that the concept of terms can be appropriately defined in order to describe his or her invention in the best way.

따라서, 본 명세서에 기재된 실시예와 도면에 도시된 구성은 본 발명의 가장 바람직한 일 실시예에 불과할 뿐이고, 본 발명의 기술적 사상을 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형 예들이 있을 수 있음을 이해하여야 한다.Accordingly, the embodiments described in the present specification and the configurations shown in the drawings are only the most preferred embodiments of the present invention, and do not represent all the technical ideas of the present invention, so that they can be replaced at the time of application. It should be understood that there may be various equivalents and variations.

즉, 본 발명은 커버윈도우용 박막글라스 제조방법에 있어서, 원판글라스공급과정(100)과 DFR라미과정(210), 단면지그조사양면노광과정(220), DFR라미PREBAKE과정(230), 비노광DFR라미현상과정(240), 잔류DFR라미HARDBAKE과정(250), 셀커팅홈가공과정(310), 셀글라스분리과정(320), L챔퍼화학에칭과정(400), DFR박리과정(420), L챔퍼힐링과정(510), 세정과정(520) 및 강화과정(530)으로 이루어진 것이다.That is, in the method of manufacturing a thin film glass for a cover window, the present invention provides an original glass supply process 100 and a DFR lamy process 210, a single-sided jig irradiation double-sided exposure process 220, a DFR lamy PREBAKE process 230, and a non-exposure process. DFR Lamy Development Process (240), Residual DFR Lamy HardBAKE Process (250), Cell Cutting Groove Process (310), Cell Glass Separation Process (320), L Chamfer Chemical Etching Process (400), DFR Peeling Process (420), It consists of the L chamfer healing process 510, the cleaning process 520, and the strengthening process 530.

여기서, 상기 원판글라스공급과정(100)과은 원판글라스(10)를 공급하는 과정으로 이루어진 것이다.Here, the process of supplying the original glass (100) and the process of supplying the original glass (10).

그리고, 상기 DFR라미과정(210)은 원판글라스공급과정(100)을 통하여 공급된 원판글라스(10)의 상하 양면에 DFR필름을 부착하는 과정으로 이루어진 것이다. In addition, the DFR lamy process 210 consists of attaching the DFR film to both upper and lower sides of the original glass 10 supplied through the original glass supply process 100.

상기 DFR필름은 고감도필름으로 이루어지며 두께는 15~50㎛로 이루어지는 것이다.The DFR film is made of a highly sensitive film and has a thickness of 15 to 50 μm.

상기 DFR필름의 두께가 15㎛ 이하로 형성되게 되면 L챔퍼화학에칭과정(400)에 있어 셀글라스(20)의 양면이 L챔퍼 에칭과정에 보호되지 않게 되고, DFR필름의 두께가 50㎛ 이상으로 형성하여 실시하게 되면 단면지그조사양면노광과정(220)에 있어 일면 조사에 의한 양면노광이 이루어지지 않게 되므로 DFR필름은 두께는 15~50㎛로 형성한 것으로 이루어지는 것이 바람직한 것이다.When the thickness of the DFR film is formed to be less than 15 μm, both sides of the cell glass 20 in the L chamfer chemical etching process 400 are not protected during the L chamfer etching process, and the thickness of the DFR film is 50 μm or more. When formed and carried out, since the double-sided exposure by single-sided irradiation is not performed in the single-sided jig-irradiation double-sided exposure process 220, it is preferable that the DFR film is formed to have a thickness of 15 to 50 μm.

또한, 상기 단면지그조사양면노광과정(220)은 DFR라미과정(210)을 통하여 DFR필름이 부착된 원판글라스(10)의 일측면에 절단마스킹부(31)를 갖는 노광지그(30)를 밀착시키고 UV를 조사하여 UV가 조사면의 DFR필름을 관통하여 반대 측면의 DFR필름까지 노광경화시키는 과정으로 이루어진 것이다.In addition, in the single-sided jig irradiation double-sided exposure process 220, the exposure jig 30 having a cutting masking portion 31 is in close contact with one side of the original glass 10 to which the DFR film is attached through the DFR lamination process 210. And UV irradiation to allow UV to penetrate through the DFR film on the irradiated surface and expose cure to the DFR film on the opposite side.

상기 UV의 파장 365nm이 50~100mj/cm2의 광량으로 조사되는 것이다.365 nm of the UV wavelength is irradiated with an amount of light of 50 to 100 mj/cm2.

또한, 상기 DFR라미PREBAKE과정(230)은 단면지그조사양면노광과정(220)을 통하여 DFR필름의 단면지그조사양면노광이 완료된 원판글라스(10)의 노광 경화된 DFR필름이 원판글라스(10)에 밀착되게 가온 건조하는 과정으로 이루어진 것이다.In addition, in the DFR Lamy PREBAKE process 230, the exposure of the original glass 10 on which the single-sided jig irradiation double-sided exposure of the DFR film is completed through the single-sided jig irradiation double-sided exposure process 220 is applied to the original glass 10. It consists of a process of heating and drying closely.

상기 DFR라미PREBAKE과정(230)은 100~120℃ 온도에서 10~20분 동안 건조하는 과정을 이루어지는 것이다.The DFR ramie PREBAKE process 230 is a process of drying for 10 to 20 minutes at a temperature of 100 to 120°C.

또한, 상기 비노광DFR라미현상과정(240) DFR라미PREBAKE과정(230)을 통하여 노광 경화된 DFR필름의 밀착이 완료된 원판글라스(10)의 노광지그(30)의 절단마스킹부(31)에 의하여 형성된 비노광 비경화 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 것이다.In addition, by the cutting masking part 31 of the exposure jig 30 of the original glass 10 in which the exposure-hardened DFR film through the non-exposure DFR lamy development process 240 and the DFR lamy PREBAKE process 230 has been adhered. It consists of a process of removing the formed unexposed uncured DFR film with a developer.

상기 현상액은 Na2CO3가 3~5중량%의 함량을 갖는 Na2CO3수용액에서 30℃온도로 10~15분 동안 이루어지는 것이다.The developer is made for 10 to 15 minutes at 30 ℃ temperature in Na 2 CO 3 aqueous solution having a content of the Na 2 CO 3 3 ~ 5% by weight.

또한, 상기 잔류DFR라미HARDBAKE과정(250)은 비노광DFR라미현상과정(240)을 통하여 비노광 비경화 DFR필름이 제거된 원판글라스(10)의 잔류 DFR필름의 들뜬 부위를 원판글라스(10)에 밀착시키는 과정으로 이루어진 것이다.In addition, the residual DFR Lamy HardBAKE process 250 includes an excitation portion of the residual DFR film of the original glass 10 from which the non-exposed non-cured DFR film has been removed through the non-exposed DFR Lamy development process 240. It consists of a process of making it close to.

상기 잔류DFR라미HARDBAKE과정(250)은 120~150℃온도에서 40~60분동안 현상액에 의하여 젖어 있은 DFR필름을 건조하는 과정으로 이루어진 것이다.The residual DFR Lamy HardBAKE process 250 consists of drying the DFR film wet by the developer at a temperature of 120 to 150°C for 40 to 60 minutes.

또한, 상기 셀커팅홈가공과정(310)은 잔류DFR라미HARDBAKE과정(250)을 통하여 노출된 원판글라스(10)의 절단부 중앙에 레이저로 셀커팅선을 형성하는 과정으로 이루어진 것이다.In addition, the cell cutting groove processing process 310 consists of forming a cell cutting line with a laser in the center of the cut portion of the original glass 10 exposed through the residual DFR ramie hardboard process 250.

상기 레이저에 의한 셀커팅선은 1~3㎛로 형성되는 것이다.The cell cutting line by the laser is formed to be 1 ~ 3㎛.

또한, 상기 셀글라스분리과정(320)은 셀커팅홈가공과정(310)을 통하여 셀커팅선이 형성된 원판글라스(10)를 셀글라스(20)단위로 절단하는 과정으로 이루어진 것이다.In addition, the cell glass separation process 320 includes a process of cutting the original glass 10 on which the cell cutting line is formed in the cell glass 20 unit through the cell cutting groove processing process 310.

상기 셀글라스분리과정(320)은 흡착식 지그를 이용하여 컷팅된 셀글라스(20)를 각각 분리하는 것이다.The cell glass separation process 320 is to separate the cut cell glass 20 using an adsorption jig.

또한, 상기 L챔퍼화학에칭과정(400)은 셀글라스분리과정(320)을 통하여 셀글라스(20)로 분리되고 절단부(21)위의 상하면이 노출된 셀글라스(20)를 화학에칭에 의하여 L챔퍼부(22)가 식각형성되게 에칭하는 과정으로 이루어진 것이다.In addition, the L chamfer chemical etching process 400 is separated into the cell glass 20 through the cell glass separation process 320 and the top and bottom surfaces of the cut portion 21 are exposed by chemical etching. It consists of a process of etching the chamfer portion 22 to be etched.

상기 L챔퍼화학에칭과정(400)은 셀글라스(20)를 에칭지그(40)의 셀안착면에 안착하는 단계로 이루어진 지그안착단계(401)와 상기 지그안착단계(401)를 통하여 셀안착면에 안착된 셀글라스(20)의 안착면 반대면에 결속지그판(43)을 밀착시키고 셀안착판(42)과 결속지그판(43) 중 어느 일측에 자석을 구비하여 셀글라스(20)를 자력 안착시키는 단계로 이루어진 지그자력결속단계(402), 상기 지그자력결속단계(402)를 통하여 셀글라스(20)가 자력결속된 에칭지그(40)를 에칭액이 저장된 에칭조(50)에 침지하는 단계로 이루어진 지그에칭액침지단계(403), 상기 지그에칭액침지단계(403)를 통하여 에칭액에 침지된 셀글라스(20)가 에칭액에 의하여 DFR필름이 부착되지 않은 절단부(21)의 상하 양면과 단부면이 면상으로 에칭되는 면상에칭부(22a)를 형성하는 단계로 이루어진 절단부면에칭단계(404), 상기 절단부면에칭단계(404)를 통하여 셀글라스(20)의 절단부(21) 상하 양면이 일정 깊이 침식 에칭되어 DFR필름 부착면 하부로의 단차가 형성되면 상기 단차 형성부위로 에칭액이 작용되어서 절단부(21)의 면상에칭부(22a) 깊이에 비례하여 DFR필름의 하부로 침식에칭에 의하여 경사에칭부(22b)가 에칭형성되는 단계로 이루어진 DFR필름면경사에칭단계(405) 및 상기 DFR필름면경사에칭단계(405)를 통하여 셀글라스(20)의 면상에칭부(22a)와 경사에칭부(22b)가 일정길이로 형성되면 에칭지그(40)를 에칭조(50)로부터 꺼내고 에칭지그(40)로부터 셀글라스(20)를 분리하는 단계로 이루어진 에칭완료단계(406)로 이루어진 것이다.The L-chamfer chemical etching process 400 includes a jig mounting step 401 consisting of mounting the cell glass 20 on the cell mounting surface of the etching jig 40 and the cell mounting surface through the jig mounting step 401 The binding jig plate 43 is in close contact with the opposite side of the seating surface of the cell glass 20 seated in the cell glass 20, and a magnet is provided on either side of the cell seating plate 42 and the binding jig plate 43. Zig magnetic binding step 402 consisting of a step of magnetically seating, and the etching jig 40 magnetically bound by the cell glass 20 through the zig magnetic binding step 402 is immersed in the etching bath 50 in which the etchant is stored. A jig etching solution immersion step 403 consisting of steps, the cell glass 20 immersed in the etching solution through the jig etching solution immersion step 403 is the upper and lower sides and the end surfaces of the cut portion 21 to which the DFR film is not attached by the etching solution Through the cutting surface etching step 404 consisting of forming an etching part 22a on the surface etched on this surface, and the cutting surface etching step 404, the upper and lower sides of the cut part 21 of the cell glass 20 have a certain depth. When a step is formed under the DFR film adhesion surface by erosion etching, an etching solution is applied to the step forming part, and in proportion to the depth of the etching part 22a on the surface of the cut part 21, an inclined etching part is performed by erosion etching to the lower part of the DFR film. Through the DFR film surface gradient etching step 405 and the DFR film surface gradient etching step 405 consisting of a step in which (22b) is etched, the etching portion 22a and the oblique etching portion 22b on the surface of the cell glass 20 ) Is formed to a predetermined length, the etching jig 40 is taken out from the etching bath 50 and the etching completion step 406 consisting of separating the cell glass 20 from the etching jig 40.

상기 에칭조(50)의 에칭액은 25~40중량%의 불산혼합물로 이루어지며 에칭시간은 300~800초동안 이루어지는 것이다.The etching solution of the etching bath 50 is made of 25 to 40% by weight of a hydrofluoric acid mixture, and the etching time is performed for 300 to 800 seconds.

상기 에칭지그(40)는 상부 양측에 에칭조(50)에 구비된 행거부(51)에 지지되는 행거암(41)을 돌출형성하고 상기 행거암(41)의 중앙 측에서 하부로 돌출형성된 1 개 내지 2개의 셀안착판(42) 및 상기 셀안착판(42)에 안착된 셀글라스(20)를 밀착 결속하는 결속지그판(43)으로 구성되는 것이다.The etching jig 40 protrudes a hanger arm 41 supported by a hanger portion 51 provided in the etching bath 50 on both upper sides and protrudes downward from the center side of the hanger arm 41 It is composed of two to two cell seating plate 42 and a binding jig plate 43 for closely binding the cell glass 20 seated on the cell seating plate 42.

상기 행거암(41)의 양측에는 에칭조(50)에 행거시 이탈방지를 위하여 하부로 돌출형성된 이탈방지돌기(41a)를 형성한 것이다.Both sides of the hanger arm 41 are formed with separation prevention protrusions 41a protruding downward in the etching bath 50 to prevent separation during hanger.

또한, 상기 DFR박리과정(420)은 L챔퍼화학에칭과정(400)을 통하여 L챔퍼부(22)가 형성된 셀글라스(20) 양면의 DFR필름을 박리액에 의하여 제거하는 과정으로 이루어진 것이다.In addition, the DFR peeling process 420 consists of removing the DFR film on both sides of the cell glass 20 on which the L chamfer part 22 is formed through the L chamfer chemical etching process 400 with a peeling solution.

상기 박리액은 NaOH가 3~5중량% 함량을 갖는 NaOH수용액에 50~60℃온도로 7~13분 동안 이루어지는 것이다.The stripping solution is made in an aqueous NaOH solution having 3 to 5% by weight of NaOH at a temperature of 50 to 60° C. for 7 to 13 minutes.

또한, 상기 L챔퍼힐링과정(510)은 L챔퍼화학에칭과정(400)을 통하여 에칭형성된 셀글라스(20)의 L챔퍼부(22)의 거친표면을 부드러운면이 형성되게 저농도애칭하는 과정으로 이루어진 것이다.In addition, the L chamfer healing process 510 consists of a process of nicking the rough surface of the L chamfer portion 22 of the cell glass 20 etched through the L chamfer chemical etching process 400 at a low concentration so that a smooth surface is formed. will be.

상기 L챔퍼힐링과정(510)은 3~15중량%의 농도를 갖는 불산혼합물 속에서 50~120초동안 이루어지는 것이다.The L chamfer healing process 510 is performed for 50 to 120 seconds in a hydrofluoric acid mixture having a concentration of 3 to 15% by weight.

또한, 상기 강화과정(530)은 L챔퍼힐링과정(510)을 통하여 셀글라스(20)의 표면의 이물질을 제거하는 과정으로 이루어진 세정과정(520) 및 상기 세정과정(520)을 통하여 세정이 완료된 셀글라스(20)의 전체외면을 질산칼슘으로 강화하는 과정으로 이루어진 으로 이루어진 것이다.In addition, the reinforcing process 530 includes a cleaning process 520 comprising a process of removing foreign substances from the surface of the cell glass 20 through the L chamfer healing process 510 and the cleaning process 520 It consists of a process of strengthening the entire outer surface of the cell glass 20 with calcium nitrate.

상기 강화과정(530)은 셀글라스(20)가 800Mpa의 표면응력을 가지며 12±3㎛ 강화깊이를 가지고, 중앙응력을 갖게 이루어지는 것이다.In the reinforcing process 530, the cell glass 20 has a surface stress of 800 Mpa, a reinforcement depth of 12±3 μm, and a central stress.

상기 강화과정(530)은 셀글라스(20)를 본열과정에 급속한 온도상승에 의한 손상이방지되게 280±30℃의 열풍에 의하여 30±10분 동안 예열하고, 예열된 셀글라스(20)를 380±40℃의 KNO3(질산칼륨)용액 속에서 40±20분 동안 본열을 가하여 KNO3 셀글라스(20) 표면에 침투되게 하고, 130±30℃의 온수에 의하여 15±5분동안 서냉하여 이루지는 것이다.In the strengthening process 530, the cell glass 20 is preheated for 30 ± 10 minutes by hot air at 280 ± 30° C. to prevent damage due to a rapid temperature increase in the main heating process, and the preheated cell glass 20 is 380 Apply full heat for 40±20 minutes in KNO 3 (potassium nitrate) solution at ±40°C to penetrate the surface of KNO 3 cell glass (20), and slowly cool for 15±5 minutes by warm water at 130±30°C. Is.

이하, 본 발명의 적용실시에 따른 작용효과에 대하여 설명하면 다음과 같다.Hereinafter, a description will be given of the effects of the application of the present invention.

상기한 바와 같이 커버윈도우용 박막글라스 제조방법에 있어서, 원판글라스(10)를 공급하는 과정으로 이루어진 원판글라스공급과정(100)과 상기 원판글라스공급과정(100)을 통하여 공급된 원판글라스(10)의 상하 양면에 DFR필름을 부착하는 과정으로 이루어진 DFR라미과정(210), 상기 DFR라미과정(210)을 통하여 DFR필름이 부착된 원판글라스(10)의 일측면에 절단마스킹부(31)를 갖는 노광지그(30)를 밀착시키고 UV를 조사하여 UV가 조사면의 DFR필름을 관통하여 반대 측면의 DFR필름까지 노광경화시키는 과정으로 이루어진 단면지그조사양면노광과정(220), 상기 단면지그조사양면노광과정(220)을 통하여 DFR필름의 단면지그조사양면노광이 완료된 원판글라스(10)의 노광 경화된 DFR필름이 원판글라스(10)에 밀착되게 가온 건조하는 과정으로 이루어진 DFR라미PREBAKE과정(230), 상기 DFR라미PREBAKE과정(230)을 통하여 노광 경화된 DFR필름의 밀착이 완료된 원판글라스(10)의 비노광 비경화 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 비노광DFR라미현상과정(240), 상기 비노광DFR라미현상과정(240)을 통하여 비노광 비경화 DFR필름이 제거된 원판글라스(10)의 잔류 DFR필름의 들뜬 부위를 원판글라스(10)에 밀착시키는 과정으로 이루어진 잔류DFR라미HARDBAKE과정(250), 상기 잔류DFR라미HARDBAKE과정(250)을 통하여 노출된 원판글라스(10)의 커팅부 중앙에 레이저로 셀커팅선을 형성하는 과정으로 이루어진 셀커팅홈가공과정(310), 상기 셀커팅홈가공과정(310)을 통하여 셀커팅선이 형성된 원판글라스(10)를 셀글라스(20)단위로 절단하는 과정으로 이루어진 셀글라스분리과정(320), 상기 셀글라스분리과정(320)을 통하여 셀글라스(20)로 분리되고 절단부(21)위의 상하면이 노출된 셀글라스(20)를 화학에칭에 의하여 L챔퍼부(22)가 식각형성되게 에칭하는 과정으로 이루어진 L챔퍼화학에칭과정(400), 상기 L챔퍼화학에칭과정(400)을 통하여 L챔퍼부(22)가 형성된 셀글라스(20) 양면의 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 DFR박리과정(420), 상기 L챔퍼화학에칭과정(400)을 통하여 에칭형성된 셀글라스(20)의 L챔퍼부(22)의 거친표면을 부드러운면이 형성되게 저농도애칭하는 과정으로 이루어진 L챔퍼힐링과정(510), 상기 L챔퍼힐링과정(510)을 통하여 셀글라스(20)의 표면의 이물질을 제거하는 과정으로 이루어진 세정과정(520) 및 상기 세정과정(520)을 통하여 세정이 완료된 셀글라스(20)의 전체외면을 질산칼슘으로 강화하는 과정으로 이루어진 강화과정(530)으로 이루어진 본 발명을 적용하여 실시하게 되면, 절단부면에칭단계(404)와 DFR필름면경사에칭단계(405)로 이루어진 L챔퍼화학에칭과정(400)을 통하여 셀글라스(20)의 셀커팅선에 의하여 절단형성된 양단 절단부(21)에 L챔퍼부(22)가 형성되어 셀글라스(20)의 양단 절단부(21) 취성에 대한 내구성이 향상되는 것이다.As described above, in the method of manufacturing a thin film glass for a cover window, the original glass supply process 100 consisting of the process of supplying the original glass 10 and the original glass 10 supplied through the original glass supply process 100 DFR lamy process 210 consisting of a process of attaching the DFR film on both sides of the DFR lamy process 210, through the DFR lamy process 210, having a cutting masking part 31 on one side of the original glass 10 to which the DFR film is attached. A single-sided jig irradiation double-sided exposure process 220 consisting of a process in which the exposure jig 30 is in close contact and UV irradiated so that the UV penetrates the DFR film on the irradiated side and exposes and cures the DFR film on the opposite side, the single-sided jig irradiation double-sided exposure DFR Lamy PREBAKE process 230 consisting of a process of heating and drying the cured DFR film to be in close contact with the original glass 10 by exposure of the original glass 10 on which the single-sided jig irradiation of the DFR film has been exposed through the process 220, The non-exposed DFR lami developing process 240 consisting of removing the non-exposed non-cured DFR film of the original glass 10 on which the exposure-cured DFR film is adhered through the DFR lami PREBAKE process 230 with a developer solution, Residual DFR Lamy HardBAKE process consisting of a process of intimately adhering the excitation part of the residual DFR film of the original glass 10 from which the non-exposed non-cured DFR film has been removed through the non-exposed DFR lamy development process 240 to the original glass 10 (250), a cell cutting groove processing process 310 consisting of forming a cell cutting line with a laser in the center of the cutting part of the original glass 10 exposed through the residual DFR ramie hardboard process 250, the cell cutting The cell glass separation process 320 consisting of cutting the original glass 10 on which the cell cutting line is formed by the cell glass 20 unit through the grooving process 310, and the cell glass separation process 320 L chamfer chemical etching process 400 consisting of a process of etching the cell glass 20 separated by the glass 20 and the upper and lower surfaces of the cut part 21 exposed so that the L chamfer part 22 is etched by chemical etching , The L chamfer The DFR peeling process 420 consisting of removing the DFR film on both sides of the cell glass 20 on which the L chamfer part 22 is formed through a chemical etching process 400, and the L chamfer chemical etching process 400 The cell through the L chamfer healing process 510 and the L chamfer healing process 510 consisting of a process of nickname the rough surface of the L chamfer part 22 of the cell glass 20 formed by etching at a low concentration so that a smooth surface is formed. A reinforcing process consisting of a cleaning process 520 consisting of removing foreign substances from the surface of the glass 20 and a process of reinforcing the entire outer surface of the cell glass 20 cleaned through the cleaning process 520 with calcium nitrate If implemented by applying the present invention consisting of 530, the cell of the cell glass 20 through the L chamfer chemical etching process 400 consisting of the cutting surface etching step 404 and the DFR film surface oblique etching step 405 L chamfer portions 22 are formed in the cut portions 21 at both ends formed by cutting lines, so that the durability against brittleness of the cut portions 21 at both ends of the cell glass 20 is improved.

또한, 본 발명은 파장 365nm이고 50~100mj/cm2의 광량을 갖는 UV에 의하여 DFR필름이 부착된 원판글라스(10)의 일측면에서 UV를 조사하여서 조사면의 DFR필름을 관통하여 반대 측면의 DFR필름까지 노광경화시키는 과정으로 이루어진 단면지그조사양면노광과정(220)이 이루어져 원판글라스(10)의 노광경화가 신속하고 명확하게 이루어지는 것이다.In addition, the present invention penetrates the DFR film on the irradiated surface by irradiating UV from one side of the original glass 10 to which the DFR film is attached by UV having a wavelength of 365 nm and an amount of light of 50 to 100 mj/cm2. A single-sided jig-irradiation double-sided exposure process 220 consisting of a process of exposure-curing even the film is performed, and exposure-curing of the original glass 10 is quickly and clearly performed.

10 : 원판글라스
20 : 셀글라스 21 : 절단부
22 : L챔퍼부
22a: 면상에칭부 22b: 경사에칭부
30 : 노광지그 31 : 절단마스킹부
40 : 에칭지그
41 : 행거암 41a: 이탈방지돌기
42 : 셀안착판
43 : 결속지그판
50 : 에칭조 51 : 행거부
100 : 원판글라스공급과정
210 : DFR라미과정 220 : 단면지그조사양면노광과정
230 : DFR라미PREBAKE과정 240 : 비노광DFR라미현상과정
250 : 잔류DFR라미HARDBAKE과정
310 : 셀커팅홈가공과정 320 : 셀글라스분리과정
410 : L챔퍼화학에칭과정,
411 : 지그안착단계 412 : 지그자력결속단계
413 : 지그에칭액침지단계 414 : 절단부면에칭단계
415 : DFR필름면경사에칭단계 416 : 에칭완료단계
420 : DFR박리과정
510 : L챔퍼힐링과정
520 : 세정과정
530 : 강화과정10: Original glass
20: cell glass 21: cut
22: L chamfer part
22a: surface etching portion 22b: oblique etching portion
30: exposure jig 31: cutting masking part
40: etching jig
41: hanger arm 41a: departure preventing protrusion
42: cell seat plate
43: binding jig plate
50: etching bath 51: hanger portion
100: Original glass supply process
210: DFR Lamy process 220: Single-sided jig irradiation double-sided exposure process
230: DFR Lamy PREBAKE process 240: Non-exposed DFR Lamy development process
250: Residual DFR Ramie HardBAKE process
310: Cell cutting groove processing process 320: Cell glass separation process
410: L chamfer chemical etching process,
411: jig seating step 412: jig magnetic binding step
413: jig etching liquid immersion step 414: cut surface etching step
415: DFR film surface gradient etching step 416: Etching completion step
420: DFR peeling process
510: L chamfer healing process
520: cleaning process
530: Reinforcement process

Claims (4)

커버윈도우용 박막글라스 제조방법에 있어서;
원판글라스(10)를 공급하는 과정으로 이루어진 원판글라스공급과정(100)과 상기 원판글라스공급과정(100)을 통하여 공급된 원판글라스(10)의 상하 양면에 DFR필름을 부착하는 과정으로 이루어진 DFR라미과정(210), 상기 DFR라미과정(210)을 통하여 DFR필름이 부착된 원판글라스(10)의 일측면에 절단마스킹부(31)를 갖는 노광지그(30)를 밀착시키고 UV를 조사하여 UV가 조사면의 DFR필름을 관통하여 반대 측면의 DFR필름까지 노광경화시키는 과정으로 이루어진 단면지그조사양면노광과정(220), 상기 단면지그조사양면노광과정(220)을 통하여 DFR필름의 단면지그조사양면노광이 완료된 원판글라스(10)의 노광 경화된 DFR필름이 원판글라스(10)에 밀착되게 가온 건조하는 과정으로 이루어진 DFR라미PREBAKE과정(230), 상기 DFR라미PREBAKE과정(230)을 통하여 노광 경화된 DFR필름의 밀착이 완료된 원판글라스(10)의 비노광 비경화 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 비노광DFR라미현상과정(240), 상기 비노광DFR라미현상과정(240)을 통하여 비노광 비경화 DFR필름이 제거된 원판글라스(10)의 잔류 DFR필름의 들뜬 부위를 원판글라스(10)에 밀착시키는 과정으로 이루어진 잔류DFR라미HARDBAKE과정(250), 상기 잔류DFR라미HARDBAKE과정(250)을 통하여 노출된 원판글라스(10)의 커팅부 중앙에 레이저로 셀커팅선을 형성하는 과정으로 이루어진 셀커팅홈가공과정(310), 상기 셀커팅홈가공과정(310)을 통하여 셀커팅선이 형성된 원판글라스(10)를 셀글라스(20)단위로 절단하는 과정으로 이루어진 셀글라스분리과정(320), 상기 셀글라스분리과정(320)을 통하여 셀글라스(20)로 분리되고 절단부(21)위의 상하면이 노출된 셀글라스(20)를 화학에칭에 의하여 L챔퍼부(22)가 식각형성되게 에칭하는 과정으로 이루어진 L챔퍼화학에칭과정(400), 상기 L챔퍼화학에칭과정(400)을 통하여 L챔퍼부(22)가 형성된 셀글라스(20) 양면의 DFR필름을 현상액에 의하여 제거하는 과정으로 이루어진 DFR박리과정(420), 상기 L챔퍼화학에칭과정(400)을 통하여 에칭형성된 셀글라스(20)의 L챔퍼부(22)의 거친표면을 부드러운면이 형성되게 저농도애칭하는 과정으로 이루어진 L챔퍼힐링과정(510), 상기 L챔퍼힐링과정(510)을 통하여 셀글라스(20)의 표면의 이물질을 제거하는 과정으로 이루어진 세정과정(520) 및 상기 세정과정(520)을 통하여 세정이 완료된 셀글라스(20)의 전체외면을 질산칼슘으로 강화하는 강화과정(530)으로 이루어진 것을 특징으로 하는 L 챔퍼형 커버윈도우용 박막글라스 제조방법.
In the method of manufacturing a thin film glass for a cover window;
DFR Lamy consisting of a process of attaching a DFR film to both upper and lower sides of the original glass supplying process 100 consisting of the process of supplying the original glass 10 and the original glass 10 supplied through the original glass supplying process 100 Through the process 210, the DFR lamy process 210, the exposure jig 30 having the cut masking part 31 is in close contact with one side of the original glass 10 to which the DFR film is attached, and UV is irradiated with UV light. The single-sided jig irradiation double-sided exposure process 220 consisting of a process of exposing and curing the DFR film on the opposite side through the DFR film on the irradiated surface, and the single-sided jig irradiation double-sided exposure of the DFR film through the single-sided jig irradiation double-sided exposure process 220 DFR Lamy PREBAKE process 230 consisting of a process of heating and drying the exposure-cured DFR film of the completed original glass 10 to be in close contact with the original glass 10, and exposure-hardened DFR through the DFR Lamy PREBAKE process 230 Non-exposed DFR lamy developing process 240 consisting of removing the unexposed uncured DFR film of the original glass 10 on which the film is adhered with a developer, and non-exposed through the non-exposed DFR lami developing process 240 The residual DFR ramie HardBAKE process 250, which consists of a process of bringing the excitation part of the residual DFR film of the original glass 10 from which the uncured DFR film has been removed, into close contact with the original glass 10, and the residual DFR Ramie HardBAKE process 250, are performed. A cell cutting groove processing process 310 consisting of forming a cell cutting line with a laser in the center of the cutting portion of the original glass 10 exposed through the cell cutting groove processing process 310, and the original plate on which the cell cutting line is formed through the cell cutting groove processing process 310 A cell glass separation process 320 consisting of cutting the glass 10 into a cell glass 20 unit, the cell glass separation process 320 is separated into the cell glass 20, and the upper and lower surfaces of the cutting part 21 are separated. L chamfer chemical etching process 400 consisting of a process of etching the exposed cell glass 20 so that the L chamfer part 22 is etched by chemical etching, and the L chamfer chemical etching process 400 Celgla with fur part 22 formed The DFR peeling process 420 consisting of removing the DFR film on both sides of the screen 20 by a developer, and the L chamfer portion 22 of the cell glass 20 etched through the L chamfer chemical etching process 400. A cleaning process consisting of a process of removing foreign substances from the surface of the cell glass 20 through the L chamfer healing process 510, which consists of a process of nickname the rough surface at a low concentration to form a smooth surface, and the L chamfer healing process 510 ( 520) and a reinforcing process (530) of reinforcing the entire outer surface of the cell glass (20), which has been cleaned through the cleaning process (520), with calcium nitrate.
 제 1 항에 있어서;
상기 L챔퍼화학에칭과정(400)은 셀글라스(20)를 에칭지그(40)의 셀안착면에 안착하는 단계로 이루어진 지그안착단계(401)와 상기 지그안착단계(401)를 통하여 셀안착면에 안착된 셀글라스(20)의 안착면 반대면에 결속지그판(43)을 밀착시키고 셀안착판(42)과 결속지그판(43) 중 어느 일측에 자석을 구비하여 셀글라스(20)를 자력 안착시키는 단계로 이루어진 지그자력결속단계(402), 상기 지그자력결속단계(402)를 통하여 셀글라스(20)가 자력결속된 에칭지그(40)를 에칭액이 저장된 에칭조(50)에 침지하는 단계로 이루어진 지그에칭액침지단계(403), 상기 지그에칭액침지단계(403)를 통하여 에칭액에 침지된 셀글라스(20)가 에칭액에 의하여 DFR필름이 부착되지 않은 절단부(21)의 상하 양면과 단부면이 면상으로 에칭되는 면상에칭부(22a)를 형성하는 단계로 이루어진 절단부면에칭단계(404), 상기 절단부면에칭단계(404)를 통하여 셀글라스(20)의 절단부(21) 상하 양면이 일정 깊이 침식 에칭되어 DFR필름 부착면 하부로의 단차가 형성되면 상기 단차 형성부위로 에칭액이 작용되어서 절단부(21)의 면상에칭부(22a) 깊이에 비례하여 DFR필름의 하부로 침식에칭에 의하여 경사에칭부(22b)가 에칭형성되는 단계로 이루어진 DFR필름면경사에칭단계(405) 및 상기 DFR필름면경사에칭단계(405)를 통하여 셀글라스(20)의 면상에칭부(22a)와 경사에칭부(22b)가 일정길이로 형성되면 에칭지그(40)를 에칭조(50)로부터 꺼내고 에칭지그(40)로부터 셀글라스(20)를 분리하는 단계로 이루어진 에칭완료단계(406)로 이루어진 것을 특징으로 하는 L 챔퍼형 커버윈도우용 박막글라스 제조방법.
The method of claim 1;
The L-chamfer chemical etching process 400 includes a jig mounting step 401 consisting of mounting the cell glass 20 on the cell mounting surface of the etching jig 40 and the cell mounting surface through the jig mounting step 401 The binding jig plate 43 is in close contact with the opposite side of the seating surface of the cell glass 20 seated in the cell glass 20, and a magnet is provided on either side of the cell seating plate 42 and the binding jig plate 43. Zig magnetic binding step 402 consisting of a step of magnetically seating, and the etching jig 40 magnetically bound by the cell glass 20 through the zig magnetic binding step 402 is immersed in the etching bath 50 in which the etchant is stored. A jig etching solution immersion step 403 consisting of steps, the cell glass 20 immersed in the etching solution through the jig etching solution immersion step 403 is the upper and lower sides and the end surfaces of the cut portion 21 to which the DFR film is not attached by the etching solution Through the cutting surface etching step 404 consisting of forming an etching part 22a on the surface etched on this surface, and the cutting surface etching step 404, the upper and lower sides of the cut part 21 of the cell glass 20 have a certain depth. When a step is formed under the DFR film adhesion surface by erosion etching, an etching solution is applied to the step forming part, and in proportion to the depth of the etching part 22a on the surface of the cut part 21, an inclined etching part is performed by erosion etching to the lower part of the DFR film. Through the DFR film surface gradient etching step 405 and the DFR film surface gradient etching step 405 consisting of a step in which (22b) is etched, the etching portion 22a and the oblique etching portion 22b on the surface of the cell glass 20 L, characterized in that consisting of an etching completion step 406 consisting of the step of removing the etching jig 40 from the etching bath 50 and separating the cell glass 20 from the etching jig 40 when) is formed to a predetermined length. Thin film glass manufacturing method for chamfered cover windows.
 제 2 항에 있어서;
상기 에칭지그(40)는 상부 양측에 에칭조(50)에 구비된 행거부(51)에 지지되는 행거암(41)을 돌출형성하고 상기 행거암(41)의 중앙 측에서 하부로 돌출형성된 1 개 내지 2개의 셀안착판(42) 및 상기 셀안착판(42)에 안착된 셀글라스(20)를 밀착 결속하는 결속지그판(43)으로 구성하고, 상기 행거암(41)의 양측에는 에칭조(50)에 행거시 이탈방지를 위하여 하부로 돌출형성된 이탈방지돌기(41a)를 형성한 것을 특징으로 하는 L 챔퍼형 커버윈도우용 박막글라스 제조방법.
The method of claim 2;
The etching jig 40 protrudes a hanger arm 41 supported by a hanger portion 51 provided in the etching bath 50 on both upper sides and protrudes downward from the center side of the hanger arm 41 Consisting of two or two cell seating plates 42 and a binding jig plate 43 for closely binding the cell glass 20 seated on the cell seating plate 42, and etching on both sides of the hanger arm 41 L-chamfer type thin film glass manufacturing method for a cover window, characterized in that forming a detachment preventing protrusion (41a) protruding downward to prevent detachment when hanging in the bath (50).
 제 1 항에 있어서;
상기 강화과정(530)은 셀글라스(20)를 본열과정에 급속한 온도상승에 의한 손상이방지되게 280±30℃의 열풍에 의하여 30±10분 동안 예열하고, 예열된 셀글라스(20)를 380±40℃의 KNO3(질산칼륨)용액 속에서 40±20분 동안 본열을 가하여 KNO3 셀글라스(20) 표면에 침투되게 하고, 130±30℃의 온수에 의하여 15±5분동안 서냉하여 이루어진 것을 특징으로 하는 L 챔퍼형 커버윈도우용 박막글라스 제조방법.
The method of claim 1;
In the strengthening process 530, the cell glass 20 is preheated for 30 ± 10 minutes by hot air at 280 ± 30° C. to prevent damage due to a rapid temperature increase in the main heating process, and the preheated cell glass 20 is 380 It is made by applying main heat in ±40℃ KNO 3 (potassium nitrate) solution for 40±20 minutes to penetrate the surface of KNO 3 cell glass (20), and slowly cooling for 15±5 minutes with warm water at 130±30℃. L-chamfer-type thin-film glass manufacturing method for a cover window, characterized in that.
KR1020200171633A 2020-12-09 2020-12-09 Manufacturing method of thin-film glass for L chamfer type cover window KR102240445B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020200171633A KR102240445B1 (en) 2020-12-09 2020-12-09 Manufacturing method of thin-film glass for L chamfer type cover window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200171633A KR102240445B1 (en) 2020-12-09 2020-12-09 Manufacturing method of thin-film glass for L chamfer type cover window

Publications (1)

Publication Number Publication Date
KR102240445B1 true KR102240445B1 (en) 2021-04-14

Family

ID=75477388

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200171633A KR102240445B1 (en) 2020-12-09 2020-12-09 Manufacturing method of thin-film glass for L chamfer type cover window

Country Status (1)

Country Link
KR (1) KR102240445B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102443796B1 (en) * 2022-05-30 2022-09-16 주식회사 도우인시스 Cell unit thin glass manufactured by cutting and post-processing method of glass
KR20230102368A (en) * 2021-12-30 2023-07-07 주식회사 도우인시스 Laser cutting and post-processing method of partially coated UTG
KR20230127575A (en) * 2022-02-25 2023-09-01 주식회사 도우인시스 Side healing method of UTG glass using acid-resistant coating and film

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101661278B1 (en) * 2015-07-14 2016-09-29 에스피텍 주식회사 Manufacturing Method of Ultra-Thin Type Glass Plate
KR20180045120A (en) * 2016-10-24 2018-05-04 (주)유티아이 manufacturing method of camera window with bottom pattern and camera window with bottom pattern thereby
KR20190045730A (en) 2017-10-24 2019-05-03 크루셜텍 (주) Cover glass and manufacturing method thereof
KR102067930B1 (en) * 2019-05-17 2020-02-11 주식회사 진우엔지니어링 Manufacturing method of both-sided patterned window glass for camera of smartphone

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101661278B1 (en) * 2015-07-14 2016-09-29 에스피텍 주식회사 Manufacturing Method of Ultra-Thin Type Glass Plate
KR20180045120A (en) * 2016-10-24 2018-05-04 (주)유티아이 manufacturing method of camera window with bottom pattern and camera window with bottom pattern thereby
KR20190045730A (en) 2017-10-24 2019-05-03 크루셜텍 (주) Cover glass and manufacturing method thereof
KR102067930B1 (en) * 2019-05-17 2020-02-11 주식회사 진우엔지니어링 Manufacturing method of both-sided patterned window glass for camera of smartphone

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230102368A (en) * 2021-12-30 2023-07-07 주식회사 도우인시스 Laser cutting and post-processing method of partially coated UTG
KR102580360B1 (en) * 2021-12-30 2023-09-19 주식회사 도우인시스 Manufacturing method of partially coated UTG
KR20230127575A (en) * 2022-02-25 2023-09-01 주식회사 도우인시스 Side healing method of UTG glass using acid-resistant coating and film
KR102604022B1 (en) * 2022-02-25 2023-11-20 주식회사 도우인시스 Side healing method of UTG glass using acid-resistant coating and film
KR102443796B1 (en) * 2022-05-30 2022-09-16 주식회사 도우인시스 Cell unit thin glass manufactured by cutting and post-processing method of glass
WO2023234467A1 (en) * 2022-05-30 2023-12-07 주식회사 도우인시스 Unit cell thin film glass manufactured by means of glass cutting and post-processing method

Similar Documents

Publication Publication Date Title
KR102240445B1 (en) Manufacturing method of thin-film glass for L chamfer type cover window
KR101225543B1 (en) Strengthened glass, touch panel and method of manufacturing strengthened glass
KR101970921B1 (en) Pattern glass manufacturing method for portable terminal using raw material plate glass
JP2001293700A (en) Manufacturing method of microstructure using preformed photoresist sheet
US3358363A (en) Method of making fuse elements
KR100848333B1 (en) Manufacturing method of non-slip plate
DE69513424D1 (en) Method for producing a matrix for producing optical disks without using a main plate
JPS6364394A (en) Manufacture of printed wiring board
JP2003507765A (en) Exposure during rework for improved resist removal
KR102240446B1 (en) Thin film glass manufacturing method for convex curved chamfer type cover window
JPH09288358A (en) Formation of conductor circuit
KR20060044449A (en) Method of processing substrate and chemical used in the same
US5755947A (en) Adhesion enhancement for underplating problem
US3668029A (en) Chemical machining process
JP2005343115A (en) Preparation method of resist pattern, method of preparing elecroforming, and preparation method of mold
KR20130060999A (en) Method of forming pattern
US2389504A (en) Process of making reticles or the like
JP4977516B2 (en) Substrate manufacturing method
KR20100065831A (en) Etching method of metal layer
RU2195047C2 (en) Photoresist mask generation process
JPS5984426A (en) Patterning method of positive resist
JPH06105686B2 (en) Method for manufacturing semiconductor device
JPS60192951A (en) Production of electrophotographic sensitive body
KR102436068B1 (en) No-bridge type electronic component manufacturing method
US2371773A (en) Method and means for making engraved plates