KR102134203B1 - Lithography method, determination method, information processing apparatus, storage medium, and method of manufacturing article - Google Patents

Abstract

The present invention comprises a first shot area layout having a first size, respectively, by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure. Provided is a method of forming on a substrate a second layer comprising a layout of a second shot area, each having a second size corresponding to a size including a first layer and two or more first shot areas to overlap each other. In such a method, each of the first shot regions is such that combinations each including two or more first shot regions and scanning directions included in the second shot region in the first process are the same in at least a portion of the second shot region. With respect to, it includes the step of determining the scanning direction when performing the scanning exposure to the first shot area in the first process.

Description

Lithography method, determination method, information processing device, storage medium, and manufacturing method of articles{LITHOGRAPHY METHOD, DETERMINATION METHOD, INFORMATION PROCESSING APPARATUS, STORAGE MEDIUM, AND METHOD OF MANUFACTURING ARTICLE}

The present invention relates to a lithography method, a determination method, an information processing apparatus, a storage medium, and a method of manufacturing an article.

International Publication No. 99/36949 and Japanese Patent Publication No. 2009-212471 disclose techniques for overlapping accuracy (Mix & Match) between different lithographic apparatuses. International Publication No. 99/36949 discloses an exposure method that improves the overlapping accuracy depending on the type of exposure apparatus, that is, a syringe and a stepper, by taking into consideration the characteristics of the apparatus (ease of correction of imaging characteristics). In this exposure method, when a plurality of layers (patterns) overlapping each other using a plurality of exposure apparatuses are formed on a substrate, a layer having different imaging characteristics of the exposure apparatus for forming an arbitrary layer among the plurality of exposure apparatuses It is adjusted in consideration of the image distortion correction characteristics of the exposure apparatus for forming.

Japanese Patent Laid-Open No. 2009-212471, between the shot regions by using an imprint apparatus that is difficult to control the shape of the shot region for the lower layer pattern, and by using an exposure apparatus for the pattern to overlap on the lower layer pattern. Disclosed is a method for reducing distortion.

Recently, for semiconductor devices, various techniques have been developed to increase the capacity of a memory and also reduce the size of a memory, not only by two-dimensional miniaturization but also by a three-dimensional multilayer structure. With the progress of this technology, the types of lithographic apparatus used to manufacture semiconductor devices have been diversified. In addition, since the three-dimensional multi-layer structure of the semiconductor device increases the number of layers, there is a tendency that a high overlapping accuracy with a lower layer pattern in each layer is required. For example, the overlapping accuracy with a stepper or syringe, the overlapping accuracy between an exposure apparatus having a normal angle of view (small angle of view) and an exposure apparatus having a large angle of view, the overlapping accuracy between the imprint apparatus and the exposure apparatus, and other high levels It is required to be.

In particular, between the exposure apparatus having a normal viewing angle and the imprint apparatus having a large viewing angle, the tendency of the shot area (exposure area) of the normal viewing angle included in the shot area (imprint area) of the large viewing angle where the mold is pressed is generally It is different for each large angle of view. For example, it is highly likely that a combination including a shot area of a normal angle of view and a scanning direction included in a shot area of a large angle of view is changed. As such, it is difficult to control the match of the shot area between these devices, resulting in a clear overlap error.

The present invention provides an lithographic method that is advantageous in reducing overlap errors when forming the first and second layers on a substrate such that they overlap each other.

According to one aspect of the present invention, a plurality of first shots each having a first size by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure A first layer comprising a layout of regions, and a second layer comprising a layout of a plurality of second shot regions each having a second size corresponding to a size including two or more first shot regions to overlap each other. A lithographic method is provided for forming a substrate on a substrate, the method comprising: obtaining first layout information indicating a layout of a first shot area, and second layout information indicating a layout of a second shot area, and a first layout And based on the information and the second layout information, for each of the first shot regions, determining a scanning direction when performing scanning exposure to the first shot regions in the first processing, and in such a determining step , In the first process, the scan direction is determined such that combinations each including two or more first shot areas and scan directions included in the second shot area are the same in at least a portion of the second shot area.

Additional features of the present invention will become apparent from the following description of exemplary embodiments with reference to the accompanying drawings.

1 is a flow diagram illustrating a lithographic method according to one aspect of the invention.
2A and 2B are views showing examples of the layout of the first shot area and the layout of the second shot area, respectively.
3A to 3C are diagrams illustrating a case where the first and second layers overlap with each other according to conventional techniques.
4A to 4C are diagrams illustrating a case where the first and second layers overlap with each other according to an embodiment.
5A and 5B are diagrams showing examples of layouts of the first shot region and examples of layouts of the second shot region, respectively.
6A to 6D are diagrams illustrating a case where the first and second layers overlap with each other according to conventional techniques.
7A to 7D are diagrams illustrating a case where the first and second layers overlap with each other according to an embodiment.
8 is a diagram illustrating an example of an exposure error according to a scanning direction of four first shot regions included in each second shot region.
9 is a view showing an example of a correction table for correcting the exposure error shown in FIG. 8.
10 is a view for explaining the number of first shot regions included in each second shot region.
11A and 11B are diagrams for describing the number of first shot regions included in each second shot region.

With reference to the accompanying drawings, preferred embodiments of the present invention will be described below. It should be noted that throughout the drawings, the same reference numerals denote the same members and will not be repeated.

1 is a flow diagram illustrating a lithographic method according to one aspect of the invention. In this lithographic method, a first treatment and a second layer (e.g., (N+1)) layer or (N-) forming a first layer (e.g., Nth layer) in a process involving scanning exposure 1) By the second process of forming the first layer), the first and second layers are formed on the substrate such that they overlap each other. The first layer includes a layout of a plurality of first shot areas each having a first size, and the second layer includes a plurality of second sizes each having a second size corresponding to a size including two or more first shot areas. Contains the layout of the shot area. In the first and second processes, different lithographic apparatuses (different types of lithographic apparatuses) are used. In this embodiment, a scanning exposure apparatus (exposure apparatus referred to as a syringe, or other) for performing exposure (scanning exposure) to the substrate while scanning the mask (reticle) and the substrate in the scanning direction is used in the first process and , An imprint apparatus for forming a pattern by contacting a mold with an imprint material on a substrate is used in the second processing. Accordingly, the exposure apparatus is used as a lithographic apparatus having a small angle of view (the first shot region has a first size), and the imprint apparatus is used as a lithographic apparatus having a large angle of view (the second shot region is a second size) Have).

In step S102, first layout information indicating the layout of the first shot region in the first layer formed by the exposure apparatus is obtained. The exposure apparatus (the storage unit) stores a recipe for forming the first layer. The recipe includes layout information indicating the layout of the shot area as well as the exposure conditions when performing scanning exposure to the substrate (each of the shot areas). Accordingly, the first layout information can be acquired by referring to the recipe stored in the exposure apparatus. The exposure conditions include, for example, the scanning direction and scanning speed when performing scanning exposure for each shot area, the exposure order of each shot area, the exposure amount, and the movement path of the substrate between the shot areas .

In step S104, second layout information indicating the layout of the second shot region in the second layer formed by the imprint apparatus is obtained. The imprint apparatus (the storage unit) stores a recipe for forming the second layer. The recipe includes layout information indicating the layout of the shot area as well as the imprint conditions when performing an imprint process on the substrate. Accordingly, the second layout information can be obtained by referring to the recipe stored in the imprint apparatus. Imprint conditions include the remaining layer thickness of the imprint material to be formed on the substrate, the time to fill the mold with the imprint material, and the pressing force of the mold. It should be noted that the remaining layer thickness represents the thickness of the imprint material between the surface of the substrate and the surface (lower surface) of the concave portion of the pattern formed by the cured imprint material.

In step S106, whether or not overlapping conditions between the first and second shot regions are uniform, that is, two or more first shot regions and scanning directions included in each second shot region in the first process are determined. It is determined whether the combinations included therein are the same. In this example, the fact that the combinations each including the scanning direction and two or more first shot regions are the same indicates that those combinations are the same in at least a portion (more than a predetermined number) of the second shot regions. If the overlap condition between the first and second shot regions is non-uniform, the process proceeds to step S108. On the other hand, if the overlapping conditions between the first and second shot regions are uniform, the process proceeds to step S112.

In step S108, for each of the first shot regions, the scanning direction when performing the exposure of the first shot region in the first processing is uniform in the overlapping conditions between the first and second shot regions. So, it is decided. In this example, in the first processing, two or more first shot regions included in the second shot region are specified based on the first layout information obtained in step S102 and the second layout information obtained in step S104. do. Subsequently, each scan direction of the first shot area is determined such that combinations each including two or more first shot areas and the scan direction included in the second shot area are the same within at least a portion of the second shot area. . At this time, such combinations are preferably the same in all second shot regions.

In step S110, the recipe for forming the first layer, that is, the recipe stored in the exposure apparatus is changed (updated) based on the scanning direction determined in step S108. For example, the scanning direction when scanning exposure for each of the first shot areas included in the recipe stored in the exposure apparatus is changed to the determined scanning direction. In addition, the exposure order in which the first shot regions are scanned and exposed in the recipe stored in the exposure apparatus is changed so that the scanning direction when performing scanning exposure for each of the first shot regions is changed to the determined scanning direction. Can be. In addition, the movement path of the substrate between the first shot regions included in the recipe stored in the exposure apparatus is changed so that the scanning direction when performing scanning exposure for each of the first shot regions is changed to the determined scanning direction. Can be.

In step S112, the first and second processes are performed, so that the first and second layers to be overlapped with each other are formed on the substrate. As described above, in the first process, the first layer is formed by subjecting the substrate to scanning exposure according to the recipe stored in the exposure apparatus, and in the second processing, according to the recipe stored in the imprint apparatus. The second layer is formed by performing an imprint process.

In this embodiment, the first processing is performed such that combinations each including two or more first shot regions and scanning directions included in each second shot region are the same within at least a portion of the second shot region. This helps control the match between two or more first shot areas and the second shot area when performing an imprint process on the second shot area in the second process (this allows more accurate control of the match). Accordingly, this embodiment is advantageous in reducing overlapping errors (i.e., overlapping errors between different lithographic apparatuses) when forming the first and second layers to overlap each other on the substrate.

A practical example of the lithography method according to this embodiment will be described below.

<Example 1>

2A is a diagram showing an example of the layout of a plurality of first shot regions SR1 in the first layer. In Fig. 2A, the scanning direction when scanning exposure is performed for each of the first shot regions SR1 is indicated by arrows. 2B is a diagram illustrating an example of the layout of a plurality of second shot regions SR2 in the second layer. 2A and 2B, the size of the first shot area SR1 is different from the size of the second shot area SR2, and the second shot area SR2 includes four first shot areas SR1. It has a size corresponding to the inclusive size.

FIG. 3A shows a first layer (FIG. 3A) without considering first layout information indicating the layout of the first shot area SR1 and second layout information indicating the layout of the second shot area SR2 according to a conventional technique. 2A) and a second layer (FIG. 2B) are views showing a state in which they overlap each other. In this case, it can be understood that as shown in FIGS. 3B and 3C, combinations each including four first shot regions SR1 and scanning directions included in each second shot region SR2 are different. There will be.

4A is a diagram showing a state in which the first layer (FIG. 2A) and the second layer (FIG. 2B) overlap each other according to the present embodiment. In this embodiment, as described above, the scanning direction when performing scanning exposure for each of the first shot regions SR1 is determined based on the first layout information and the second layout information. Accordingly, as shown in FIGS. 4B and 4C, a combination including at least four first shot regions SR1 and scan directions respectively included in each second shot region SR2 is the same.

As described above, in this embodiment, overlap between the first shot area SR1 and the second shot area SR2 (first layout information and second layout information) is previously acquired, and the first shot area SR1 ) Is determined when scanning exposure is performed for each. As a result, combinations each including the scanning direction and the first shot area SR1 may be the same in all the second shot areas SR2.

<Example 2>

5A is a diagram illustrating an example of the layout of a plurality of first shot regions SR1 in the first layer. In Fig. 5A, the scanning direction when scanning exposure is performed for each of the first shot regions SR1 is indicated by arrows. 5B is a diagram illustrating an example of the layout of a plurality of second shot regions SR2 in the second layer. 5A and 5B, the size of the first shot area SR1 is different from the size of the second shot area SR2, and the second shot area SR2 includes two first shot areas SR1. It has a size corresponding to the inclusive size.

6B is a view showing a state in which the first layer (FIG. 5A) and the second layer (FIG. 5B) overlap each other when scanning exposure is performed on the first shot region SR1 in the exposure order shown in FIG. 6A. to be. When performing scanning exposure for each shot area of the substrate, the exposure order is generally set from the shot area located at the end of the substrate to form a serpentine shape, as shown in Fig. 6A. In this case, as illustrated in FIGS. 6C and 6D, some of the combinations each including two first shot regions SR1 and scanning directions included in each second shot region SR2 are different.

7B is a view showing a state in which the first layer (FIG. 5A) and the second layer (FIG. 5B) overlap each other when scanning exposure is performed on the first shot area SR1 in the exposure order shown in FIG. 7A. to be. In this embodiment, as described above, the scanning direction when performing scanning exposure for each of the first shot regions SR1 is determined based on the first layout information and the second layout information. Subsequently, the exposure order in which the first shot area SR1 is scanned and exposed is changed so that the scanning direction when performing the exposure of each of the first shot areas SR1 is set to the determined scanning direction. More specifically, as shown in FIG. 7A, the exposure ordinal number of the first shot area SR1 indicated by the dotted line in FIG. 7A has been changed from the exposure order shown in FIG. 6A. Accordingly, as shown in FIGS. 7C and 7D, combinations each including two first shot regions SR1 and scanning directions included in each second shot region SR2 are the same.

As described above, in this embodiment, overlap between the first shot area SR1 and the second shot area SR2 (first layout information and second layout information) is previously acquired, and the first shot area SR1 ) Is determined when scanning exposure is performed for each. Subsequently, the exposure order of the first shot area SR1 is changed so that the scanning direction when performing the exposure of each of the first shot areas SR1 is set to the determined scanning direction. As a result, combinations each including the scanning direction and the first shot area SR1 may be the same in all the second shot areas SR2.

<Example 3>

When performing scanning exposure to the first shot area SR1 in the first process, a correction table RSP for correcting the exposure error according to the scanning direction of the shot area is selected according to the scanning direction determined in this embodiment. . In the first process, scanning exposure is performed on the first shot area SR1 using the selected correction table.

8 is a diagram illustrating an example of an exposure error according to a scanning direction of four first shot regions SR1a, SR1b, SR1c, and SR1d included in the second shot region SR2. In this case, when scanning exposure is performed on the first shot area SR1a, the correction table CTa shown in FIG. 9 is selected, and the first shot area is used by using the correction table CTa in the first process. Scan exposure is performed for (SR1a). Further, when scanning exposure is performed on the first shot area SR1b, the correction table CTb shown in FIG. 9 is selected, and the first shot area SR1b is used by using the correction table CTb in the first process. ) Is subjected to scanning exposure. Similarly, when performing scanning exposure for each of the first shot regions SR1c and SR1d, the correction table CTc or CTd shown in Fig. 9 is selected, and the correction table CTc or CTd in the first process Scan exposure is performed for each of the first shot regions SR1c and SR1d using.

As described above, for each of the first shot regions SR1a to SR1d, changing the correction table for use in the first process between the correction tables CTa to CTd according to the scanning direction determined in this embodiment Thereby, the exposure error according to the scanning direction can be corrected.

<Example 4>

In the shot layout, as illustrated in FIG. 10, the number of first shot regions SR1 included in each second shot region SR2 may vary according to the position of the second shot regions SR2. For example, the second shot region SR2a in the central portion of the substrate includes four first shot regions SR1, but the second shot region SR2b in the peripheral portion of the substrate is only two first shot regions (SR1). Also, the second shot region SR2c in the peripheral portion of the substrate includes only one first shot region SR1. When the imprint process is performed for each of the second shot areas SR2b and SR2c (partial shot area), when the imprint process is performed for the second shot area SR2a (complete shot area), a specific Distortion occurs. In order to cope with such specific distortion, when scanning exposure is performed for each of the first shot regions SR1, the first shot regions included in the second shot region SR2 as well as the scan direction determined in this embodiment are ( Depending on the number of SR1), a correction table is selected. In other words, even when the scanning direction when performing the exposure of the first shot region SR1 is the same, the second according to the number of the first shot regions SR1 included in the second shot region SR2. The correction table for use in processing is preferably changed. This can more accurately correct an exposure error according to a scanning direction when performing a scanning exposure for the first shot area SR1.

<Example 5>

In the shot layout, as shown in FIGS. 11A and 11B, the number of first shot regions SR1 included in each second shot region SR2 may vary according to the position of the second shot regions SR2. have. For example, as shown in FIG. 11B, each second shot area SR2d (partial shot area) in the peripheral portion of the substrate includes only one to three first shot areas SR1. As shown in Fig. 11A, scanning exposure is matched to the second shot area SR2d by matching scanning directions to obtain a shot layout identical to the shot layout of the second shot area SR2a (see Fig. 10). Is generally practiced. However, as in the case of the second shot area SR2d, in consideration of characteristics when performing an imprint process on the second shot area SR2 having the second size, a scanning direction different from the scanning direction of the other shot areas Can be set. For example, when pressing the mold against the imprint material within the second shot area SR2d, a method of applying a force or hardening the imprint material, which is different from the method for other shot areas, considers the protrusion of the imprint material. Can be adopted. Accordingly, as illustrated in FIG. 11B, scanning exposure may be performed by setting a scanning direction different from a scanning direction of another shot area in a specific shot area, that is, within the second shot area SR2d. .

The method of manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a semiconductor element or a liquid crystal display element. The manufacturing method includes forming a pattern on the substrate using the lithography method described above, and processing the substrate on which the pattern is formed. Such a manufacturing method may further include other well-known steps (e.g., oxidation, deposition, deposition, doping, planarization, etching, resist removal, dicing, bonding, and packaging) following the formation steps described above. have. The article manufacturing method according to the embodiment is superior to the conventional method in at least one of the performance, quality, productivity, and production cost of the article.

Further, when forming first and second layers overlapping each other on a substrate, a determination method for determining a scanning direction when performing scanning exposure for each of the first shot regions, and an information processing apparatus for executing such a determination method Also constitutes one aspect of the present invention.

Other Examples

The embodiment(s) of the present invention is a computer recorded in a storage medium (which may be more broadly referred to as a'non-transitory computer-readable storage medium') to perform one or more functions of the above-described embodiment(s). Includes one or more circuits (eg, on-demand semiconductors (ASICs)) that read and execute executable instructions (eg, one or more programs) and/or perform one or more of the functions of the embodiment(s) described above. By reading and executing computer-executable instructions from a storage medium to perform one or more functions of the above-described embodiment(s), and/or by a computer of a system or device, and/or the above-described embodiment ( It may also be implemented by controlling the one or more circuits to perform one or more of the functions, or by a method performed by a computer of a system or device. A computer may include one or more processors (eg, a central processing unit (CPU), micro processing unit (MPU)), and separate computers or separate computer processors for reading and executing computer-executable instructions. It may include a network. Computer-executable instructions may be provided, for example, from a network or storage medium to a computer. The storage medium includes, for example, a hard disk, random access memory (RAM), read-only memory (ROM), a storage unit of a distributed computing system, an optical disk (eg, a compact disk (CD), a digital multifunctional disk (DVD) ), or Blu-ray Disc (BD) ^TM, etc.), flash memory devices, memory cards, and others.

(Other examples)

The present invention provides a program that realizes one or more functions of the above-described embodiments to a system or device via a network or storage medium, and one or more processors read and execute the program in the computer of the system or device. It is also possible to realize the processing.

Also, it can be implemented by a circuit (for example, ASIC) that realizes one or more functions.

Although the invention has been described with reference to exemplary embodiments, it will be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims shall follow the broadest interpretation to cover all modifications and equivalent structures and functions.

Claims (13)

Said first comprising a layout of a plurality of first shot regions each having a first size, by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure Lithography to form the second layer on the substrate comprising a layout of a plurality of second shot regions each having a second size corresponding to a size including a layer and two or more first shot regions to overlap each other. The way is:
Obtaining first layout information indicating the layout of the first shot regions and second layout information indicating the layout of the second shot regions; And
Based on the first layout information and the second layout information, for each of the first shot regions, determining a scanning direction when performing a scanning exposure to the first shot region in the first process Including,
In the determining step, the scanning direction is such that combinations of scanning directions of two or more respective first shot regions included in the second shot regions in the first process are the same in all of the second shot regions. Decided,
In the two or more first shot regions included in each of the second shot regions, a scanning direction of at least one first shot region is different from a scanning direction of other first shot regions. delete According to claim 1,
Lithography further comprising changing the scanning direction when performing scanning exposure for each of the first shot regions included in the recipe for forming the first layer to the scanning direction determined in the determining step. Way. According to claim 1,
The first shot regions included in the recipe for forming the first layer, such that the scanning direction when performing scanning exposure for each of the first shot regions is set to the scanning direction determined in the determining step A method of lithography, further comprising changing the order of exposure to be scanned. According to claim 1,
Between the first shot regions included in the recipe for forming the first layer, so that the scanning direction when performing scanning exposure for each of the first shot regions is set to the scanning direction determined in the determining step. And changing the path of movement of the substrate. According to claim 1,
For each of the first shot regions, according to the scanning direction determined in the determining step, selecting a correction table for correcting an exposure error according to a scanning direction when performing scanning exposure for the first shot region Further comprising steps,
In the first processing, a lithography method is performed in which the exposure to the first shot area is performed using a correction table selected in the selecting step. The method of claim 6,
In the selecting step, the correction table is selected according to the number of first shot areas included in the second shot area, in addition to the scanning direction determined in the determining step. According to claim 1,
A lithographic method in which different lithographic apparatuses are used in the first processing and the second processing. The method of claim 8,
In the second process, an imprint apparatus for forming a pattern by contacting a mold with an imprint material on the substrate forms the second layer. Said first comprising a layout of a plurality of first shot regions each having a first size, by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure When forming on the substrate the second layer comprising a layout of a plurality of second shot regions each having a second size corresponding to a size including a layer and two or more first shot regions to be overlapped with each other , Is a determination method for determining a scanning direction when scanning exposure is performed for each of the plurality of first shot regions,
Obtaining first layout information indicating the layout of the first shot regions and second layout information indicating the layout of the second shot regions; And
Based on the first layout information and the second layout information, for each of the first shot regions, determining a scanning direction when performing a scanning exposure to the first shot region in the first process Including,
In the determining step, the scanning direction is such that combinations of scanning directions of two or more respective first shot regions included in the second shot regions in the first process are the same in all of the second shot regions. Decided,
In the two or more first shot regions included in each of the second shot regions, a scanning method of at least one first shot region is different from a scanning direction of other first shot regions. It is an information processing device,
Said first comprising a layout of a plurality of first shot regions each having a first size, by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure When forming the second layer on the substrate, the second layer comprising a layout of a plurality of second shot regions each having a second size corresponding to a size including a layer and two or more first shot regions to overlap each other, A processing unit configured to execute a determination method for determining a scanning direction when performing scanning exposure for each of the plurality of first shot regions,
The processing unit,
Obtaining first layout information indicating a layout of the first shot regions and second layout information indicating a layout of the second shot regions, and
Based on the first layout information and the second layout information, for each of the first shot regions, determining a scanning direction when performing a scanning exposure to the first shot region in the first process And run
In the determining step, the scanning direction is such that combinations of scanning directions of two or more respective first shot regions included in the second shot regions in the first processing are the same in all of the second shot regions. Decided,
In the two or more first shot areas included in each of the second shot areas, the scanning direction of at least one first shot area is different from the scanning direction of the other first shot areas. Said first comprising a layout of a plurality of first shot regions each having a first size, by a first process forming a first layer and a second process forming a second layer in a process including scanning exposure When forming on the substrate the second layer comprising a layout of a plurality of second shot regions each having a second size corresponding to a size including a layer and two or more first shot regions to be overlapped with each other , A storage medium for storing a program for causing the information processing apparatus to execute a determination method for determining a scanning direction when performing scanning exposure for each of the plurality of first shot regions,
The program, the information processing device,
Obtaining first layout information indicating the layout of the first shot regions and second layout information indicating the layout of the second shot regions; And
Based on the first layout information and the second layout information, for each of the first shot regions, determining a scanning direction when performing a scanning exposure to the first shot region in the first process To run,
In the determining step, the scanning direction is such that combinations of scanning directions of two or more respective first shot regions included in the second shot regions in the first process are the same in all of the second shot regions. Decided,
In the two or more first shot regions included in each of the second shot regions, a scanning direction of at least one first shot region is different from a scanning direction of other first shot regions. How to manufacture goods
Forming a pattern on the substrate using the lithographic method according to claim 1; And
And processing the substrate on which the pattern is formed.

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