KR102086257B1 - 색변환 소자 - Google Patents
색변환 소자 Download PDFInfo
- Publication number
- KR102086257B1 KR102086257B1 KR1020180128683A KR20180128683A KR102086257B1 KR 102086257 B1 KR102086257 B1 KR 102086257B1 KR 1020180128683 A KR1020180128683 A KR 1020180128683A KR 20180128683 A KR20180128683 A KR 20180128683A KR 102086257 B1 KR102086257 B1 KR 102086257B1
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- South Korea
- Prior art keywords
- transparent
- layer
- insulating layer
- semiconductor layer
- conversion element
- Prior art date
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- 239000004065 semiconductor Substances 0.000 claims abstract description 94
- 238000006243 chemical reaction Methods 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 230000005684 electric field Effects 0.000 claims abstract description 18
- 239000010410 layer Substances 0.000 claims description 213
- 239000011247 coating layer Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 239000011368 organic material Substances 0.000 claims description 3
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 2
- 239000004020 conductor Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000010409 thin film Substances 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
Description
도 2는 본 발명의 제 2 실시예에 따른 색변환 소자를 예시한 도면이며,
도 3은 본 발명의 제 3 실시예에 따른 색변환 소자를 예시한 도면이고,
도 4는 본 발명의 제 4 실시예에 따른 색변환 소자를 예시한 도면이다.
120 : 하부코팅층
130 : 투명절연층
140 : 투명반도체층
150 : 접촉부
160 : 투명전도층
170 : 상부코팅층
Claims (8)
- 투명기판과,
상기 투명기판의 상부에 구비되는 투명절연층 및 투명반도체층과,
상기 투명반도체층에 전기장을 인가하는 투명전도층을 포함하며,
상기 투명반도체층은 Zn 산화물, In 산화물 및 Sn 산화물 중 적어도 하나를 포함하고, 1.8 내지 2.2의 고굴절율을 가지며,
상기 투명절연층은 SiO2, Al2O3, ZrO2, TiO2, Ta2O5, Si3N4 및 SiOxNx-1 중 선택된 적어도 하나를 포함하고, 1.4 내지 1.6의 저굴절율을 가지며,
상기 투명절연층이 상기 투명반도체층의 사이에 선택적으로 배치되는 구조가 반복하여 적층되고, 상기 투명반도체층 각각은 접촉부를 통해 상호 전기적으로 연결되며,
상기 인가되는 전기장을 이용하여 상기 투명반도체층의 굴절율을 변화시켜 상기 투명절연층 및 투명반도체층의 굴절율 차이를 발생시키는 색변환 소자.
- 삭제
- 삭제
- 제 1 항에 있어서,
상기 투명반도체층 또는 투명절연층은, 유기물을 포함하는 색변환 소자.
- 제 4 항에 있어서,
상기 색변환 소자는,
상기 투명기판의 상부에 형성되며, 투명하거나 혹은 반사 특성을 가지는 하부코팅층
을 더 포함하는 색변환 소자.
- 제 4 항에 있어서,
상기 색변환 소자는,
상기 투명기판, 투명절연층 및 투명반도체층을 포함하는 구조물의 상부에 반사 특성을 갖는 상부코팅층
을 더 포함하는 색변환 소자.
- 삭제
- 제 1항, 제 4항, 제 5항 및 제 6항에서 선택되는 어느 한 항에 있어서,
상기 투명전도층은, 상기 투명기판, 최하부에 위치하는 상기 투명절연층, 최상부에 위치하는 상기 투명절연층, 상기 투명반도체층의 사이에 위치하는 상기 투명절연층 중 적어도 하나의 상부에 구비되는 색변환 소자.
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KR1020180128683A KR102086257B1 (ko) | 2018-10-26 | 2018-10-26 | 색변환 소자 |
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KR1020180128683A KR102086257B1 (ko) | 2018-10-26 | 2018-10-26 | 색변환 소자 |
Publications (1)
Publication Number | Publication Date |
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KR102086257B1 true KR102086257B1 (ko) | 2020-03-06 |
Family
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KR1020180128683A Active KR102086257B1 (ko) | 2018-10-26 | 2018-10-26 | 색변환 소자 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090130717A (ko) | 2008-06-16 | 2009-12-24 | 김용성 | 마이크로 렌즈용 코팅필름 및 그 제조방법 |
KR20120133146A (ko) * | 2011-05-30 | 2012-12-10 | 삼성전자주식회사 | 광 이미지 셔터 및 그 제조 방법 |
KR20170011945A (ko) * | 2015-07-21 | 2017-02-02 | 삼성전자주식회사 | 나노구조체를 포함하는 광변조기 |
-
2018
- 2018-10-26 KR KR1020180128683A patent/KR102086257B1/ko active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090130717A (ko) | 2008-06-16 | 2009-12-24 | 김용성 | 마이크로 렌즈용 코팅필름 및 그 제조방법 |
KR20120133146A (ko) * | 2011-05-30 | 2012-12-10 | 삼성전자주식회사 | 광 이미지 셔터 및 그 제조 방법 |
KR20170011945A (ko) * | 2015-07-21 | 2017-02-02 | 삼성전자주식회사 | 나노구조체를 포함하는 광변조기 |
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