KR102050893B1 - Plasma electrode structure for skin treatment and plasma apparatus for skin treatment - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma electrode structure for skin treatment and a plasma generator for skin treatment using the same, wherein a base metal pattern portion and a base to which an electric power is connected to an upper surface and a lower surface of an insulating substrate are applied. A plasma conversion metal pattern part spaced apart from the metal pattern part, the plasma conversion metal pattern part covering, the dielectric layer whose surface is in contact with the skin is laminated on the lower surface of the insulating substrate body and covers the plasma conversion metal pattern part and the surface Plasma is converted in three steps, including the dielectric layer in contact with the skin, to evenly distribute the plasma to the skin, thereby preventing energy concentration of the plasma, thereby safely treating the skin without causing burns on the skin of the subject.

Description

Plasma electrode structure for skin treatment and plasma generator for skin treatment using the same {PLASMA ELECTRODE STRUCTURE FOR SKIN TREATMENT AND PLASMA APPARATUS FOR SKIN TREATMENT}

The present invention relates to a plasma electrode structure for skin treatment and a plasma generating device for skin treatment using the same. More particularly, the electrical energy is converted into plasma energy after passing through an insulating substrate, thereby preventing skin damage by plasma energy. The present invention relates to a plasma electrode structure for skin treatment and a plasma generator for skin treatment using the same.

In general, the plasma generator for skin treatment generates plasma between the skin and the electrode when an alternating sine wave of several kV to several tens of kV formed through a high voltage transformer approaches a sufficiently close distance to the human body by enlarging a dielectric such as plastic or glass. Device.

Plasma generators for skin treatment are to heal wounds of the skin using plasma or to facilitate the treatment of skin diseases such as atopy.

Plasma is accompanied by light and thermal energy accompanied by traces of ozone and ultraviolet light to act on the surface of the skin and in the process generates hydroxyl radicals that disinfect and purify.

Hydroxyl radicals generated on the skin surface by plasma act to disinfect and cleanse to heal wounds of the skin or to promote the treatment of skin diseases such as atopy.

As a prior patent for a plasma treatment device for skin treatment, Korean Patent Registration No. 1568380 has been proposed for 'skin treatment device using plasma'.

Korean Patent Registration No. 1568380 'Skin Treatment Apparatus Using Plasma' has electrodes placed on the top of the substrate to receive a frequency from the transformer, and a dielectric directly in contact with the skin on the bottom of the substrate. It has a structure provided with a plurality of through holes.

That is, Korean Patent Registration No. 1568380 “Skin Treatment Device Using Plasma” has a structure in which a high voltage is supplied to a through hole in a via hole, and plasma energy equal to the diameter of the through hole is transferred to the dielectric through the through hole, respectively.

Korean Patent Registration No. 1568380 “Skin Treatment Apparatus Using Plasma” has a structure in which an electrode and a dielectric directly contacting the skin are electrically connected by a plurality of through holes penetrated in the form of via holes, that is, the electrode is provided on the inner surface of the through hole. The conductive material is directly connected to the dielectric.

Therefore, Korean Patent Registration No. 1568380, 'Skin Treatment Apparatus Using Plasma,' treats plasma as it passes directly through the through hole to the dielectric layer, and the energy density of the plasma formed through the dielectric is high because the dielectric has a single layer structure. If heavy plasma energy is concentrated on any part of the skin, there is a risk of causing burns on the skin of the subject.

In addition, Korean Patent Registration No. 1568380, 'Skin Treatment Device Using Plasma', uses a dielectric film made of plastic. When excessive energy is concentrated in the through-hole of a substrate having a single layer structure, the dielectric made of plastic is overheated and melted to function. There was a problem to lose. In addition, when the dielectric is heated and melted, electrical insulation is properly performed. In this case, the electrical insulation is broken, and energy is transmitted to the skin in the form of electric discharge instead of plasma, which may cause serious burns. .

In addition, Korean Patent Registration No. 1568380 'Skin Treatment Device Using Plasma' uses a single layer of dielectric, so it uses because of the etching effect of plasma and skin even if the dielectric is manufactured from plastic, quartz and ceramic. When the contamination phenomenon that the contaminants stick to the surface of the dielectric occurs, there was a problem that it is difficult to remove the contaminants attached to the surface.

Prior Patent: Domestic Patent Registration No. 1568380 'Skin Treatment Apparatus Using Plasma' (registered on Nov. 5, 2015)

An object of the present invention is to provide a plasma generating structure by providing electrodes isolated from each other on the upper and lower surfaces of the substrate to distribute the plasma evenly through the dielectric and to the skin for plasma treatment structure and skin treatment using the same The present invention provides a plasma generator.

Another object of the present invention is to deliver a plasma to the skin through the multilayer structure of the dielectric to prevent deformation of the dielectric by heat, to prevent the burn of the skin of the subject due to the deformation of the dielectric, and to adhere to the surface contaminants The present invention provides a plasma electrode structure for skin treatment that is easy to remove and a plasma generator for skin treatment using the same.

In order to achieve the above object, the plasma electrode structure for skin treatment according to the present invention includes an insulating substrate, an upper surface of the insulating substrate, and a base metal pattern portion to which an electric power source is connected and a high voltage AC square wave is applied. A plasma conversion metal pattern part disposed on the bottom surface of the insulating substrate body and spaced apart from the base metal pattern part, laminated on the bottom surface of the insulating substrate body, covering the metal pattern part for plasma conversion, and the surface of which is in contact with the skin. And a dielectric layer.

In the present invention, the insulating substrate may have a thickness of 0.2mm ~ 1.0mm.

In the present invention, the dielectric layer may be formed to a thickness of 0.6mm ~ 1.7mm.

In the present invention, the dielectric layer is made of a material having insulation and heat resistance and is laminated on the lower surface of the insulating substrate and the dielectric plate made of a material having an insulating material is laminated on the dielectric plate portion to cover the dielectric plate portion It may include a plate cover dielectric portion to prevent contamination.

In the present invention, the dielectric plate portion may have a thickness of 0.5mm ~ 1.5mm.

In the present invention, the dielectric plate portion may be formed of any one of a ceramic material, a crystal material, a germanium material, and a sapphire material.

In the present invention, the plate cover dielectric portion may be a thin film dielectric film of 0.1mm ~ 0.2mm.

In the present invention, the plate cover dielectric portion may be formed of a dielectric film in the form of a coating or a tape of any one of Teflon, PTFE (Polytetrafluoroethylene), polyester.

In the present invention, the plasma conversion metal pattern part includes a plurality of first metal patterns spaced apart from the lower surface of the insulating substrate body, and the base metal pattern part includes a plurality of first metal patterns spaced apart from the upper surface of the insulating substrate body. A second metal pattern, a power connection metal pattern electrically connected to the second metal pattern, and to which a high voltage AC square wave is applied; and a circuit connection metal pattern electrically connecting the power connection metal pattern and the second metal pattern. It may include.

In the present invention, the first metal pattern is arranged side by side so as to have a plurality of columns and a plurality of rows, any one formed of another column or a first metal pattern adjacent to any one column formed of the first metal pattern. In another row adjacent to the row, the first metal patterns may be staggered with each other.

In order to achieve the above object, the plasma treatment apparatus for skin treatment according to the present invention is a skin electrode plasma electrode structure for contacting the skin and delivering plasma energy to the contacted skin, and the plasma electrode structure for skin treatment on the front surface. A window portion opened to expose the bottom surface of the handpiece body portion and the handpiece body portion in which the plasma electrode structure for skin treatment is embedded, and electrically connected to the plasma electrode structure for skin treatment. The skin treatment plasma electrode structure includes a high voltage applying unit for applying a high voltage alternating square wave, wherein the skin treatment plasma electrode structure is provided on an insulating substrate and an upper surface of the insulating substrate and is connected to an electric power source to supply a high voltage alternating current. Base metal pattern part to which a square wave is applied, phase A dielectric layer provided on the bottom surface of the insulating substrate and spaced apart from the base metal pattern portion, the metal pattern portion for plasma conversion, stacked on the bottom surface of the insulation substrate, covering the metal pattern portion for plasma conversion, and having a surface contacting the skin Characterized in that it comprises a.

The present invention is to convert the plasma in three steps to provide evenly distributed plasma to the skin to prevent the energy concentration of the plasma to enable a safe skin treatment without causing burns on the skin of the subject.

The present invention prevents the concentration of energy in the plasma, and evenly distributes the plasma to the skin, thereby making it possible to treat the skin with less irritation and soft feeling, thereby improving treatment satisfaction.

The present invention has a multilayered dielectric structure, which does not easily adhere to the surface of the dielectric due to the etching effect of plasma and skin, and easily removes the contaminants attached to the surface of the dielectric, which is hygienic and safe. Skin treatment is possible.

1 is a perspective view showing a plasma electrode structure for skin treatment according to the present invention.
Figure 2 is a cross-sectional view showing a plasma electrode structure for skin treatment according to the present invention.
3 is a plan view of an insulating substrate in the plasma electrode structure for skin treatment according to the present invention.
Figure 4 is a bottom view of the insulating substrate in the plasma electrode structure for skin treatment according to the present invention.
5 is an exploded perspective view of a plasma generating device for skin treatment according to the present invention;
Figure 6 is a perspective view of a plasma generating device for skin treatment according to the present invention.

Hereinafter, the present invention will be described in more detail.

When described in detail with reference to the accompanying drawings a preferred embodiment of the present invention. Prior to the detailed description of the invention, the terms or words used in the specification and claims described below should not be construed as limiting in their usual or dictionary meanings. Therefore, the embodiments described in the specification and the drawings shown in the drawings are only one of the most preferred embodiments of the present invention and do not represent all of the technical idea of the present invention, various modifications that can be replaced at the time of the present application It should be understood that there may be equivalents and variations.

1 is a perspective view showing a plasma electrode structure for skin treatment according to the present invention, Figure 2 is a cross-sectional view showing a plasma generating device for skin treatment according to the present invention.

An embodiment of a plasma electrode structure for skin treatment according to the present invention will be described in detail with reference to FIGS. 1 and 2.

The plasma treatment apparatus for skin treatment according to the present invention includes an insulating substrate 100 made of an insulating material.

The insulating substrate 100 is made of a substrate having a flat upper surface and a lower surface, and made of FR4 material as an example. In addition, the insulating substrate 100 may be variously modified with a known insulating material used in a conventional PCB substrate. Let's find out.

The insulating substrate 100 has a thickness of 0.2 mm to 1.0 mm, and serves as a primary insulating dielectric in which a high voltage signal connected to the base metal pattern part 200 provided on the upper surface is directly transmitted to the lower surface side. Is blocked first.

The base metal pattern part 200 is connected to an electric power source to apply a high voltage AC square wave, and the high voltage PCB having the high voltage plug 32 is directly contacted and connected to thereby apply a high voltage AC square wave.

The lower surface of the insulating substrate 100 is provided with a plasma conversion metal pattern part 300, which is a metal pattern spaced apart from the base metal pattern part 200.

The upper and lower surfaces of the insulating substrate 100 are defined as the lower surface, and the opposite side is defined as the upper surface, with the upper surface and the lower surface as the upper surface, with respect to the direction toward the skin during skin treatment. Note that it does not define the upper side and the lower side.

Plasma conversion metal pattern portion 300 is a plasma that is not electrically connected to the base metal pattern portion 200 and is converted into primary plasma energy by receiving the electrical energy of the base metal pattern portion 200 as a separate electrode. Metal pattern for energy conversion.

That is, the plasma conversion metal pattern part 300 serves only as a primary receiver so that the electrical energy of the base metal pattern part 200 is received and converted into primary plasma energy.

The base metal pattern part 200 is connected to the high voltage PCB by direct contact and is applied with a high voltage AC square wave, and the high voltage electric energy is transferred to the lower side through the insulating substrate 100, that is, the metal pattern part 300 for plasma conversion. Supply.

In addition, the plasma conversion metal pattern part 300 receives the electrical energy supplied from the base metal pattern part 200 and converts it into primary plasma energy.

The insulating substrate 100 transmits the high voltage electrical energy by the high voltage alternating square wave of the base metal pattern portion 200 to the metal pattern portion 300 for plasma conversion and obtains a skin treatment effect by using the transferred electrical energy. It will be manufactured to have a thickness of 0.2mm ~ 1.0mm to generate.

In addition, the plasma generating device for skin treatment according to the present invention treats the skin through the base metal pattern part 200 and the plasma conversion metal pattern part 300 which are provided on the upper and lower surfaces of the insulating substrate 100, respectively. It can stably maintain the output of plasma energy, i.e., power.

According to the present invention, the base metal pattern portions are formed on the upper and lower surfaces of the insulating substrate 100 to have an insulating structure while minimizing power loss of plasma energy transferred from the upper surface to the lower surface of the insulating substrate 100. 200 and the metal pattern portion 300 for plasma conversion are applied, and the thickness of the insulating substrate 100 is limited to 0.2 mm to 1.0 mm.

On the other hand, the lower surface of the insulating substrate 100 is provided with a dielectric layer 400 in contact with the skin of the subject to deliver the plasma to the skin.

The dielectric layer 400 is stacked on the bottom surface of the insulating substrate 100 and has a plate shape covering the metal pattern portion 300 for plasma conversion.

For example, the dielectric layer 400 may be formed to a thickness of 0.6 mm to 1.7 mm.

In addition, the dielectric layer 400 is made of a material having insulation and heat resistance and is laminated on the dielectric plate portion 410 stacked on the lower surface of the insulating substrate 100 and the dielectric plate portion 410 made of an insulating material. It may include a plate cover dielectric 420 to cover the dielectric plate 410 to prevent contamination of foreign matter.

Dielectric plate portion 410 is a plate-shaped dielectric having a thickness of 0.5mm ~ 1.5mm as an example of a ceramic dielectric. Dielectric plate portion 410 is not only a ceramic material, but also a crystal material, germanium material, sapphire material, etc. It can be found that it can be replaced with various dielectric materials that can distribute the plasma energy to the skin side.

The dielectric plate portion 410 disperses the plasma energy beam through a process of secondarily converting the plasma primarily formed in the metal pattern portion 300 for plasma conversion.

That is, the plasma energy primarily formed in the plasma conversion metal pattern part 300 in the lower surface of the insulating substrate 100 passes through the dielectric plate part 410, and the beam is evenly distributed so that the plasma energy is any one of the skin. Partial concentration is prevented, and plasma energy is evenly applied to the skin to improve the skin treatment effect.

In addition, the plate cover dielectric portion 420 may be a thin film dielectric film of 0.1mm ~ 0.2mm.

The plate cover dielectric portion 420 forms a dielectric film on the surface of the dielectric plate portion 410 in the form of a Teflon coating or Teflon tape to contact the skin to transfer plasma energy to the skin.

Since the plate cover dielectric part 420 is a thin film dielectric having a thickness of 0.1 mm to 0.2 mm, energy loss can be minimized when plasma passing through the ceramic layer is transmitted to the skin, and at the same time, contamination of foreign substances due to etching on the surface is prevented. You can prevent it.

The plate cover dielectric part 420 protects the surface of the dielectric plate part 410 by forming a dielectric film on the surface of the dielectric plate part 410, such as PTFE (polytetrafluoroethylene) and polyester, in addition to Teflon, and protects the surface of the dielectric plate part 410 and the etching of plasma and skin. The contaminants due to the etching action do not adhere well to the surface, and other materials that can easily remove the contaminants attached to the surface are hygienic and safe to treat the skin.

The dielectric layer 400 protects the surfaces of the two dielectric layers 400 of different materials, that is, the dielectric plate portion 410 and the surface of the dielectric plate portion 410 that disperse the plasma beam and removes the external contaminants. It includes a plate cover dielectric portion 420 easy to minimize the damage to the skin and minimize the deformation and breakage of the dielectric.

That is, when the thickness of 0.5mm ~ 1.5mm, and the plasma energy transmitted from the plasma conversion metal pattern portion 300 through the dielectric plate portion 410 of the ceramic material having a heat resistance property to the skin damage Minimization and deformation and breakage of the dielectric can be prevented.

In addition, a thin plate cover dielectric having a thickness of 0.1 mm to 0.2 mm, which is different from that of the dielectric plate portion 410 that can protect the surface of the dielectric plate portion 410 from contaminants on the surface of the dielectric plate portion 410. Is provided to increase the delivery efficiency of the plasma energy, it is possible to ensure the safety of the subject in contact with the skin.

Meanwhile, FIG. 3 is a plan view of the insulating substrate 100 in the plasma electrode structure for skin treatment according to the present invention, and FIG. 4 is a bottom view of the insulating substrate 100 in the plasma electrode structure for skin treatment according to the present invention. .

3 illustrates an embodiment of the base metal pattern portion 200 provided on the upper surface of the insulating substrate 100, and FIG. 4 illustrates a plasma conversion metal provided on the lower surface of the insulating substrate 100. An embodiment of the pattern portion 300 is illustrated.

The plasma conversion metal pattern part 300 includes a plurality of first metal patterns 310 spaced apart from the lower surface of the insulating substrate 100.

For example, the first metal patterns 310 may be arranged side by side at regular intervals to have a plurality of columns and a plurality of rows in a circular dot shape.

For example, the first metal pattern 310 is staggered with another column adjacent to one column formed with the first metal pattern 310 or another row adjacent with one row formed with the first metal pattern 310. do.

That is, another row of first metal patterns 310 adjacent to each other are positioned between the rows of metal patterns. Alternatively, another row of first metal patterns 310 adjacent to each other are positioned between rows of metal patterns.

The base metal pattern part 200 is electrically connected to the plurality of second metal patterns 210 and the second metal pattern 210 which are spaced apart from the upper surface of the insulating substrate 100, and a high voltage AC square wave is applied thereto. The power connection metal pattern 220, the power connection metal pattern 220, and the circuit connection metal pattern 230 electrically connecting the second metal pattern 210.

The metal pattern 220 for power connection is a metal pattern for electrically connecting the high voltage AC square wave to the high voltage plug 32, which will be described in more detail below.

 The power connection metal pattern 220 is positioned at the center of the upper surface of the insulating substrate 100, the second metal pattern 210 is positioned to face the first metal pattern 310, and the first metal pattern ( The first metal pattern 310 and the second metal pattern 210 are formed to have a shape corresponding to that of 310, respectively.

In other words, except for the first metal pattern 310 overlapping with the power connection metal pattern 220 positioned in the center of the insulating substrate 100 in detail, the remaining first metal patterns 310 are each second. It is positioned to face the metal pattern 210 and is formed to correspond.

Therefore, the plurality of first metal patterns 310 spaced apart from the plasma conversion portion correspond to the plurality of spaced apart second metal patterns 210 to which the high voltage AC square wave is applied, and thus the electrical energy from the second metal pattern 210. When receiving and converting into the primary plasma energy to minimize the energy loss, the plasma energy is first distributed and delivered.

On the other hand, Figure 5 is an exploded perspective view of the plasma treatment apparatus for skin treatment according to the invention, Figure 6 is a perspective view of the plasma treatment apparatus for skin treatment according to the present invention.

5 and 6, the plasma treatment apparatus for skin treatment according to the present invention has a skin electrode plasma electrode structure 10 for skin contact with the skin and delivers plasma energy to the contacted skin, and a plasma for skin treatment on the front surface. A handpiece having a window portion 20a open to expose a lower surface of the electrode structure 10, that is, a lower surface of the plate cover dielectric portion 420, and having a plasma electrode structure 10 for skin treatment embedded therein. The high voltage applying unit is provided on the body portion 20 and the handpiece body portion 20 and electrically connected to the plasma electrode structure 10 for skin treatment to apply a high voltage AC square wave to the plasma electrode structure 10 for skin treatment. (30).

The high voltage applying unit 30 is in contact with the high voltage plug PCB 31 and the high voltage plug PCB 31 in contact with the power supply metal pattern 220 and is connected to the electric power supply to apply a high voltage AC square wave. And (32).

The high voltage applying unit 30 is variously modified to another example of a known example of applying a high voltage AC square wave for generating plasma energy by being connected to the metal pattern 220 for power connection of the plate cover dielectric 420 according to the present invention. Note that it can be implemented.

The handpiece body portion 20 may include a first handpiece housing 21 and a first handpiece housing 21 having a window portion 20a open to expose the bottom surface of the plate cover dielectric portion 420. The second handpiece housing 22 is detachably provided and includes an electrode support frame 20c that surrounds and supports the circumference of the plate cover dielectric part 420.

The plate cover dielectric portion 420 according to the present invention is inserted into the space surrounded by the electrode support frame 20c in the inside of the handpiece body portion 20 so that the position is firmly supported.

In addition, the upper side of the second handpiece housing 22 is provided with a plug coupling portion 20b having a plug through path through which the high voltage plug 32 may be penetrated into the inside.

The plate cover dielectric part 420 is provided on the insulating substrate 100, the upper surface of the insulating substrate 100, the base metal pattern part 200 to which an electric power is connected and a high voltage AC square wave is applied, and the insulation. The plasma pattern metal pattern part 300 disposed on the bottom surface of the substrate 100 and spaced apart from the base metal pattern part 200, and the metal pattern for plasma conversion stacked on the bottom surface of the insulating substrate body 100. The dielectric layer 400 covers the portion 300 and has a surface in contact with the skin.

That is, the embodiment of the plate cover dielectric portion 420 is the same as the embodiment of the plate cover dielectric portion 420 according to the present invention described above, overlapping the description is omitted.

The present invention has five multi-layered structures and the plasma is converted into three stages to evenly distribute the plasma to the skin, thereby preventing the energy concentration of the plasma, thereby allowing the skin treatment to be safely performed without generating burns on the skin of the subject. .

The present invention prevents the concentration of energy in the plasma, and evenly distributes the plasma to the skin, thereby making it possible to treat the skin with less irritation and soft feeling, thereby improving treatment satisfaction.

The present invention has a multilayered dielectric structure, which does not easily adhere to the surface of the dielectric due to the etching effect of plasma and skin, and easily removes the contaminants attached to the surface of the dielectric, which is hygienic and safe. Skin treatment is possible.

The present invention is not limited to the above-described embodiments, and various changes can be made without departing from the gist of the present invention, which is understood to be included in the configuration of the present invention.

10: plasma electrode structure for skin treatment 20: handpiece body
20a: window portion 20b: plug coupling portion
20c: electrode support frame 21: first handpiece housing
22: second handpiece housing 30: high voltage applying unit
31: PCB for high voltage plug 32: high voltage plug
100: insulating substrate 200: base metal pattern portion
210: second metal pattern 220: metal pattern for power connection
230: circuit connection metal pattern
300: metal pattern portion for plasma conversion 310: first metal pattern
400: dielectric layer 410: dielectric plate portion
420: plate cover dielectric portion

Claims (11)

Insulating substrate;
A base metal pattern part provided on an upper surface of the insulating substrate and connected to an electric power source to apply a high voltage AC sine wave;
A plasma conversion metal pattern part provided on a lower surface of the insulating substrate and electrically insulated from the base metal pattern part; And
A dielectric layer laminated on a lower surface of the insulating substrate and covering the metal pattern for plasma conversion and having a surface in contact with the skin;
A high voltage AC sine wave is applied to the base metal pattern part, and high voltage electric energy is transferred to the plasma conversion metal pattern electrically insulated from the base metal pattern part through the insulating substrate, and then the skin is formed on the plasma conversion metal pattern. Output plasma energy for treatment,
The insulating substrate has a thickness of 0.2mm ~ 1.0mm,
The dielectric layer,
A dielectric plate part made of a material having insulation and heat resistance and laminated on a lower surface of the insulation substrate and dispersing a beam of plasma energy; And
Stacked on the dielectric plate part to cover the dielectric plate part, the plate cover dielectric part contacting the skin and delivering plasma energy to the skin,
The dielectric plate portion has a thickness of 0.5mm ~ 1.5mm,
The plate cover dielectric portion is a thin film dielectric film of 0.1mm ~ 0.2mm,
The dielectric plate portion is formed of any one of a crystal material, germanium material, sapphire material,
The plate cover dielectric part is formed of a dielectric film in the form of a coating or a tape of any one of Teflon, PTFE (polytetrafluoroethylene), polyester material.
delete delete delete delete delete delete delete The method according to claim 1,
The metal pattern for plasma conversion includes a plurality of first metal patterns spaced apart from the lower surface of the insulating substrate body,
The base metal pattern portion,
A plurality of second metal patterns spaced apart from the upper surface of the insulating substrate;
A power supply metal pattern electrically connected to the second metal pattern and to which a high voltage AC sine wave is applied; And
And a circuit connection metal pattern for electrically connecting the power connection metal pattern and the second metal pattern.
The method according to claim 9,
The first metal pattern is arranged side by side with a gap to have a plurality of columns and a plurality of rows,
And the other column adjacent to one column formed of the first metal pattern or the other row adjacent to one row formed of the first metal pattern, wherein the first metal pattern is staggered from each other.
A plasma electrode structure for skin treatment, the surface being in contact with the skin and delivering plasma energy to the contacted skin;
A handpiece body having a window portion open to expose a lower surface of the plasma electrode structure for skin treatment and having a plasma electrode structure for skin treatment therein; And
A high voltage applying unit provided at the handpiece body and electrically connected to the plasma electrode structure for skin treatment to apply a high voltage alternating sine wave to the plasma electrode structure for skin treatment;
The plasma electrode structure for skin treatment is a plasma generating device for skin treatment, characterized in that the plasma electrode structure for skin treatment according to any one of claims 1, 9 and 10.

Images