KR102093264B1 - Plasma Skin Treatment Apparatus - Google Patents

Abstract

Plasma skin treatment apparatus according to an embodiment of the present invention, a plasma module for generating an atmospheric pressure plasma adjacent to the skin in the form of a film; An AC power supply for supplying AC power to the plasma module; And a housing exposing one surface of the plasma module and mounting the plasma module. The plasma module may include a lower insulating film including a plurality of first nozzles that discharge a first gas; An upper insulating layer provided on the lower insulating film and providing a gas buffer space connected to the first nozzles; Spacer pillars periodically arranged to maintain a constant thickness in the gas buffer space; A plurality of power electrodes which are supplied with power from the AC power supply, are buried through the upper insulating layer, the spacer pillar, and the lower insulating film and periodically arranged in a plane of arrangement of the plasma module; And a power distribution pad disposed on the upper insulating film to electrically connect one end of the power electrodes.

Description

Plasma Skin Treatment Apparatus

The present invention relates to a plasma treatment apparatus for skin treatment using plasma, and more specifically, plasma implemented in a film form using a flexible printed circuit board so as to achieve a uniform treatment effect within a certain area on skin having a curved surface It relates to a processing device.

Atmospheric pressure plasma is known to have various medical effects such as sterilization, cancer cell death, and tissue regeneration, and has recently attracted attention for its applicability in the biomedical field. Atmospheric pressure plasma has various types such as jet discharge and dielectric barrier discharge (DBD). The effect of atmospheric plasma varies depending on the type of discharge. It is known that there are various contradictory effects depending on the gas used for the plasma discharge, the type of the applied power source, and the dosage. For example, when plasma is treated with cells or tissues, it may induce cell regeneration, and in some cases, cells (especially cancer cells) may be killed. As described above, various results may be caused according to the discharge state of the plasma. It is very important to maintain a stable and consistent plasma discharge in order to utilize the plasma medically, as it sometimes leads to completely opposite results. Particularly, in the case of plasma equipment aimed at improving the pathological condition of a biological surface, such as wound treatment and scar treatment, rather than for the purpose of cell death or tissue removal, plasma treatment effects may vary depending on changes in subtle discharge conditions of plasma. It is important to stably implement a uniform plasma discharge across the treatment site. .

In the case of the jet plasma, which has the most literature verification of the therapeutic effect, the most common structure is to place a pin type electrode in the center of a tube made of a dielectric material through which an inert gas flows. However, in most cases, there is a disadvantage in that the discharge characteristics can be easily changed according to the surrounding electrical environment (ground position, etc.). In addition, the jet plasma is likely to be converted into streamer discharges, in which high current flow occurs. Therefore, an electric burn or the like on the surface of the living body may be caused during plasma treatment. In the case of the jet plasma for improving the existing skin quality, there are cases in which a weak effect is intentionally caused by a thermal effect. But. Basically, it is very important to suppress the conversion to a strong streamer discharge for safe plasma discharge that is not painful and tissue damage.

Atmospheric pressure plasma is difficult to generate in a large area due to its physical properties, and even if it is produced, it is not easy to produce a uniform effect over a large area. However, in order to treat plasma on a large lesion tissue of a living body, a plasma capable of uniformly treating a certain area is required. In addition, in some cases, it may be necessary to supply a plurality of gases in order to improve the therapeutic effect, but it is not easy to generate plasma without mixing with each other in a small discharger.
(Patent Document 0001) Registered Patent Publication No. 10-1407672 (2014.06.13)
(Patent Document 0002) Publication No. 10-2008-0073412 (2008.08.11)

One technical problem to be solved by the present invention is to provide a plasma skin treatment apparatus capable of generating a uniform plasma effect over a large area of jet plasma.

One technical problem to be solved by the present invention is to provide a plasma skin treatment apparatus that bends along a curved surface of the skin.

One technical problem to be solved by the present invention is to provide a plasma skin treatment apparatus that improves the skin treatment effect by simultaneously or sequentially providing gas activated by plasma and gas not activated by plasma.

Plasma skin treatment apparatus according to an embodiment of the present invention, a plasma module for generating an atmospheric pressure plasma adjacent to the skin in the form of a film; An AC power supply for supplying AC power to the plasma module; And a housing exposing one surface of the plasma module and mounting the plasma module. The plasma module may include a lower insulating film including a plurality of first nozzles that discharge a first gas; An upper insulating layer provided on the lower insulating film and providing a gas buffer space connected to the first nozzles; Spacer pillars periodically arranged to maintain a constant thickness in the gas buffer space; A plurality of power electrodes which are supplied with power from the AC power supply, are buried through the upper insulating layer, the spacer pillar, and the lower insulating film and periodically arranged in a plane of arrangement of the plasma module; And a power distribution pad disposed on the upper insulating film to electrically connect one end of the power electrodes.

In one embodiment of the present invention, a gas connection part disposed on the upper insulating layer and supplying the first gas to the gas buffer space may be further included. The upper insulating layer may further include a connection passage connecting the gas connection part and the gas buffer space.

In one embodiment of the present invention, the lower insulating film may further include protrusions that protrude locally from the lower surface. Each of the protrusions may be disposed between the adjacent power electrodes to maintain a constant distance between the skin and the other end of the power electrode.

In one embodiment of the present invention, it may be further disposed in the housing to further include a pressure applying unit for applying pressure to one surface of the plasma module. The pressure applying unit may apply pressure to one surface of the plasma module made of a flexible printed circuit board to adhere the other surface of the plasma module to the skin.

In one embodiment of the present invention, it may further include a ground electrode disposed on the lower surface of the lower insulating film. The ground electrode includes ground electrode openings arranged periodically, and each of the ground electrode openings may expose the power electrode and at least one first nozzle disposed around the power electrode.

A method of manufacturing a plasma generating device according to an embodiment of the present invention includes forming a sacrificial pattern on a lower insulating film; Laminating an upper insulating layer to cover the sacrificial pattern on the lower insulating film on which the sacrificial pattern is formed; Forming a plurality of first nozzles connected to the sacrificial pattern on the lower insulating film; Removing the sacrificial pattern using wet etching to form a gas buffer space and providing spacer pillars periodically arranged in the gas buffer space; Forming through holes penetrating the spacer pillar and the lower insulating film of the upper insulating layer; Disposing power electrodes in each of the through holes; And forming a power distribution pad connecting one end of the power electrodes on the upper insulating layer.

In one embodiment of the present invention, forming a connection passage for connecting to the gas buffer space on the upper surface of the upper insulating layer; And providing a gas connection portion to cover the connection passage.

Plasma skin treatment apparatus according to an embodiment of the present invention, the plasma module in the form of a film and generates atmospheric pressure plasma; An AC power supply for supplying AC power to the plasma module; And a housing exposing one surface of the plasma module and mounting the plasma module. The plasma module may include a lower insulating film including a plurality of first nozzles that discharge a first gas; An upper insulating layer including a gas buffer space connected to the first nozzles and stacked on the lower insulating film; A power electrode disposed on the upper insulating layer and having a plurality of openings periodically arranged; Auxiliary nozzles vertically aligned with each of the openings and penetrating the upper insulating layer and the lower insulating film; And the spacer pillars disposed to surround each of the auxiliary nozzles and arranged to maintain a constant thickness in the gas buffer space, and supporting the auxiliary nozzles. The plasma formed around the openings of the power electrode is discharged through the auxiliary nozzle.

In one embodiment of the present invention, an auxiliary gas distribution unit disposed on the power electrode to provide an auxiliary gas buffer space may be further included. The auxiliary gas distribution unit may receive a second gas from the outside and inject through the auxiliary nozzles through the auxiliary gas buffer space.

In one embodiment of the present invention, an auxiliary insulating layer including auxiliary openings disposed on the power electrode and vertically aligned with the openings may be further included.

In one embodiment of the present invention, the diameter of the auxiliary nozzles may increase in diameter as it progresses toward the skin.

Plasma skin treatment apparatus according to an embodiment of the present invention, the plasma module in the form of a film and generates atmospheric pressure plasma; An AC power supply for supplying AC power to the plasma module; And a housing exposing one surface of the plasma module and mounting the plasma module. The plasma module, the lower insulating film; An upper insulating layer laminated on the lower insulating film; A power electrode disposed on the upper insulating layer and having a plurality of openings periodically arranged; And auxiliary nozzles vertically aligned with each of the openings and penetrating the upper insulating layer and the lower insulating film. The plasma formed around the openings of the power electrode is discharged toward the skin through the auxiliary nozzle.

The plasma skin treatment apparatus according to an embodiment of the present invention can uniformly treat skin having a curved surface over a large area. In addition, through the spatially separated nozzle structure, one gas is activated by plasma and provided to the skin, and the other gas is provided to the skin without being activated by plasma. Accordingly, the skin sequentially and chemically reacts simultaneously by a plurality of gases, so that the wound healing effect can be improved.

1 is a conceptual diagram illustrating a plasma skin treatment apparatus according to an embodiment of the present invention.
FIG. 2 is a plan view of the plasma module of the plasma skin treatment apparatus of FIG. 1.
FIG. 3 is a cut-away perspective view taken along line AA ′ of the plasma module of FIG. 2.
4 is a cross-sectional view taken along line BB 'of the plasma module of FIG. 2.
5 is a cross-sectional view taken along line CC ′ of the plasma module of FIG. 2.
6A to 6G are cross-sectional views illustrating a method of manufacturing a plasma module according to an embodiment of the present invention.
7 is a cut perspective view illustrating a skin treatment apparatus according to another embodiment of the present invention.
8 is a view for explaining a plasma skin treatment apparatus according to another embodiment of the present invention.
9 is a view for explaining a plasma skin treatment apparatus according to another embodiment of the present invention.

Plasma is known to have various medical effects, such as sterilization, cancer cell death, and tissue regeneration, and has recently attracted attention for its application in the biomedical field. Atmospheric pressure plasma is difficult to generate in a large area due to its physical properties, and even if it is produced, it is not easy to produce a uniform effect over a large area. However, in order to irradiate plasma to a wide lesion tissue of a living body, a plasma capable of processing a certain area is required.

On the other hand, when forming a plasma at atmospheric pressure, oxygen in the atmosphere may form ozone. Therefore, ozone needs to be minimized due to its strong odor and toxicity. In order to suppress ozone generation, a separate inert gas supply is required.

The plasma skin treatment apparatus according to an embodiment of the present invention provides a wound treatment effect or a sterilization effect by using a gas containing an inert gas such as helium and / or a therapeutic agent component in a large area on a skin having an arbitrary curved surface You can.

Plasma skin treatment apparatus according to an embodiment of the present invention provides a plasma skin treatment apparatus having a curved surface flexibility using a flexible printed circuit board structure.

The plasma skin treatment apparatus according to an embodiment of the present invention may provide an inert gas such as helium to the skin after being activated by the plasma, and provide a separate therapeutic gas to the skin without being activated in the plasma. The therapeutic gas may be supplied by vaporizing a liquid therapeutic agent. The liquid therapeutic agent may be an anti-inflammatory agent, an analgesic agent, a sterilizing agent, or a preparation containing skin regeneration ingredients.

Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings. Hereinafter, the present invention will be described in more detail with reference to preferred embodiments. However, these examples are intended to illustrate the present invention in more detail, and it will be apparent to those skilled in the art that the present invention is not limited or limited by experimental conditions, material types, and the like. The present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided to ensure that the disclosed contents are thorough and complete and that the spirit of the present invention is sufficiently conveyed to those skilled in the art. In the drawings, the components are exaggerated for clarity. Parts indicated by the same reference numerals throughout the specification indicate the same components.

1 is a conceptual diagram illustrating a plasma skin treatment apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view of the plasma module of the plasma skin treatment apparatus of FIG. 1.

3 is a cut-away perspective view taken along line A-A 'of the plasma module of FIG. 2.

4 is a cross-sectional view taken along line B-B 'of the plasma module of FIG. 2.

5 is a cross-sectional view taken along line C-C 'of the plasma module of FIG. 2.

1 to 5, the plasma skin treatment apparatus 100 includes a plasma module 101 that generates an atmospheric plasma adjacent to the skin 10 in the form of a film; An AC power supply 140 that supplies AC power to the plasma module 101; And a housing 102 exposing one surface of the plasma module 101 and mounting the plasma module 101. The plasma module 101 includes: a lower insulating film 110 including a plurality of first nozzles 112 discharging a first gas; An upper insulating layer 120 provided on the lower insulating film 110 and providing a gas buffer space 122 connected to the first nozzles 112; Spacer pillars 124 periodically disposed to maintain a constant thickness in the gas buffer space 122; It is supplied with power from the AC power supply 140 and is buried through the upper insulating layer 120, the spacer pillar 124, and the lower insulating film 110 and periodically arranged in the plane of arrangement of the plasma module. A plurality of power electrodes 132; And a power distribution pad 134 disposed on the upper insulating film 120 to electrically connect one end of the power electrodes 132.

The plasma skin treatment apparatus 100 may provide a first gas, such as an inert gas or a treatment gas, to the skin. The therapeutic gas may include an analgesic, anti-inflammatory, or sterilizing agent. The inert gas may be argon or helium. Accordingly, discharge by oxygen and nitrogen in the atmosphere can be minimized. Thus, the production of ozone or nitrogen oxides can be minimized. However, if necessary, the first gas may further include an inert gas such as helium or argon as a main component and additionally oxygen or nitrogen as an auxiliary component.

The plasma module 101 may be configured as a flexible printed circuit board structure having a gas buffer space 122 therein. The flexible printed circuit board structure provided with the gas buffer space 122 provides flexibility, and can be bent along the curved surface of the skin by external pressure. Accordingly, uniform treatment of the skin can be achieved.

The AC power supply 140 may supply AC power to the power electrodes 132 to form a plasma. The AC power supply 140 may supply sinusoidal AC power to the pin-shaped power electrode 132. The frequency of the AC power supply 140 may be several kHz to several hundred MHz. Preferably, the frequency of the AC power supply 140 may be 10 kHz to 30 kHz. The peak-to-peak voltage of the AC power supply 140 may be several to several tens of kV. The peak to peak current flowing through the AC power supply 140 may be several microamperes to tens of milliamps. The AC power supply 140 may operate in a pulse mode. The pulse operating frequency during the pulse operation may be several tens Hz to several hundred Hz. When the AC power 140 utilizes a low frequency of 20 kHz or less, the discharge current may be kept low to minimize electrical stimulation to the skin and painless treatment. The skin 10 may be grounded. The AC power supply 140 may be disposed outside or inside the housing 102.

The housing 102 may be a plastic-based insulator material. The housing 102 can be used as a handpiece. The housing 102 may include a pressure applying unit 160 disposed therein.

The pressure applying unit 160 is disposed in the housing 102 to apply pressure to one surface of the plasma module 101. The pressure applying unit 101 may apply pressure to one surface of the plasma module 101 to bring the other surface of the plasma module 101 into close contact with the skin 10. Specifically, the pressure applying unit 160 may include an elastic body support plate 164 and an elastic body 162 such as a spring. The elastic support plate 164 may be fixed in parallel to the plasma module 101 in the housing 102. A plurality of elastic bodies 162 may be coupled to the elastic support plate 164 to apply pressure to one surface of the plasma module. Accordingly, the other surface of the plasma module may protrude to the skin and be in close contact with the skin 10.

The gas connection unit 150 is disposed on the upper insulating layer 120 and can supply the first gas to the gas buffer space 122. The upper insulating layer 120 may include a connection passage 126 connecting the gas connection part 150 and the gas buffer space 122 to an upper surface thereof. The connection passage 126 may be located in an area where the power distribution pad 134 is not disposed. Accordingly, the first gas stored in the gas storage unit 156 may be provided to the gas buffer space 122 through the pipe 154, the gas connection unit 150, and the connection passage 126. The gas buffer space 122 may distribute the first gas to the plurality of first nozzles 122. The gas buffer space 122 may provide a constant thickness by spacer pillars 124 disposed periodically. The gas connection part 150 may be combined with the upper insulating layer 120 by adhesive or thermocompression bonding. The gas connection unit 150 may be disposed on the edge of the upper surface of the plasma module 101 in a plan view. The gas storage unit 156 may be disposed outside or inside the housing.

The plasma module 101 includes a lower insulating film 110, an upper insulating layer 120 stacked on the lower insulating film 110, and power electrodes passing through the upper insulating layer and the lower insulating film 110. It may include (132). The gas buffer space 122 may be formed by a depression formed on a lower surface of the upper insulating layer 120 and an upper surface of the lower insulating film 120. One surface of the plasma module 101 is disposed to face the skin. The edge of the plasma module 101 may be coupled to the housing 102.

The lower insulating film 110 may be a plastic film such as a polyethylene film or a polyimide film. The thickness of the lower insulating film 110 may be hundreds of micrometers to several millimeters. The polyimide film may be laminated in multiple layers and used as a flexible printed circuit board. The lower insulating film 110 may include a plurality of first nozzles 112 arranged in two dimensions. At least one of the first nozzles 112 may be disposed around the power electrode 132. Accordingly, when the power electrode 132 forms a plasma, the first gas discharged through the first nozzle 112 may operate as a gas forming plasma. Specifically, in a plan view, four first nozzles 122 may be arranged around each power electrode 132 at 90 degree intervals. The diameter of the first nozzles 122 may be several hundred micrometers to several millimeters. The lower insulating film 110 may include protrusions 114 that protrude locally from the lower surface. Each of the protrusions 114 may be disposed between the adjacent power electrodes to maintain a constant distance between the skin and the other end of the power electrode 132. The protrusions 114 may have a hemispherical shape. The protrusions 114 may be integrated with the same material as the lower insulating film 110.

The upper insulating layer 120 may be a polyethylene plastic film or a polyimide film. The thickness of the upper insulating layer 120 may be hundreds of micrometers to several millimeters. The lower insulating film 110 and the upper insulating layer 110 may be combined through an adhesive that is thermocompressed.

The power electrodes 132 may be periodically arranged in a matrix form. The unit cells constituted by the power electrodes may be triangular, square, or hexagonal. The plasma module 101 may have a thickness of several hundred micrometers to several millimeters. The diameter of the power electrodes 132 may be hundreds of micrometers to several millimeters. The power electrodes may be formed by inserting a pin-shaped pillar, a conductive paste, or an electroplating method. The power electrodes may include at least one of copper, aluminum, and silver. Plasma may be formed between the power electrodes 132 and the grounded skin. The protrusions 114 may prevent direct contact between the skin and the power electrodes 132.

According to a modified embodiment of the present invention, the other end of the power electrodes 132 is disposed in the lower insulating film 110 or in the upper insulating layer 120 in order to eliminate the possibility of direct contact with the skin. Can be.

The thickness of the power distribution pad 134 may be several micrometers to several hundred micrometers. The power distribution pad 134 may be electrically connected to one end of the power electrodes. The power distribution pad 134 may be connected to the AC power supply 140 through a conducting wire. The material of the power distribution pad 134 may include at least one of copper, aluminum, and silver.

The protective layer 136 may be disposed on the power distribution pad 134. The protective layer can suppress parasitic discharge. The protective layer 136 may be disposed to cover the top and side surfaces of the power distribution pad 134 with an insulator.

6A to 6G are cross-sectional views illustrating a method of manufacturing a plasma module according to an embodiment of the present invention.

6A to 6G, a method of manufacturing the plasma module 101 includes forming a sacrificial pattern 119 on the lower insulating film 110; Laminating an upper insulating layer 120 to cover the sacrificial pattern 119 on the lower insulating film 110 on which the sacrificial pattern 119 is formed; Forming a plurality of first nozzles 112 connected to the sacrificial pattern 119 on the lower insulating film 110; Removing the sacrificial pattern 112 using wet etching to form a gas buffer space 122 and providing spacer pillars 124 periodically arranged in the gas buffer space 122; Forming through holes 129 penetrating the spacer pillar 124 and the lower insulating film 110 of the upper insulating layer 120; Disposing power electrodes 132 in each of the through holes 129; And forming a power distribution pad 134 connecting one end of the power electrodes on the upper insulating layer 120.

Referring to FIG. 6A, a sacrificial pattern 119 is formed on the lower insulating film 110. The lower insulating film 110 may be a plastic-based or polyimide. The sacrificial pattern 119 is used to form the gas buffer space 119 in a pattern that is later removed. The sacrificial pattern 119 may be formed of a material having high etching selectivity with the lower insulating film 110 and the upper insulating layer 120. The sacrificial pattern 119 may be formed by screen printing or printing techniques.

Referring to FIG. 6B, an upper insulating layer 120 is stacked to cover the sacrificial pattern 119 on the lower insulating film 110 on which the sacrificial pattern 119 is formed. The upper insulating layer 120 may be performed by a deposition method, a screen printing method or a spin coating method. When the upper insulating layer 120 is in the form of a film, the upper insulating layer 120 and the lower insulating film 110 may be bonded by thermal compression or adhesive. The material of the upper insulating layer 120 may be the same as the lower insulating film.

Referring to FIG. 6C, a plurality of first nozzles 112 connected to the sacrificial pattern 119 is formed on the lower insulating film 110. The first nozzles 112 may be formed by dry etching using a mask or wet etching, or laser processing without using a mask.

Referring to FIG. 6D, the sacrificial pattern 119 is removed using wet etching to form a gas buffer space 122, and spacer pillars 124 periodically arranged in the gas buffer space 122 are provided. . The wet etching solution removes the sacrificial pattern 119 through the first nozzles 112.

Referring to FIG. 6E, through holes 129 penetrating the spacer pillar 124 and the lower insulating film 110 of the upper insulating layer 120 are formed. The through holes 129 may be formed by plasma etching, chemical etching, laser drilling technology or punch technology. The through holes 129 may penetrate the upper insulating layer 120 and the lower insulating film 110.

Referring to FIG. 6F, power electrodes 132 may be disposed in each of the through holes 129. The power electrodes 132 may be performed by a plating process, a conductive paste printing process, a conductive pillar insertion process, and the like. The power electrodes 132 may include at least one of copper, aluminum, and silver.

Referring to FIG. 6G, a power distribution pad 134 connecting one end of the power electrodes 132 may be formed on the upper insulating layer 120. The power distribution pad 134 may be formed using a conductive layer forming technique for manufacturing a printed circuit board. Specifically, the power distribution pad 134 may be performed by a plating process, conductive layer deposition and patterning process, conductive paste printing, or the like.

A protective layer 136 may be formed on the power distribution pad 134. The protective layer 136 may cover the top and side surfaces of the power distribution pad 134. The protective layer 136 may be formed of an insulating material and have a sufficient thickness to suppress parasitic discharge. The protective layer 136 may be formed by screen printing technology or deposition technology.

A connection passage 126 for connecting to the gas buffer space may be formed on the upper surface of the upper insulating layer 120. The connection passage 126 may be formed by plasma etching, chemical etching, laser drilling technology or punch technology. The connection passage 126 may penetrate the upper portion of the upper insulating layer 120.

 A gas connection 150 may be provided to cover the connection passage 126. The gas connection part 150 is formed of an insulating material, and may be made of the same material as the upper insulating layer 120. The gas connection part 150 and the upper insulating layer 120 may be combined by an adhesive or thermocompression bonding.

7 is a cut perspective view illustrating a skin treatment apparatus according to another embodiment of the present invention.

Referring to FIG. 7, the plasma skin treatment apparatus 200 includes a plasma module 101 that is in the form of a film and generates atmospheric pressure plasma; An AC power supply 140 that supplies AC power to the plasma module 101; And a housing 102 exposing one surface of the plasma module 101 and mounting the plasma module 101. The plasma module 101 includes: a lower insulating film 110 including a plurality of first nozzles 112 discharging a first gas; An upper insulating layer 120 provided on the lower insulating film 110 and providing a gas buffer space 122 connected to the first nozzles 112; Spacer pillars 124 periodically disposed to maintain a constant thickness in the gas buffer space 122; It is supplied with power from the AC power supply 140 and is buried through the upper insulating layer 120, the spacer pillar 124, and the lower insulating film 110 and periodically arranged in the plane of arrangement of the plasma module. A plurality of power electrodes 132; And a power distribution pad 134 disposed on the upper insulating film 120 to electrically connect one end of the power electrodes 132.

The ground electrode 211 may be disposed on the lower surface of the lower insulating film. The ground electrode 211 may be formed in a thin film form by plating or vapor deposition. The ground electrode 211 may include ground electrode openings 213 arranged periodically. Each of the ground electrode openings 213 may expose the power electrode 132 and at least one first nozzle 112 disposed around the power electrode 132. Each of the ground electrode openings 213 exposes one power electrode 132 and first nozzles 112 disposed around the power electrode 132 to operate as a unit discharge cell. The ground electrode 211 can form a stable plasma even when the skin is not grounded.

8 is a view for explaining a plasma skin treatment apparatus according to another embodiment of the present invention.

Referring to FIG. 8, the plasma skin treatment apparatus 300 includes a plasma module 301 that is in the form of a film and generates atmospheric pressure plasma; An AC power supply 140 that supplies AC power to the plasma module 301; And a housing 102 exposing one surface of the plasma module 301 and mounting the plasma module 301. The plasma module 301 may include a lower insulating film 110 including a plurality of first nozzles 112 discharging a first gas; An upper insulating layer 120 including a gas buffer space 122 connected to the first nozzles 112 and stacked on the lower insulating film 110; A power electrode 332 disposed on the upper insulating layer 120 and having a plurality of openings 333 arranged periodically; Auxiliary nozzles 329 aligned vertically to each of the openings 333 and penetrating the upper insulating layer 120 and the lower insulating film 110; And the spacer pillars 124 disposed to surround each of the auxiliary nozzles 329 and to maintain a constant thickness in the gas buffer space 122 and supporting the auxiliary nozzles 329. . Plasma is formed around the openings 333 of the power electrode 332 and discharged through the auxiliary nozzle 329.

The power electrode 332 may be in the form of a thin film or film covering the upper insulating layer 120. The power electrode 332 may form a plasma by using a second gas around the openings 333 arranged periodically. The diameter of the opening 333 may be the same as or larger than the diameter of the auxiliary nozzle 329. The central axis of the opening 333 may coincide with the central axis of the auxiliary nozzle 329.

The auxiliary nozzle 329 may penetrate the upper insulating layer 120, the spacer pillar 124, and the lower insulating layer 110. The auxiliary nozzle 329 may have a diameter of several hundred micrometers to several millimeters. The auxiliary nozzle 329 may deliver a second gas to the skin. The second gas may be an inert gas.

The first gas injected through the first nozzles 112 may include a treatment gas. The therapeutic gas may include an analgesic, anti-inflammatory, or sterilizing agent. Accordingly, the auxiliary nozzle 329 may provide a second gas activated by plasma to the skin, and the first nozzle 112 may provide a first gas not exposed to the plasma to the skin. Accordingly, the skin treatment effect can be maximized.

The auxiliary insulating layer 334 may include auxiliary openings 335 disposed on the power electrode 332 and vertically aligned with the openings 333. The auxiliary insulating layer 334 may suppress parasitic discharge formed on the upper surface of the power electrode 332. The auxiliary insulating layer 334 may cover the upper surface of the power electrode and be aligned with the power electrode.

The auxiliary gas distribution unit 336 may be disposed on the power electrode 332 or the auxiliary insulating layer 334 to provide an auxiliary gas buffer space 337. The auxiliary gas distribution unit 336 may receive a second gas from the outside and inject through the auxiliary nozzles 329 through the auxiliary gas buffer space 337. The auxiliary gas distribution unit 336 may be disposed to cover the top and side surfaces of the power electrode or the auxiliary insulation. The auxiliary gas distribution unit 336 may include spacers 338 arranged in an island shape to maintain a constant height of the auxiliary gas buffer space. The spacer 338 may be regularly arranged on the power electrode or the auxiliary insulating layer.

According to a modified embodiment of the present invention, a ground electrode (not shown) may be disposed on the lower surface of the lower insulating film 110. The ground electrode may include ground electrode openings periodically arranged. Each of the ground electrode openings may be vertically aligned with the openings of the power electrode and expose at least one first nozzle 112.

9 is a view for explaining a plasma skin treatment apparatus according to another embodiment of the present invention.

Referring to FIG. 9, the plasma skin treatment apparatus 300a includes a plasma module 301a in a film form and generating atmospheric pressure plasma; An AC power supply 140 that supplies AC power to the plasma module 301a; And a housing 102 exposing one surface of the plasma module 301 and mounting the plasma module 301. The plasma module 301 may include a lower insulating film 110 including a plurality of first nozzles 112 discharging a first gas; An upper insulating layer 120 including a gas buffer space 122 connected to the first nozzles 112 and stacked on the lower insulating film 110; A power electrode 332 disposed on the upper insulating layer 120 and having a plurality of openings 333 arranged periodically; Auxiliary nozzles 329a aligned vertically to each of the openings 333 and penetrating the upper insulating layer 120 and the lower insulating film 110; And the spacer pillars 124 disposed to surround each of the auxiliary nozzles 329 and to maintain a constant thickness in the gas buffer space 122 and supporting the auxiliary nozzles 329. . Plasma is formed around the openings 333 of the power electrode 332 and discharged through the auxiliary nozzle 329.

The diameter of the auxiliary nozzles 329 may increase as it progresses toward the skin. Specifically, the diameter D1 of the auxiliary nozzle 329a in the upper insulating layer 120 may be smaller than the diameter D2 of the auxiliary nozzle 329 in the lower insulating film. Accordingly, the second gas can be diffused to suppress streamer plasma generation.

According to a modified embodiment of the present invention, the first nozzle 112 and the gas buffer space 122 may be removed. The plasma skin treatment apparatus includes a plasma module 301 that is in the form of a film and generates atmospheric pressure plasma; An AC power supply 140 that supplies AC power to the plasma module; And a housing 102 exposing one surface of the plasma module 310 and mounting the plasma module 310. The plasma module 310, the lower insulating film 110; An upper insulating layer 120 laminated on the lower insulating film; A power electrode 132 disposed on the upper insulating layer 120 and having a plurality of openings 333 arranged periodically; And auxiliary nozzles 329 aligned vertically to each of the openings 333 and penetrating the upper insulating layer and the lower insulating film. The plasma formed around the openings of the power electrode may be discharged toward the skin through the auxiliary nozzle 329.

In the above, the present invention has been illustrated and described with respect to specific preferred embodiments, but the present invention is not limited to these embodiments, and those skilled in the art to which the present invention pertains are claimed in the claims. It includes all of the various types of embodiments that can be carried out without departing from the technical spirit.

10: skin
101: plasma module
110: lower insulating film
120: upper insulating layer
122: gas buffer space
132: power electrode
134: roll electrode pad

Claims (12)

delete delete delete delete delete Forming a sacrificial pattern on the lower insulating film;
Laminating an upper insulating layer to cover the sacrificial pattern on the lower insulating film on which the sacrificial pattern is formed;
Forming a plurality of first nozzles connected to the sacrificial pattern on the lower insulating film;
Removing the sacrificial pattern using wet etching to form a gas buffer space and providing spacer pillars periodically arranged in the gas buffer space;
Forming through holes penetrating the spacer pillar and the lower insulating film of the upper insulating layer;
Disposing power electrodes in each of the through holes; And
And forming a power distribution pad connecting one end of the power electrodes on the upper insulating layer. The method of claim 6,
Forming a connection passage for connecting to the gas buffer space on the upper surface of the upper insulating layer; And
And providing a gas connection portion to cover the connection passage. A plasma module in the form of a film and generating atmospheric pressure plasma;
An AC power supply for supplying AC power to the plasma module; And
A housing for exposing one surface of the plasma module and mounting the plasma module,
The plasma module,
A lower insulating film including a plurality of first nozzles for discharging the first gas;
An upper insulating layer including a gas buffer space connected to the first nozzles and stacked on the lower insulating film;
A power electrode disposed on the upper insulating layer and having a plurality of openings periodically arranged;
Auxiliary nozzles vertically aligned with each of the openings and penetrating the upper insulating layer and the lower insulating film; And
Includes; spacers pillars disposed to surround each of the auxiliary nozzles and arranged to maintain a constant thickness in the gas buffer space and supporting the auxiliary nozzles.
Plasma formed around the openings of the power electrode is discharged through the auxiliary nozzle plasma skin treatment apparatus. The method of claim 8,
Further comprising an auxiliary gas distribution portion disposed on the power electrode to provide an auxiliary gas buffer space,
The auxiliary gas distribution unit is provided with a second gas from the outside, the plasma skin treatment device, characterized in that through the auxiliary gas buffer space through the auxiliary nozzles. The method of claim 8,
And an auxiliary insulating layer disposed on the power electrode and including auxiliary openings vertically aligned with the openings. The method of claim 8,
The diameter of the auxiliary nozzles, plasma skin treatment apparatus characterized in that the diameter increases as it progresses in the direction of the skin. A plasma module in the form of a film and generating atmospheric pressure plasma;
An AC power supply for supplying AC power to the plasma module; And
A housing for exposing one surface of the plasma module and mounting the plasma module,
The plasma module;
Lower insulating film;
An upper insulating layer laminated on the lower insulating film;
A power electrode disposed on the upper insulating layer and having a plurality of openings periodically arranged; And
And auxiliary nozzles aligned vertically to each of the openings and penetrating the upper insulating layer and the lower insulating film.
Plasma formed around the openings of the power electrode is discharged in the direction of the skin through the auxiliary nozzle plasma skin treatment apparatus.

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