KR102048610B1 - Epoxy resin having binaphthalene skeleton - Google Patents

Epoxy resin having binaphthalene skeleton Download PDF

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KR102048610B1
KR102048610B1 KR1020167009380A KR20167009380A KR102048610B1 KR 102048610 B1 KR102048610 B1 KR 102048610B1 KR 1020167009380 A KR1020167009380 A KR 1020167009380A KR 20167009380 A KR20167009380 A KR 20167009380A KR 102048610 B1 KR102048610 B1 KR 102048610B1
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binaphthalene
resin
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요시노리 카와무라
카츠히로 후지이
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타오카 케미컬 컴퍼니 리미티드
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/24Di-epoxy compounds carbocyclic
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D301/00Preparation of oxiranes
    • C07D301/27Condensation of epihalohydrins or halohydrins with compounds containing active hydrogen atoms
    • C07D301/28Condensation of epihalohydrins or halohydrins with compounds containing active hydrogen atoms by reaction with hydroxyl radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/12Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/28Ethers with hydroxy compounds containing oxirane rings
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/24Di-epoxy compounds carbocyclic
    • C08G59/245Di-epoxy compounds carbocyclic aromatic

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Abstract

본 발명은, 하기 식 (1):
[화학식 1]

Figure 112016034125871-pct00006

(식 중, n은 0 또는 1 이상의 정수이다.)
로 나타내어지는 구조를 가지는 바이나프탈렌 골격 함유 에폭시 수지를 포함한다. 또한, 본 발명은, 알칼리 금속 수산화물 존재하에서, 2, 2'-비스(2-히드록시에톡시)-1, 1'-바이나프탈렌에 에피할로히드린을 반응시키는 것을 포함하는, 상기 식 (1)로 나타내어지는 신규한 바이나프탈렌 골격 함유 에폭시 수지의 제조 방법을 포함한다.This invention is following formula (1):
[Formula 1]
Figure 112016034125871-pct00006

(Wherein n is an integer of 0 or 1 or more.)
The binaphthalene frame | skeleton containing epoxy resin which has a structure represented by this is included. In addition, the present invention includes reacting epihalohydrin with 2,2′-bis (2-hydroxyethoxy) -1,1′-binaphthalene in the presence of an alkali metal hydroxide. The manufacturing method of the novel binaphthalene frame | skeleton containing epoxy resin shown by 1) is included.

Description

바이나프탈렌 골격을 가지는 에폭시 수지{EPOXY RESIN HAVING BINAPHTHALENE SKELETON}Epoxy resin having binaphthalene skeleton {EPOXY RESIN HAVING BINAPHTHALENE SKELETON}

본 발명은, 바이나프탈렌 골격을 가지는 신규한 에폭시 수지에 관한 것이다.The present invention relates to a novel epoxy resin having a binaphthalene skeleton.

에폭시 수지는, 일반적으로, 여러 가지 경화제로 경화시킴으로써, 기계적 성질, 내수성, 내약품성, 내열성, 전기적 성질 등이 우수한 경화물이 된다. 그 때문에, 에폭시 수지는, 접착제, 도료, 적층판, 성형 재료, 주형 재료 등의 폭넓은 분야에 이용되고 있다.Generally, an epoxy resin is hardened | cured by various hardening | curing agents, and turns into hardened | cured material excellent in mechanical property, water resistance, chemical resistance, heat resistance, electrical property, etc. For this reason, epoxy resins are used in a wide range of fields, such as adhesives, coatings, laminates, molding materials, and casting materials.

그 중에서, 바이나프탈렌 골격을 가지는 에폭시 수지는, 흡수율이 낮고 고온 영역에서의 탄성률이 낮은 특징을 가지는 에폭시 수지로서, 반도체 밀봉 재료 분야등으로의 이용에 대한 연구 개발이 활발히 이루어지고 있다. 또한, 이와 함께, 반도체 밀봉 재료 분야에서는 표면 실장시의 땜납 내크랙성의 향상을 위해 필러를 고충전화하는 것이 요구되고 있으며, 필러의 고충전화 목적을 달성하기 위해 용융 점도를 낮게 하여 유동성이 우수한 에폭시 수지를 필요로 하고 있다(예를 들면, 특허문헌 1 참조)Among them, the epoxy resin having a binaphthalene skeleton is an epoxy resin having a low water absorption and a low elastic modulus in a high temperature region, and research and development on the use in the field of semiconductor sealing materials and the like are actively performed. In addition, in the field of semiconductor sealing materials, it is required to fill the filler with high fillers in order to improve the solder crack resistance at the time of surface mounting, and in order to achieve the purpose of filling the filler, an epoxy resin having low melt viscosity and excellent flowability is required. (See Patent Document 1, for example)

한편, 바이나프탈렌 골격을 가지는 에폭시 수지로서, 예를 들면, 특허문헌 1및 특허문헌 2에 하기 구조식 (2): On the other hand, as an epoxy resin which has a binaphthalene frame | skeleton, it is the following structural formula (2) in patent document 1 and patent document 2, for example:

[화학식 1][Formula 1]

Figure 112016034125871-pct00001
Figure 112016034125871-pct00001

로 나타내어지는, 바이나프톨의 디글리시딜에테르가 개시되어 있다. 그러나, 특허문헌 1에는 실시예 1 내지 3에 기재되는 상기 식 (2)의 에폭시 수지의 연화점은 61℃ 내지 79℃인 것이 기재되어 있으며, 마찬가지로 특허문헌 2에는 실시예에 기재된 상기 식 (2)의 에폭시 수지의 연화점은 59℃ 내지 60℃인 것이 기재되어 있으며, 이들을 고체로 취급한다고 해도 연화점이 낮고 보관 조건에 의해 블로킹되는 등 취급성에 어려움이 있는 한편, 액체로 취급하기 위해서는 용해 작업이 필요해지는 등 사용 용도가 한정되는 문제가 있다.The diglycidyl ether of binaphthol which is represented by is disclosed. However, Patent Document 1 describes that the softening point of the epoxy resin of the above formula (2) described in Examples 1 to 3 is 61 ° C to 79 ° C, and similarly, Patent Document 2 describes the formula (2) described in Examples. It is described that the softening point of the epoxy resin of 59 ° C to 60 ° C is difficult to handle, such as low softening point and blocking due to storage conditions even when treated as a solid. There is a problem in that the use is limited.

일본 공개 특허 공보 「일본 특허 공개 평6-184131호 공보」Japanese Unexamined Patent Publication "Japanese Patent Publication No. Hei 6-184131" 일본 공개 특허 공보 「일본 특허 공개 제2009-292996호 공보」Japanese Unexamined Patent Publication "Japanese Patent Publication No. 2009-292996"

본 발명의 목적은, 바이나프탈렌 골격을 가지며, 또한 용융 점도가 낮고 실온에서도 액체이기 때문에 작업성과 유동성이 우수한 신규한 바이나프탈렌 골격 함유 에폭시 수지를 제공하는 것이다.An object of the present invention is to provide a novel binaphthalene skeleton-containing epoxy resin having a binaphthalene skeleton and having a low melt viscosity and a liquid at room temperature, which is excellent in workability and fluidity.

본 발명자들은, 상기의 과제를 해결하기 위하여 예의 연구를 거듭한 결과, 하기 식(1)로 나타내어지는 구조를 가지는 바이나프탈렌 골격 함유 에폭시 수지는 용융 점도가 낮고 실온에서도 액체이며, 작업성과 유동성이 우수하다는 것을 발견하였다. 또한, 상기 바이나프탈렌 골격 함유 에폭시 수지는 고굴절률, 고아베수(Abbe number)를 나타내는 것도 판명되었다. 구체적으로, 본 발명은 이하의 것을 포함한다.MEANS TO SOLVE THE PROBLEM As a result of earnestly researching in order to solve the said subject, the binaphthalene frame | skeleton containing epoxy resin which has a structure represented by following formula (1) has a low melt viscosity, is a liquid at room temperature, and is excellent in workability and fluidity. I found out. It has also been found that the binaphthalene skeleton-containing epoxy resin has a high refractive index and an Abbe number. Specifically, the present invention includes the following.

[1] 하기 식 (1):[1] The following formula (1):

[화학식 2][Formula 2]

Figure 112016034125871-pct00002
Figure 112016034125871-pct00002

(식 중, n은 0 또는 1 이상의 정수이다.)(Wherein n is 0 or an integer of 1 or more)

로 나타내어지는 디에폭시바이나프탈렌 수지.Diepoxy binaphthalene resin represented by.

[2][2]

알칼리 금속 수산화물 존재하에서, 2, 2'-비스(2-히드록시에톡시)-1, 1'-바이나프탈렌에 에피할로히드린을 반응시키는 공정을 포함하는 [1]에 기재된 디에폭시바이나프탈렌 수지의 제조 방법.Diepoxy binaphthalene according to [1], comprising the step of reacting epihalohydrin with 2,2′-bis (2-hydroxyethoxy) -1,1′-binaphthalene in the presence of an alkali metal hydroxide. Method for producing a resin.

본 발명에 의하면, 바이나프탈렌 골격을 가지며 실온에서도 액체인 작업성과 유동성이 우수한 신규한 바이나프탈렌 골격 함유 에폭시 수지 및 그 제조 방법을 제공할 수 있다. 또한, 본 발명의 바이나프탈렌 골격 함유 에폭시 수지는 고굴절률, 고아베수를 나타내므로 신규한 광학계 재료로서의 이용도 기대할 수 있다.According to the present invention, it is possible to provide a novel binaphthalene skeleton-containing epoxy resin having a binaphthalene skeleton and excellent in workability and fluidity, which is liquid even at room temperature. Moreover, since the binaphthalene frame | skeleton containing epoxy resin of this invention shows high refractive index and a high Abbe's number, use as a novel optical system material can also be expected.

도 1은 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지의 13C-NMR(CDCl3) 차트이다.
도 2는 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지의 질량 분석 차트이다.
1 is a 13 C-NMR (CDCl 3 ) chart of diepoxy binaphthalene resin represented by Formula (1).
It is the mass spectrometry chart of diepoxy binaphthalene resin represented by Formula (1).

<신규한 디에폭시바이나프탈렌 수지의 제조 방법><The manufacturing method of new diepoxy binaphthalene resin>

 이하의 식 (1)Equation (1) below

[화학식 3][Formula 3]

Figure 112016034125871-pct00003
Figure 112016034125871-pct00003

(식 중, n은 0 또는 1 이상의 정수이다. )(Wherein n is 0 or an integer of 1 or more.)

로 나타내어지는 디에폭시바이나프탈렌 수지는, 예를 들면, 알칼리 금속 수산화물 존재하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌과 에피할로히드린을 반응시킴으로써 얻어진다.The diepoxy binaphthalene resin represented by this is, for example, by reacting 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene and epihalohydrin in the presence of an alkali metal hydroxide. Obtained.

원료로서 사용하는 2, 2'-비스(2-히드록시에톡시)-1, 1'-바이나프탈렌은 시판품을 이용할 수 있으며, 관용의 방법, 예를 들면 1,1-바이-2-나프톨과 소정량의 에틸렌카보네이트 또는 에틸렌옥사이드를 불활성 용매 및 알칼리 촉매 존재하에 반응시켜 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌으로 만든 것을 그대로 이용할 수 있으며, 또한 상기 반응 종료후의 반응 생성물로부터 관용의 정제 방법(추출, 정석 등)을 이용하여 정제한 것을 이용할 수도 있다. 본 발명에서, 원료로로서 사용하는 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌의 순도는, 통상 90중량% 이상, 바람직하게는 95중량% 이상, 특히 바람직하게는 99중량% 이상이다.2, 2'-bis (2-hydroxyethoxy) -1 and 1'-binaphthalene which are used as a raw material can use a commercial item, and it is a common method, for example, 1, 1- bi- 2-naphthol, A predetermined amount of ethylene carbonate or ethylene oxide is reacted in the presence of an inert solvent and an alkali catalyst to make 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene as it is. You may use what refine | purified from the reaction product after completion | finish of reaction using the usual purification method (extraction, crystallization etc.). In the present invention, the purity of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene used as a raw material is usually 90% by weight or more, preferably 95% by weight or more, particularly Preferably it is 99 weight% or more.

본 발명에서의 알칼리 금속 수산화물로서는, 예를 들면 수산화나트륨, 수산화칼륨 등 예시되며, 그 사용량은 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌의 수산기 1몰 당량에 대해 통상 0.8 내지 4.0몰, 바람직하게는 2.0 내지 3.0몰이다. 알칼리 금속 수산화물은 고체일수도 있고 수용액일 수도 있다.As an alkali metal hydroxide in this invention, sodium hydroxide, potassium hydroxide, etc. are illustrated, for example, The usage-amount is 1 mol of hydroxyl groups of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene. The amount is usually 0.8 to 4.0 moles, preferably 2.0 to 3.0 moles per equivalent. The alkali metal hydroxide may be a solid or an aqueous solution.

본 발명에서 사용하는 에피할로히드린으로서는, 구체적으로는 에피클로로히드린, 에피브롬히드린 등이 예시되며, 그 사용량은 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌의 수산기 1몰 당량에 대해 통상 2 내지 30몰, 바람직하게는 3 내지 20몰이다. 한편, 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지의 반복 단위수인 n의 값(n수)은, 에피할로히드린의 사용량에 따라 조정이 가능하다. 즉, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 대해서 에피할로히드린을 대량 과잉으로 사용하면, n이 0인 화합물이 주성분으로서 얻어지며, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 대하여 에피할로히드린의 사용량을 낮춰가면, n이 0보다 큰 화합물의 비율을 높게 할 수 있다.Specific examples of the epihalohydrin used in the present invention include epichlorohydrin, epibromhydrin, and the like, and the amount thereof used is 2,2'-bis (2-hydroxyethoxy) -1,1. The molar ratio is usually from 2 to 30 moles, preferably from 3 to 20 moles, relative to 1 molar equivalent of the hydroxyl group of X-binaphthalene. In addition, the value (n number) of n which is the repeating unit number of diepoxy binaphthalene resin represented by said Formula (1) can be adjusted with usage-amount of epihalohydrin. Namely, when a large amount of epihalohydrin is used in excess of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene, a compound having n is obtained as a main component, and 2 When the usage-amount of epihalohydrin is reduced with respect to, 2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene, the ratio of the compound whose n is larger than 0 can be made high.

2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌과 에피할로히드린을 반응시킬 때의 반응 방법으로서는, 예를 들면, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌과 에피할로히드린을 반응 용기에 투입하여 용해 혼합한 후, 20℃ 내지 120℃, 바람직하게는 40℃ 내지 90℃에서 알칼리 금속 수산화물을 첨가하고, 그 후 20℃ 내지 120℃, 바람직하게는 40℃ 내지 90℃에서 1 내지 24시간 반응시킴으로써 본 발명의 디에폭시바이나프탈렌 수지를 얻을 수 있다. 한편, 알칼리 금속 수산화물은 일괄적으로 첨가해도 되지만, 소정의 반응 온도를 유지하기 위하여 일정 시간, 예를 들면 1 내지 10시간에 걸쳐 적하 등의 방법에 의해 연속적으로 첨가하거나, 또는 필요량을 분할하여 첨가하는 것이 바람직하다.As a reaction method at the time of making 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene and epihalohydrin react, for example, 2,2'-bis (2- Hydroxyethoxy) -1,1'-binaphthalene and epihalohydrin were added to the reaction vessel for dissolution and mixing, and then alkali metal hydroxide was added at 20 ° C to 120 ° C, preferably 40 ° C to 90 ° C. Then, the diepoxy binaphthalene resin of the present invention can be obtained by reacting at 20 ° C to 120 ° C, preferably at 40 ° C to 90 ° C for 1 to 24 hours. In addition, although alkali metal hydroxide may be added collectively, in order to maintain predetermined | prescribed reaction temperature, it adds continuously by the method of dripping over a predetermined time, for example, 1 to 10 hours, or it divides and adds required amount It is desirable to.

상기 반응을 실시할 때, 알칼리 금속 수산화물의 수용액을 사용하는 경우는 그 알칼리 금속 수산화물의 수용액을 연속적으로 반응계 내에 첨가하는 한편, 반응계를 감압하에서, 또는 상압하에서 환류 상태로 하여 물 및 미반응 에피할로히드린을 유출(溜出) 한 후에 유출액을 분액하여 물은 계외로 제거하고, 에피할로히드린은 반응계 내로 되돌리는 것이 바람직하다.When carrying out the above reaction, in the case of using an aqueous solution of an alkali metal hydroxide, an aqueous solution of the alkali metal hydroxide is continuously added into the reaction system, while the reaction system is refluxed under reduced pressure or under atmospheric pressure to avoid water and unreacted reaction. After dilution of hydrhydrin, the effluent is separated and water is removed out of the system, and epihalohydrin is preferably returned to the reaction system.

상기 반응을 실시할 때, 테트라메틸암모늄클로라이드, 테트라메틸암모늄브로마이드, 테트라부틸암모늄브로마이드, 벤질트리메틸암모늄클로라이드, 벤질트리에틸암모늄클로라이드 등의 4급 암모늄염을 이용하는 것이 반응성 향상의 관점에서 바람직하다. 4급 암모늄염을 사용하는 경우의 사용량은 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌 1몰에 대해, 통상 0.01 내지 0.50몰, 바람직하게는 0.02 내지 0.20몰이다. 또한, 4급 암모늄염을 사용하는 경우, 통상, 알칼리 금속 수산화물을 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌과 에피할로히드린의 용해 혼합물에 첨가하기 전에 첨가한다.When carrying out the above reaction, it is preferable to use quaternary ammonium salts such as tetramethylammonium chloride, tetramethylammonium bromide, tetrabutylammonium bromide, benzyltrimethylammonium chloride, benzyltriethylammonium chloride and the like from the viewpoint of improving the reactivity. The use amount of a quaternary ammonium salt is usually 0.01 to 0.50 mol, preferably 0.02 to 0.20 mol, per 1 mol of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene. to be. In addition, when using a quaternary ammonium salt, the alkali metal hydroxide is usually added to a dissolution mixture of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene and epihalohydrin. Add before.

상기 반응 후, 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지를 그대로 사용해도 되나, 하기 <1> 내지 <3>에 나타낸 후처리 공정을 적절하게 실시하여 원하는 상기 디에폭시바이나프탈렌 수지로 만드는 것이 바람직하다.After the reaction, the diepoxy binaphthalene resin represented by the above formula (1) may be used as it is, but the post-treatment steps shown in the following <1> to <3> are appropriately performed to obtain the desired diepoxy binaphthalene resin. It is preferable.

<1> 무기분 등의 제거 공정 및 농축 공정<1> removal process and concentration process, such as inorganic powder

상기 반응에서 얻어진 반응 생성물을 필요에 따라 여과 및/또는 수세·분액제거하여, 불용해분, 무기염 및 알칼리 금속 수산화물을 제거한다. 그 후, 상기 반응에 있어서 에피할로히드린을 대량 과잉 사용한 경우, 내온 100℃ 내지 150℃, 내압 30mmHg 이하, 바람직하게는 10mmHg 이하로 에피할로히드린을 제거하는 것이 바람직하다.The reaction product obtained in the said reaction is filtered and / or washed with water, and liquid separation is performed as needed, and insoluble matter, an inorganic salt, and an alkali metal hydroxide are removed. Then, when epihalohydrin is excessively used in the said reaction, it is preferable to remove epihalohydrin in internal temperature 100 degreeC-150 degreeC, internal pressure 30mmHg or less, Preferably it is 10mmHg or less.

<2> 폐환 공정<2> ring closure process

가수분해성 할로겐의 함유량이 보다 적은 디에폭시바이나프탈렌 수지로 만들기 위해서, 상기 반응 후의 디에폭시바이나프탈렌 수지 또는 <1>에서 나타낸 후처리 공정을 실시한 디에폭시바이나프탈렌 수지에 유기 용매를 첨가한 후, 알칼리 금속 수산화물을 첨가하여, 통상 20℃ 내지 120℃에서 교반함으로써 가수분해성 할로겐의 함유량이 보다 적은 디에폭시바이나프탈렌 수지로 만들 수 있다.In order to make diepoxy binaphthalene resin with less content of hydrolysable halogen, after adding the organic solvent to the diepoxy binaphthalene resin after the said reaction or the diepoxy binaphthalene resin which performed the post-processing process shown by <1>, alkali By adding a metal hydroxide and stirring at 20 to 120 degreeC normally, it can be made into the diepoxy binaphthalene resin with less content of a hydrolysable halogen.

폐환 공정에서 사용하는 유기 용매로서는 디에폭시바이나프탈렌 수지나 알칼리 금속 수산화물과 반응하지 않는 것이면 어떠한 것이어도 무방하며, 예를 들면 톨루엔, 메틸이소부틸케톤, 메틸에틸케톤 등을 예시할 수 있다. 또한, 폐환 공정에서 사용하는 알칼리 금속 수산화물로서는, 예를 들면, 수산화나트륨, 수산화칼륨이 있으며, 고체여도 되고 수용액이어도 되나, 바람직하게는 수용액이 이용된다. 또한, 알칼리 금속 수산화물의 사용량은 에폭시화에 사용한 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌의 수산기 1몰 당량에 대해서 통상 0.01 내지 2.5몰, 바람직하게는 0.20 내지 1.2몰이다. 본 폐환 공정은 통상 0.5 내지 6시간 실시된다.Any organic solvent may be used as long as it does not react with diepoxy binaphthalene resin or alkali metal hydroxide, and toluene, methyl isobutyl ketone, methyl ethyl ketone and the like can be exemplified. As the alkali metal hydroxide used in the ring closure step, for example, sodium hydroxide and potassium hydroxide may be used and may be solid or an aqueous solution, but an aqueous solution is preferably used. The amount of alkali metal hydroxide used is usually 0.01 to 2.5 mol, preferably 1 mol equivalent to 1 mol equivalent of hydroxyl groups of 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene used for epoxidation. 0.20 to 1.2 moles. This ring-closure process is normally performed for 0.5 to 6 hours.

<3> 정제 공정<3> refining process

상기 폐환 공정 종료 후, 폐환 공정에서 얻어진 반응물을 필요에 따라 여과 및/또는 수세·분액 제거를 행하여 부생한 타르분이나 염을 제거한다. 그 후, pH가 8.0 내지 4.0이 되도록, 인산, 인산 나트륨, 옥살산, 아세트산 등의 산으로 중화를 행한다. 중화 후, 수세·분액 제거를 반복하고, 필요에 따라 여과를 행함으로써 불용해분을 제거한 후, 감압하에서 폐환 공정에서 사용한 유기 용매를 유거(留去)함으로써 본 발명의 디에폭시바이나프탈렌 수지를 얻는다.After completion of the ring closing step, the reactant obtained in the ring closing step is filtered and / or washed with water and liquid separation as necessary to remove by-product tar powder and salt. Thereafter, neutralization is performed with acids such as phosphoric acid, sodium phosphate, oxalic acid and acetic acid so that the pH is 8.0 to 4.0. After neutralization, water washing and liquid separation are repeated, and insoluble matter is removed by filtration as necessary, and then the organic solvent used in the ring closure step is removed under reduced pressure to obtain the diepoxy binaphthalene resin of the present invention. .

<신규한 디에폭시바이나프탈렌 수지><New diepoxy binaphthalene resin>

이하의 식 (1)Equation (1) below

[화학식 4][Formula 4]

Figure 112016034125871-pct00004
Figure 112016034125871-pct00004

(식 중, n은 0 또는 1 이상의 정수이다)(Wherein n is 0 or an integer of 1 or more)

로 나타내어지는 디에폭시바이나프탈렌 수지(이하, 본 발명의 디에폭시바이나프탈렌 수지라고 할 수 있음)의 반복 단위수인 n의 값(n수)은, 본 발명의 디에폭시바이나프탈렌 수지의 용도에 아울러 임의로 선택할 수 있으며, n수가 단일한 것을 정제에 의해서도 얻을 수는 있지만, 통상적으로는 n수가 다른 디에폭시바이나프탈렌 수지가 혼합된 것을 본 발명의 디에폭시바이나프탈렌 수지로서 사용한다. 또한, 본 발명의 디에폭시바이나프탈렌 수지에는 중간체인 모노글리시딜체, 소량의 가수분해성 염소, α-글리콜 등의 불순물 및 n=1인 디에폭시바이나프탈렌 수지의 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체 등 중 적어도 하나가 혼합되어 있을 수 있다.The value (n number) of n which is the repeating unit number of the diepoxy binaphthalene resin (henceforth the diepoxy binaphthalene resin of this invention) represented by the is in addition to the use of the diepoxy binaphthalene resin of this invention. Although it can select arbitrarily and the thing of single n number can also be obtained by refine | purification, what mixed the diepoxy binaphthalene resin from which n number differs is used normally as the diepoxy binaphthalene resin of this invention. Further, epichlorohydrin is further added to the diepoxybinaphthalene resin of the present invention to impurities such as monoglycidyl as an intermediate, a small amount of hydrolysable chlorine, α-glycol, and hydroxyl groups of n = 1 diepoxybinaphthalene resin. At least one of the triglycidyl bodies and the like may be mixed.

본 발명의 디에폭시바이나프탈렌 수지의 n수는 바람직하게는 0 또는 1 내지 10의 정수, 더 바람직하게는 0 또는 1 내지 2의 정수, 가장 바람직하게는 0 또는 1로 한다. n수가 3을 넘는 것의 비율이 높아지면 상용성이 나빠져, 조성물을 만들 때 첨가량에 제약이 생기는 등의 문제가 생길 수 있다. 또한, 보다 저점도의 디에폭시바이나프탈렌 수지로 만들기 위해서는, n=0인 수지의 비율을 통상 65% 이상, 바람직하게는 85% 이상으로 한다.N number of the diepoxy binaphthalene resin of this invention becomes like this. Preferably it is an integer of 0 or 1-10, More preferably, it is an integer of 0 or 1-2, Most preferably, it is 0 or 1. When the ratio of n-number exceeding 3 becomes high, compatibility will worsen and a problem may arise, such as a restriction | limiting in addition amount when making a composition. In order to make a lower viscosity diepoxy binaphthalene resin, the ratio of resin which is n = 0 is made into 65% or more normally, Preferably it is 85% or more.

본 발명의 디에폭시바이나프탈렌 수지는, 흡수율이 낮고 고온 지역에서의 탄성률이 낮은 등의 특징을 나타내는 바이나프탈렌 골격을 가지고 있음에도 불구하고, 실온에서 액체이며 용융 점도가 낮은 특징을 나타낸다. 예를 들면, 본 발명의 디에폭시바이나프탈렌 수지의 100℃에서의 용융 점도는 50 내지 200mPa·s, 150℃에서의 용융 점도는 5 내지 30mPa·s이기 때문에 취급성이 우수하다.Although the diepoxy binaphthalene resin of this invention has the binaphthalene frame | skeleton which shows the characteristics, such as low water absorption and low elasticity modulus in a high temperature area | region, shows the characteristic which is liquid at room temperature and low melt viscosity. For example, since the melt viscosity in 100 degreeC of the diepoxy binaphthalene resin of this invention is 50-200 mPa * s, and melt viscosity in 150 degreeC is 5-30 mPa * s, it is excellent in handleability.

본 발명의 디에폭시바이나프탈렌 수지는, 고내열성 등의 특성을 가지며 저점도이기 때문에 취급성도 우수하며, 열경화성 수지 원료, 경화제 등으로도 이용할 수 있다. 예를 들면, 본 발명의 디에폭시바이나프탈렌 수지는, 일반적인 에폭시 수지와 마찬가지로 그대로 이용할 수도 있고, 에폭시(메타)아크릴레이트 등의 열경화성 수지 원료로서 이용할 수도 있다.Since the diepoxy binaphthalene resin of this invention has characteristics, such as high heat resistance, and is low viscosity, it is excellent in handleability, and can be used also as a thermosetting resin raw material, a hardening | curing agent, etc. For example, the diepoxy binaphthalene resin of this invention can be used as it is like a general epoxy resin, and can also be used as thermosetting resin raw materials, such as an epoxy (meth) acrylate.

본 발명의 디에폭시바이나프탈렌 수지는, 통상적으로 경화제, 필요에 따라 희석제, 경화 촉진제, 또한, 필요에 따라 관용의 첨가제(예를 들면, 착색제, 안정제, 충전제, 대전 방지제, 난연제 등) 등을 포함한 에폭시 수지 조성물로 만들 수도 있다. 상기 에폭시 수지 조성물로 만들 때, 상기 에폭시 수지 조성물에 포함되는 에폭시 수지 성분은 본 발명의 디에폭시바이나프탈렌 수지로만 구성할 수도 있으며, 다른 에폭시 수지와 병용할 수도 있다.The diepoxy binaphthalene resin of this invention usually contains a hardening | curing agent, a diluent, a hardening accelerator, and also usual additives (for example, a coloring agent, a stabilizer, a filler, an antistatic agent, a flame retardant, etc.) etc. as needed. It can also be made from an epoxy resin composition. When making the said epoxy resin composition, the epoxy resin component contained in the said epoxy resin composition may be comprised only by the diepoxy binaphthalene resin of this invention, and may be used together with another epoxy resin.

본 발명의 디에폭시바이나프탈렌 수지와 병용할 수 있는 다른 에폭시 수지로서는 노볼락형 에폭시 수지, 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 비페닐형 에폭시 수지 등을 들 수 있다. 이러한 다른 에폭시 수지는, 단독 또는 2종류 이상을 조합할 수도 있다.As another epoxy resin which can be used together with the diepoxy binaphthalene resin of this invention, a novolak-type epoxy resin, a bisphenol-A epoxy resin, a bisphenol F-type epoxy resin, a biphenyl-type epoxy resin, etc. are mentioned. These other epoxy resins can also be used individually or in combination of 2 or more types.

실시예Example

이하, 실시예 및 비교예를 들어 본 발명을 더 상세히 설명하지만, 본 발명이 이들에 한정되는 것은 아니다.Hereinafter, although an Example and a comparative example are given and this invention is demonstrated in detail, this invention is not limited to these.

한편, 실시예 및 비교예에서 각 측정값은 다음의 방법 및 측정 조건에 따라 측정하였다.In addition, each measured value in the Example and the comparative example was measured according to the following method and measurement conditions.

〔1〕HPLC 순도[1] HPLC purity

다음의 측정 조건으로 HPLC 측정을 행하였을 때의 면적 백분율값을 HPLC 순도로 하였다.The area percentage value at the time of performing HPLC measurement on the following measurement conditions was made into HPLC purity.

·장치: (주)시마즈제작소제 「LC-2010AHT」Equipment: "LC-2010AHT" made by Shimadzu Corporation

·컬럼: 일반재단법인 화학물질평가연구기구제 「L-column ODS」(5μm, 4.6mmφ×250 mm)Column: L-column ODS (5μm, 4.6mmφ × 250mm)

·컬럼 온도: 40℃Column temperature: 40 ° C

·검출 파장: UV 254nmDetection wavelength: UV 254 nm

·이동상: A액=30% 메탄올, B액=메탄올Mobile phase: Liquid A = 30% methanol, Liquid B = methanol

·이동상 유량: 1.0ml/분Mobile phase flow rate: 1.0 ml / min

·이동상 기울기:B액 농도: 30%(0분)→100%(25분후)→100%(35분후)Mobile phase inclination: B liquid concentration: 30% (0 minutes) → 100% (25 minutes later) → 100% (35 minutes later)

〔2〕NMR 측정[2] NMR measurement

다음의 측정 조건으로 13C-NMR를 측정하였다. 13 C-NMR was measured under the following measurement conditions.

·내부 표준: 테트라메틸실란Internal standard: tetramethylsilane

·용매:CDCl3 Solvent: CDCl 3

·장치:JEOL-ESC400 분광계Device: JEOL-ESC400 spectrometer

〔3〕LC-MS 측정[3] LC-MS measurement

다음의 측정 조건으로 분리, 질량 분석하여 목적물을 동정하였다.The target object was identified by separation and mass spectrometry under the following measurement conditions.

·장치: (주)Waters제 「Xevo G2 Q-Tof」Device: "Xevo G2 Q-Tof" made by Waters Co., Ltd.

·컬럼: (주)Waters제 「ACQUITY UPLC BEH C18」(1.7μm, 2.1mmφ×100mm)Column: "ACQUITY® UPLC® BEH® C18" made by Waters Co., Ltd. (1.7μm, 2.1mmφ × 100mm)

·컬럼 온도: 40℃Column temperature: 40 ° C

·검출 파장: UV 230-800nmDetection wavelength: UV-230-800nm

·이동상: A액=초순수, B액=메탄올Mobile phase: A liquid = ultrapure water, B liquid = methanol

·이동상 유량: 0.3ml/분Mobile phase flow rate: 0.3 ml / min

·이동상 기울기:B액 농도: 60%(0분)→70%(10 분후)→100%(12분후)Mobile phase inclination: Liquid B concentration: 60% (0 minutes) → 70% (after 10 minutes) → 100% (after 12 minutes)

·검출법: Q-TofDetection method: Q-Tof

·이온화법: ESI(+) 법Ionization method: ESI (+) method

·Ion Source: 전압(+) 2.0kV, 온도 120℃Ion Source: voltage (+) 2.0kV, temperature 120 ℃

·Sampling Cone: 전압 10V, 가스 플로우 50L/hSampling Cone : Voltage: 10V, gas flow 50L / h

·Desolvation Cas: 온도 500℃, 가스 플로우 1000L/hDesolvation Cas : temperature 500 ℃, gas flow 1000L / h

〔4〕에폭시 당량[4] epoxy equivalent

자동 적정 장치(쿄토전자제 AT-5100)를 이용하여 JIS K7236에 따른 방법으로 측정하였다.It measured by the method according to JISK7236 using the automatic titrator (AT-5100 by Kyoto Electronics).

〔5〕용융 점도[5] melt viscosity

 B형 점도계(TOKIMEC INC제, MODEL: BBH)를 이용하여 로터 HH-1로, 20 내지 100rpm으로 100℃ 및 150℃로 가열하여 측정하였다.It measured by heating at 100-100 degreeC and 150 degreeC at 20-100 rpm with rotor HH-1 using the Brookfield viscometer (made by TOKIMEC®INC, MODEL: BBH).

〔6〕굴절률 및 아베수[6] refractive index and Abbe number

아베 굴절계((주)아타고제 「다파장 아베 굴절계 DR-2M」)를 이용하여 20℃에서의 굴절률(파장: 589nm) 및 20℃에서의 아베수(파장: 486, 589, 656nm)를 측정하였다. 한편, 샘플 조제 및 굴절률·아베수의 산출은 이하의 방법으로 행하였다.Refractive index (wavelength: 589 nm) at 20 ° C and Abbe number (wavelength: 486, 589, 656 nm) at 20 ° C were measured using an Abbe refractometer (manufactured by Atago Co., Ltd. "Multiwavelength Abbe Refractometer # DR-2M"). . In addition, calculation of the sample preparation and refractive index Abbe's number was performed with the following method.

얻어진 본 발명의 디에폭시바이나프탈렌 수지를 N,N-디메틸포름아미드에 용해하여 10중량%, 20중량% 및 30중량% 용액을 조제하고, 각 용액에 대해 상술한 조건으로 굴절률 및 아베수를 측정하였다. 다음으로, 얻어진 3지점의 측정값으로부터 근사 곡선을 도출하고, 이것을 100중량%로 외삽했을 때의 값을 얻어진 수지의 굴절률 및 아베수로 하였다.The obtained diepoxy binaphthalene resin of the present invention was dissolved in N, N-dimethylformamide to prepare 10% by weight, 20% by weight and 30% by weight solution, and the refractive index and Abbe number were measured under the conditions described above for each solution. It was. Next, the approximation curve was derived from the measured value of three points obtained, and the value at the time of extrapolating this at 100 weight% was made into the refractive index and Abbe's number of the obtained resin.

[실시예 1]EXAMPLE 1

교반기, 냉각기 및 온도계를 구비한 200ml의 유리제 반응 용기에, 질소 분위기하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌(다오카화학공업(주)제, 상품명 TBIS-BNE) 15.00g(0.040mol), 에피클로로히드린 74.20g(0.800mol)을 넣고, 50℃로 승온 및 용해한 후, 벤질트리에틸암모늄클로라이드 1.37g(0.006mol)를 첨가하였다. 첨가 후 80℃로 승온하여, 입상 수산화나트륨 6.65g(0.166mol)을 동일 온도로 80분에 걸쳐 분할 첨가하고, 동일 온도로 4시간 교반한 후 HPLC에 의해 반응 생성물의 분석을 행한 결과, 원료 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌은 0.1% 이하였다.In a 200 ml glass reaction vessel equipped with a stirrer, a cooler, and a thermometer, 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene (manufactured by Takaoka Chemical Co., Ltd.) under a nitrogen atmosphere, Trademark TBIS-BNE) 15.00g (0.040mol), epichlorohydrin 74.20g (0.800mol) was added, and after heating and dissolving at 50 degreeC, 1.37g (0.006mol) of benzyl triethylammonium chloride was added. It heated up at 80 degreeC after addition, and added 6.65 g (0.166 mol) of granular sodium hydroxide over 80 minutes at the same temperature, and after stirring for 4 hours at the same temperature, analyzed the reaction product by HPLC, and the raw material 2 , 2′-bis (2-hydroxyethoxy) -1,1′-binaphthalene was 0.1% or less.

얻어진 반응 생성물에 물을 가하여 교반하고 여과를 행함으로써 불용해분을 제거하였다. 그 후, 수층을 분액·제거하고 수세·분액을 행한 후, 유기층을 130℃까지 가열하고 내압 10mmHg로 농축을 행하였다. 그 후, 80℃까지 냉각하여 잔류물에 톨루엔을 가하여 잔류물을 용해한 후, 그 톨루엔 용액에 80℃이며 24중량%인 수산화나트륨 수용액 5.00g(0.030mol)을 첨가하고 동일 온도로 6시간 교반하였다. 교반 후, 여과를 행함으로써 불용해분을 제거하고 수층을 분액·제거하였다. 그 후, 물 및 산을 가하여 중화하고 수층을 분액 제거하였다. 이어서, 유기층을 수세·분액하고 유기층을 여과하여 불용해분을 제거한 후 감압 농축함으로써 황갈색 점조성의 액체 17.27g(겉보기 수율 89.2%)를 얻었다.Water was added to the obtained reaction product, stirred, and filtered to remove insoluble matter. Thereafter, the aqueous layer was separated and removed, followed by water washing and separation, and then the organic layer was heated to 130 ° C and concentrated to an internal pressure of 10 mmHg. Thereafter, the mixture was cooled to 80 DEG C, toluene was added to the residue to dissolve the residue, and then, 5.00 g (0.030 mol) of 80 DEG C and 24 wt% sodium hydroxide aqueous solution was added to the toluene solution, followed by stirring at the same temperature for 6 hours. . After stirring, the insoluble component was removed by filtration, and the aqueous layer was separated and removed. Thereafter, water and acid were added to neutralize and the aqueous layer was separated. Subsequently, the organic layer was washed with water and separated, the organic layer was filtered to remove insoluble matters, and then concentrated under reduced pressure to obtain 17.27 g of a yellowish viscous liquid (89.2% of an apparent yield).

얻어진 황갈색 점조성의 액체를 HPLC로 분석한 결과, 상기 식 (1)에서 n=0인 것이 86.6%, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 에피클로로히드린이 1개 부가된 모노글리시딜체가 4.8%, 상기 식 (1)에서 n=1인 것이 1.9%, n=1인 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체가 1.8%, 상기 식 (1)에서 n=2 이상인 것이 0.1% 이하 포함되어 있는 것으로부터, 목적으로 하는 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지가 생성되어 있음을 확인하였다. 얻어진 디에폭시바이나프탈렌 수지의 물성을 이하에 나타낸다.As a result of analyzing the obtained yellowish viscous liquid by HPLC, 86.6% of n = 0 in said Formula (1) was carried out to 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene. 4.8% of the monoglycidyl body to which one epichlorohydrin was added, 1.9% to n = 1 in the formula (1), and triglycidyl body to which epichlorohydrin was further added to the hydroxyl group having n = 1 was 1.8. It was confirmed that the diepoxy binaphthalene resin represented by the target Formula (1) was produced because 0.1% or less of% and the formula (1) contained n = 2 or more were contained. The physical property of obtained diepoxy binaphthalene resin is shown below.

·에폭시 당량: 256g/eqEpoxy equivalent: 256 g / eq

·용융 점도; 100℃: 80mPa·s, 150℃: 15mPa·sMelt viscosity: 100 ° C: 80 mPa · s, 150 ° C: 15 mPa · s

·굴절률: 1.60Refractive index: 1.60

·아베수: 21.5Abbe number: 21.5

얻어진 디에폭시바이나프탈렌 수지의 13C-NMR(CDCl3) 차트를 도 1에 나타낸다. 여기서, 115.4 내지 154.2ppm까지는 나프타렌 골격의 탄소에 귀속되고, 43.9, 50.6, 69.8ppm은 글리시딜기의 탄소에 귀속되며, 71.4, 71.7ppm은 에톡시기의 탄소에 귀속된다.The 13 C-NMR (CDCl 3 ) chart of the obtained diepoxy binaphthalene resin is shown in FIG. 1. Here, from 115.4 to 154.2 ppm are attributed to carbon of the naphtharene skeleton, 43.9, 50.6, and 69.8 ppm belong to the carbon of glycidyl group, and 71.4 and 71.7 ppm belong to the carbon of ethoxy group.

또한, 얻어진 디에폭시바이나프탈렌 수지 중, 상기 식 (1)에서의 n=0에 해당 하는 피크를 LC-MS으로 분석한 결과를 도 2에 나타낸다. 본 분석에서의 디에폭시바이나프탈렌 수지의 계산값(TOF MS ESI; C30H30O6+Na)은 509.1940이며, 실측값은 509.1955였다.Moreover, the result which analyzed the peak corresponding to n = 0 in said Formula (1) among the obtained diepoxy binaphthalene resin by LC-MS is shown in FIG. The calculated value (TOF MS ESI + ; C 30 H 30 O 6 + Na) of the diepoxy binaphthalene resin in this analysis was 509.1940, and the measured value was 509.1955.

[실시예 2]EXAMPLE 2

교반기, 냉각기 및 온도계를 구비한 200ml의 유리제 반응 용기에, 질소 분위기하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌(다오카화학공업(주) 제, 상품명 TBIS-BNE) 15.00g(0.040mol), 에피클로로히드린 74.20g(0.800mol)을 넣고, 50℃로 승온 및 용해한 후, 벤질트리에틸암모늄클로라이드 1.37g(0.006mol)을 첨가하였다. 첨가 후 80℃로 승온하여, 입상 수산화나트륨 8.00g(0.200mol)을 동일 온도로 90분에 걸쳐 분할하여 첨가하고 동일 온도로 3시간 교반한 후, HPLC에 의해 반응 생성물의 분석을 행한 결과, 원료 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌은 0.1% 이하였다.In a 200 ml glass reaction vessel equipped with a stirrer, a cooler, and a thermometer, 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene (manufactured by Takaoka Chemical Co., Ltd.) under a nitrogen atmosphere; Trademark TBIS-BNE) 15.00g (0.040mol), epichlorohydrin 74.20g (0.800mol) was added, and heated and dissolved at 50 ℃, 1.37g (0.006mol) benzyltriethylammonium chloride was added. After the addition, the temperature was raised to 80 ° C., and 8.00 g (0.200 mol) of granular sodium hydroxide was added at a similar temperature over 90 minutes, and stirred at the same temperature for 3 hours, after which the reaction product was analyzed by HPLC. 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene was 0.1% or less.

얻어진 반응 생성물에 물을 가하여 여과를 행함으로써 불용해분을 제거한 후, 130℃까지 가열하고 내압 10mmHg로 농축을 실시하였다. 그 후, 60℃까지 냉각하고 잔류물에 톨루엔을 가하여 용해하였다. 이 톨루엔 용액에, 60℃이며 24중량%인 수산화나트륨 수용액 3.30g(0.020mol)을 첨가하고 동일 온도로 2시간 교반한 후 여과를 행함으로써 불용해분을 제거한 후, 수층을 분액 제거하였다. 그 후, 물 및 산을 가해 중화한 후, 수층을 분액 제거하였다. 또한, 유기층을 식염수 및 물로 수차례 세정·분액 제거 조작을 행한 후, 유기층을 여과하여 불용해분을 제거한 후에 감압 농축함으로써, 황갈색 점조성 액체 16.64g(겉보기 수율 85.5%)을 얻었다.Water was added to the obtained reaction product to perform filtration to remove the insoluble fraction, and then heated to 130 ° C. and concentrated to an internal pressure of 10 mmHg. Then, it cooled to 60 degreeC, and toluene was added and dissolved in the residue. To this toluene solution, 3.30 g (0.020 mol) of an aqueous solution of sodium hydroxide at 60 ° C and 24% by weight was added and stirred at the same temperature for 2 hours, followed by filtration to remove the insoluble fraction, followed by separating an aqueous layer. Thereafter, water and acid were added to neutralize and the aqueous layer was separated. The organic layer was washed with brine and water several times, and the organic layer was filtered to remove insoluble matters and then concentrated under reduced pressure to give 16.64 g of a yellowish viscous liquid (85.5% in apparent yield).

얻어진 황갈색 점조성 액체를 HPLC로 분석한 결과, 상기 식 (1)에서 n=0인 것이 82.3%, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 에피클로로히드린이 1개 부가된 모노글리시딜체가 5.0%, 상기 식 (1)에서 n=1인 것이 2.0%, n=1인 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체가 2.1%, 상기 식 (1)에서 n=2 이상인 것이 0.2% 포함되어 있는 것으로부터, 목적으로 하는 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지가 생성되어 있음을 확인하였다. 얻어진 디에폭시바이나프탈렌 수지의 물성을 이하에 나타낸다.As a result of analyzing the obtained yellow viscous liquid by HPLC, it is 82.3% that n = 0 in the said Formula (1), and it is epi in 2,2'-bis (2-hydroxyethoxy) -1,1'- binaphthalene. 5.0% monoglycidyl added with one chlorohydrin, 2.0% n = 1 in formula (1), and 2.1% triglycidyl added with epichlorohydrin to a hydroxyl group having n = 1 Since 0.2% of thing of n = 2 or more is contained in the said Formula (1), it confirmed that the diepoxy binaphthalene resin represented by the target Formula (1) was produced. The physical property of obtained diepoxy binaphthalene resin is shown below.

·에폭시 당량: 258g/eqEpoxy equivalent: 258 g / eq

·용융 점도; 100℃: 87mPa·s, 150℃: 17mPa·sMelt viscosity: 100 ° C: 87 mPa · s, 150 ° C: 17 mPa · s

[실시예 3]EXAMPLE 3

교반기, 냉각기 및 온도계를 구비한 200ml의 유리제 반응 용기에, 질소 분위기하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌(다오카화학공업(주) 제, 상품명 TBIS-BNE) 15.00g(0.040mol), 에피클로로히드린 37.10g(0.400mol)을 넣고, 50℃로 승온 및 용해 후, 벤질트리에틸암모늄클로라이드 1.37g(0.006mol)를 첨가하였다. 첨가 후 80℃로 승온하여, 입상 수산화나트륨 6.65g(0.166mol)을 동일 온도로 50분에 걸쳐 분할하고 첨가하여 동일 온도로 4시간 교반한 후 HPLC에 의해 반응 생성물의 분석을 행한 결과, 원료 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌은 0.1% 이하였다.In a 200 ml glass reaction vessel equipped with a stirrer, a cooler, and a thermometer, 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene (manufactured by Takaoka Chemical Co., Ltd.) under a nitrogen atmosphere; Trademark TBIS-BNE) 15.00g (0.040mol), epichlorohydrin 37.10g (0.400mol) was added, and after heating and dissolving at 50 ℃, 1.37g (0.006mol) benzyltriethylammonium chloride was added. After the addition, the temperature was raised to 80 ° C., and 6.65 g (0.166 mol) of granular sodium hydroxide was divided at 50 ° C. over 50 minutes, added, stirred at the same temperature for 4 hours, and then analyzed by reaction with HPLC. , 2′-bis (2-hydroxyethoxy) -1,1′-binaphthalene was 0.1% or less.

얻어진 반응 생성물에 물을 가하여 여과를 행함으로써 불용해분을 여과 제거한 후, 130℃까지 가열하고 내압 10mmHg로 농축하였다. 그 후, 80℃까지 냉각하고 잔류물에 톨루엔을 가하여 용해하였다. 이 톨루엔 용액에, 80℃이며 30중량%인 수산화나트륨 수용액 10.95g(0.082mol)을 첨가하여 동일 온도로 3시간 교반한 후, 물을 가해 수세하여 수층을 분액 제거하였다. 그 후, 물 및 산을 가해 중화한 후, 수층을 분액 제거하였다. 또한, 수세·분액 제거 조작을 행하고 유기층을 여과하여 불용해분을 제거한 후, 감압 농축함으로써 황갈색 점조성 액체 16.28g(겉보기 수율 84.2%)을 얻었다.Water was added to the obtained reaction product, and filtration was carried out to remove insoluble matters, and then heated to 130 ° C. and concentrated to 10 mmHg. Then, it cooled to 80 degreeC, and toluene was added to the residue, and it melt | dissolved. To this toluene solution, 10.95 g (0.082 mol) of an aqueous 30% sodium hydroxide solution at 80 ° C was added and stirred at the same temperature for 3 hours, followed by washing with water to remove the aqueous layer. Thereafter, water and acid were added to neutralize and the aqueous layer was separated. Furthermore, after washing with water and separating liquids, the organic layer was filtered to remove insoluble matters, and then concentrated under reduced pressure, 16.28 g of a yellowish viscous liquid (84.2% of an apparent yield) was obtained.

얻어진 황갈색 점조성 액체를 HPLC로 분석한 결과, 상기 식 (1)에서 n=0인 것이 73.0%이고, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 에피클로로히드린이 1개 부가된 모노글리시딜체가 2.1%, 상기 식 (1)에서 n=1인 것이 4.1%, n=1인 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체가 6.2%, 상기 식 (1)에서 n=2 이상인 것이 1.2% 포함되어 있는 것으로부터, 목적으로 하는 상기 식 (1)으로 나타내어지는 디에폭시바이나프탈렌 수지가 생성되어 있음을 확인하였다. 얻어진 디에폭시바이나프탈렌 수지의 물성을 이하에 나타낸다.As a result of analyzing the obtained yellow viscous liquid by HPLC, it is 73.0% that n = 0 in said Formula (1), and it is carried out to 2,2'-bis (2-hydroxyethoxy) -1,1'- binaphthalene. The monoglycidyl body to which one epichlorohydrin was added was 2.1%, and in the formula (1), the triglycidyl body to which epichlorohydrin was further added was 4.1% and n = 1 to the hydroxyl group having n = 1. It was confirmed that the diepoxy binaphthalene resin represented by the target Formula (1) was produced because 1.2% of% and the above formula (1) contained n = 2 or more. The physical property of obtained diepoxy binaphthalene resin is shown below.

·에폭시 당량: 251g/eqEpoxy equivalent: 251 g / eq

·용융 점도; 100℃: 68mPa·s, 150℃: 15mPa·sMelt viscosity: 100 ° C: 68 mPa · s, 150 ° C: 15 mPa · s

[실시예 4]EXAMPLE 4

교반기, 냉각기 및 온도계를 구비한 200ml의 유리제 반응 용기에, 질소 분위기하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌(다오카화학공업(주) 제, 상품명 TBIS-BNE) 20.00g(0.053mol), 에피클로로히드린 29.70g(0.321mol)을 넣고, 80℃로 승온 및 용해한 후, 벤질트리에틸암모늄클로라이드 1.82g(0.008mol)를 첨가하였다. 그 후, 입상 수산화나트륨 8.87g(0.222mol)을 동일 온도로 90분에 걸쳐 분할하여 첨가하고 동일 온도로 3시간 교반한 후, HPLC에 의해 반응 생성물의 분석을 실시한 결과, 원료 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌은 0. 1% 이하였다.In a 200 ml glass reaction vessel equipped with a stirrer, a cooler, and a thermometer, 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene (manufactured by Takaoka Chemical Co., Ltd.) under a nitrogen atmosphere; A brand name TBIS-BNE) 20.00 g (0.053 mol) and epichlorohydrin 29.70 g (0.321 mol) were added thereto, and the mixture was heated and dissolved at 80 ° C., followed by addition of 1.82 g (0.008 mol) of benzyltriethylammonium chloride. Thereafter, 8.87 g (0.222 mol) of granular sodium hydroxide was added at the same temperature in 90 minutes, and the mixture was stirred at the same temperature for 3 hours. Then, the reaction product was analyzed by HPLC. Bis (2-hydroxyethoxy) -1,1'-binaphthalene was 0.1% or less.

반응 생성물에 톨루엔 40g을 가한 후에 여과를 행함으로써 불용해분을 제거한 후, 이 톨루엔 용액에 30℃이며 24중량%인 수산화나트륨 수용액 4.50g(0.027mol)을 첨가하여 동일 온도로 3시간 교반하였다. 그 후, 물을 가해 수세하여 수층을 분액 제거하였다. 그 후, 물 및 산을 가하여 중화한 후 수층을 분액 제거하였다. 또한, 수세·분액 제거를 행한 후 유기층을 여과하여 불용해분을 제거한 후 감압 농축함으로써, 황갈색 점조성 액체 25.26g(겉보기 수율 97.9%)을 얻었다.After 40 g of toluene was added to the reaction product, the insoluble fraction was removed by filtration, and then, to this toluene solution, 4.50 g (0.027 mol) of an aqueous sodium hydroxide solution of 30 ° C and 24% by weight was added and stirred at the same temperature for 3 hours. Thereafter, water was added thereto, followed by water washing to separate the aqueous layer. Thereafter, water and acid were added to neutralize and the aqueous layer was separated. Furthermore, after washing with water and separating liquids, the organic layer was filtered to remove insoluble matters, and then concentrated under reduced pressure to obtain 25.26 g of a yellowish viscous liquid (apparent yield 97.9%).

얻어진 황갈색 점조성 액체를 HPLC로 분석한 결과, 상기 식 (1)에서 n=0인 것이 77.9%이고, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 에피클로로히드린이 1개 부가된 모노글리시딜체가 0.6%, 상기 식 (1)에서 n=1인 것이 3.6%, n=1인 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체가 7.4%, 상기 식 (1)에서 n=2 이상인 것이 1.5% 포함되어 있는 것으로부터, 목적으로 하는 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지가 생성되어 있음을 확인하였다. 얻어진 디에폭시바이나프탈렌 수지의 물성을 이하에 나타낸다.As a result of analyzing the obtained yellowish viscous liquid by HPLC, it is 77.9% that n = 0 in the said Formula (1), and to 2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene. 0.6% of monoglycidyl body to which one epichlorohydrin was added, 3.6% to n = 1 in formula (1), and triglycidyl body to which epichlorohydrin was further added to the hydroxyl group having n = 1.4 It was confirmed that the diepoxy binaphthalene resin represented by the target Formula (1) was produced because 1.5% of% and the above formula (1) contained n = 2 or more. The physical property of obtained diepoxy binaphthalene resin is shown below.

·에폭시 당량: 254g/eqEpoxy equivalent: 254 g / eq

·용융 점도; 100℃: 77mPa·s, 150℃: 16mPa·sMelt viscosity: 100 ° C: 77 mPa · s, 150 ° C: 16 mPa · s

[실시예 5]EXAMPLE 5

교반기, 냉각기 및 온도계를 구비한 200ml의 유리제 반응 용기에 질소 분위기 하에서 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌(다오카화학공업(주)제, 상품명 TBIS-BNE) 20.00g(0.053mol), 에피클로로히드린 20.80g(0.225mol)를 넣고 80℃로 승온 및 용해한 후, 테트라부틸암모늄브로마이드 2.58g(0.008mol)을 첨가하였다. 그 후, 입상 수산화나트륨 8.87g(0.222mol)을 동일 온도로 80분에 걸쳐 분할하여 첨가하고 동일 온도로 2시간 교반한 후, HPLC에 의해 반응 생성물의 분석을 행한 결과, 원료 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌은 0.1% 이하였다.2,2'-bis (2-hydroxyethoxy) -1,1'-binaphthalene (product made from Takaoka Chemical Co., Ltd.) in a 200 ml glass reaction vessel equipped with a stirrer, a cooler and a thermometer under a nitrogen atmosphere. 20.00 g (0.053 mol) of TBIS-BNE) and 20.80 g (0.225 mol) of epichlorohydrin were added thereto, and the mixture was heated and dissolved at 80 ° C., followed by addition of 2.58 g (0.008 mol) of tetrabutylammonium bromide. Thereafter, 8.87 g (0.222 mol) of granular sodium hydroxide was added at a constant temperature over 80 minutes, and stirred at the same temperature for 2 hours. Then, the reaction product was analyzed by HPLC. Bis (2-hydroxyethoxy) -1,1'-binaphthalene was 0.1% or less.

얻어진 반응 생성물에 톨루엔 40g을 가한 후에 여과를 행함으로써 불용해분을 제거한 후, 이 톨루엔 용액에 40℃이며 24중량%인 수산화나트륨 수용액 4.50g(0.027mol)을 첨가하여 동일 온도로 2시간 교반한 후 물을 가해 수세를 실시하고 수층을 분액 제거하였다. 그 후, 물 및 산을 가하여 중화한 후 수층을 분액제거하였다. 계속해서, 수세·분액 조작을 행한 후 유기층을 여과하여 불용해분을 제거한 후 감압 농축함으로써, 황갈색 점조성 액체 25.34g(겉보기 수율 98.3%)을 얻었다.40 g of toluene was added to the obtained reaction product, followed by filtration to remove the insoluble fraction, and then, to the toluene solution, 4.50 g (0.027 mol) of an aqueous sodium hydroxide solution of 40 ° C and 24% by weight was added and stirred at the same temperature for 2 hours. Thereafter, water was added, water washing was performed, and the aqueous layer was separated. Thereafter, water and acid were added to neutralize and the aqueous layer was separated. Subsequently, after performing a water washing and separating operation, the organic layer was filtered to remove insoluble matters, and then concentrated under reduced pressure to obtain 25.34 g of a yellowish viscous viscous liquid (apparent yield 98.3%).

얻어진 황갈색 점조성 액체를 HPLC로 분석한 결과, 상기 식 (1)에서 n=0인 것이 68.3%이고, 2,2'-비스(2-히드록시에톡시)-1,1'-바이나프탈렌에 에피클로로히드린이 1개 부가된 모노글리시딜체가 0.4%, 상기 식 (1)에서 n=1인 것이 3.9%, n=1인 수산기에 에피클로로히드린이 더 부가된 트리글리시딜체가 9.0%, 상기 식 (1)에서 n=2 이상인 것이 3.2% 포함되어 있는 것으로부터, 목적으로 하는 상기 식 (1)로 나타내어지는 디에폭시바이나프탈렌 수지가 생성되어 있음을 확인하였다. 얻어진 디에폭시바이나프탈렌 수지의 물성을 이하에 나타낸다.As a result of analyzing the obtained yellow viscous liquid by HPLC, it is 68.3% that n = 0 in said Formula (1), and it is carried out to 2,2'-bis (2-hydroxyethoxy) -1,1'- binaphthalene. 0.4% of monoglycidyl bodies to which one epichlorohydrin was added, 3.9% to n = 1 in Formula (1) above, and triglycidyl body to which epichlorohydrin was further added to the hydroxyl group having n = 1 was 9.0 It was confirmed that the diepoxy binaphthalene resin represented by the target Formula (1) was produced from 3.2% containing% = n = 2 or more in Formula (1). The physical property of obtained diepoxy binaphthalene resin is shown below.

·에폭시 당량: 280g/eqEpoxy equivalent: 280 g / eq

·용융 점도; 100℃: 150mPa·s, 150℃: 23mPa·sMelt viscosity: 100 ° C: 150 mPa · s, 150 ° C: 23 mPa · s

[비교예 1][Comparative Example 1]

원료를 1,1'-바이-2-나프톨 11.45g(0.040mol)으로 변경한 것 이외에는 실시예 1과 마찬가지로 에폭시화 반응, 반응 후의 후처리를 실시하여, 담황색 고체의 상기 식 (2)로 나타내어지는 바이나프톨의 디글리시딜에테르를 주체로 하는 에폭시 수지 14.30g(겉보기 수율 91.9%, HPLC 순도 90.4%)을 얻었다. 얻어진 에폭시 수지의 물성을 이하에 나타낸다.Epoxidation reaction and post-treatment after reaction were carried out similarly to Example 1 except having changed the raw material into 11.45 g (0.040 mol) of 1,1'- bi-2- naphthols, and it is represented by said Formula (2) of a pale yellow solid. 14.30 g of an epoxy resin mainly composed of diglycidyl ether of binaphthol (apparent yield 91.9%, HPLC purity 90.4%) was obtained. The physical property of the obtained epoxy resin is shown below.

·에폭시 당량: 218g/eqEpoxy equivalent: 218 g / eq

·용융 점도; 100℃: 825mPa·s, 150℃: 40mPa·sMelt viscosity: 100 ° C: 825 mPa · s, 150 ° C: 40 mPa · s

본 발명의 디에폭시바이나프탈렌 수지, 또는 상기 디에폭시바이나프탈렌 수지를 포함한 에폭시 수지 조성물은, 바이나프탈렌 골격을 가지므로 흡수율이 낮고, 고온 영역에서의 탄성률이 낮은 등의 특성을 가지며, 경화 전에는 저점도이며 작업성이 양호하기 때문에, 내열성, 저점도가 요구되는 광범위한 분야에서 이용할 수 있다. 구체적으로는 밀봉 재료, 적층판, 절연 재료, 프린트 기판용 솔더레지스트, 커버레이 등의 레지스터 재료, 컬러 필터, 코팅제 등의 모든 전기·전자 재료로서 유용하다. 또한, 고굴절, 저아베수와 같은 특성을 가지므로 광학재 원료로서도 유용하다. 그 외, 성형 재료, 접착제, 복합 재료, 도료, 인쇄 잉크, 광경화성 수지 원료, 감광성 수지 원료 등의 분야에도 이용할 수 있다.Since the diepoxy binaphthalene resin of this invention or the epoxy resin composition containing the said diepoxy binaphthalene resin has a binaphthalene frame | skeleton, it has the characteristics of low water absorption, low elasticity in high temperature range, etc., and low viscosity before hardening And because of its good workability, it can be used in a wide range of fields where heat resistance and low viscosity are required. Specifically, it is useful as all electrical and electronic materials, such as a sealing material, a laminated board, an insulating material, solder materials for printed circuit boards, a resist material, such as a coverlay, a color filter, and a coating agent. Moreover, since it has characteristics such as high refractive index and low Abbe's number, it is also useful as an optical material raw material. In addition, it can be used also in fields such as molding materials, adhesives, composite materials, paints, printing inks, photocurable resin raw materials, and photosensitive resin raw materials.

Claims (2)

하기 식 (1):
[화학식 1]
Figure 112016034125871-pct00005

(식 중, n은 0 또는 1 이상의 정수이다.)
로 나타내어지는 디에폭시바이나프탈렌 수지.
Formula (1) below:
[Formula 1]
Figure 112016034125871-pct00005

(Wherein n is an integer of 0 or 1 or more.)
Diepoxy binaphthalene resin represented by.
알칼리 금속 수산화물 존재하에서, 2, 2'-비스(2-히드록시에톡시)-1, 1'-바이나프탈렌에 에피할로히드린을 반응시키는 공정을 포함하는 제1항의 디에폭시바이나프탈렌 수지의 제조 방법.Of the diepoxy binaphthalene resin of claim 1 comprising the step of reacting epihalohydrin with 2,2′-bis (2-hydroxyethoxy) -1,1′-binaphthalene in the presence of an alkali metal hydroxide. Manufacturing method.
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