KR102043862B1 - Liquid Crystal Display Device and Method of manufacturing the sames - Google Patents

Abstract

The present invention includes a first substrate including a red pixel, a green pixel, a blue pixel, and a white pixel; A second substrate facing the first substrate; A liquid crystal layer formed between the first substrate and the second substrate; A thin film transistor formed on each of a red pixel, a green pixel, a blue pixel, and a white pixel on the first substrate; And a color filter layer formed on the first substrate, wherein the color filter layer is formed of a red color filter formed in the red pixel, a green color filter formed in the green pixel, and a blue color filter formed in the blue pixel, The color filter layer relates to a liquid crystal display device and a manufacturing method thereof, wherein the color filter layer is formed in a step compensation hole provided in the insulating film on the first substrate.

Description

Liquid Crystal Display Device and Method of manufacturing the sames

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a color filter formed on a thin film transistor substrate and a manufacturing method thereof.

Liquid crystal display devices (Liquid Crystal Display Device) has a low operating voltage, low power consumption, and can be used as a portable, such as notebook computers, monitors, spacecraft, aircraft, etc. has a wide range of applications.

The liquid crystal display device includes an upper substrate, a lower substrate, and a liquid crystal layer formed between the two substrates, and the arrangement state of the liquid crystal layer is adjusted according to the presence or absence of an electric field, and thus the light transmittance is adjusted to display an image. Device.

In general, since the color filter is formed on the upper substrate, the upper substrate may be referred to as a color filter substrate. In addition, since the thin film transistor is formed on the lower substrate, the lower substrate may be referred to as a thin film transistor substrate.

However, the liquid crystal display device using the color filter substrate and the thin film transistor substrate as described above has a limitation in simplifying the manufacturing process because both substrates are bonded after the color filter substrate and the thin film transistor substrate are manufactured through separate manufacturing process lines. . Therefore, in order to simplify the manufacturing process, a liquid crystal display device having a so-called COT (Color On TFT) structure for forming a color filter on a thin film transistor substrate has been devised.

Hereinafter, a liquid crystal display device having a COT structure (hereinafter, abbreviated as 'liquid crystal display device' for a liquid crystal display device having a COT structure) will be described with reference to the accompanying drawings.

FIG. 1A is a schematic plan view of a lower substrate constituting a conventional liquid crystal display, and FIG. 1B is a schematic cross-sectional view of a conventional liquid crystal display, which corresponds to a cross section of the line I-I of FIG. 1A.

As shown in FIG. 1A, a gate line 11 and a data line 13 are formed on a conventional lower substrate 10.

The gate lines 11 are arranged in the horizontal direction, and the data lines 13 are arranged in the vertical direction. As described above, a plurality of pixels are defined by the gate line 11 and the data line 13 which are arranged to cross each other. The plurality of pixels includes a red (R) pixel, a green (G) pixel, and a blue (B) pixel.

Although not shown, a thin film transistor is formed in an area where the gate line 11 and the data line 13 cross each other, and the thin film transistor is connected to the pixel electrode.

As shown in FIG. 1B, a conventional liquid crystal display device includes a lower substrate 10, an upper substrate 20, and a liquid crystal layer 30 formed between the substrates 10 and 20.

More specifically, on the lower substrate 10, a first insulating film 12 is formed on an upper surface of the lower substrate 10 facing the upper substrate 20, and data is provided on the first insulating film 12. A line 13 is formed, a second insulating film 14 is formed on the data line 13, and a color filter layer 15 is formed on the second insulating film 14. The color filter layer 15 includes a red (R) color filter, a green (G) color filter, and a blue (B) color formed for each pixel. A third insulating film 16 is formed on the color filter layer 15, and a pixel electrode 17 and a common electrode 18 are formed on the third insulating film 16.

More specifically, the color filter layer is not formed on the lower surface of the upper substrate 20 facing the lower substrate 10, and thus, on the upper substrate 20, no configuration is provided on the lower surface of the upper substrate 20. This may not be formed.

As described above, since the thin film transistor and the color filter layer 15 are formed together on the lower substrate 10 and no configuration may be formed on the upper substrate 10, the upper substrate ( There is an advantage that the manufacturing process of 10) is simplified.

However, since the conventional liquid crystal display device is composed of a combination of red (R) pixels, green (G) pixels, and blue (B) pixels, a red (R) color filter formed in the red (R) pixels, Due to the green (G) color filter formed in the green (G) pixel and the blue (B) color formed in the blue (B) pixel, the light transmittance is lowered, and thus there is a limit in improving the luminance.

The present invention has been devised to solve the above-mentioned conventional problems, and an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, wherein the light transmittance is increased to improve luminance.

The present invention, in order to achieve the above object, a first substrate comprising a red pixel, a green pixel, a blue pixel, and a white pixel; A second substrate facing the first substrate; A liquid crystal layer formed between the first substrate and the second substrate; A thin film transistor formed on each of a red pixel, a green pixel, a blue pixel, and a white pixel on the first substrate; And a color filter layer formed on the first substrate, wherein the color filter layer is formed of a red color filter formed in the red pixel, a green color filter formed in the green pixel, and a blue color filter formed in the blue pixel, The color filter layer is provided in the step compensation hole provided in the insulating film on the first substrate.

The present invention also provides a process for forming a first insulating film layer on a first substrate and forming a source electrode and a drain electrode on the first insulating film layer; Forming a second insulating film layer on the source electrode and the drain electrode, and forming a photoresist pattern on the second insulating film layer; Etching the second insulating film layer and the first insulating film layer using the photoresist pattern as a mask to form a second insulating film and a first insulating film having a step compensation hole to expose the first substrate; Forming a color filter layer in the step compensation hole; And bonding the first substrate and the second substrate with the liquid crystal layer interposed therebetween.

According to the present invention as described above has the following effects.

The liquid crystal display of the present invention is composed of a combination of red (R) pixels, green (G) pixels, blue (B) pixels, and white (W) pixels, and color filters are not formed in the white (W) pixels. As a result, the problem of light transmittance deterioration due to the color filter is reduced as compared with the related art. Therefore, in the liquid crystal display of the present invention, light transmittance may be increased, thereby improving luminance.

Further, according to the liquid crystal display device of the present invention, since the color filter layer is formed in the step compensation hole in the red (R), green (G), and blue (B) pixels, the red (R) in which the color filter layer is formed, The step difference can be minimized between the green (G) and blue (B) pixels and the white (W) pixel on which the color filter layer is not formed.

FIG. 1A is a schematic plan view of a lower substrate constituting a conventional liquid crystal display, and FIG. 1B is a schematic cross-sectional view of a conventional liquid crystal display, which corresponds to a cross section of line II of FIG. 1A.
2 is a schematic plan view of a first substrate 100 constituting a liquid crystal display according to an exemplary embodiment of the present invention.
FIG. 3 is a schematic cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention, which corresponds to a cross section of line II of FIG. 2.
FIG. 4 is a schematic cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention, which corresponds to a cross section of line II of FIG. 2.
5 is a detailed plan view of the first substrate 100 constituting the liquid crystal display according to the exemplary embodiment of the present invention.
FIG. 6 is a cross-sectional view of the liquid crystal display according to the exemplary embodiment of the present invention, which corresponds to a cross section of the II line of FIG. 5.
7A to 7G are schematic cross-sectional views illustrating a manufacturing process of a liquid crystal display according to an exemplary embodiment of the present invention, which relates to the manufacturing process of the liquid crystal display according to FIG. 6.

The term " on " as used herein means including not only when a configuration is formed directly on or under another configuration, but also when a third configuration is interposed between these configurations.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a schematic plan view of a first substrate 100 constituting a liquid crystal display according to an exemplary embodiment of the present invention.

As shown in FIG. 2, a gate line 110 and a data line 130 are formed on the first substrate 100 according to the exemplary embodiment of the present invention.

The gate line 110 is arranged in a first direction, for example, in a horizontal direction, and the data line 130 is arranged in a second direction different from the first direction, for example, in a vertical direction. As described above, a plurality of pixels are defined by the gate line 110 and the data line 130 which are arranged to cross each other. Although the data line 130 is illustrated in a straight line shape in the drawing, the data line 130 is not necessarily limited thereto and the data line 130 may be formed in a bent straight line shape.

Although not shown, a thin film transistor is formed in an area where the gate line 110 and the data line 130 cross each other, and the thin film transistor is connected to the pixel electrode.

The plurality of pixels includes a red (R) pixel, a green (G) pixel, a blue (B) pixel, and a white (W) pixel. In the drawing, in each row, a red (R) pixel, a green (G) pixel, a blue (B) pixel, and a white (W) pixel are arranged in that order, but such a form is always shown. It is not limited to the arrangement, it can be changed to various arrangement forms known in the art.

3 is a schematic cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention, which corresponds to a cross section of the I-I line of FIG. 2.

As can be seen in FIG. 3, the liquid crystal display according to the exemplary embodiment of the present invention includes a liquid crystal layer 300 formed between the first substrate 100, the second substrate 200, and the substrates 100 and 200. )

More specifically, on the first substrate 100, a first insulating layer 120, a data line 130, and a second insulating layer may be formed on one surface of the first substrate 100 facing the second substrate 200. 140, the color filter layer 150, the third insulating layer 160, the pixel electrode 170, and the common electrode 180 are formed.

The first insulating layer 120 is entirely formed on one surface of the first substrate 100.

The data line 130 is patterned on the first insulating layer 120. A red (R) pixel, a green (G) pixel, a blue (B) pixel, or a white (W) pixel is formed in an area between the data line 130 on one side and the data line 130 on the other side.

The second insulating layer 140 is formed on the data line 130. In particular, the second insulating layer 140 is entirely formed on one surface of the first substrate 100.

The color filter layer 150 is formed on the second insulating layer 140. The color filter layer 150 includes a red (R) color filter formed in a red (R) pixel, a green (G) color filter formed in a green (G) pixel, and a blue (B) color formed in a blue (B) pixel. It is done by The color filter layer 150 is not formed in the white (W) pixel.

As described above, the liquid crystal display of the present invention is composed of a combination of red (R) pixels, green (G) pixels, blue (B) pixels, and white (W) pixels, and a color filter layer in the white (W) pixels. Since 150 is not formed, the problem of light transmittance decrease due to color filters is reduced as compared with the conventional art.

The third insulating layer 160 is formed on the color filter layer 150. In particular, the third insulating layer 160 is entirely formed on one surface of the first substrate 100.

The pixel electrode 170 and the common electrode 180 are patterned on the third insulating layer 160. The pixel electrode 170 and the common electrode 180 are arranged in parallel to each other so that a horizontal electric field is formed therebetween, and the arrangement direction of the liquid crystal layer 300 may be adjusted by the horizontal electric field. As such, the liquid crystal display device in which the arrangement direction of the liquid crystal layer 300 is controlled by a horizontal electric field is called a horizontal in-plane switching mode liquid crystal display device, and the liquid crystal display device according to the present invention is known in the art. Various types of horizontal field mode liquid crystal displays. That is, although the pixel electrode 170 and the common electrode 180 are patterned on the third insulating layer 160 in the drawing, the pixel electrode 170 and the common electrode 180 are not necessarily limited thereto. 180 may be formed in different layers from each other.

In addition, the liquid crystal display according to the present invention is not necessarily limited to a horizontal in-plane switching mode liquid crystal display device, a twisted nematic (TN) mode liquid crystal display device, a FFS (Fringe Field Switching) mode liquid crystal display device, Various liquid crystal display devices known in the art, such as VA (Vertical Alignment) mode liquid crystal display device.

More specifically, the color filter layer is not formed on one surface of the second substrate 200 facing the first substrate 100, and in particular, the second substrate 200 No configuration may be formed on one surface. However, the present invention is not limited thereto, and in some cases, a black matrix and / or a column spacer may be formed on one surface of the second substrate 200.

The black matrix serves to prevent light from being transmitted to a region other than the pixel region, and the column spacer serves to maintain a uniform cell gap of the liquid crystal display.

The black matrix and / or color spacer may not be formed on the second substrate 200, but may instead be formed on the first substrate 100.

In addition, in the twisted nematic (TN) mode liquid crystal display and the vertical alignment (VA) mode liquid crystal display, the alignment direction of the liquid crystal layer 300 is controlled by a vertical electric field, and thus, the twisted nematic (TN) mode liquid crystal display. In the device and the vertical alignment (VA) mode liquid crystal display, the common electrode 180 is not formed on the first substrate 100 but is instead formed on the second substrate 200.

On the other hand, in the liquid crystal display shown in FIG. 3 as described above, since the color filter layer 150 is not formed in the white (W) pixel, the red (R) / green (G) / blue (B) pixel and the white (W) pixel are not formed. ) Steps are generated between the pixels. The LCD according to FIG. 4 described below minimizes the step difference between the red (R) / green (G) / blue (B) pixel and the white (W) pixel.

4 is a schematic cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention, which corresponds to a cross section of the I-I line of FIG. 2.

As can be seen in Figure 4, the liquid crystal display device according to another embodiment of the present invention, the liquid crystal layer 300 formed between the first substrate 100, the second substrate 200, and both substrates (100, 200) ) In the following, repeated description of the same configuration as in the above-described embodiment will be omitted.

More specifically, on the first substrate 100, a first insulating layer 120, a data line 130, and a second insulating layer may be formed on one surface of the first substrate 100 facing the second substrate 200. 140, the color filter layer 150, the third insulating layer 160, the pixel electrode 170, and the common electrode 180 are formed.

The first insulating layer 120 is formed on one surface of the first substrate 100.

The first insulating layer 120 is formed on the entire surface of the first substrate 100 in the white (W) pixel, but in the red (R) / green (G) / blue (B) pixel. It is not formed on one surface of the substrate 100. More specifically, the first insulating layer 120 is formed to have step compensation holes in the red (R) pixel, the green (G) pixel, and the blue (B) pixel. Accordingly, one surface of the first substrate 100 is exposed to the outside by the step compensation hole in the red (R) pixel, the green (G) pixel, and the blue (B) pixel, whereas the white (W) surface is exposed. ) It is not exposed to the outside in the pixel.

The data line 130 is patterned on the first insulating layer 120.

The second insulating layer 140 is formed on the data line 130.

The second insulating layer 140 is formed on the entire surface of the first substrate 100 in the white (W) pixel, but is formed in the red (R) / green (G) / blue (B) pixel. It is not formed on one surface of the substrate 100. More specifically, the second insulating layer 140 is formed to have the step compensation hole in the red (R) pixel, the green (G) pixel, and the blue (B) pixel. Therefore, one surface of the first substrate 100 is exposed to the outside by the step compensation hole in the red (R) pixel, the green (G) pixel, and the blue (B) pixel.

The color filter layer 150 is formed in the step compensation hole. More specifically, the color filter layer 150 may include a red (R) color filter formed in the step compensation hole in a red (R) pixel, a green (G) color filter formed in the step compensation hole in a green (G) pixel, and And a blue (B) color formed in the step compensation hole in the blue (B) pixel. The color filter layer 150 is formed to contact the first substrate 100.

As illustrated, the color filter layer 150 may be further formed on the top surface of the second insulating layer 140. In addition, as in the above-described embodiment, the color filter layer 150 is not formed in the white (W) pixel.

The third insulating layer 160 is formed on the color filter layer 150. In particular, the third insulating layer 160 is entirely formed on one surface of the first substrate 100.

The pixel electrode 170 and the common electrode 180 are patterned on the third insulating layer 160.

As described above, according to another exemplary embodiment of the present invention illustrated in FIG. 4, since the color filter layer 150 is formed in the step compensation hole in the red (R) / green (G) / blue (B) pixel, the color filter layer ( The step difference may be minimized between the red (R) / green (G) / blue (B) pixel on which the 150 is formed and the white (W) pixel on which the color filter layer 150 is not formed.

FIG. 5 is a detailed plan view of the first substrate 100 constituting the liquid crystal display according to the exemplary embodiment of the present invention, which illustrates a blue (B) pixel and a white (W) pixel. Although not shown, the configuration of the red (R) pixel and the green (G) pixel is the same as that of the blue (B) pixel except for the color filter used.

As can be seen in FIG. 5, the gate line 110, the data line 130, the thin film transistor T, the pixel electrode 170, and the common electrode 180 are formed on the first substrate 100 according to an exemplary embodiment of the present invention. ) Is formed.

As described above, the gate line 110 and the data line 130 cross each other to define a plurality of pixels, for example, a blue (B) pixel and a white (W) pixel.

The thin film transistor T is formed in an area where the gate line 110 and the data line 130 cross each other in the plurality of pixels. The thin film transistor T includes a gate electrode 115, a source electrode 132, and a drain electrode 134. The gate electrode 115 is branched from the gate line 110, the source electrode 132 is branched from the data line 130, and the drain electrode 134 is connected to the source electrode 132. Facing away. The thin film transistor T may be modified in various forms known in the art, and for example, the gate electrode 115 as well as the bottom gate structure in which the gate electrode 115 is formed under the semiconductor layer. ) May be formed in a top gate structure formed on the semiconductor layer.

The pixel electrode 170 is connected to the drain electrode 134 of the thin film transistor T through the contact hole CH in each of the plurality of pixels.

The common electrode 180 is arranged in parallel with the pixel electrode 170 in each of the plurality of pixels, and the common electrode 180 is connected to the common line 185. Although not specifically illustrated, the common electrode 180 and the common line 185 may be formed on different layers, and in this case, the common electrode 180 and the common line 185 may be formed through a predetermined contact hole. Are connected to each other.

6 is a cross-sectional view of the liquid crystal display according to the exemplary embodiment of the present invention, which corresponds to a cross section of the line I-I of FIG. 5.

As shown in FIG. 6, the liquid crystal display according to the exemplary embodiment of the present invention may include a first substrate 100, a second substrate 200 facing the first substrate 100, and the first substrate 100. ) And the liquid crystal layer 300 formed between the second substrate 200.

The gate electrode 115 is patterned on the first substrate 100. The gate electrode 115 is patterned on a blue (B) pixel and a white (W) pixel, respectively.

The first insulating layer 120 is formed on the gate electrode 115. The first insulating layer 120 is formed on the entire surface of the first substrate 100 in the white (W) pixel, but is formed to have a step compensation hole in the blue (B) pixel.

The semiconductor layer 125 is patterned on the first insulating layer 120. The semiconductor layer 125 is patterned on a blue (B) pixel and a white (W) pixel, respectively.

The source electrode 132 and the drain electrode 134 are patterned on the semiconductor layer 125. The source electrode 132 and the drain electrode 134 are patterned on the blue (B) pixel and the white (W) pixel, respectively. In addition, the source electrode 132 is connected to the data line 130.

The second insulating layer 140 is formed on the source electrode 132 and the drain electrode 134. The second insulating layer 140 is formed on the entire surface of the first substrate 100 except for the contact hole CH, which will be described later, in the white (W) pixel, but is described later in the blue (B) pixel. In addition to the hole CH, the step compensation hole is formed.

The color filter layer 150 is formed in the step compensation hole.

The color filter layer 150 is formed in the step compensation hole in the blue (B) pixel. In particular, the color filter layer 150 extends from the step compensation hole to the top surface of the second insulating layer 140. Therefore, the color filter layer 150 may be formed to overlap the thin film transistor.

The color filter layer 150 is not formed on the white (W) pixel. However, the present invention is not limited thereto, and the color filter layer 150 may be formed to overlap the thin film transistor in the white (W) pixel. That is, referring to FIG. 5, the white (W) pixel is defined by the gate line 110 and the data line 130, and a region in which the thin film transistor T is formed in the white (W) pixel. And areas that are not. At this time, since the region in which the thin film transistor T is formed is a region where light is blocked, the color filter layer 150 may be formed in the region.

A third insulating layer 160 is formed on the color filter layer 150 formed on the blue (B) pixel and the second insulating layer 140 formed on the white (W) pixel.

In the case of the blue (B) pixel, a contact hole CH is formed in the second insulating layer 140, the color filter layer 150, and the third insulating layer 160, and the drain is formed by the contact hole CH. The predetermined region of the electrode 134 is exposed.

In the case of the white (W) pixel, a contact hole CH is formed in the second insulating layer 140 and the third insulating layer 160, and the predetermined contact of the drain electrode 134 is defined by the contact hole CH. The area is exposed. Meanwhile, when the color filter layer 150 is formed to overlap the thin film transistor T in the white (W) pixel, the contact hole CH is also formed in the color filter layer in the white (W) pixel.

The pixel electrode 170 is patterned on the third insulating layer 160. The pixel electrode 170 is formed in the blue (B) pixel and the white (W) pixel, respectively, and is connected to the drain electrode 134 through the contact hole CH.

7A to 7G are schematic cross-sectional views illustrating a manufacturing process of a liquid crystal display according to an exemplary embodiment of the present invention, which relates to the manufacturing process of the liquid crystal display according to FIG. 6.

As described above, hereinafter, a manufacturing process of a blue (B) pixel and a white (W) pixel will be described. The manufacturing process of a red (R) pixel and a green (G) pixel may be performed in blue (except for a color filter used). B) It is the same as the manufacturing process of a pixel.

First, as shown in FIG. 7A, the gate electrode 115 is formed on the first substrate 100, the first insulating layer 120a is formed on the gate electrode 115, and the first insulating layer is formed. The semiconductor layer 125 is formed on the semiconductor layer 125a, and the data line 130, the source electrode 132, and the drain electrode 134 are formed on the semiconductor layer 125.

The gate electrode 115 is patterned on a blue (B) pixel and a white (W) pixel, respectively.

The first insulating layer 120a is entirely formed on the first substrate 100.

The semiconductor layer 125, the source electrode 132, and the drain electrode 134 are patterned on the blue (B) pixel and the white (W) pixel, respectively.

As illustrated, the gate electrode 115 may be formed under the semiconductor layer 125 (bottom gate structure), but the gate electrode 115 may be formed on the semiconductor layer 125 ( Top gate structure).

Next, as shown in FIG. 7B, a second insulating layer 140a is formed on the source electrode 132 and the drain electrode 134, and a photoresist pattern 145 is formed on the second insulating layer 140a. To form.

The second insulating layer 140a is entirely formed on the first substrate 100.

The photoresist pattern 145 may include a first opening P1 and a second opening P2.

The first opening P1 corresponds to the contact hole CH to be described later and is formed to overlap the drain electrode 134 of the thin film transistor in each of the blue (B) pixel and the white (W) pixel.

The second opening P2 corresponds to a step compensation hole, which will be described later, and is formed in the blue (B) pixel but not in the white (W) pixel. The second opening P2 is formed to overlap an area where the thin film transistor is not formed in the blue (B) pixel.

Next, as shown in FIG. 7C, the second insulating layer 140a and the first insulating layer 120a are etched using the photoresist pattern 145 as a mask to etch the second insulating layer 140 and the first insulating layer 120. ) Is formed, and then the photoresist pattern 145 is removed.

That is, the second insulating layer 140 has contact holes CH in each of the blue (B) pixels and the white (W) pixels, and the drain electrode 134 is exposed to the outside through the contact holes CH. . In addition, the second insulating layer 140 and the first insulating layer 120 have step compensation holes in the blue (B) pixel, and the first substrate 100 is exposed to the outside through the step compensation holes.

Next, as shown in FIG. 7D, the color filter layer 150 is formed in the step compensation hole of the blue (B) pixel.

The color filter layer 150 extends from the step compensation hole to the top surface of the second insulating layer 140 to overlap the thin film transistor. In this case, the color filter layer 150 is formed to have a contact hole (CH).

Although not shown, the color filter layer 150 may be further formed to overlap the thin film transistor in the white (W) pixel.

Next, as shown in FIG. 7E, a third insulating layer 160 is formed on the color filter layer 150 formed on the blue (B) pixel and the second insulating layer 140 formed on the white (W) pixel.

The third insulating layer 160 is formed to have a contact hole CH in each of the blue (B) pixel and the white (W) pixel.

Next, as shown in FIG. 7F, the pixel electrode 170 is formed on the third insulating layer 160. The pixel electrode 170 is formed in a pattern on the blue (B) pixel and the white (W) pixel, respectively, and is formed to be connected to the drain electrode 134 through the contact hole CH.

Next, as shown in FIG. 7G, the first substrate 100 and the second substrate 200 are bonded to each other with the liquid crystal layer 300 interposed therebetween.

The bonding of the first substrate 100 and the second substrate 200 may be performed using a vacuum injection method or a liquid crystal drop method known in the art.

100: first substrate 110: gate line
120: first insulating film 130: data line
140: second insulating film 150: color filter layer
160: third insulating film 170: pixel electrode
180: common electrode 200: second substrate
300: liquid crystal layer

Claims (9)

A first substrate including a red pixel, a green pixel, a blue pixel, and a white pixel;
A second substrate facing the first substrate;
A liquid crystal layer formed between the first substrate and the second substrate;
A thin film transistor formed on each of a red pixel, a green pixel, a blue pixel, and a white pixel on the first substrate; And
It comprises a color filter layer including a red color filter, a green color filter and a blue color filter formed on the first substrate,
The color filter layer is formed in a step compensation hole provided in the insulating film on the first substrate,
The thin film transistor includes a gate electrode, a source electrode, and a drain electrode,
The insulating film,
A first insulating film formed on the gate electrode;
A second insulating film formed on the source electrode and the drain electrode; And
A third insulating film formed on the second insulating film, covering the color filter layer, and formed on the upper surface of the first substrate as a whole;
The step compensation hole is formed by etching the at least a portion of the first insulating film and the second insulating film corresponding to the red color filter, the green color filter, and the blue color filter, and the first insulating film and the second insulating film Formed entirely on the substrate in the white pixel,
The color filter layer is formed to cover the step compensation hole,
And the color filter layer is formed to overlap the thin film transistor, and extends from the step compensation hole to an upper surface of the second insulating layer. The method of claim 1,
And the color filter layer is in contact with at least a portion of the first substrate. delete delete delete The method of claim 1,
The color filter layer has a contact hole formed therein, and the drain electrode of the thin film transistor is exposed through the contact hole. delete delete The method of claim 1,
And the color filter layer is formed to have a contact hole in at least a portion of the region overlapping the drain electrode, and the pixel electrode is connected to the drain electrode through the contact hole.

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