KR102028619B1 - nail beauty tool and its manufacturing method - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nail polisher having a pattern for improving gloss efficiency and a method for manufacturing the nail polisher, wherein the polishing area is formed by forming a pattern including a square or a polygon to enlarge the polishing area by line contact. The purpose of the present invention is to shorten the polishing time due to the enlargement and to improve the gloss efficiency for improving the reliability of the nail polisher by minimizing the surrounding contamination by the residues generated during polishing.
To this end, the present invention, in the method of manufacturing a nail polisher, which is a kind of beauty device in which a pattern is formed on the glass to polish the surface of the hands and toenails,
A substrate preparation step (S1) for preparing a glass substrate made of glass having a transmittance of 60% or more and an exposure wavelength of 350 nm or more; A metal film forming step (S2) of forming a metal film on the glass substrate by depositing a metal film having a thickness of 700 Å to 11,000 상 에 on the prepared glass substrate; When the metal film is formed on the glass substrate, the cleaning step (S3) for pickling and alkali cleaning the glass substrate to easily remove the organic material on the surface of the metal film; When the cleaning of the glass substrate is completed, the pattern film attaching step (S4) for attaching a pattern film (DFR, Dry Film Resist) pattern is formed on the metal film; An exposure step (S5) of placing a glass substrate with a pattern film on the exposure machine and irradiating ultraviolet rays to the pattern film for 8 to 60 seconds; After the exposure is completed, a development step of forming a primary pattern of a pattern film on a metal film by developing a pattern film using a developer having a sodium hydroxide (NaOH) or potassium hydroxide (KOH) series having a concentration of less than 10wt% (S6). Wow; When the primary pattern is formed on the metal film, the metal film is etched using a metal film etching solution to form a secondary pattern made of a metal film on the glass substrate, and the primary film is cleaned and dried to remove the pattern film. Etching step (S7); A second etching step (S8) of etching the glass substrate from which the pattern film is removed with hydrofluoric acid at a concentration of 20 to 30 wt% to form a glass substrate having the same pattern as the secondary pattern; When the pattern is formed on the glass substrate, a cleaning process is performed to remove the etchant or other residues remaining on the pattern of the glass substrate, but after the primary cleaning by spraying sulfuric acid on the pattern formation surface of the glass substrate, A washing step (S9) of spraying the cleaning liquid toward the lower side of the glass substrate while vibrating the glass substrate in a state in which the pattern formation surface of the glass substrate faces downward (S9); And attaching the glass substrate to the main body through an adhesive layer formed on the main body when the washing of the glass substrate is completed (S10).
The pattern may be any one of a mixed pattern in which a circle and a square or a polygon are mixed, or a single pattern in which only one of a rectangle and a polygon is formed, and the thickness of the pattern is 15 to 25 μm.

Description

Nail polisher having a pattern for improving gloss efficiency and a method of manufacturing the nail polisher {nail beauty tool and its manufacturing method}

The present invention relates to a nail polisher having a pattern for improving gloss efficiency and a method for manufacturing the nail polisher, and more particularly, to constitute a pattern including a square or polygonal to enlarge the polishing area by line contact. Thus, the nail polisher and nail polisher having a pattern for improving polishing efficiency by shortening the polishing time due to the expansion of the polishing area, minimizing the surrounding contamination by the residues generated during polishing, and improving the product reliability of the nail polisher It relates to a manufacturing method of.

In general, nail beauty instruments are used to polish and polish nail surfaces or ends with sandpaper, and are also referred to as nail polishers.

The nail paper beauty device with nail paper, that is, the nail polisher is composed of a plurality of sand papers having different particle sizes, and polishes the hands and toenails while using the sand paper attached device with the sand grain having a smaller particle size from the device with the larger sand paper. It is.

However, the conventional nail polisher has a problem that it is difficult to use long time since the particles of the sand paper dull quickly, and because the size of the particles contained in the sand paper is not uniform, there is a problem that it is difficult to produce a good quality gloss.

In addition, the embossed nail polisher is generally embossed in one side for the polishing of hands and toenails, in this case only push in a predetermined direction to polish the hands and toenails evenly, push in the other direction In this case, only a part of the hands and the toenails are polished, which causes a problem.

For example, as shown in Fig. 1, when the arrangement of the embossed protrusions 1 is constant, when polishing in the x-direction (or y-direction), they are disposed on the virtual straight lines L1 'and L3'. There is a problem that polishing is performed only by the projections 1 to be used, and because the projections 1 are not disposed on the virtual straight line L2 ', the polishing is not performed and scratches occur on the hands and toenails.

In addition, when grinding | polishing only by the projections 1 arrange | positioned on the virtual straight lines L4 'and L6', even if the protrusion 1 is not arrange | positioned on the virtual straight line L5 ', Since the distance is shorter than the distance between the virtual straight lines L1 'and L3', the polishing can be performed without scratching the hands and toenails.

However, since the polishing cannot be performed in the x direction or the y direction, and only the diagonal direction should be polished, it is inconvenient to polish the hands and toenails.

In addition, due to the material of the nail polisher can not be washed or disinfected, there is an unsanitary problem such as bacterial growth.

In addition, beauty salons or nail art specialty stores mainly use disposable nail polishes that are thrown away once to solve these problems, but there is a problem that causes a waste of resources.

In order to solve the above problems, the nail cosmetic device of the Republic of Korea Patent No. 10-1654334 is a nail cosmetic device including a polishing portion for polishing the nail, a plurality of protrusions are formed on at least one surface of the polishing portion, The projection of is repeated with a predetermined interval in the virtual projection pattern consisting of four projections in a first direction and a second direction perpendicular to the first direction, the virtual projection pattern is a predetermined angle in the first direction and the second direction Arranged to form an inclined rectangular shape, at least one protrusion overlaps a virtual straight line formed in any direction on the polishing portion.

As illustrated in FIG. 2, the polishing unit 200 may have a plurality of protrusions 210 to 214 formed on at least one surface thereof. The protrusions 210-214 have the shape of a cylinder or truncated cone so that the nail can be polished effectively in any direction. Alternatively, similar effects may be realized by configuring the elliptic cylinder.

However, since the projections formed on the polishing portion of the conventional nail polisher are formed in a planar circle, the contact with the nail is made in point contact due to the circular characteristic, and the polishing area is narrowed once by such point contact, so that the number of times of polishing There is a problem that it takes a long time to obtain a gloss that can be obtained to increase the desired gloss.

In addition, the conventional nail polisher has a problem that it is contaminated by maximizing the generation of residues through the polishing of the nail according to the increase in the number of times of polishing as the protrusion of the polishing portion is made circular.

As a result, the conventional nail polisher has a problem that the polishing time for obtaining the gloss is long, and thus, the occurrence of residues of the nail is increased, thereby polluting the surroundings, thereby losing product reliability for the nail polisher.

Republic of Korea Patent Publication No. 10-2011-117533 (2011.10.27.published) Republic of Korea Patent Publication No. 10-1654334 (2016.09.05. Notification) Republic of Korea Patent Publication No. 10-1672526 (August 28, 2016.)

As a proposal to solve the above problems, an object of the present invention is to configure a pattern comprising a square or polygon to enlarge the polishing area by line contact, thereby reducing the polishing time due to the expansion of the polishing area. The present invention provides a nail polisher and a method for manufacturing the nail polisher having a pattern for shortening and minimizing surrounding contamination by residues generated during polishing to improve gloss efficiency for improving product reliability for the nail polisher.

The present invention for achieving the above object, in the nail polisher which is a kind of beauty device in which a pattern is formed on the glass substrate to polish the surface of the hands and toenails, the pattern is based on a plane It is characterized in that the square or polygonal phase is mixed in a proportion of 50 to 80% to increase the contact area by contact to reduce the polishing time.

The present invention, in the nail polisher which is a kind of beauty instruments in which a pattern is formed on the glass substrate to polish the surface of the hands and toenails, the pattern is a circular, square or polygonal mixed on the basis of the plane Mixed pattern; It is preferable to include.

The present invention, in the nail polisher which is a kind of beauty instruments in which a pattern is formed on the glass substrate to polish the surface of the hands and toenails, the pattern is shortened the polishing time through the line contact on the basis of the plane It is preferable to include; a singular pattern formed with a square or polygon to enable it.

In the present invention, the thickness t of the pattern is preferably formed to be 15 to 25 µm on the surface of the glass substrate.

The present invention provides a method for manufacturing a nail polisher, which is a type of beauty instrument in which a pattern is formed on the glass to polish the surface of the hands and toenails, the glass substrate having a transmittance of 60% or more and an exposure wavelength of 350 nm or more. Preparing a substrate; A metal film forming step of forming a metal film by depositing a metal film on the substrate prepared through the substrate preparation step; A cleaning step of cleaning the substrate when metal film deposition of a predetermined thickness is completed on the substrate through the metal film forming step; When the cleaning of the metal film is completed through the cleaning step, attaching a pattern film having a pattern (DFR, Dry Film Resist) to attach the pattern film; An exposure step of performing an exposure process by placing the substrate on an exposure machine and irradiating ultraviolet rays when the pattern film is completely attached onto the substrate through the pattern film attaching step; A developing step of forming a primary pattern by performing a developing process when the exposure is completed through the exposure step; A primary etching step of forming a secondary pattern using a metal film etching solution when the primary pattern is completed by the developing process through the developing step; The pattern formed by any one of claims 1 to 3 is formed on the substrate by etching with 20 to 30% of hydrofluoric acid, which is a kind of etching solution, on the substrate from which the pattern film is removed through the first etching step. A secondary etching step of completing the glass; When the glass is completed through the secondary etching step, the cleaning step of performing a cleaning process to remove the etching solution or other residues remaining in the pattern of the glass; It is preferable to include; and the glass is attached to the main body through the adhesive layer formed on the main body of the glass is washed through the cleaning step, the attachment step to complete the nail polisher.

According to the present invention, by forming a pattern including a square or a polygon to enlarge the polishing area by line contact, the polishing time is shortened due to the expansion of the polishing area, and the surrounding contamination by the residues generated during polishing is reduced. Minimize the effect of improving product reliability for nail polisher.

1 is a view showing a pattern of the polishing unit of the conventional nail polisher.
2 is a view showing a pattern of the polishing unit of the nail polisher according to another conventional example.
3 is a perspective view of the nail polisher according to the first embodiment of the present invention.
Figure 4 is an enlarged view of the pattern of the glass according to the first embodiment of the present invention.
5 is a pattern configuration diagram of the glass according to the first embodiment of the present invention.
6 is a manufacturing process of the nail polisher according to the first embodiment of the present invention.
7 is an enlarged view of a pattern of glass according to a second embodiment of the present invention.
8 is a pattern configuration diagram of a glass according to a second embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

First Embodiment

As shown in FIG. 3, the nail polisher of the first embodiment includes a main body 10, a glass substrate 20 formed on one side of the main body 10, and a glass substrate 20 formed on the main body 10. ) Is stably fixed to the adhesive layer 30, and the glass substrate 20 has a pattern 22 having a predetermined shape.

The pattern 22 shortens the polishing time for obtaining gloss by polishing the surface of the hands and toenails, and minimizes the occurrence of residues of the hands and toenails to improve gloss efficiency.

As shown in FIG. 4, the pattern 22 is a mixed type in which circular and square are arranged in a complex manner. In this case, the quadrangle of the pattern 22 is not limited to a square, but may be formed in a polygonal shape such as a rectangle or a triangle or a pentagon.

That is, the mixed pattern may be configured such that the first column formed in a circle and the second column formed in a quadrangle are alternated at regular intervals.

In addition, as shown in FIG. 5, the mixed pattern has a circular diameter d of approximately 150 to 250 μm, a square width s of 100 to 250 μm, and a spacing g between patterns is circular. It is preferably formed at a ratio of 80 to 150% relative to the diameter (d).

In this case, when the circular diameter d is less than 150 μm, the contact area with the nail is insignificant, and the polishing functionality is inferior. When the diameter d exceeds 250 μm, the functionality of polishing is degraded due to the interference between the patterns.

In addition, when the width (s) of the square is less than 100㎛, the contact area with the nail is insignificant, and the polishing functionality is inferior.If the width is larger than 250㎛, the combination of patterns is lost due to the interference and the enlargement of the area between the patterns. .

In addition, if the gap g between the patterns is less than 80%, smooth grinding is not performed as the gap with the patterns is narrowed. If the gap g is greater than 150%, the overlapping portions between the patterns are enlarged due to the expansion of the gaps between the patterns. Is lowered.

In addition, the thickness t of the mixed pattern is formed on the surface of the glass 20 to 15 ~ 25㎛. In this case, if less than 15㎛ there is a problem that interferes with the polishing as it is easily filled by the foreign matter generated when the nail is polished, if it exceeds 25㎛ there is a problem of lowering the durability of the pattern.

In addition, the mixed pattern is preferably such that the square is more than the circular circle in the mixing ratio of the square and the circle 50 to 80% range.

This is a problem in that the round has a long polishing time because the polishing area is small by point contact as in the prior art, whereas the square has a shorter polishing time because the polishing area is larger than the round by the nail and line contact. As a result, when the circular and rectangular shapes are mixed, the polishing time is shorter than that of the conventional circular shape.

In addition, the method of forming the pattern 22 on the substrate 20 uses a lithography method.

Looking at the manufacturing method of the nail polisher configured as described above are as follows.

As shown in FIG. 6, the nail polisher of the present invention includes a substrate preparation step (S1), a metal film forming step (S2), a cleaning step (S3), a pattern film attaching step (S4), and an exposure step ( S5), a developing step S6, a first etching step S7, a second etching step S8, a cleaning step S9, and an attaching step S10.

In the substrate preparation step S1, a glass substrate having a transmittance of 60% or more and an exposure wavelength of 350 nm or more is prepared.

In this case, when the transmittance is less than 60% and the exposure wavelength is less than 350 nm, smooth pattern formation is not achieved.

In addition, it is preferable that the one side does not exceed 500 mm.

In addition, the substrate is preferably any one of Quartz, Soda lime.

The metal film forming step (S2) forms a metal film by depositing a metal film on the substrate prepared through the substrate preparation step (S1).

The metal film is preferably chromium (Cr). Of course, the present invention is not limited thereto, and silicon-molybdenum (MoSi), tantalum (Ta), or chromium oxide may be used. The silicon-molybdenum has a high temperature antioxidant (oxidation temperature of about 1,700 ℃), tantalum is a very hard silver gray metal element, a high density and very high melting point.

In addition, the metal film preferably has a deposition thickness of 700 kPa to 11,000 kPa. If it is less than 700 GPa, precise pattern formation is not performed during the exposure and etching process, and if it is more than 11,000 GPa, the metal film forming effect is not exhibited.

In addition, the metal film is preferably formed of a metal film through a vacuum thin film device, such as a sputtering vacuum deposition device. Of course, the present invention is not limited thereto, and any device capable of smoothly depositing a metal film having a thickness of 700 kPa to 11,000 kPa may be used.

In the cleaning step S3, when metal film deposition of a predetermined thickness is completed on the substrate through the metal film forming step S2, the cleaning step S3 is performed to induce stable attachment of the pattern film.

In order to easily remove the organic matter on the surface of the metal film, an acid washing and an alkali washing process are performed. Of course, the present invention is not limited thereto, and any method may be used as long as it is a cleaning liquid or a cleaning process that allows the pattern film to be attached to the metal film surface to be stably attached.

In the pattern film attaching step S4, when the cleaning of the metal film is completed through the cleaning step S3, a pattern film (DFR, dry film resist) having a pattern is attached, and a transparent film is attached thereon. The transparent film is a means for protecting the pattern film, and may be omitted in some cases.

In the exposing step S5, when the attaching the pattern film is completed on the substrate through the attaching the pattern film S4, the substrate is placed on an exposure machine and irradiated with ultraviolet rays to perform an exposure process.

In this case, the exposure step is irradiated with ultraviolet light for 8 to 60 seconds in a 1: 1 exposure method.

In the developing step S6, when the exposure is completed through the exposure step S5, the first pattern is formed by removing the transparent film attached to the pattern film and performing a developing process.

In this case, the developer is developed using a series such as sodium hydroxide (NaOH) or potassium hydroxide (KOH) having a concentration of less than 10%.

In the primary etching step S7, when the primary pattern is completed by the developing process through the developing step S6, the secondary pattern is formed by using a metal film etching solution, for example, a chromium etching solution when the metal film is chromium.

In this case, when the secondary pattern is completed, after cleaning and drying the substrate, the pattern film attached to the substrate is removed.

In the secondary etching step S8, the substrate on which the pattern film is removed is etched using hydrofluoric acid through the primary etching step S7 to complete the glass on which the final pattern is formed.

In this case, the hydrofluoric acid concentration is preferably 20 to 30%.

Through this, the pattern 22 is formed in a mixed form of a square and a circle.

In the cleaning step S9, when the glass substrate 20 obtained by etching the final pattern on the substrate is completed through the second etching step S8, the etching solution remaining in the pattern of the glass substrate 20 is removed. Perform the process.

In this case, the cleaning process is performed by spraying sulfuric acid on the glass substrate 20 to perform the first cleaning, and performing a second cleaning process through an ultrasonic cleaner, thereby improving the cleanliness so that etching liquid or other foreign substances do not remain in the pattern of the substrate. Keep it.

By preventing the remaining of the etching solution harmful to the human body in the final formed pattern through the second washing process, as well as the glossy interference by the remaining etching solution as well as to prevent damage to the nail or toenails during the nail or toenail care process.

For example, the washing step (S9) performs a first wash and a second wash.

First, in the first cleaning process, the glass substrate 20 is seated and fixed on the jig, and the cleaning liquid is sprayed through the nozzle located above the jig to clean the glass substrate 20.

In this case, the jig generates a vacuum pressure to fix the glass substrate 20 seated on the jig.

In addition, the nozzle is a fine hole of 0.05 ~ 0.2mm is formed, the injection of the cleaning liquid is made smoothly and the injection pressure by the fine hole is amplified to wash the remaining residue between the precise patterns of the glass substrate 20 This is done easily.

In this case, the micropores of the nozzle is preferably processed by laser processing.

Subsequently, the secondary cleaning process reverses the jig and the nozzle so that the jig is positioned upward and the nozzle is positioned downward.

Accordingly, the cleaning liquid sprayed from the lower nozzle cleans the surface of the glass substrate 20 fixed to the lower end of the jig, and the sprayed cleaning liquid falls freely and falls downwardly between the patterns of the glass substrate 20. The residues of are eliminated together.

In particular, the jig is applied with vibration for the vibrator, so that the residues remaining between the patterns formed on the glass substrate 20 by washing by the injection pressure of the cleaning liquid of the nozzle and vibration of the vibrator are easily dropped. In addition, the cleaning efficiency of the glass substrate 20 is improved.

Attaching step (S10), the nail polisher is completed by attaching and fixing the adhesive layer 30 to the main body 10, the glass substrate 20 has been cleaned through the cleaning step (S9).

The body 10 and the adhesive layer 30 are previously manufactured before the glass substrate 20 is manufactured.

On the other hand, the glass substrate having a pattern formed through the above-described method may be used as a nail polisher, and preferably, the final pattern formed on the glass substrate is cut out through a scribing device and joined to the base frame, thereby providing a perfect nail polisher. Use after completion.

Second Embodiment

The same reference numerals are used for the same components as those in the first embodiment, and detailed description thereof will be omitted.

In the glass substrate 20 of the second embodiment, as shown in FIG. 7, a single pattern 24 formed of only a square is formed.

In addition, the single-shaped pattern 24, as shown in Figure 8, the width (s) of the square is 100 ~ 250㎛, the interval (g) between the pattern is 80 ~ compared to the width (s) of the square It is preferable to form in 150% ratio.

In addition, the thickness t of the singular pattern 24 is formed to be 15 to 25㎛. In this case, if less than 15㎛ there is a problem that interferes with the polishing as it is easily filled by the foreign matter generated when the nail is polished, if it exceeds 25㎛ there is a problem of lowering the durability of the pattern.

That is, the first embodiment is a mixed pattern 22 in which circular and square shapes are mixed at a predetermined ratio with respect to a planar shape, and the second embodiment is a single pattern 24 having only a rectangular shape.

The comparative analysis was performed with respect to consumers for the mixed pattern (pattern 1) according to the first embodiment and the single pattern (pattern 2) according to the second embodiment.

As can be seen from the diagram above, the mixed pattern, that is, pattern 1 has a smaller roughness of the nail polish process than the existing circular pattern, and takes a short time to polish.

That is, in the case of the circular pattern, the time required for the gloss was about 100 to 150 seconds, and in the case of the pattern 1, the required time was shortened to about 50 to 70 seconds.

The pattern 2 has the smoothest roughness of the nail polish process than the existing circular pattern, and almost no dust, that is, the residue of the nail, the time required for the gloss is about 20 to 40 seconds, the time required to polish the shortest .

In addition, the pattern 1 has a gloss effect superior to that of the conventional round and pattern 2, the gloss effect is excellent.

In addition, the pattern 2 did not scratch the nail while the time required for gloss was shortest.

It is also a photograph that is actually demonstrated through patterns 1 and 2.

<Microscopic picture of pattern 1>

<Photo polished nail by pattern 1>

<Microscopic picture of pattern 2>

<Photo polished nail by pattern 2>

Third Embodiment

Like reference numerals refer to like elements throughout the first to second embodiments, and detailed descriptions thereof will be omitted.

As shown in FIG. 9, the glass substrate 20 of the third exemplary embodiment is provided with a single pattern 24 made of only a rhombus or a parallelogram.

That is, since the pattern 24 is formed in a straight shape, the gloss time for nail polish due to the enlarged contact area is shortened, so that convenience and efficiency of use are improved.

What has been described above is only one embodiment for performing a nail polisher having a pattern for improving gloss efficiency and a method for manufacturing the nail polisher, and the present invention is not limited to the above-described embodiment. Those skilled in the art will appreciate that various modifications can be made without departing from the spirit of the invention.

10: main body 20: substrate
22: pattern 24: single pattern
30: adhesive layer

Claims (5)

In the method of manufacturing a nail polisher, which is a kind of beauty device in which a pattern is formed on the glass to polish the surface of the hands and toenails,
A substrate preparation step (S1) for preparing a glass substrate made of glass having a transmittance of 60% or more and an exposure wavelength of 350 nm or more;
A metal film forming step (S2) of forming a metal film on the glass substrate by depositing a metal film having a thickness of 700 Å to 11,000 상 에 on the prepared glass substrate;
When the metal film is formed on the glass substrate, the cleaning step (S3) for pickling and alkali cleaning the glass substrate to easily remove the organic material on the surface of the metal film;
When the cleaning of the glass substrate is completed, the pattern film attaching step (S4) for attaching a pattern film (DFR, Dry Film Resist) pattern is formed on the metal film;
An exposure step (S5) of placing a glass substrate with a pattern film on the exposure machine and irradiating ultraviolet rays to the pattern film for 8 to 60 seconds;
After the exposure is completed, a development step of forming a primary pattern of a pattern film on a metal film by developing a pattern film using a developer having a sodium hydroxide (NaOH) or potassium hydroxide (KOH) series having a concentration of less than 10wt% (S6). Wow;
When the primary pattern is formed on the metal film, the metal film is etched using a metal film etching solution to form a secondary pattern made of a metal film on the glass substrate, and the primary film is cleaned and dried to remove the pattern film. Etching step (S7);
A second etching step (S8) of etching the glass substrate from which the pattern film is removed with hydrofluoric acid at a concentration of 20 to 30 wt% to form a glass substrate having the same pattern as the secondary pattern;
When the pattern is formed on the glass substrate, a cleaning process is performed to remove the etchant or other residues remaining on the pattern of the glass substrate, but after the primary cleaning by spraying sulfuric acid on the pattern formation surface of the glass substrate, A washing step (S9) of spraying a cleaning solution toward the lower side of the glass substrate while vibrating the glass substrate in a state in which the pattern formation surface of the glass substrate faces downward (S9); And
When the cleaning of the glass substrate is completed by attaching the glass substrate to the body through the adhesive layer formed on the main body to complete the nail polisher (S10); and
The pattern is any one of a mixed pattern formed by mixing a circle and a square or a polygon or a single pattern formed of only one of a rectangle or a polygon, the thickness of the pattern is a method of manufacturing a nail polisher, characterized in that 15 ~ 25㎛. The method of claim 1,
The mixed pattern is a method of manufacturing a nail polisher, characterized in that the mixture of the rectangular or polygonal shape in the proportion of 50 to 80%. It is produced by the method of Claim 1 or 2, The nail polisher which has a pattern which improves gloss efficiency. delete delete

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