KR101928107B1 - Liquid control apparatus - Google Patents

Abstract

An object of the present invention is to provide a liquid control device capable of accurately monitoring the liquid vaporization process while maintaining responsiveness in temperature control.
The liquid control device 10 controls the spreading and vaporization of the chemical liquid. The liquid control apparatus 10 includes a main body 31 having an upper surface 31c to which a chemical liquid is supplied, a mesh having a fine structure for promoting the spread of the chemical liquid, And a heater (80). The liquid control apparatus 10 includes a first temperature sensor 83 for detecting the temperature of the first portion inside the main body 31 between the supplied position and the heater 80 in the spreading direction of the upper surface 31c, A second temperature sensor 84 for detecting the temperature of the second portion inside the main body 31 on the side opposite to the first portion with the supply target position interposed therebetween; And a controller (70) for controlling the calorific value and executing a predetermined monitoring process based on the temperature of the second part.

Description

[0001] LIQUID CONTROL APPARATUS [0002]

The present invention relates to a liquid control apparatus for controlling spreading and vaporization of a liquid in contact with a surface.

In this kind of liquid control apparatus, fine irregularities are formed on the heat storage plate by arranging meshes on the upper surface of the heat storage plate (see, for example, Patent Document 1). According to the technique disclosed in Patent Document 1, since the liquid supplied to the space between the upper surface of the heat storage plate and the mesh is spread by the interfacial tension, the liquid can be supplied to a large area of the mesh. By heating the regenerating plate by the heater, the liquid on the upper surface of the regenerating plate can be vaporized.

In the apparatus disclosed in Patent Document 1, the temperature of the heat storage plate is detected by a thermocouple, and the temperature of the heat storage plate is feedback-controlled using the detected temperature. Further, a temperature change caused by vaporization of the liquid is detected by the thermocouple, and the process is confirmed to be normal.

Japanese Patent Application No. 4673449

However, in the apparatus disclosed in Patent Document 1, since the temperature near the heater is detected by the thermocouple, the detected temperature is liable to fluctuate in accordance with the change of the heating value of the heater. Therefore, there is a possibility that it is not possible to accurately determine whether or not the process is normal based on the temperature change detected by the thermocouple.

Here, it is also conceivable to arrange the thermocouple so as to detect the temperature of the portion of the heat storage plate remote from the heater, in order to suppress the fluctuation of the detected temperature due to the change in the calorific value of the heater. In this case, however, the responsiveness to the change in the calorific value of the heater and the response to the detected temperature is lowered, so that the responsiveness in controlling the temperature of the heat storage plate to the target temperature is lowered.

SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and its main object is to provide a liquid control device capable of accurately monitoring the liquid vaporization process while maintaining responsiveness in temperature control.

In order to solve the above problems, the present invention employs the following means.

The first means is a liquid control device for controlling spreading and vaporization of liquid, comprising: a main body having a surface to be supplied to which the liquid is supplied; and a promoting device having a microstructure for promoting spreading of the liquid supplied to the surface to be supplied A heater for heating the surface to be fed from the inside of the main body at a position away from a feed position where the liquid is supplied on the surface to be fed in a spreading direction of the surface to be fed; A first temperature sensor for detecting the temperature of the first portion inside the main body between the feed target position and the heater in the spreading direction of the feed target surface, A second temperature sensor for detecting the temperature of the second portion inside the main body on the side opposite to the first portion, And a monitoring unit for performing a predetermined monitoring process based on the temperature of the second portion detected by the second temperature sensor .

According to the above configuration, the promoter has a fine structure that promotes the spread of the liquid supplied to the surface to be fed. As a result, the liquid supplied to the surface to be fed spreads along the surface to be fed by the interfacial tension in the microstructure. The liquid spreading along the surface to be fed from the fed position where the liquid is supplied on the surface to be fed is heated from the inside of the body by the heater. Thereby, the liquid can be vaporized in a large area on the surface to be fed.

Here, the temperature of the first portion inside the main body is detected by the first temperature sensor between the supplied position and the heater in the spreading direction of the surface to be fed. Since the first portion is located closer to the heater than the fed position in the spread direction of the surface to be fed, the change in the heating value of the heater is quickly reflected. The control unit controls the amount of heat generated by the heater based on the temperature of the first portion detected by the first temperature sensor. This makes it possible to maintain the responsiveness when the temperature of the main body is controlled by the heater.

The temperature of the second portion inside the main body is detected by the second temperature sensor on the side opposite to the first portion with the supplied position in the spreading direction of the surface to be supplied. The second portion is located at a position away from the heater with respect to the feed position in the spread direction of the feed face. As a result, the temperature of the second portion is hardly influenced by the change in the calorific value of the heater, and accurately reflects the vaporization state of the liquid. Then, the monitoring unit performs a predetermined monitoring process based on the temperature of the second part detected by the second temperature sensor. Therefore, the liquid vaporization process can be accurately monitored. The predetermined monitoring process may include a process of displaying the temperature of the second portion on a monitor (display portion), a process of detecting or notifying an abnormality based on the temperature of the second portion, and the like.

In the second means, the first portion and the second portion are portions in the vicinity of the supplied surface in the main body in a direction perpendicular to the surface to be fed.

According to the above configuration, the temperature of the first portion (the first portion near the surface to be fed in the interior of the body) near the surface to be fed in the main body in the direction perpendicular to the surface to be fed . This makes it possible to accurately detect the temperature of the surface to be supplied, which is in contact with the liquid, and more precisely to control the temperature of the surface to be supplied. Further, the second temperature sensor detects the temperature of the second portion (the second portion near the surface to be fed in the main body) near the surface to be fed in the main body in the direction perpendicular to the surface to be fed. This makes it possible to accurately detect the temperature change due to vaporization of the liquid on the surface to be fed, and more precisely to monitor the vaporization state of the liquid on the surface to be fed. The temperature change due to the vaporization of the liquid on the surface to be fed includes a decrease in temperature due to the heat of vaporization of the liquid and a rise in temperature after vaporization of the liquid due to the heating of the heater.

The third means includes a display unit for displaying an image, and the monitoring unit causes the display unit to display the temperature transition of the second portion detected by the second temperature sensor as the monitoring process.

According to the above configuration, the temperature change of the second portion detected by the second temperature sensor is displayed on the display portion. Thus, the user can observe the temperature change of the second portion displayed on the display unit, and judge whether or not the liquid vaporization process is normal.

In the fourth means, the monitoring unit detects abnormality based on the temperature of the second portion detected by the second temperature sensor as the monitoring process.

As described above, the temperature of the second portion accurately reflects the vaporization state of the liquid. In this respect, according to the above configuration, the abnormality is detected on the basis of the temperature of the second portion detected by the second temperature sensor, so that the abnormality of the liquid vaporization process can be appropriately detected.

In the fifth means, when the temperature of the second portion detected by the second temperature sensor is lowered beyond the determination temperature width while the heating amount of the heater is being controlled by the control unit , It is detected that an abnormality occurs in the heating by the heater.

In a state where the heating value of the heater is controlled by the control unit, the liquid supplied to the surface to be supplied is heated by the heater and vaporized. As a result, the temperature of the second portion rises by the heat of the heater after being lowered by vaporization of the liquid. However, in the case where an abnormality occurs in heating by the heater, for example, when the power supply of the heater is turned off, the liquid supplied to the surface to be supplied is not heated by the heater, It is lower than normal time.

In this regard, according to the above configuration, when the temperature of the second portion detected by the second temperature sensor is lowered beyond the determination temperature width while the heating amount of the heater is controlled by the control unit, It is detected that an abnormality occurs in the heating by the heater. Therefore, it can be detected that the heating by the heater is not performed properly. In the above case, the monitoring unit may detect that the liquid is supplied to the surface to be supplied. That is, even when an abnormality occurs in the heating by the heater, in a state in which the chemical liquid is supplied to the surface to be supplied, the chemical liquid is volatilized and the temperature of the second part is lowered.

In the sixth means, the monitoring unit detects vaporization of the liquid based on the temperature of the second portion detected by the second temperature sensor as the monitoring process.

As described above, the temperature of the second portion accurately reflects the vaporization state of the liquid. In this respect, according to the above configuration, vaporization of the liquid is detected based on the temperature of the second portion detected by the second temperature sensor, so that it is possible to accurately detect that the liquid has vaporized on the surface to be supplied.

In the seventh aspect, the monitoring unit may be configured such that, in a state where the temperature of the second part detected by the second temperature sensor is maintained at a predetermined temperature, the temperature of the second part detected by the second temperature sensor is And when it is maintained up to the predetermined temperature after the temperature is lowered, the supply and vaporization of the liquid is detected.

The first portion is easily influenced by a change in the calorific value of the heater while the second portion is hardly influenced by the change in the calorific value of the heater. Therefore, when the amount of heat generated by the heater is increased to compensate for the decrease in the temperature of the first portion due to the supply of the liquid, the temperature of the first portion is likely to overshoot the predetermined temperature, It is difficult to overshoot the predetermined temperature.

In this regard, according to the above configuration, in the state where the temperature of the second portion detected by the second temperature sensor is maintained at the predetermined temperature, after the temperature of the second portion detected by the second temperature sensor is lowered In the case where the temperature is raised and maintained to the predetermined temperature, supply of liquid and vaporization are detected. Therefore, it can be accurately detected that the liquid is supplied to the supplied position and that the supplied liquid is vaporized.

In the eighth means, when the temperature of the first portion detected by the first temperature sensor is lowered beyond the determination temperature width while the heating amount of the heater is being controlled by the control portion , It is detected that an abnormality occurs in the heating by the heater.

When an abnormality occurs in the heating by the heater, the liquid supplied to the surface to be supplied is not heated by the heater, and the temperature of the first portion is lower than the normal time.

In this regard, according to the above configuration, when the temperature of the first portion detected by the first temperature sensor is lowered beyond the determination temperature width while the heating amount of the heater is being controlled by the control unit, It is detected that an abnormality occurs in the heating by the heater. Therefore, it can be detected that the heating by the heater is not performed properly. In the above case, the monitoring unit may detect that the liquid is supplied to the surface to be supplied.

In the ninth aspect, the promoting unit is a net-shaped body that is woven in a mesh-like shape so as to be in contact with the surface to be supplied, and has an inductive member abutting the net-shaped body with the body and the net-shaped body interposed therebetween.

According to the above-described configuration, a mesh-like body is used which is woven in a mesh-like shape as a promoter and is brought into contact with the surface to be supplied. As a result, a plurality of interfaces are formed between the surface to be fed and the mesh-like body, and the liquid supplied to the surface to be fed spreads along the surface to be fed by the interfacial tension at the plurality of interfaces.

Here, since the guide member contacting the net-like body is provided between the body and the net-shaped body, a plurality of interfaces are also formed between the net-shaped body and the guide member. Therefore, even between the net-shaped body and the guide member, the liquid can be spread by the interfacial tension. As a result, the spread of the liquid can be promoted in the portion provided with the guide member as compared with the other portions. As a result, by adjusting the arrangement of the guide members, it is possible to preferentially spread the liquid in contact with the surface to be fed in a desired direction.

In the tenth means, the guide member is formed by being woven in a mesh shape.

According to the above configuration, since the guide member is formed by weaving in a mesh-like shape, evaporation of liquid through the guide member can be promoted as compared with the case where the guide member is formed in a plate shape or a film shape. Thus, evaporation of the liquid can be promoted while allowing the liquid in contact with the surface to be fed to spread preferentially in a desired direction.

In the eleventh means, a liquid flow path for flowing the liquid is formed in the inside of the body, the liquid flow path opens at the surface to be fed and forms a supply port for the liquid, And the guiding member has a portion corresponding to the first portion of the surface to be supplied and a portion corresponding to the second portion of the surface to be supplied, And the supply port.

According to the above configuration, the liquid flow path for flowing the liquid is formed in the main body, and the opening on the surface to be fed of the liquid flow path forms the liquid supply port. Therefore, the space inside the main body can be effectively used, and the liquid can be supplied to the surface to be fed. The position to which the liquid is supplied to the surface to be fed through the supply port may be adopted as the supplied position.

Further, the portion corresponding to the first portion of the surface to be fed, the portion corresponding to the second portion of the surface to be fed, and the supply port are covered with the net-shaped body and the guide member. This allows the liquid supplied from the supply port to preferentially spread in the direction of the first part and the direction of the second part in the spreading direction of the surface to be fed. Therefore, the amount of heat generated by the heater can be controlled based on the temperature of the first portion while sufficiently supplying the liquid to the portion corresponding to the first portion of the surface to be fed. As a result, in a state where the liquid is stably supplied, the vaporization state of the liquid can be controlled. It is also possible to perform a predetermined monitoring process based on the temperature of the second portion while sufficiently supplying the liquid to the portion corresponding to the second portion of the surface to be fed. As a result, in a state in which the liquid is stably supplied, the vaporization process of the liquid can be monitored.

In the twelfth aspect, a groove for suppressing spreading of the liquid toward the opposite side to the fed position is provided on the surface to be fed, with the second portion interposed therebetween in the spread direction of the surface to be fed.

The liquid supplied to the surface to be fed of the main body is spread by the interfacial tension in the microstructure of the promoting portion. On the other hand, when grooves are formed on the surface to be fed, no interface is formed on the surface to be fed in the groove, and spread of the liquid is suppressed.

Therefore, according to the above configuration, the groove provided on the surface to be fed suppresses the spread of the liquid on the side opposite to the feed position, with the second portion interposed therebetween in the spreading direction of the surface to be fed. By suppressing the spread of the liquid to the opposite side to the fed position with the second portion interposed therebetween, the supply of the liquid to the portion corresponding to the second portion of the fed surface can be promoted. As a result, it is possible to monitor the vaporization process of the liquid in a state in which liquid is stably supplied.

In the thirteenth means, a first gas flow channel and a second gas flow channel are formed in the body so as to flow the gas, the first gas flow channel is opened at the surface to be fed to form an introduction port of the gas, The second gas flow path opens at the surface to be supplied to form an outlet of the base body, and the inlet and the outlet are formed with the heater interposed therebetween.

According to the above arrangement, the first gas flow path and the second gas flow path are formed in the body, and the openings in the surfaces to be supplied to the first gas flow path and the second gas flow path, Thereby forming an outlet. As a result, the space inside the main body can be effectively used to introduce the gas into the space around the surface to be fed and to discharge the gas from the peripheral space on the surface to be fed. At this time, the liquid in contact with the surface to be fed promotes spreading of the gas in the flow direction. Since the inlet and outlet of the gas are formed with the heater interposed therebetween, the spread of the liquid in the direction passing through the heater can be promoted. As a result, heating of the liquid by the heater can be promoted.

In the fourteenth aspect, the main body is disposed such that the surface to be fed is on the upper side, and the second gas flow path is formed with a concave portion that is concave downward than the second gas flow path.

According to the above configuration, the main body is disposed such that the surface to be fed is on the upper side, and the second gas flow path is formed with a recess that is concave downward relative to the second gas flow path. As a result, the liquid which has flowed into the second gas flow path is stored in the recess formed in the second gas flow path, so that it is less likely to flow forward than the recessed portion. Therefore, it is possible to suppress the liquid from being discharged through the second gas flow path without being vaporized. Further, the liquid stored in the concave portion can be vaporized by the heat of the heater.

The fifteenth means includes a third temperature sensor for detecting the temperature of a third portion in the vicinity of the recess in the main body, wherein the monitoring portion detects the temperature of the third portion detected by the third temperature sensor Detects that the liquid has flowed into the second gas flow passage when the temperature of the liquid drops below the determination temperature range.

When the liquid is stored in the concave portion, the liquid in the concave portion is vaporized, so that the temperature in the vicinity of the concave portion is lowered.

In this respect, according to the above configuration, the temperature of the third portion in the vicinity of the concave portion inside the main body is detected by the third temperature sensor. When the temperature of the third portion detected by the third temperature sensor is lowered beyond the determination temperature width by the monitoring portion, it is detected that the liquid has flowed into the second gas flow path. Therefore, it is possible to suitably detect that the liquid has flowed into the second gas flow path, and the treatment such as stopping the supply of the liquid can be performed.

In the sixteenth means, the main body is arranged such that the surface to be fed is on the upper side, and in the spreading direction of the surface to be fed, a liquid-collecting groove is provided between the to-be-fed position and the discharge port.

According to the above arrangement, since the liquid collecting grooves are provided between the liquid supply position and the discharge port in the spreading direction of the surface to be fed, the liquid supplied to the liquid supply position easily flows into the liquid collection grooves ahead of the discharge port. Therefore, the liquid can be prevented from flowing into the second gas flow passage through the discharge port.

In the seventeenth means, the height of the opening face of the discharge port is higher than the height of the opening face of the liquid collecting groove.

According to the above configuration, since the height of the opening surface of the discharge port is higher than the height of the opening surface of the liquid collection groove, the liquid on the surface to be supplied is preferentially introduced into the liquid collection groove rather than the discharge port. Therefore, the liquid can be further prevented from flowing into the second gas passage through the discharge port.

The 18th means includes a third temperature sensor for detecting the temperature of the third lower portion of the liquid collection groove in the main body, wherein the monitoring portion detects the temperature of the third portion detected by the third temperature sensor And the liquid is introduced into the liquid collection groove when the temperature of the liquid drops below the determination temperature range.

According to the above arrangement, it is possible to appropriately detect that the liquid has flowed into the liquid collecting groove in the same manner as in the fifteenth means, and to perform treatment such as stopping the supply of the liquid.

1 is a view showing a liquid control device;
2 is a view showing a liquid control device;
3 is a perspective view showing a liquid vaporizer;
4 is a perspective view showing the body of the liquid vaporizer;
5 is an exploded perspective view of a liquid vaporizer;
6 is an enlarged plan view of the mesh;
7 is an enlarged cross-sectional view of the upper surface of the main body and the mesh.
8 is an enlarged cross-sectional view of the upper surface of the main body and the mesh.
9 is an enlarged cross-sectional view of an upper surface of the main body, a mesh and a mesh band.
10 is an enlarged cross-sectional view of the upper surface of the main body, the mesh and the shielding member.
11 is a graph showing the relationship between a single pump operation and the temperatures of the first and second portions.
12 is a graph showing the relationship between the operation of the continuous pump and the temperatures of the first part and the second part.
13 is a graph showing the relationship between the periodic pump operation and the temperatures of the first and second portions.
14 is a perspective view showing a modified example of the liquid vaporizer main body.
15 is a perspective view showing another modification of the liquid vaporizer main body;
16 is a perspective view showing another modification of the liquid vaporizer main body;
17 is a perspective view showing a modified example around the second gas flow path.

Hereinafter, one embodiment will be described with reference to the drawings. This embodiment is embodied as a liquid control device that causes liquid to spread and vaporize and mixes with an inert gas and is discharged.

1 (a) is a plan view showing the liquid control apparatus 10, and FIG. 1 (b) is a sectional view taken along line 1B-1B of FIG. 1 (a). As shown in the figure, the liquid control apparatus 10 includes a first housing 11, a second housing 20, a liquid vaporizer 30, a valve device 60, a heater 80, a temperature sensor 83 84, a controller 70, a monitor 71, and the like.

The first housing 11 is formed in a hollow rectangular parallelepiped shape, and a columnar space S having a bottom oval shape is formed therein. The columnar space S is opened on the side surface 11a of the first housing 11 by an elliptical opening 12. In the lower surface 11b of the first housing 11, an insertion hole 13 for inserting the valve device 60 is formed. On the upper surface 11c of the first housing 11, an attachment hole 15 for attaching the glass plate 14 is formed.

In the columnar space S, the liquid vaporizer 30 is inserted from the opening 12. A valve device 60 is inserted into the insertion hole 13. The first housing 11 and the valve device 60 are sealed by a seal member. A glass plate 14 is attached to the attachment hole 15 by a fastening member. The space between the first housing 11 and the glass plate 14 is sealed by a seal member. The user can observe the inside of the first housing 11 from above through the glass plate 14. [

2 (a) is a side view of the second housing 20 viewed from the line 2A-2A in Fig. 2 (a), the second housing 20 is formed in a rectangular parallelepiped shape and is attached to the side surface 11a of the first housing 11. As shown in Fig. The space between the first housing 11 and the second housing 20 is sealed by a seal member. In the second housing 20, a surface opposed to the side surface 11a of the first housing 11 is a side surface 20b. The second housing 20 has a first gas flow passage 21, a second gas flow passage 22, a chemical liquid flow passage 23, a heater insertion hole 24 and temperature sensor insertion holes 25a and 25b.

The first gas flow path 21 penetrates the second housing 20 from the side surface 20b to the upper surface 20a. The second gas flow passage 22 penetrates from the side face 20b to the side face 20c opposite to the side face 20b. The first gas flow path 21 and the second gas flow path 22 are provided at positions near both ends in the longitudinal direction of the upper surface 20a. The chemical liquid flow path 23 (liquid flow path) penetrates from the side surface 20b to the side surface 20c at approximately the center of the side surface 20b and the side surface 20c. The heater insertion hole 24 penetrates from the side surface 20b to the side surface 20c between the second gas flow path 22 and the chemical liquid flow path 23. [ The temperature sensor insertion hole 25a penetrates from the side surface 20b to the side surface 20c between the chemical liquid flow path 23 and the heater insertion hole 24. [ The temperature sensor insertion hole 25b penetrates from the side surface 20b to the side surface 20c between the chemical liquid flow path 23 and the first gas flow path 21. [

A first block 26, a second block 27, and a chemical liquid block 28 are attached to the second housing 20 by fastening members or the like.

The first block 26 is attached to the upper surface 20a of the second housing 20. In the first block 26, a first block flow passage 26a penetrating from the lower surface to the upper surface is formed. One end of the first block flow path (26a) is connected to the first gas flow path (21). A first gas pipe 26b is connected to the other end of the first block flow path 26a. And gas is introduced into the first block 26 from the first gas pipe 26b.

The second block 27 is attached to the side 20c of the second housing 20. The second block 27 is provided with a second block flow passage 27a penetrating from its side face to the upper face. One end of the second block flow path 27a is connected to the second gas flow path 22. A second gas pipe 27b is connected to the other end of the second block flow path 27a. Then, the gas is discharged from the second block 27 to the second gas pipe 27b.

The chemical solution block 28 is attached to the side surface 20c of the second housing 20. In the chemical liquid block 28, a chemical liquid flow path 28a penetrating from the side surface to the bottom surface is formed. One end of the chemical liquid flow path 28a is connected to the chemical liquid flow path 23. A chemical liquid pipe 28b is connected to the other end of the chemical liquid flow path 28a. The chemical liquid is introduced from the chemical liquid pipe 28b into the chemical liquid block 28 by driving the pump (not shown). The pump discharges a predetermined amount of the chemical solution by driving once, and the driving of the pump is controlled by the controller (70).

2 (b) and 2 (c) are sectional views taken along line 2B-2B and 2c-2c, respectively, of FIG. Referring to FIGS. 2 (b) and 2 (c), the liquid vaporizer 30 has a main body 31.

The main body 31 is formed in a column shape of a bottom oval in correspondence with the columnar space S, and is formed to be smaller than the columnar space S. As described above, the liquid vaporizer 30 is inserted into the columnar space S of the first housing 11 from the opening 12. The liquid vaporizer 30 is attached to the side surface 20b of the second housing 20 using a fastening member in the through hole B formed in the main body 31. [ Thus, an elliptical cylindrical gap is formed between the inner circumferential surface of the first housing 11 and the main body 31. In the main body 31, a surface opposed to the side surface 20b of the second housing 20 is a side surface 31b.

The main body 31 is provided with a first gas flow path 33, a second gas flow path 34, a chemical liquid flow path 35, a heater insertion hole 36, temperature sensor insertion holes 37a and 37b, Respectively.

The first gas flow path 33 penetrates the main body 31 from its side surface to the upper surface. One end of the first gas flow path (33) is connected to the first gas flow path (21). The other end of the first gas flow path 33 is connected to the upper surface 31c of the main body 31 in the direction from the second housing 20 to the first housing 11 (the shorter direction of the upper surface 31c of the main body 31) And is opened at approximately the center of the opening 31c.

The second gas flow path (34) penetrates the main body (31) from its side face to the upper face. One end of the second gas flow path (34) is connected to the second gas flow path (22). The other end of the second gas flow path 34 is opened substantially at the center of the upper surface 31c of the main body 31 in the short direction of the upper surface 31c of the main body 31. [ The first gas flow path 33 and the second gas flow path 34 are provided at positions near both ends in the longitudinal direction of the upper surface 31c. The first gas flow path 33 and the second gas flow path 34 are arranged parallel to each other.

The chemical liquid flow path 35 (liquid flow path) penetrates the main body 31 from the side surface 31b to the upper surface 31c. One end of the chemical liquid flow path (35) is connected to the chemical liquid flow path (23). The other end of the chemical liquid flow path 35 is opened substantially at the center of the upper surface 31c of the main body 31 in the short direction of the upper surface 31c of the main body 31. [

The heater insertion hole 36 is connected to the heater insertion hole 24 and extends from the side surface 31b to the vicinity of the side surface 31d on the opposite side. The heater 80 is inserted into the heater insertion holes 24 and 36 so that the top surface 31c is heated by the heater 80. [

The temperature sensor insertion hole 37a is connected to the temperature sensor insertion hole 25a and extends to the substantially center of the main body 31 in the short direction of the upper surface 31c of the main body 31. [ The temperature sensor insertion hole 37a is formed in the vicinity of the upper surface 31c of the main body 31 (in the vicinity of the upper surface 31c inside the main body 31 in a direction perpendicular to the upper surface 31c). The first temperature sensor 83 is inserted into the temperature sensor insertion holes 25a and 37a and the temperature in the vicinity of the top surface 31c (first portion) is detected by the first temperature sensor 83. [ The first temperature sensor 83 is formed of a resistance thermometer or the like using platinum.

The temperature sensor insertion hole 37b is connected to the temperature sensor insertion hole 25b and extends to the substantially center of the main body 31 in the short direction of the upper surface 31c of the main body 31. [ The temperature sensor insertion hole 37b is formed in the vicinity of the upper surface 31c of the main body 31 (in the vicinity of the upper surface 31c inside the main body 31 in a direction perpendicular to the upper surface 31c). The second temperature sensor 84 is inserted into the temperature sensor insertion holes 25b and 37b and the temperature in the vicinity of the upper surface 31c (second portion) is detected by the second temperature sensor 84. [ That is, the second temperature sensor 84 detects the temperature of the inside of the main body 31 from the opposite side of the first part with the chemical liquid flow path 35 (supply port 35a) in the spreading direction of the upper surface 31c, Lt; / RTI > is detected. The second temperature sensor 84 is constituted by a temperature-measuring resistor or the like using platinum.

The heater 80 and the temperature sensors 83 and 84 are connected to the controller 70 (see Fig. 1). The controller 70 includes a CPU, a storage device, an input / output circuit, and the like. The detected temperatures of the temperature sensors 83 and 84 are input to the controller 70. [ The controller 70 (control unit) controls the amount of heat generated by the heater 80 based on the temperature of the first part detected by the first temperature sensor 83. [ Based on the temperature of the first part and the temperature of the second part respectively detected by the first temperature sensor 83 and the second temperature sensor 84, the controller 70 (monitoring part) Quot;

The monitor (71) is connected to the controller (70). The monitor 71 (display portion) displays an image on the basis of the output from the controller 70. The controller 70 monitors the temperature of the first portion and the temperature of the second portion detected by the first temperature sensor 83 and the second temperature sensor 84, respectively, . Specifically, the temperature of the first part and the temperature change of the second part with respect to time are displayed on the monitor 71 as a graph.

In the main body 31, a recessed portion 38 is formed at a position facing the insertion hole 13 of the first housing 11. A valve device 60 is inserted into the insertion hole 13 and the recessed portion 38 and a valve device 60 is attached to the main body 31 by a fastening member or the like. The body 31 and the valve device 60 are sealed by a seal member. The concave portion (38) communicates with the chemical liquid flow path (35). A valve seat 39 is provided at a communicating portion between the chemical liquid flow path 35 and the recessed portion 38. The main body 31 has an operating gas flow path 40 formed therein. The working gas flow path 40 extends from the side surface 11d of the first housing 11 to the approximate center of the first housing 11 in the longitudinal direction of the upper surface 11c of the first housing 11, 11c so as to communicate with the insertion hole 13. As shown in Fig. The controller 70 controls the introduction and discharge of the working gas into the working gas flow path 40.

The valve device 60 includes a main body 61, a piston 62, a diaphragm valve body 63, a spring 64, a spring retainer 65, and the like.

The main body 61 is formed in a cylindrical shape, and a piston 62 is accommodated therein. The main body 61 and the piston 62 have their center axes aligned with each other.

The piston (62) is supported by the main body (61) so as to be slidable in the central axial direction. Between the main body 61 and the first housing 11 and between the main body 61 and the main body 31 of the liquid vaporizer 30 and between the main body 61 and the piston 62, .

A valve body 63a of the diaphragm valve body 63 is attached to the distal end of the piston 62. [ The outer edge of the diaphragm 63b of the diaphragm valve body 63 is supported by the main body 351 and the main body 61 of the liquid vaporizer 30.

One end of the spring 64 is in contact with the piston 62, and the other end is supported by a spring retainer 65. The piston (62) is urged by the spring (64) in the direction of the valve seat (39). Thereby, in the natural state, the valve body 63a of the diaphragm valve body 63 is pressed against the valve seat 39, and the chemical liquid flow path 35 is blocked.

An operating gas flow path 66 is formed in the main body 61. One end of the working gas flow path (66) is connected to the working gas flow path (40) of the first housing (11). The other end of the working gas flow path 66 communicates with the pressing chamber 67 on the opposite side of the spring 64 with the flange portion 62a of the piston 62 interposed therebetween in the main body 61. Then, the working gas is introduced through the working gas flow passages 40 and 66, so that the piston 62 moves in a direction away from the valve seat 39. Thereby, the chemical liquid flow path 35 is communicated, and the chemical liquid is supplied to the upper surface 31c of the main body 31 of the liquid vaporizer 30.

Next, the configuration of the liquid vaporizer 30 will be described in detail. Fig. 3 is a perspective view showing the liquid vaporizer 30, and Fig. 4 is a perspective view showing the main body 31 of the liquid vaporizer 30. Fig. As shown in the figure, the liquid vaporizer 30 includes a main body 31, a mesh 47, a first shielding member 50, a mesh band 52, mesh holders 55a and 55b, 56). The main body 31 is made of a material having a relatively high corrosion resistance against a chemical liquid and a relatively high wettability of the chemical liquid, for example, a stainless steel material or an aluminum material when the chemical liquid is a hydrophobic treatment liquid.

The first gas passage 33 is opened on the upper surface 31c of the main body 31, and a gas inlet 33a is formed. On the upper surface 31c of the main body 31, the second gas passage 34 is opened, and a gas outlet 34a is formed. The chemical liquid flow path 35 is opened on the upper surface 31c (supply surface) of the main body 31, and a chemical liquid supply port 35a is formed. That is, the position where the chemical liquid is supplied to the upper surface 31c through the supply port 35a is the supply position where the chemical liquid is supplied to the upper surface 31c.

The inlet 33a and the outlet 34a are connected to the supply port 35a, the temperature sensor insertion holes 37a and 37b (the temperature sensors 83 and 84), and the heater insertion hole 36 (the heater 80) Respectively. A supply port 35a and temperature sensor insertion holes 37a and 37b and a heater insertion hole 36 are provided between the inlet 33a and the outlet 34a in the spreading direction of the upper surface 31c . The supply port 35a is provided between the introduction port 33a and the discharge port 34a and more specifically between the introduction port 33a and the discharge port 34a in the vicinity of the introduction port 33a.

The supply port 35a is provided between the introduction port 33a and the temperature sensor insertion hole 37a and the heater insertion hole 36 in the spreading direction of the upper surface 31c. That is, the supply port 35a is provided closer to the inlet port 33a than the temperature sensor insertion hole 37a and the heater insertion hole 36. [ On the other hand, the supply port 35a is provided closer to the discharge port 34a than the temperature sensor insertion hole 37b.

The temperature sensor insertion hole 37a and the heater insertion hole 36 are provided between the supply port 35a and the discharge port 34a in the spreading direction of the upper surface 31c. That is, the temperature sensor insertion hole 37a and the heater insertion hole 36 are provided closer to the discharge port 34a than the supply port 35a. More specifically, the temperature sensor insertion hole 37a is provided on the side of the supply port 35a with respect to the heater insertion hole 36 in the spreading direction of the upper surface 31c. On the other hand, the temperature sensor insertion hole 37b is provided closer to the inlet port 33a than the supply port 35a.

The discharge port 34a is formed larger than the introduction port 33a. More specifically, in the direction perpendicular to the direction from the introduction port 33a to the discharge port 34a (the short direction of the upper surface 31c) in the upper surface 31c, the discharge port 34a is positioned at a position It is extended long.

A liquid collecting groove 34b communicating with (connected to) the discharge port 34a is formed on the upper surface 31c of the main body 31. [ In the short direction of the upper surface 31c, the liquid collection grooves 34b (second grooves) extend from both ends of the discharge port 34a. The liquid collecting grooves 34b are provided over the entire length in the short direction of the upper surface 31c. That is, the liquid collecting grooves 34b extend on the upper surface 31c in a direction substantially perpendicular to the direction from the supply port 35a (the inlet port 33a) to the discharge port 34a. The liquid collecting grooves 34b extend in the direction from the discharge port 34a to the inlet port 33a (the longitudinal direction of the upper surface 31c) and then extend in the direction substantially perpendicular to the direction from the supply port 35a to the discharge port 34a An extension portion 34c extending to the outer edge of the upper surface 31c is provided. The width of the liquid collection groove 34b is formed to be slightly narrower than the width of the discharge port 34a in the direction from the introduction port 33a to the discharge port 34a. The depth of the liquid collecting groove 34b is set to a depth that allows the liquid flowing in the direction of the discharge port 34a from the supply port 35a to collect into the discharge port 34a along the liquid collecting groove 34b, , And is preferably set to 1.0 mm. The width of the liquid collecting groove 34b is set to, for example, 1.0 to 2.0 mm, preferably 1.5 mm.

The second gas flow path 34 is formed with a recess 34d recessed downward from the second gas flow path 34. The concave portion 34d is formed in the second gas flow path 34 below the discharge port 34a.

The body 31 has a temperature sensor insertion hole 37c formed therein. The temperature sensor insertion hole 37c is connected to a temperature sensor insertion hole (not shown) formed in the first housing 11. The temperature sensor insertion hole 37c extends in the short direction of the upper surface 31c of the main body 31 to the vicinity of the recess 34d Extended. The temperature sensor insertion hole 37c is formed in the vicinity of the lower surface 31e of the main body 31 (in the vicinity of the lower surface 31e inside the main body 31 in the direction perpendicular to the upper surface 31c). The third temperature sensor 85 is inserted into the temperature sensor insertion hole 37c and the third temperature sensor 85 detects the temperature in the vicinity of the concave portion 34d do. The third temperature sensor 85 is constituted by a resistance thermometer or the like using platinum. Further, the temperature of the lower portion (third portion) of the concave portion 34d may be detected by the third temperature sensor 85. [

The upper surface 31c of the main body 31 is provided with a supply port 35a on the side opposite to the heater insertion hole 36 (heater 80) and on the opposite side of the temperature sensor insertion hole 37a (first temperature sensor 83) (First groove) for suppressing the spreading of the chemical liquid in the first space. The restricting groove 41 suppresses the spread of the chemical solution on the opposite side of the supply port 35a (supply position) with the second portion interposed in the spreading direction of the upper surface 31c. The restraining groove 41 has a circular arc portion 41a and a straight line portion 41c.

The arc portion 41a is formed as a circular arc of a semicircle and surrounds the periphery of the supply port 35a except for the heater insertion hole 36 side and the temperature sensor insertion hole 37a side. That is, the circular arc portion 41a surrounds the half circumference on the side of the introduction port 33a of the supply port 35a (the half circumference opposite to the discharge port 34a).

The restricting grooves 41 are formed on the outlet 34a, the supply port 35a, the temperature sensor insertion holes 37a and 37b (the temperature sensors 83 and 84), and the heater insertion hole 36 (the heater 80) And has the same positional relationship as that of the introduction port 33a. A supply port 35a and temperature sensor insertion holes 37a and 37b and a heater insertion hole 36 are provided between the restricting groove 41 and the discharge port 34a in the spreading direction of the upper surface 31c . The supply port 35a is provided between the suppressing groove 41 and the temperature sensor insertion hole 37a and the heater insertion hole 36 in the spreading direction of the upper surface 31c.

The straight portion 41c extends from the end portion of the circular arc portion 41a to the outside of the upper surface 31c in the short direction of the upper surface 31c. The length of the straight portion 41c is shorter than the radius of the circular arc portion 41a. The straight portion 41c extends to the end portion in the longitudinal direction of the upper surface 31c. The width and depth of the restraining groove 41 are set in the same manner as the width and the depth of the liquid collecting groove 34b.

A concave portion 42 is provided on the upper surface 31c at the side of the central portion of the circular arc portion 41a (groove), specifically, on the side opposite to the supply port 35a. The concave portion 42 is formed in a substantially circular shape and communicates with the circular arc portion 41a of the restricting groove 41. The main body 31 (the liquid vaporizer 30) is arranged such that the surface to be fed with the supply port 35a is the upper surface 31c. The introduction port 33a is formed at the approximate center of the recess 42, that is, at a position shifted from the restricting groove 41. The introduction port 33a, the supply port 35a and the discharge port 34a are arranged on the same straight line.

The lower surface 31e of the main body 31 is formed with engaging grooves 45 for engaging the mesh pressers 55a and 55b and the fixing member 56 at both ends in the longitudinal direction thereof. The engaging groove 45 is formed to extend along the shorter side of the lower surface 31e with a predetermined width and depth.

The mesh pressers 55a and 55b are formed in the shape of a bar having an L-shaped cross section. The fixing member 56 is formed in the shape of a bar having a cross-section " T " The lengths of the mesh pressers 55a and 55b and the fixing member 56 are equal to the length of the lower surface 31e in the short direction.

The width and depth of the engaging groove 45 are set so that they are fixed when the first mesh presser 55a, the second mesh presser 55b and the fixing member 56 are assembled in this order. The fixing member 56 may be configured as a fastening member for fastening the second mesh presser 55b to the main body 31. [

A concave portion 44 is formed on the curved surface 31f of the main body 31 so as to extend linearly in the short direction of the upper surface 31c.

On the outer periphery of the main body 31, a mesh 47 (net-like body) woven in a mesh shape is provided so as to be in contact with the upper surface 31c and the curved surface 31f. Therefore, the concave portion 42, the inlet 33a, the suppressing groove 41, the outlet 34a, and the liquid collecting groove 34b are provided on the upper surface 31c in contact with the mesh 47.

The mesh 47 is formed in a rectangular shape and is sized to cover the upper surface 31c and the curved surface 31f. More specifically, the length in the short direction of the upper surface 31c is equal to the length in the shorter direction of the mesh 47, so that the length in the longitudinal direction of the upper surface 31c and the length in the outer circumference of the curved surface 31f are matched , The length of the mesh 47 in the longitudinal direction is long.

A mesh 47 is wound on the upper surface 31c and the two curved surfaces 31f. As a result, the introduction port 33a, the supply port 35a, the restricting groove 41, the liquid collecting grooves 34b and the discharge port 34a are covered with the mesh 47. The mesh 47 covers a portion of the upper surface 31c corresponding to the first portion and a portion of the upper surface 31c corresponding to the second portion.

The shape of the mesh (47) nose is formed in the opening of the mesh (47) so that the chemical solution can easily be formed into a film, for example, 300 meshes with 300 mesh per inch. Specifically, in the mesh 47, the line diameter is 0.03 mm and the line-to-line distance (line-to-line distance) is 0.054 mm. It is preferable to set the mesh 47 appropriately according to the wettability of the chemical liquid to the mesh 47, the wettability of the chemical liquid to the main body 31, the viscosity of the chemical liquid, and the like. Further, the formation of the mesh 47 may be set according to the result of testing the spreading state of the chemical liquid. The widths of the restricting grooves 41 and the liquid collecting grooves 34b are set to 16 times or more the line distance of the meshes 47 and the depths of the restricting grooves 41 and the liquid collecting grooves 34b Of the wire diameter. The mesh 47 is formed of a material having a relatively high corrosion resistance against a chemical liquid and a relatively high wettability of the chemical liquid, for example, a stainless steel material when the chemical liquid is a hydrophobic treatment liquid.

A first shielding member 50 is provided at a position corresponding to the supply port 35a so as to cover the supply port 35a. Specifically, the first shielding member 50 (shielding member, guide member) covers only the supply port 35a and its vicinity, and is surrounded by the arc portion 41a of the restricting groove 41. [ The first shielding member 50 is provided on the outer side of the mesh 47 and is in contact with the mesh 47. The first shielding member 50 is in contact with the mesh 47 on the opposite side from the main body 31 and meshes with the mesh 47 between the upper surface 31c of the main body 31 and the first shielding member 50. [ Respectively.

The first shielding member 50 is not in contact with the upper surface 31c of the main body 31 and the flow path of the chemical liquid is formed between the upper surface 31c and the first shielding member 50 by the mesh 47 Respectively. The first shielding member 50 is also made of a material having a relatively high corrosion resistance against the chemical liquid and a relatively high wettability of the chemical liquid.

At the position of the concave portion 42, a gap is formed below the mesh 47. That is, no interface is formed between the main body 31 and the mesh 47 at the position of the recess 42. The concave portion 42 is connected to the circular arc portion 41a of the restricting groove 41 and a gap is formed below the mesh 47 at the connection portion with the circular arc portion 41a.

A mesh band 52 that is woven in a mesh shape is formed on the outer periphery of the main body 31 (the mesh 47) so as to extend from the inlet 33a to the direction of the outlet 34a (the longitudinal direction of the upper surface 31c) Is installed.

The mesh band 52 (guide member) covers the introduction port 33a, the supply port 35a (first shielding member), and the discharge port 34a. The mesh band 52 covers a portion of the upper surface 31c corresponding to the first portion and a portion of the upper surface 31c corresponding to the second portion. That is, the mesh band 52 is inserted from the inlet 33a in order through the temperature sensor insertion hole 37b (second temperature sensor 84), the supply port 35a, the temperature sensor insertion hole 37a The temperature sensor 83, the heater insertion hole 24 (heater 80), and the discharge port 34a.

The mesh band 52 is provided outside the mesh 47 and the first shielding member 50 and is in contact with the mesh 47 and the first shielding member 50. That is, the mesh band 52 is in contact with the mesh 47 on the side opposite to the side of the main body 31, and a mesh 47 is provided between the upper side 31c of the main body 31 and the mesh band 52. Further, a first shielding member 50 is provided between the mesh 47 and the mesh band 52.

The mesh band 52 is formed in a rectangular shape (band shape) and is formed to have a size capable of covering the introduction port 33a and the first shielding member 50 (the supply port 35a). Specifically, the diameter of the first shielding member 50 is substantially equal to the length of the mesh band 52 in the short direction. The length in the longitudinal direction of the mesh band 52 is longer than the length in the longitudinal direction of the upper surface 31c and the outer circumferential length of the curved surface 31f.

A mesh band 52 is wound on the upper surface 31c and the two curved surfaces 31f. The smoothness of the mesh band 52 nose is also formed in the opening of the mesh band 52 so as to make the chemical solution easy to make the film, for example, 300 meshes with 300 mesh per one inch. The mesh band 52 is also formed of a material having a relatively high corrosion resistance against the chemical liquid and a relatively high wettability of the chemical liquid.

Both ends of the mesh 47 and the longitudinal direction of the mesh band 52 are fixed by mesh holders 55a and 55b and a fixing member 56, respectively. The ends of the mesh 47 and the mesh band 52 are pressed by the first mesh presser 55a in the engaging groove 45 and the first mesh presser 55a is pressed by the second mesh presser 55a, And is pushed by the pusher 55b.

The ends of the mesh 47 and the mesh band 52 are guided outwardly between the first mesh presser 55a and the second mesh presser 55b. That is, the ends of the mesh 47 and the mesh band 52 are sandwiched between the first mesh presser 55a and the second mesh presser 55b.

The fixing member 56 engages with the engaging groove 45 in a state in which the second mesh presser 55b is pressed by the fixing member 56. [ As a result, the mesh pressers 55a and 55b and the fixing member 56 are fixed in a state of being engaged with the engaging groove 45. [ Although not shown, when the fixing member 56 is formed of a screw, the second mesh presser 55b is fastened to the main body 31 with a screw.

Here, the mesh 47 and the mesh band 52 are fixed in their longitudinally stretched state. The mesh 47 is brought into close contact with the upper surface 31c and the curved surface 31f of the main body 31 and the mesh band 52 is in tight contact with the mesh 47. [ The first shielding member 50 is in close contact with the mesh 47 and the mesh band 52.

Next, the procedure of assembling the liquid vaporizer 30 will be described. 5 is an exploded perspective view of the liquid vaporizer 30. Fig. As shown in the drawing, the first shielding member 50 includes a disk-like disk portion 50a and a needle-like pin 50b. A through hole 50c is formed in the center of the disk portion 50a. In the pin 50b, one end portion is a tip portion sharpened in a needle-like shape, and the other end portion is a head portion having a larger diameter than other portions. The diameter of the head portion of the pin 50b is larger than the diameter of the through hole 50c and the diameter of the portion of the pin 50b other than the head portion is smaller than the diameter of the through hole 50c. The diameter of the tip of the pin 50b is smaller than the line-to-line distance of 0.054 mm of the mesh 47. [

The mesh 47 is wound around the outer periphery of the main body 31 while aligning the longitudinal direction of the upper surface 31c of the main body 31 with the longitudinal direction of the mesh 47. [ At this time, the mesh 47 covers the whole of the upper surface 31c and the curved surface 31f, and both ends remain. The mesh 47 is formed on the upper surface (the upper surface) of the recess 47, except for the portion where the recess 42, the restricting groove 41, the supply port 35a, the discharge port 34a, the liquid collecting groove 34b, 31c.

Then, the disk portion 50a of the first shielding member 50 is disposed so as to cover the supply port 35a from the outside of the mesh 47. Next, At this time, the center position of the supply port 35a is aligned with the center of the disk portion 50a (through hole 50c). Then, the pin 50b is inserted into the through hole 50c of the disk portion 50a from the tip end portion and the mesh 47 is penetrated to insert the pin 50b into the supply port 35a. At this time, since the diameter of the tip portion of the pin 50b is smaller than the line-to-line distance of the mesh 47, the tip portion can be inserted between the wire material of the mesh 47 and the wire material. Then, the head portion of the pin 50b is brought into contact with the disk portion 50a, and the insertion of the pin 50b is completed.

The mesh band 52 is wound around the outer periphery of the main body 31 while aligning the longitudinal direction of the upper surface 31c of the main body 31 and the longitudinal direction of the mesh band 52. [ Specifically, the mesh band 52 is wound so as to overlap the introduction port 33a, the supply port 35a (the first shielding member 50), and the discharge port 34a. At this time, the mesh band 52 covers the upper surface 31c and the curved surface 31f, and both ends remain.

3 (b), 3 (c) and 3, the first mesh presser 55a in the engaging groove 45 presses the mesh 47 and the mesh band 52, Respectively. The mesh 47 and the mesh band 52 are respectively stretched in the longitudinal direction in the state where the first mesh presser 55a is pressed by the second mesh presser 55b. As a result, the wrinkles of the mesh 47 and the mesh band 52 are stretched and tension is generated in the mesh 47 and the mesh band 52. Then, the mesh pressers 55a and 55b are fixed by the fixing member 56, and the assembling of the liquid vaporizer 30 is completed.

The assembled liquid vaporizer 30 is attached to the side surface 20b of the second housing 20 using a fastening member at the through hole B formed in the main body 31 as described above. An elliptical cylindrical gap is formed between the inner circumferential surface of the first housing 11 and the main body 31.

The mesh 47 and the mesh band 52 are wound and fixed on the outer periphery of the main body 31 and between the mesh 47 and the recessed portion 44 of the curved surface 31f A gap is generated. The axial direction of the main body 31 (the short direction of the upper surface 31c) is provided between the inner peripheral surface of the first housing 11 and the mesh 47 and the mesh band 52 so as to engage with the recess 44. Therefore, The insertion member 57 is inserted.

The insertion member 57 is formed in a round bar shape, and the radius of the cross section is substantially equal to the radius of curvature of the concave portion 44. The distal end portion of the insertion member 57 is slightly thinner than the other portion and the mesh 47 and the mesh band 52 are pressed against the concave portion 44 from the distal end portion of the insertion member 57, (47) and the mesh band (52). Thereby, the gap between the recess 44 and the mesh 47 and the mesh band 52 can be reduced, and the tension generated in the mesh 47 and the mesh band 52 can be increased. As a result, the mesh 47 and the mesh band 52 are brought into tight contact with the main body 31.

Next, a description will be given of the principle that the chemical solution, which is in contact with the upper surface 31c of the main body 31, is spread by the mesh 47, the mesh band 52 and the first shielding member 50. FIG. 6 is an enlarged plan view of the mesh 47. Fig. The mesh 47 is formed by weaving (weaving) the vertical wire members 48a, 48b, 48c, and 48d and the horizontal wire members 49a, 49b, 49c, and 49d in a mesh shape.

A mesh space surrounded by the vertical wire material and the horizontal wire material is formed in the mesh 47 in plan view. The mesh space is a rectangular parallelepiped (square in plan view), and is formed at equal intervals in the longitudinal direction and the transverse direction of the mesh 47. For example, the mesh space T1 is a fine space (0.054 mm x 0.054 mm x the thickness of the mesh 47) surrounded by two vertical line members 48b and 48c and two horizontal line members 49b and 49c .

Since the mesh space T1 is a minute space, a relatively large intermolecular force acts between the wire rods 48b, 48c, 49b, 49c and the chemical liquid. As a result, the chemical liquid is sucked into the mesh space T1, and a film of the chemical liquid is formed so as to close the mesh space T1 (capillary phenomenon). In this state, the chemical solution is sucked into each mesh space, and the action of the chemical solution to spread along the surface of the mesh 47 is relatively small.

7 is an enlarged cross-sectional view of the upper surface 31c of the main body 31 and the mesh 47. Fig. As shown in the figure, between the upper surface 31c of the main body 31 and the mesh 47, a flow space T2 surrounded by an upper surface 31c, a vertical line member and a horizontal line member is formed. The flow channel space T2 is a space connecting the upper surface 31c and the gap between the vertical and horizontal wires and extends along the upper surface 31c.

In the portions where the vertical wires 48a, 48b, 48c and 48d contact the upper surface 31c (the intersections of the wires), the horizontal wires 49a, 49b, 49c and 49d are separated from the upper surface 31c. On the other hand, the vertical wire members 48a, 48b, 48c, and 48d are separated from the upper surface 31c at portions where the horizontal wire members 49a, 49b, 49c, and 49d contact the upper surface 31c (intersections of the wire members). Thus, the flow path space T2 is not blocked by the vertical and horizontal wires and is continuous along the upper surface 31c.

A plurality of fine interfaces are formed between the upper surface 31c and the vertical and horizontal wires. Therefore, the chemical liquid supplied to the upper surface 31c spreads along the upper surface 31c through the flow space T2 due to the interfacial tension at a plurality of fine interfaces (capillary phenomenon). That is, the mesh 47 (facilitating part) forms a microstructure for promoting the spread of the chemical liquid supplied to the upper surface 31c. Further, since the chemical liquid has wettability with respect to the upper surface 31c, the vertical line material and the horizontal line material, the spread of the chemical liquid along the upper surface 31c is promoted.

8 is an enlarged cross-sectional view of the upper surface 31c of the main body 31 and the mesh 47. Fig. Here, a part of the horizontal wire 49b is separated from the upper surface 31c, and a gap G is generated. Even in this state, the chemical liquid can be spread by the interfacial tension in the distribution space T2. That is, the top surface 31c and the vertical and horizontal wires may be partially separated.

9 is an enlarged sectional view of the upper surface 31c of the main body 31, the mesh 47 and the mesh band 52. Fig. As shown in the figure, in addition to the flow-through space T2, there are provided between the mesh 47 and the mesh band 52, vertical and horizontal wires of the mesh 47 as viewed from the side, And a flow space T3 surrounded by the vertical and horizontal wires is formed. The distribution space T3 is a space in which the vertical wire and the horizontal wire of the mesh 47 are connected to the gap between the vertical wire and the horizontal wire of the mesh band 52 and extends substantially parallel to the upper surface 31c.

The horizontal line members of the mesh band 52 and the vertical line members 53a, 53b, 53c and 53d of the mesh band 52 come into contact with the horizontal line members of the mesh 47, Away from the horizontal line of the wire. 53b, 53c, and 53d of the mesh band 52 mesh with the mesh (not shown) at the portion of the mesh band 52 where the horizontal line material contacts the vertical line material of the mesh 47 47). Therefore, the flow space T3 is not blocked by the vertical wire and the horizontal wire, but is continued substantially parallel to the upper surface 31c.

A plurality of fine interfaces are formed between the vertical and horizontal wires of the mesh 47 and the vertical and horizontal wires of the mesh band 52. That is, the mesh band 52 (facilitating part) forms a microstructure for promoting the spread of the chemical liquid supplied to the upper surface 31c. The chemical liquid supplied to the upper surface 31c spreads along the upper surface 31c through the flow space T2 due to the interfacial tension at a plurality of fine interfaces and flows through the flow space T3 to the upper surface 31c (Capillary phenomenon). Further, since the chemical liquid has wettability with respect to the top surface 31c, the vertical and horizontal wires of the mesh 47, and the vertical and horizontal wires of the mesh band 52, spreading of the chemical liquid is promoted. In this figure, the position of the vertical wire member 45 of the mesh 47 and the vertical wire member of the mesh band 52, and the position of the horizontal wire member of the mesh 47 and the horizontal wire member of the mesh band 52, But they may be shifted from each other.

10 is an enlarged sectional view of the upper surface 31c of the main body 31, the mesh 47 and the first shielding member 50. Fig. As shown in the figure, in addition to the circulation space T2, between the disk portion 50a of the first shielding member 50 and the mesh 47, there are formed a circular plate portion 50a, A circulation space T4 surrounded by the wire rod is formed. The circulation space T4 is formed in the same manner as the circulation space T2 and is a space connecting the lower surface of the disk portion 50a and the gap between the vertical and horizontal wires. Respectively.

The chemical liquid supplied to the upper surface 31c spreads along the upper surface 31c through the circulation space T2 due to the interfacial tension at a plurality of fine interfaces and flows through the circulation space T4 to the disk 50a ) (Capillary phenomenon). Further, since the chemical liquid has wettability with respect to the upper surface 31c, the lower surface of the disk portion 50a, the vertical and horizontal wires, spreading of the chemical liquid is promoted.

Next, the operation of the liquid control apparatus 10 will be described with reference to Figs. 1 and 3. Fig. Here, the case where the chemical liquid which can be spread by the liquid vaporizer 30 and can be vaporized (for example, the hydrophobic treatment liquid) is mixed with an inert gas (for example, nitrogen) do.

When inert gas is introduced from the first gas pipe 26b, the inert gas is ejected from the introduction port 33a of the main body 31 through the recessed portion 42 through the first gas flow paths 21 and 33. [ Since the introduction port 33a is connected to the restricting groove 41 via the recess 42, part of the inert gas ejected from the introduction port 33a is restricted by the restricting groove 41 covered by the mesh 47, . As a result, inert gas is introduced into the columnar space (S) in the first housing (11).

The inert gas flows through the gap formed between the inner peripheral surface of the first housing 11 and the main body 31 of the liquid vaporizer 30 and flows into the discharge port 34a. The inert gas introduced into the discharge port 34a is discharged from the second gas pipe 27b through the second gas flow channels 34 and 22. [ The second gas pipe 27b is connected to the next device, and the inert gas discharged from the second gas pipe 27b is supplied to the next device.

When the chemical liquid is supplied from the chemical liquid pipe 28b by driving the pump, the chemical liquid is supplied from the supply port 35a of the main body 31 to the upper surface 31c through the chemical liquid flow paths 23, At this time, since the chemical liquid supplied from the supply port 35a touches the first shielding member 50 covering the supply port 35a, it is suppressed that the chemical liquid is ejected through the mesh 47 and the mesh band 52 do. Since the pin 50b of the first shielding member 50 is inserted into the supply port 35a, even if the pressure of the chemical liquid acts on the first shielding member 50, And deviation from the sphere 35a is suppressed. Further, the pin 50b may be used for positioning the first shielding member 50 with respect to the supply port 35a.

Between the upper surface 31c of the main body 31 and the disc portion 50a of the first shielding member 50, as shown in Fig. 10, the supplied chemical liquid is subjected to the interfacial tension at a plurality of fine interfaces Is spread along the upper surface 31c through the distribution space T2 and spreads along the lower surface of the disk portion 50a through the circulation space T4. Therefore, at this portion, the chemical liquid spreads faster than the portion where only the mesh 47 is provided with respect to the upper surface 31c.

The chemical liquid flows under the disc portion 50a of the first shielding member 50 and spreads around again. 7, the chemical liquid is supplied to the upper surface 31c through the flow-through space T2 by the interfacial tension at a plurality of fine interfaces, as shown in Fig. 7, at the portion where only the mesh 47 is provided with respect to the upper surface 31c. Lt; / RTI > On the other hand, in the portion where the mesh 47 and the mesh band 52 are provided with respect to the upper surface 31c, as shown in Fig. 9, the chemical liquid flows into the distribution space T2 and spreads substantially parallel to the upper surface 31c through the flow passage space T3. Therefore, the chemical liquid circulating under the disc portion 50a of the first shielding member 50 spreads preferentially along the mesh band 52. [0064]

A part of the chemical solution spreading around the first shielding member 50 along the upper surface 31c reaches the restricting groove 41 of the upper surface 31c. No interface is formed between the upper surface 31c and the mesh 47 at the portion where the inhibition groove 41 is formed, so that the spread of the chemical liquid is suppressed. In addition, in the mesh 47, since the inert gas is spouted from the mesh at the portion that covers the suppressing groove 41, particularly at the portion that covers the recess 42, the chemical solution is effectively suppressed from spreading beyond the suppressing groove 41 .

Particularly, at the portion where the inhibition groove 41 and the mesh band 52 overlap, there is a possibility that the chemical liquid is spread over the inhibition groove 41 by riding the mesh band 52. At this point, since the concave portion 42 is connected to the portion where the suppression groove 41 and the mesh band 52 overlap, the width of the suppression groove 41 is substantially wider. As a result, it is possible to effectively suppress the spread of the chemical solution over the restraining groove 41 by riding the mesh band 52.

Here, the arc portion 41a of the restricting groove 41 is formed in the supply hole (not shown) except for the heater insertion hole 36 (heater 80) side and the temperature sensor insertion hole 37a (first temperature sensor 83) The spread of the chemical solution in directions other than the side of the heater 80 and the first temperature sensor 83 is suppressed. As a result, the amount of the chemical liquid flowing to the heater 80 side and the first temperature sensor 83 side increases, and the spread of the chemical liquid is promoted toward the heater 80 side and the first temperature sensor 83 side. Spreading of the chemical solution toward the heater 80 side and the first temperature sensor 83 side is also promoted by the straight portion 41c of the restraining groove 41. [ The suppressing groove 41 prevents the spread of the chemical solution on the opposite side of the supply port 35a (supply position) with the second portion interposed in the spreading direction of the upper surface 31c. The supply of the chemical liquid to the portion corresponding to the second portion of the upper surface 31c can be promoted by suppressing the spread of the chemical liquid on the opposite side of the supply port 35a with the second portion therebetween.

A heater 80 is inserted into the heater insertion hole 36 so that the upper surface 31c of the main body 31 is heated by the heater 80. [ Since the spread of the chemical solution toward the heater 80 is promoted by the mesh band 52 and the suppression groove 41, the efficiency of heating the chemical solution by the heater 80 can be improved. In addition, since the mesh band 52 is formed by being woven in a mesh shape, evaporation of the chemical solution through the mesh band 52 is facilitated, as compared with the case where the mesh band 52 is formed in a plate shape or a film shape. Therefore, the spread of the chemical solution toward the heater 80 can be promoted while the good evaporation of the chemical liquid is maintained by the mesh band 52.

Here, the relationship between the operation (right axis) of the pump and the temperatures (left axis) of the first and second parts will be described with reference to Figs. 11 to 13. Fig. 11 to 13, the controller 70 controls the temperature of the first portion detected by the first temperature sensor 83 so as to maintain the temperature of the first portion detected by the first temperature sensor 83 at 75 占 폚. The amount of heat generated by the heater 80 is feedback-controlled. As the feedback control, PID control, PD control, or the like can be employed.

11 is a graph showing the relationship between the operation of one pump and the temperature of the first part and the second part. As shown in the figure, when the chemical liquid is discharged once by the pump, the temperature of the first part and the temperature of the second part are lowered. Since the temperature of the first portion is lowered, the amount of heat generated by the heater 80 is increased by the controller 70. At this time, since the first portion is close to the heater 80, the temperature of the first portion is high in response to the change in the calorific value of the heater 80, but is likely to fluctuate as the calorific value of the heater 80 changes. As a result, the temperature of the first part converges to 75 캜 after repeating overshoot and undershoot. On the other hand, since the second portion is remote from the heater 80, the temperature of the second portion is slightly lower in response to the change in the calorific value of the heater 80, but is less likely to change even if the calorific value of the heater 80 changes . As a result, the temperature of the second part does not overshoot and undershoot, and rises to 75 占 폚 and converges.

12 is a graph showing the relationship between the operation of the continuous pump and the temperatures of the first part and the second part. As shown in the figure, the temperature of the first part and the temperature of the second part tend to be the same as those in Fig. 11 even when the chemical liquid discharging operation is performed a plurality of times consecutively by the pump. However, in this case, since the discharge amount and the vaporization amount of the chemical liquid increase, the temperature decrease width and the rise width are larger than those in FIG.

13 is a graph showing the relationship between the continuous pump operation periodically repeated and the temperatures of the first and second portions. As shown in the figure, the temperature of the first part and the temperature of the second part tend to be the same as in Fig. 12 even when the chemical liquid is continuously and repeatedly discharged by the pump. That is, in this case, the temperature transition of FIG. 12 is repeated periodically. By this discharge operation of the pump, the chemical liquid can be continuously supplied to the liquid vaporizer 30. Then, the liquid chemical vaporizer 30 can spread the chemical liquid supplied to the upper surface 31c to vaporize it.

Paying attention to trends in the temperature trends shown in Figs. 11 to 13, the controller 70 performs the following monitoring processing.

The controller 70 detects an abnormality based on the temperature of the second part detected by the second temperature sensor 84. [ Specifically, when the temperature of the second portion detected by the second temperature sensor 84 is lowered beyond the determination temperature width in the state where the amount of heat generated by the heater 80 is controlled, the controller 70 , It is detected that an abnormality occurs in heating by the heater (80). When an abnormality occurs in the heating by the heater 80, for example, when the power supply of the heater 80 is turned off, or when a disconnection occurs in the wiring for supplying electric power to the heater 80 The chemical liquid supplied to the upper surface 31c is not heated by the heater 80, and the temperature of the second portion is lower than the normal time. Therefore, it can be detected that the heating by the heater 80 is not properly performed. In the above case, the controller 70 detects that the chemical liquid is supplied to the upper surface 31c. That is, even when an abnormality occurs in the heating by the heater 80, when the inert gas is distributed along the upper surface 31c while the chemical liquid is being supplied to the upper surface 31c, the chemical liquid volatilizes, The temperature is lowered.

In addition, the controller 70 detects vaporization of the chemical liquid based on the temperature of the second part detected by the second temperature sensor 84. Specifically, in a state where the temperature of the second portion detected by the second temperature sensor 84 is maintained at 75 占 폚 (predetermined temperature), the controller 70 detects The supply of the chemical liquid and the vaporization of the chemical liquid are detected. The first portion is easily affected by the change in the amount of heat generated by the heater 80 while the second portion is less affected by the change in the amount of heat generated by the heater 80. [ Therefore, when the amount of heat generated by the heater 80 is increased in order to compensate for a decrease in the temperature of the first portion due to the supply of the chemical liquid, the temperature of the first portion is likely to overshoot 75 DEG C, It is difficult to overshoot the temperature of 75 占 폚. Therefore, it can be accurately detected that the chemical liquid is supplied from the supply port 35a to the upper surface 31c and that the supplied chemical liquid is vaporized.

When the temperature of the first portion detected by the first temperature sensor 83 is lowered beyond the determination temperature width while the heating amount of the heater 80 is being controlled by the controller 70, It is detected that an abnormality occurs in heating by the heater 80. When abnormality occurs in the heating by the heater 80, the chemical solution supplied to the upper surface 31c is not heated by the heater 80, and the temperature of the first portion is lower than the normal time. Therefore, it can be detected that the heating by the heater 80 is not properly performed. In the above case, the controller 70 detects that the chemical liquid is supplied to the upper surface 31c.

Returning to Figs. 1 to 3, the inert gas ejected from the mesh of the mesh 47 in the recess 42 and the restricting groove 41 is supplied to the second temperature sensor 84, the supply port 35a, The first temperature sensor 83, and the heater 80, and is discharged from the discharge port 34a. As a result, the spread of the chemical solution from the supply port 35a to the heater 80 side and the first temperature sensor 83 side is also promoted by the inert gas. The vapor generated by evaporation of the chemical liquid is guided by the inert gas in the direction of the discharge port 34a. Here, the restricting groove 41 is provided over the entire length of the main body 31 in the short direction on the side opposite to the discharge port 34a with respect to the supply port 35a. The vapor of the chemical liquid can be effectively guided toward the discharge port 34a by the inert gas ejected from the mesh of the mesh 47 in the recess 42 and the restricting groove 41. [

A liquid collection groove 34b extending in a direction substantially perpendicular to the direction from the supply port 35a to the discharge port 34a is connected to the discharge port 34a. As a result, vapor of the chemical liquid or the chemical liquid spreading out of the direction from the supply port 35a to the discharge port 34a is led to the discharge port 34a by the liquid collection groove 34b.

The upper surface 31c of the second housing 20 has an upper surface 31c and an upper surface 31c of the upper surface 31c of the second housing 20. The upper surface 31c has an outer rim along the boundary between the main body 31 and the second housing 20, 20b, the chemical liquid is liable to spread by the interfacial tension. At this point, the chemical liquid spreading along the outer edge of the upper surface 31c extends in the direction from the discharge port 34a to the supply port 35a, and then is substantially perpendicular to the direction from the supply port 35a to the discharge port 34a And extends to an extended portion 34c extending to the outer edge of the upper surface 31c in the inward direction. As a result, the chemical liquid spreading along the outer edge of the upper surface 31c can be efficiently guided to the discharge port 34a by the liquid collecting groove 34b.

The chemical liquid flowing into the second gas flow path 34 through the discharge port 34a is stored in the recessed portion 34d formed below the discharge port 34a in the second gas flow path 22, It becomes difficult to flow forward. The chemical liquid stored in the concave portion 34d is vaporized by the heat of the heater 80. [ At this time, the temperature in the vicinity of the concave portion 34d is lowered by the heat of vaporization of the chemical liquid in the concave portion 34d.

Therefore, when the temperature of the third part detected by the third temperature sensor 85 is lowered beyond the determination temperature range, the controller 70 detects that the chemical liquid has flowed into the second gas flow path 34 . Then, the controller 70 stops the discharge operation of the chemical liquid by the pump. Thereafter, after the temperature of the third part detected by the third temperature sensor 85 rises and converges to a predetermined temperature, the controller 70 resumes the discharge operation of the chemical liquid by the pump.

The embodiment described in detail above has the following advantages.

The mesh 47 has a microstructure that promotes spreading of the chemical liquid supplied to the upper surface 31c. As a result, the chemical liquid supplied to the upper surface 31c spreads along the upper surface 31c due to the interfacial tension in the microstructure. The chemical liquid spreading from the supply port 35a through which the chemical liquid is supplied on the upper surface 31c along the upper surface 31c is heated inside the main body 31 by the heater 80. [ As a result, the chemical liquid can be vaporized over a large area on the upper surface 31c.

The temperature of the first portion inside the main body 31 is detected by the first temperature sensor 83 between the supply port 35a and the heater 80 in the spreading direction of the upper surface 31c. The first portion is located nearer to the heater 80 than the supply port 35a in the spreading direction of the upper surface 31c and therefore the change in the calorific value of the heater 80 is quickly reflected. The controller 70 controls the amount of heat generated by the heater 80 based on the temperature of the first portion detected by the first temperature sensor 83. [ Therefore, the responsiveness in controlling the temperature of the main body 31 by the heater 80 can be maintained.

The temperature of the second portion inside the main body 31 is detected by the second temperature sensor 84 on the opposite side of the first portion with the supply port 35a therebetween in the spreading direction of the upper surface 31c do. The second portion is located farther from the heater 80 than the supply port 35a in the spreading direction of the upper surface 31c. Therefore, the temperature of the second portion is hardly influenced by the change in the calorific value of the heater 80, and accurately reflects the vaporized state of the chemical liquid. The controller 70 executes a predetermined monitoring process based on the temperature of the second portion detected by the second temperature sensor 84. [ Therefore, the vaporization process of the chemical liquid can be accurately monitored.

The first portion and the second portion are located in the vicinity of the upper surface 31c inside the main body 31 in the direction perpendicular to the upper surface 31c, that is, in the vicinity of the upper surface 31c in the inside of the main body 31 Is set. Thus, the temperature of the upper surface 31c contacting the chemical liquid can be accurately detected based on the detection temperature of the first portion, and furthermore, the temperature of the upper surface 31c can be accurately controlled. Further, it is possible to accurately detect the temperature change due to the vaporization of the chemical liquid on the upper surface 31c based on the detection temperature in the second portion, and to precisely monitor the vaporization state of the chemical liquid on the upper surface 31c can do.

The temperature trend of the second part detected by the second temperature sensor 84 is displayed on the monitor 71. [ Thus, the user can observe the temperature transition of the second portion displayed on the monitor 71 and judge whether or not the vaporization process of the chemical liquid is normal.

The temperature of the second part accurately reflects the vaporization state of the chemical liquid. In this respect, since the abnormality is detected based on the temperature of the second portion detected by the second temperature sensor 84, the abnormality of the chemical liquid vaporization process can be properly detected.

When the temperature of the second portion detected by the second temperature sensor 84 is lowered beyond the determination temperature width while the heating amount of the heater 80 is being controlled by the controller 70, It is detected that an abnormality occurs in the heating by the heater 80. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 can detect that the chemical liquid is supplied to the upper surface 31c.

Since the vaporization of the chemical liquid is detected based on the temperature of the second portion detected by the second temperature sensor 84, it is possible to accurately detect that the chemical liquid has vaporized on the upper surface 31c.

In the state where the temperature of the second portion detected by the second temperature sensor 84 is maintained at 75 占 폚, the temperature of the second portion detected by the second temperature sensor 84 is lowered to 75 占 폚 The supply and the vaporization of the chemical liquid are detected. Therefore, it can be accurately detected that the chemical liquid is supplied from the supply port 35a and that the supplied chemical liquid is vaporized.

When the temperature of the first part detected by the first temperature sensor 83 is lowered beyond the determination temperature width while the heating amount of the heater 80 is being controlled by the controller 70, It is detected that an abnormality occurs in the heating by the heater 80. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 can detect that the chemical liquid is supplied to the upper surface 31c.

A plurality of interfaces are also formed between the mesh 47 and the mesh band 52 since the mesh band 52 contacting the mesh 47 is provided between the main body 31 and the mesh 47. Therefore, even between the mesh 47 and the mesh band 52, the chemical liquid can be spread by the interfacial tension. Therefore, the spread of the chemical liquid can be promoted at the portion where the mesh band 52 is provided, as compared with other portions. As a result, by adjusting the arrangement of the mesh band 52, it is possible to preferentially spread the chemical solution in contact with the upper surface 31c in a desired direction.

Since the mesh band 52 is formed by being woven in a mesh shape, evaporation of the chemical liquid through the mesh band 52 can be promoted as compared with the case where the mesh band 52 is formed in a plate shape or a film shape . Thus, the chemical liquid in contact with the upper surface 31c is preferentially spread in a desired direction, and evaporation of the chemical liquid can be promoted.

A liquid medicine flow path 35 is formed in the main body 31 so as to flow the chemical liquid and an opening in the upper surface 31c of the liquid chemical flow path 35 forms a chemical liquid supply port 35a. As a result, the space inside the main body 31 can be effectively used to supply the chemical liquid to the upper surface 31c. As the supply port 35a, a position where the chemical liquid is supplied to the upper surface 31c through the supply port 35a can be employed.

The portion corresponding to the first portion of the upper surface 31c and the portion corresponding to the second portion of the upper surface 31c and the supply port 35a are covered with the mesh 47 and the mesh band 52, It is. This allows the chemical liquid supplied from the supply port 35a to preferentially spread in the direction of the first part and the direction of the second part in the spreading direction of the upper surface 31c. Therefore, the amount of heat generated by the heater 80 can be controlled based on the temperature of the first portion while sufficiently supplying the chemical solution to the portion corresponding to the first portion of the upper surface 31c. As a result, the vaporization state of the chemical liquid can be controlled in a state where the chemical liquid is stably supplied. It is also possible to perform a predetermined monitoring process on the basis of the temperature of the second portion while sufficiently supplying the chemical solution to the portion corresponding to the second portion of the upper surface 31c. As a result, the vaporization process of the chemical liquid can be monitored while the chemical liquid is stably supplied.

The restricting groove 41 provided on the upper surface 31c suppresses the spread of the chemical solution on the opposite side of the supply port 35a with the second portion interposed in the spreading direction of the upper surface 31c. The supply of the chemical liquid to the portion corresponding to the second portion of the upper surface 31c can be promoted by suppressing the spread of the chemical liquid on the opposite side of the supply port 35a with the second portion therebetween. As a result, the vaporization process of the chemical liquid can be monitored in a state where the chemical liquid is stably supplied.

A first gas flow passage 33 and a second gas flow passage 34 are formed in the main body 31 so as to flow the gas. The first gas flow field 33 and the second gas flow field 34 31c form the gas inlet 33a and the gas outlet 34a, respectively. This allows the space inside the main body 31 to be effectively used to introduce the gas into the space around the upper surface 31c and discharge the gas from the space around the upper surface 31c. At this time, the chemical liquid contacting the upper surface 31c is promoted to spread in the gas flow direction. Since the gas inlet 33a and the gas outlet 34a are provided with the heater 80 interposed therebetween, the spread of the chemical solution in the direction passing through the heater 80 can be promoted. As a result, heating of the chemical liquid by the heater 80 can be promoted.

A main body 31 is arranged so that the upper surface 31c is on the upper side and a concave portion 34d is formed in the second gas flow path 34 so as to be recessed downward from the second gas flow path 34. As a result, the chemical liquid flowing into the second gas flow path 34 is stored in the recess 34d formed in the second gas flow path 34. Therefore, the chemical liquid can be prevented from being discharged through the second gas flow path 34 without being vaporized. Further, the chemical liquid stored in the concave portion 34d can be vaporized by the heat of the heater 80. [

The third temperature sensor detects the temperature of the third portion in the vicinity of the concave portion 34d inside the main body 31. [ When the temperature of the third portion detected by the third temperature sensor is lowered beyond the determination temperature width by the controller 70, it is detected that the chemical liquid has flowed into the second gas flow path 34. Therefore, it is possible to suitably detect that the chemical liquid has flowed into the second gas flow path 34, and the treatment such as stopping the supply of the chemical liquid can be performed.

The above embodiment may be modified as follows. The same members as in the above embodiment are denoted by the same reference numerals, and a description thereof will be omitted.

14 is a perspective view showing a modified example of the main body 31 of the liquid vaporizer 30. Fig. It is also possible to employ a configuration in which the introduction port 33a directly communicates with the circular arc portion 141a of the restricting groove 141 as shown in the figure. The inert gas is introduced into the suppressing groove 141 from the inside of the main body 31 through the introduction port 33a so that the inert gas can flow into the suppressing recess 141 and the flow path formed by the mesh 47, . The inert gas that flows through the mesh of the mesh 47 and flows through the restricting groove 141 can suppress the spread of the chemical liquid beyond the restricting groove 141. [ The temperature sensor insertion holes 37a and 37b (temperature sensors 83 and 84) can also be arranged substantially at the center of the main body 31 in the vertical direction, as shown in the figure.

15 is a perspective view showing another modified example of the main body 31 of the liquid vaporizer 30. Fig. It is also possible to adopt a restricting groove 241 for connecting the recess 42 and the discharge port 34a on the upper surface 31c of the main body 31 as shown in the figure. According to such a configuration, not only the chemical liquid flowing into the above-described liquid collecting groove 34b but also the chemical liquid flowing into the restricting groove 241 can be led to the discharge port 34a. Further, the restricting groove 241 surrounds the entire periphery of the supply port 235a. Thus, overflow of the chemical liquid from the upper surface 31c can be suppressed.

Further, as shown in the drawing, the chemical liquid flow path 35 and the supply port 35a may be omitted, and the chemical liquid may be supplied to the liquid supply position 235a from above. In this case, a chemical liquid flow path for circulating the chemical liquid to the upper side of the supplied position 235a is formed. The temperature sensor insertion hole 37a (first temperature sensor 83) may be arranged in the vicinity of the lower surface 31e of the main body 31 in the vertical direction as shown in the figure.

16 is a perspective view showing another modified example of the main body 31 of the liquid vaporizer 30. Fig. As shown in the figure, an inlet 33a and an outlet 34a are formed in the main body 131 on the diagonal line of the upper surface 31c. An inhibiting groove 341 parallel to the liquid collecting groove 34b is provided on the upper surface 31c and the introducing port 33a communicates with the suppressing groove 341. [ Also with this configuration, the inert gas introduced into the restricting groove 341 flows along the restricting groove 341. Here, temperature sensor insertion holes 337a and 337b extending from below to above the body 131 (thickness direction of the body 131) are provided. The first temperature sensor 83 and the second temperature sensor 84 are inserted into the temperature sensor insertion holes 337a and 337b to detect the temperature in the vicinity of the upper surface 31c.

The inert gas ejected from the mesh of the mesh 47 in the portion of the restricting groove 341 can be guided by the temperature sensor insertion hole 337b (second temperature sensor 84), the supply port 35a, Passes through the temperature sensor insertion hole 337a (first temperature sensor 83) and the heater insertion hole 36 (heater 80) in order and is discharged from the discharge port 34a. Therefore, the inert gas can promote the spread of the chemical solution from the supply port 35a to the heater 80 side and the temperature sensor 83 side, and the vapor flow of the chemical solution.

17 is a perspective view showing a modification example in the vicinity of the second gas flow path 34. Fig. The liquid collection groove 34e may be provided between the supply port 35a (the supply position) and the discharge port 34a in the spreading direction of the upper surface 31c. The liquid collecting groove 34e extends in the direction perpendicular to the direction from the supply port 35a toward the discharge port 34a in the spreading direction of the upper surface 31c. The height of the opening surface of the discharge port 34a is higher than the height of the opening surface of the liquid collecting groove 34e. As a result, the chemical liquid flows into the liquid collecting groove 34e, and the chemical liquid can be prevented from flowing into the discharge port 34a. As shown in the drawings, the second gas passage 34 may be provided in the vicinity of the upper surface 315c in the main body 31. [

A temperature sensor insertion hole 437c (third temperature sensor 485) is provided below the liquid collecting groove 34e in the main body 31. [ The temperature sensor insertion hole 437c (third temperature sensor 485) extends in the short direction of the upper surface 31c. The third temperature sensor 485 detects the temperature of the third portion near the bottom of the liquid collecting groove 34e. According to this configuration, when the temperature of the third portion detected by the third temperature sensor is lowered beyond the determination temperature width by the controller 70, it is possible to appropriately control the flow of the chemical liquid into the liquid collection groove 34e It is possible to perform the treatment such as stopping the supply of the chemical liquid.

When the temperature of the first part (second part) detected by the first temperature sensor 83 (second temperature sensor 84) does not rise for a period longer than the predetermined period, It may be detected that an abnormality occurs in heating.

The controller 70 may digitally display the temperature of the first part and the temperature of the second part on the monitor 71. [

When the temperature of the liquid vaporizer 30 becomes higher than the predetermined temperature by providing a thermal fuse to the liquid vaporizer 30, the heating of the heater 80 may be stopped by the thermal fuse.

A liquid sensor for detecting liquid may be attached to the concave portion 34d of the second gas flow path 34. The chemical liquid stored in the concave portion 34d may be detected by the liquid sensor.

The first shielding member 50 may be provided outside the mesh band 52. Further, the first shielding member 50 may be any shape as long as it covers the supply port 35a, and its shape can be changed arbitrarily.

The weaving method (weaving method) of the mesh 47 or the mesh band 52 is not limited to the plain weave, and other methods such as twill may be employed. The formation of the mesh 47 and the mesh band 52 is suitably carried out in the range of about 100 to 500 mesh depending on the wettability of the chemical liquid to them, the wettability of the chemical liquid to the main body 31, .

In each of the above embodiments, the mesh bands 52 are woven in a mesh shape, but they may be formed in a film shape. In this case, since the band formed in a film shape fulfills the function of the first shielding member, the first shielding member 50 may be omitted. The first shielding member 50 may be omitted even when the supply pressure of the chemical liquid is low and the possibility of the chemical liquid spraying through the mesh 47 and the mesh band 52 is low. Conversely, the mesh band 52 may not be provided at the portion where the first shielding member 50 is provided. That is, the mesh band 52 may be provided only at the portion where the first shielding member 50 is not provided. Further, the mesh band 52 may be formed in a plate shape.

The shape of the main body 31 is not limited to the columnar shape of the bottom face ellipse, but other shapes such as a rectangular parallelepiped shape may be adopted. The top surface 31c (the surface to be supplied) of the main body 31 is not limited to a flat surface but may be a curved surface.

The restraining grooves 41, 141, 241 and 341 may be omitted.

As the microstructure for promoting the spread of the chemical liquid supplied to the upper surface 31c, a structure in which fine irregularities are formed on the upper surface 31c may be adopted. In this case, the fine uneven structure of the upper surface 31c constitutes the accelerating portion, so that the mesh 47 can be omitted.

As the chemical liquid, not only the hydrophobic treatment liquid (HMDS) but also other chemical liquids such as a thinner type solvent and a silane coupling agent may be employed. At that time, it is preferable to change the material of the mesh 47 and the mesh band 52 according to the wettability with the chemical liquid. As a material of these, for example, a metal or resin other than the stainless steel material may be used. Further, the liquid vaporizer is not limited to the liquid controller 10, and may be applied to other apparatuses such as a chemical liquid applicator and a film forming apparatus.

10: Liquid control device
21: first gas flow path
22: a second gas flow path
23: chemical liquid flow path (liquid flow path)
30: liquid vaporizer
31: Body
33: first gas flow path
33a: introduction port
34: second gas flow path
34a:
34d:
34e: Home
35: chemical liquid flow path (liquid flow path)
35a: supply port
41: Suppression groove (groove)
47: mesh (accelerating part, net-like body)
52: Mesh band (accelerating part, net-shaped body, guide member)
70: Controller (control unit, monitoring unit)
71: Monitor (Display)
80: Heater
83: first temperature sensor
84: second temperature sensor
85: third temperature sensor
131:
141: restraining groove (groove)
235a: feed position
241: Suppression groove (groove)
341: Suppression groove (groove)
485: third temperature sensor

Claims (18)

A liquid control device for controlling the spreading and vaporization of liquid,
A main body having a surface to be supplied to which the liquid is supplied;
A promoting portion having a fine structure for promoting spreading of the liquid supplied to the surface to be fed;
A heater for heating the surface to be fed from the inside of the main body at a position away from a feed position where the liquid is supplied on the surface to be fed in the spread direction of the surface to be fed,
A first temperature sensor for detecting a temperature of a first portion inside the main body between the feed target position and the heater in a spreading direction of the surface to be fed,
A second temperature sensor for detecting a temperature of a second portion inside the main body on a side opposite to the first portion with the fed position being interposed in the spreading direction of the surface to be fed,
A controller for controlling the amount of heat generated by the heater based on the temperature of the first portion detected by the first temperature sensor;
And a monitoring section for performing a predetermined monitoring process based on the temperature of the second section detected by the second temperature sensor. The liquid control apparatus according to claim 1, wherein the first portion and the second portion are portions in the vicinity of the surface to be fed inside the main body in a direction perpendicular to the surface to be fed. The image processing apparatus according to claim 1, further comprising: a display unit for displaying an image,
And the monitoring unit displays, as the monitoring process, the temperature transition of the second portion detected by the second temperature sensor on the display unit. The liquid control apparatus according to claim 1, wherein the monitoring section detects abnormality based on the temperature of the second section detected by the second temperature sensor as the monitoring process. 5. The apparatus according to claim 4, wherein the monitoring unit is configured to, when the heating amount of the heater is controlled by the control unit,
And detects that an abnormality has occurred in the heating by the heater when the temperature of the second portion detected by the second temperature sensor is lowered beyond the determination temperature width. The liquid control apparatus according to claim 1, wherein the monitoring unit detects vaporization of the liquid based on the temperature of the second portion detected by the second temperature sensor as the monitoring processing. 7. The apparatus according to claim 6, wherein the monitoring unit is configured to monitor the temperature of the second portion detected by the second temperature sensor when the temperature of the second portion detected by the second temperature sensor is maintained at a predetermined temperature, And when the temperature of the liquid is maintained to rise up to the predetermined temperature, the supply of liquid and the vaporization of the liquid are detected. 2. The apparatus according to claim 1, wherein when the temperature of the first portion detected by the first temperature sensor is lowered beyond the determination temperature width in a state where the heating amount of the heater is controlled by the control unit And detects that an abnormality has occurred in heating by the heater. [2] The apparatus according to claim 1, wherein the accelerating portion is a mesh-shaped body that is woven in a mesh-
And an inductive member abutting the net-like body with the main body and the net-like body interposed therebetween. The liquid control apparatus according to claim 9, wherein the guide member is formed by being woven in a mesh shape. 10. The apparatus according to claim 9, wherein a liquid flow path for flowing the liquid is provided inside the body,
Wherein the liquid flow path is opened at the surface to be supplied to form a supply port for the liquid,
Wherein the liquid supply position is a position where the liquid is supplied to the surface to be supplied through the supply port,
Wherein the net-shaped body and the guide member cover a portion corresponding to the first portion of the surface to be supplied, a portion corresponding to the second portion of the surface to be supplied, and the supply port. 12. The method according to any one of claims 1 to 11, further comprising the step of controlling the spreading of the liquid on the side opposite to the feeding position with the second portion interposed therebetween in the spread direction of the surface to be fed, Wherein the groove is provided with a groove. 12. The apparatus according to any one of claims 1 to 11, wherein a first gas flow passage and a second gas flow passage are formed in the body,
Wherein the first gas flow path is open at the surface to be supplied to form an introduction port of the gas,
Wherein the second gas flow path is open at the surface to be supplied to form an outlet of the gas,
And the inlet and the outlet are provided with the heater interposed therebetween. 14. The apparatus according to claim 13, wherein the main body is disposed such that the surface to be fed is an upper surface of the main body,
And the second gas flow path is provided with a recessed portion that is concave downward relative to the second gas flow path. The apparatus according to claim 14, further comprising a third temperature sensor for detecting a temperature of a third portion in the vicinity of the recess in the main body,
Wherein the monitoring unit detects that the liquid has flowed into the second gas flow passage when the temperature of the third part detected by the third temperature sensor has dropped below the determination temperature range. 14. The apparatus according to claim 13, wherein the main body is disposed such that the surface to be fed is an upper surface of the main body,
Wherein a liquid-collecting groove is provided between the fed-out position and the discharge port in a spreading direction of the surface to be fed. 17. The liquid control apparatus according to claim 16, wherein the height of the opening surface of the discharge port is higher than the height of the opening surface of the liquid collection groove. The liquid ejecting apparatus according to claim 16, further comprising: a third temperature sensor for detecting a temperature of a third portion below the liquid collecting groove in the main body,
Wherein the monitoring section detects that the liquid has flowed into the liquid collecting groove when the temperature of the third section detected by the third temperature sensor is lowered beyond the determination temperature width.

Images